JPH0260245U - - Google Patents
Info
- Publication number
- JPH0260245U JPH0260245U JP14017088U JP14017088U JPH0260245U JP H0260245 U JPH0260245 U JP H0260245U JP 14017088 U JP14017088 U JP 14017088U JP 14017088 U JP14017088 U JP 14017088U JP H0260245 U JPH0260245 U JP H0260245U
- Authority
- JP
- Japan
- Prior art keywords
- image data
- data captured
- photomask blank
- sample
- storage time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007689 inspection Methods 0.000 claims description 6
- 230000007547 defect Effects 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 claims description 2
- 238000003384 imaging method Methods 0.000 claims 3
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
第１図は本考案の一実施例を示す図、第２図は
透過率分布を示す図、第３図は従来のブランク検
査方法を説明するための図、第４図はブランクと
その欠陥を説明するための図、第５図は従来の検
出方法を説明するための図である。
１１……ＣＣＤカメラ、１２……画像処理装置
、１３……制御装置、１４……モニタ、１５……
試料、１６……照明装置、１７……電源。
Fig. 1 shows an embodiment of the present invention, Fig. 2 shows a transmittance distribution, Fig. 3 shows a conventional blank inspection method, and Fig. 4 shows blanks and their defects. FIG. 5 is a diagram for explaining a conventional detection method. 11... CCD camera, 12... Image processing device, 13... Control device, 14... Monitor, 15...
Sample, 16...Lighting device, 17...Power supply.
Claims (1)
ータに基づき欠陥検査を行うことを特徴とするフ
オトマスクブランク検査装置。 (2) 撮像手段が冷却型ＣＣＤカメラである請求
項１記載のフオトマスクブランク検査装置。 (3) 蓄積時間可変の撮像手段により試料なしで
撮像した画像データと試料を置いて撮像した画像
データから得られる試料の透過率分布に基づき欠
陥検査するフオトマスクブランク検査装置。[Scope of Claim for Utility Model Registration] (1) A photomask blank inspection device characterized by performing defect inspection based on image data captured by an imaging device with variable storage time. (2) The photomask blank inspection apparatus according to claim 1, wherein the imaging means is a cooled CCD camera. (3) A photomask blank inspection device that performs defect inspection based on the transmittance distribution of the sample obtained from image data captured without a sample and image data captured with the sample placed using an imaging means with variable storage time.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14017088U JPH0260245U (en) | 1988-10-26 | 1988-10-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14017088U JPH0260245U (en) | 1988-10-26 | 1988-10-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0260245U true JPH0260245U (en) | 1990-05-02 |
Family
ID=31404100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14017088U Pending JPH0260245U (en) | 1988-10-26 | 1988-10-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0260245U (en) |
-
1988
- 1988-10-26 JP JP14017088U patent/JPH0260245U/ja active Pending
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