JPH027001B2 - - Google Patents

Info

Publication number
JPH027001B2
JPH027001B2 JP18496582A JP18496582A JPH027001B2 JP H027001 B2 JPH027001 B2 JP H027001B2 JP 18496582 A JP18496582 A JP 18496582A JP 18496582 A JP18496582 A JP 18496582A JP H027001 B2 JPH027001 B2 JP H027001B2
Authority
JP
Japan
Prior art keywords
optical
light beam
half mirror
focus position
pickup
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18496582A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5973707A (ja
Inventor
Hirobumi Nakamura
Akira Yoneda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP18496582A priority Critical patent/JPS5973707A/ja
Publication of JPS5973707A publication Critical patent/JPS5973707A/ja
Publication of JPH027001B2 publication Critical patent/JPH027001B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Measurement Of Optical Distance (AREA)
JP18496582A 1982-10-20 1982-10-20 光学的位置検出方式 Granted JPS5973707A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18496582A JPS5973707A (ja) 1982-10-20 1982-10-20 光学的位置検出方式

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18496582A JPS5973707A (ja) 1982-10-20 1982-10-20 光学的位置検出方式

Publications (2)

Publication Number Publication Date
JPS5973707A JPS5973707A (ja) 1984-04-26
JPH027001B2 true JPH027001B2 (enrdf_load_stackoverflow) 1990-02-15

Family

ID=16162443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18496582A Granted JPS5973707A (ja) 1982-10-20 1982-10-20 光学的位置検出方式

Country Status (1)

Country Link
JP (1) JPS5973707A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997021132A1 (fr) * 1995-12-04 1997-06-12 Komatsu Ltd. Detecteur angulaire a miroir et procede de detection

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033603U (ja) * 1983-08-11 1985-03-07 横河電機株式会社 光ビ−ムスポット観察装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997021132A1 (fr) * 1995-12-04 1997-06-12 Komatsu Ltd. Detecteur angulaire a miroir et procede de detection

Also Published As

Publication number Publication date
JPS5973707A (ja) 1984-04-26

Similar Documents

Publication Publication Date Title
JP3181050B2 (ja) 投影露光方法およびその装置
KR100471524B1 (ko) 노광방법
US5048968A (en) Alignment mark detecting optical system
US4477185A (en) Optical imaging apparatus
US5721605A (en) Alignment device and method with focus detection system
JP3308063B2 (ja) 投影露光方法及び装置
GB2167262A (en) Distance measurement
US4614432A (en) Pattern detector
JP2938187B2 (ja) パターン形成方法及び同方法を実施するための装置
JP2897330B2 (ja) マーク検出装置及び露光装置
US6198527B1 (en) Projection exposure apparatus and exposure method
EP0231977B1 (en) Optical imaging arrangement comprising an opto-electric focussing-error detection system
KR0174486B1 (ko) 노광 장비에서 시시디 카메라를 이용한 정렬 장치
CN106483777A (zh) 一种具有调焦功能的对准系统及对准方法
JPH027001B2 (enrdf_load_stackoverflow)
JPH09312248A (ja) 露光装置
JPS6257008B2 (enrdf_load_stackoverflow)
US7760349B2 (en) Mask-defect inspecting apparatus with movable focusing lens
JP2630302B2 (ja) 投影光学系における基板の位置決定方法及び投影露光方法
JP3252526B2 (ja) 位置検出装置及びそれを用いた半導体素子の製造方法
JPH06104158A (ja) 位置検出装置
JP3352280B2 (ja) 投影露光装置の調整方法及び露光方法
JP3327627B2 (ja) 露光用原板及びそれを用いた投影露光装置
JPH07321030A (ja) アライメント装置
JP3101582B2 (ja) 斜光軸光学系を用いた位置検出装置及び方法