JPH0286877A - Cleaning device - Google Patents

Cleaning device

Info

Publication number
JPH0286877A
JPH0286877A JP28057888A JP28057888A JPH0286877A JP H0286877 A JPH0286877 A JP H0286877A JP 28057888 A JP28057888 A JP 28057888A JP 28057888 A JP28057888 A JP 28057888A JP H0286877 A JPH0286877 A JP H0286877A
Authority
JP
Japan
Prior art keywords
solvent
heat exchanger
cleaning
refrigerant
bathtubs
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28057888A
Other languages
Japanese (ja)
Inventor
Mitsuru Hoshino
充 星野
Atsusuke Sakaida
敦資 坂井田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP28057888A priority Critical patent/JPH0286877A/en
Publication of JPH0286877A publication Critical patent/JPH0286877A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To remarkably decrease the amount of cleaning solvent dissipated and to reduce cleaning cost by providing a heat exchanger through which a refrigerant is passed to the inside of the wall surface of a device vessel in contact with bath tanks. CONSTITUTION:When operation is stopped and heaters 3A, 3B are shut off, a refrigerant is supplied by means of a refrigerant feeder 5 into a heat exchanger 4, by which bath tanks 2A, 2C in contact with the heat exchanger 4 are rapidly cooled by means of the heat exchanger 4 and the generation ot the vapor of the solvent can be prevented. As a result, the amount of the solvent dissipated can be reduced.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は洗浄装置に関し、特に油脂、フラックス等が付
着したIC部品や電子部品を洗浄する洗浄装置の構造改
良に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a cleaning device, and more particularly to a structural improvement of a cleaning device for cleaning IC parts and electronic parts to which oil, fat, flux, etc. have adhered.

[従来の技術] かかる洗浄装置はフロン、トリクロルエチレン等の有機
洗浄溶剤により上記IC部品等の被洗浄物を洗浄するも
ので、その−例を第5図に示す。
[Prior Art] Such a cleaning device cleans objects to be cleaned, such as the above-mentioned IC parts, using an organic cleaning solvent such as chlorofluorocarbon or trichlorethylene, and an example thereof is shown in FIG.

図において、装置容器1は底壁11と側壁12.13に
所定厚の断熱材を内設した密閉体であり、一方の側壁1
3の上端部に搬入口14が設けである。上記容器1内に
は底壁11上に洗浄溶剤を満たした浴槽2A、2B、2
Cが比較的薄い断熱層を介して隣接して設けである。
In the figure, the device container 1 is a closed body in which a bottom wall 11 and side walls 12 and 13 are provided with a heat insulating material of a predetermined thickness.
A carry-in port 14 is provided at the upper end of 3. Inside the container 1, there are bathtubs 2A, 2B, 2 filled with cleaning solvent on the bottom wall 11.
C are provided adjacent to each other with a relatively thin heat insulating layer interposed therebetween.

本例では、浴槽2A〜2Cはそれぞれ温浴槽、冷浴槽、
ベーパ槽となっており、浴槽2A、2Cには底壁11よ
りU字形のヒータ3A、3Bが突出せしめである。また
、浴槽2Bには底面に超音波振動子6が設けられるとと
もに、側面内周には冷却水を流通せしめる蛇管71が配
設しである。
In this example, the bathtubs 2A to 2C are a hot bathtub, a cold bathtub, and a hot bathtub, respectively.
The bathtubs 2A and 2C have U-shaped heaters 3A and 3B protruding from the bottom wall 11. Further, the bathtub 2B is provided with an ultrasonic vibrator 6 on the bottom surface, and a flexible pipe 71 through which cooling water flows is provided on the inner periphery of the side surface.

また、これら各浴槽2A、2Bの上方の容器1内壁に蛇
管72が設けてあり、該蛇管72により上記各浴槽2A
〜2Cより蒸発した溶剤蒸気を凝縮回収している。
Further, a flexible pipe 72 is provided on the inner wall of the container 1 above each of these bathtubs 2A, 2B, and the flexible pipe 72 allows each of the bathtubs 2A and 2B to
The solvent vapor evaporated from ~2C is condensed and recovered.

上記容器1内にはコンベヤ8が配設してあり、これは各
浴槽2A、2Bの洗浄溶剤中と浴槽2Cの洗浄溶剤上を
通過し、搬入口14を経て容器1外に延出している。上
記コンベア8に設けた治具に被洗浄物を収納したマガジ
ン81を装着し、図中矢印の如く順次上記各浴槽2A〜
2Cに搬送して洗浄する。
A conveyor 8 is disposed inside the container 1, which passes through the cleaning solvent in each bathtub 2A, 2B and over the cleaning solvent in the bathtub 2C, and extends out of the container 1 through an inlet 14. . A magazine 81 containing items to be cleaned is attached to a jig provided on the conveyor 8, and the articles are sequentially placed in each of the bathtubs 2A to 2A as shown by the arrows in the figure.
Transfer to 2C and wash.

すなわち、温浴槽2Aでは被洗浄物に付着している油脂
等を膨脹させてその一部を洗浄液中に溶解させ、冷浴槽
2Bでは超音波により上記油脂等を剥離せしめるととも
に被洗浄物を冷却し、次いでベーパ槽2Cでは溶剤蒸気
を被洗浄物の表面で凝縮せしめて、すすぎ洗いを行なう
That is, in the hot bath 2A, oil and fat attached to the object to be cleaned is expanded and a part of it is dissolved in the cleaning liquid, and in the cold bath 2B, the oil and fat, etc. are peeled off by ultrasonic waves, and the object to be cleaned is cooled. Next, in the vapor tank 2C, the solvent vapor is condensed on the surface of the object to be rinsed.

なお、上記各蛇管71.72は装置容器外の冷却水供給
器5へ配管接続されて冷却水の供給を受ける(図中矢印
)。
Each of the flexible pipes 71 and 72 is connected to the cooling water supply device 5 outside the device container to receive cooling water (arrows in the figure).

[発明が解決しようとする課題] 上記従来の洗浄装置において、特に加熱された温浴槽と
ベーパ槽からは多量の溶剤蒸気が発生せしめられる。こ
れら溶剤蒸気の大部分は、上述の如く、冷却用蛇管によ
り回収されるが、一部は搬入口等から容器外へ消散する
。操業中の溶剤の消散はある程度不可避であるものの、
操業停止後も浴槽内の洗浄液の温度低下は断熱材の効果
で緩やかであり、発明者等の試算では一日8時間操業し
、残る時間を停止して、−カ月稼働せしめた場合の溶剤
消散量は1001以上にも達する。
[Problems to be Solved by the Invention] In the conventional cleaning apparatus described above, a large amount of solvent vapor is generated particularly from the heated hot tub and vapor tank. Most of these solvent vapors are recovered by the cooling coils as described above, but some of them are dissipated out of the container through the inlet and the like. Although some dissipation of solvent during operation is unavoidable,
Even after the operation is stopped, the temperature of the cleaning liquid in the bathtub decreases slowly due to the effect of the insulation material, and the inventors have estimated that the solvent dissipation will occur if the bathtub is operated for 8 hours a day, stopped for the remaining time, and operated for -month. The amount reaches more than 1001.

そこで、溶剤回収装置を新たに増設する等の対策が採ら
れているが、これは設備費が大幅に上昇するという問題
がある。
Therefore, countermeasures such as installing a new solvent recovery device have been taken, but this has the problem of significantly increasing equipment costs.

本発明はかかる問題点を解決するもので、比較的低コス
トで溶剤消散量を極めて少なくできる洗浄装置を提供す
ることを目的とする。
The present invention solves these problems, and aims to provide a cleaning device that can extremely reduce the amount of solvent dissipated at a relatively low cost.

[課題を解決するための手段] 本発明の構成を第1図で説明すると、断熱壁12.13
で構成した装置容器1内に洗浄溶剤を満たした複数の浴
槽2A、2B、2Cを設けて、上記装置容器1内に搬入
した被洗浄物を洗浄するようになし、かつ上記浴槽2A
〜2Cの少なくとも一つに洗浄溶剤を加熱するヒータ3
A、3Bを付設してなる洗浄装置には、上記断熱壁12
.13の、上記ヒータ3A、3Bを設けた浴槽2A、2
Cに接する壁面内に熱交換器4を設けるとともに、上記
ヒータ3A、3B停止時に上記熱交換器4に冷媒を供給
する冷媒供給器5を設けである。
[Means for Solving the Problems] The configuration of the present invention is explained with reference to FIG. 1.
A plurality of bathtubs 2A, 2B, and 2C filled with a cleaning solvent are provided in the apparatus container 1 constructed of the above to wash the objects to be cleaned carried into the apparatus container 1, and the bathtub 2A
A heater 3 that heats the cleaning solvent to at least one of ~2C
The cleaning device equipped with A and 3B has the above-mentioned heat insulating wall 12.
.. No. 13, bathtubs 2A and 2 equipped with the heaters 3A and 3B
A heat exchanger 4 is provided within the wall surface in contact with C, and a refrigerant supply device 5 is provided to supply refrigerant to the heat exchanger 4 when the heaters 3A and 3B are stopped.

[作用] 上記構成の洗浄装置において、操業を止めてヒータを停
止すると、熱交換器に冷媒が供給され、熱交換器はこれ
に接する浴槽を急速に冷却して溶剤蒸気の発生を防止す
る。これにより、−溶剤の消散量は小さく抑えられる。
[Function] In the cleaning device configured as described above, when the operation is stopped and the heater is stopped, the refrigerant is supplied to the heat exchanger, and the heat exchanger rapidly cools the bathtub in contact with the heat exchanger to prevent the generation of solvent vapor. As a result, the amount of -solvent dissipated can be kept small.

[実施例] 本発明の一実施例を従来例との相違点を中心に説明する
[Example] An example of the present invention will be described focusing on the differences from the conventional example.

第1図において、断熱材を内設した底壁11および側壁
12.13を有する密閉の装置容器1内には、底壁11
上に浴槽2A、2B、2Cが設けられ、このうち浴槽2
A、2B内にはヒータ3A、3Bが突設されて洗浄溶剤
を加熱している。
In FIG. 1, a closed device container 1 having a bottom wall 11 and side walls 12,13 with internal heat insulating material includes a bottom wall 11 and a side wall 12,13.
Bathtubs 2A, 2B, and 2C are provided above, of which bathtub 2
Heaters 3A and 3B are provided protruding inside A and 2B to heat the cleaning solvent.

上記側壁12.13の段付に小径となった下半部には、
上記各浴槽2A、2Cの側面に接する壁面内に熱交換器
4が設けである。上記熱交換器4は壁内に一定厚さで上
下方向に延設され、図略の前後の側壁内にも設けられて
互いに連通し、そのハウジング内には交互にフィン41
を突設しである。
In the lower half of the stepped and smaller diameter side wall 12.13,
A heat exchanger 4 is provided within the wall surface in contact with the side surface of each of the bathtubs 2A, 2C. The heat exchanger 4 is provided vertically extending within the wall with a constant thickness, and is also provided within the front and rear side walls (not shown) so as to communicate with each other.
It is installed protrudingly.

上記熱交換器4には装置容器1外の冷却水供給器5より
自動弁51を介して冷却水が供給されており、該自動弁
51は上記各ヒータ3A、3Bへの通電が停止すると電
気信号により開放作動せしめられる。
Cooling water is supplied to the heat exchanger 4 from a cooling water supply device 5 outside the device container 1 via an automatic valve 51. It is activated to open by a signal.

他の構造は従来と同一である。Other structures are the same as before.

かかる洗浄装置において、操業を停止し、ヒータ3A、
3Bへの通電を止めると、熱交換器4に冷却水が供給さ
れて浴槽2A、2Cの急速冷却がなされる。これを第2
図の線Xで示し、線yは熱交換器4を設けない従来例を
示す。
In such a cleaning device, the operation is stopped and the heater 3A,
When the power supply to 3B is stopped, cooling water is supplied to the heat exchanger 4, and the bathtubs 2A and 2C are rapidly cooled. This is the second
It is shown by line X in the figure, and line y shows a conventional example in which no heat exchanger 4 is provided.

図より知られる如く、熱交換器の冷却作用により溶剤温
度は急速に沸点(47,57℃)近くから常温(20℃
)まで低下している。溶剤温度とその蒸気圧は第3図に
示す如く比例関係にあるから、溶剤温度が高い程その消
散量も大きい。しかして、第2図の斜線で示す部分は熱
交換器を設けた装置の溶剤消散量の節約分となり、発明
者等の実験では、溶剤をフロンとした場合、熱交換器を
設けることにより上記消散量は一操業当り約5gから約
2gへと60%程度も減少する。
As can be seen from the figure, the solvent temperature rapidly changes from near the boiling point (47, 57°C) to room temperature (20°C) due to the cooling action of the heat exchanger.
). Since the solvent temperature and its vapor pressure are in a proportional relationship as shown in FIG. 3, the higher the solvent temperature, the greater the amount of dissipation. Therefore, the shaded area in Figure 2 is the savings in the amount of solvent dissipated in the equipment equipped with a heat exchanger, and in the experiments conducted by the inventors, when the solvent is CFC, the above is achieved by installing a heat exchanger. The amount of dissipation is reduced by about 60% from about 5g to about 2g per operation.

なお、熱交換器4の構造は上記のものに限られず、例え
ば第4図に示す如く、蛇管42を積層配設したものでも
良い。
Note that the structure of the heat exchanger 4 is not limited to the one described above, and may be one in which flexible pipes 42 are arranged in a stacked manner, for example, as shown in FIG.

冷媒は上記冷却水に限られず、油あるいは空気等を使用
できる。また、自動弁に代えて手動弁としても良い。
The refrigerant is not limited to the above-mentioned cooling water, and oil, air, or the like can be used. Also, a manual valve may be used instead of the automatic valve.

洗浄液の有機溶剤はフロン以外にトリクロルエチレン、
トリクロルエタン等が使用できる。
In addition to CFCs, the organic solvent used in the cleaning solution is trichlorethylene,
Trichloroethane etc. can be used.

さらに、上記熱交換器4に、操業開始前に温水等の熱線
体を通すようになせば、洗浄溶剤のヒータ加熱が効率的
になされて装置の立上がり時間が短縮されるとともに、
これに伴い洗浄溶剤の消散も低く抑えることができる。
Furthermore, if a hot wire such as hot water is passed through the heat exchanger 4 before the start of operation, the cleaning solvent can be efficiently heated by the heater, and the start-up time of the device can be shortened.
Accordingly, the dissipation of the cleaning solvent can also be suppressed to a low level.

[発明の効果] 以上の如く、本発明の洗浄装置は、浴槽に接する装置容
器の壁面内に冷媒を通す熱交換器を設置する簡単かつ安
価な構造により、洗浄溶剤の消散量を大幅に低減して洗
浄コストの低減を実現したものである。
[Effects of the Invention] As described above, the cleaning device of the present invention has a simple and inexpensive structure in which a heat exchanger for passing a refrigerant is installed in the wall of the device container in contact with the bathtub, thereby significantly reducing the amount of cleaning solvent dissipated. This realized a reduction in cleaning costs.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示す洗浄装置の概略断面図
、第2図は溶剤冷却効果を従来と比較する図、第3図は
溶剤温度とその蒸気圧の関係を示す図、第4図は熱交換
器の他の例を示す洗浄装置の概略断面図、第5図は従来
例を示す洗浄装置の概略断面図である。 1・・・装置容器 12.13・・・側壁(断熱壁) 2A、2B、2C・・・浴槽 3A、3B・・・ヒータ 4・・・熱交換器 41・・・フィン 42・・・蛇管 5・・・冷却水供給器(冷媒供給器) 51・・・自動弁 6・・・超音波振動子 8・・・コンベヤ 第1図 第2図 出 刑 温 第4図
Figure 1 is a schematic sectional view of a cleaning device showing an embodiment of the present invention, Figure 2 is a diagram comparing the solvent cooling effect with conventional equipment, Figure 3 is a diagram showing the relationship between solvent temperature and its vapor pressure, and Figure 3 is a diagram showing the relationship between solvent temperature and its vapor pressure. FIG. 4 is a schematic cross-sectional view of a cleaning device showing another example of a heat exchanger, and FIG. 5 is a schematic cross-sectional view of a cleaning device showing a conventional example. 1... Equipment container 12.13... Side wall (insulation wall) 2A, 2B, 2C... Bathtub 3A, 3B... Heater 4... Heat exchanger 41... Fin 42... Corrugated pipe 5...Cooling water supply device (refrigerant supply device) 51...Automatic valve 6...Ultrasonic vibrator 8...Conveyor Figure 1 Figure 2 Discharge temperature Figure 4

Claims (1)

【特許請求の範囲】[Claims]  断熱壁で構成した装置容器内に洗浄溶剤を満たした複
数の浴槽を設けて、上記装置容器内に搬入した被洗浄物
を洗浄するようになし、かつ上記浴槽の少なくとも一つ
に洗浄溶剤を加熱するヒータを付設してなる洗浄装置に
おいて、上記断熱壁の、上記ヒータを設けた浴槽に接す
る壁面内に熱交換器を設けるとともに、上記ヒータ停止
時に上記熱交換器に冷媒を供給する冷媒供給器を設けた
ことを特徴とする洗浄装置。
A plurality of bathtubs filled with a cleaning solvent are provided in an apparatus container configured with a heat insulating wall to wash objects to be cleaned carried into the apparatus container, and the cleaning solvent is heated in at least one of the bathtubs. In the cleaning device equipped with a heater, a heat exchanger is provided in a wall surface of the heat insulating wall that is in contact with the bathtub provided with the heater, and a refrigerant supply device supplies refrigerant to the heat exchanger when the heater is stopped. A cleaning device characterized by being provided with.
JP28057888A 1988-06-27 1988-11-07 Cleaning device Pending JPH0286877A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28057888A JPH0286877A (en) 1988-06-27 1988-11-07 Cleaning device

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP15893388 1988-06-27
JP63-158933 1988-06-27
JP28057888A JPH0286877A (en) 1988-06-27 1988-11-07 Cleaning device

Publications (1)

Publication Number Publication Date
JPH0286877A true JPH0286877A (en) 1990-03-27

Family

ID=26485898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28057888A Pending JPH0286877A (en) 1988-06-27 1988-11-07 Cleaning device

Country Status (1)

Country Link
JP (1) JPH0286877A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0621785U (en) * 1992-08-27 1994-03-22 東芝ホームテクノ株式会社 Ultrasonic cleaner
JP2015141923A (en) * 2014-01-27 2015-08-03 信越半導体株式会社 Cleaning tank for semiconductor wafer and method of producing laminated wafer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0621785U (en) * 1992-08-27 1994-03-22 東芝ホームテクノ株式会社 Ultrasonic cleaner
JP2015141923A (en) * 2014-01-27 2015-08-03 信越半導体株式会社 Cleaning tank for semiconductor wafer and method of producing laminated wafer

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