JPH0266518A - Phase film integrated type transparent conductive film - Google Patents

Phase film integrated type transparent conductive film

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Publication number
JPH0266518A
JPH0266518A JP63216225A JP21622588A JPH0266518A JP H0266518 A JPH0266518 A JP H0266518A JP 63216225 A JP63216225 A JP 63216225A JP 21622588 A JP21622588 A JP 21622588A JP H0266518 A JPH0266518 A JP H0266518A
Authority
JP
Japan
Prior art keywords
film
transparent conductive
phase
transparent
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63216225A
Other languages
Japanese (ja)
Inventor
Hideki Omae
秀樹 大前
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP63216225A priority Critical patent/JPH0266518A/en
Publication of JPH0266518A publication Critical patent/JPH0266518A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Laminated Bodies (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

PURPOSE:To reduce the weight and thickness of the above film by integrating the phase plate of a transparent high-polymer film and a transparent conductive film. CONSTITUTION:A polysulfone film is laminated as a backing layer on at least one surface of the phase plate of the transparent high-polymer film and a transparent film having conductivity is laminated to at least one surface thereof. The transparent high-polymer film which has double refractiveness and is formed by controlling the retardation value so as to have nearly the same value as the value of an STN type liquid crystal panel is used as the phase plate. The high-polymer film having >=85% transmittance of 600nm ray, <=15nm double refractions as retardation <=2.0mm/kg photoelastic constant, and <=5% thermal shrinkage at 200 deg.C is adequate as the backing layer of the phase film. A composite oxide essentially composed of indium oxide is used as the transparent conductive material. The weight and thickness of the film are reduced in this way.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、STN (スーパーツイスト不マテインク)
型液晶白黒表示素子として用いるべく、リタデーション
値(Δn−d)を任意設計された高分子透明フィルム位
相膜の少なくとも片面の支持層としてポリスルホン系フ
ィルムを用いた位相膜一体型透明導電性フィルムに関す
るものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention is directed to STN (Super Twist Material Ink)
A phase film-integrated transparent conductive film using a polysulfone film as a support layer on at least one side of a polymer transparent film phase film whose retardation value (Δn-d) is arbitrarily designed for use as a black-and-white liquid crystal display element. It is.

〔従来の技術〕[Conventional technology]

従来よりSTN型液晶表示素子のカラー化を図るために
、様々な方法で白黒化が進められてきた。
Conventionally, in order to make STN type liquid crystal display elements color, various methods have been used to make them black and white.

元来績モードでは液晶の屈折率異方性と高ツイスト角の
為に入射した直線偏光は楕円偏光になって出てくるため
に、青紫色または黄緑色に着色して見えた。このままで
は素子のカラー化は不可能であり、かかる欠点に対して
この液晶パネルの上にまったく面対称なSTN型液晶パ
ネルを置くことにより、該パネルが位相補償板の役割を
果し、楕円偏光が元の直線偏光に戻るという原理に基づ
いた2要式STN方式により、白黒化が可能になり、コ
ントラストも元のSTN型液晶パネルと比較すると2倍
以上となり階調表示も可能となった。
Originally, in the optical mode, the linearly polarized light that entered the liquid crystal came out as elliptically polarized light due to the refractive index anisotropy and high twist angle, so it appeared colored blue-purple or yellow-green. In this state, it is impossible to colorize the device, but by placing a completely plane-symmetric STN type liquid crystal panel on top of this liquid crystal panel, this panel plays the role of a phase compensation plate, and the elliptically polarized light is The two-way STN system, which is based on the principle that light returns to its original linear polarization, makes it possible to display black and white, and the contrast is more than twice that of the original STN liquid crystal panel, making it possible to display gradations.

しかしながら液晶パネルを2層にすることで、パネルが
重く、厚くなり、また高精度を必要とするSTN液晶パ
ネルを2枚作製せねばならないことによりかなりのコス
トアンプとなった。
However, by making the liquid crystal panel two-layered, the panel becomes heavier and thicker, and two STN liquid crystal panels that require high precision must be manufactured, resulting in a considerable cost increase.

そこでかかる欠点を解決する為、該位相補償バネルの代
わりにSTN型液晶パネルと同じリタデーション値を有
する高分子透明フィルム位相板例えばポリカーボネート
仮等を貼り合わすことにより、2層成STNとほとんど
遜色ない白黒表示液晶パネルが可能となった。
Therefore, in order to solve this drawback, in place of the phase compensation panel, a polymer transparent film phase plate, such as a temporary polycarbonate film, having the same retardation value as the STN type liquid crystal panel is laminated. Display liquid crystal panels became possible.

しかしながらパネル作製後に位相板を貼り合わせるのは
光軸を合わせることも含めてうまく粘着させることが雛
しく、量産にはまだ問題が多い。
However, when bonding the phase plate together after the panel is manufactured, it is difficult to properly adhere the phase plate, including aligning the optical axis, and there are still many problems in mass production.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

本発明の目的とするところは高分子透明フィルム位相板
と透明導電性フィルムとを一体型にすることにより、S
TN型液晶白黒表示パネルの軽量薄型化をはかるととも
にパネル作製後に位相41を位置合せして貼り合せる工
程が省略でき、製造工程の簡略化を測り、歩留向上、コ
ストダウンを目的として、耐熱性に優れ、かつ光学的に
等方な高分子フィルムを位相板の支持層として用い、そ
の表面に透明性を有する有機高分子層を設けて平坦性を
高め、さらに透明感@、層を順次積層することにより、
−層のパネルだけで白黒表示の可能なSTN型液晶表示
素子材料として用い得る位相膜−体型透明導電性フィル
ムを提供するにある。
The purpose of the present invention is to integrate a polymeric transparent film phase plate and a transparent conductive film into a
In order to make the TN-type liquid crystal black and white display panel lighter and thinner, and to omit the process of aligning and bonding the phase 41 after panel fabrication, we aim to simplify the manufacturing process, improve yields, and reduce costs. An optically isotropic polymer film with excellent optical properties is used as the support layer of the phase plate, and a transparent organic polymer layer is provided on the surface to improve flatness. By doing so,
An object of the present invention is to provide a phase film-type transparent conductive film that can be used as an STN type liquid crystal display element material capable of displaying black and white with just a layer panel.

(課題を解決するための手段) 本発明は透明な高分子フィルム位相板の少なくとも片面
に支持層としてポリスルホン系フィルムを積層し、該積
層フィルムのいずれか一方の表面に透明導電性を有する
被膜を積層したことを特徴とする位相膜一体型透明導電
性フィルムである。
(Means for Solving the Problems) The present invention laminates a polysulfone film as a support layer on at least one side of a transparent polymer film phase plate, and coats one surface of the laminate film with a transparent conductive film. This is a transparent conductive film integrated with a phase film, which is characterized by being laminated.

本発明で使用する位相板としては、複屈折性を有する透
明な高分子フィルムで、そのリタデーション値がSTN
型液晶パネルのそれとほぼ同じ値を有するように制御さ
れたもの、例えばビニロン、ポリビニルアルコール、ポ
リカーボネート、ポリスチレンナイロン、酢酸ブチルセ
ルロース、セロハン等の樹脂を一軸延伸配向させてでき
たようなフィルムで複屈折性Δn−0,001〜0.1
で厚みd=10〜1100IIといったものである。(
Δn=dは0.1〜1.0μm1好ましくは0.9μm
)また少なくとも120”CX 2時間以上の耐熱性を
有するものが゛帝妙→頓望ましい。
The phase plate used in the present invention is a transparent polymer film having birefringence, and its retardation value is STN.
Birefringence is a film made by uniaxially stretching and aligning a resin such as vinylon, polyvinyl alcohol, polycarbonate, polystyrene nylon, butyl cellulose acetate, or cellophane, which is controlled to have almost the same value as that of a type liquid crystal panel. Sex Δn-0,001~0.1
The thickness d is 10 to 1100 II. (
Δn=d is 0.1 to 1.0 μm, preferably 0.9 μm
) It is also desirable that the material has a heat resistance of at least 120" CX for 2 hours or more.

位相膜の支持層としては、透明性が良く、光学的に等方
性であり、且耐熱性に優れた、更に、詳しくは600n
mの光線透過率が85%以上であり、且複屈折がリタデ
ーションにして+5nm以下であり、且光弾性常数が2
.0mm/kg以下であり、更に200°Cにおける熱
収縮率が5%以下である高分子フィルムが適しており、
具体的には、ポリスルホン、ポリエーテルスルホン、ビ
フェニル変性ポリエーテルスルホン、ポリアリルスルホ
ン等のポリスルホン系フィルムを用いることにより一体
型にできる。特にその特性に優れたポリエーテルスルホ
ン(以下PESと略記する)フィルムを用いることが望
ましい。ポリスルホン系フィルムは液晶表示素子用透明
電極として必要な透明性、機械的強度、耐エツチング性
、及び耐溶剤性t−備えている。またフィルム自体の平
坦性としてグイライン、プッ、異物などによる0、1μ
m以上の厚み方向の大きさの突起物は液晶パネルのセル
ギャップを乱し、色ムラの原因となる為に無いことが望
ましい。
For the support layer of the phase film, a material with good transparency, optical isotropy, and excellent heat resistance, more specifically, 600 nm
The light transmittance of m is 85% or more, the birefringence is +5 nm or less in terms of retardation, and the photoelastic constant is 2.
.. A polymer film having a heat shrinkage rate of 0 mm/kg or less and a heat shrinkage rate of 5% or less at 200°C is suitable.
Specifically, by using a polysulfone-based film such as polysulfone, polyethersulfone, biphenyl-modified polyethersulfone, or polyallylsulfone, it can be made into an integrated structure. In particular, it is desirable to use a polyether sulfone (hereinafter abbreviated as PES) film which has excellent properties. Polysulfone films have the transparency, mechanical strength, etching resistance, and solvent resistance necessary for transparent electrodes for liquid crystal display devices. In addition, the flatness of the film itself may be 0 or 1 μm due to guilines, bulges, foreign matter, etc.
Protrusions with a size of m or more in the thickness direction disturb the cell gap of the liquid crystal panel and cause color unevenness, so it is desirable that they be absent.

この表面に積層される透明導電性物質としては金、パラ
ジウムなどの貴金属や、酸化スズ、酸化インジウム、な
どの金属酸化物が選ばれるが、般には、ITO(インジ
ウム・ティン・オキサイド)と称される5〜15重1%
の酸化スズを含む酸化インジウムを主体とする複合酸化
物が用いられる。
The transparent conductive material laminated on this surface is selected from noble metals such as gold and palladium, and metal oxides such as tin oxide and indium oxide, but is generally referred to as ITO (indium tin oxide). 5-15 weight 1%
A composite oxide mainly composed of indium oxide containing tin oxide is used.

透明導電層を積層する方法としては真空蒸着法、スパッ
タリング法、イオンブレーティング法、プラズマCVD
法など一般的な薄膜、形成技術が利用できる。特にスパ
ッタリング法が適している。なお位相膜にポリスルホン
系フィルムを積層する場合、充分な密着強度を得るため
にウレタン樹脂系、エポキシ樹脂、シリコン樹脂或いは
合成ゴム系の接着剤で、少なくとも120℃×2時間以
上の耐熱性を存する接着剤を用いることが望ましい。又
ポリスルホン系フィルム面に透明導電層を積層する場合
、エポキシアクリレート、ウレタンアクリレート等をベ
ースにした紫外線硬化可能な樹脂組成物をアンダーコー
ト剤として使用することでより安定な品質が得られる。
Methods for laminating transparent conductive layers include vacuum evaporation, sputtering, ion blating, and plasma CVD.
General thin film formation techniques such as the method can be used. Particularly suitable is the sputtering method. When laminating a polysulfone film on the phase film, in order to obtain sufficient adhesion strength, use a urethane resin, epoxy resin, silicone resin, or synthetic rubber adhesive that has heat resistance of at least 120°C for 2 hours or more. It is preferable to use adhesive. Furthermore, when laminating a transparent conductive layer on the surface of a polysulfone film, more stable quality can be obtained by using an ultraviolet curable resin composition based on epoxy acrylate, urethane acrylate, etc. as an undercoat agent.

又ポリスルホン系フィルムの少なくとも一方の面、透明
導電層の内側に透明な絶縁層を積層することで、水医気
透過の防止、イオン物質移行の防止及び充分な耐候性を
付与することができる。その絶縁層としては5iOx(
X=1〜2)、TiO□、ZrCh、A1.O,、Ta
xes、NbzOs、CeO□、ZnOの透明金属酸化
物群から少なくとも一種が選ばれる。更に本発明の位相
板一体型透明導電性フィルムの導電層の反対側にハード
コード処理、或いは偏光板との接着性を向上するような
例えばプラズマ処理、コロナ処理、を機動コート等がな
されても良い。
Furthermore, by laminating a transparent insulating layer on at least one surface of the polysulfone film and inside the transparent conductive layer, it is possible to prevent water and air permeation, prevent ionic substance migration, and provide sufficient weather resistance. The insulating layer is 5iOx (
X=1-2), TiO□, ZrCh, A1. O,,Ta
At least one member is selected from the group of transparent metal oxides: xes, NbzOs, CeO□, and ZnO. Furthermore, the opposite side of the conductive layer of the phase plate-integrated transparent conductive film of the present invention may be subjected to a hard code treatment or a mobile coating such as plasma treatment, corona treatment, etc. to improve the adhesion to the polarizing plate. good.

〔実施例〕〔Example〕

本発明を更に実施例によって詳細に説明する。 The present invention will be further explained in detail by way of examples.

実施例1 ドクターコーター及び送風型乾燥機を備えたコーティン
グ装置を用いて製膜したPVAフィルムをロール型延伸
機を用いて縦方向に5倍に延伸してPVA位相膜を得た
。この膜の全複屈折度は0.03であり (そのときの
延伸軸方向とこれに垂直な方向の屈折率は約1.53と
1.56であった)、厚みはだいたい30μmでリタデ
ーション値としては0.9を得た。この位相膜の片面に
支持層として50μm厚PESフィルムを、もう一方の
面にも保護層として同じ<50μm厚PESフィルムを
それぞれウレタン系接着剤で貼り合せた。
Example 1 A PVA phase film was obtained by stretching a PVA film produced using a coating device equipped with a doctor coater and a blow dryer in the longitudinal direction five times using a roll stretching machine. The total birefringence of this film was 0.03 (the refractive indices in the direction of the stretching axis and in the direction perpendicular to this were approximately 1.53 and 1.56), the thickness was approximately 30 μm, and the retardation value As a result, 0.9 was obtained. A 50 μm thick PES film was bonded to one side of this phase film as a support layer, and the same <50 μm thick PES film was bonded to the other side as a protective layer using a urethane adhesive.

支持層となるPESフィルムには片面にアンダーコート
処理が既にほどこしである。この基板を該アンダーコー
ト面を表にして、高周波マグネトロンスパッタリング装
置の基板ホルダーに固定し、酸化スズを7.5重量%含
む酸化インジウムからなるターゲットを用いて5 X 
10−”Torrのアルゴンプラズマ中で300人厚入
退明導電性被膜を形成し、本発明の位相膜一体型透明導
電性フィルムを得た。
The PES film serving as the support layer has already been undercoated on one side. This substrate was fixed to a substrate holder of a high frequency magnetron sputtering device with the undercoated side facing up, and a target made of indium oxide containing 7.5% by weight of tin oxide was used to 5X
A 300-meter-thick conductive film was formed in an argon plasma at 10-'' Torr to obtain a transparent conductive film integrated with a phase film of the present invention.

応用例 実施例1で得られた位相膜一体型透明導電性フィルムを
用いて次に示す方法でSTN型液晶白黒表示素子を作成
した。
Application Example Using the phase film-integrated transparent conductive film obtained in Example 1, an STN type liquid crystal black and white display element was prepared by the following method.

フィルムの透明導電膜をパターニングし、これを視角方
向前部基板とし、後部基板としてPESフィルム単体の
透明導電性フィルムをパターニングしたものを用いた。
The transparent conductive film of the film was patterned and used as a front substrate in the viewing angle direction, and a patterned transparent conductive film consisting of a PES film alone was used as a rear substrate.

この両者電極面上にポリイミドからなる配向膜を形成し
、位相板の光軸を考えあわせた上で240°にツイスト
するようにラビング処理をほどこした。この両基板5μ
m平均粒径をスペーサーをはさみこんで、エポキシ系接
着剤で貼り合わせ、熱硬化せしめてセルを組み立てた。
An alignment film made of polyimide was formed on both electrode surfaces, and after considering the optical axis of the phase plate, a rubbing treatment was applied so as to twist it at 240°. Both boards are 5μ
A cell was assembled by inserting a spacer having an average particle size of m and bonding the particles together using an epoxy adhesive and curing with heat.

次に真空注入法により、あらかじめ設けておいた開口部
よりカイラル剤を添加したネマチック型液晶を注入し、
開口部を接着剤で封止した。
Next, using the vacuum injection method, nematic liquid crystal added with a chiral agent was injected through a pre-prepared opening.
The opening was sealed with adhesive.

このセルに適当な光軸で偏光板を貼り合せることにより
、フレキシブルな白黒表示のSTN型液晶パネルを得た
By bonding a polarizing plate to this cell with an appropriate optical axis, a flexible STN type liquid crystal panel with black and white display was obtained.

位相板一体型でない場合は偏光板を貼り合せる前に軸合
せを行なって位相板を貼り合せなければならないが、一
体型の場合、この工程を省略できるので工程の簡略化と
なりコストを下げることができる。
If the phase plate is not integrated, it is necessary to align the axes before attaching the polarizing plate and then attach the phase plate. However, in the case of an integrated type, this step can be omitted, which simplifies the process and reduces costs. can.

実施例2 実施例1と同様の方法により、2枚のPESフィルムで
貼り合せたPVA系位相板の片面にアンダーコート処理
を行い、高周波マグネトロンスパッタリング装置の基板
ホルダーに固定し、透明絶縁層としてSiO2を500
人厚入退成し、次いで酸化スズ、酸化インジウムターゲ
ットにより、ITOの薄膜を形成した。
Example 2 By the same method as in Example 1, one side of a PVA-based phase plate bonded with two PES films was undercoated, fixed to a substrate holder of a high-frequency magnetron sputtering device, and SiO2 was applied as a transparent insulating layer. 500
A thin film of ITO was then formed using tin oxide and indium oxide targets.

得られた基板の0□バリアー性は0.1cc/rrf・
2211rs・latmであった。
The 0□ barrier property of the obtained substrate was 0.1cc/rrf・
It was 2211rs・latm.

実施例3 実施例1と同様の方法によりPVA系位相膜を得た。一
方、下記に示す配合により光硬化性樹脂組成物を調整し
た。
Example 3 A PVA-based phase film was obtained in the same manner as in Example 1. On the other hand, a photocurable resin composition was prepared using the formulation shown below.

(A)イソシアナート成分としてイソホロンジイソシア
ナートを使用したウレタンアクリレート(日本合成化学
■製・U V −3000B )100重量部 (B)エピコート#1004 (商品名:油化シェルエ
ポキシ■製エビビス型エポキシ樹脂)とアクリル酸を反
応して得たエボキシアクリレート50重量部 (C)2−ヒドロキシプロピルアクリレート・−90〃 (D)2−ヒドロキシ−3−クロロプロピルメタクリレ
−1−−−m−−−30 (E)2−メチル−1−(4−メチルチオフェニル)−
2−モルフォリノプロパン−1−オン(イルガキュア9
07、チバ・ガイギー社製)・・・−3〃 (F)  n−ノニルフェノキシオキシエチレンアクリ
レート          −・−−−−−100(G
)1−(4−イソプロピルフェニル)−2−ヒドロキシ
−2−メチルプロパン−1−オン(ダロキュア1116
、メルク社製) 上記PVA系位相膜を、この樹脂組成物を片面に塗布し
た2枚のPESフィルム(70μm厚)ではさみ込み圧
締ロールでフィルム間に介在する空気と余分な樹脂組成
物を押し出し密着させた。これをただちに、80W/a
m高圧水銀灯2本をそなえた紫外線照射装置に2m/m
inのラインスピードで送り、紫外線を一回照射系した
のち、120“Cで5分間加熱しアニーリングした。
(A) 100 parts by weight of urethane acrylate using isophorone diisocyanate as the isocyanate component (UV-3000B manufactured by Nippon Gohsei ■) (B) Epicoat #1004 (product name: Ebisu type epoxy manufactured by Yuka Shell Epoxy ■) 50 parts by weight of epoxy acrylate obtained by reacting resin) with acrylic acid (C) 2-hydroxypropyl acrylate -90〃 (D) 2-hydroxy-3-chloropropyl methacrylate-1---m--- 30 (E)2-methyl-1-(4-methylthiophenyl)-
2-morpholinopropan-1-one (Irgacure 9
07, manufactured by Ciba Geigy)...-3 (F) n-nonylphenoxyoxyethylene acrylate ------100 (G
) 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one (Darocur 1116
(manufactured by Merck & Co., Ltd.) The above PVA-based phase film was sandwiched between two PES films (70 μm thick) coated with this resin composition on one side, and the air interposed between the films and the excess resin composition was removed using a pressure roll. I pushed it out and made it stick. Immediately turn this on to 80W/a
2 m/m to an ultraviolet irradiation device equipped with two high-pressure mercury lamps
The film was fed at a line speed of 1.5 in., was irradiated with ultraviolet rays once, and then annealed by heating at 120"C for 5 minutes.

得られた偏光板のビール強度の評価結果を表1に示す。Table 1 shows the evaluation results of the beer strength of the obtained polarizing plate.

表1 実施例4 実施例3で得られた位相板の片面にアンダーコート層と
して下記に示す配合で得られた溶液を塗布した。
Table 1 Example 4 A solution obtained in the following formulation was applied as an undercoat layer to one side of the phase plate obtained in Example 3.

(A) イソシアネート成分としてイソホロンジイソシ
アネート、ポリオール成分として1.6ヘキサンジオー
ル、アクリル成分として2ヒドロキシエチルメククリレ
ートよりなる反応生成物のウレタンアクリレートプレポ
リマー(分子113200、融点55°C)  −−m
−−30重量部(B)エポキシアクリレートプレポリマ
−(分子盟約1040、融点55°C1昭和高分子■製
VR90)             −−一−−−7
0(C)ベンジルアルコール    −・−・300〃
(D)エチレングリコール   −・−・200〃(E
)メチルイソブチルケトン −−−−150//(F)
ベンゾインエチルエーテルーーーー−−・ 2 〃塗布
方法としてはボイラーを用い、80“Cで10分間加熱
して溶媒を除去した後80 W / cn+の高圧水銀
灯により15cmの距離で30秒間紫外線を照射し樹脂
層を硬化して行なった。コーティング膜厚は2,5μm
であった。
(A) Urethane acrylate prepolymer (molecules: 113,200, melting point: 55°C), a reaction product consisting of isophorone diisocyanate as an isocyanate component, 1.6 hexanediol as a polyol component, and 2-hydroxyethyl meccrylate as an acrylic component.
--30 parts by weight (B) Epoxy acrylate prepolymer (molecular approx. 1040, melting point 55°C1 VR90 manufactured by Showa Kobunshi ■) ---1 ---7
0(C) Benzyl alcohol -・-・300〃
(D) Ethylene glycol -・-・200〃(E
) Methyl isobutyl ketone -----150//(F)
Benzoin ethyl ether --- 2 As for the coating method, use a boiler and heat it at 80"C for 10 minutes to remove the solvent, then irradiate it with ultraviolet rays for 30 seconds at a distance of 15 cm using an 80 W/cn+ high pressure mercury lamp. This was done by curing the resin layer.The coating thickness was 2.5 μm.
Met.

このアンダーコート層の上に実施例1と同様な方法で透
明導電膜を300人厚入退成し、位相膜一体型透明導電
性フィルムとした。
A transparent conductive film having a thickness of 300 layers was deposited on this undercoat layer in the same manner as in Example 1 to obtain a phase film integrated transparent conductive film.

該フィルムの透明導電膜の密着性を次のような方法で評
価した。まず耐擦傷性の評価として、荷重をかけたガー
ゼで数回こすることを行なったが、表面抵抗値の変化は
数%以下であった。
The adhesion of the transparent conductive film of the film was evaluated by the following method. First, as an evaluation of scratch resistance, the surface resistance was rubbed several times with gauze under a load, and the change in surface resistance value was less than a few percent.

次に耐アルカリ性の評価として10%−NaO)lHに
10分間浸漬するという方法をとったが、表面抵抗値の
変化はほとんどなく、クランク等も発生しなかった。
Next, as an evaluation of alkali resistance, a method of immersing the sample in 10%-NaO)lH for 10 minutes was used, but there was almost no change in the surface resistance value and no cranking or the like occurred.

実施例5 実施例3.4と同様な方法で得られた片面アンダーコー
ト要件の位相板をDCマグネトロンスパッタリング装置
を真空チャンバー内の基板ホルダーに固定し、1時間排
気を行なった。この時のガス発生量は4 X 10−S
mbar−1/5ec−ctであった0次いで、インジ
ウムスズ合金がら成るターゲットを用い、アルゴンと酸
素の混合ガスプラズマによって、酸化インジウム・酸化
スズ複合酸化物(rTo)の薄膜を形成した。得られた
ITO薄膜の特性は膜厚250人、表面抵抗値300Ω
/口であり、場所によるバラツキの少ない均一な膜であ
った。
Example 5 A DC magnetron sputtering device was fixed to a substrate holder in a vacuum chamber for a phase plate obtained in the same manner as in Example 3.4 and required to be undercoated on one side, and the vacuum chamber was evacuated for 1 hour. The amount of gas generated at this time is 4 x 10-S
Next, a thin film of indium oxide/tin oxide composite oxide (rTo) was formed using a mixed gas plasma of argon and oxygen using a target made of an indium tin alloy. The characteristics of the obtained ITO thin film are a film thickness of 250 Ω and a surface resistance value of 300 Ω.
/ mouth, and the film was uniform with little variation depending on location.

実施例6 実施例1で得られた位相膜一体型透明導電性シイルムの
透明導電膜と反対側の表面にプラズマ処理をほどこして
やった。該フィルムに偏光板を貼り付けた液晶セルは6
0°C90%RHの耐湿熱試験5001(rs経過後も
偏光板のはがれも認められなかった。
Example 6 The surface of the transparent conductive film integrated with a phase film obtained in Example 1 on the side opposite to the transparent conductive film was subjected to plasma treatment. The liquid crystal cell with a polarizing plate attached to the film is 6
Humid and heat resistance test 5001 at 0°C and 90% RH (no peeling of the polarizing plate was observed even after rs had passed).

以上の説明から明らかな様に、本発明により位相膜、支
持層、透明導電性被膜が一体化されたリタデーション値
の制御できるSTN型液晶白黒表示素子用のフィルムが
得られた。
As is clear from the above description, according to the present invention, a film for an STN type liquid crystal black and white display element in which a phase film, a support layer, and a transparent conductive film are integrated and whose retardation value can be controlled was obtained.

〔発明の効果〕〔Effect of the invention〕

本発明による位相膜一体型透明導電性フィルムを用いる
ことにより、STN型液晶白黒表示パネル組み立て工程
に於ける位相板組み込みの手間が完全に省かれるため、
製造工程並びに製造工数を飛躍的に簡略化、低減でき、
大巾なコストダウンが可能となる。更に、軽量薄型化と
なり、フレキシンプル、曲面表示等プラスチック基板液
晶表示素子として用いる場合、プラスチックフィルムの
利点をそのまま生かせる。
By using the phase film-integrated transparent conductive film according to the present invention, the labor of assembling a phase plate in the STN type liquid crystal monochrome display panel assembly process can be completely eliminated.
The manufacturing process and manufacturing man-hours can be dramatically simplified and reduced.
Significant cost reductions are possible. Furthermore, it is lightweight and thin, and when used as a plastic substrate liquid crystal display element such as a flexible simple display or a curved display, the advantages of a plastic film can be utilized as is.

Claims (1)

【特許請求の範囲】[Claims] (1)複屈折性を有し、リタデーションを任意の値にあ
らかじめ設定された高分子透明フィルム位相膜の少なく
とも片面に支持層としてポリスルホン系フィルムを積層
し、該積層フィルムのいずれか一方の表面に透明導電性
を有する被膜を設けたことを特徴とする位相膜一体型透
明導電性フィルム。
(1) A polysulfone film is laminated as a support layer on at least one side of a polymer transparent film phase film having birefringence and retardation set to an arbitrary value, and one surface of the laminated film is A transparent conductive film integrated with a phase film, characterized in that it is provided with a transparent conductive film.
JP63216225A 1988-09-01 1988-09-01 Phase film integrated type transparent conductive film Pending JPH0266518A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63216225A JPH0266518A (en) 1988-09-01 1988-09-01 Phase film integrated type transparent conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63216225A JPH0266518A (en) 1988-09-01 1988-09-01 Phase film integrated type transparent conductive film

Publications (1)

Publication Number Publication Date
JPH0266518A true JPH0266518A (en) 1990-03-06

Family

ID=16685238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63216225A Pending JPH0266518A (en) 1988-09-01 1988-09-01 Phase film integrated type transparent conductive film

Country Status (1)

Country Link
JP (1) JPH0266518A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0588160A (en) * 1991-09-30 1993-04-09 Sharp Corp Plastic substrate liquid crystal element
JPH05297364A (en) * 1992-04-20 1993-11-12 Sharp Corp Liquid crystal display element with plastic substrate
JP2005216692A (en) * 2004-01-30 2005-08-11 Sekisui Jushi Co Ltd Resin molding and its method of manufacture
WO2010074194A1 (en) * 2008-12-25 2010-07-01 日東電工株式会社 Method for manufacturing liquid crystal display device and apparatus for manufacturing liquid crystal display device
JP4723045B1 (en) * 2010-06-24 2011-07-13 日東電工株式会社 Continuous production system for liquid crystal display panel and continuous production method for liquid crystal display panel

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0588160A (en) * 1991-09-30 1993-04-09 Sharp Corp Plastic substrate liquid crystal element
JPH05297364A (en) * 1992-04-20 1993-11-12 Sharp Corp Liquid crystal display element with plastic substrate
JP2005216692A (en) * 2004-01-30 2005-08-11 Sekisui Jushi Co Ltd Resin molding and its method of manufacture
JP4575676B2 (en) * 2004-01-30 2010-11-04 積水樹脂株式会社 Manufacturing method of resin molded products
WO2010074194A1 (en) * 2008-12-25 2010-07-01 日東電工株式会社 Method for manufacturing liquid crystal display device and apparatus for manufacturing liquid crystal display device
TWI472752B (en) * 2008-12-25 2015-02-11 Nitto Denko Corp The layered layer of polarizing plate and the laminated system of polarizing plate
JP4723045B1 (en) * 2010-06-24 2011-07-13 日東電工株式会社 Continuous production system for liquid crystal display panel and continuous production method for liquid crystal display panel
JP2012027003A (en) * 2010-06-24 2012-02-09 Nitto Denko Corp System for continuously manufacturing liquid crystal display panel and method for continuously manufacturing liquid crystal display panel
US9304339B2 (en) 2010-06-24 2016-04-05 Nitto Denko Corporation Method for manufacturing liquid crystal display panels

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