JPH0282436A - Mass spectrograph - Google Patents

Mass spectrograph

Info

Publication number
JPH0282436A
JPH0282436A JP63232398A JP23239888A JPH0282436A JP H0282436 A JPH0282436 A JP H0282436A JP 63232398 A JP63232398 A JP 63232398A JP 23239888 A JP23239888 A JP 23239888A JP H0282436 A JPH0282436 A JP H0282436A
Authority
JP
Japan
Prior art keywords
sampling
gas
tube
solenoid valve
change
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63232398A
Other languages
Japanese (ja)
Inventor
Akira Okamoto
明 岡本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63232398A priority Critical patent/JPH0282436A/en
Publication of JPH0282436A publication Critical patent/JPH0282436A/en
Pending legal-status Critical Current

Links

Landscapes

  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To make it possible to prevent adsorption or residence of a sample gas in an analytical tube and to accurately analyze a change in concentration of an object sample gas by installing a switching valve whose opening-closing time can be arbitrarily set at the tip or in the middle of a sampling piping through which a sample gas is taken. CONSTITUTION:A solenoid valve 3 whose opening-closing time can be controlled, a sampling tube 4, an analytical tube 6 and an operating exhauster 8 are connected to a sampling port 2 so that they are controlled by a control unit 9. A sampling gas 11 passes the sampling port 2 from a plasma 10 in a plasma generator 1 and then a solenoid valve 3, a gas sampling tube 4 and an orifice 5 to be introduced to an analitical tube 6 so that the sampling gas 11 is ionized and then detected. The opening and closing intervals of the solenoid valve 3 are controlled by a signal from the control unit 9 such that the valve 3 is opened and closed ordinally at a cycle of 0.1-1.0sec. Thereby, it is possible to analyze a change in concentration of the sampling gas in the chamber at a real time.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はプラズマを利用する半導体製造装置に係り、特
にプラズマチャンバ内のガス分析に好適な質量分析装置
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to semiconductor manufacturing equipment that utilizes plasma, and particularly to a mass spectrometer suitable for gas analysis within a plasma chamber.

〔従来の技術〕[Conventional technology]

従来プラズマ中のガス分析装置としては、四重極質蓋分
析計以下QMSと略すが多く重いられており、チャンバ
との接続方法は文献中のFig 2に示すようにチャン
バとQMSとの間にバリアプルリークバルブ又はゲート
バルブとオリフィス等を用いてガスをサンプリングして
いた。しかし、これらの接続方法ではチャンバ内の試料
ガスの圧力が10’Pa以上の場合ガス濃度が高くなる
ため、サンプリング配管内壁に吸着したり、QMS分析
管内に滞留する時間が長くなったりするため、チャンバ
内のガス濃度の変化を正確に分析することが困難であっ
た。
Conventional plasma gas analyzers, often referred to as quadrupole lid analyzers (abbreviated as QMS), are heavy, and the connection method with the chamber is as shown in Fig. 2 in the literature. Gas was sampled using a barrier pull leak valve or gate valve and orifice. However, with these connection methods, if the pressure of the sample gas in the chamber is 10'Pa or more, the gas concentration will increase, which may cause it to adsorb to the inner wall of the sampling pipe or to remain in the QMS analysis pipe for a long time. It has been difficult to accurately analyze changes in gas concentration within the chamber.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術において、サンプリング配管へのガス吸着
については、極力配管の長さを短かくするしかないが、
質量分析計の分析管内に滞留する試料ガスの問題に対し
ては配慮がされておらず、チャンバ内の試料ガスの濃度
変化をリアルタイムで分析することができない問題があ
った。
In the above conventional technology, the only way to prevent gas adsorption to the sampling pipe is to shorten the length of the pipe as much as possible.
No consideration was given to the problem of the sample gas remaining in the analysis tube of the mass spectrometer, and there was a problem in that it was not possible to analyze the concentration change of the sample gas in the chamber in real time.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的は、試料ガスをサンプリングするサンプリング
配管の先端又は途中に開閉時間を任意に設定できる開閉
バルブを設けることにより、達成される。
The above object is achieved by providing an opening/closing valve whose opening/closing time can be arbitrarily set at the tip or midway of the sampling pipe for sampling the sample gas.

〔作用〕[Effect]

サンプリング配管の先端又は途中に設置した開閉パルプ
の開閉周期を任意の間隔に設定することにより、質量分
析装置の分析管内に導入される試料ガスの量を分析管内
壁等に吸着汚染しない程度に調整することができる。
By setting the opening/closing cycle of the opening/closing pulp installed at the tip or midway of the sampling pipe to an arbitrary interval, the amount of sample gas introduced into the analysis tube of the mass spectrometer can be adjusted to a level that does not cause contamination by adsorption on the inner wall of the analysis tube, etc. can do.

〔実施例〕〔Example〕

以下、本発明の一実施例を第1 、第2図により説明す
る。まず始めに第1図により本実施例の構成及び動作に
ついて説明する。プラズマ発生装置1の側面に設けられ
たガスサンプリング口2に四重極質量分析装置7が接続
されており、該サンプリング口2には開閉時間が制御可
能な電磁弁3とサンプリング管4と分析管6と作動排気
装置8が接続されている。以上の装置は制御盤9により
制御されている。該サンプリング管3にはオリフィス5
が内蔵されている。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2. First, the configuration and operation of this embodiment will be explained with reference to FIG. A quadrupole mass spectrometer 7 is connected to a gas sampling port 2 provided on the side of the plasma generator 1, and a solenoid valve 3 whose opening/closing time can be controlled, a sampling tube 4, and an analysis tube are connected to the sampling port 2. 6 and an actuated exhaust device 8 are connected. The above devices are controlled by a control panel 9. The sampling tube 3 has an orifice 5
is built-in.

次に測定方法について説明する。試料ガス11はプラズ
マ発生装置1内のプラズマ10からサンプリング口2を
通って、電磁弁3、ガスサンプリング管4.オリフィス
5を通過し分析管6内に導入されイオン化された後検出
される。電磁弁6の開閉間隔は制御盤9からの信号によ
り制御されており、通常0.1〜t 0秒の周期で開閉
されている。
Next, the measurement method will be explained. Sample gas 11 is passed from plasma 10 in plasma generator 1 through sampling port 2 to electromagnetic valve 3, gas sampling pipe 4. It passes through the orifice 5, is introduced into the analysis tube 6, is ionized, and then detected. The opening and closing intervals of the solenoid valve 6 are controlled by signals from the control panel 9, and are normally opened and closed at a cycle of 0.1 to t0 seconds.

第2因に測定結果を示す。実線の質量ピーク強度12は
下段の電磁弁3の開閉を周期的に行った場合の経時的な
ピーク強度変化を表わし友ものであり、点線の質量ピー
ク強度13ば、電磁弁5を開の状態での経時変化を表わ
したものであり、プラズマ発生装置1内のガス圧力を経
時的に低下させた場合の測定結果である。点線で示した
電磁弁6を開にした状態での質量ピーク強度の変化をみ
るとプラズマ発生装置1内のガス圧力の変化に比ベピー
ク強度の変化がゆるやかであるのに対し、実線で示した
電磁弁5の開閉を周期的に行った場合のピーク強度の変
化はガス圧力の変化と同様の経時変化を示している。
The measurement results are shown in the second factor. The solid line mass peak intensity 12 represents the change in peak intensity over time when the lower solenoid valve 3 is opened and closed periodically, and the dotted line mass peak intensity 13 indicates the state in which the solenoid valve 5 is open. This shows the change over time in the plasma generator 1, and is a measurement result when the gas pressure inside the plasma generator 1 is decreased over time. Looking at the change in the mass peak intensity when the solenoid valve 6 is open, shown by the dotted line, the change in the peak intensity relative to the change in gas pressure inside the plasma generator 1 is gradual, whereas the change shown by the solid line The change in peak intensity when the electromagnetic valve 5 is opened and closed periodically shows a change over time similar to the change in gas pressure.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、試料ガスによる分析管内の吸着や滞留
等を紡ぐことができるので、対象試料ガスの濃度変化を
正確に分析できる。
According to the present invention, since it is possible to determine the adsorption and retention of the sample gas in the analysis tube, it is possible to accurately analyze the concentration change of the target sample gas.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の構成図、 第2図は測定結果を示す線図である。 1・・・・・・プラズマ発生装置、 2・・・・・・サンプリング口、 6・・・・・・′電磁弁、 4・・・・・・サンプリング管、 5・・・・・・オリフィス、 6・・・・・・分析管、 7・・・・・・四重極質量分析装置、 8・・・・・・作動排気装置、 9・・・・・・制御盤。 10・・・・・・プラズマ、 11・・・・・・試料ガス。 第 7L¥] FIG. 1 is a configuration diagram of an embodiment of the present invention, FIG. 2 is a diagram showing the measurement results. 1... Plasma generator, 2... Sampling port, 6...' solenoid valve, 4... Sampling tube, 5... Orifice, 6...Analysis tube, 7... Quadrupole mass spectrometer, 8...operating exhaust system, 9...Control panel. 10...Plasma, 11...Sample gas. No. 7L¥]

Claims (1)

【特許請求の範囲】[Claims] 1、プラズマを利用した半導体製造装置のチャンバ内の
ガス分析に用いられる質量分析装置において、該チャン
バに接続したガスサンプリング機構に開閉間隔を任意の
時間に設定できる開閉バルブを設けたことを特徴とする
質量分析装置。
1. A mass spectrometer used for gas analysis in a chamber of a semiconductor manufacturing device using plasma, characterized in that a gas sampling mechanism connected to the chamber is provided with an opening/closing valve whose opening/closing interval can be set at any time. mass spectrometer.
JP63232398A 1988-09-19 1988-09-19 Mass spectrograph Pending JPH0282436A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63232398A JPH0282436A (en) 1988-09-19 1988-09-19 Mass spectrograph

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63232398A JPH0282436A (en) 1988-09-19 1988-09-19 Mass spectrograph

Publications (1)

Publication Number Publication Date
JPH0282436A true JPH0282436A (en) 1990-03-23

Family

ID=16938619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63232398A Pending JPH0282436A (en) 1988-09-19 1988-09-19 Mass spectrograph

Country Status (1)

Country Link
JP (1) JPH0282436A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6615472B2 (en) 1999-02-05 2003-09-09 Sidel, Inc. Quick change blow mold shell assembly
USRE39769E1 (en) 1995-04-19 2007-08-14 Sidel Blow molding device for producing thermoplastic containers

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE39769E1 (en) 1995-04-19 2007-08-14 Sidel Blow molding device for producing thermoplastic containers
US6615472B2 (en) 1999-02-05 2003-09-09 Sidel, Inc. Quick change blow mold shell assembly
US6648623B2 (en) 1999-02-05 2003-11-18 Sidel, Inc. Quick change blow mold shell assembly

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