JPH0250897B2 - - Google Patents

Info

Publication number
JPH0250897B2
JPH0250897B2 JP7432481A JP7432481A JPH0250897B2 JP H0250897 B2 JPH0250897 B2 JP H0250897B2 JP 7432481 A JP7432481 A JP 7432481A JP 7432481 A JP7432481 A JP 7432481A JP H0250897 B2 JPH0250897 B2 JP H0250897B2
Authority
JP
Japan
Prior art keywords
formula
group
unsubstituted
substituted
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP7432481A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5716851A (en
Inventor
Myuuraa Beato
Rooto Marutein
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=4267205&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPH0250897(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS5716851A publication Critical patent/JPS5716851A/ja
Publication of JPH0250897B2 publication Critical patent/JPH0250897B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/72Hydrazones
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/29Compounds containing one or more carbon-to-nitrogen double bonds
    • C08K5/30Hydrazones; Semicarbazones
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/132Anti-ultraviolet fading

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP7432481A 1980-05-21 1981-05-19 Hydrazone derivative,manufacture and use Granted JPS5716851A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH396280 1980-05-21

Publications (2)

Publication Number Publication Date
JPS5716851A JPS5716851A (en) 1982-01-28
JPH0250897B2 true JPH0250897B2 (enrdf_load_stackoverflow) 1990-11-05

Family

ID=4267205

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7432481A Granted JPS5716851A (en) 1980-05-21 1981-05-19 Hydrazone derivative,manufacture and use

Country Status (4)

Country Link
US (2) US4383948A (enrdf_load_stackoverflow)
EP (1) EP0040583B1 (enrdf_load_stackoverflow)
JP (1) JPS5716851A (enrdf_load_stackoverflow)
DE (1) DE3176608D1 (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1989005996A1 (en) * 1987-12-23 1989-06-29 Hoechst Celanese Corporation A photoresist composition including a copolymer from maleimide and a vinyl-ether or -ester
DE3923896A1 (de) * 1989-07-19 1991-01-31 Basf Ag 1-aza-butadiene und diese verbindungen enthaltende fungizide
DE4016056A1 (de) * 1990-05-18 1991-11-21 Basf Ag Waessrige kunstharzzubereitungen
US5284732A (en) * 1993-06-09 1994-02-08 Fuji Photo Film Co., Ltd. Silver halide photographic material
US6046330A (en) * 1998-04-24 2000-04-04 Qinghong; Jessica Ann Complexes of ultraviolet absorbers and quaternary ammonium compounds which are substantially free from unwanted salts
US7008476B2 (en) * 2003-06-11 2006-03-07 Az Electronic Materials Usa Corp. Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2818367A (en) * 1954-09-21 1957-12-31 Monsanto Chemicals Method of inhibiting cereal plant rust with phenylhydrazones
US3462479A (en) * 1965-12-29 1969-08-19 Gaf Corp Hydrazone sun-screening compounds
US4150987A (en) * 1977-10-17 1979-04-24 International Business Machines Corporation Hydrazone containing charge transport element and photoconductive process of using same

Also Published As

Publication number Publication date
EP0040583B1 (de) 1988-01-13
JPS5716851A (en) 1982-01-28
EP0040583A1 (de) 1981-11-25
US4383948A (en) 1983-05-17
US4435489A (en) 1984-03-06
DE3176608D1 (en) 1988-02-18

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