JPH0248900U - - Google Patents
Info
- Publication number
- JPH0248900U JPH0248900U JP12746488U JP12746488U JPH0248900U JP H0248900 U JPH0248900 U JP H0248900U JP 12746488 U JP12746488 U JP 12746488U JP 12746488 U JP12746488 U JP 12746488U JP H0248900 U JPH0248900 U JP H0248900U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- workpiece
- section
- lead plate
- processing chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims description 14
- 230000002265 prevention Effects 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
Description
第１図は本考案の１実施例である電子線照射装
置に使用する鉛板の概略断面及びその表面に衝突
したＸ線の進路を示す図、第２図は本考案の１実
施例である電子線照射装置の中間Ｘ線漏出防止部
に使用する鉛板の概略断面及び侵入したＸ線の進
路を示す図、第３図及び第４図は鉛板の変形例を
示す概略断面図、第５図は電子線照射装置の概略
図、第６図は従来の電子線照射装置に使用される
平板状鉛板の概略断面及び平板状鉛板に入射した
Ｘ線の進路を示す図、第７図は従来の電子線照射
装置の中間漏出部３４に使用する鉛板の概略断面
及び侵入したＸ線の進路を示す図、第８図はＸ線
漏出防止部の概略斜視図である。
１……鉛板、１１，２１，３１……凸状部、２
……上部鉛板、２ａ，２ｂ……鋸歯面、３……下
部鉛板、３ａ，３ｂ……鋸歯面、４……通路、１
０……電子線発生部、１１……線状陰極、１２…
…電子銃、１３……シールド電極、１４……グリ
ツド、１５……箔、２０……処理室、２１……搬
入口、２２……照射部、２３……搬出口、３０…
…Ｘ線漏出防止部、３１……入口Ｘ線漏出防止部
、３２……出口Ｘ線漏出防止部、３３，３４……
中間Ｘ線漏出防止部、Ａ……被処理物。
Fig. 1 is a diagram showing a schematic cross section of a lead plate used in an electron beam irradiation device, which is an embodiment of the present invention, and the path of the X-rays that collide with the surface of the lead plate, and Fig. 2 is an embodiment of the invention. Figures 3 and 4 are schematic cross-sections of a lead plate used in the intermediate X-ray leakage prevention section of an electron beam irradiation device and the paths of the invading X-rays. Fig. 5 is a schematic diagram of an electron beam irradiation device, Fig. 6 is a diagram showing a schematic cross section of a flat lead plate used in a conventional electron beam irradiation device and the path of X-rays incident on the flat lead plate, and Fig. 7 This figure is a schematic cross-section of a lead plate used in the intermediate leakage part 34 of a conventional electron beam irradiation device and shows the path of the invading X-rays, and FIG. 8 is a schematic perspective view of the X-ray leakage prevention part. 1...Lead plate, 1 1 , 2 1 , 3 1 ...Convex portion, 2
... Upper lead plate, 2a, 2b ... Serrated surface, 3 ... Lower lead plate, 3a, 3b ... Serrated surface, 4 ... Passage, 1
0... Electron beam generating section, 11... Linear cathode, 12...
...electron gun, 13...shield electrode, 14...grid, 15...foil, 20...processing chamber, 21...carry-in port, 22...irradiation section, 23...carry-out port, 30...
...X-ray leakage prevention section, 31... Inlet X-ray leakage prevention section, 32... Outlet X-ray leakage prevention section, 33, 34...
Intermediate X-ray leakage prevention section, A...Object to be processed.
Claims (1)
射する照射部と被処理物の搬出口とを有する処理
室と、該処理室内の照射部を通過する被処理物に
電子線を照射するための電子線を発生する電子線
発生手段と、少なくとも平板状鉛板が被処理物を
介して対向配置され、被処理物への電子線の照射
の際に発生するＸ線が前記処理室内から外部へ漏
出するのを防止するために被処理物の搬送路に設
けられたＸ線漏出防止部とを有する電子線照射装
置において、前記Ｘ線漏出防止部に用いられる鉛
板の内側表面に、被処理物の搬送方向に対して略
直角な方向に延びる複数の凸状部を形成したこと
を特徴とする電子線照射装置。 (2) 前記凸状部は、その断面が鋸歯状に形成さ
れ、かつ該鋸歯状の鋸歯面のうち、少なくとも前
記照射部に近い方の面が被処理物の進行方向に対
して略垂直になるように形成されている請求項１
記載の電子線照射装置。[Scope of Claim for Utility Model Registration] (1) A processing chamber having an inlet for a workpiece, an irradiation section for irradiating the workpiece with an electron beam, and an exit for the workpiece, and an irradiation section in the processing chamber. An electron beam generating means for generating an electron beam for irradiating the passing object with the electron beam, and at least a flat lead plate are disposed facing each other with the object to be processed interposed therebetween. In the electron beam irradiation apparatus, the electron beam irradiation apparatus includes an X-ray leakage prevention section provided in a conveyance path of the processing object to prevent X-rays generated during the process from leaking from the processing chamber to the outside. An electron beam irradiation device characterized in that a plurality of convex portions extending in a direction substantially perpendicular to a direction of conveyance of an object to be processed are formed on an inner surface of a lead plate used for the workpiece. (2) The convex portion has a serrated cross section, and at least the surface of the serrated surface that is closer to the irradiation portion is substantially perpendicular to the direction of movement of the object to be processed. Claim 1 is formed so that
The electron beam irradiation device described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12746488U JPH0248900U (en) | 1988-09-29 | 1988-09-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12746488U JPH0248900U (en) | 1988-09-29 | 1988-09-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0248900U true JPH0248900U (en) | 1990-04-04 |
Family
ID=31379922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12746488U Pending JPH0248900U (en) | 1988-09-29 | 1988-09-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0248900U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017101309A (en) * | 2015-12-04 | 2017-06-08 | Ｊｆｅスチール株式会社 | Electron beam irradiation device |
-
1988
- 1988-09-29 JP JP12746488U patent/JPH0248900U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017101309A (en) * | 2015-12-04 | 2017-06-08 | Ｊｆｅスチール株式会社 | Electron beam irradiation device |
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