JPH0248133U - - Google Patents
Info
- Publication number
- JPH0248133U JPH0248133U JP12917088U JP12917088U JPH0248133U JP H0248133 U JPH0248133 U JP H0248133U JP 12917088 U JP12917088 U JP 12917088U JP 12917088 U JP12917088 U JP 12917088U JP H0248133 U JPH0248133 U JP H0248133U
- Authority
- JP
- Japan
- Prior art keywords
- gas supply
- potential side
- flange
- supply pipe
- gas passage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012212 insulator Substances 0.000 claims description 2
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Pipeline Systems (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12917088U JPH0248133U (es) | 1988-09-30 | 1988-09-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12917088U JPH0248133U (es) | 1988-09-30 | 1988-09-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0248133U true JPH0248133U (es) | 1990-04-03 |
Family
ID=31383198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12917088U Pending JPH0248133U (es) | 1988-09-30 | 1988-09-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0248133U (es) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003077415A (ja) * | 2001-09-05 | 2003-03-14 | Mitsubishi Electric Corp | イオン注入装置およびそのイオン注入装置を用いた半導体装置の製造方法 |
| JP2007324095A (ja) * | 2006-06-05 | 2007-12-13 | Canon Inc | プラズマ処理装置及び方法 |
-
1988
- 1988-09-30 JP JP12917088U patent/JPH0248133U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003077415A (ja) * | 2001-09-05 | 2003-03-14 | Mitsubishi Electric Corp | イオン注入装置およびそのイオン注入装置を用いた半導体装置の製造方法 |
| JP2007324095A (ja) * | 2006-06-05 | 2007-12-13 | Canon Inc | プラズマ処理装置及び方法 |