JPH0273958A - Device for forming superfine-particle film - Google Patents

Abstract

PURPOSE:To excellently collect superfine particles and to stably supply the particles by sending the superfine particles formed in a superfine-particle forming chamber to a film forming chamber through a transparent pipe having an expanding inlet part at its end in the particle forming chamber, and depositing the particles on an object. CONSTITUTION:The raw material in a crucible 5 is vaporized in an inert carrier gas atmosphere in the superfine particle forming chamber 1 to form superfine particles. The chamber 1 is connected to the film forming chamber 2 by the transparent pipe 10. The expanding inlet part 20 is provided at the end of the transparent pipe 10 in the forming chamber 1. The superfine particles are sent to the film forming chamber 2 from the inlet part 20, and blown against a substrate 7 as the object from a nozzle 11 to deposit a superfine-particle film 12. By this method, superfine particles can be excellently collected and stably supplied.

Description

Detailed Description of the Invention [Industrial Application Field] The present invention relates to an ultrafine particle film forming apparatus that forms a film of ultrafine particles on the surface of an object, and in particular, to The present invention relates to an ultrafine particle film forming apparatus that transports ultrafine particles using.

[Prior Art] As an apparatus for forming an ultrafine particle film on the surface of an adsorbed object such as a glass plate or a metal plate, for example, Japanese Patent Laid-Open No. 60-1
Examples include those disclosed in Japanese Patent No. 06964.

FIG. 3 shows an ultrafine particle film forming apparatus according to this type of conventional technology. The ultrafine particle film forming apparatus includes an ultrafine particle generation chamber 31 and a film formation chamber 32.

A gas source 33 that provides a carrier gas such as an inert gas and an atmosphere gas is connected to the ultrafine particle generation chamber 31 via a valve 36, and a gas source 33 that accommodates the evaporation raw material is connected to a heating power source 34. 35 are arranged.

Further, in the film forming chamber 32, a substrate 37 on which an ultrafine particle film 42 is formed is accommodated on a moving stage 38.

The moving stage 38 is driven by a drive system 39 such as a motor.

A high vacuum (10'
A vacuum evacuation device 45, 46 (about Torr or higher) is connected via a vacuum valve 47, 48.

The ultrafine particle generation chamber 31 and the film formation chamber 32 are communicated with each other via a gas transport pipe structure 40. The gas conveying pipe structure 40 includes pipes 4 connected by a valve 43 like a three-way cock.
A spray nozzle 41 for spraying ultrafine particles toward the substrate is connected to the end of the pipe 45 of the gas transport pipe structure 40 in the six-film forming chamber 32 having the six-layer film forming chamber 32 and the pipe 45 .

In the ultrafine particle liquid forming apparatus described above, the ultrafine particle generation chamber 3
1 and the film forming chamber 32 are evacuated to a high vacuum, and then an inert gas (helium He, argon meter, etc.) is introduced into the ultrafine particle generating chamber 31 as an atmospheric gas at tens to hundreds of Torr. This atmospheric gas also flows into the film forming chamber 32 by opening the valve 43. The degree of vacuum (pressure) in the film forming chamber 32 is maintained at 0.1 to several 0.0 by an evacuation system 46.

After introducing the atmospheric gas, the raw material contained in the crucible 35 is heated by resistance heating or the like and evaporated into the atmospheric gas.

The raw material atoms evaporated from the crucible collide with atmospheric gas molecules and gradually grow, forming ultrafine particles.6 When the valve 43 is open, relatively high pressure (low vacuum) of tens to hundreds of 7° ) Ultrafine particle generation chamber 31 maintained at
Atmospheric gas is fed to the film forming chamber 32 maintained at a relatively low pressure (high vacuum) of 0.1 to several Torr through the gas conveying pipe structure 40 due to the pressure difference.

The grown ultrafine particles flow into the film forming chamber 32 together with the atmospheric gas and are sprayed from the spray nozzle 41 toward the substrate 37 . In this way, an ultrafine particle film 42 is formed on the surface of the substrate 37.

[Problems to be Solved by the Invention] According to the prior art as described above, there are the following problems to be solved.

The pipe 44 that introduces the ultrafine particles is thin, and the upward flow of the ultrafine particles spreads beyond the diameter of the pipe, making it impossible to efficiently collect and transport the generated ultrafine particles.

When inert gas is introduced, the upward flow of ultrafine particles becomes uneven, and the amount of ultrafine particles flowing into the pipe 44 fluctuates, making it impossible to collect a certain amount of ultrafine particles and transport them to the film forming chamber 32. I'm away.

The purpose of the present invention is to efficiently collect the generated ultrafine particles,
Another object of the present invention is to provide an apparatus for forming an ultrafine particle film that can stably supply ultrafine particles.

[Means for solving the problem] An ultrafine particle generation chamber that is connected to a vacuum evacuation system and generates ultrafine particles by evaporating raw materials in an atmospheric gas; In an ultrafine particle film forming apparatus having a film forming chamber for spraying and depositing ultrafine particles, and a transport pipe structure for communicating the ultrafine particle generation chamber and the film forming chamber for transporting the ultrafine particles, a Equipped with a widening introduction section.

[Operation] When the raw material is evaporated in an atmosphere, the evaporated raw material atoms grow while colliding with the molecules of the atmospheric gas, and rise while expanding. In order to maintain a constant pressure difference between the ultrafine particle generation chamber and the film formation chamber, it is preferable to suppress the inner diameter of the transport pipe structure connecting the two chambers to a certain value or less. As a result, the spread of the upward flow of ultrafine particles becomes larger than the inner diameter of the pipe of the transport tube structure, making it impossible to collect them efficiently.

By providing a tapering introduction section at the end of the ultrafine particle generation chamber of the transport tube structure, the inner diameter of the introduction section can be selected independently of the inner diameter of the transport tube body. By providing an introduction portion having a diameter corresponding to the spread of the upward flow of ultrafine particles, the generated ultrafine particles can be efficiently collected and transported to the film forming chamber.

Further, when an inert gas is introduced to generate ultra-m particles, the upward flow of the ultra-fine particles is disturbed by the flow of the inert gas. In this case, the turbulence of the upward flow of ultrafine particles caused unevenness in the amount of ultrafine particles collected in the transport tube structure and transported to the film forming chamber, making it impossible to form a uniform film.

However, by providing an introduction portion with a diameter that corresponds to the extent of the turbulence in the upward flow of ultrafine particles, a constant amount of ultrafine particles can be transported at all times, and a uniform film can be formed.

[Example] FIG. 1 shows an ultrafine particle film forming apparatus according to an example of the present invention. The ultrafine particle film forming apparatus includes an ultrafine particle generation chamber 1 and a film formation chamber 2.

The ultrafine particle generation chamber 1 is connected to a gas source 3 for supplying a carrier gas and an atmosphere gas such as an inert gas via a valve 6, is connected to a heating power source 4, and is provided with a crucible 5 for storing evaporation raw materials. It is set up.

Furthermore, a moving stage 8 is disposed within the film forming chamber 2 and is driven by a drive source 9 such as an electric motor. On the upper surface of this moving stage 8, a substrate 7 made of a glass plate or a metal plate is mounted. ! placed.

The ultrafine particle film forming apparatus 1 and film forming chamber 2 are equipped with a high vacuum (10'
A vacuum evacuation device 22.24 (of the order of Torr or higher) is connected via a vacuum valve 26.28.

The ultrafine particle generation chamber 1 and the film formation chamber 2 have a gas conveying pipe structure 1.
0. The waste conveyance pipe structure 10 has pipes 14 and 1 connected by a valve 13 like a three-way cock.
5. An introduction section 20 is provided at the end of the pipe 14 in the ultrafine particle generation chamber 1, and a Suzuley nozzle 11 for spraying ultrafine particles toward the substrate is provided at the end of the via 15 in the film forming chamber 2.

FIG. 2 shows an enlarged view of the structure of the end of the transport tube structure 10 inside the ultrafine particle generation chamber 1. A morning glory-shaped introduction part 20 is connected to an end of a pipe 14 forming an oval conveying pipe via a connector fitting 16. The morning glory-shaped large diameter part accommodates the outer diameter of the ultrafine particle cloud rising while expanding from the crucible 5, which is the evaporation source.
In addition, even if the atmospheric gas fluctuates due to the flow of gas from the atmospheric gas source 3, the size is set to such an extent that most of it can be accommodated. In the morning glory-shaped introduction ti520, the inner diameter gradually widens, and it is preferable that the large diameter part has a diameter three times or more that of the small diameter part. For example, the large diameter portion of the morning glory shape 20 connected to the 1/4 inch diameter pipe 14 has an inner diameter of 8c11. The material is preferably one to which ultrafine particles do not easily adhere, but is not particularly limited. For example, it can be made of brass.

For example, diameter 450-5001I, height 500-600u
The ultrafine particle generation chamber 1 is formed into an oval shape with a bell jar of approximately 250 m in diameter.
The film forming chamber 2 was formed using a bell jar with a height of approximately 300 tpri, and the two were connected using pipes 14 and 15 with a diameter of 1/4 inch.

The formation of ultrafine particles will be explained below.

In the ultrafine particle film forming apparatus described above, the ultrafine particle generation chamber 1
and the film forming chamber 2 are evacuated to a high vacuum, and then an inert gas (helium, He, argon, r, etc.) is introduced into the ultrafine particle generating chamber 1 as an atmospheric gas at tens to hundreds of Torr. This atmospheric gas also flows into the film forming chamber 2 by opening the valve 13. The degree of vacuum (pressure) in the film forming chamber 2 is maintained at 0.1 to several Torr by an evacuation system 24.

After introducing the atmospheric gas, the crucible 5 is heated by resistance heating or the like, and the raw material contained in the crucible 5 is evaporated into the atmospheric gas. At this time, the atmospheric gas around the crucible 5 is also warmed, and together with the evaporated steam, an upward air current rising from the crucible 5 is created. The raw material atoms evaporated from Ruppo 5 gradually grow while colliding with atmospheric gas molecules in the updraft, forming ultrafine particles.

A morning glory-shaped introduction section 20 is placed upward to accommodate this rising airflow.
is located. The grown ultrafine particles are sent into the morning glory-shaped introduction section 20 together with the atmospheric gas. Since a pressure difference is created between the ultrafine particle generation chamber 1 and the film formation chamber 2, the pressure (degree of vacuum) of the atmospheric gas is several tens to hundreds of To
The ultrafine particle generation chamber 1 of RR is fed through the gas transport pipe structure 10 into the film formation chamber 2 at a pressure (degree of vacuum) of 0.1 to several 0.0 mm.

For example, the distance between the crucible 5 and the introduction part 20 is set to 20 to 3
00cn, and ultrafine particles with a diameter of approximately several hundred to several thousand particles were produced. With a particle size of this size, the ultrafine particles rose like cigarette smoke and settled in the morning glory-shaped introduction section 20.

A spray nozzle 11 with a narrowed internal cross section is provided at the other end of the transport tube structure 10, and the ultrafine particles are sprayed toward the substrate 7 from the spray nozzle 11. In this way, the ultrafine particle film 12 is formed on the surface of the substrate 7.

Although the embodiments of the ultrafine particle film forming apparatus according to the present invention have been described above, the present invention is not limited to these embodiments, and various modifications and changes can be made without departing from the scope of the present invention. .

[Effects of the Invention] In the ultrafine particle film forming apparatus of the present invention, since the introduction part with a widening tip is provided at the end of the conveying tube structure that collects the ultrafine particles, even if the upward air current containing the ultrafine particles expands, By introducing atmospheric gas, ultrafine particles can be collected efficiently and stably supplied even with fluctuations.

[Brief explanation of the drawing]

FIG. 1 is a schematic cross-sectional view showing an ultrafine particle film forming apparatus according to an embodiment of the present invention, and FIG. 2 is an enlarged view of the introduction part of the conveying tube structure used in the ultrafine particle film forming apparatus of FIG. The front view and FIG. 3 are schematic cross-sectional views showing an example of an ultrafine particle film forming apparatus according to the prior art. Ultrafine particle generation chamber Film formation chamber Power source Crucible Transport pipe structure Nozzle] 2 Pipe connector metal fittings of transport pipe structure Introduction part of transport pipe structure

Claims (2)

[Claims] (1) An ultrafine particle generation chamber that is connected to the vacuum evacuation system and generates ultrafine particles by evaporating raw materials in an atmospheric gas, and an ultrafine particle generation chamber that is connected to the vacuum evacuation system and sprays and adheres the ultrafine particles onto the target object. A transport pipe structure for communicating the film formation chamber, the ultrafine particle generation chamber, and the film formation chamber, and for transporting the ultrafine particles generated in the ultrafine particle generation chamber to the film formation chamber, wherein the ultrafine particle generation chamber and the film formation chamber An apparatus for forming an ultrafine particle film, comprising: a transport pipe section that communicates with the ultrafine particle production chamber; and a transport pipe structure having a divergent introduction section provided at an end of the transport pipe section within the ultrafine particle generation chamber. (2) The ultrafine particle film forming apparatus according to claim 1, wherein the introduction section is connected to a conveyance pipe by a connector member.