JPH0256432U - - Google Patents
Info
- Publication number
- JPH0256432U JPH0256432U JP13489188U JP13489188U JPH0256432U JP H0256432 U JPH0256432 U JP H0256432U JP 13489188 U JP13489188 U JP 13489188U JP 13489188 U JP13489188 U JP 13489188U JP H0256432 U JPH0256432 U JP H0256432U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- chamber
- coil
- plasma chamber
- supplies
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008021 deposition Effects 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 2
Description
第１図は本考案の実施例のＥＣＲプラズマＣＶ
Ｄ装置の模式断面図、第２図は第１図における
―線断面図、第３図は第２図のＡ方向からみた
側面図である。
１……試料台、２……試料、４……プラズマ室
、５……デポジシヨン室、６……ガス供給管、７
……導波管、８……第１のコイル、１０……ガス
供給部、１１……段差、１２，１３……側壁部、
１４，１５，１６，１７……第２のコイル。
Figure 1 shows an ECR plasma CV according to an embodiment of the present invention.
FIG. 2 is a schematic cross-sectional view of the device D, FIG. 2 is a cross-sectional view taken along the line -- in FIG. 1, and FIG. 3 is a side view taken from the direction A in FIG. 1... Sample stage, 2... Sample, 4... Plasma chamber, 5... Deposition chamber, 6... Gas supply pipe, 7
... waveguide, 8 ... first coil, 10 ... gas supply section, 11 ... step, 12, 13 ... side wall section,
14, 15, 16, 17... second coil.
Claims (1)
ズマ室の周側に設けられた第１のコイルと、前記
プラズマ室と開口を介して連つたデポジシヨン室
と、前記プラズマ室にガスを供給するガス供給管
と、前記開口の前記デポジシヨン室側にガスを供
給するガス供給部と、前記プラズマ室にマイクロ
波を供給する導波管と、前記デポジシヨン室の周
囲に設けられ前記第１のコイルが発生する磁界の
方向と直交する方向の磁界を発生する第２のコイ
ルと、を備えて成ることを特徴とする電子サイク
ロトロン共鳴プラズマＣＶＤ装置。 A plasma chamber in which plasma is generated, a first coil provided around the circumference of the plasma chamber, a deposition chamber connected to the plasma chamber through an opening, and a gas supply pipe that supplies gas to the plasma chamber. a gas supply unit that supplies gas to the deposition chamber side of the opening; a waveguide that supplies microwaves to the plasma chamber; and a magnetic field provided around the deposition chamber and generated by the first coil. An electron cyclotron resonance plasma CVD apparatus comprising: a second coil that generates a magnetic field in a direction perpendicular to the direction of the electron cyclotron resonance plasma CVD apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13489188U JPH0256432U (en) | 1988-10-14 | 1988-10-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13489188U JPH0256432U (en) | 1988-10-14 | 1988-10-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0256432U true JPH0256432U (en) | 1990-04-24 |
Family
ID=31394047
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13489188U Pending JPH0256432U (en) | 1988-10-14 | 1988-10-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0256432U (en) |
-
1988
- 1988-10-14 JP JP13489188U patent/JPH0256432U/ja active Pending