JPH027001B2 - - Google Patents
Info
- Publication number
- JPH027001B2 JPH027001B2 JP18496582A JP18496582A JPH027001B2 JP H027001 B2 JPH027001 B2 JP H027001B2 JP 18496582 A JP18496582 A JP 18496582A JP 18496582 A JP18496582 A JP 18496582A JP H027001 B2 JPH027001 B2 JP H027001B2
- Authority
- JP
- Japan
- Prior art keywords
- optical
- light beam
- half mirror
- focus position
- pickup
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Measurement Of Optical Distance (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18496582A JPS5973707A (ja) | 1982-10-20 | 1982-10-20 | 光学的位置検出方式 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18496582A JPS5973707A (ja) | 1982-10-20 | 1982-10-20 | 光学的位置検出方式 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5973707A JPS5973707A (ja) | 1984-04-26 |
JPH027001B2 true JPH027001B2 (enrdf_load_stackoverflow) | 1990-02-15 |
Family
ID=16162443
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18496582A Granted JPS5973707A (ja) | 1982-10-20 | 1982-10-20 | 光学的位置検出方式 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5973707A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997021132A1 (fr) * | 1995-12-04 | 1997-06-12 | Komatsu Ltd. | Detecteur angulaire a miroir et procede de detection |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6033603U (ja) * | 1983-08-11 | 1985-03-07 | 横河電機株式会社 | 光ビ−ムスポット観察装置 |
-
1982
- 1982-10-20 JP JP18496582A patent/JPS5973707A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997021132A1 (fr) * | 1995-12-04 | 1997-06-12 | Komatsu Ltd. | Detecteur angulaire a miroir et procede de detection |
Also Published As
Publication number | Publication date |
---|---|
JPS5973707A (ja) | 1984-04-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3181050B2 (ja) | 投影露光方法およびその装置 | |
KR100471524B1 (ko) | 노광방법 | |
US5048968A (en) | Alignment mark detecting optical system | |
US4477185A (en) | Optical imaging apparatus | |
US5721605A (en) | Alignment device and method with focus detection system | |
JP3308063B2 (ja) | 投影露光方法及び装置 | |
GB2167262A (en) | Distance measurement | |
US4614432A (en) | Pattern detector | |
JP2938187B2 (ja) | パターン形成方法及び同方法を実施するための装置 | |
JP2897330B2 (ja) | マーク検出装置及び露光装置 | |
US6198527B1 (en) | Projection exposure apparatus and exposure method | |
EP0231977B1 (en) | Optical imaging arrangement comprising an opto-electric focussing-error detection system | |
KR0174486B1 (ko) | 노광 장비에서 시시디 카메라를 이용한 정렬 장치 | |
CN106483777A (zh) | 一种具有调焦功能的对准系统及对准方法 | |
JPH027001B2 (enrdf_load_stackoverflow) | ||
JPH09312248A (ja) | 露光装置 | |
JPS6257008B2 (enrdf_load_stackoverflow) | ||
US7760349B2 (en) | Mask-defect inspecting apparatus with movable focusing lens | |
JP2630302B2 (ja) | 投影光学系における基板の位置決定方法及び投影露光方法 | |
JP3252526B2 (ja) | 位置検出装置及びそれを用いた半導体素子の製造方法 | |
JPH06104158A (ja) | 位置検出装置 | |
JP3352280B2 (ja) | 投影露光装置の調整方法及び露光方法 | |
JP3327627B2 (ja) | 露光用原板及びそれを用いた投影露光装置 | |
JPH07321030A (ja) | アライメント装置 | |
JP3101582B2 (ja) | 斜光軸光学系を用いた位置検出装置及び方法 |