JPH0268835A - Ion source - Google Patents

Abstract

PURPOSE:To make it possible to efficiently generate ion beams in high purity and with large currents by applying an electric field to the down stream area of substance which was excited in Rydberg condition after exciting specific substance in the Rydberg condition being highly excited condition by applying laser beams. CONSTITUTION:This has a laser generator 8 to generate laser beams which excite only specific kind of atoms or molecules from base condition to Rydberg condition. For example, in case of generation ion beams of Na (sodium), Na is put in a grain flow generator 1 so as to generate atomic beams 3 of Na from a nozzle 2. By a mirror 17 inside the laser beam generator 8 and a dielectric reflecting mirror 18, a pulse laser beam with a wave length of 589nm (lambda1) and a pulse laser beam with a wave length of 413.1nm (lambda2) are made the laser beams on the same optical axis, and these are applied to an atomic beam 3 near the nozzle 2 of the grain flow generator by a light path adjusting instrument 9. Hereby, if the output densities of the two wave lengths pulse lasers from the laser beam generator 8 are not less than 10<4>W/cm<2>, Na atoms are saturated from the base condition to the highly excited condition of 20d, and they become the atomic beam in the Rydberg condition efficiently.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an ion source that uses light to ionize substances, and particularly to an ion source that uses laser light as the light.

[Conventional technology]

FIG. 11 is a diagram showing an ion source arrangement using a conventional laser beam, as disclosed in, for example, Japanese Patent Application Laid-Open No. 50-22999. 2 is an ejection hole of the particle flow generator 1; 3 is an atomic beam extracted from the ejection hole 2 in the form of a beam; 4 is three dye laser devices;
5 is a lens for focusing the laser beam from the dye laser device 4 on the atomic beam 3 and point P; 6 is an atomic beam containing ions in which a portion of the atomic beam 3 is ionized by laser beam irradiation; Reference numeral 7 denotes an electrode for selecting only ions from the ion-containing atomic beam.

A conventional ion source using laser light is configured as described above. For example, an operation will be described in which Na (sodium) is put into the particle flow generator 1, an atomic beam 3 of Na is generated, and ionization is performed using a laser beam.

When the Na atomic beam 3 is passing through point P at a certain speed from the ejection hole 2 of the particle flow generator 1, the laser beams from the dye laser devices 4a, 4b, 4c are transmitted through lenses 5a, 5b,
5c to simultaneously focus the light on point P.

The energy diagram of the Na atom is shown in Figure 12, so
The wavelength (λa) of the first dye laser device 4a is set to 589 n
m, and the wavelength (λb) of the second dye laser device 4b is set to 5.
When the wavelength is set to 68.8 nm, the Na atom at the P point is optically excited by the laser beam and changes from the ground state of 3S''Sl/2 to 3S''Sl/2.
It is excited to the 4d state through the p''Ps/l state.Na
The 4d state of atoms is about 7000c from the ionization limit of Na atoms.
m-', the third dye laser device 4C
When the wavelength (λC) of is made shorter than 1°4 μm, Na atoms are directly ionized by the light, and the atomic beam that passes through point P contains some ions. An electric field is applied to the atomic beam 6 containing the ions by an electrode 7 to deflect only the ions, and the ions are incident on a predetermined region as an ion beam.

[Problem to be solved by the invention]

In the conventional ion source using laser light as mentioned above,
The laser light power density required to efficiently ionize Na atoms irradiated with laser light at point P is 3
s" S+7z 31)"Einstein's A coefficient for transitioning P3/ (transition wavelength 589 nm) is approximately 6.3
X10' (1/s), the first dye laser beam needs to have a power density of about 10 W/cm" or more, and N
A's 3p! p-4a transition (transition wavelength 568.8nn+
), Einstein's A coefficient is approximately 1°3 XIO'(
1/s), so the second dye laser light is about 40
A power density of W/cm" or more is required, and the absorption cross section of light when directly photoionizing the 4d state of Na is io-
” Since it is less than cffl, the third dye laser beam
A power density of 0'W/cm'' or more is required.

In this way, in the conventional ion source using laser light, the absorption cross section of direct photoionization light is less than IQ-IlIC1, so the laser light output density is 10'W/cm.
However, the output of commonly available high-output large dye lasers is about 106 W for pulsed lasers and about IW for continuous wave lasers, so pulsed laser 10-'
It is necessary to increase the laser high output density by focusing the light on a micro region of less than 10 cm" or less than 10 am" in the case of a continuous wave laser.

Therefore, there was a problem that the ionizable region was small and a large amount of ions could not be obtained.

Furthermore, even if an attempt is made to increase the amount of ions by increasing the atomic density of the atomic beam 3, if the ion density exceeds 1010/c-3, the spatial electric field due to the ions themselves will be 3 kV/c.
■As a result, the ions spread in the region of the atomic beam 6 that includes ions after point P, and the amount of ions that can effectively reach the electrode 7 and enter a predetermined region does not increase, and the ions of the atomic beam 3 There was a problem in that even if the atomic density was increased, the amount of ions obtained could not be increased.

This invention was made to solve the above-mentioned problems. It uses a low-output dye laser device to ionize an atomic beam over a wide area with high efficiency, and is capable of ionizing an atomic beam with a large diameter and high efficiency.
The objective is to obtain an ion source using laser light that can generate a large current ion beam.

[Means to solve the problem]

The ion source according to the present invention includes a particle flow generator and a particle flow generator that detects specific atomic species or molecules by irradiating a region near a particle ejection hole with a laser beam. A laser beam generator that generates a laser beam that excites only the molecular species from the ground state to Rydberg States, and ionizes the atoms or molecules in the highly excited state downstream of the region irradiated with the laser beam. It is equipped with an electrode that applies the minimum electric field to

[Effect]

In this invention, the laser wavelength is matched to the wavelength that resonantly excites only the specific substance to be ionized from the ground state to the Red Berg state, and the laser beam is irradiated near the particle ejection hole of the particle flow. A specific atom or molecule passing through a region of high particle density in the vicinity is efficiently excited to the Ridberg state. Also, the lifetime of the Ridberg state is several 1
0 μs or more, and atoms in the Rydberg state are neutral, so after the laser beam is incident, atoms or molecules in the Rydberg state in the particle flow remain in the Rydberg state for several tens of μs or more, regardless of the presence or absence of the laser beam, and the atoms or molecules in the Rydberg state remain in the Rydberg state for several tens of μs or more During the above period, the atoms or molecules in the Ridberg state maintain their state and flow downstream as a particle stream, and along the flow, they diffuse to the surroundings while decreasing the density, and in the vicinity of the electrode, the Lydberg state is spread over a wide area. atoms or molecules will be distributed.

In addition, atoms or molecules in the Ridberg state can be easily and efficiently ionized by applying a weak electric field of several kV/cm or less. ionizes only the atoms or molecules in the Lydberg state that are distributed in .

In addition, the ion density at this time is sufficiently lower than the density of the laser beam irradiation area, so the ions can be effectively extracted from between the electrodes without being affected by the spatial electric field. can efficiently generate ion beams.

〔Example〕

An embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 shows an ion source according to a first embodiment of the present invention, in which 1 is a particle stream generator for generating the substance to be ionized in the form of an atomic or molecular stream; 2 is the particle stream generator; 1 is an ejection hole; 3 is an atomic beam extracted from the ejection hole 2 in the form of a beam; 8 is a laser beam generator that irradiates a laser beam having one or more wavelengths; 9 is from the laser beam generator 8. This is an optical path adjuster for irradiating the atomic beam 3 near the ejection hole 2 of the particle flow generator 1 with a laser beam, and a convex lens is used in this embodiment.

Reference numeral 10a denotes a region on the atomic beam 3 that is irradiated with a laser beam, and the atoms in the atomic beam are excited to a Ridberg state. 10b, 10c, 10d are Ridberg-shaped B
10A shows how the excited atomic beam flows downstream over time, and shows the distribution of atoms in the deberg state after a certain period of time. lla, llb
is a set of electrodes arranged in the downstream region 10d of the atomic beam in the Ridberg state, and in this embodiment, parallel plate type electrodes are arranged.

Reference numeral 12 denotes an extraction hole located on the electrode 111b opposite to the electrode 111a, and 13 denotes a power source connected to the electrode 11a. In this embodiment, a pulse power source that generates a positive pulse voltage is used. It is used. 14 is a pulse applied from the power source 13 to the electrodes 11a and llb after irradiating the atomic beam 3 with a laser beam from the laser beam generator 8 to excite the atomic beam 3 into an atomic beam 10 in the Ridberg state. Electric field created between electrodes by voltage, 15
is an ion beam which is ionized and accelerated by the electric field 14, and is extracted from the extraction hole 12 on the electrode 11b.

FIG. 2 is a diagram showing an example of the configuration of the laser beam generator 8 used in the above embodiment, and shows a case where laser beams having two different wavelengths are generated on the same optical axis.
16a is a dye laser that oscillates with wavelength λ as its center wavelength; 16b is a dye laser that oscillates as center wavelength λ2; 17 is an optical system for adjusting the optical path of the laser beam from the dye laser (λ+) 16a. The element is a mirror in this example. 18 is the above dye laser (λ+)
The light with the oscillation wavelength λ of 16a is transmitted, and the dye laser (7g
) 16b with an oscillation wavelength λ2 is reflected by a mirror, and in this embodiment, a dielectric reflective mirror is used.

19 is the wavelength λ3. This is a laser beam having a wavelength of λ2.

In the ion source of the first embodiment of the present invention configured as described above, when generating an ion beam of Na (sodium), for example, put Na into the particle flow generator 1,
A Na atomic beam 3 is generated from the ejection hole 2. The mirror 17 in the laser beam generator 8 and the dielectric reflection mirror produce wavelengths of 589 nm (λ, ) and 413.1 nm (λ).
The pulsed laser beam of t) is made into a laser beam on the same optical axis, and is irradiated to the atomic beam 3 near the ejection hole 2 of the particle flow generator by the optical path adjuster 9. FIG. 3 is an energy diagram of Na atoms, showing one example of a highly excited state of Na atoms. The amount of Na in the Na atom stream irradiated by the laser beam is 33"
SI/! is excited from the ground state to a state of 3p''Ps/z by a laser beam (λI) of 589 r++++, and
3.1 nw laser light (λ2) produces a highly excited state (Rydberg
5tates+Ridberg state). The required laser output is Na 3s” 5lit 3p”P
5/ (transition wavelength 589 nm) is approximately 6.3
``If there is a power density higher than
Excitation to the ptP,/2 state is saturated. 3 of Na atoms
The absorption cross section of excitation light from the p''Ps/z state to the highly excited state of the nd state is as shown in Figure 4, and depends on the value of the principal quantum number (n) of the highly excited state: 1O-14CIll! from 1
It is in the range of O-17Craz, but 31)"P+/z-
At the time of 20d transition (transition wavelength 413.1 nm), the absorption cross section is approximately 1O-IsC11! Therefore, the wavelength is 413.
1 r++a laser beam λ8 is approximately 10'W/c++"
With the above power density, the excitation of Na atoms from the 39''Ps/z state to the 20d state is saturated.

As described above, if the output density of the two-wavelength pulsed laser beam from the laser beam generator 8 is 10'W/cm'' or more, the Na atoms are saturated from the ground state to the highly excited state of 20 d, and an atomic beam of the Ridberg state is efficiently generated. become.

Also, the radiative lifetime of the Ridberg state is as shown in Figure 5,
It changes depending on the value of the principal quantum number (n) of the excited state, but 2
When the time is 0d, it is about 30μs, and when an n atom is excited to the 20d state by a −degree laser beam, the Na atom will remain in the Rydberg state 20d with a lifetime of about 30μs even after the laser beam disappears.
It will be in .

Therefore, the Na atoms in the atomic beam 3 with high particle density near the ejection hole 2 excited to the Ridberg state by the two-wavelength pulsed laser beam remain about 30% even after the laser beam irradiation is finished.
While maintaining the Ridberg state for more than μs, the particles flow downstream as a particle stream, and diffuse into the surrounding area while decreasing the density along the flow.

In other words, the atomic beam, which initially occupies an area about the same as the laser beam irradiation area 10a, increases in volume as shown by 10b, 10c, and 10d as time passes, decreases its density, and flows downstream. To go. The rate of increase in volume is determined by the fact that when the Na atoms in the particle flow generator are in thermal equilibrium and the ejection port 2 is a single thin hole, the velocity distribution of the Na atoms has a Maxwellian distribution, and the atomic beam 3 has a Maxwellian distribution. Since the flow spreads according to the cosine law, initially 10a
The Noridberg state atomic beam occupies a volume V, and at the position where it flows downstream by l, the volume is approximately 13/v.
For example, the laser beam irradiation area is ~1O-IC
11! Therefore, when the atomic beam in the Lydberg state of 10a occupies a volume of ~3 x 10-'cm', the volume of the atomic beam in the Lydberg state when it flows 15 mm downstream is ~3 cm', and the volume is about 100 cm. This is doubled, and the Na atom density becomes approximately 1/100.

The properties described above can also be applied to the Rydberg state of other atoms, and in general, the properties of atoms and molecules in highly excited states (Rydberg 5tates) where the principal quantum number (n) of valence electrons is large are based on RoF Stibinges (RoF). ,
``Rydberg 5tates of atoms and molecules'' by Stebbings et al.
Atoa+s and Molecules+”)
(Cambridge University Press, London)
e University Press, Londo
n), 1983), it can be approximately expressed by the principal quantum number (n) regardless of atoms or molecules, and the lifetime τ of the Ridberg state is τ−n3, and the lifetime becomes longer as n becomes larger.

In addition, since the highly excited state valence electrons are at an energy level near the ionization limit, they are easily ionized by an external electric field, and the minimum electric field Ec for ionization is Ec ~ 3.2 XIO'n-' (V /cm)
...(1), and when n=20, Ec~2kV/CIm.

Next, in this way, the Na atom beam 3 is irradiated with a pulsed laser beam to excite it into an atomic beam in the Ridberg state of Na with a principal quantum number of 20, and then a pulsed voltage is applied from the power source 13 to the electrodes 11a and llb. to create an electric field 14 between the electrodes.
Apply repeatedly at the timing shown in the figure. In FIG. 6, 20 is the oscillation period of the pulsed laser beam, 21 is the electric field application delay time which is the delay time until the electric field is applied between the electrodes after irradiation with the pulsed laser beam, and 22 is the electric field being applied between the electrodes. The electric field application time is the time, and 24 is the electric field strength.

In this example, the oscillation period 20 of the pulsed laser beam is approximately 1
μs, the electric field application delay time 21 is about 30 μs, the electric field application time 22 is about 1 μs, the electric field strength 24 is 5 kV/cm, the laser beam irradiation area is about 10 days c, and the image electrode is The distance between 11a and 11b to the atomic beam 10d in the Lidberg state is 1511-.

Since the average thermal velocity of the atomic beam 3 is about several hundred m/s, the atomic beam excited in the region 10a by the laser beam or in the Deberg state flows into the region 10d between the electrodes when an electric field is applied. become. Therefore, since the strength of the electric field applied between the electrodes is 5 kV/ca+, the Na atoms in a highly excited state between the electrodes are easily ionized, and the generated Na ions are accelerated by the electric field and are formed through the extraction hole of the electrode 11b. 12 to the outside.

As explained earlier, the area where atoms in the Ridberg state of 10d are distributed is about 3ca+', which is about 100 times the volume of the laser irradiation area 10a, and the Na atom density is 1.
/100. Therefore, the amount of Na ions that can be extracted without being affected by the spatial electric field of the generated Na ions is also approximately 100 times greater.

Due to the operation described above, in this embodiment, the laser light output is 1k.
Using a pulsed dye laser beam with a low output of about W, an ion current 100 times or more can be generated compared to the conventional example.

In the above example, by setting the distance between regions 10a and 10d to 15f1 or more, changing the laser wavelength to excite Na to the Nordberg state with a principal quantum number of 20 or more, and setting the electric field application delay time to 30 μs or more, Can generate ion beam with higher current. Also, instead of making the laser beams on the same optical axis and irradiating the vicinity of the nozzle from the side, it is also possible to shift the optical axes of each laser beam and irradiate the laser beams so that they overlap near the nozzle. Even if the ion beam is incident from above or obliquely, a large current ion beam can be generated in the same way.

In addition, although the above example shows the case where an ion beam of Na is generated, the properties of the Lydberg state are expressed by the principal quantum number (n) of the excited state, regardless of atoms or molecules. , molecules can similarly be generated as ion beams. When generating an ion beam of Qa, the oscillation wavelength λ1 of the dye laser 16a is set to 403.3 nm, the transition wavelength from the ground state of Ga to the excited state of 53, and the dye laser 1
The oscillation wavelength λ8 of 6b is 5s-np shorter than 429 ns.
An ion beam can be generated in the same way if the transition wavelength is used.

FIG. 7 shows a hole 12 in order to apply an electric field downstream of the atomic beam in the Ridberg state approximately parallel to the flow of the atomic beam.
A second embodiment of the present invention is shown in which electrodes 11a and llb are arranged with a gap between the electrodes 11a and llb. Occurs on the axis. Also,
In this embodiment, the atomic beam 10 in the Ridberg state is made to flow between the electrodes through the hole 12 of the electrode 11a,
Since the hole 12 of the electrode 11b for extracting the ion beam is also provided on the same axis, all the atoms that have flowed between the electrodes can be extracted as an ion beam.

FIG. 8 is a diagram showing the timing of applying a pulsed electric field when generating an ion beam using continuous wave laser light in the third embodiment of the present invention, and shows the case where the electric field is applied at a constant cycle. .

The laser power required to excite atoms into the Lydberg state using continuous wave laser light is a sufficiently weaker power density than that of pulsed laser light because the Lydberg state has a long lifetime of several tens of microseconds. However, excitation and accumulation to the Ridberg state occur gradually. For example, when an n atom is excited from the 3pzPs/ state to the 20d state, the energy consumption is several 10 W/C11! To some extent, transition saturation occurs.

Therefore, in order to excite atoms to the Rydberg state using continuous wave laser light, unlike the case of pulsed laser light, it is necessary to have a lower laser output of several tens of W/CDI" to excite the atoms in the Rydberg state in the atomic beam 3. It can flow between the electrodes as a beam.

When a pulsed electric field is applied as shown in FIG. 8, atoms in the Ridberg state always flow between the electrodes, so the frequency of generation of the pulsed ion beam matches the repetition frequency of the applied electric field. Therefore, by repeating the application of an electric field at about IMHz, it is possible to generate an ion beam of about several mA/cm.Also, when applying a DC electric field between the electrodes 11a and llb, it is possible to generate an ion beam of about several mA/cm''. teeth,
Since all of the ions can be ionized and extracted to the outside as an ion beam, the current value that can be extracted depends on the number of atoms in the deberg state flowing between the electrodes, and it is easy to generate a high-purity ion beam of about several mA/a1. can be drawn out continuously.

FIG. 9 shows a third embodiment of the present invention, in which a magnetic field 25 is applied between the electrodes 11a and llb parallel to the electric field to suppress the spread of the ion beam. be.

In the above embodiment, a case was described in which an ion beam of atoms or molecules was generated. However, by narrowing the wavelength width of the laser beam that excites the Lydberg state, the isotope uranium 235 (23% tJ ) can also be used as an ion beam generator containing a large amount of a specific isotope.

FIG. 10 shows an example of a configuration in which a thin film of Ga or the like is formed on a substrate using the ion source of the present invention.

A substrate 2b is placed outside the electrode 11b from which the ion beam is extracted, and the ion beam is irradiated onto the substrate.

P is also used for ion implantation as an atomic stream.

Atoms of a material such as As are ionized in the same way, and the ion beam is applied to the substrate 2 by setting the strength of the electric field to several tens of kV/cm or higher.
6, the above ion source can be used not only for thin film formation but also for ion implantation.

Furthermore, if an ion beam is generated by similarly ionizing etching atoms and molecules such as fluorine and chlorine as an atomic stream, the layer to be etched on the substrate 26 can be etched by this ion beam. This ion source can also be used for etching.

In the above embodiment, the substrate 26 is placed outside the electrode, but since ionization occurs evenly between the electrodes 11a and 11b, the substrate 26 can be used as a substitute for the electrode 11b, and the substrate 26 can be used as an electrode. A similar effect can be expected even if it is placed between 11a and llb.

Furthermore, from the above, the following embodiments of the present invention can be considered.

(2) The ion source according to claim 1, wherein the electrode is arranged so that the direction of the electric field intersects the direction of the particle flow.

(3) The ion source according to claim 1, wherein the electrode is arranged so as to be substantially parallel to the particle flow in the direction of the electric field.

(4) Atoms or molecules are excited in multiple stages from the ground state to the Radberg state by using two or more types of laser light with different wavelengths as the laser light from the laser light generator. The ion source according to any one of Items 1 to 3.

(5) At least one of the laser beams from the laser beam generator is a pulsed laser, and after the particles excited to the Ridberg state by the incidence of the pulsed laser beam flow between the electrodes, 5. The ion source according to claim 1, wherein a pulsed electric field is repeatedly applied once or multiple times.

(6) The rest period between one pulsed electric field and the next of the pulsed electric fields repeatedly applied multiple times between the electrodes is made longer than the time required for the particle flow to pass through the electric field application region. An ion source according to claim 5, characterized in that:

(7) The ion source according to any one of claims 5 to 6, characterized in that the incidence of the pulsed laser beam and the repeated application of the pulsed electric field are repeated.

(8) Any one of claims 1 to 4, characterized in that the laser beam from the laser generator is a continuous wave laser beam, and a pulsed electric field is periodically and repeatedly applied between the electrodes. The ion source described in Crab.

(9) A patent characterized in that the pause time between one pulsed electric field and the next pulsed electric field that is repeatedly applied between the electrodes is longer than the time required for the particle flow to pass through the electric field application region. An ion source according to claim 8.

α[Claim 1, wherein the Ridberg state is a highly excited state with a principal quantum number of 20 or more.
The ion source according to any one of Items 9 to 9.

11. The ion source according to claim 1, further comprising a magnetic field generator for applying a magnetic field between the electric fields.

(2) The ion source according to claim 11, wherein the magnetic field is parallel to the electric field.

αj A particle stream containing gallium is irradiated with a laser beam of wavelength 403.3na+ to transform gallium from the ground state of 4p to 53
The ion source according to any one of claims 1 to 12, characterized in that after the first stage of excitation to an excited state, the ion source is excited to a Ridberg state by a laser beam having a wavelength shorter than 429 nm. .

(1) The wavelength width of at least one laser beam is made smaller than the isotope shift of the transition wavelength of the atom to be excited, and the laser wavelength is made to match the wavelength that excites only the isotope of a specific atom to the Rydberg state. An ion source according to any one of claims 1 to 13, characterized in that:

Q. Claims 1 to 14 are characterized in that the ion beam extracted from the ion source is used to form a thin film on the substrate, implant ions into the substrate, or etch the substrate. The ion source according to any of paragraphs.

Q6) The ion source according to claim 15, characterized in that a substrate is disposed between the electrodes.

〔Effect of the invention〕

As described above, according to the present invention, after exciting a specific substance to a highly excited Rydberg state by irradiating a region near the particle ejection hole of a particle stream containing an ionized substance with a laser beam, We applied an electric field to the downstream region of the substance excited to the Ridberg state, so with a simple configuration,
This method has the effect of easily generating an efficient, high-purity, high-current ion beam using a low-power laser beam.

[Brief explanation of the drawing]

FIG. 1 shows an ion source according to a first embodiment of the present invention, FIG. 2 shows an example of the configuration of a laser beam generator used in the above embodiment, and FIG. 3 shows an ion source according to a first embodiment of the present invention. FIG. 4 is an energy diagram showing an example of the Nordberg state of Na atoms; FIG. 4 is a diagram showing the light absorption cross section of the optical transition of Na atoms from the 3PzPs/z state to the nd state;
The figure shows the nd radiation lifetime of Na atoms, FIG. 6 shows the timing of pulsed laser beam irradiation and electric field application in the above embodiment, and FIG. 7 shows the second embodiment of the present invention. A diagram showing an example of applying an electric field almost parallel to the flow of particles, and FIG. 8 shows the timing of laser light irradiation and electric field application when continuous wave laser light is used in the third embodiment of the present invention. 9A and 9B are diagrams showing an example of applying a magnetic field parallel to the electric field, which is a fourth embodiment of the present invention, and FIG.
0 is a diagram showing an example of a configuration when forming a thin film on a substrate using the ion source of the present invention, FIG. 11 is a diagram showing an ion source device using a conventional laser beam, and FIG. It is an energy diagram of an atom. In the figure, 1 is a particle flow generator, 2 is an ejection hole, 3 is an atomic beam, 4 is a dye laser (λa), and 4b is a dye laser (
λb), 4c is a dye laser (λC) 5a, 5b, 5c is a lens, 8 is a laser beam generator, 9 is an optical path adjuster, 10a
, 10b, 10c, and 10d are Rydberg state atomic beams, lla and 11b are electrodes, 12 is an extraction hole, 13 is a power source, 14 is an electric field, 15 is an ion beam, 16a is a dye laser (λl), and 16b is a dye laser ( λt), 17 is a mirror, 18 is a dielectric reflection mirror, 19 is a laser beam, 2
0 is the oscillation period of the pulsed laser beam, 21 is the electric field application delay time, 22 is the electric field application time, 23 is the electric field application pause time, 2
4 is the strength of the electric field, 25 is the magnetic field, and 26 is the substrate. Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

[Claims] (1) A particle stream generator that generates a particle stream consisting of atoms or molecules, and one or more wavelengths applied to all or some of the atoms or molecules on the particle stream near the particle ejection hole of the particle stream generator. a laser beam generator that irradiates a laser beam having a laser beam; a set of electrodes for applying an electric field to part or the entire region of the particle flow downstream from the region irradiated with the laser beam; and generating an electric field between the electrodes. In an ion source equipped with a power source for applying a voltage to the electrode, the wavelength of the laser beam is changed from the ground state to a high wavelength where the principal quantum number of valence electrons is large. Rydberg states are excited states.
), and after the laser beam is incident, a voltage is applied between the electrodes to generate an electric field greater than the minimum electric field that ionizes the atoms or molecules in the Ridberg state, An ion source characterized in that one or more extraction holes for extracting an ion beam are provided in a part of the electrode.