JPH0251262U - - Google Patents

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Publication number
JPH0251262U
JPH0251262U JP12941488U JP12941488U JPH0251262U JP H0251262 U JPH0251262 U JP H0251262U JP 12941488 U JP12941488 U JP 12941488U JP 12941488 U JP12941488 U JP 12941488U JP H0251262 U JPH0251262 U JP H0251262U
Authority
JP
Japan
Prior art keywords
etching apparatus
nozzles
etching
etched
equal intervals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12941488U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12941488U priority Critical patent/JPH0251262U/ja
Publication of JPH0251262U publication Critical patent/JPH0251262U/ja
Pending legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案のエツチング装置における上部
スプレー配管及びノズル配置の底面図、第2図は
従来の底面図を示す。 1……直管、2……スプレーノズル。
FIG. 1 shows a bottom view of the upper spray piping and nozzle arrangement in the etching apparatus of the present invention, and FIG. 2 shows a conventional bottom view. 1... Straight pipe, 2... Spray nozzle.

Claims (1)

【実用新案登録請求の範囲】 1 被エツチング板のエツチング液を吹付けるべ
き上面に対する吹付けノズル装備の配管において
、ノズル配置を中央部において密とし周辺部にお
いて粗とすることを特徴とするエツチング装置。 2 水平面内にあつて相互に等間隔平行にある直
管を被エツチング板の移動方向とほぼ平行に固定
し、各直管に等間隔で設けた直下方向ノズルの間
隔を中央部で小さく両端に近いほど大きくして成
る請求項1記載のエツチング装置。 3 隣接する直管のノズルを互い違いとして成る
請求項2記載のエツチング装置。
[Claims for Utility Model Registration] 1. An etching device characterized in that, in piping equipped with spray nozzles for spraying the etching liquid on the upper surface of a plate to be etched, the nozzles are arranged densely in the center and coarsely in the periphery. . 2 Straight pipes that are parallel to each other at equal intervals in a horizontal plane are fixed almost parallel to the moving direction of the plate to be etched, and the distance between the vertical nozzles provided at equal intervals on each straight pipe is small in the center and at both ends. 2. The etching apparatus according to claim 1, wherein the etching apparatus is made larger as the size of the etching apparatus approaches. 3. The etching apparatus according to claim 2, wherein the nozzles of adjacent straight pipes are alternated.
JP12941488U 1988-09-30 1988-09-30 Pending JPH0251262U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12941488U JPH0251262U (en) 1988-09-30 1988-09-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12941488U JPH0251262U (en) 1988-09-30 1988-09-30

Publications (1)

Publication Number Publication Date
JPH0251262U true JPH0251262U (en) 1990-04-10

Family

ID=31383668

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12941488U Pending JPH0251262U (en) 1988-09-30 1988-09-30

Country Status (1)

Country Link
JP (1) JPH0251262U (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5993881A (en) * 1982-11-17 1984-05-30 Hitachi Chem Co Ltd Etching device
JPS62202087A (en) * 1986-02-28 1987-09-05 Matsushita Electric Ind Co Ltd Etching method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5993881A (en) * 1982-11-17 1984-05-30 Hitachi Chem Co Ltd Etching device
JPS62202087A (en) * 1986-02-28 1987-09-05 Matsushita Electric Ind Co Ltd Etching method

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