JPH0255080A - Sewing system - Google Patents

Abstract

PURPOSE:To improve workability and productivity by providing a means to set a region in which a pattern is formed on a cloth to be sewn and automatically vary a reference line so that a pattern is contained in the region. CONSTITUTION:A region in which a pattern is to be formed on a cloth to be sewn is set by a region set means M6. Meanwhile, pattern data is corrected and computed by a pattern aligning means M4 so that pattern data stored in a memory means M3 is aligned along a given reference line. A reference line varying means M7 automatically varies a reference line so that the corrected and computed pattern data is contained in the set region on the cloth to be sewn. A pattern aligning means M4 corrects and computes so that the pattern data is aligned along a varied reference line. A moving means M2 and a stitch forming means M1 are driven and controlled by means of a control means M5, and a pattern extending along a given reference line is formed in a region set on the cloth to be sewn.

Description

Detailed Description of the Invention Object of the Invention [Industrial Field of Application] The present invention relates to a sewing system that forms a pattern along a predetermined reference line on a work cloth, and particularly relates to a sewing system that forms a pattern along a predetermined reference line on a work cloth. The present invention relates to a sewing system that allows a pattern to be formed inside.

[Prior Art] Conventionally, sewing systems for forming patterns such as letters and symbols along predetermined reference lines on processed cloth have been known. be. The device described in the above-mentioned publication is configured to form patterns such as letters and symbols along a predetermined arcuate curve on a work cloth. The above-mentioned arcuate curve is determined by the operator selecting the origin position and radius.

[Problems to be Solved by the Invention] However, in the conventional sewing system described above, in order to form a pattern such as a character or symbol at a desired position on the workpiece cloth, the operator has to think about forming the pattern. position/
The origin and radius of the arc had to be calculated backwards from the reference line in advance. However, when the individual sizes of the letters and symbols that make up the pattern change, or when the length of the pattern varies, it is extremely difficult for even highly skilled workers to calculate backwards. It was difficult.

As a result, workability and productivity were poor, and there were cases where defective products were generated due to calculation errors.

Structure of the Invention The present invention has been made to solve the above problems, and employs the following structure.

[Means for Solving the Problems] That is, the gist of the present invention is, as illustrated in FIG. , a moving means M2 for changing the relative positional relationship between the work cloth and the needle, a storage means M3 for storing pattern data for forming a predetermined pattern, and a means for arranging the pattern along a predetermined reference line. pattern array means M for performing 11 positive operations on the pattern data stored in the storage means M3;
4, and a control means M5 for driving and controlling the moving means M2 and the seam forming means M1 based on the pattern data subjected to the (1 positive operation) by the pattern arranging means M4. In the sewing system for forming a pattern along the work cloth, an area setting means M6 sets an area in which the pattern is to be formed on the work cloth, and the pattern fits within the area set by the area setting means M6. a reference line changing means M7 for automatically changing the reference line as shown in FIG.
The sewing system is characterized by comprising:

"Operation" According to the sewing system of the present invention having the above configuration, the area setting means M6 sets an area on the work cloth in which a pattern is to be formed. On the other hand, the pattern arranging means M4 corrects and calculates the pattern data stored in the storage means M3 in order to arrange the pattern data along a predetermined reference line. here,
The reference line changing means M7 automatically changes the reference line so that the modified pattern data falls within the set area on the work cloth. Then, the pattern arranging means M4 performs a corrective calculation so that the pattern data is arranged along the changed reference line. In this way, when the reference line is changed and the pattern data is corrected and the pattern data falls within the area on the work cloth set by the area setting means M6, the control means M5 causes the moving means M2 and the seam forming The means M1 is driven and controlled to form a pattern along a predetermined reference line within a set area on the work cloth.

[Embodiment] Next, an embodiment in which the present invention is embodied in an electronic embroidery sewing machine will be described based on the drawings.

FIG. 2 shows the external appearance of the electronic embroidery sewing machine 1, and FIG. 3 shows the configuration of its control system.

As shown in the figure, the electronic embroidery sewing machine 1 includes a workbench 3 having a flat top plate 2, and a bed 4 installed on the workbench 3 and arranged on the same plane as the top plate 2 to constitute a work cloth support surface 2a. and an arm 5, an XY moving device 9 which is also installed on the workbench 3 and is capable of moving an embroidery frame 8 supporting a work cloth 7 in the XY directions, and a keyboard 10. Digitizer 11° Display device 12. It consists of an external storage device 13 and an electronic control device 14, and a control unit 15 that drives and controls the sewing machine main body 6 and the XY moving device 9.

The arm 5 of the sewing machine body 6 is provided with a needle bar 17 having a needle 16 at its lower end and supported so as to be movable up and down.The needle bar 17 is moved up and down as the sewing machine motor 18 rotates. Further, a needle plate 4a is mounted on the bed 4, and a needle hole 4b is formed approximately at the center of the needle plate 4a. The needle 16 moves the workpiece cloth 7 along with the vertical movement of the needle bar 17. The needle is inserted through the needle hole 4b to form stitches on the work cloth 7 in cooperation with the pot 19 provided in the bed 4.

Here, needle 16. Needle bar 17. Sewing machine motor 18 and hook 9
corresponds to the stitch forming means M1.

Further, the XY moving device 9 moves with a fixed rail 20, 21 disposed parallel to the X direction in the figure, and a movable rail 22, which is slidably extended in the X direction between the fixed rails 20 and 21.
An X-axis pulse motor 23 that slides the rail 22 in the X direction along the fixed rail 20.21 and an X-axis pulse motor 23 that moves the embroidery frame 8 along the fixed rail 20.
2, and corresponds to the moving means M2.

The electronic control unit 14 includes a CPU 25, a program memory 261, and a working memory 27 to form a logical operation circuit.
0. Digitizer 11. Electrical signals from the external storage device 13 are input manually, and the output interface 29. The sewing machine motor 18. The X-axis pulse motor 23 and the Y-axis pulse motor 249 output drive signals to the display device 12. Incidentally, the electronic control device 14 controls the pattern arrangement means M4. This corresponds to the control means M5 and the reference line changing means M7, the external storage device 13 corresponds to the storage means M3, and the keyboard 10 and the digitizer 11 correspond to the area setting means M6.

Next, the control processing performed by the electronic control unit 14 will be explained based on the flowcharts in FIGS. 4 and 5 and the explanatory diagrams in FIGS. .

As shown in FIG. 4, when the process is started, various flags, memories, etc. are converted into rice grains in step Sl (hereinafter simply referred to as Sl). Next, in S2, an area A in which a pattern is to be formed on the work cloth 7, which has been entered manually by the operator as numerical data via the keyboard 10 or as image data via the digitizer 11, is stored in the work memory 27.
is memorized. In continuation <53, the operator presses keyboard 1.
By manually inputting a pattern selection instruction such as a number from 0, the corresponding pattern data in the external storage device 13 is read and stored in the working memory 27.

As is well known, the pattern data is expressed by mask data D1 to D5 indicating the range occupied by each pattern, and the relative positional relationship between the needle and the work cloth to form the line pattern of Φ. It consists of location data.

Next, the process advances to S4 and a reference line designation process is executed.

In this example, the reference line is one arc of a semicircle.

Straight lines, spline curves, etc. can be specified, and the operator can use the keyboard 10. Select and specify using the digitizer 11.

When the area setting, pattern designation, and reference line designation are completed as described above, the process advances to reference line change processing (S5).

For simplicity, the following explanation will focus on the case where a semicircle is specified.

When a semicircle is specified as a reference line in S4, the semicircle mote process shown in FIG. 5 is executed.

First, in SIO, the center of the lower edge of area A is the origin O, and the semicircle C7 with radius R1 initially set in SI is used as the reference line.
For example, temporary settings are made as shown in FIG. 6(a). Next, Sli
The pattern data stored in the working memory 27 is read out, and each pattern is arranged starting from the lower left end of the semicircle C1 as shown in FIG. 6(b). At this time, the read pattern data is corrected by rotation calculation so that each pattern to be formed is arranged substantially perpendicular to the reference line C1, and is stored in a predetermined area of the working memory 27. Ru. Thereafter, the following processing is performed depending on whether the mask data D1 to D5 of the pattern data fit within the area IA.

In S12, it is determined whether all of the arranged mask data D1 to D5 are within the area A. If it falls within the area A as shown in FIG. 6(b), the process proceeds to S13, where a predetermined value ΔR is added to the radius R1, and the origin is 0. Radius R1+△
A semicircle C2 is set at the location of R, and the above-mentioned Sll is set in S14.
Similarly, mask data D1 to D5 are arranged as shown in FIG. 6(c). Continuation < S 15t It is determined again whether all the mask data D1 to D5 are within the area A, and the processing under 313U is repeated until a negative determination is made. Therefore, as shown in Figure 6'(d), the origin 0° radius Rn
In the semicircle Cn, all of the mask data D1 to D5 are within the area fiA, so the process of S13.914 is executed again. As a result, as shown in Fig. 6 (e), the radius Rn
The mask data D2 protrudes from the area A in the semicircle CD+1 of +1=Rn+ΔR, and a negative determination is made in S15, and the process proceeds to 816. In 916, the semicircle C of the origin O1 radius R=Rn+1-ΔR, which is obtained by subtracting a predetermined value ΔR from the radius Rn+1 that has been increased so far, is determined as the reference line.

Thereafter, in S6, pattern data arrangement processing is executed in the same manner as in Sll and S14, and in S7, the sewing machine motor 18. The X-axis pulse motor 23 and the Y-axis pulse motor 24 are driven to form a desired area A on the workpiece cloth 7.
The pattern that fits inside is formed into a seam.

On the other hand, the radius R1- of the semicircle C1- provisionally set at 510
is larger than the area A as shown in FIG. 7(a), the mask data D1- to
D5- protrudes from area A as shown in FIG. 7(b) 6 Therefore, S12 becomes a negative determination and the process advances to S17. In S17, a predetermined value △R is subtracted from the radius R1-, and a new semicircle C is created.
2- is set, and mask data D, .about.D5- are arranged in S18 as shown in FIG. 7(c). In S19, until all the mask data D1- to D5- fall within the territory @A, a negative determination is made and the processes from S17 onward are repeated, and as shown in FIG. 7(E), all the mask data D+- to D5- are When it falls within the area A, it exits to 920 and the semicircle C- with the radius R- of the origin O9 is set as the reference line.

If, for example, a spline interval approximation curve is specified as the reference line in S4, the reference line is temporarily set by inputting a predetermined point sequence from the digitizer 11. Set the reference line by enlarging or reducing the spline curve so that it fits. Similarly, when an arc is specified, the origin position is automatically changed and a reference line is set so that the pattern data fits within area A based on the input arc curvature. Note that the origin may be specified instead of the arc curvature, and the arc curvature may be automatically changed. When using a straight line as the reference line, the reference line is similarly set by automatically changing the starting point position of the straight line along either side of the area A.

In addition, in the above processing, the display device 12 is shown in FIG.
Images such as those shown in (a) to (d) and FIG. 7 (a) to (b) are displayed. While watching the video, the operator presses the break key 10a on the keyboard 10 before the process in S5 is completely completed.
It is also possible to forcibly end the reference line change process and move the process to S6 by pressing .

Incidentally, the processing in S5, that is, S10 to S20 is performed by the base m line changing means M.
7, S6 corresponds to the processing as the pattern arrangement means M4, and S7 corresponds to the processing as the control means M5.

As explained above, according to this embodiment, the operator
By manually determining the area without calculating the curvature or the like, the reference line temporarily set in advance is automatically changed and the pattern data is arranged in the desired area. Further, area setting can also be done manually using the display device 12 and digitizer 11. Therefore, the operator can form a pattern on the work cloth 7 very simply and reliably along the predetermined reference line without the need for troublesome calculations. In addition, since the reference line can be set by operating the break key 10a during processing while viewing the display on the display device 12, it is possible to roughly set the area at the start of processing and specify the special spline. It is. Roughly speaking, mask data is used to determine whether or not the pattern is within the area, so the time required for this determination is based on the position data (actual seam position determination). ) has the advantage of being shorter.

Although one embodiment of the present invention has been described above, the present invention is not limited to this example, and various embodiments can be adopted without departing from the gist thereof.

For example, the reference line may be a closed curve such as a circle or polygon, and the position of the pattern array on the reference line within the setting area can be specified/changed. The reference line change process (S
5) may be performed. Further, in the process of S10, the radius of the semicircle may be temporarily set as the maximum diameter that fits within the area, and the processes of 813 to 816 may not be performed.

It should be noted that the calculation time can be shortened by performing the calculation by sandwiching both the large radius and the small radius.

Effects of the Invention As described above, according to the sewing system of the present invention, the reference line is automatically changed by simple area setting, and the pattern is formed at the correct position. Therefore, there is no need for troublesome calculations, there is no occurrence of defective products due to calculation errors, and workability and productivity can be significantly improved.

[Brief explanation of the drawing]

FIG. 1 is a block diagram illustrating the configuration of the present invention, FIG. 2 is a schematic perspective view showing the external appearance of an electronic embroidery sewing machine 1 according to an embodiment, FIG. 3 is a main part configuration diagram showing its control system, and FIG. 4 is a flowchart of the control process performed by the electronic control unit 14, FIG. 5 is a flowchart showing the process in the semicircle mode as the reference line change process, and FIGS.
Figures (A) to (E) are explanatory diagrams showing the state of the reference line changing process. Ml... Stitch forming means IVI 3... Storage means M5... Control means M7... Reference line changing means 6... Sewing machine body M2... Moving means M4... Pattern arrangement means M6. - Area setting means 1...Electronic embroidery sewing machine 7...Work cloth 8...Embroidery frame 0...Keyboard 1 2...Display device 1 4...Electronic control device 1 9...Kettle 20, 2 2...Moving rail 2 4...Y-axis pulse motor

Claims (1)

[Scope of Claims] Stitch forming means that includes a needle that moves up and down and forms stitches on a work cloth; Moving means that changes the relative positional relationship between the work cloth and the needle; Forming a predetermined pattern. a storage means for storing pattern data for arranging the patterns; a pattern arrangement means for correcting the pattern data stored in the storage means so as to arrange the patterns along a predetermined reference line; A sewing system for forming a pattern along a predetermined reference line on the work cloth, the sewing system comprising: a control means for driving and controlling the moving means and the seam forming means based on the calculated pattern data; and a reference line changing means for automatically changing the reference line so that the pattern fits within the area set by the area setting means. A sewing system characterized by: