JPH0270428U - - Google Patents
Info
- Publication number
- JPH0270428U JPH0270428U JP15003888U JP15003888U JPH0270428U JP H0270428 U JPH0270428 U JP H0270428U JP 15003888 U JP15003888 U JP 15003888U JP 15003888 U JP15003888 U JP 15003888U JP H0270428 U JPH0270428 U JP H0270428U
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- wafers
- rotating
- gear
- rotation stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 235000012431 wafers Nutrition 0.000 claims 2
- 238000001312 dry etching Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15003888U JPH0270428U (fr) | 1988-11-17 | 1988-11-17 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15003888U JPH0270428U (fr) | 1988-11-17 | 1988-11-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0270428U true JPH0270428U (fr) | 1990-05-29 |
Family
ID=31422820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15003888U Pending JPH0270428U (fr) | 1988-11-17 | 1988-11-17 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0270428U (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022548958A (ja) * | 2019-09-20 | 2022-11-22 | チャンスー フェイヴァード ナノテクノロジー カンパニー リミテッド | コーティング装置及びその運動電極装置、可動スタンド装置並びに応用 |
-
1988
- 1988-11-17 JP JP15003888U patent/JPH0270428U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022548958A (ja) * | 2019-09-20 | 2022-11-22 | チャンスー フェイヴァード ナノテクノロジー カンパニー リミテッド | コーティング装置及びその運動電極装置、可動スタンド装置並びに応用 |
EP4033004A4 (fr) * | 2019-09-20 | 2023-10-04 | Jiangsu Favored Nanotechnology Co., Ltd. | Appareil de revêtement, son dispositif d'électrode de déplacement et son dispositif de support mobile, et son utilisation |