JPH0258555A - Production of fluorine-containing copolymer - Google Patents
Production of fluorine-containing copolymerInfo
- Publication number
- JPH0258555A JPH0258555A JP21111988A JP21111988A JPH0258555A JP H0258555 A JPH0258555 A JP H0258555A JP 21111988 A JP21111988 A JP 21111988A JP 21111988 A JP21111988 A JP 21111988A JP H0258555 A JPH0258555 A JP H0258555A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- vinyl ether
- group
- solvent
- carbon atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001577 copolymer Polymers 0.000 title claims abstract description 21
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 17
- 239000011737 fluorine Substances 0.000 title claims abstract description 17
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims abstract description 54
- 239000002904 solvent Substances 0.000 claims abstract description 33
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 150000001336 alkenes Chemical class 0.000 claims abstract description 20
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000000178 monomer Substances 0.000 claims abstract description 18
- 239000000203 mixture Substances 0.000 claims abstract description 17
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 16
- 150000001875 compounds Chemical class 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 11
- 150000002576 ketones Chemical class 0.000 claims abstract description 10
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 4
- 150000001340 alkali metals Chemical group 0.000 claims abstract description 4
- 125000000962 organic group Chemical group 0.000 claims abstract description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 18
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 12
- 150000007514 bases Chemical class 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 125000004437 phosphorous atom Chemical group 0.000 claims description 7
- 229910052698 phosphorus Inorganic materials 0.000 claims description 7
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 3
- MYHAAONPWPYATB-UHFFFAOYSA-N 2-chloro-1,1,3,4,4,5,6,6,7,8,8,8-dodecafluoro-5-(trifluoromethyl)oct-1-ene Chemical compound FC(C(F)(F)F)C(C(C(F)(F)F)(C(C(C(=C(F)F)Cl)F)(F)F)F)(F)F MYHAAONPWPYATB-UHFFFAOYSA-N 0.000 claims description 2
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 claims description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 2
- 125000004429 atom Chemical group 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 239000003973 paint Substances 0.000 abstract description 8
- 239000012046 mixed solvent Substances 0.000 abstract description 5
- 239000002994 raw material Substances 0.000 abstract description 4
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- 229960000834 vinyl ether Drugs 0.000 description 40
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 24
- -1 hydroxyalkyl vinyl ether Chemical compound 0.000 description 21
- 150000008065 acid anhydrides Chemical class 0.000 description 20
- 239000002585 base Substances 0.000 description 15
- 238000006116 polymerization reaction Methods 0.000 description 13
- 239000004135 Bone phosphate Substances 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 6
- 238000004070 electrodeposition Methods 0.000 description 6
- 238000001879 gelation Methods 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 239000002966 varnish Substances 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 5
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 5
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- 239000008199 coating composition Substances 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- HMBNQNDUEFFFNZ-UHFFFAOYSA-N 4-ethenoxybutan-1-ol Chemical compound OCCCCOC=C HMBNQNDUEFFFNZ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000005456 alcohol based solvent Substances 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 150000001339 alkali metal compounds Chemical class 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 150000003003 phosphines Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- RYNWBTUKZJGLPV-UHFFFAOYSA-N 2-ethenoxycyclohexan-1-ol Chemical compound OC1CCCCC1OC=C RYNWBTUKZJGLPV-UHFFFAOYSA-N 0.000 description 2
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- KDSNLYIMUZNERS-UHFFFAOYSA-N 2-methylpropanamine Chemical compound CC(C)CN KDSNLYIMUZNERS-UHFFFAOYSA-N 0.000 description 2
- UZEKMOGXCWDILU-UHFFFAOYSA-N 3-ethenoxycyclohexan-1-ol Chemical compound OC1CCCC(OC=C)C1 UZEKMOGXCWDILU-UHFFFAOYSA-N 0.000 description 2
- XLLBDKNJKVBVEZ-UHFFFAOYSA-N 4-ethenoxycyclohexan-1-ol Chemical compound OC1CCC(OC=C)CC1 XLLBDKNJKVBVEZ-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 229960002887 deanol Drugs 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- VZZJVOCVAZHETD-UHFFFAOYSA-N diethylphosphane Chemical compound CCPCC VZZJVOCVAZHETD-UHFFFAOYSA-N 0.000 description 2
- 239000012972 dimethylethanolamine Substances 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- MUTGBJKUEZFXGO-UHFFFAOYSA-N hexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21 MUTGBJKUEZFXGO-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- LAYAKLSFVAPMEL-UHFFFAOYSA-N 1-ethenoxydodecane Chemical compound CCCCCCCCCCCCOC=C LAYAKLSFVAPMEL-UHFFFAOYSA-N 0.000 description 1
- YAOJJEJGPZRYJF-UHFFFAOYSA-N 1-ethenoxyhexane Chemical compound CCCCCCOC=C YAOJJEJGPZRYJF-UHFFFAOYSA-N 0.000 description 1
- QJJDJWUCRAPCOL-UHFFFAOYSA-N 1-ethenoxyoctadecane Chemical compound CCCCCCCCCCCCCCCCCCOC=C QJJDJWUCRAPCOL-UHFFFAOYSA-N 0.000 description 1
- XXCVIFJHBFNFBO-UHFFFAOYSA-N 1-ethenoxyoctane Chemical compound CCCCCCCCOC=C XXCVIFJHBFNFBO-UHFFFAOYSA-N 0.000 description 1
- HAVHPQLVZUALTL-UHFFFAOYSA-N 1-ethenoxypropan-2-ol Chemical compound CC(O)COC=C HAVHPQLVZUALTL-UHFFFAOYSA-N 0.000 description 1
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 1
- IELYMBBIHQDONA-UHFFFAOYSA-N 1-prop-2-enoxyoctane Chemical compound CCCCCCCCOCC=C IELYMBBIHQDONA-UHFFFAOYSA-N 0.000 description 1
- YJJKYKYXZZCJEE-UHFFFAOYSA-N 2,2-diphenylethylphosphane Chemical compound C=1C=CC=CC=1C(CP)C1=CC=CC=C1 YJJKYKYXZZCJEE-UHFFFAOYSA-N 0.000 description 1
- JPSKCQCQZUGWNM-UHFFFAOYSA-N 2,7-Oxepanedione Chemical compound O=C1CCCCC(=O)O1 JPSKCQCQZUGWNM-UHFFFAOYSA-N 0.000 description 1
- KTIBRDNFZLYLNA-UHFFFAOYSA-N 2-(2-hydroxyethenoxy)ethenol Chemical compound OC=COC=CO KTIBRDNFZLYLNA-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- FNRYSYWADFALHR-UHFFFAOYSA-N 2-ethenoxy-2-methylpropan-1-ol Chemical compound OCC(C)(C)OC=C FNRYSYWADFALHR-UHFFFAOYSA-N 0.000 description 1
- PGYJSURPYAAOMM-UHFFFAOYSA-N 2-ethenoxy-2-methylpropane Chemical compound CC(C)(C)OC=C PGYJSURPYAAOMM-UHFFFAOYSA-N 0.000 description 1
- GNUGVECARVKIPH-UHFFFAOYSA-N 2-ethenoxypropane Chemical compound CC(C)OC=C GNUGVECARVKIPH-UHFFFAOYSA-N 0.000 description 1
- LTHNHFOGQMKPOV-UHFFFAOYSA-N 2-ethylhexan-1-amine Chemical compound CCCCC(CC)CN LTHNHFOGQMKPOV-UHFFFAOYSA-N 0.000 description 1
- ASUDFOJKTJLAIK-UHFFFAOYSA-N 2-methoxyethanamine Chemical compound COCCN ASUDFOJKTJLAIK-UHFFFAOYSA-N 0.000 description 1
- NJBCRXCAPCODGX-UHFFFAOYSA-N 2-methyl-n-(2-methylpropyl)propan-1-amine Chemical compound CC(C)CNCC(C)C NJBCRXCAPCODGX-UHFFFAOYSA-N 0.000 description 1
- RPBWMJBZQXCSFW-UHFFFAOYSA-N 2-methylpropanoyl 2-methylpropaneperoxoate Chemical compound CC(C)C(=O)OOC(=O)C(C)C RPBWMJBZQXCSFW-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- HCHJSQGMAQVHNO-UHFFFAOYSA-N 2-prop-2-enoxypropane Chemical compound CC(C)OCC=C HCHJSQGMAQVHNO-UHFFFAOYSA-N 0.000 description 1
- SYIUWAVTBADRJG-UHFFFAOYSA-N 2H-pyran-2,6(3H)-dione Chemical compound O=C1CC=CC(=O)O1 SYIUWAVTBADRJG-UHFFFAOYSA-N 0.000 description 1
- BMNCJOAMYDWZAS-UHFFFAOYSA-N 3-(2-cyanoethylphosphanyl)propanenitrile Chemical compound N#CCCPCCC#N BMNCJOAMYDWZAS-UHFFFAOYSA-N 0.000 description 1
- NXMSYSCTSWMYIF-UHFFFAOYSA-N 3-(2-methylbutyl)oxolane-2,5-dione Chemical compound CCC(C)CC1CC(=O)OC1=O NXMSYSCTSWMYIF-UHFFFAOYSA-N 0.000 description 1
- QMSDRIKKAAVQJG-UHFFFAOYSA-N 3-(3-hydroxypropylphosphanyl)propan-1-ol Chemical compound OCCCPCCCO QMSDRIKKAAVQJG-UHFFFAOYSA-N 0.000 description 1
- DSSAWHFZNWVJEC-UHFFFAOYSA-N 3-(ethenoxymethyl)heptane Chemical compound CCCCC(CC)COC=C DSSAWHFZNWVJEC-UHFFFAOYSA-N 0.000 description 1
- CHZAMJVESILJGH-UHFFFAOYSA-N 3-[bis(2-cyanoethyl)phosphanyl]propanenitrile Chemical compound N#CCCP(CCC#N)CCC#N CHZAMJVESILJGH-UHFFFAOYSA-N 0.000 description 1
- YICAEXQYKBMDNH-UHFFFAOYSA-N 3-[bis(3-hydroxypropyl)phosphanyl]propan-1-ol Chemical compound OCCCP(CCCO)CCCO YICAEXQYKBMDNH-UHFFFAOYSA-N 0.000 description 1
- ULEAHVRSLJRGPK-UHFFFAOYSA-N 3-ethenoxy-1,1,2,2-tetrafluoropropane Chemical compound FC(F)C(F)(F)COC=C ULEAHVRSLJRGPK-UHFFFAOYSA-N 0.000 description 1
- OJXVWULQHYTXRF-UHFFFAOYSA-N 3-ethenoxypropan-1-ol Chemical compound OCCCOC=C OJXVWULQHYTXRF-UHFFFAOYSA-N 0.000 description 1
- FASUFOTUSHAIHG-UHFFFAOYSA-N 3-methoxyprop-1-ene Chemical compound COCC=C FASUFOTUSHAIHG-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- HMMBJOWWRLZEMI-UHFFFAOYSA-N 4,5,6,7-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CCCC2=C1C(=O)OC2=O HMMBJOWWRLZEMI-UHFFFAOYSA-N 0.000 description 1
- LTPVSOCPYWDIFU-UHFFFAOYSA-N 4-methoxyphenylethylamine Chemical compound COC1=CC=C(CCN)C=C1 LTPVSOCPYWDIFU-UHFFFAOYSA-N 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- SAIKULLUBZKPDA-UHFFFAOYSA-N Bis(2-ethylhexyl) amine Chemical compound CCCCC(CC)CNCC(CC)CCCC SAIKULLUBZKPDA-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- 238000005698 Diels-Alder reaction Methods 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SVYKKECYCPFKGB-UHFFFAOYSA-N N,N-dimethylcyclohexylamine Chemical compound CN(C)C1CCCCC1 SVYKKECYCPFKGB-UHFFFAOYSA-N 0.000 description 1
- QCOGKXLOEWLIDC-UHFFFAOYSA-N N-methylbutylamine Chemical compound CCCCNC QCOGKXLOEWLIDC-UHFFFAOYSA-N 0.000 description 1
- GRSMWKLPSNHDHA-UHFFFAOYSA-N Naphthalic anhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=CC3=C1 GRSMWKLPSNHDHA-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- RRSCGNXXNRAXJC-UHFFFAOYSA-N bis(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1PC1=CC=C(C)C=C1 RRSCGNXXNRAXJC-UHFFFAOYSA-N 0.000 description 1
- YWAAKSBJISUYNU-UHFFFAOYSA-N buta-1,2-dien-1-one Chemical compound CC=C=C=O YWAAKSBJISUYNU-UHFFFAOYSA-N 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005695 dehalogenation reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- SBWJERDWKYNUFP-UHFFFAOYSA-N dibenzylphosphane Chemical compound C=1C=CC=CC=1CPCC1=CC=CC=C1 SBWJERDWKYNUFP-UHFFFAOYSA-N 0.000 description 1
- PTLIZOFGXLGHSY-UHFFFAOYSA-N dibutylphosphane Chemical compound CCCCPCCCC PTLIZOFGXLGHSY-UHFFFAOYSA-N 0.000 description 1
- HDULBKVLSJEMGN-UHFFFAOYSA-N dicyclohexylphosphane Chemical compound C1CCCCC1PC1CCCCC1 HDULBKVLSJEMGN-UHFFFAOYSA-N 0.000 description 1
- OKMVYXTWPPPSIM-UHFFFAOYSA-N dicyclopentylphosphane Chemical compound C1CCCC1PC1CCCC1 OKMVYXTWPPPSIM-UHFFFAOYSA-N 0.000 description 1
- LVTCZSBUROAWTE-UHFFFAOYSA-N diethyl(phenyl)phosphane Chemical compound CCP(CC)C1=CC=CC=C1 LVTCZSBUROAWTE-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- NAPSCFZYZVSQHF-UHFFFAOYSA-N dimantine Chemical compound CCCCCCCCCCCCCCCCCCN(C)C NAPSCFZYZVSQHF-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- YOTZYFSGUCFUKA-UHFFFAOYSA-N dimethylphosphine Chemical compound CPC YOTZYFSGUCFUKA-UHFFFAOYSA-N 0.000 description 1
- BYYQOWAAZOHHFN-UHFFFAOYSA-N dioctylphosphane Chemical compound CCCCCCCCPCCCCCCCC BYYQOWAAZOHHFN-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- YCUBDDIKWLELPD-UHFFFAOYSA-N ethenyl 2,2-dimethylpropanoate Chemical compound CC(C)(C)C(=O)OC=C YCUBDDIKWLELPD-UHFFFAOYSA-N 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- JZRGFKQYQJKGAK-UHFFFAOYSA-N ethenyl cyclohexanecarboxylate Chemical compound C=COC(=O)C1CCCCC1 JZRGFKQYQJKGAK-UHFFFAOYSA-N 0.000 description 1
- GLVVKKSPKXTQRB-UHFFFAOYSA-N ethenyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OC=C GLVVKKSPKXTQRB-UHFFFAOYSA-N 0.000 description 1
- LZWYWAIOTBEZFN-UHFFFAOYSA-N ethenyl hexanoate Chemical compound CCCCCC(=O)OC=C LZWYWAIOTBEZFN-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- RUPZNABSRDUIKU-UHFFFAOYSA-N ethyl bis(ethoxycarbonyl)phosphanylformate Chemical compound CCOC(=O)P(C(=O)OCC)C(=O)OCC RUPZNABSRDUIKU-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- DLEGDLSLRSOURQ-UHFFFAOYSA-N fluroxene Chemical compound FC(F)(F)COC=C DLEGDLSLRSOURQ-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000003402 intramolecular cyclocondensation reaction Methods 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- VMOWKUTXPNPTEN-UHFFFAOYSA-N n,n-dimethylpropan-2-amine Chemical compound CC(C)N(C)C VMOWKUTXPNPTEN-UHFFFAOYSA-N 0.000 description 1
- SFBHPFQSSDCYSL-UHFFFAOYSA-N n,n-dimethyltetradecan-1-amine Chemical compound CCCCCCCCCCCCCCN(C)C SFBHPFQSSDCYSL-UHFFFAOYSA-N 0.000 description 1
- QHCCDDQKNUYGNC-UHFFFAOYSA-N n-ethylbutan-1-amine Chemical compound CCCCNCC QHCCDDQKNUYGNC-UHFFFAOYSA-N 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- FSAJWMJJORKPKS-UHFFFAOYSA-N octadecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C=C FSAJWMJJORKPKS-UHFFFAOYSA-N 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000012966 redox initiator Substances 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- RTEOUPSFAUNLBD-UHFFFAOYSA-N sulfino benzoate Chemical compound OS(=O)OC(=O)C1=CC=CC=C1 RTEOUPSFAUNLBD-UHFFFAOYSA-N 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- QHDZGOLELSOUFO-UHFFFAOYSA-N tert-butyl butaneperoxoate Chemical compound CCCC(=O)OOC(C)(C)C QHDZGOLELSOUFO-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- IFXORIIYQORRMJ-UHFFFAOYSA-N tribenzylphosphane Chemical compound C=1C=CC=CC=1CP(CC=1C=CC=CC=1)CC1=CC=CC=C1 IFXORIIYQORRMJ-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- DHWBYAACHDUFAT-UHFFFAOYSA-N tricyclopentylphosphane Chemical compound C1CCCC1P(C1CCCC1)C1CCCC1 DHWBYAACHDUFAT-UHFFFAOYSA-N 0.000 description 1
- ABVVEAHYODGCLZ-UHFFFAOYSA-N tridecan-1-amine Chemical compound CCCCCCCCCCCCCN ABVVEAHYODGCLZ-UHFFFAOYSA-N 0.000 description 1
- GRAKJTASWCEOQI-UHFFFAOYSA-N tridodecylphosphane Chemical compound CCCCCCCCCCCCP(CCCCCCCCCCCC)CCCCCCCCCCCC GRAKJTASWCEOQI-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 1
- KCTAHLRCZMOTKM-UHFFFAOYSA-N tripropylphosphane Chemical compound CCCP(CCC)CCC KCTAHLRCZMOTKM-UHFFFAOYSA-N 0.000 description 1
- XAOIGBAYYHYZQA-UHFFFAOYSA-N tris(2-chloroethyl)phosphane Chemical compound ClCCP(CCCl)CCCl XAOIGBAYYHYZQA-UHFFFAOYSA-N 0.000 description 1
- GKPXVNQQMJCBEF-UHFFFAOYSA-N tris(2-methoxyethyl)phosphane Chemical compound COCCP(CCOC)CCOC GKPXVNQQMJCBEF-UHFFFAOYSA-N 0.000 description 1
- DKSQNJOUNGHPJI-UHFFFAOYSA-N tris(2-phenylethyl)phosphane Chemical compound C=1C=CC=CC=1CCP(CCC=1C=CC=CC=1)CCC1=CC=CC=C1 DKSQNJOUNGHPJI-UHFFFAOYSA-N 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、フッ素樹脂塗料の原料などとして有用なカル
ボキシル基を含有する含フツ素共重合体の製造法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for producing a fluorine-containing copolymer containing a carboxyl group, which is useful as a raw material for fluororesin paints.
〔従来の技術およびその課題〕
カルボキシル基を有するビニルエーテルとフルオロオレ
フィンを共重合させると、カルボキシル基を有するフッ
素樹脂を製造することができるが、カルボキシル基を有
するビニルエーテルは合成が困難である。たとえば、ヒ
ドロキシアルキルビニルエーテルと三塩基性酸無水物を
反応させて(ハーフエステル化)カルボキシル基を有す
るビニルエーテルを合成しようとしても、カルボキシル
基とビニル基が反応して分子内で環化してしまい、目的
物をうろことができない。[Prior Art and its Problems] A fluororesin having a carboxyl group can be produced by copolymerizing a vinyl ether having a carboxyl group with a fluoroolefin, but a vinyl ether having a carboxyl group is difficult to synthesize. For example, if you attempt to synthesize a vinyl ether with a carboxyl group by reacting a hydroxyalkyl vinyl ether with a tribasic acid anhydride (half esterification), the carboxyl group and vinyl group will react and cyclize within the molecule, resulting in the desired goal. I can't look around for things.
したがって、カルボキシル基を含有する含フツ素共重合
体は、たとえばヒドロキシル誌を含有するビニルエーテ
ルとフルオロオレフィンとの共重合体を製造し、ついで
共重合体に含有されるヒドロキシル基と三塩基性酸無水
物を反応(ハーフエステル化)させる方法(特公昭61
−49323号公報参照)によってえている。しかし、
この方法では共重合ののちノ1−フエステル化を行なう
ので、共重合の溶媒として三塩基性酸無水物と反応する
安価なアルコール類などを使用し難いという問題がある
。Therefore, a fluorine-containing copolymer containing a carboxyl group can be obtained by, for example, producing a copolymer of a hydroxyl-containing vinyl ether and a fluoroolefin, and then combining the hydroxyl group contained in the copolymer with a tribasic acid anhydride. Method for reacting (half-esterifying) substances (Special Publication 1986)
-49323). but,
In this method, copolymerization is followed by 1-phesterification, so there is a problem in that it is difficult to use inexpensive alcohols that react with tribasic acid anhydrides as a solvent for copolymerization.
本発明者らは、カルボキシル基を含有するビニルエーテ
ルの製法について鋭意検討した結果、ヒドロキシアルキ
ルビニルエーテルと三塩基性酸無水物を反応させる際、
塩基性化合物を系内に存在させておくと分子内環化反応
が生じず、えられたビニルエーテルのカルボキシル基が
塩基性化合物の塩の形をとることにより安定性が向上し
、しかもフルオロオレフィンと共重合させるばあいに収
率が格段に向上することを見出した。また、カルボキシ
ル基含有オレフィンとしてアリルアルコールと三塩基性
酸無水物とのハーフエステル化物や三塩基性酸無水物の
モノビニルエステルも用いることができる。As a result of intensive studies on the production method of vinyl ether containing a carboxyl group, the present inventors found that when reacting a hydroxyalkyl vinyl ether with a tribasic acid anhydride,
When a basic compound is present in the system, intramolecular cyclization reaction does not occur, and the carboxyl group of the obtained vinyl ether takes the form of a salt of the basic compound, improving stability. It has been found that the yield is significantly improved when copolymerized. Further, as the carboxyl group-containing olefin, a half ester of allyl alcohol and a tribasic acid anhydride or a monovinyl ester of a tribasic acid anhydride can also be used.
ところで、こうした−股木性塗料や電着塗料として有用
なカルボキシル基含有含フッ素共重合体を重合してうる
ばあい、重合溶媒として水に溶解性であるか分散性にす
ぐれたものを用いる必要がある。By the way, when such a carboxyl group-containing fluorine-containing copolymer useful as a cross-layer paint or an electrodeposition paint is to be polymerized, it is necessary to use a polymerization solvent that is soluble in water or has excellent dispersibility. There is.
そうした溶媒のうち、ジメチルホルムアミドやジメチル
アセトアミドなどのアミド系溶媒および酢酸メチルセロ
ソルブなどのエステル系溶媒は水溶液中で雑イオンを生
じ、共重合体の水溶化の際の安定化を損ねたり、生成す
る塗膜の外観にワキやハジキを生ぜしめたりする。また
、メタノール、エタノール、イソプロパツールなどのア
ルコール系溶媒はそれがもつ水酸基の作用によりビニル
エーテル系モノマーの安定性をわるくするほか、重合率
の低下をまねき、その結果、アミド系やエステル系と同
様の塗膜欠陥を生ずる。さらにまた、アセトンやメチル
エチレンケトンなどのケトン系溶媒を単独で使用するば
あいにはゲル化が生じてしまう。こうした塗膜性能の低
下は、含フツ素重合体を電着塗料として用いるばあいに
、より顕著となる。Among these solvents, amide solvents such as dimethylformamide and dimethylacetamide, and ester solvents such as methylcellosolve acetate generate miscellaneous ions in aqueous solutions, which may impair the stability of the copolymer when it is made water-soluble or generate ions. It may cause wrinkles or cracks in the appearance of the paint film. In addition, alcohol solvents such as methanol, ethanol, and isopropanol impair the stability of vinyl ether monomers due to the action of their hydroxyl groups, and also cause a decrease in the polymerization rate, resulting in similar effects to amide and ester monomers. This causes paint film defects. Furthermore, gelation occurs when a ketone solvent such as acetone or methyl ethylene ketone is used alone. Such a decrease in coating film performance becomes more noticeable when a fluorine-containing polymer is used as an electrodeposition coating.
本発明は、かかる課題を解決するためになされたもので
あり、
囚ヒドロキシ基含有オレフィンと、
(B1式(I):
CHz=CHOR’0C(=O)R2C(’O)O(H
)nM (I)(式中、R1は炭素原子数2〜10の
2価の脂肪族基、R2は2価の有機基、Mはアルカリ金
属、またはチッ素もしくはリン原子を含有する化合物で
あってそのpKaが6〜12である工官能性の塩基性化
合物、nはアルカリ金属のばあいのみ01その他は1を
示す)で表わされるカルボキシル基が塩の形のビニルエ
ーテル(以下、ビニルエーテル(II1という)
と式(II):
%式%()
(式中、R1およびR2は前記と同じ)で表わされる遊
離のカルボキシル基を有するビニルエーテル(以下、ビ
ニルエーテル帽)という)とからなり、ビニルエーテル
(II)がビニルエーテル(I)の1モル%以上含有さ
れてなるビニルエーテルモノマー組成物、または式l;
(式中、yl y2およびY3は同じかまたは異な
り、ハロゲン原子または炭素数1〜6のアルキル基、a
はOまたは1〜6の整数、R2は前記と同じ)で表わさ
れるモノマーと、(C)フルオロオレフィン
とを共重合させる際に、炭素数3〜20のケトン系溶媒
と弐動;
(式中、Y4は炭素原子数1〜Bのアルキル基、Y5は
水素原子またはメチル基、ΩはOまたは1〜20の整数
である)で表わされるアルコール系溶媒との混合溶媒を
重合溶媒として用いることを特徴とする含フツ素共重合
体の製造法に関するものである。The present invention has been made to solve such problems, and includes a captive hydroxy group-containing olefin, (B1 formula (I): CHz=CHOR'0C(=O)R2C('O)O(H
) nM (I) (wherein R1 is a divalent aliphatic group having 2 to 10 carbon atoms, R2 is a divalent organic group, and M is an alkali metal or a compound containing a nitrogen or phosphorus atom. vinyl ether (hereinafter referred to as vinyl ether (II1)) in which the carboxyl group is in the form of a salt, represented by ) and formula (II): a vinyl ether having a free carboxyl group (hereinafter referred to as vinyl ether cap) represented by the formula (in the formula, R1 and R2 are the same as above), and vinyl ether (II) A vinyl ether monomer composition containing 1 mol% or more of vinyl ether (I), or a vinyl ether monomer composition of formula l;
is O or an integer of 1 to 6, R2 is the same as above) and (C) fluoroolefin are copolymerized with a ketone solvent having 3 to 20 carbon atoms; , Y4 is an alkyl group having 1 to B carbon atoms, Y5 is a hydrogen atom or a methyl group, Ω is O or an integer from 1 to 20), and a mixed solvent with an alcoholic solvent is used as the polymerization solvent. The present invention relates to a method for producing a characteristic fluorine-containing copolymer.
[好ましい実施態様]
本発明で用いるヒドロキシ基含有オレフィン穴としては
、4−ヒドロキシブチルビニルエーテル、2−ヒドロキ
シエチルビニルエーテル、3−ヒドロキシ−n−プロピ
ルビニルエーテル、2−ヒドロキシ−1so−プロピル
ビニルエーテル、2−ヒドロキシ−2−メチルエチルビ
ニルエーテル、2−ヒドロキシ−1,1ジメチルビニル
エーテル、4−ヒドロキシシクロヘキシルビニルエーテ
ル、3−ヒドロキシシクロヘキシルビニルエーテル、2
−ヒドロキシシクロヘキシルビニルエーテル、4−ヒド
ロキシベンゾオキシビニル、2−ヒドロキシエチルメタ
クリレート、2−ヒドロキシプロピルα−クロロアクリ
レート、アリルアルコールなどがあげられる。[Preferred Embodiment] The hydroxy group-containing olefin holes used in the present invention include 4-hydroxybutyl vinyl ether, 2-hydroxyethyl vinyl ether, 3-hydroxy-n-propyl vinyl ether, 2-hydroxy-1so-propyl vinyl ether, 2-hydroxy -2-Methyl ethyl vinyl ether, 2-hydroxy-1,1 dimethyl vinyl ether, 4-hydroxycyclohexyl vinyl ether, 3-hydroxycyclohexyl vinyl ether, 2
-hydroxycyclohexyl vinyl ether, 4-hydroxybenzooxyvinyl, 2-hydroxyethyl methacrylate, 2-hydroxypropyl α-chloroacrylate, allyl alcohol, and the like.
本発明で用いる(B)成分のうちビニルエーテルモノマ
ー組成物は、前記のごとく、ビニルエーテル(II)単
独使用のばあいに比して各段に保存安定性が向上してい
る。その理由は、安定なビニルエーテル(II)を(I
[)の1モル%以上共存させることにより、ビニルエー
テル(II0の環化を促進するII”の系内濃度が低下
するためであると推定される。As mentioned above, among the components (B) used in the present invention, the vinyl ether monomer composition has significantly improved storage stability compared to the case where vinyl ether (II) is used alone. The reason is that the stable vinyl ether (II) can be converted into (I
This is presumed to be due to the coexistence of 1 mol % or more of vinyl ether (II'' which promotes the cyclization of II0) in the system.
ビニルエーテルモノマー組成物のうち、ビニルエーテル
mは、
■式:
%式%(
(式中、R1は前記と同じ)で表わされるヒドロキシア
ルキルビニルエーテル、
■式:
(式中、R2は前記と同じ)で表わされる二塩基性酸無
水物、
および
■アルカリ金属化合物またはチッ素原子もしくはリン原
子を含有する化合物であってそのpKa(水中25℃に
おける酸解離指数)が6〜12の1官能性の塩基性化合
物(以下、両者を区別しないときは単に塩基■という)
を反応させることによりえられる。In the vinyl ether monomer composition, the vinyl ether m is a hydroxyalkyl vinyl ether represented by the formula: (wherein, R1 is the same as above); dibasic acid anhydride, and ■ monofunctional basic compound which is an alkali metal compound or a compound containing a nitrogen atom or a phosphorus atom and whose pKa (acid dissociation index in water at 25°C) is 6 to 12. (Hereafter, when the two are not distinguished, they are simply referred to as base ■)
It can be obtained by reacting.
この製法の原料であるヒドロキシアルキルビニルエーテ
ルの具体例としては、4−ヒドロキシブチルビニルエー
テル、2−ヒドロキシエチルビニルエーテル、3−ヒド
ロキシ−〇−プロピルビニルエーテル、2−ヒドロキシ
−1so−プロピルビニルエーテル、2−ヒドロキシ−
2−メチルエチルビニルエーテル、2−ヒドロキシ−1
,1−ジメチルエチルビニルエーテル、4−ヒドロキシ
シクロヘキシルビニルエーテル、3−ヒドロキシシクロ
ヘキシルビニルエーテル、2−ヒドロキシシクロヘキシ
ルビニルエーテル、4−ヒドロキシベンゾオキシビニル
などをあげることができる。Specific examples of hydroxyalkyl vinyl ether, which is a raw material for this production method, include 4-hydroxybutyl vinyl ether, 2-hydroxyethyl vinyl ether, 3-hydroxy-〇-propyl vinyl ether, 2-hydroxy-1so-propyl vinyl ether, and 2-hydroxy-1so-propyl vinyl ether.
2-methylethyl vinyl ether, 2-hydroxy-1
, 1-dimethylethyl vinyl ether, 4-hydroxycyclohexyl vinyl ether, 3-hydroxycyclohexyl vinyl ether, 2-hydroxycyclohexyl vinyl ether, 4-hydroxybenzooxyvinyl and the like.
三塩基性酸無水物およびビニルエーテル(II1または
(It)に含有されるR2としては、式(II):%式
%()
c式中、XIは水素原子または炭素原子数1〜3のアル
キル基、x2は水素原子または炭素原子数1〜3のアル
キル基、pおよびqは0または1〜llの整数(ただし
、同時に0であることはない)を示す〕で表わされる基
、式(i)−+CIh←−÷CX3=CII←−(ii
)S
c式中、rは0または1〜3の整数、Sは1〜3の整数
、x3は水素原子または炭素原子数1〜3のアルキル基
を示す〕で表わされる基、式():
〔式中、R7は−(CIIX’ i 基(タタL、X4
は水素原子または炭素原子数1〜3のアルキル基、tは
1〜4の整数である)、
H3
式(へ):
〔式中、R8は←CII X S→−基(ただし、Xは
水素原子または炭素原子数1〜3のアルキル基、Uは3
〜4の整数である)または
+CX6− CX7→−基(ただし、XIおよびXIは
同一または異なり水素原子または炭素原子数1〜3のア
ルキル基、■は2〜3の整数である)を示す〕で表わさ
れる基、式(V)ニーC(−C1l 2) −C)+2
− (v)で表わされる基または式(0:
で表わされる基などをあげることができる。R2 contained in the tribasic acid anhydride and vinyl ether (II1 or (It)) is represented by the formula (II): % formula % () c In the formula, XI is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. , x2 is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, p and q are 0 or an integer from 1 to 11 (however, they are never 0 at the same time), a group represented by the formula (i) −+CIh←−÷CX3=CII←−(ii
)S c In the formula, r is 0 or an integer of 1 to 3, S is an integer of 1 to 3, and x3 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms], a group represented by the formula (): [In the formula, R7 is -(CIIX' i group (Tata L, X4
is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, t is an integer of 1 to 4), H3 formula (f): [wherein, R8 is a ←CII atom or alkyl group having 1 to 3 carbon atoms, U is 3
) or +CX6-CX7→- group (where XI and XI are the same or different and are a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and ■ is an integer of 2 to 3)] A group represented by the formula (V) nee C(-C1l 2) -C)+2
- A group represented by (v) or a group represented by the formula (0: can be mentioned.
三塩基性酸無水物の具体例としては、無水マレイン酸、
無水コハク酸、無水メチルコノ1り酸、無水フタル酸、
無水アジピン酸、無水グルタル酸、無水グルタコン酸、
無水イタコン酸、無水1.8−ナフタル酸、無水シトラ
コン酸、無水1.2−シクロヘキサンジカルボン酸、無
水4−メチル−1,2−ヘキサンジカルボン酸、無水e
ls−4−シクロヘキセン−1,2−ジカルボン酸、無
水l−シクロヘキセン−1,2−ジカルボン酸、シクロ
ペンタジェンと無水マレイン酸のディールス−アルダ−
反応による付加物などをあげることができる。Specific examples of tribasic acid anhydrides include maleic anhydride,
Succinic anhydride, methylconollic anhydride, phthalic anhydride,
Adipic anhydride, glutaric anhydride, glutaconic anhydride,
Itaconic anhydride, 1,8-naphthalic anhydride, citraconic anhydride, 1,2-cyclohexanedicarboxylic anhydride, 4-methyl-1,2-hexanedicarboxylic anhydride, anhydride e
ls-4-cyclohexene-1,2-dicarboxylic acid, 1-cyclohexene-1,2-dicarboxylic anhydride, Diels-Alder of cyclopentadiene and maleic anhydride
Examples include adducts resulting from reactions.
一般に、ヒドロキシル化合物と三塩基性酸無水物との反
応は塩基性触媒の存在下に、次式に従って進行する。Generally, the reaction between a hydroxyl compound and a tribasic acid anhydride proceeds according to the following formula in the presence of a basic catalyst.
このばあい、90%以上の収率で目的物をつるには高々
0.5モル%(二塩基性酸無水物基準)の塩基を使用す
れば充分である。しかしながら、本発明者らの研究によ
ればヒドロキシル化合物としてカチオン反応性に富むヒ
ドロキシビニルエーテルを使用するばあい、反応は後述
するごとく、塩基が存在しなければ目的物かえられず、
また0、5モル%程度では目的物の収率は低く、しかも
安定性がわるいため重合用モノマーとして適さない。In this case, it is sufficient to use at most 0.5 mol % (based on the dibasic acid anhydride) of the base to obtain the desired product with a yield of 90% or more. However, according to research conducted by the present inventors, when hydroxyvinyl ether, which is highly cationically reactive, is used as a hydroxyl compound, the reaction cannot be converted to the desired product in the absence of a base, as will be described later.
Moreover, if it is about 0.5 mol %, the yield of the target product is low and the stability is poor, so it is not suitable as a monomer for polymerization.
しかし、前記の塩基■を1モル%以上存在させることに
より収率は90%を超え、しかもえられる生成物も安定
となり、収率の低下は防ぐことができる。その理由は、
塩基■がカルボキシル基とビニル基の反応を防ぎ、かつ
前記したごとく生成したビニルエーテル(II)の環化
を防いでいるものと考えられる。なお、塩基■はカルボ
キシル基と化学量論的に反応するが、前記のごとく反応
系内に酸無水物■に対して1モル%以上存在すればよく
、そのばあいビニルエーテル(II1と帽)の混合物か
えられる。However, by making the base (1) present in an amount of 1 mol % or more, the yield exceeds 90%, and the resulting product is also stable, so that a decrease in the yield can be prevented. The reason is,
It is believed that the base (2) prevents the reaction between the carboxyl group and the vinyl group, and also prevents the cyclization of the vinyl ether (II) produced as described above. Note that the base (2) reacts stoichiometrically with the carboxyl group, but as mentioned above, it only needs to be present in the reaction system in an amount of 1 mol% or more based on the acid anhydride (2). The mixture can be changed.
また、モノマー組成物はビニルエーテル(II1と(I
)との混合物に塩基■を加え、ビニルエーテル(II)
と反応させることによってもえられる。後添加する塩基
■は反応の際に存在させた塩基と同一でも異なっていて
もよい。このばあいもビニルエーテル(II)のカルボ
キシル基と塩基■とは化学量論的に反応する。In addition, the monomer composition is vinyl ether (II1) and (I
) to the mixture with vinyl ether (II).
It can also be obtained by reacting with The base (2) added later may be the same as or different from the base present during the reaction. In this case, the carboxyl group of the vinyl ether (II) and the base (2) react stoichiometrically.
塩基■としては前記のごとくアルカリ金属化合物と特定
の1官能性の塩基性化合物が用いられる。As the base (2), as mentioned above, an alkali metal compound and a specific monofunctional basic compound are used.
アルカリ金属化合物としては、Li、KまたはNaの化
合物が好ましく、たとえば水酸化リチウム、水酸化ナト
リウム、水酸化カリウム、炭酸リチウム、炭酸ナトリウ
ム、炭酸カリウム、ナトリウムメチラート、ナトリウム
エチラート、カリウムメチラートなどがあげられる。The alkali metal compound is preferably a compound of Li, K or Na, such as lithium hydroxide, sodium hydroxide, potassium hydroxide, lithium carbonate, sodium carbonate, potassium carbonate, sodium methylate, sodium ethylate, potassium methylate, etc. can be given.
特定の1官能性の塩基性化合物は、前記のごとくチッ素
原子またはリン原子を含有する化合物であって、そのp
Kaが6〜12、好ましくは8〜11の塩基性化合物で
ある。peaがこの範囲にあるものは塩形成能が高く、
ビニルエーテル(I)の安定化作用が大きい。すなわち
、二塩基性酸無水物■のカルボン酸よりも高いpKaを
有するものが高い塩形成能を有し、特に対応するカルボ
ン酸よりも3〜8高いpKaを有するものが好ましい。The specific monofunctional basic compound is a compound containing a nitrogen atom or a phosphorus atom as described above, and its p
It is a basic compound having a Ka of 6 to 12, preferably 8 to 11. Those with pea in this range have high salt-forming ability,
Vinyl ether (I) has a large stabilizing effect. That is, those having a pKa higher than the carboxylic acid of the dibasic acid anhydride (1) have a high salt-forming ability, and those having a pKa 3 to 8 higher than the corresponding carboxylic acid are particularly preferred.
好適な1官能性の塩基性化合物としてはアンモニア、ア
ミン類、フォスフイン類などがあげられる。アミン類の
具体例としては、たとえばメチルアミン、エチルアミン
、n−プロピルアミン、イソプロピルアミン、n−ブチ
ルアミン、イソブチルアミン、 5ea−ブチルアミン
、1゜2−ジメチルプロピルアミン、2〜エチルヘキシ
ルアミン、トリデシルアミン、ジメチルアミン、ジエチ
ルアミン、ジ−n−プロピルアミン、ジイソプロピルア
ミン、ジブチルアミン、ジ −イソブチルアミン、ジル
5ee−ブチルアミン、ジ2−エチルヘキシルアミン、
トリメチルアミン、トリエチルアミン、トリーロープロ
ピルアミン、トリー〇−ブチルアミン、N−メチルブチ
ルアミン、N−エチルブチルアミン、N、N−ジメチル
エチルアミン、N、N−ジメチルイソプロピルアミン、
N、N−ジメチルテトラデシルアミン、N、N−ジメチ
ルオクタデシルアミン、2−メトキシエチルアミン、3
−エトキシエチルアミン、シクロヘキシルアミン、N、
N−ジメチルシクロヘキシルアミン、ジシクロヘキシル
アミン、ベンジルアミン、N、N−ジメチルベンジルア
ミン、4−メトキシフェニルエチルアミン、エタノール
アミン、ジェタノールアミン、トリエタノールアミン、
イソブロバノ−ルアミン、ジメチルエタノールアミン、
ピロリジン、ピペリジン、■−メチルピペリジン、4−
メチルピペリジン、モルホリンなどがあげられる。Suitable monofunctional basic compounds include ammonia, amines, phosphines, and the like. Specific examples of amines include methylamine, ethylamine, n-propylamine, isopropylamine, n-butylamine, isobutylamine, 5ea-butylamine, 1°2-dimethylpropylamine, 2-ethylhexylamine, tridecylamine, Dimethylamine, diethylamine, di-n-propylamine, diisopropylamine, dibutylamine, di-isobutylamine, di-5ee-butylamine, di-2-ethylhexylamine,
Trimethylamine, triethylamine, trilopropylamine, tri-butylamine, N-methylbutylamine, N-ethylbutylamine, N,N-dimethylethylamine, N,N-dimethylisopropylamine,
N,N-dimethyltetradecylamine, N,N-dimethyloctadecylamine, 2-methoxyethylamine, 3
-ethoxyethylamine, cyclohexylamine, N,
N-dimethylcyclohexylamine, dicyclohexylamine, benzylamine, N,N-dimethylbenzylamine, 4-methoxyphenylethylamine, ethanolamine, jetanolamine, triethanolamine,
Isobrobanolamine, dimethylethanolamine,
Pyrrolidine, piperidine, ■-methylpiperidine, 4-
Examples include methylpiperidine and morpholine.
フォスフイン類の具体例としては、たとえばトリメチル
フォスフイン、トリエチルフォスフイン、トリプロピル
フォスフイン、トリブチルフォスフイン、トリオクチル
フォスフイン、トリラウリルフォスフイン、トリステア
リルフォスフイン、ジメチルフォスフイン、ジエチルフ
ォスフイン、ジブチルフォスフイン、ジオクチルフォス
フイン、ジラウリルフォスフインのごときジーもしくは
トリアルキルフォスフイン類;トリス(3−ヒドロキシ
プロピル)フォスフイン、トリス(2−シアノエチル)
フォスフイン、トリス(2−メトキシエチル)フォスフ
イン、トリス(2−クロロエチル)フォスフイン、トリ
ス(2−メトキシカルボニル)フォスフイン、トリス(
2−(2−ジメチルアミノエトキシ)カルボニル)フォ
スフイン、トリス(2−エトキシカルボニル)フォスフ
イン、ビス(3−ヒドロキシプロピル)フォスフイン、
ビス(2−シアノエチル)フォスフインのごときジーも
しくはトリ −g1換アルキルフォスフイン類;ジシク
ロペンチルフォスフイン、ジシクロへキシルフォスフイ
ン、トリシクロペンチルフォスフイン、トリシクロへキ
シルフォスフインのごとき脂環式フォスフイン類ニトリ
フェニルフォスフイン、トリス(4−メチルフェニル)
フォスフイン、ジフェニルフォスフイン、ビス(4−メ
チルフェニル)フォスフインのごときジーもしくはトリ
アリールフォスフイン類;トリベンジルフォスフイン、
トリフェネチルフォスフイン、ジベンジルフォスフイン
、ジエチルフォスフインのごときジーもしくはトリーア
ラルキルフォスフイン類;テトラメチレンフォスフイン
、テトラメチレン−メチル−フォスフインなどの環内に
リン原子を存するフォスフイン類;ジフェニルメチルフ
ォスフイン、ジフェニルエチルフォスフイン、フエニル
ジエチルフォスフインのごときリン原子に互いに異なる
2種または3種の有機基が結合したフォスフイン類など
があげられる。特に第3級アミンが好ましい。Specific examples of phosphines include trimethylphosphine, triethylphosphine, tripropylphosphine, tributylphosphine, trioctylphosphine, trilaurylphosphine, tristearylphosphine, dimethylphosphine, diethylphosphine, and dibutylphosphine. Di- or trialkylphosphines such as phosphine, dioctylphosphine, dilaurylphosphine; tris(3-hydroxypropyl)phosphine, tris(2-cyanoethyl)
Phosphine, tris(2-methoxyethyl)phosphine, tris(2-chloroethyl)phosphine, tris(2-methoxycarbonyl)phosphine, tris(
2-(2-dimethylaminoethoxy)carbonyl)phosphine, tris(2-ethoxycarbonyl)phosphine, bis(3-hydroxypropyl)phosphine,
Di- or tri-g1-substituted alkylphosphines such as bis(2-cyanoethyl)phosphine; alicyclic phosphines such as dicyclopentylphosphine, dicyclohexylphosphine, tricyclopentylphosphine, and tricyclohexylphosphine; nitriphenyl Phosphine, tris(4-methylphenyl)
Di- or triarylphosphines such as phosphine, diphenylphosphine, bis(4-methylphenyl)phosphine; tribenzylphosphine;
Di- or tri-aralkylphosphines such as triphenethylphosphine, dibenzylphosphine, and diethylphosphine; Phosphines containing a phosphorus atom in the ring such as tetramethylenephosphine and tetramethylene-methylphosphine; diphenylmethylphosphine , diphenylethylphosphine, and phenyldiethylphosphine, in which two or three different organic groups are bonded to a phosphorus atom. Tertiary amines are particularly preferred.
反応温度は、通常−80〜100℃、好ましくは0〜5
0℃である。溶媒は、通常使用するが、使用しなくても
実施できる。溶媒は、三塩基性酸無水物と反応するアル
コール類を除き使用することができるが、アセトン、メ
チルエチルケトン、メチルイソブチルケトンなどのケト
ン類が、原料の反応性の低下、反応混合物の着色などを
もたらさないので好ましい。塩基■の使用量は、前記■
の三塩基性酸無水物に対して、通常0.01〜1,2、
好ましくは0.05〜1.0(ただし、モル比)である
。The reaction temperature is usually -80 to 100°C, preferably 0 to 5°C.
It is 0°C. A solvent is usually used, but the process can be carried out without using it. Solvents can be used except for alcohols that react with tribasic acid anhydrides, but ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone may cause a decrease in the reactivity of the raw materials and coloration of the reaction mixture. It is preferable because there is no. The amount of base ■ to be used is as described above.
tribasic acid anhydride, usually 0.01 to 1.2,
Preferably it is 0.05 to 1.0 (however, molar ratio).
(B)成分の他のカルボキシル基含有オレフィンとして
は、式(IN)で表わされるモノマーがあげられる。具
体例としては、たとえばアリルアルコールまたはメタア
リルアルコールと前記三塩基性酸無水物から合成された
ジカルボン酸モノアリルエステルおよびジカルボン酸モ
ノメタアリルエステルなどがあげられる。Other carboxyl group-containing olefins as component (B) include monomers represented by formula (IN). Specific examples include dicarboxylic acid monoallyl ester and dicarboxylic acid monomethallyl ester synthesized from allyl alcohol or methalyl alcohol and the tribasic acid anhydride.
本発明の製造法は、ヒドロキシ基含有オレフィン囚とカ
ルボキシル基含有オレフィン(B)とフルオロオレフィ
ン(C)を共重合させる際に、重合溶媒としてケトン系
溶媒と前記式Nで表わされるアルコール系溶媒との混合
溶媒を用いることに特徴がある。The production method of the present invention uses a ketone solvent and an alcohol solvent represented by the formula N as polymerization solvents when copolymerizing a hydroxy group-containing olefin prisoner, a carboxyl group-containing olefin (B), and a fluoroolefin (C). It is characterized by the use of a mixed solvent of
ケトン系溶剤としては、たとえばアセトン、メチルエチ
ルケトン、メチルイソブチルケトン、ジブチルケトン、
アセチルアセトン、シクロヘキサノンなどがあげられ、
アセトンまたはメチルエチルケトン、とくにアセトンが
好ましい。Examples of ketone solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, dibutyl ketone,
Examples include acetylacetone, cyclohexanone, etc.
Acetone or methyl ethyl ketone, especially acetone, is preferred.
式Nで表わされるアルコール系溶媒としては、たとえば
メタノール、エタノール、イソプロパツール、n−ブタ
ノール、t−ブタノール、メチルセロソルブ、ブチルセ
ロソルブ、ブチルカルピトール、メチルカルピトールな
どの1種または2種以上があげられ、メタノール、エタ
ノール、インプロパツールまたはn−ブタノールが好ま
しい。Examples of the alcoholic solvent represented by the formula N include one or more of methanol, ethanol, isopropanol, n-butanol, t-butanol, methyl cellosolve, butyl cellosolve, butyl calpitol, and methyl calpitol. methanol, ethanol, impropatol or n-butanol are preferred.
前記のごとくケトン系溶媒を単独使用して重合を行なう
とゲル化してしまうが、ケトン系溶媒と前記アルコール
系溶媒を混合使用するとゲル化は生じない。この理由は
、ヒドロキシ基含有オレフィン穴とケトン系溶媒との架
橋により生ずるゲル化を、アルコール系溶媒を添加する
ことにより阻止しているものと推定される。しかし、ア
ルコール系溶媒には前記のごとき欠点があるので、ゲル
化を抑えかつアルコール系溶媒の欠点を出さないため、
アルコール系溶媒/ヒドロキシ基含有オレフィン(モル
比)が1/10〜lOハ、好ましくは・1.73〜5/
lとなる範囲で使用する。As mentioned above, if a ketone solvent is used alone for polymerization, gelation occurs, but if a ketone solvent and the alcohol solvent are used in combination, gelation does not occur. The reason for this is presumed to be that gelation caused by crosslinking between the hydroxy group-containing olefin holes and the ketone solvent is prevented by adding the alcohol solvent. However, alcohol-based solvents have the disadvantages mentioned above, so in order to suppress gelation and avoid the disadvantages of alcohol-based solvents,
Alcohol solvent/hydroxy group-containing olefin (molar ratio) is 1/10 to 10/10, preferably 1.73 to 5/
Use within the range of l.
混合溶媒の量としては全七ツマ−に対し通常4/1−1
/4が好ましい。The amount of mixed solvent is usually 4/1-1 for all seven solvents.
/4 is preferred.
かかる混合溶媒を重合溶媒として用いるときは各モノマ
ーに対して悪影響を与えず、重合収量に優れ、えられる
重合体溶液に低分子量物が含まれに<<、塗装性や塗膜
物性に優れる。When such a mixed solvent is used as a polymerization solvent, it does not have an adverse effect on each monomer, has an excellent polymerization yield, contains low molecular weight substances in the resulting polymer solution, and has excellent paintability and physical properties of the coating film.
共重合系は、基本的にヒドロキシ基含有オレフィン穴、
カルボキシル基含有オレフィン(B)、フルオロオレフ
ィン(C)、重合溶媒、重合開始剤からなる。重合方法
としては乳化重合、懸濁重合、溶液重合などを採用する
ことができる。The copolymerization system basically consists of olefin holes containing hydroxy groups,
It consists of a carboxyl group-containing olefin (B), a fluoroolefin (C), a polymerization solvent, and a polymerization initiator. As the polymerization method, emulsion polymerization, suspension polymerization, solution polymerization, etc. can be adopted.
重合温度は開始剤や溶媒の種類に応じて適宜変更するこ
とができるが、通常−20〜150℃、好ましくは、5
〜95℃である。反応圧力も適宜選択可能であるが、通
常0〜50kg / cj Gである。The polymerization temperature can be changed as appropriate depending on the type of initiator and solvent, but is usually -20 to 150°C, preferably 5°C.
~95°C. The reaction pressure can also be selected as appropriate, but is usually 0 to 50 kg/cj G.
フルオロオレフィン(C)としては、たとえばテトラフ
ルオロエチレン、クロロトリフルオロエチレン、ヘキサ
フルオロプロピレン、トリフルオロエチレン、フッ化ビ
ニリデン、フッ化ビニルなどをあげることができる。Examples of the fluoroolefins (C) include tetrafluoroethylene, chlorotrifluoroethylene, hexafluoropropylene, trifluoroethylene, vinylidene fluoride, and vinyl fluoride.
本発明において、ヒドロキシ基含有オレフィン穴とカル
ボキシル基含有オレフィン(B)とフルオロオレフィン
(C)の反応モル比は、通常、(A)/[8)/(C)
−t〜50/ 1〜H/20〜80である。In the present invention, the reaction molar ratio between the hydroxy group-containing olefin hole, the carboxyl group-containing olefin (B), and the fluoroolefin (C) is usually (A)/[8)/(C).
-t~50/1~H/20~80.
水溶性塗料として含フツ素共重合体を使用するばあいヒ
ドロキシ基含有オレフィン穴を5〜50モル%含有し、
さらにこの共重合体の水溶性を良好にするうえで、カル
ボキシル基含有オレフィン[8)を5〜60モル%含有
していることが好ましく、これのカルボキシル基は3(
II%以上中和されていることがさらに好ましい(電着
塗装のばあい)。中和に用いる化合物としては前記塩基
■で例示したものがあげられる。When a fluorine-containing copolymer is used as a water-soluble paint, it contains 5 to 50 mol% of hydroxy group-containing olefin holes,
Furthermore, in order to improve the water solubility of this copolymer, it is preferable to contain 5 to 60 mol% of carboxyl group-containing olefin [8], in which the carboxyl group is 3 (
It is more preferable that it is neutralized by II% or more (in the case of electrodeposition coating). Compounds used for neutralization include those exemplified in the above-mentioned base ①.
含フツ素共重合体を有機溶剤に溶解し、いわゆる溶剤型
塗料として使用するばあい、ヒドロキシ基含有オレフィ
ン穴は2〜40モル%、カルボキシル基含有オレフィン
(Blの含有量は、基材との密着性の点で1〜15モル
%が好ましく、顔料分散性の点で2〜10モル%が好ま
しい。When a fluorine-containing copolymer is dissolved in an organic solvent and used as a so-called solvent-based paint, the hydroxyl group-containing olefin pores are 2 to 40 mol%, and the carboxyl group-containing olefin (Bl content is the same as that of the base material). It is preferably 1 to 15 mol% from the viewpoint of adhesion, and preferably 2 to 10 mol% from the viewpoint of pigment dispersibility.
前記含フツ素共重合体には、囚〜(C)成分のほかに他
種のエチレン性不飽和化合物を含フツ素共重合体に対し
80モル%以下の量比で含有させることができる。他種
のエチレン性不飽和化合物としては、たとえば式:
%式%)
(式中、R3は炭素原子数1〜17の脂肪族基、炭素原
子数3〜17の脂環式基、炭素原子数1〜20のフルオ
ロアルキル基、kは0または1を示す)で表わされるア
ルキルビニルエーテルまたはビニルエステルがあげられ
、具体例としては、たとえばメチルビニルエーテル、エ
チルビニルエーテル、n−プロピルビニルエーテル、イ
ソプロピルビニルエーテル、n−ブチルビニルエーテル
、イソブチルビニルエーテル、t−ブチルビニルエーテ
ル、ローペンチルビニルエーテル、n−ヘキシルビニル
エーテル、n−オクチルビニルエーテル、2−エチルヘ
キシルビニルエーテル、シクロヘキシルビニルエーテル
、ラウリルビニルエーテル、ステアリルビニルエーテル
、2,2.2−トリフルオロエチルビニルエーテル、2
,2,3.3−テトラフルオロプロピルビニルエーテル
、2,2,3,3.3−ペンタフルオロプロピルビニル
エーテル、2,2,3,3゜4.4,5.5−オクタフ
ルオロペンチルビニルエーテル、2,2,3,3,4,
4.4−ヘプタフルオロブチルビニルエーテル、酢酸ビ
ニルエステル、ブロビオン酸ビニルエステル、酪酸ビニ
ルエステル、ピバリン酸ビニルエステル、カプロン酸ビ
ニルエステル、ラウリン酸ビニルエステル、バーサチッ
ク酸ビニルエステル、シクロヘキサンカルボン酸ビニル
エステルなどがあげられる。The fluorine-containing copolymer may contain, in addition to the components (C), other ethylenically unsaturated compounds in an amount of 80 mol % or less relative to the fluorine-containing copolymer. Other types of ethylenically unsaturated compounds include, for example, the formula: %Formula %) (wherein R3 is an aliphatic group having 1 to 17 carbon atoms, an alicyclic group having 3 to 17 carbon atoms, or an alicyclic group having 3 to 17 carbon atoms. Examples include alkyl vinyl ethers or vinyl esters represented by 1 to 20 fluoroalkyl groups (k represents 0 or 1), and specific examples include methyl vinyl ether, ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n- Butyl vinyl ether, isobutyl vinyl ether, t-butyl vinyl ether, lopentyl vinyl ether, n-hexyl vinyl ether, n-octyl vinyl ether, 2-ethylhexyl vinyl ether, cyclohexyl vinyl ether, lauryl vinyl ether, stearyl vinyl ether, 2,2.2-trifluoroethyl vinyl ether, 2
, 2,3.3-tetrafluoropropyl vinyl ether, 2,2,3,3.3-pentafluoropropyl vinyl ether, 2,2,3,3°4.4,5.5-octafluoropentyl vinyl ether, 2, 2, 3, 3, 4,
4.4-Heptafluorobutyl vinyl ether, vinyl acetate, vinyl brobionate, vinyl butyrate, vinyl pivalate, vinyl caproate, vinyl laurate, vinyl versatate, vinyl cyclohexanecarboxylate, etc. It will be done.
さらに式:
%式%
(式中、X8は水素原子、塩素原子、フッ素原子、メチ
ル基またはトリフルオロメチル基、R9は水素原子、塩
素原子、炭素原子数1〜17の脂肪族基、炭素原子数3
〜17の脂環式基または炭素原子数1〜20のフルオロ
アルキル基、偏は0または1を示す)で表わされる化合
物があげられ、具体例としては、エチレン、プロピレン
、■−ブテン、イソブチン、スチレン、塩化ビニル、塩
化ビニリデン、イソブチルアクリレート、メチルアクリ
レート、エチルメタクリレート、2゜2.3,3.3−
ペンタフルオロプロピルα−フルオロアクリレート、2
,2,3,3,4,4,5,5,6,8.7.7−ドゾ
カフルオロペンチルα −トリフルオロメチルアクリレ
ート、シクロへキシルアクリレート、2゜2.3,3,
4,4,5.5,6,8,7.7,8.8,9,9,1
0,10.11,11゜+2.12.13.13,14
.14,15,15.15−ノナコサフルオロペンタデ
シルアクリレート、オクチルα −クロロアクリレート
、オクタデシルアククリレートなどがあげられる。Furthermore, the formula: %Formula% (wherein, Number 3
~17 alicyclic groups or fluoroalkyl groups having 1 to 20 carbon atoms, the bias is 0 or 1), and specific examples include ethylene, propylene, ■-butene, isobutyne, Styrene, vinyl chloride, vinylidene chloride, isobutyl acrylate, methyl acrylate, ethyl methacrylate, 2゜2.3,3.3-
Pentafluoropropyl α-fluoroacrylate, 2
, 2,3,3,4,4,5,5,6,8.7.7-dozocafluoropentyl α-trifluoromethyl acrylate, cyclohexyl acrylate, 2゜2.3,3,
4, 4, 5.5, 6, 8, 7.7, 8.8, 9, 9, 1
0,10.11,11°+2.12.13.13,14
.. Examples include 14,15,15.15-nonacosafluoropentadecyl acrylate, octyl α-chloroacrylate, and octadecyl acrylate.
また、式:
%式%
(式中、戸は塩素原子または炭素原子数1〜8の脂肪族
オキシ基を示す)で表わされる化合物も使用でき、具体
例としてはたとえばアリルクロライド、アリルメチルエ
ーテル、アリルイソプロピルエーテル、アリルオクチル
エーテルなどがあげられる。Compounds represented by the formula: % (in the formula % represents a chlorine atom or an aliphatic oxy group having 1 to 8 carbon atoms) can also be used, and specific examples include allyl chloride, allyl methyl ether, Examples include allyl isopropyl ether and allyl octyl ether.
また要すれば、共重合時に少量の多価金属(たとえばM
g、 Ca5Zn、 ANなど)または多官能性のチッ
素原子もしくはリン原子含有化合物(たとえばアルキル
ジアミン、アルキルトリアミンなどのポリアミン類、ア
ルキルシフオスフィン、アルキルトリフオスフィンなど
のポリフォスフイン類)とビニルエーテル(II)との
塩からなるジビニルエーテルやトリビニルエーテルなど
を共重合成分として存在させることもでき、このばあい
は部分ゲル化により艶消しなどの用途に用いることがで
きる。Also, if necessary, a small amount of polyvalent metal (for example, M
g, Ca5Zn, AN, etc.) or polyfunctional nitrogen or phosphorus atom-containing compounds (e.g. polyamines such as alkyldiamines and alkyltriamines, polyphosphines such as alkylsiphosphines and alkyltriphosphines) and vinyl ethers. Divinyl ether, trivinyl ether, etc. consisting of a salt with (II) can also be present as a copolymerization component, and in this case, it can be used for purposes such as matting due to partial gelation.
重合開始剤としては、たとえば過硫酸塩(過硫酸アンモ
ニウム、過硫酸カリウムなど)、過硫酸塩と亜硫酸塩(
亜硫酸カリウム、亜硫酸ナトリウムなど)または酸性亜
硫酸塩(酸性亜硫酸カリウム、酸性亜硫酸ナトリウムな
ど)からなるレドックス系開始剤、有機過酸化物(ジイ
ソプロピルパーオキシジカーボネート、tert−ブチ
ルパーオキシブチレート、ベンゾイルツク−オキサイド
、イソブチリルパーオキサイドなど)、アゾ化合物(ア
ゾビスイソブチロニトリルなど)などをあげることがで
きる。開始剤の使用量は、通常使用する全単量体に対し
o、oot〜5重量%、好ましくは0.05〜2゜0重
量%である。Examples of polymerization initiators include persulfates (ammonium persulfate, potassium persulfate, etc.), persulfates and sulfites (
Redox initiators consisting of potassium sulfite, sodium sulfite, etc.) or acidic sulfites (acidic potassium sulfite, acidic sodium sulfite, etc.), organic peroxides (diisopropyl peroxydicarbonate, tert-butyl peroxybutyrate, benzoyl sulfite, etc.) oxide, isobutyryl peroxide, etc.), and azo compounds (azobisisobutyronitrile, etc.). The amount of the initiator used is usually 0.05 to 5% by weight, preferably 0.05 to 2.0% by weight, based on the total monomers used.
本発明の製造法の操作方式に関しては、特に制限はなく
、回分式、半連続式、連続式などの方式が採用可能であ
る。There are no particular limitations on the operating method of the production method of the present invention, and methods such as batch, semi-continuous, and continuous methods can be employed.
つぎに本発明を実施例に基づいて説明するが、本発明は
かかる実施例のみに限定されるものではない。Next, the present invention will be explained based on Examples, but the present invention is not limited to these Examples.
参考例1
1O口Om+のフラスコに無水1,2−シクロヘキサン
ジカルボン酸(酸無水物) 405 g (2,83モ
ル)およびアセトン40gからなる溶液を入れ、トリエ
チルアミン(塩基:pKa=lO,72) 2.63g
(0,26モル)を添加し、磁気攪拌機で5分間攪拌し
た。Reference Example 1 A solution consisting of 405 g (2.83 mol) of 1,2-cyclohexanedicarboxylic anhydride (acid anhydride) and 40 g of acetone was placed in a 10-mouth Om+ flask, and triethylamine (base: pKa=lO, 72) 2 .63g
(0.26 mol) was added and stirred for 5 minutes with a magnetic stirrer.
この混合物を氷水で0〜10℃になるように冷却しなが
ら、ヒドロキシブチルビニルエーテル305 g (2
,83モル)を2g/分の割合で滴下した。While cooling this mixture with ice water to a temperature of 0 to 10°C, 305 g (2
, 83 mol) was added dropwise at a rate of 2 g/min.
反応混合物についてフーリエ変換核磁気共鳴分析(FT
−NMR% +3C%テトラメチルシラン標$)を行な
い、下記の本発明のビニルエーテルfl)(以下、cH
HEM塩という)と対応する遊離のビニルエーテル(N
) (以下、c II II E Mという)がほぼI
O/115(モル比)での収率で生成していることを確
認した。各炭素原子・(8〜mの符号を付す)のケミカ
ルシフトを示す。The reaction mixture was subjected to Fourier transform nuclear magnetic resonance analysis (FT
-NMR% + 3C% tetramethylsilane standard $) was carried out, and the following vinyl ether fl) of the present invention (hereinafter referred to as cH
HEM salt) and the corresponding free vinyl ether (N
) (hereinafter referred to as c II II E M) is approximately I
It was confirmed that the product was produced at a yield of O/115 (molar ratio). The chemical shift of each carbon atom (signed from 8 to m) is shown.
す。vinegar.
さらに、えられた反応生成物の20℃および一20℃で
保存したときの分解率(%)を13C−7JMl?によ
って調べた。結果を第1表に併記する。Furthermore, the decomposition rate (%) of the obtained reaction product when stored at 20°C and -20°C was determined as 13C-7JMl? Investigated by. The results are also listed in Table 1.
δ(ppl)−115,6<a+、 151.5<
In、67.2(C)、25 、3−25 、6 (
d+、62.1!(el、 173.3<r+、42
.9((l+、27 、4<+11.24.4<i+、
43.5rj)、17G、2ck+、44.9巾、 9
、 l (ffl)参考例2
参考例1のトリエチルアミン量を第1表に示す量に変更
したほかは参考例1と同様の手順でc tl II E
M塩とc I(If E Mとからなるモノマー組成
物を製造した。FT−NMI?で分析した収率を第1表
に示参考例3
参考例2の実験番号4の条件でえられた反応生成物(c
H)IBM塩/ dllEM −0,1/84.9 :
モル比)に第2表に示す塩基を加えてcllHEMをc
11 tl E M塩に変換し、参考例2と同様にし
て分解率を調べた。結果を第2表に示す。δ(ppl)-115,6<a+, 151.5<
In, 67.2(C), 25, 3-25, 6 (
d+, 62.1! (el, 173.3<r+, 42
.. 9((l+, 27 , 4<+11.24.4<i+,
43.5rj), 17G, 2ck+, 44.9 width, 9
, l (ffl) Reference Example 2 c tl II E in the same manner as in Reference Example 1 except that the amount of triethylamine in Reference Example 1 was changed to the amount shown in Table 1.
A monomer composition consisting of M salt and c I (If E M) was produced. The yield analyzed by FT-NMI? is shown in Table 1. Reference Example 3 Obtained under the conditions of Experiment No. 4 of Reference Example 2. Reaction product (c
H) IBM salt/dllEM-0,1/84.9:
molar ratio) and the base shown in Table 2 to make cllHEM.
11 tl EM salt, and the decomposition rate was examined in the same manner as in Reference Example 2. The results are shown in Table 2.
65℃に維持した。仕込み終了後、65℃で16時1反
応を続け、カルボキシル基含有歯フッ索具1合体をえた
。収量は455gで共重合体濃度は64゜%であった。The temperature was maintained at 65°C. After the preparation was completed, the reaction was continued at 65° C. for 16 hours to obtain a carboxyl group-containing tooth rigging device. The yield was 455 g, and the copolymer concentration was 64%.
実施例2〜5および比較例1〜4
第3表に示す組成で実施例1と同様にしてJ重合を行な
い、それぞれ含フツ素共重合体を〉た。それらの収量お
よび共重合体濃度を第35に示す。Examples 2 to 5 and Comparative Examples 1 to 4 J polymerization was carried out in the same manner as in Example 1 using the compositions shown in Table 3 to obtain fluorine-containing copolymers. Their yields and copolymer concentrations are shown in No. 35.
第2表から明らかなように、pKaが6未満の塩基性化
合物ではその塩基性が弱いためcH!IEHの安定化へ
の寄与が小さいことがわかる。As is clear from Table 2, basic compounds with pKa less than 6 have weak basicity, so cH! It can be seen that the contribution of IEH to stabilization is small.
実施例1
攪拌機を備えた容積800m1のガラス製オートクレー
ブにアセトン140.2gおよびエタノール19.8g
を仕込み、液体チッ素で固化後、脱気した。Example 1 140.2 g of acetone and 19.8 g of ethanol in a glass autoclave with a volume of 800 ml equipped with a stirrer
was charged, solidified with liquid nitrogen, and then degassed.
その後、クロロトリフルオロエチレン(以下、CTFE
という)を128.2g仕込み、系内を65℃に加熱し
た。つぎに、別途参考例1でえたビニルエーテルモノマ
ー組成物(cHtlEM塩/ cllHEM−10/8
5、モル比) 72.83g、ヒドロキシブチルビニル
エーテル(以下、II B V Bという)49.9g
、炭素原子数IOのアルキル基を有するカルボン酸の
ビニルエステル[シェル化学社製のベオバ10(以下、
VAという) 181.4gおよびアゾビスイソブチロ
ニトリル(以下、AIBNという) 1.64gを混合
し、液体チッソで固化後脱気したモノマー混合物をで4
時間かけて連続して仕込んだ。系内温度は第3表中の記
号はそれぞれつぎの化合物を水重量部
す。After that, chlorotrifluoroethylene (hereinafter referred to as CTFE)
), and the system was heated to 65°C. Next, a vinyl ether monomer composition separately obtained in Reference Example 1 (cHtlEM salt/cllHEM-10/8
5. molar ratio) 72.83g, hydroxybutyl vinyl ether (hereinafter referred to as II B V B) 49.9 g
, a vinyl ester of a carboxylic acid having an alkyl group having IO carbon atoms [Beoba 10 manufactured by Shell Chemical Co., Ltd. (hereinafter referred to as
(hereinafter referred to as VA) and 1.64 g of azobisisobutyronitrile (hereinafter referred to as AIBN) were mixed, and the monomer mixture was degassed after solidifying with liquid nitrogen.
I spent a lot of time preparing it continuously. As for the system temperature, the symbols in Table 3 represent the following compounds in parts by weight of water.
EVE :エチルビニルエーテル
AIBN:アゾビスイソブチロニトル
実施例6
実施例1でえられた含フツ素重合体をイソプロピルアル
コール(IPA)で重合体濃度25重量%になるまで希
釈した。えられたワニス100gを攪拌機付きフラスコ
に入れMgOlO,Ogを添加し、60℃にて24時間
攪拌したのちグラスフィルターでン濾過して脱ハロゲン
処理をした。EVE: Ethyl vinyl ether AIBN: Azobisisobutyronitrile Example 6 The fluorine-containing polymer obtained in Example 1 was diluted with isopropyl alcohol (IPA) to a polymer concentration of 25% by weight. 100 g of the obtained varnish was placed in a flask equipped with a stirrer, MgOIO and Og were added thereto, and the mixture was stirred at 60° C. for 24 hours, and then filtered through a glass filter for dehalogenation treatment.
脱ハロゲン処理した25重量%ワニスを減圧下に濃縮し
、65%濃度のワニスとした。このワニス 100重量
部に対してジメチルエタノールアミン3.9重量部(重
合体酸価に対し0,9等量)加えて中和した。The 25% by weight varnish that had been dehalogenated was concentrated under reduced pressure to obtain a 65% concentration varnish. 3.9 parts by weight of dimethylethanolamine (0.9 equivalent to the acid value of the polymer) was added to 100 parts by weight of this varnish for neutralization.
えられた部分中和ワニスを用い、つぎの処方で電着塗装
用組成物を調製した。Using the obtained partially neutralized varnish, an electrodeposition coating composition was prepared according to the following formulation.
ワニス 100ブチルセロ
ソルブ 1080%メチルメチロール
化
メラミン樹脂
(日立化成工業■製のメラン620゜
固形分含量70重量%)20
脱イオン水 990この電着塗装
用組成物を用い、アルマイト処理された60B3Sアル
ミニウム合金板(アルマイト皮膜の厚さ9J7111)
を被塗装物(陽極)とし、塗装用組成物部20℃、電圧
140Vで3分間通電し、組成物をアルミニウム合金板
上に被着させたのち水洗し、ついで180℃に30分間
保って焼付け、硬化させて電着塗膜をえた。Varnish 100 Butyl cellosolve 1080% methyl methylolated melamine resin (Melan 620° manufactured by Hitachi Chemical ■, solid content 70% by weight) 20 Deionized water 990 60B3S aluminum alloy plate anodized using this electrodeposition coating composition (Thickness of alumite film 9J7111)
was used as the object to be painted (anode), and the coating composition part was energized for 3 minutes at 20°C and a voltage of 140V, and the composition was deposited on the aluminum alloy plate, washed with water, and then kept at 180°C for 30 minutes and baked. It was cured to give an electrodeposited coating.
えられた塗膜について第4表に示す性質を調べた。結果
を第4表に示す。The properties shown in Table 4 of the resulting coating film were investigated. The results are shown in Table 4.
(膜 厚)
膜厚計(■ケラト科学研究所製のパーマスコープEV型
)を使用して測定した(単位二I)。(Film thickness) It was measured using a film thickness meter (■Permascope EV model manufactured by Kerato Science Institute) (unit 2I).
(光 沢)
光沢計(日本重色工業■製のVC−2PD)を使用し6
0°鏡而反射率(単位:%)を測定した。(Gloss) Using a gloss meter (VC-2PD manufactured by Nippon Heavy Industries, Ltd.)
The 0° mirror reflectance (unit: %) was measured.
(耐候性)
ウェザ−メーター(スガ試験機■製、デユーサイクル、
照射60分/暗黒60分、ブラックパネル温度63℃)
で360時間の促進耐候性試験を行ない、光沢保持率(
単位二%)を測定した。(Weather resistance) Weather meter (manufactured by Suga Test Instruments, Ducycle,
60 minutes of irradiation/60 minutes of darkness, black panel temperature 63℃)
A 360-hour accelerated weathering test was conducted to determine the gloss retention rate (
(Unit: 2%) was measured.
(付着性)
塗膜にカッターナイフで1 on角の折目 100個の
切り目を入れ、セロハン粘着テープで10回剥離試験を
行ない、残存した折目数を求めた。(Adhesion) 100 1-square folds were made in the coating film using a cutter knife, and a peel test was performed 10 times using cellophane adhesive tape to determine the number of remaining folds.
(iJ沸水性) JI8118802に僧する。(iJ boiling water) Became a monk at JI8118802.
(耐導水テスト後の耐アルカリ性)
耐沸水テスト後のサンプルを1重量%の水酸化ナトリウ
ムの水溶液に72時間浸漬したのちの塗膜の外観を目視
で観察し、ブリスター発生のa無を調べた。(Alkali resistance after water conduction resistance test) After the boiling water resistance test, the sample was immersed in a 1% by weight sodium hydroxide aqueous solution for 72 hours, and the appearance of the coating film was visually observed to check for any blistering. .
(耐酸性)
5%塩酸溶液中に7日間浸漬後、塗膜の変化を目視にて
判定した。(Acid resistance) After immersion in a 5% hydrochloric acid solution for 7 days, changes in the coating film were visually determined.
(外 観) 塗膜の外観を目視で判定した。(exterior) The appearance of the coating film was visually judged.
(液安定性)
30℃の雰囲気下に1力月静置し、その変化を目視にて
判定した。(Liquid Stability) The sample was left standing in an atmosphere at 30° C. for one month, and the change was visually judged.
実施例7〜IOおよび比較例5〜8
実施例2〜5および比較例1〜4でそれぞれ製造した含
フツ素重合体を用いたほかは実施例6と同様にして電着
塗装用組成物を調製し、電着を行なった。Examples 7 to IO and Comparative Examples 5 to 8 Electrodeposition coating compositions were prepared in the same manner as in Example 6, except that the fluorine-containing polymers produced in Examples 2 to 5 and Comparative Examples 1 to 4, respectively, were used. It was prepared and electrodeposited.
結果を第4表に示す。The results are shown in Table 4.
C以下余白〕
〔発明の効果〕
本発明によれば、特定の重合溶媒を用いることにより収
率を高め、かつより均質な含フツ素共重合体を提供する
ことができる。かかる含フツ素共重合体を塗料として用
いるときは、ワキとハジキがなく、しかも耐候性にすぐ
れた塗膜かえられる。Margin below C] [Effects of the Invention] According to the present invention, by using a specific polymerization solvent, it is possible to increase the yield and provide a more homogeneous fluorine-containing copolymer. When such a fluorine-containing copolymer is used as a coating material, a coating film that is free from flaking and repelling and has excellent weather resistance can be obtained.
Claims (1)
O(H)nM( I ) (式中、R^1は炭素原子数2〜10の2価の脂肪族基
、R^2は2価の有機基、Mはアルカリ金属またはチッ
素原子もしくはリン原子を含有する化合物であってその
pKaが6〜12である1官能性の塩基性化合物、nは
アルカリ金属のばあいのみ0、その他は1を示す) で表わされるビニルエーテルと、式(II):CH_2=
CHOR^1OC(=O)R^2C(=O)OH(II)
(式中、R^1およびR^2は前記と同じ)で表わされ
るビニルエーテルとからなり、式( I )で表わされる
ビニルエーテルが式(II)で表わされるビニルエーテル
の1モル%以上含有されてなるビニルエーテルモノマー
組成物、または式(III):▲数式、化学式、表等があ
ります▼(III) (式中、Y^1、Y^2およびY^3は同じかまたは異
なり、ハロゲン原子または炭素数1〜6のアルキル基、
aは0または1〜6の整数、R^2は前記と同じ)で表
わされるモノマーと、(C)フルオロオレフィン とを共重合させる際に、炭素数3〜20のケトン系溶媒
と式(IV): ▲数式、化学式、表等があります▼(IV) (式中、Y^4は炭素原子数1〜8のアルキル基、Y^
5は水素原子またはメチル基、lは0または1〜20の
整数である)で表わされるアルコール系溶媒をヒドロキ
シ基含有オレフィンのモル比が1/10〜10/1の範
囲で混合した溶媒を重合溶媒として用いることを特徴と
する含フッ素共重合体の製造法。 2 ケトン系溶媒がアセトンまたはメチルエチルケトン
である請求項1記載の製造法。 3 アルコール系溶媒がメタノール、エタノール、イソ
プロパノールまたはn−ブタノールである請求項1記載
の製造法。 4 式( I )で表わされるビニルエーテルを式(II)
で表わされるビニルエーテルの5モル%以上含有してい
る請求項1記載の製造法。 5 フルオロオレフィンがテトラフルオロエチレン、ク
ロロトリフルオロエチレン、ヘキサフルオロプロピレン
、トリフルオロエチレン、フッ化ビニリデンおよびフッ
化ビニルよりなる群から選ばれたものである請求項1記
載の製造法。[Scope of Claims] 1 (A) a hydroxy group-containing olefin; (B) formula (I): CH_2=CHOR^1OC(=O)R^2C(=O)
O(H)nM(I) (in the formula, R^1 is a divalent aliphatic group having 2 to 10 carbon atoms, R^2 is a divalent organic group, M is an alkali metal, a nitrogen atom, or a phosphorus atom) A monofunctional basic compound which is a compound containing atoms and whose pKa is 6 to 12, n is 0 only in the case of an alkali metal, and 1 in other cases); and a vinyl ether represented by the formula (II). :CH_2=
CHOR^1OC(=O)R^2C(=O)OH(II)
(wherein R^1 and R^2 are the same as above), and the vinyl ether represented by formula (I) contains 1 mol% or more of the vinyl ether represented by formula (II). Vinyl ether monomer composition, or formula (III): ▲Mathematical formula, chemical formula, table, etc.▼(III) (In the formula, Y^1, Y^2 and Y^3 are the same or different, and the number of halogen atoms or carbon atoms 1 to 6 alkyl groups,
When copolymerizing the monomer represented by (a is 0 or an integer of 1 to 6, and R^2 is the same as above) and (C) fluoroolefin, a ketone solvent having 3 to 20 carbon atoms and the formula (IV ): ▲There are mathematical formulas, chemical formulas, tables, etc.▼(IV) (In the formula, Y^4 is an alkyl group having 1 to 8 carbon atoms, Y^
5 is a hydrogen atom or a methyl group, l is an integer of 0 or 1 to 20) is mixed with a hydroxy group-containing olefin in a molar ratio of 1/10 to 10/1. A method for producing a fluorine-containing copolymer, characterized in that it is used as a solvent. 2. The production method according to claim 1, wherein the ketone solvent is acetone or methyl ethyl ketone. 3. The production method according to claim 1, wherein the alcohol solvent is methanol, ethanol, isopropanol or n-butanol. 4 Vinyl ether represented by formula (I) is converted to formula (II)
The method according to claim 1, wherein the method contains 5 mol% or more of vinyl ether represented by: 5. The method according to claim 1, wherein the fluoroolefin is selected from the group consisting of tetrafluoroethylene, chlorotrifluoroethylene, hexafluoropropylene, trifluoroethylene, vinylidene fluoride, and vinyl fluoride.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63211119A JP2551116B2 (en) | 1988-08-25 | 1988-08-25 | Method for producing fluorine-containing copolymer |
EP19890106900 EP0338498A3 (en) | 1988-04-20 | 1989-04-18 | Process for preparing fluorine-containing copolymers |
US07/341,992 US4952653A (en) | 1987-03-10 | 1989-04-20 | Process for preparing fluorine-containing copolymers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63211119A JP2551116B2 (en) | 1988-08-25 | 1988-08-25 | Method for producing fluorine-containing copolymer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0258555A true JPH0258555A (en) | 1990-02-27 |
JP2551116B2 JP2551116B2 (en) | 1996-11-06 |
Family
ID=16600716
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Application Number | Title | Priority Date | Filing Date |
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JP63211119A Expired - Fee Related JP2551116B2 (en) | 1987-03-10 | 1988-08-25 | Method for producing fluorine-containing copolymer |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0637759U (en) * | 1992-07-17 | 1994-05-20 | ベックマン インスツルメンツ インコーポレーテッド | Capillary electrophoresis apparatus and capillary assembly |
-
1988
- 1988-08-25 JP JP63211119A patent/JP2551116B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0637759U (en) * | 1992-07-17 | 1994-05-20 | ベックマン インスツルメンツ インコーポレーテッド | Capillary electrophoresis apparatus and capillary assembly |
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JP2551116B2 (en) | 1996-11-06 |
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