JPH02722U - - Google Patents
Info
- Publication number
- JPH02722U JPH02722U JP7742588U JP7742588U JPH02722U JP H02722 U JPH02722 U JP H02722U JP 7742588 U JP7742588 U JP 7742588U JP 7742588 U JP7742588 U JP 7742588U JP H02722 U JPH02722 U JP H02722U
- Authority
- JP
- Japan
- Prior art keywords
- ammonia water
- cleaning liquid
- semiconductor wafer
- cleaning apparatus
- wafer cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 5
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7742588U JPH02722U (ko) | 1988-06-10 | 1988-06-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7742588U JPH02722U (ko) | 1988-06-10 | 1988-06-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02722U true JPH02722U (ko) | 1990-01-05 |
Family
ID=31302410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7742588U Pending JPH02722U (ko) | 1988-06-10 | 1988-06-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02722U (ko) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5946032A (ja) * | 1982-09-09 | 1984-03-15 | Hitachi Ltd | 洗浄装置 |
| JPS61281532A (ja) * | 1985-06-07 | 1986-12-11 | Hitachi Ltd | 半導体洗浄液の濃度調整方法及びその装置 |
-
1988
- 1988-06-10 JP JP7742588U patent/JPH02722U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5946032A (ja) * | 1982-09-09 | 1984-03-15 | Hitachi Ltd | 洗浄装置 |
| JPS61281532A (ja) * | 1985-06-07 | 1986-12-11 | Hitachi Ltd | 半導体洗浄液の濃度調整方法及びその装置 |