JPH0287066U - - Google Patents
Info
- Publication number
- JPH0287066U JPH0287066U JP16684188U JP16684188U JPH0287066U JP H0287066 U JPH0287066 U JP H0287066U JP 16684188 U JP16684188 U JP 16684188U JP 16684188 U JP16684188 U JP 16684188U JP H0287066 U JPH0287066 U JP H0287066U
- Authority
- JP
- Japan
- Prior art keywords
- sputtering device
- ion sputtering
- sample chamber
- ions
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16684188U JPH0287066U (cs) | 1988-12-26 | 1988-12-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16684188U JPH0287066U (cs) | 1988-12-26 | 1988-12-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0287066U true JPH0287066U (cs) | 1990-07-10 |
Family
ID=31454589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16684188U Pending JPH0287066U (cs) | 1988-12-26 | 1988-12-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0287066U (cs) |
-
1988
- 1988-12-26 JP JP16684188U patent/JPH0287066U/ja active Pending