JPH02722U - - Google Patents

Info

Publication number

JPH02722U

JPH02722U JP7742588U JP7742588U JPH02722U JP H02722 U JPH02722 U JP H02722U JP 7742588 U JP7742588 U JP 7742588U JP 7742588 U JP7742588 U JP 7742588U JP H02722 U JPH02722 U JP H02722U

Authority

JP

Japan

Prior art keywords

ammonia water

cleaning liquid

semiconductor wafer

cleaning apparatus

wafer cleaning

Prior art date

1988-06-10

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 238000004140 cleaning Methods 0.000 claims description 10
• 239000007788 liquid Substances 0.000 claims description 6
• VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 5
• 235000011114 ammonium hydroxide Nutrition 0.000 claims description 5
• MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 4
• 239000004065 semiconductor Substances 0.000 claims description 3
• 239000000203 mixture Substances 0.000 claims 1
• 238000010586 diagram Methods 0.000 description 1