JPH0266A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPH0266A JPH0266A JP24533588A JP24533588A JPH0266A JP H0266 A JPH0266 A JP H0266A JP 24533588 A JP24533588 A JP 24533588A JP 24533588 A JP24533588 A JP 24533588A JP H0266 A JPH0266 A JP H0266A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- aromatic
- resin
- diazo
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 40
- -1 aromatic diazonium compound Chemical class 0.000 claims abstract description 50
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 28
- 150000001491 aromatic compounds Chemical class 0.000 claims abstract description 12
- 238000009833 condensation Methods 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims description 22
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 17
- 239000000470 constituent Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 abstract description 41
- 239000011347 resin Substances 0.000 abstract description 41
- 229920000642 polymer Polymers 0.000 abstract description 33
- 125000003118 aryl group Chemical group 0.000 abstract description 14
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 abstract description 13
- 229920001577 copolymer Polymers 0.000 abstract description 11
- 150000002576 ketones Chemical class 0.000 abstract description 7
- 150000001299 aldehydes Chemical class 0.000 abstract description 6
- 239000003513 alkali Substances 0.000 abstract description 6
- 239000011230 binding agent Substances 0.000 abstract description 6
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 abstract description 6
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 abstract description 5
- 230000005494 condensation Effects 0.000 abstract description 4
- NRWSKRNTEMNRHM-UHFFFAOYSA-N 4-diazocyclohexa-1,5-dien-1-amine;sulfuric acid Chemical compound OS(O)(=O)=O.NC1=CCC(=[N+]=[N-])C=C1 NRWSKRNTEMNRHM-UHFFFAOYSA-N 0.000 abstract description 3
- 229960004889 salicylic acid Drugs 0.000 abstract description 3
- 229920006026 co-polymeric resin Polymers 0.000 abstract 1
- 150000001989 diazonium salts Chemical class 0.000 abstract 1
- 229920002401 polyacrylamide Polymers 0.000 abstract 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 31
- 238000007639 printing Methods 0.000 description 29
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- 229910052782 aluminium Inorganic materials 0.000 description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 17
- 230000015572 biosynthetic process Effects 0.000 description 14
- 239000000178 monomer Substances 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 14
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 13
- 239000002253 acid Substances 0.000 description 12
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 10
- 239000000975 dye Substances 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 9
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 8
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000002244 precipitate Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 229940074391 gallic acid Drugs 0.000 description 6
- 235000004515 gallic acid Nutrition 0.000 description 6
- 238000005227 gel permeation chromatography Methods 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000000866 electrolytic etching Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- 239000005711 Benzoic acid Substances 0.000 description 4
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 150000003926 acrylamides Chemical class 0.000 description 4
- 235000010233 benzoic acid Nutrition 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 4
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- IBHWREHFNDMRPR-UHFFFAOYSA-N 2,4,6-Trihydroxybenzoic acid Chemical compound OC(=O)C1=C(O)C=C(O)C=C1O IBHWREHFNDMRPR-UHFFFAOYSA-N 0.000 description 3
- UIAFKZKHHVMJGS-UHFFFAOYSA-N 2,4-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1O UIAFKZKHHVMJGS-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000004342 Benzoyl peroxide Substances 0.000 description 3
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000001476 alcoholic effect Effects 0.000 description 3
- 235000019400 benzoyl peroxide Nutrition 0.000 description 3
- 235000019445 benzyl alcohol Nutrition 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 3
- 125000005395 methacrylic acid group Chemical group 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 3
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- JLIDVCMBCGBIEY-UHFFFAOYSA-N 1-penten-3-one Chemical compound CCC(=O)C=C JLIDVCMBCGBIEY-UHFFFAOYSA-N 0.000 description 2
- AKEUNCKRJATALU-UHFFFAOYSA-N 2,6-dihydroxybenzoic acid Chemical compound OC(=O)C1=C(O)C=CC=C1O AKEUNCKRJATALU-UHFFFAOYSA-N 0.000 description 2
- GSCKNWYHELSSSU-UHFFFAOYSA-N 2-hydroxy-6-propylbenzoic acid Chemical compound CCCC1=CC=CC(O)=C1C(O)=O GSCKNWYHELSSSU-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 2
- ROXSWPDJVVHMEQ-UHFFFAOYSA-N 4-(4-hydroxyanilino)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1NC1=CC=C(O)C=C1 ROXSWPDJVVHMEQ-UHFFFAOYSA-N 0.000 description 2
- KLXPCYHWTLAVLN-UHFFFAOYSA-N 4-(4-hydroxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(O)C=C1 KLXPCYHWTLAVLN-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- BBMFSGOFUHEVNP-UHFFFAOYSA-N 4-hydroxy-2-methylbenzoic acid Chemical compound CC1=CC(O)=CC=C1C(O)=O BBMFSGOFUHEVNP-UHFFFAOYSA-N 0.000 description 2
- NJESAXZANHETJV-UHFFFAOYSA-N 4-methylsalicylic acid Chemical compound CC1=CC=C(C(O)=O)C(O)=C1 NJESAXZANHETJV-UHFFFAOYSA-N 0.000 description 2
- OHNKSVVCUPOUDJ-UHFFFAOYSA-N 5-nitro-1h-indene Chemical compound [O-][N+](=O)C1=CC=C2CC=CC2=C1 OHNKSVVCUPOUDJ-UHFFFAOYSA-N 0.000 description 2
- HCJMNOSIAGSZBM-UHFFFAOYSA-N 6-methylsalicylic acid Chemical compound CC1=CC=CC(O)=C1C(O)=O HCJMNOSIAGSZBM-UHFFFAOYSA-N 0.000 description 2
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- KCXZNSGUUQJJTR-UHFFFAOYSA-N Di-n-hexyl phthalate Chemical compound CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCC KCXZNSGUUQJJTR-UHFFFAOYSA-N 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 229930040373 Paraformaldehyde Natural products 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- ZFOZVQLOBQUTQQ-UHFFFAOYSA-N Tributyl citrate Chemical compound CCCCOC(=O)CC(O)(C(=O)OCCCC)CC(=O)OCCCC ZFOZVQLOBQUTQQ-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 229940125782 compound 2 Drugs 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- JTHNLKXLWOXOQK-UHFFFAOYSA-N hex-1-en-3-one Chemical compound CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 2
- QNVRIHYSUZMSGM-UHFFFAOYSA-N hexan-2-ol Chemical compound CCCCC(C)O QNVRIHYSUZMSGM-UHFFFAOYSA-N 0.000 description 2
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 2
- 229940065472 octyl acrylate Drugs 0.000 description 2
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 2
- 229920002866 paraformaldehyde Polymers 0.000 description 2
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 2
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 2
- 229960005323 phenoxyethanol Drugs 0.000 description 2
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- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- 229940114055 beta-resorcylic acid Drugs 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- HJZGNWSIJASHMX-UHFFFAOYSA-N butyl acetate;ethane-1,2-diol Chemical compound OCCO.CCCCOC(C)=O HJZGNWSIJASHMX-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940005460 butyl levulinate Drugs 0.000 description 1
- UDHMTPILEWBIQI-UHFFFAOYSA-N butyl naphthalene-1-sulfonate;sodium Chemical compound [Na].C1=CC=C2C(S(=O)(=O)OCCCC)=CC=CC2=C1 UDHMTPILEWBIQI-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical group [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- COVFEVWNJUOYRL-UHFFFAOYSA-N digallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)=C1 COVFEVWNJUOYRL-UHFFFAOYSA-N 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- BBLSYMNDKUHQAG-UHFFFAOYSA-L dilithium;sulfite Chemical compound [Li+].[Li+].[O-]S([O-])=O BBLSYMNDKUHQAG-UHFFFAOYSA-L 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 1
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- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
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- 229920001249 ethyl cellulose Polymers 0.000 description 1
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- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
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- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- LRBQNJMCXXYXIU-QWKBTXIPSA-N gallotannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@H]2[C@@H]([C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-QWKBTXIPSA-N 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- SEOVTRFCIGRIMH-UHFFFAOYSA-N indole-3-acetic acid Chemical compound C1=CC=C2C(CC(=O)O)=CNC2=C1 SEOVTRFCIGRIMH-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- JESHZQPNPCJVNG-UHFFFAOYSA-L magnesium;sulfite Chemical compound [Mg+2].[O-]S([O-])=O JESHZQPNPCJVNG-UHFFFAOYSA-L 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- NIQQIJXGUZVEBB-UHFFFAOYSA-N methanol;propan-2-one Chemical compound OC.CC(C)=O NIQQIJXGUZVEBB-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- DWCZIOOZPIDHAB-UHFFFAOYSA-L methyl green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)[N+](C)(C)C)=C1C=CC(=[N+](C)C)C=C1 DWCZIOOZPIDHAB-UHFFFAOYSA-L 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- OPBAOMCCUSNABO-UHFFFAOYSA-N n-(naphthalen-1-ylmethyl)aniline Chemical compound C=1C=CC2=CC=CC=C2C=1CNC1=CC=CC=C1 OPBAOMCCUSNABO-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- PMJFVKWBSWWAKT-UHFFFAOYSA-N n-cyclohexylprop-2-enamide Chemical compound C=CC(=O)NC1CCCCC1 PMJFVKWBSWWAKT-UHFFFAOYSA-N 0.000 description 1
- BNTUIAFSOCHRHV-UHFFFAOYSA-N n-ethyl-n-phenylprop-2-enamide Chemical compound C=CC(=O)N(CC)C1=CC=CC=C1 BNTUIAFSOCHRHV-UHFFFAOYSA-N 0.000 description 1
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical compound CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 1
- FYCBGURDLIKBDA-UHFFFAOYSA-N n-hexyl-2-methylprop-2-enamide Chemical compound CCCCCCNC(=O)C(C)=C FYCBGURDLIKBDA-UHFFFAOYSA-N 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- GIPDEPRRXIBGNF-KTKRTIGZSA-N oxolan-2-ylmethyl (z)-octadec-9-enoate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC1CCCO1 GIPDEPRRXIBGNF-KTKRTIGZSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- PCYCKXJRAKEYSM-UHFFFAOYSA-N phenyl-(1,5,6-trihydroxycyclohexa-2,4-dien-1-yl)methanone Chemical compound OC1C(O)=CC=CC1(O)C(=O)C1=CC=CC=C1 PCYCKXJRAKEYSM-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- AZIQALWHRUQPHV-UHFFFAOYSA-N prop-2-eneperoxoic acid Chemical compound OOC(=O)C=C AZIQALWHRUQPHV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-M salicylate Chemical compound OC1=CC=CC=C1C([O-])=O YGSDEFSMJLZEOE-UHFFFAOYSA-M 0.000 description 1
- 229960001860 salicylate Drugs 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 229940072958 tetrahydrofurfuryl oleate Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 229940075420 xanthine Drugs 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、感光性組成物に係り、特に感光性平版印刷板
の製造に適した感光性組成物に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a photosensitive composition, and particularly to a photosensitive composition suitable for manufacturing a photosensitive lithographic printing plate.
感光性印刷板は、一般に、アルミニウム板等の支持体上
に感光性組成物を塗布し、陰画等を通して紫外線等の活
性光線を照射し、光が照射された部分を重合あるいは架
橋させ現像液に不溶化させ、光の非照射部分を現像液に
溶出させ、それぞれの部分を、水を反発して油性インキ
を受容する画像部、および水を受容して油性インキを受
容する非画像部とすることにより得られる。Photosensitive printing plates are generally produced by coating a photosensitive composition on a support such as an aluminum plate, irradiating it with active light such as ultraviolet rays through a negative image, polymerizing or crosslinking the irradiated areas, and turning the composition into a developer. Insolubilize and elute non-light irradiated areas into a developer, making each area an image area that repels water and receives oil-based ink, and a non-image area that receives water and receives oil-based ink. It is obtained by
この場合における感光性組成物としては、P−ジアゾジ
フェニルアミンとホルムアルデヒドとの縮合物などのジ
アゾ樹脂が広く用いられてきた。As photosensitive compositions in this case, diazo resins such as condensates of P-diazodiphenylamine and formaldehyde have been widely used.
しかし、従来知られているジアゾ樹脂は、一般にアルカ
リ可溶性を有していないため、それを含む感光性組成物
に対して、感光後、アルカリ現像液にて現像する際、現
像性、特にアンダー条件下での現像性が良好でなく、ま
た現像後の支持体表面上にジアゾ樹脂が膜状に残るいわ
ゆるジアゾ残りを生じ、印刷適性の低下を招く問題があ
る。However, conventionally known diazo resins generally do not have alkali solubility, so when developing a photosensitive composition containing it with an alkaline developer after exposure, it is difficult to develop the diazo resin, especially under under conditions. There is a problem in that the developability at the bottom is not good, and a so-called diazo residue, in which the diazo resin remains in the form of a film on the surface of the support after development, is caused, resulting in a decrease in printability.
そこで、本発明の主たる目的は、アルカリ可溶性を有し
、したがって現像性に優れ、かつジアゾ残りの無い、ま
たその結果、組合わせ使用できる親油性高分子化合物(
バインダー樹脂)の選択範囲を拡大できる新規な感光性
組成物を提供することにある。Therefore, the main object of the present invention is to provide a lipophilic polymer compound (
The object of the present invention is to provide a novel photosensitive composition that can expand the selection range of binder resins.
上記目的は、少くとも1つのカルボキシル基および少く
とも1つの水酸基を有する芳香族化合物と、芳香族ジア
ゾニウム化合物とを構成単位として含む共縮合化合物を
含有することで達成される。The above object is achieved by containing a co-condensed compound containing an aromatic compound having at least one carboxyl group and at least one hydroxyl group and an aromatic diazonium compound as a constituent unit.
C発明の具体的構成〕 以下、本発明をさらに詳細に説明する。Specific configuration of invention C] The present invention will be explained in more detail below.
本発明に係る前記のカルボキシル基およびヒドロキシル
基を有する芳香族化合物は、少なくとも1つのカルボキ
シル基で置換された芳香族環と少なくとも1つのヒドロ
キシル基で置換した芳香族環を分子中に含むものであっ
て、この場合、上記カルボキシル基とヒドロキシル基と
が同一の芳香環に置換されていてもよい。The aromatic compound having a carboxyl group and a hydroxyl group according to the present invention contains an aromatic ring substituted with at least one carboxyl group and an aromatic ring substituted with at least one hydroxyl group in the molecule. In this case, the carboxyl group and the hydroxyl group may be substituted with the same aromatic ring.
そして上記の芳香族環としては、好ましくはアリール基
例えばフェニル基、ナフチル基を挙げることができる。Preferable examples of the aromatic ring include aryl groups such as phenyl and naphthyl groups.
また前記のカルボキシル基あるいはヒドロキシル基は芳
香族環に直接結合してもよく、ジヨイントを介して結合
していてもよい。Furthermore, the above carboxyl group or hydroxyl group may be bonded directly to the aromatic ring or may be bonded via a joint.
本発明において1つの芳香族環に結合するカルボキシル
基の数としては1または2が好ましく、また1つの芳香
族環に結合するヒドロキシル基の数としてはl乃至3が
好ましい。さらにジヨイントとしては例えば炭素数1乃
至4のアルキレン基を挙げることができる。In the present invention, the number of carboxyl groups bonded to one aromatic ring is preferably 1 or 2, and the number of hydroxyl groups bonded to one aromatic ring is preferably 1 to 3. Furthermore, examples of joints include alkylene groups having 1 to 4 carbon atoms.
前記の芳香族化合物はアルデヒド類またはケトン類と縮
合するためには、少な(とも1つのヒドロキシル基で置
換された1つ以上の了り−ル基の芳香族環上に少なくと
も2つの非置換部位を有することが必要である。In order to condense the above-mentioned aromatic compounds with aldehydes or ketones, at least two unsubstituted sites on the aromatic ring of one or more aryl groups substituted with at least one hydroxyl group are required. It is necessary to have
本発明に利用される分子中にカルボキシル基及びヒドロ
キシル基を有する芳香族化合物の具体例としては、サリ
チル酸、4−メチルサリチル酸、6−メチルサリチル酸
、4−エチルサリチル酸、6−プロピルサリチル酸、6
−ラウリルサリチル酸、6〜ステアリルサリチル酸、4
.6−シメチルサリチル酸、p−ヒドロキシ安息香酸、
2−メチル−4−ヒドロキシ安息香酸、6−メチル−4
−ヒドロキシ安息香酸、2,6−シメチルー4−ヒドロ
キシ安息香酸、2.4−ジヒドロキシ安息香酸、2.4
−ジヒドロキシ−6−メチル安息香酸、2,6−ジヒド
ロキシ安息香酸、2.6−ジヒドロキシ−4〜メチル安
息香酸、4−クロロ−2,6−ジヒドロキシ安息香酸、
4−メトキシ−2,6−ジオキシ安息香酸、没食子酸、
フロログルシンカルボン酸、2.4.5− )ジヒドロ
キシ安息香酸、m−ガロイル没食子酸、タンニン酸、m
−ベンゾイル没食子酸、m−(p−トルイル)没食子酸
、プロトカテクオイルー没食子酸、4.6−シヒドロキ
シフタル酸、(2,4−ジヒドロキシフェニル)酢酸、
(2,6−ジヒドロキシフェニル)酢酸、(3,4,5
−1−ジヒドロキシフェニル)酢酸、p−ヒドロキシメ
チル安息香酸、p−ヒドロキシエチル安息香酸、4−(
p−ヒドロキシフェニル)メチル安息香酸、4− (。Specific examples of aromatic compounds having a carboxyl group and a hydroxyl group in the molecule used in the present invention include salicylic acid, 4-methylsalicylic acid, 6-methylsalicylic acid, 4-ethylsalicylic acid, 6-propyl salicylic acid, 6-propyl salicylic acid,
-Laurylsalicylic acid, 6 - stearylsalicylic acid, 4
.. 6-dimethylsalicylic acid, p-hydroxybenzoic acid,
2-methyl-4-hydroxybenzoic acid, 6-methyl-4
-Hydroxybenzoic acid, 2,6-dimethyl-4-hydroxybenzoic acid, 2.4-dihydroxybenzoic acid, 2.4
-dihydroxy-6-methylbenzoic acid, 2,6-dihydroxybenzoic acid, 2,6-dihydroxy-4-methylbenzoic acid, 4-chloro-2,6-dihydroxybenzoic acid,
4-methoxy-2,6-dioxybenzoic acid, gallic acid,
Phloroglucin carboxylic acid, 2.4.5-) dihydroxybenzoic acid, m-galloyl gallic acid, tannic acid, m
-benzoyl gallic acid, m-(p-toluyl) gallic acid, protocatechoyl gallic acid, 4,6-cyhydroxyphthalic acid, (2,4-dihydroxyphenyl) acetic acid,
(2,6-dihydroxyphenyl)acetic acid, (3,4,5
-1-dihydroxyphenyl)acetic acid, p-hydroxymethylbenzoic acid, p-hydroxyethylbenzoic acid, 4-(
p-hydroxyphenyl)methylbenzoic acid, 4-(.
−ヒドロキシベンゾイル)安息香酸、4− (2,4ジ
ヒドロキシベンゾイル)安息香酸、4−(p−ヒドロキ
シフェノキシ)安息香酸、4−(p−ヒドロキシアニリ
ノ)安息香酸、ビス(3−力ルボキシ−4−ヒドロキシ
フェニル)アミン、4(p−ヒドロキシフェニルスルホ
ニル)安息香酸、4−(p−ヒドロキシフェニルチオ)
安息香酸等があげられ、これらのうち特に好ましくは、
サリチル酸、p−ヒドロキシ安息香酸、2.4−ジヒド
ロキシ安息香酸、没食子酸、フロログルシンカルボン酸
、及び4−(p−ヒドロキシアニリノ)安息香酸である
。-hydroxybenzoyl)benzoic acid, 4-(2,4dihydroxybenzoyl)benzoic acid, 4-(p-hydroxyphenoxy)benzoic acid, 4-(p-hydroxyanilino)benzoic acid, bis(3-hydroxybenzoyl)benzoic acid, -hydroxyphenyl)amine, 4(p-hydroxyphenylsulfonyl)benzoic acid, 4-(p-hydroxyphenylthio)
Examples include benzoic acid, and among these, particularly preferred are:
These are salicylic acid, p-hydroxybenzoic acid, 2,4-dihydroxybenzoic acid, gallic acid, phloroglucincarboxylic acid, and 4-(p-hydroxyanilino)benzoic acid.
本発明に利用される芳香族ジアゾ化合物としては、芳香
族環に直接ジアゾニウム基が結合している化合物であれ
ば、特に限定はされないが、その例としては、4−ジア
ゾフェニルアミン硫酸塩、4−ジアゾジフェニルアミン
四フッ化ホウ酸塩、4−ジアゾジフェニルアミン六フフ
化リン酸塩、4−モルフォリノ−ベンゼンジアゾニウム
四フッ化ホウ酸塩、4−(N−エチル−N−ヒドロキシ
エチル)−アミノベンゼンジアゾニウム硫酸塩、4−N
、N’−ジメチルアミノベンゼンジアゾニウム六フッ化
リン酸塩、および8−ヒドロキシ−2ナフタレンジアゾ
ニウム四フツ化ホウ酸塩が挙げられる。そのうち特に好
ましい芳香族ジアゾ化合物としては、4−ジアゾジフェ
ニルアミン塩が挙げられる。The aromatic diazo compound used in the present invention is not particularly limited as long as it has a diazonium group directly bonded to the aromatic ring, but examples thereof include 4-diazophenylamine sulfate, 4-diazophenylamine sulfate, -Diazodiphenylamine tetrafluoroborate, 4-diazodiphenylamine hexafluoride phosphate, 4-morpholino-benzenediazonium tetrafluoroborate, 4-(N-ethyl-N-hydroxyethyl)-aminobenzenediazonium Sulfate, 4-N
, N'-dimethylaminobenzenediazonium hexafluorophosphate, and 8-hydroxy-2naphthalenediazonium tetrafluoroborate. Among these, particularly preferred aromatic diazo compounds include 4-diazodiphenylamine salts.
本発明に係る感光性ジアゾ共縮合樹脂は、公知の方法、
例えば、フォトグラフィック・サイエンス・アンド・エ
ンジニアリンク(Photo、 Sci、。The photosensitive diazo cocondensation resin according to the present invention can be prepared by a known method,
For example, Photographic Science and Engineering Link (Photo, Sci.
Eng、)第17巻、第33頁(1973) 、米国特
許第2.063,631号、同第2.679.498号
各明細書に記載の方法に従い、硫酸やリン酸あるいは塩
酸中でアゾニウム塩、カルボキシおよびヒドロキシ基を
有する芳香族化合物およびアルデヒド類、例えばパラホ
ルムアルデヒド、アセトアルデヒド、ベンズアルデヒド
あるいはケトン類、例えばアセトン、アセトフェノンと
を重縮合させることによって得られる。Eng., Volume 17, Page 33 (1973), U.S. Patent No. 2.063,631, U.S. Patent No. 2.679.498. It is obtained by polycondensation of salts, aromatic compounds having carboxyl and hydroxyl groups, and aldehydes, such as paraformaldehyde, acetaldehyde, benzaldehyde, or ketones, such as acetone and acetophenone.
また、これら分子中にカルボキシル基およびヒドロキシ
ル基を有する芳香族化合物、芳香族ジアゾ化合物および
アルデヒド類またはケトン類は相互に組合せ自由であり
、さらに各々2種以上を混ぜて共縮合することも可能で
ある。またさらにカルボキシル基を有しない共縮合可能
なフェノール類を添加して共縮合させることもできる。In addition, these aromatic compounds, aromatic diazo compounds, and aldehydes or ketones having carboxyl groups and hydroxyl groups in their molecules can be freely combined with each other, and it is also possible to co-condense two or more of each. be. Furthermore, co-condensation can be carried out by adding a co-condensable phenol having no carboxyl group.
その際、カルボキシル基およびヒドロキシル基を有する
芳香族化合物と芳香族ジアゾ化合物の仕込みモル比は、
1:0.1〜0.1:1;好ましくは1:0.5〜0.
2:1、より好ましくは1:1〜0.2:1である。ま
たこの場合カルボキシル基およびヒドロキシル基を有す
る化合物および芳香族ジアゾ化合物の合計とアルデヒド
類またはケトン類とをモル比で通常t:O,S〜1:2
、好ましくは1:0.7〜1:1.5で仕込み、低温で
短時間、例えば3時間程度反応させることによりジアゾ
共縮合樹脂が得られる。At that time, the charging molar ratio of the aromatic compound having a carboxyl group and a hydroxyl group and the aromatic diazo compound is
1:0.1-0.1:1; preferably 1:0.5-0.
The ratio is 2:1, more preferably 1:1 to 0.2:1. In this case, the total of the compound having a carboxyl group and a hydroxyl group and the aromatic diazo compound and the aldehyde or ketone are usually mixed in a molar ratio of t:O,S to 1:2.
, preferably at a ratio of 1:0.7 to 1:1.5, and reacted at low temperature for a short time, for example, about 3 hours, to obtain a diazo cocondensation resin.
本発明において使用されるジアゾ樹脂の対アニオンは、
該ジアゾ樹脂と安定な塩を形成し、かつ該樹脂を有機溶
媒に可溶となすアニオンを含む。The counter anion of the diazo resin used in the present invention is
It contains an anion that forms a stable salt with the diazo resin and makes the resin soluble in organic solvents.
これらは、デカン酸および安息香酸等の有機カルボン酸
、フェニルリン酸等のを機リン酸およびスルホン酸を含
み、典型的な例としては、メタンスルホン酸、クロロエ
タンスルホン酸、ドデカンスルホン酸、ベンゼンスルホ
ン酸、トルエンスルホン酸、メシチレンスルホン酸、お
よびアントラキノンスルホン酸、2−ヒドロキシ−4−
メトキシベンゾフェノン−5−スルホン酸、ヒドロキシ
スルホン酸、4−アセチルベンゼンスルホン酸、ジメチ
ル−5−スルホイソフタレート等の脂肪族並びに芳香族
スルホン酸、2.2 ’ 、4.4 ’−テトラヒドロ
キシベンゾフェノン、1,2.3−トリヒドロキシベン
ゾフェノン、2.2’ 、4− トリヒドロキシベンゾ
フェノン等の水酸基含有芳香族化合物、ヘキサフルオロ
リン酸、テトラフルオロホウ酸等のハロゲン化ルイス酸
、CI204.104等の過ハロゲン酸等が挙げられる
が、これに限られるものではない。これらの中で、特に
好ましいものは、ヘキサフルオロリン酸、2−ヒドロキ
シ−4−メトキシベンゾフェノン−5−スルホン酸であ
る。These include organic carboxylic acids such as decanoic acid and benzoic acid; acids, toluenesulfonic acid, mesitylenesulfonic acid, and anthraquinonesulfonic acid, 2-hydroxy-4-
Aliphatic and aromatic sulfonic acids such as methoxybenzophenone-5-sulfonic acid, hydroxysulfonic acid, 4-acetylbenzenesulfonic acid, dimethyl-5-sulfoisophthalate, 2.2', 4.4'-tetrahydroxybenzophenone, Hydroxyl group-containing aromatic compounds such as 1,2,3-trihydroxybenzophenone and 2,2',4-trihydroxybenzophenone, halogenated Lewis acids such as hexafluorophosphoric acid and tetrafluoroboric acid, and peroxidases such as CI204.104. Examples include, but are not limited to, halogen acids. Among these, particularly preferred are hexafluorophosphoric acid and 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid.
本発明に使用されるカルボキシル基およびヒドロキシル
基を有する芳香族化合物および芳香族ジアゾ化合物とを
構成単位として含むアルデヒド類またはケトン類との縮
合型樹脂(以下ジアゾ共縮合樹脂と称する)の例として
は、サリチル酸−4−ジアゾジフェニルアミン・六フッ
化リン酸塩−ホルムアルデヒド樹脂、4−メチルサリチ
ル酸4−ジアゾジフェニルアミン・四フッ化ホウ酸塩ホ
ルムアルデヒド樹脂、p−ヒドロキシ安息香酸−4−ジ
アゾジフェニルアミン・六フッ化リン酸塩−ホルムアル
デヒド樹脂、2.4−ジヒドロキシ安息香酸−4−ジア
ゾジフェニルアミン・2−ヒドロキシ−4−メトキシベ
ンゾフェノン−5スルホン酸塩−ホルムアルデヒド樹脂
、没食子酸4−ジアゾジフェニルアミン・六フッ化リン
酸塩−ホルムアルデヒド樹脂、フロログルシンカルボン
酸−4−ジアゾジフェニルアミン・四フッ化ホウ酸塩−
アセトアルデヒド樹脂、(2,4−ジヒドロキシフェニ
ル)酢酸−4−(N−エチル−N−ヒドロキシエチル)
−アミノベンゼンジアゾニウム・六フッ化リン酸塩−ベ
ンズアルデヒド樹脂、4− (0−ヒドロキシベンゾイ
ル) 安息香酸−4−ジアゾジフェニルアミン・六フッ
化リン酸塩−ホルムアルデヒド樹脂、4−(p−ヒドロ
キシフェノキシ)安息香酸−4−ジアゾジフェニルアミ
ン・六フッ化リン酸塩−ホルムアルデヒド樹脂、4−(
p−ヒドロキシアニリノ)安息香酸−4−ジアゾジフェ
ニルアミン・六フッ化すン酸塩−ホルムアルデヒド樹M
L 4 (p−ヒドロキシフェニルスルホニル)安
息香酸−4−ジアゾジフェニルアミン・六フッ化リン酸
塩−ホルムアルデヒド樹脂等があり;このうち特に好ま
しくは、サリチル酸−4−ジアゾジフェニルアミン・六
フフ化リン酸塩−ホルムアルデヒド樹脂、p−ヒドロキ
シ安息香酸−4−ジアゾジフェニルアミン・六フッ化リ
ン酸塩−ホルムアルデヒド樹脂、2.4−ジヒドロキシ
安息香酸−4−ジアゾジフェニルアミン・2−ヒドロキ
シ−4−メトキシベンゾフェノン−5−スルホン酸塩−
ホルムアルデヒド樹脂、および4−(p−ヒドロキシア
ニリノ)安息香酸−4−ジアゾジフェニルアミン・六フ
ッ化すン酸塩−ホルムアルデド樹脂である。本発明のジ
アゾ共縮合樹脂は、各単量体の仕込みモル比および縮合
条件を種々変えることにより、その分子量は任意の値と
して得ることができるが、本発明の目的とする使途に有
効に供するためには分子量が約400乃至10,000
のものが使用可能であるが、好ましくは約800乃至5
,000のものが適当である。Examples of condensation type resins (hereinafter referred to as diazo cocondensation resins) with aldehydes or ketones containing aromatic compounds having carboxyl groups and hydroxyl groups and aromatic diazo compounds as structural units used in the present invention include: , 4-diazodiphenylamine salicylate/hexafluorophosphate-formaldehyde resin, 4-diazodiphenylamine 4-methylsalicylate/tetrafluoroborate formaldehyde resin, p-hydroxybenzoic acid-4-diazodiphenylamine/hexafluoride Phosphate-formaldehyde resin, 2,4-dihydroxybenzoic acid-4-diazodiphenylamine/2-hydroxy-4-methoxybenzophenone-5-sulfonate-formaldehyde resin, gallic acid 4-diazodiphenylamine/hexafluorophosphate -Formaldehyde resin, phloroglucincarboxylic acid -4-diazodiphenylamine/tetrafluoroborate-
Acetaldehyde resin, (2,4-dihydroxyphenyl)acetic acid-4-(N-ethyl-N-hydroxyethyl)
-Aminobenzenediazonium/hexafluorophosphate -benzaldehyde resin, 4-(0-hydroxybenzoyl)benzoic acid-4-diazodiphenylamine/hexafluorophosphate -formaldehyde resin, 4-(p-hydroxyphenoxy)benzoic acid Acid-4-diazodiphenylamine/hexafluorophosphate-formaldehyde resin, 4-(
p-hydroxyanilino)benzoic acid-4-diazodiphenylamine/hexafluorosulfate-formaldehyde tree M
L 4 (p-hydroxyphenylsulfonyl)benzoic acid-4-diazodiphenylamine/hexafluorophosphate-formaldehyde resin, etc.; particularly preferred among these are salicylic acid-4-diazodiphenylamine/hexafluorophosphate- Formaldehyde resin, p-hydroxybenzoic acid-4-diazodiphenylamine/hexafluorophosphate-formaldehyde resin, 2,4-dihydroxybenzoic acid-4-diazodiphenylamine/2-hydroxy-4-methoxybenzophenone-5-sulfonic acid Salt-
Formaldehyde resin and 4-(p-hydroxyanilino)benzoic acid-4-diazodiphenylamine/hexafluorosulfate-formalde resin. The diazo cocondensation resin of the present invention can have any molecular weight by varying the molar ratio of each monomer and the condensation conditions, but it can be effectively used for the purpose of the present invention. The molecular weight is about 400 to 10,000.
can be used, but preferably about 800 to 5
,000 is appropriate.
上記の感光性ジアゾ共縮合樹脂は、アルカリ可溶性もし
くは膨潤性の親油性高分子化合物をバインダー樹脂とし
て使用して、これと組合わせて使用するのが望ましい。The photosensitive diazo cocondensation resin described above is desirably used in combination with an alkali-soluble or swellable lipophilic polymer compound as a binder resin.
この親油性高分子化合物としては、下記(1)〜Ozに
示すモノマーをその構造単位とする通常2〜20万の分
子量をもつ共重合体が挙げられる。Examples of this lipophilic polymer compound include copolymers having a molecular weight of usually 20,000 to 200,000 and having monomers shown in (1) to Oz below as structural units.
(1)芳香族水酸基を有するアクリルアミド類、メタク
リルアミド類、アクリル酸エステル、およびメタクリル
酸エステル類、例えばN−(4−ヒドロキシフェニル)
アクリルアミド又はN−(4ヒドロキシフエニル)メタ
クリルアミド、〇−m−1p−ヒドロキシスチレン、0
−1m−1pヒドロキシフェニル−アクリレート又はメ
タクリレート、
(2)脂肪族水酸基を有するアクリル酸エステル類、お
よびメタクリル酸エステル類、例えば2−ヒドロキシエ
チルアクリレート又は2−ヒドロキシエチルメタクリレ
ート、
(3) アクリル酸、メタクリル酸、無水マレイン酸
等のα、β−不飽和カルボン酸、
(4) アクリル酸メチル、アクリル酸エチル、アク
リル酸プロピル、アクリル酸ブチル、アクリル酸アミル
、アクリル酸ヘキシル、アクリル酸オクチル、アクリル
酸−2−クロロエチル、グリシジルアクリレート、N−
ジメチルアミノエチルアクリレート等の(置換)アルキ
ルアクリレート、(5) メチルメタクリレート、エ
チルメタクリレート、プロピルメタクリレート、ブチル
メタクリレート、アミルメタクリレート、シクロヘキシ
ルメタクリレート、4−ヒドロキシブチルメタクリレー
ト、グリシジルメタクリレート、N−ジメチルアミノエ
チルメタクリレート等の(置換)アルキルメタクリレー
ト、
(6) アクリルアミド、メタクリルアミド、N−メ
チロールアクリルアミド、N−メチロールメタクリルア
ミド、N−エチルアクリルアミド、N−へキシルメタク
リルアミド、N−シクロヘキシルアクリルアミド、N−
ヒドロキシエチルアクリルアミド、N−フェニルアクリ
ルアミド、N−ニトロフェニルアクリルアミド、N−エ
チル−N−フェニルアクリルアミド等のアクリルアミド
若しくはメタクリルアミド類、
(7)エチルビニルエーテル、2−クロロエチルビニル
エーテル、ヒドロキシエチルビニルエーテル、プロピル
ビニルエーテル、ブチルビニルエーテル、オクチルビニ
ルエーテル、フェニルビニルエーテル等のビニルエーテ
ル類、
(8) ビニルアセテート、ビニルクロロアセテート
、ビニルブチレート、安息香酸ビニル等のビニルエステ
ル類、
(9) スチレン、α−メチルスチレン、メチルスチ
レン、クロロメチルスチレン等のスチレン類、α〔メチ
ルビニルケトン、エチルビニルケトン、プロピルビニル
ケトン、フェニルビニルケトン等のビニルケトン類、
αυ エチレン、プロピレン、イソブチレン、ブタジェ
ン、イソプレン等のオレフィン類、0EN−ビニルピロ
リドン、N−ビニルカルバゾ−ル、4−ビニルピリンン
、アクリロニトリル、メタクリレートリル等、
更に、上記モノマーと共重合し得る七ツマ−を共重合さ
せてもよい。また、上記モノマーの共重合によって得ら
れる共重合体を例えば、グリシジルメタクリレート、グ
リシジルアクリレート等によって修飾したものも含まれ
るがこれらに限られるものではない。(1) Acrylamides, methacrylamides, acrylic esters, and methacrylic esters having an aromatic hydroxyl group, such as N-(4-hydroxyphenyl)
Acrylamide or N-(4-hydroxyphenyl)methacrylamide, 〇-m-1p-hydroxystyrene, 0
-1m-1p hydroxyphenyl acrylate or methacrylate, (2) Acrylic esters and methacrylic esters having aliphatic hydroxyl groups, such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate, (3) Acrylic acid, methacrylate acids, α, β-unsaturated carboxylic acids such as maleic anhydride, (4) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, acrylic acid. 2-chloroethyl, glycidyl acrylate, N-
(Substituted) alkyl acrylates such as dimethylaminoethyl acrylate, (5) methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, cyclohexyl methacrylate, 4-hydroxybutyl methacrylate, glycidyl methacrylate, N-dimethylaminoethyl methacrylate, etc. (Substituted) alkyl methacrylate, (6) acrylamide, methacrylamide, N-methylol acrylamide, N-methylol methacrylamide, N-ethyl acrylamide, N-hexyl methacrylamide, N-cyclohexyl acrylamide, N-
Acrylamides or methacrylamides such as hydroxyethyl acrylamide, N-phenylacrylamide, N-nitrophenyl acrylamide, N-ethyl-N-phenylacrylamide, (7) ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, Vinyl ethers such as butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether, etc. (8) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, vinyl benzoate, etc. (9) Styrene, α-methylstyrene, methylstyrene, chloro Styrenes such as methylstyrene, α [vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone, αυ olefins such as ethylene, propylene, isobutylene, butadiene, and isoprene, 0EN-vinylpyrrolidone, N -vinylcarbazole, 4-vinylpyrine, acrylonitrile, methacrylatetrile, etc. Furthermore, a heptamer which can be copolymerized with the above monomers may be copolymerized. It also includes, but is not limited to, copolymers obtained by copolymerizing the above monomers and modified with glycidyl methacrylate, glycidyl acrylate, and the like.
更に具体的には、上記+1). T2)に掲げたモノマ
ー等を含有する、水酸基を有する共重合体が好ましく、
芳香族性水酸基を有する共重合体が更に好ましい。More specifically, the above +1). A copolymer having a hydroxyl group containing a monomer etc. listed in T2) is preferable,
More preferred are copolymers having aromatic hydroxyl groups.
上記共重合体には(3)に掲げたα、β−不飽和カルボ
ン酸を含有することが好ましく、共重合体の好ましい酸
価は10〜100である。The copolymer preferably contains an α,β-unsaturated carboxylic acid listed in (3), and the copolymer preferably has an acid value of 10 to 100.
上記共重合体の好ましい分子量は4〜15万である。The preferred molecular weight of the above copolymer is 40,000 to 150,000.
また上記共重合体には必要に応じて、ポリビニルブチラ
ール樹脂、ポリウレタン樹脂、ポリアミド樹脂、エポキ
シ樹脂、ノボラック樹脂、天然樹脂等を添加してもよい
。Further, polyvinyl butyral resin, polyurethane resin, polyamide resin, epoxy resin, novolac resin, natural resin, etc. may be added to the above copolymer as necessary.
バインダーとして、特に好ましい親油性高分子化合物と
しては、メチルアクリレートを構造単位として有する次
記の共重合体である。A particularly preferable lipophilic polymer compound as a binder is the following copolymer having methyl acrylate as a structural unit.
すなわち、分子構造中に、
(al アルコール性水酸基を有する構造単位及び/
又はフェノール性水酸基を有する構造単位を1〜50モ
ル%、
(b) 下記−最大■、
CI2−C−・・・・・・・・・I
N
(式中、R1は水素原子又はアルキル基を表わす、)で
表わされる構造単位を5〜40モル%、fc) メチ
ルアクリレートから形成される単位を5〜40モル%、
(dl 下記−最大■、
cut−c−・・・・・・・・・■
GOOR’
(式中、R2は水素原子、メチル基又はエチル基を表わ
し、R3は、炭素原子数2〜12のアルキル基又はアル
キル置換アリール基を表わす。)で表わされる構造単位
を25〜60モル%、及び(e) カルボキシル基を
有する構造単位を2〜30モル%
含有し、且つその重量平均分子量が5〜20万である共
重合体である。That is, in the molecular structure, (a structural unit having an alcoholic hydroxyl group and/or
or 1 to 50 mol% of a structural unit having a phenolic hydroxyl group, (b) the following - maximum ■, CI2-C-...I N (wherein R1 is a hydrogen atom or an alkyl group) 5 to 40 mol% of structural units represented by ), fc) 5 to 40 mol% of units formed from methyl acrylate, (dl below - maximum ■, cut-c-...・■ GOOR' (In the formula, R2 represents a hydrogen atom, a methyl group, or an ethyl group, and R3 represents an alkyl group or an alkyl-substituted aryl group having 2 to 12 carbon atoms.) 60 mol%, and (e) 2 to 30 mol% of a structural unit having a carboxyl group, and has a weight average molecular weight of 50,000 to 200,000.
前記アルコール性水酸基を有する構造単位を形成する七
ツマ−の具体例としては、特公昭527364号公報に
記載されたような下記−最大(I[)に示した化合物の
ごとく (メタ)アクリル酸エステル類や、アクリルア
ミド類が挙げられる。Specific examples of the hexamer forming the structural unit having an alcoholic hydroxyl group include (meth)acrylic acid esters such as the compounds shown in the maximum (I[) below as described in Japanese Patent Publication No. 527364. and acrylamides.
S
式中、R4は水素原子又はメチル基、R5は水素原子、
メチル基、エチル基又はクロロメチル基、そしてnは1
−IQの整数を示す。S In the formula, R4 is a hydrogen atom or a methyl group, R5 is a hydrogen atom,
Methyl group, ethyl group or chloromethyl group, and n is 1
- Indicates an integer of IQ.
(メタ)アクリル酸エステル類の例としては、2−ヒド
ロキシエチル(メタ)アクリレート、2−ヒドロキシプ
ロピル(メタ)アクリレート、2−ヒドロキシペンチル
(メタ)アクリレート等が、また、アクリルアミド類の
例としてはN−メチロール(メタ)アクリルアミド、N
−ヒドロキシエチル(メタ)アクリルアミド等が挙げら
れる。好ましくは2−ヒドロキシエチル(メタ)アクリ
レートである。Examples of (meth)acrylic acid esters include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxypentyl (meth)acrylate, and examples of acrylamides include N -Methylol (meth)acrylamide, N
-Hydroxyethyl (meth)acrylamide and the like. Preferably it is 2-hydroxyethyl (meth)acrylate.
また、フェノール性水酸基を有する構造単位を形成する
七ツマ−としては、例えばN−(4−ヒドロキシフェニ
ル)−(メタ)アクリルアミド、N−(2−ヒドロキシ
フェニル)−(メタ)アクリルアミド、N−(4−ヒド
ロキシナフチル)=(メタ)アクリルアミド等の(メタ
)アクリルアミド類のモノマー:o−、m−又はp−ヒ
ドロキシフェニル(メタ)アクリレートモノマー:O−
m−又はp−ヒドロキシスチレンモノマー等が挙げられ
る。好ましくは、o−、m−又はp−ヒドロキシフェニ
ル(メタ)アクリレートモノマーN−(4−ヒドロキシ
フェニル)−(メタ)アクリルアミドモノマーであり、
さらに好ましくはN−(4−ヒドロキシフェニル)−(
メタ)アクリルアミドモノマーである。In addition, examples of the seven polymers forming a structural unit having a phenolic hydroxyl group include N-(4-hydroxyphenyl)-(meth)acrylamide, N-(2-hydroxyphenyl)-(meth)acrylamide, N-( Monomers of (meth)acrylamides such as 4-hydroxynaphthyl (meth)acrylamide: o-, m- or p-hydroxyphenyl (meth)acrylate monomers: O-
Examples include m- or p-hydroxystyrene monomers. Preferably, the o-, m- or p-hydroxyphenyl (meth)acrylate monomer N-(4-hydroxyphenyl)-(meth)acrylamide monomer,
More preferably N-(4-hydroxyphenyl)-(
meth)acrylamide monomer.
上記アルコール性水酸基を有する構造単位及び/又はフ
ェノール性水酸基を有する構造単位は、高分子化合物中
、望ましくは1〜50モル%、好ましくは、5〜30モ
ル%の範囲から選ばれる。The structural unit having an alcoholic hydroxyl group and/or the structural unit having a phenolic hydroxyl group is preferably selected from a range of 1 to 50 mol%, preferably 5 to 30 mol%, in the polymer compound.
前記−最大Iで表わされる構造単位を形成する、側鎖に
シアノ基を有する七ツマ−としては、アクリロニトリル
、メタクリロニトリル、2−ペンテンニトリル、2−メ
チル−3−ブテンニトリル、2−シアノエチルアクリレ
ート、〇−1m−1p−シアノスチレン等が挙げられる
。好ましくはアクリロニトリル、メタクリロニトリルで
ある。該側鎖にシアノ基を有する構造単位の高分子化合
物の分子中に含有される割合は望ましくは5〜40モル
%、好ましくは15〜35モル%の範囲から選ばれる。Examples of the seven polymers having a cyano group in the side chain and forming the structural unit represented by the maximum I include acrylonitrile, methacrylonitrile, 2-pentenenitrile, 2-methyl-3-butenenitrile, and 2-cyanoethyl acrylate. , 〇-1m-1p-cyanostyrene and the like. Preferred are acrylonitrile and methacrylonitrile. The proportion of the structural unit having a cyano group in the side chain contained in the molecule of the polymer compound is desirably 5 to 40 mol%, preferably 15 to 35 mol%.
メチルアクリレートから形成される単位は、高分子化合
物中、5〜40モル%、好ましくは、10〜30モル%
の範囲から選ばれる。The unit formed from methyl acrylate is 5 to 40 mol%, preferably 10 to 30 mol% in the polymer compound.
selected from the range.
前記−最大■で表わされる構造単位を形成する、側鎖に
カルボキシエステル基を有するモノマーとしては、エチ
ルアクリレート、エチルメタクリレート、プロピルアク
リレート、ブチルアクリレート、アミルアクリレート、
アミルメタクリレート、ヘキシルアクリレート、オクチ
ルアクリレート、2−クロロエチルアクリレート、2−
ヒドロキシアクリレート、グリシジルアクリレート、等
が挙げられる。該モノマーから形成される単位は、高分
子化合物中、25〜60モル%、好ましくは、35〜6
0モル%の範囲から選ばれる。The monomers having a carboxy ester group in the side chain and forming the structural unit represented by -maximum (■) include ethyl acrylate, ethyl methacrylate, propyl acrylate, butyl acrylate, amyl acrylate,
amyl methacrylate, hexyl acrylate, octyl acrylate, 2-chloroethyl acrylate, 2-
Examples include hydroxyacrylate, glycidyl acrylate, and the like. The units formed from the monomer account for 25 to 60 mol%, preferably 35 to 6 mol%, in the polymer compound.
It is selected from the range of 0 mol%.
また、カルボキシル基を有する構造単位を形成するモノ
マーとしては、メタクリル酸、アクリル酸、無水マレイ
ン酸、マレイン酸、等が挙げられる。該モノマーは、高
分子化合物中、2〜30モル%、好ましくは、5〜15
モル%の範囲から選ばれる。Furthermore, examples of monomers forming structural units having carboxyl groups include methacrylic acid, acrylic acid, maleic anhydride, maleic acid, and the like. The monomer accounts for 2 to 30 mol%, preferably 5 to 15 mol% in the polymer compound.
Selected from the range of mol%.
なお、以上の各構造単位は具体例として挙げたモノマー
から形成された単位に限定されるものではない。Note that each of the above structural units is not limited to units formed from the monomers listed as specific examples.
本発明組成物中のバインダーとしての親油性高分子化合
物を合成する方法としては、一般に公知のラジカル重合
法等によって、例えばアゾビスイソブチロニトリル、ベ
ンゾイルパーオキシド等の開始剤(0,1〜4.0モル
%)を使用して溶液重合法によって容易に合成される。As a method for synthesizing the lipophilic polymer compound as a binder in the composition of the present invention, a generally known radical polymerization method or the like may be used, for example, using an initiator (0,1- 4.0 mol%) by a solution polymerization method.
本発明に用いられる親油性高分子化合物は感光性組成物
の固形分中に通常40〜99重量%、好ましくは50〜
95重量%含有させる。また、本発明に用いられる感光
性ジアゾ樹脂は通常1〜60重量%、好ましくは3〜3
0重量%含有させる。The lipophilic polymer compound used in the present invention is usually 40 to 99% by weight, preferably 50 to 99% by weight in the solid content of the photosensitive composition.
Contains 95% by weight. Further, the photosensitive diazo resin used in the present invention is usually 1 to 60% by weight, preferably 3 to 3% by weight.
Contains 0% by weight.
本発明の感光性組成物には、さらに色素を用いることが
できる。該色素は、露光による可視画像(露光可視画像
)と現像後の可視画像を得ることを目的として使用され
る。A dye can further be used in the photosensitive composition of the present invention. The dye is used for the purpose of obtaining a visible image by exposure (exposed visible image) and a visible image after development.
該色素としては、フリーラジカルまたは酸と反応して色
調を変化するものが好ましく使用できる。As the dye, one that changes color tone by reacting with free radicals or acids can be preferably used.
ここに「色調が変化する」とは、無色から有色の色調へ
の変化、有色から無色あるいは異なる有色の色調へのい
ずれをも包含する。好ましい色素は酸と塩を形成して色
調を変化するものである。Here, "the color tone changes" includes both a change from colorless to a colored tone, and a change from a color to colorless or a different colored tone. Preferred dyes are those that change color tone by forming salts with acids.
例えば、ビクトリアピュアブルーBOH(保土谷化学社
製〕、オイルブルー#603(オリエント化学工業社製
〕、パテントピュアブルー〔住人王国化学社製〕、クリ
スタルバイオレット、ブリリアントグリーン、エチルバ
イオレフト、メチルバイオレット、メチルグリーン、エ
リスロシンB1ベイシックツクシン、マラカイトグリー
ン、オイルレッド、m−クレゾールパープル、ローダミ
ンB1オーラミン、4−p−ジエチルアミノフェニルイ
ミノナフトキノン、シアノ−p−ジエチルアミノフェニ
ルアセトアニリド等に代表されるトリフェニルメタン系
、ジフェニルメタン系、オキサジン系、キサンチン系、
イミノナフトキノン系、アゾメチン系またはアントラキ
ノン系の色素が有色から無色あるいは異なる有色の色調
へ変化する変色剤の例として挙げられる。For example, Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd.), Oil Blue #603 (manufactured by Orient Chemical Industry Co., Ltd.), Patent Pure Blue (manufactured by Juju Kingdom Chemical Co., Ltd.), Crystal Violet, Brilliant Green, Ethyl Bioleft, Methyl Violet, Triphenylmethane type, represented by methyl green, erythrosin B1 basic tsuksin, malachite green, oil red, m-cresol purple, rhodamine B1 auramine, 4-p-diethylaminophenylimino naphthoquinone, cyano-p-diethylaminophenyl acetanilide, etc. Diphenylmethane type, oxazine type, xanthine type,
Iminonaphthoquinone-based, azomethine-based, or anthraquinone-based dyes are examples of color-changing agents that change color from colored to colorless or to a different colored tone.
一方、無色から有色に変化する変色剤としては、ロイコ
色素及び、例えばトリフェニルアミン、ジフェニルアミ
ン、0−クロロアニリン、1.2.3−トリフェニルグ
アニジン、ナフチルアミン、ジアミノジフェニルメタン
、p、p’−ビス−ジメチルアミノジフェニルアミン、
1.2−ジアニリノエチレン、p、p +p −ト
リス−ジメチルアミノトリフェニルメタン、plp
−ビス−ジメチルアミノジフェニルメチルイミン、p、
p’、p“−トリアミノ−0−メチルトリフェニルメタ
ン、p、p”−ビス−ジメチルアミノジフェニル−4−
アニリノナフチルメタン、p、p 、p“−トリアミ
ノトリフェニルメタンに代表される第1級または第2級
アリールアミン系色素が挙げられる。On the other hand, examples of color changing agents that change from colorless to colored include leuco dyes, triphenylamine, diphenylamine, 0-chloroaniline, 1.2.3-triphenylguanidine, naphthylamine, diaminodiphenylmethane, p, p'-bis -dimethylaminodiphenylamine,
1.2-dianilinoethylene, p,p +p-tris-dimethylaminotriphenylmethane, plp
-bis-dimethylaminodiphenylmethylimine, p,
p', p"-triamino-0-methyltriphenylmethane, p, p"-bis-dimethylaminodiphenyl-4-
Examples include primary or secondary arylamine dyes typified by anilinonaphthylmethane and p,p,p''-triaminotriphenylmethane.
特に好ましくはトリフェニルメタン系、ジフェニルメタ
ン系色素が有効に用いられ、さらに好ましくはトリフェ
ニルメタン系色素であり、特にビクトリアピュアブルー
BOHである。Particularly preferably triphenylmethane and diphenylmethane dyes are effectively used, more preferably triphenylmethane dyes, especially Victoria Pure Blue BOH.
上記色素は、感光性組成物中に通常約0.5〜約10重
量%が好ましく、より好ましくは約1〜5重量%含有さ
せる。The above-mentioned dye is usually contained preferably in an amount of about 0.5 to about 10% by weight, more preferably in an amount of about 1 to 5% by weight in the photosensitive composition.
本発明の感光性組成物には、更に種々の添加物を加える
ことができる。Various additives can be further added to the photosensitive composition of the present invention.
例えば、塗布性を改良するためのアルキルエーテル類(
例えばエチルセルロース、メチルセルロース)、フッ素
系界面活性剤類や、ノニオン系界面活性剤〔例えば、プ
ルロニックL−64(旭電化株式会社製)〕、塗膜の柔
軟性、耐摩耗性を付与するための可塑剤(例えばブチル
フタリル、ポリエチレングリコール、クエン酸トリブチ
ル、フタル酸ジエチル、フタル酸ジブチル、フタル酸ジ
ヘキシル、フタル酸ジオクチル、リン酸トリクレジル、
リン酸トリブチル、リン酸トリオクチル、オレイン酸テ
トラヒドロフルフリル、アクリル酸又はメタクリル酸の
オリゴマーおよびポリマー)、画像部の感脂性を向上さ
せるための感脂化剤(例えば、特開昭55−527号公
報記載のスチレン−無水マレイン酸共重合体のアルコー
ルによるハーフエステル化物等)、安定剤〔例えば、リ
ン酸、亜リン酸、有機M (クエン酸、シュウ酸、ベン
ゼンスルホン酸、ナフタレンスルホン酸、4−メトキシ
−2−ヒドロキシベンゾフェノン−5−スルホン酸、酒
石酸等)〕等が挙げられる。これらの添加剤の添加量は
その使用対象目的によって異なるが、一般に全固形分に
対して、0.01〜30重景%である。For example, alkyl ethers (
(e.g., ethyl cellulose, methyl cellulose), fluorine-based surfactants, nonionic surfactants (e.g., Pluronic L-64 (manufactured by Asahi Denka Corporation)), plasticizers for imparting flexibility and abrasion resistance to coating films. agents (e.g. butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate,
tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, oligomers and polymers of acrylic acid or methacrylic acid), fat-sensitizing agents for improving the fat-sensitivity of image areas (for example, JP-A-55-527) half-esterified styrene-maleic anhydride copolymer with alcohol, etc.), stabilizers [e.g., phosphoric acid, phosphorous acid, organic M (citric acid, oxalic acid, benzenesulfonic acid, naphthalenesulfonic acid, 4- methoxy-2-hydroxybenzophenone-5-sulfonic acid, tartaric acid, etc.). The amount of these additives added varies depending on the purpose for which they are used, but is generally 0.01 to 30% by weight based on the total solid content.
このような感光性組成物は、支持体上に塗設される。こ
の支持体としては、アルミニウムもしくはその合金板、
亜鉛板、銅板、ステンレス板等の金属板、あるはポリエ
チレンテレフタレート、ポリプロピレン等のプラスチッ
クフィルムなどがある。Such a photosensitive composition is coated on a support. As this support, aluminum or its alloy plate,
Examples include metal plates such as zinc plates, copper plates, and stainless steel plates, and plastic films such as polyethylene terephthalate and polypropylene.
本発明の感光性組成物を感光性平版印刷板の製造に適用
する場合には、アルミニウムまたはその合金板等の支持
体上に設けられて使用される。When the photosensitive composition of the present invention is applied to the production of a photosensitive lithographic printing plate, it is used by being provided on a support such as an aluminum or alloy plate thereof.
前記の感光性平版印刷版に使用される支持体としては、
紙、プラスチック(例えば、ポリエチレン、ポリプロピ
レン、ポリスチレンなど)ラミネート紙、アルミニウム
(アルミニウム合金も含む)、亜鉛、銅などのような金
属の板、二酢酸セルロース、三酢酸セルロース、プロピ
オン酸セルロース、ポリエチレンテレフタレート、ポリ
エチレン、ポリプロピレン、ポリカーボネートポリビニ
ルアセタールなどのようなプラスチックのフィルム、上
記の如き金属がラミネートもしくは蒸着された紙もしく
はプラスチックフィルム、アルミニウムもしくはクロー
ムメツキが施された鋼板などがあげられ、これらのうち
特に、アルミニウム及びアルミニウム被覆された複合支
持体が好ましい。The support used in the photosensitive lithographic printing plate is as follows:
Paper, plastics (e.g. polyethylene, polypropylene, polystyrene, etc.) laminated paper, plates of metals such as aluminum (including aluminum alloys), zinc, copper, etc., cellulose diacetate, cellulose triacetate, cellulose propionate, polyethylene terephthalate, Plastic films such as polyethylene, polypropylene, polycarbonate polyvinyl acetal, etc., paper or plastic films laminated or vapor-deposited with metals such as those mentioned above, steel plates plated with aluminum or chrome, etc. and aluminum-coated composite supports are preferred.
また、アルミニウム材の表面は、保水性を高め、感光層
との密着性を向上させる目的で粗面化処理されているこ
とが望ましい。Further, the surface of the aluminum material is preferably roughened for the purpose of increasing water retention and improving adhesion with the photosensitive layer.
粗面化方法としては、一般に公知のブラシ研摩法、ボー
ル研摩法、電解エツチング、化学的エツチング、液体ホ
ーニング、サンドブラスト等の方法およびこれらの組合
せがあげられ、好ましくはブラシ研摩法、電解エツチン
グ、化学的エツチングおよび液体ホーニングがあげられ
、これらのうちで、特に電解エツチングの使用を含む粗
面化方法が好ましい。また、電解エツチングの際に用い
られる電解浴としては、酸、アルカリまたはそれらの塩
を含む水溶液あるいは有機溶剤を含む水性溶液が用いら
れ、これらのうちで特に塩酸、硝酸またはそれらの塩を
含む電解液が好ましい。さらに、粗面化処理の施された
アルミニウム板は、必要に応じて酸またはアルカリの水
溶液にてデスマット処理される。こうして得られたアル
ミニウム板は、陽極酸化処理されることが望ましく、特
に好ましくは、硫酸またはリン酸を含む浴で処理する方
法があげられる。また、さらに必要に応じて、ケイ酸ア
ルカリや熱水による封孔処理、その池水溶性高分子化合
物や弗化ジルコニウム酸カリウム水溶液への浸漬などに
よる表面処理を行うことができる。Examples of the surface roughening method include generally known methods such as brush polishing, ball polishing, electrolytic etching, chemical etching, liquid honing, sandblasting, etc., and combinations thereof, and preferably brush polishing, electrolytic etching, and chemical etching. Mention may be made of target etching and liquid honing, among which roughening methods involving the use of electrolytic etching are particularly preferred. The electrolytic bath used in electrolytic etching is an aqueous solution containing an acid, an alkali, or a salt thereof, or an aqueous solution containing an organic solvent. Liquid is preferred. Further, the roughened aluminum plate is desmutted with an acid or alkali aqueous solution, if necessary. It is desirable that the aluminum plate thus obtained is subjected to anodizing treatment, and particularly preferred is a method of treatment in a bath containing sulfuric acid or phosphoric acid. Further, if necessary, a sealing treatment using an alkali silicate or hot water, and a surface treatment such as immersion in a water-soluble polymer compound or an aqueous potassium fluorozirconate solution can be performed.
上述の感光性組成物を支持体上に設けるには、感光性ジ
アゾ共縮合樹脂、親油性高分子化合物、および必要に応
じて種々の添加剤の所定量を適当な溶媒(メチルセロソ
ルブ、エチルセロソルブ、メチルセロソルブアセテート
、アセトン、メチルエチルケトン、メタノール、ジメチ
ルホルムアミド、ジメチルスルホキシド、水又はこれら
の混合物等)中に溶解させ感光性組成物の塗布液を調整
し、これを支持体上に塗布、乾燥すればよい。塗布する
際の感光性組成物の濃度は1〜50重量%の範囲とする
ことが望ましい。この場合、感光性組成物の塗布量は、
おおむね、0.2〜10g/rrf程度とすればよい。To provide the above photosensitive composition on a support, predetermined amounts of a photosensitive diazo cocondensation resin, a lipophilic polymer compound, and, if necessary, various additives are added to a suitable solvent (methyl cellosolve, ethyl cellosolve). , methyl cellosolve acetate, acetone, methyl ethyl ketone, methanol, dimethyl formamide, dimethyl sulfoxide, water, or a mixture thereof, etc.) to prepare a coating solution of the photosensitive composition, and apply this onto a support and dry it. good. The concentration of the photosensitive composition during coating is preferably in the range of 1 to 50% by weight. In this case, the coating amount of the photosensitive composition is
In general, it may be about 0.2 to 10 g/rrf.
支持体上に塗布された感光材料は、従来の常法が適用さ
れる。すなわち、線画像、網点画像等を有する透明原画
を通して感光し、次いで、水性現像液で現像することに
より、原画に対してネガのレリーフ像が得られる。露光
に好適な活性光の光源としては、カーボンアーク灯、水
銀灯、キセノンランプ、メタルハライドランプ、ストロ
ボ等が挙げられる。Conventional methods are applied to the photosensitive material coated on the support. That is, by exposing a transparent original image having a line image, a halftone image, etc. to light, and then developing it with an aqueous developer, a negative relief image can be obtained with respect to the original image. Examples of active light sources suitable for exposure include carbon arc lamps, mercury lamps, xenon lamps, metal halide lamps, strobes, and the like.
本発明に係る感光性組成物の現像処理に用いられる現像
液は、特定の有機溶媒と、アルカリ剤と、水とを必須成
分として含有する。ここに特定の有機溶媒とは、現像液
中に含有させたとき上述の感光性組成物層の非露光部(
非画像部)を溶解又は膨潤することができ、しかも常温
(20℃)において水に対する溶解度が10重量%以下
の有機溶媒をいう。このような有機溶媒としては上記の
ような特性を有するものでありさえすればよく、以下の
もののみに限定されるものではないが、これらを例示す
るならば、例えば酢酸エチル、酢酸プロピル、酢酸ブチ
ル、酢酸アミン、酢酸ベンジル、エチレングリコールモ
ノブチルアセテート、乳酸ブチル、レブリン酸ブチルの
ようなカルボン酸エステル;エチルブチルケトン、メチ
ルイソブチルケトン、シクロヘキサノンのようなケトン
類;エチレングリコールモノブチルエーテル、エチレン
グリコールベンジルエーテル、エチレングリコールモノ
フェニルエーテル、ベンジルアルコール、メチルフェニ
ルカルビノール、n−アミルアルコール、メチルアミル
アルコールのようなアルコール類;キシレンのようなア
ルキル置換芳香族炭化水素;メチレンジクロライド、エ
チレンジクロライド、モノクロロベンゼンのようなハロ
ゲン化炭化水素などがある。これら有機溶媒は一種以上
用いてもよい。これら有機溶媒の中では、エチレングリ
コールモノフェニルエーテルとベンジルアルコールが特
に有効である。また、これら有機溶媒の現像液中におけ
る含有量は、おおむね1〜20重量%であり特に2〜1
0重量%のときより好ましい結果を得る。The developer used for developing the photosensitive composition according to the present invention contains a specific organic solvent, an alkaline agent, and water as essential components. The specific organic solvent herein refers to the non-exposed area (
An organic solvent that can dissolve or swell the non-image area) and has a solubility in water of 10% by weight or less at room temperature (20°C). Such organic solvents only need to have the above-mentioned characteristics, and are not limited to the following, examples of which include ethyl acetate, propyl acetate, and acetic acid. Carboxylic acid esters such as butyl, amine acetate, benzyl acetate, ethylene glycol monobutyl acetate, butyl lactate, butyl levulinate; ketones such as ethyl butyl ketone, methyl isobutyl ketone, cyclohexanone; ethylene glycol monobutyl ether, ethylene glycol benzyl Alcohols such as ether, ethylene glycol monophenyl ether, benzyl alcohol, methylphenyl carbinol, n-amyl alcohol, methyl amyl alcohol; alkyl-substituted aromatic hydrocarbons such as xylene; methylene dichloride, ethylene dichloride, monochlorobenzene. There are halogenated hydrocarbons such as One or more of these organic solvents may be used. Among these organic solvents, ethylene glycol monophenyl ether and benzyl alcohol are particularly effective. The content of these organic solvents in the developer is generally 1 to 20% by weight, particularly 2 to 1% by weight.
More preferable results are obtained when the amount is 0% by weight.
他方、現像液中に必須成分として含有されるアルカリ剤
としては、
(A)ケイ酸ナトリウム、ケイ酸カリウム、水酸化カリ
ウム、水酸化ナトリウム、水酸化リチウム、第二又は第
三リン酸のナトリウム又はアンモニウム塩、メタケイ酸
ナトリウム、炭酸ナトリウム、アンモニア等の無機アル
カリ剤、
(B)モノ、ジ又はトリメチルアミン、モノ、ジ又はト
リエチルアミン、モノ又はジイソプロピルアミン、n−
ブチルアミン、モノ、ジ又はトリエタノールアミン、モ
ノ、ジ又はトリイソプロパツールアミン、エチレンイミ
ン、エチレンジアミン等の有機アミン化合物等が挙げら
れる。On the other hand, the alkaline agents contained as essential components in the developer include (A) sodium silicate, potassium silicate, potassium hydroxide, sodium hydroxide, lithium hydroxide, sodium dibasic or tertiary phosphate, or Inorganic alkaline agents such as ammonium salts, sodium metasilicate, sodium carbonate, ammonia, etc. (B) Mono-, di- or trimethylamine, mono-, di- or triethylamine, mono- or diisopropylamine, n-
Examples include organic amine compounds such as butylamine, mono-, di-, or triethanolamine, mono-, di-, or triisopropanolamine, ethyleneimine, and ethylenediamine.
これらアルカリ剤の現像液中における含有量は通常0.
05〜4重量%で、好ましくは0.5〜2重景%である
。The content of these alkaline agents in the developer is usually 0.
0.5 to 4% by weight, preferably 0.5 to 2% by weight.
また、保存安定性、耐剛性等をより以上に高めるために
は、水溶性亜硫酸塩を現像液中に含有させることが好ま
しい。このような水溶性亜硫酸塩としては、亜硫酸のア
ルカリ又はアルカリ土類金属塩が好ましく、例えば亜硫
酸ナトリウム、亜硫酸カリウム、亜硫酸リチウム、亜硫
酸マグネシウム等がある。これらの亜硫酸塩の現像液組
成物における含有量は通常0.05〜4重景%で、好ま
しくは、o、 i〜1重量%である。Further, in order to further improve storage stability, rigidity resistance, etc., it is preferable to include a water-soluble sulfite in the developer. Such water-soluble sulfites are preferably alkali or alkaline earth metal salts of sulfite, such as sodium sulfite, potassium sulfite, lithium sulfite, magnesium sulfite, and the like. The content of these sulfites in the developer composition is usually 0.05 to 4% by weight, preferably 0.1 to 1% by weight.
かかる現像液を、像様露光後の感光性組成物と接触させ
たり、あるいは現像液によりすったりすれば、おおむね
常温〜4o℃にて10〜60秒後には、感光性組成物層
の露光部に悪影響を及ぼすことなく、非露光部の感光性
組成物が完全に除去され、たとえば感光性平版印刷板が
得られる。If such a developer is brought into contact with the photosensitive composition after imagewise exposure or is rubbed with the developer, the exposed areas of the photosensitive composition layer will be removed after 10 to 60 seconds at room temperature to 4oC. The photosensitive composition in non-exposed areas is completely removed without adversely affecting the surface of the photosensitive lithographic printing plate, for example, resulting in a photosensitive lithographic printing plate.
次に本発明に係るジアゾ共縮合樹脂の代表的な合成例を
示す。Next, a typical synthesis example of the diazo cocondensation resin according to the present invention will be shown.
次に本発明に係るジアゾ共縮合樹脂の代表的な合成例を
示す。Next, a typical synthesis example of the diazo cocondensation resin according to the present invention will be shown.
(合成例1)
p−ヒドロキシ安息香酸3.5 g (0,025モル
)および4−ジアゾジフェニルアミン硫酸塩22.0
g(0,025モル)を水冷下で90gの濃硫酸に溶解
した。この反応後に2.7gのパラホルムアルデヒド(
0,09モル)をゆっくり添加した。この際、反応温度
が10℃を超えないように添加していった。(Synthesis Example 1) 3.5 g (0,025 mol) of p-hydroxybenzoic acid and 22.0 g of 4-diazodiphenylamine sulfate
g (0,025 mol) was dissolved in 90 g of concentrated sulfuric acid under water cooling. After this reaction, 2.7 g of paraformaldehyde (
0.09 mol) was added slowly. At this time, the addition was carried out so that the reaction temperature did not exceed 10°C.
その後、2時間水冷下かくはんを続けた。この反応混合
物を水冷下、1)のエタノールに注入し、生じた沈殿を
濾過した。エタノールで洗浄後、この沈殿物を200m
j2の純水に溶解し、この液に10、5 gの塩化亜鉛
を溶解した冷濃厚水溶液を加えた。生じた沈殿を濾過し
た後エタノールで洗浄し、これを300mj2の純水に
溶解した。この液に13.7 gのへキサフルオロリン
酸アンモニウムを溶解した冷濃厚水溶液を加えた。生じ
た沈殿を濾別し水洗した後、30℃、1昼夜乾燥してジ
アゾ共縮合樹脂−1を得た。Thereafter, stirring was continued for 2 hours under water cooling. This reaction mixture was poured into the ethanol of 1) under water cooling, and the resulting precipitate was filtered. After washing with ethanol, this precipitate was washed with 200 m
j2 of pure water, and to this solution was added a cold concentrated aqueous solution in which 10.5 g of zinc chloride was dissolved. The resulting precipitate was filtered, washed with ethanol, and dissolved in 300 mj2 of pure water. A cold concentrated aqueous solution containing 13.7 g of ammonium hexafluorophosphate was added to this solution. The resulting precipitate was filtered, washed with water, and then dried at 30° C. for one day and night to obtain diazo cocondensation resin-1.
このジアゾ共縮合樹脂−1をゲルパーミェーションクロ
マトグラフィー(以下GPCと略記する)により分子量
を測定したところ、重量平均分子量で約2000であっ
た。The molecular weight of this diazo cocondensation resin-1 was measured by gel permeation chromatography (hereinafter abbreviated as GPC), and the weight average molecular weight was about 2,000.
前記のその他のジアゾ共縮合樹脂についても、合成例1
と同様の方法によって合成することができる。Regarding the other diazo cocondensation resins mentioned above, Synthesis Example 1
It can be synthesized by the same method as .
次に、本発明に係る親油性高分子化合物の合成例を示す
。Next, a synthesis example of the lipophilic polymer compound according to the present invention will be shown.
(親油性高分子化合物1の合成)
N−(4−ヒドロキシフェニル)メタクリルアミド10
.0g、アクリロニトリル25g1エチルアクリレート
60g、メタクリル酸5gおよびアゾビスイソブチロニ
トリル1,642 gをアセトン−メタノール1:1混
合溶液1)2mj!に溶解し、窒素置換した後60℃で
8時間加熱した。(Synthesis of lipophilic polymer compound 1) N-(4-hydroxyphenyl) methacrylamide 10
.. 0g, acrylonitrile 25g1 ethyl acrylate 60g, methacrylic acid 5g and azobisisobutyronitrile 1,642g in acetone-methanol 1:1 mixed solution 1) 2mj! After dissolving the mixture in a nitrogen atmosphere, the mixture was heated at 60° C. for 8 hours.
反応終了後、反応液を水51にかくはん下注ぎ、生じた
白色沈殿を濾取乾燥して親油性高分子化合物1を90g
得た。After the reaction is completed, the reaction solution is stirred and poured into water 51, and the resulting white precipitate is filtered and dried to obtain 90 g of lipophilic polymer compound 1.
Obtained.
この親油性高分子化合物1をGPCにより分子量の測定
をしたところ、重量平均分子量は8.5万であった。When the molecular weight of this lipophilic polymer compound 1 was measured by GPC, the weight average molecular weight was 85,000.
(親油性高分子2の合成) 2−ヒドロキシエチルメタクリレート50.0g。(Synthesis of lipophilic polymer 2) 50.0 g of 2-hydroxyethyl methacrylate.
アクリロニトリル20g、メチルメタクリレート25g
、メタクリル酸5gと1.2gの過酸化ベンゾイルの混
合液を、100℃に加熱したエチレングリコールモノメ
チルエーテル300gに2時間かけて滴下した。滴下終
了後エチレングリコールモノメチルエーテル300gと
過酸化ベンゾイル0.3gを加えてそのまま4時間反応
させた。反応終了後メタノールで稀釈して水51中にか
くはん下注ぎ、生じた白色沈殿を濾取乾燥して親油性高
分子化合物2を90g得た。Acrylonitrile 20g, methyl methacrylate 25g
A mixture of 5 g of methacrylic acid and 1.2 g of benzoyl peroxide was added dropwise over 2 hours to 300 g of ethylene glycol monomethyl ether heated to 100°C. After the dropwise addition was completed, 300 g of ethylene glycol monomethyl ether and 0.3 g of benzoyl peroxide were added, and the mixture was allowed to react for 4 hours. After the reaction was completed, the mixture was diluted with methanol and poured into water 51 with stirring, and the resulting white precipitate was collected by filtration and dried to obtain 90 g of lipophilic polymer compound 2.
この親油性高分子化合物をGPCにより分子量の測定を
したところ、重量平均分子量は6.5万であった。When the molecular weight of this lipophilic polymer compound was measured by GPC, the weight average molecular weight was 65,000.
(親油性高分子化合物3の合成)
2−ヒドロキシエチルメタクリレート45g1アクリロ
ニトリル10g1エチルメタクリレート35g1メタク
リル酸10gと1.2gの過酸化ベンゾイルの混合液を
親油性高分子化合物2の合成の場合と同様にエチレング
リコールモノメチルエーテルに滴下し親油性高分子3を
90g得た。(Synthesis of lipophilic polymer compound 3) A mixed solution of 45 g of 2-hydroxyethyl methacrylate, 10 g of acrylonitrile, 35 g of ethyl methacrylate, 10 g of methacrylic acid, and 1.2 g of benzoyl peroxide was added to ethylene in the same manner as in the synthesis of lipophilic polymer compound 2. The mixture was added dropwise to glycol monomethyl ether to obtain 90 g of lipophilic polymer 3.
この親油性高分子化合物をGPCにより分子量の測定を
したところ、重量平均分子量は6.2万であった。When the molecular weight of this lipophilic polymer compound was measured by GPC, the weight average molecular weight was 62,000.
(親油性高分子化合物4の合成)
窒素気流下で、アセトン100gとメタノール100g
の混合溶媒に、N−(4−ヒドロキシフェニル)メタク
ールアミド25g1アクリロニトリル4.0g、メチル
アクリレ−)18g、エチルアクリレート60g、メタ
クリル酸10g及び、アゾビスイソブチロニトリル3.
5gを溶解し、この混合液を攪拌しながら、60℃で8
時間加熱した。反応終了後、反応液を水中に投じ、生じ
た白色沈澱を濾取乾燥して、親油性高分子化合物4を1
)0g得た。真空乾燥させたこの共重合体の重量平均分
子量は1)万であった。(Synthesis of lipophilic polymer compound 4) Under a nitrogen stream, 100 g of acetone and 100 g of methanol
To a mixed solvent of 25 g of N-(4-hydroxyphenyl) methacoolamide, 4.0 g of acrylonitrile, 18 g of methyl acrylate, 60 g of ethyl acrylate, 10 g of methacrylic acid, and 3.0 g of azobisisobutyronitrile.
5g was dissolved, and the mixture was heated at 60℃ for 8 hours while stirring.
heated for an hour. After completion of the reaction, the reaction solution was poured into water, the white precipitate formed was filtered and dried, and the lipophilic polymer compound 4 was dissolved into 1
) 0g obtained. The weight average molecular weight of this vacuum-dried copolymer was 10,000.
(実施例1)
アルミニウム板を3%水酸化ナトリウム水溶液にて脱脂
し、これを2%塩酸浴中で25°C13A/dm2の電
流密度で電解エツチングし、水洗後30%硫酸浴中で3
0℃、1.5 A /dm2の条件で2分間陽極酸化処
理した。次に1%メタケイ酸ナトリウム水溶液85℃、
30秒間封孔処理し、水洗、乾燥して、平版印刷用アル
ミニウム板を得た。このアルミニウム板に次のような組
成の感光液を乾燥後の膜重量が1.5g/m”となるよ
うに塗布した。(Example 1) An aluminum plate was degreased with a 3% aqueous sodium hydroxide solution, electrolytically etched in a 2% hydrochloric acid bath at a current density of 13 A/dm2 at 25°C, and after washing with water, etched in a 30% sulfuric acid bath for 30 minutes.
Anodic oxidation treatment was performed for 2 minutes at 0°C and 1.5 A/dm2. Next, 1% sodium metasilicate aqueous solution at 85°C,
The pores were sealed for 30 seconds, washed with water, and dried to obtain an aluminum plate for planographic printing. A photosensitive liquid having the following composition was applied to this aluminum plate so that the film weight after drying was 1.5 g/m''.
感光液−1
親油性高分子化合物−15,0g
ジアゾ共縮合樹脂−1(合成例1)0.5gメチルセロ
ソルブ 100m1l得られた感光性平版
印刷版をネガ透明原画を密着させて、2KWのメタルハ
ライドランプで60cmの距離から30秒間露光し、下
記組成の現像液−1により、25℃、40秒間現像を行
った。Photosensitive liquid-1 Lipophilic polymer compound-15.0g Diazo cocondensation resin-1 (Synthesis example 1) 0.5g Methyl cellosolve 100ml 1l The obtained photosensitive lithographic printing plate was brought into close contact with a negative transparent original image, and 2KW metal halide was applied. The film was exposed to light from a distance of 60 cm using a lamp for 30 seconds, and developed at 25° C. for 40 seconds using developer-1 having the following composition.
現像液−1の組成
ベンジルアルコール 50gトリエ
タノールアミン 15g亜硫酸ソーダ
5gブチルナフタレンスル
ホン酸ソーダ 25g水
1000g次に、現像液−1に等容量
の純水を加えた希釈現像液(現像液−2)および2倍量
の純水を加えた希釈現像液(現像液−3)を用意し、上
記と同様にして現像を行ったところ、いずれの場合にも
非画像部に現像不良(汚れ)が生ずることな(良好な印
刷版が得られた。次に非画像部のジアゾ残りを調べるた
め、こうして得られた印刷版の非画像部分について半分
を再度露光し、再露出しない部分と比較したところ、目
視では区別ができなかった。また、上述の感光性平版印
刷版を強制保存(55℃、濃度O%RH13日間)した
後に、上述と同様の製版を行ったところ、いずれの現像
液の場合についても汚れが生ずることなく、良好な印刷
版を得ることができた。Composition of developer-1 Benzyl alcohol 50g Triethanolamine 15g Sodium sulfite 5g Sodium butylnaphthalene sulfonate 25g Water
1000gNext, prepare a diluted developer (Developer-2) in which an equal volume of pure water was added to Developer-1 and a diluted developer (Developer-3) in which twice the amount of pure water was added, and the above When development was carried out in the same manner as above, in both cases, a good printing plate was obtained with no developing defects (stains) in the non-image areas.Next, to examine the diazo residue in the non-image areas, When half of the non-image area of the thus obtained printing plate was exposed again and compared with the area that was not re-exposed, it could not be visually distinguished.Also, the above-mentioned photosensitive lithographic printing plate was subjected to forced storage (55℃, When the plate making was carried out in the same manner as described above, good printing plates were obtained without staining in any of the developing solutions.
以上のようにして得られた印刷版をオフセット印刷機に
かけて印刷したところ、シャープでコントラストのきい
た画像良好な印刷物が多数枚得られた。When the printing plate obtained as described above was printed on an offset printing machine, a large number of prints with sharp and high contrast images were obtained.
(比較例−1)
実施例1における感光液−1において、ジアゾ共縮合樹
脂−1を、次のようなジアゾ樹脂−1に代えた以外は実
施例1と同様にした。ジアゾ樹脂−1は、合成例1にお
いて、p−ヒドロキシ安息香酸を除いて、4−ジアゾジ
フェニルアミン硫酸塩29.3g(0,1モル)を原料
として使用した以外は、合成例1と同様にして得た。得
られた4−ジアゾジフェニルアミン六フッ化リン酸塩−
ホルムアルデヒド樹脂はGPCにより分子量を測定した
ところ、重量平均分子量で約2300であった。(Comparative Example-1) The same procedure as in Example 1 was carried out except that the diazo cocondensation resin-1 in the photosensitive liquid-1 in Example 1 was replaced with the following diazo resin-1. Diazo resin-1 was prepared in the same manner as in Synthesis Example 1, except that p-hydroxybenzoic acid was omitted and 29.3 g (0.1 mol) of 4-diazodiphenylamine sulfate was used as the raw material. Obtained. The obtained 4-diazodiphenylamine hexafluorophosphate
The molecular weight of the formaldehyde resin was measured by GPC, and the weight average molecular weight was approximately 2,300.
結果として、現像液−3を用いて現像した場合に、印刷
版の非画像部分に汚れが生じた。また、強制保存した感
光性平版印刷版については現像液−2及び現像液−3の
場合に非画像部に汚れが生じた。As a result, when developed using developer-3, stains occurred in the non-image areas of the printing plate. In addition, with respect to the photosensitive lithographic printing plates that were forcibly stored, stains occurred in the non-image areas in the case of Developer Solution-2 and Developer Solution-3.
一方、非画像部のジアゾ残りについては、現像液−1を
用いて良好な現像が得られた印刷版について、非画像部
の半分を再度露光し、再露光しない部分とを比較したと
ころ、目視ではっきりとジアゾ残りが再露光しない部分
に観察された。On the other hand, regarding the diazo residue in the non-image area, when half of the non-image area of the printing plate that was well developed using developer-1 was re-exposed and compared with the area that was not re-exposed, it was visually observed. Diazo residue was clearly observed in areas that were not re-exposed.
(実施例2)
実施例1と同様のアルミニウム板に次のような組成の感
光液を乾燥後の層重量が1.7 g /m2となるよう
に塗布した。(Example 2) A photosensitive liquid having the following composition was coated on the same aluminum plate as in Example 1 so that the layer weight after drying was 1.7 g/m2.
感光液−2
親油性高分子化合物−25,0g
2.4−ジヒドロキシ安息香酸−4−ジアゾフェニルア
ミン・2−ヒドロキシ−4−メトキシベンゾフェノン−
5−スルホン酸塩−ホルムアルデヒド樹脂(合成例1と
同様に合成したもの、重量平均分子量的2,500)
0.7 g(日本純楽■製)
0.3g
メチルセロソルブ 100ml得ら
れた感光性平版印刷版を実施例1と同様の条件で40秒
間露光し、実施例1で用いたのと同じ現像液−1〜3に
より、30℃、20秒間現像を行ったところ、いずれの
場合にも非画像部に汚れのない良好な印刷版が得られた
。次に実施例1と同様にして非画像部のジアゾ残りを調
べたところ、目視では観察できなかった。また、強制保
存した感光性平版印刷版について現像したところ、汚れ
が見られず、印刷の結果も良好であった。Photosensitive liquid-2 Lipophilic polymer compound-25.0g 2.4-dihydroxybenzoic acid-4-diazophenylamine/2-hydroxy-4-methoxybenzophenone-
5-sulfonate-formaldehyde resin (synthesized in the same manner as Synthesis Example 1, weight average molecular weight 2,500)
0.7 g (manufactured by Nippon Junraku) 0.3 g Methyl cellosolve 100 ml The obtained photosensitive lithographic printing plate was exposed for 40 seconds under the same conditions as in Example 1, and the same developer used in Example 1 was used. -1 to 3, development was performed at 30°C for 20 seconds, and in all cases, good printing plates with no stains in non-image areas were obtained. Next, when the diazo residue in the non-image area was examined in the same manner as in Example 1, it could not be visually observed. Furthermore, when the photosensitive lithographic printing plates that had been forcibly stored were developed, no stains were observed and the printing results were good.
(実施例3)
脱脂したアルミニウム板を400メツシユのバミストン
ー水懸濁液を用いて液体ホーニング法により、1次砂目
を形成した後、次いで10%水酸化ナトリウムで表面を
軽くエツチングし、さらに2%硝酸浴中で30℃、IO
A/dm2の電流密度で電解エツチングして2次砂目を
形成した。次に実施例1の同様にして陽極酸化処理およ
び封孔処理を行い、平版印刷版用アルミニウム板を得た
。(Example 3) After forming primary grains on a degreased aluminum plate by a liquid honing method using 400 mesh of bumstone-water suspension, the surface was lightly etched with 10% sodium hydroxide, and % nitric acid bath at 30 °C, IO
Secondary grains were formed by electrolytic etching at a current density of A/dm2. Next, anodizing treatment and sealing treatment were performed in the same manner as in Example 1 to obtain an aluminum plate for a lithographic printing plate.
このアルミニウム板に次のような組成の感光液を乾燥後
の層重量が1.5g/m2となるように塗布した。A photosensitive liquid having the following composition was applied to this aluminum plate so that the layer weight after drying was 1.5 g/m<2>.
感光液−3
親油性高分子化合物−35,0g
4−(p−ヒドロキシアニリノ)安息香酸−4ジアゾジ
フエニルアミン・六フッ化リン酸塩−ホルムアルデヒド
樹脂
(重量平均分子量2,700) 0.7
gメチルセロソルブ 100mf得
られた感光性平版印刷版を実施例1と同様の条件で40
秒間露光し、実施例1で用いたのと同じ現像液−1〜3
により、30℃、20秒間現像を行ったところ、いずれ
の場合にも非画像部に汚れのない良好な印刷版が得られ
た。次に実施例1と同様にして非画像部のジアゾ残りを
調べたところ、目視では観察できなかった。また、強制
保存した感光性平版印刷版について現像したところ、汚
れが見られず、印刷の結果も良好であった。Photosensitive liquid-3 Lipophilic polymer compound-35.0g 4-(p-hydroxyanilino)benzoic acid-4diazodiphenylamine/hexafluorophosphate-formaldehyde resin (weight average molecular weight 2,700) 0. 7
g Methyl cellosolve 100mf The obtained photosensitive lithographic printing plate was processed under the same conditions as in Example 1 for 40
Exposure for seconds and the same developer solution-1 to 3 used in Example 1.
When development was carried out at 30° C. for 20 seconds, good printing plates with no stains in non-image areas were obtained in all cases. Next, when the diazo residue in the non-image area was examined in the same manner as in Example 1, it could not be visually observed. Furthermore, when the photosensitive lithographic printing plates that had been forcibly stored were developed, no stains were observed and the printing results were good.
(実施例4)
実施例1と同様のアルミニウム板に次のような組成の感
光液を乾燥後の層重量が1.6g/nfとなるように塗
布した。(Example 4) A photosensitive liquid having the following composition was coated on the same aluminum plate as in Example 1 so that the layer weight after drying was 1.6 g/nf.
感光液−4
親油性高分子化合物−45,0g
ジアゾ共縮合樹脂−1(合成例1) 0.7gオイ
ルブルー#603
(オリエント化学側型) 0.2gジュ
リマーMCl0L
(日本純薬■製> 0.3gメチ
ルセロソルブ 100mj!得られた
感光性平版印刷版を実施例1と同様の条件で40秒間露
光し、実施例1で用いたのと同じ現像液−1〜3により
、30℃、20秒間現像を行ったところ、いずれの場合
にも非画像部に汚れのない良好な印刷版が得られた。次
に実施例1と同様にして非画像部のジアゾ残りを調べた
ところ、目視では観察できなかった。また、強制保存し
た感光性平版印刷版について現像したところ、汚れが見
られず、印刷の結果も良好であった。Photosensitive liquid-4 Lipophilic polymer compound-45.0g Diazo cocondensation resin-1 (Synthesis example 1) 0.7g Oil Blue #603 (Orient chemical side type) 0.2g Jurimer MCl0L (manufactured by Nippon Pure Chemical Industries Ltd.) > 0 .3g Methyl cellosolve 100mj!The obtained photosensitive lithographic printing plate was exposed for 40 seconds under the same conditions as in Example 1, and then exposed to light for 20 seconds at 30°C using the same developer 1 to 3 used in Example 1. When development was carried out, a good printing plate with no stains in the non-image area was obtained in all cases.Next, the diazo residue in the non-image area was examined in the same manner as in Example 1, and it was visually observed. Furthermore, when the photosensitive lithographic printing plate that had been forcibly stored was developed, no stains were observed and the printing results were good.
以上の通り、本発明によれば、現像性に優れ、かつジア
ゾ残りを防止できる。As described above, according to the present invention, the developability is excellent and diazo residue can be prevented.
Claims (1)
つの水酸基を有する芳香族化合物と、芳香族ジアゾニウ
ム化合物とを構成単位として含む共縮合化合物を含有す
ることを特徴とする感光性組成物。(1) at least one carboxyl group and at least one
1. A photosensitive composition comprising a co-condensation compound containing an aromatic compound having two hydroxyl groups and an aromatic diazonium compound as constituent units.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63245335A JP2810998B2 (en) | 1987-10-15 | 1988-09-29 | Photosensitive composition |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26056087 | 1987-10-15 | ||
JP62-260560 | 1987-10-15 | ||
JP63245335A JP2810998B2 (en) | 1987-10-15 | 1988-09-29 | Photosensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0266A true JPH0266A (en) | 1990-01-05 |
JP2810998B2 JP2810998B2 (en) | 1998-10-15 |
Family
ID=26537188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63245335A Expired - Fee Related JP2810998B2 (en) | 1987-10-15 | 1988-09-29 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2810998B2 (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03240061A (en) * | 1990-02-19 | 1991-10-25 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
JPH04211253A (en) * | 1990-02-21 | 1992-08-03 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH04274430A (en) * | 1991-03-01 | 1992-09-30 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH04274429A (en) * | 1991-03-01 | 1992-09-30 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
JPH05142768A (en) * | 1991-11-20 | 1993-06-11 | Fuji Photo Film Co Ltd | Photosensitive composition |
US5414473A (en) * | 1992-08-03 | 1995-05-09 | Goldstar Co., Ltd. | Apparatus and method for enhancing transient edge of video signal |
US5849463A (en) * | 1994-03-03 | 1998-12-15 | Mitsubishi Chemical Corporation | Photosensitive composition |
KR100812186B1 (en) * | 2007-04-13 | 2008-03-12 | 주식회사 이제이텍 | Method for analysis total subsidence and method for prediction |
KR100897510B1 (en) * | 2009-02-04 | 2009-05-15 | 주식회사 남양이. 엔. 지 | To manufecture hydrogen fuel and the method of controlling hydrogen fuel at the peak of operating |
KR100911628B1 (en) * | 2007-06-19 | 2009-08-12 | 서강대학교산학협력단 | Method for refinement of images search results based on text query |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210039409A (en) | 2018-07-31 | 2021-04-09 | 닛토덴코 가부시키가이샤 | Optical pressure-sensitive adhesive composition and its use |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4912902A (en) * | 1972-05-16 | 1974-02-04 | ||
JPS5333116A (en) * | 1976-09-08 | 1978-03-28 | Hoechst Ag | Photosensitive copying composition |
-
1988
- 1988-09-29 JP JP63245335A patent/JP2810998B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4912902A (en) * | 1972-05-16 | 1974-02-04 | ||
JPS5333116A (en) * | 1976-09-08 | 1978-03-28 | Hoechst Ag | Photosensitive copying composition |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03240061A (en) * | 1990-02-19 | 1991-10-25 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
JPH04211253A (en) * | 1990-02-21 | 1992-08-03 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH04274430A (en) * | 1991-03-01 | 1992-09-30 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPH04274429A (en) * | 1991-03-01 | 1992-09-30 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
JPH05142768A (en) * | 1991-11-20 | 1993-06-11 | Fuji Photo Film Co Ltd | Photosensitive composition |
US5414473A (en) * | 1992-08-03 | 1995-05-09 | Goldstar Co., Ltd. | Apparatus and method for enhancing transient edge of video signal |
US5849463A (en) * | 1994-03-03 | 1998-12-15 | Mitsubishi Chemical Corporation | Photosensitive composition |
KR100812186B1 (en) * | 2007-04-13 | 2008-03-12 | 주식회사 이제이텍 | Method for analysis total subsidence and method for prediction |
KR100911628B1 (en) * | 2007-06-19 | 2009-08-12 | 서강대학교산학협력단 | Method for refinement of images search results based on text query |
KR100897510B1 (en) * | 2009-02-04 | 2009-05-15 | 주식회사 남양이. 엔. 지 | To manufecture hydrogen fuel and the method of controlling hydrogen fuel at the peak of operating |
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---|---|
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