JPH0247052A - Sheet suitable for iron based printed board - Google Patents
Sheet suitable for iron based printed boardInfo
- Publication number
- JPH0247052A JPH0247052A JP19726188A JP19726188A JPH0247052A JP H0247052 A JPH0247052 A JP H0247052A JP 19726188 A JP19726188 A JP 19726188A JP 19726188 A JP19726188 A JP 19726188A JP H0247052 A JPH0247052 A JP H0247052A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- steel plate
- chromate
- plating
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 title claims description 14
- 229910052742 iron Inorganic materials 0.000 title claims description 7
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 30
- 239000010959 steel Substances 0.000 claims abstract description 30
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000011651 chromium Substances 0.000 claims abstract description 14
- 150000001875 compounds Chemical class 0.000 claims abstract description 12
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 10
- 229920000620 organic polymer Polymers 0.000 claims abstract description 6
- 229910052718 tin Inorganic materials 0.000 claims abstract description 6
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052802 copper Inorganic materials 0.000 claims abstract description 4
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 4
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 abstract description 45
- 229910052751 metal Inorganic materials 0.000 abstract description 12
- 239000002184 metal Substances 0.000 abstract description 12
- 239000011247 coating layer Substances 0.000 abstract description 8
- 238000005520 cutting process Methods 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 5
- 238000003825 pressing Methods 0.000 abstract description 5
- 238000006243 chemical reaction Methods 0.000 abstract description 3
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 abstract description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract description 2
- OWMBTIRJFMGPAC-UHFFFAOYSA-N dimethylamino 2-methylprop-2-enoate Chemical compound CN(C)OC(=O)C(C)=C OWMBTIRJFMGPAC-UHFFFAOYSA-N 0.000 abstract description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 abstract description 2
- 238000004532 chromating Methods 0.000 abstract 1
- 229920006026 co-polymeric resin Polymers 0.000 abstract 1
- 239000002075 main ingredient Substances 0.000 abstract 1
- 238000007747 plating Methods 0.000 description 20
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 13
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 239000011889 copper foil Substances 0.000 description 10
- 238000004080 punching Methods 0.000 description 8
- 229920000768 polyamine Polymers 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 4
- 235000013405 beer Nutrition 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 229910000976 Electrical steel Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 2
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 2
- -1 NirZn Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 125000004985 dialkyl amino alkyl group Chemical group 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000010008 shearing Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229910003556 H2 SO4 Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 241000269821 Scombridae Species 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 239000002168 alkylating agent Substances 0.000 description 1
- 229940100198 alkylating agent Drugs 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 125000004202 aminomethyl group Chemical group [H]N([H])C([H])([H])* 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 150000001541 aziridines Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 239000010960 cold rolled steel Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 125000003010 ionic group Chemical group 0.000 description 1
- 235000020640 mackerel Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 229940044654 phenolsulfonic acid Drugs 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229920000333 poly(propyleneimine) Polymers 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Iron Core Of Rotating Electric Machines (AREA)
- Laminated Bodies (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は絶縁層との密着性及び打抜き特性に優れた鉄系
プリント基板に適した鋼板に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a steel plate suitable for iron-based printed circuit boards that has excellent adhesion to an insulating layer and punching properties.
[従来の技術]
近年、放熱性、機械的強度が優れたものとして、また小
型モーターの磁路として、鋼板をベースにした鉄系プリ
ント基板が用いられている。[Prior Art] In recent years, iron-based printed circuit boards based on steel plates have been used as having excellent heat dissipation properties and mechanical strength, and as magnetic paths for small motors.
ところが、鉄系プリント基板の場合、絶縁層を形成後銅
箔を貼り、銅箔に回路を形成するため薬品でエツチング
した場合や、半田付けをした場合に絶縁層との間より剥
離したり、切断やプレス時に端部より2〜3mm程度剥
離したり、切断時のカエリ等の問題があった。However, in the case of iron-based printed circuit boards, when copper foil is pasted after forming an insulating layer, and etching is performed using chemicals to form a circuit on the copper foil, or when soldering is performed, the copper foil may peel off between the insulating layer and the copper foil. There were problems such as peeling of about 2 to 3 mm from the edges during cutting and pressing, and burrs during cutting.
又銅箔を貼った面と反対側の鋼板の耐錆性、更に切断さ
れた鋼板の端面の耐錆性に問題があった。Additionally, there were problems with the rust resistance of the steel plate on the opposite side to the side to which the copper foil was applied, as well as the rust resistance of the cut end face of the steel plate.
一方、特開昭61−142939号公報により、小型精
密モーター用プリント基板に適した鋼板が提案されてい
る。この内容は鋼板(含む珪素鋼板)の表面にSn、Z
n、Ni、Cr、CLI、j61の内から1種又は、2
種以上を5〜150g/rfメツキすることにより、プ
リント基板の製造工程で鋼板にエポキシ樹脂等の絶縁層
(約100μ)を施し、その上に銅箔を貼り付けて所望
の配線状態にエツチングし、銅箔の配線箇所に種々の部
品を半田付けした場合の鋼板と絶縁層との密着性が改善
されると共に、耐錆性が向上するというものである。On the other hand, Japanese Patent Application Laid-Open No. 61-142939 proposes a steel plate suitable for printed circuit boards for small precision motors. This content includes Sn and Z on the surface of steel plates (including silicon steel plates).
One or two of the following: n, Ni, Cr, CLI, j61
By plating 5 to 150g/rf of the seed or higher, an insulating layer (approximately 100μ) of epoxy resin or the like is applied to the steel plate in the printed circuit board manufacturing process, and copper foil is pasted on top of it and etched into the desired wiring state. , when various parts are soldered to the copper foil wiring locations, the adhesion between the steel plate and the insulating layer is improved, and the rust resistance is also improved.
所が、上記の提案においては依然として、切断面やプレ
ス時の絶縁層の端部の剥離、切断時の鋼板のカエリの問
題は未解決である。However, the above-mentioned proposal still leaves unsolved problems such as peeling of the cut surface and the edges of the insulating layer during pressing, and burrs of the steel plate during cutting.
本発明は上記の欠点を改善した絶縁層との密着性、打抜
き特性に優れた鉄系プリント基板に適した鋼板の提供を
目的としたものである。The object of the present invention is to provide a steel plate suitable for iron-based printed circuit boards, which improves the above-mentioned drawbacks and has excellent adhesion with an insulating layer and punching properties.
本発明は、第1図のように鋼板1の表面にCr。 In the present invention, as shown in FIG. 1, the surface of a steel plate 1 is coated with Cr.
Cu 、N i r Z n 、S nの内から選ばれ
た1種又は2種以上の特定量のメツキ層2を形成し、そ
の上に特定量のクロメート層3を形成させ、その上に有
機高分子化合物を特徴とする特定量の有機被覆層4を形
成したものである。A plating layer 2 of a specific amount of one or more types selected from Cu, NirZn, and Sn is formed, a specific amount of a chromate layer 3 is formed thereon, and an organic A specific amount of organic coating layer 4 characterized by a polymer compound is formed.
尚、本発明鋼板を用いてプリント基板を製造するに当た
っては、図示の如く片面に絶縁層5、及び銅箔6を形成
するものである。In manufacturing a printed circuit board using the steel sheet of the present invention, an insulating layer 5 and a copper foil 6 are formed on one side as shown in the figure.
鋼板1として、板厚が0.2〜2.0 mmが望ましく
、板厚が0.2mtm未満では放熱性が充分でなく、2
.0朋超では小型モーターの磁路として用いた場合、良
好なモーター特性が得られない。It is desirable that the steel plate 1 has a thickness of 0.2 to 2.0 mm; if the thickness is less than 0.2 mtm, the heat dissipation will not be sufficient;
.. If it exceeds 0, good motor characteristics cannot be obtained when used as a magnetic path for a small motor.
又、鋼板の組成としては、放熱性や機械的強度のみが必
要な場合には普通鋼で充分であるが、小型モーター用の
磁路として用いる場合には、通常のモーター用に使用さ
れる0、5〜3.5%の珪素を含有した珪素鋼板を用い
ることが好ましい。Regarding the composition of the steel plate, if only heat dissipation and mechanical strength are required, ordinary steel is sufficient, but when used as a magnetic path for a small motor, 0.05 mm, which is used for ordinary motors, is sufficient. It is preferable to use a silicon steel plate containing 5 to 3.5% silicon.
これらの鋼板1の表面に形成するメツキ層2は、Cr、
Cu、Nl、Zn、Snの内から選ばれた1種又は2種
類以上を0.5g/ば〜5g/イのメツキ量であり、そ
の上のクロメート層3は、金属クロム換算で10〜80
+++g/rrfのクロメート量であり、更にその上に
形成する有機高分子化合物を主成分とする有機被覆層4
は0.5〜5g/rr?の有機皮膜量であることを必須
とするものである。The plating layer 2 formed on the surface of these steel plates 1 is made of Cr,
One or more selected from Cu, Nl, Zn, and Sn are plated in an amount of 0.5 to 5 g/I, and the chromate layer 3 thereon has a plating amount of 10 to 80 in terms of metallic chromium.
+++g/rrf chromate amount, and an organic coating layer 4 mainly composed of an organic polymer compound formed thereon.
Is it 0.5~5g/rr? It is essential that the amount of organic film is .
以下限定理由を詳細に説明する。The reason for the limitation will be explained in detail below.
先ず、メツキ層2については、メツキ金属としてCr、
Cu、Nl 、Zn、Snを選定し、これらの内から選
ばれた1tTi又は2種以上を0.5〜5.0g/dメ
ツキする。メツキ量が0.5g/rrf未満では常態で
も良好な密着性が得られず、又耐錆性も不十分である。First, regarding the plating layer 2, as the plating metal, Cr,
Cu, Nl, Zn, and Sn are selected, and 1tTi or two or more selected from these are plated at a rate of 0.5 to 5.0 g/d. If the amount of plating is less than 0.5 g/rrf, good adhesion cannot be obtained even under normal conditions, and rust resistance is also insufficient.
一方5g/rrF超では、製造コストが高いばかりでな
く、半田後の絶縁層との密着性が劣る。この場合のメツ
キ層2は、単層メツキ、重層メツキ、単層メツキ又は重
層メツキ後の合金化処理を包含するものである。On the other hand, if it exceeds 5 g/rrF, not only is the manufacturing cost high, but also the adhesion to the insulating layer after soldering is poor. The plating layer 2 in this case includes single-layer plating, multi-layer plating, single-layer plating, or alloying treatment after multi-layer plating.
これらの表面に施すクロメート処理層3としては、本発
明では特に限定するものではないが、短時間で安定した
クロメート皮膜を得るにはCro3−H,、SO4,C
ro3−HCll。The chromate treatment layer 3 applied to these surfaces is not particularly limited in the present invention, but in order to obtain a stable chromate film in a short time, Cro3-H, SO4, C
ro3-HCll.
Cr Oa HF等の無水クロム酸にアニオンを、必
要に応じてCr Oa ffiの1〜3%添加した浴が
適当である。A bath in which an anion is added to chromic anhydride such as Cr Oa HF in an amount of 1 to 3% of Cr Oa ffi as necessary is suitable.
又、処理法としては、電解法でも、浸漬法でも良い。こ
れらの金属クロム換算でlO〜80I1g/dクロメー
ト処理を施こす。Further, the treatment method may be an electrolytic method or a dipping method. The chromate treatment is carried out in terms of 10 to 80 I1 g/d in terms of metal chromium.
クロメート量が10mg/rrr未満では常態でも密着
性の改善効果が殆どなく80mg/rr?超ではクロメ
ート層の強度不足から、クロメート皮膜層で凝集破壊し
て密着性が劣化する等の欠点を生じて好ましくない。If the amount of chromate is less than 10 mg/rrr, there is almost no effect of improving adhesion even under normal conditions, and 80 mg/rr? If it is more than 100%, the strength of the chromate layer is insufficient, causing defects such as cohesive failure in the chromate film layer and deterioration of adhesion, which is not preferable.
次に有機被覆層4であるが、有機高分子化合物を主成分
とする所定量の有機被覆層を形成すると、プリント基板
の製造工程で絶縁層及び銅箔を形成し、エツチング後半
田付けする場合の半田耐熱性(耐熱ビール強度)を劣化
させることなく、打抜き加工時の金属層と絶縁層間の密
着不良による剥離が防止できると共に、金属層のカエリ
が減少することを見出した。Next, regarding the organic coating layer 4, when a predetermined amount of organic coating layer mainly composed of an organic polymer compound is formed, an insulating layer and copper foil are formed in the printed circuit board manufacturing process, and soldering is performed after etching. It has been found that peeling due to poor adhesion between the metal layer and the insulating layer during punching can be prevented and the burr of the metal layer can be reduced without deteriorating the solder heat resistance (heat-resistant beer strength) of the metal layer.
この場合、その量が0.5g1rd未満では目的が達成
されず、打抜き時の絶縁皮膜の剥離、並びに打抜き、切
断時の金属層のカエリに対する改善効果が少なく、又耐
錆性も十分ではない。一方、5g / rr?超では、
半田耐熱性(耐熱ビール強度)が劣化する傾向が認めら
れるものである。In this case, if the amount is less than 0.5g1rd, the purpose will not be achieved, and the effect of improving the peeling of the insulating film during punching and the burring of the metal layer during punching and cutting will be small, and the rust resistance will not be sufficient. On the other hand, 5g/rr? In super,
There is a tendency for solder heat resistance (heat-resistant beer strength) to deteriorate.
これら有機被覆層4として用いられる有機高分子化合物
としては、水溶性または水分散性の有機樹脂が、又は通
常の有機溶剤に溶解した何機高分子化合物が使用出来る
。As the organic polymer compound used as the organic coating layer 4, a water-soluble or water-dispersible organic resin, or a polymer compound dissolved in a common organic solvent can be used.
これらの有機樹脂としては、例えば、■ポリエチレンイ
ミン、ポリプロピレンイミン等のポリアルキレンポリア
ミンおよびその誘導体、■ポリカルボン酸とポリアミン
との縮合により生成するポリアミドポリアミンおよびそ
の誘導体、■エポキシ樹脂等のポリグリシジル化合物と
アミンおよび/またはポリアミンとの反応によって得ら
れる陽イオン性エポキシ樹脂、■ウレタンプレポリマー
等のポリイソシアネート化合物とアミンおよび/または
ポリアミンとの反応によって得られる陽イオン性尿素系
樹脂、■ジアルキルアミノアルキル(メタ)アクリレー
ト等のアミノエステル基を含有するビニル化合物、ビニ
ルピリジン、ビニルイミダゾールあるいはそれらの塩類
等陽イオン性窒素含有ビニル化合物から選ばれた1種ま
たは2種以上から導かれた重合体あるいはこれらの陽イ
オン性窒素含有ビニル化合物と共重合可能な他の単量体
との多成分共重合体、■ジアリルアミンおよびその塩類
からなる群から選ばれた1種または2種以上の単量体か
ら導かれた重合体あるいはこれらの単量体と共重合可能
な他の単量体との共重合体、■クロルメチル基および/
またはヒドロキシメチル基含有重合体とアミンおよび/
またはポリアミンとの反応によって得られるアミノメチ
ル基含有樹脂、■ポリハロアルカンおよび/またはエピ
ハロヒドリンおよび/またはポリエビハロヒドリンとア
ミンおよび/またはポリアミンとの重縮合物、■前記第
■〜■の陽イオン性樹脂に公知の方法で(−例としてク
ロル酢酸等を用いて)陰イオン性基としてカルボキシル
基を導入した樹脂、[相](メタ)アクリル系樹脂、ア
ルキッド系樹脂あるいはマレイン化ポリブタジェン等の
カルボキシル基含有樹脂とエチレンイミン、ボロピレン
イミン、ヒドロキシエチレンイミン、1,6−へキサメ
チレンジエチレンウレア、ジフェニルメタン、4.4−
N、N−ジエチレンウレア等のアジリジン化合物やグ
リシジルアミン、またはその塩等の塩基性窒素含有アル
キル化剤との反応によって得られる両性イオン基を有す
る樹脂、■ジアルキルアミノアルキル(メタ)アクリレ
ート、ビニルピリジン、ビニルイミダゾールあるいはそ
れらの塩類等の塩基性窒素含有ビニル化合物から選ばれ
た1種または2種以上と、(メタ)アクリル酸、クロト
ン酸あるいはマレイン酸等のカルボキシル基含有ビニル
化合物の1種または2種以上との共重合体、あるいは共
重合可能な他の単量体との多成分共重合体等の■〜■の
水溶性あるいは水分散性の樹脂の1種または2種以上の
混合樹脂が用いられる。Examples of these organic resins include: (1) polyalkylene polyamines such as polyethyleneimine and polypropylene imine and their derivatives; (2) polyamide polyamines and their derivatives produced by condensation of polycarboxylic acids and polyamines; and (2) polyglycidyl compounds such as epoxy resins. Cationic epoxy resin obtained by reacting with amine and/or polyamine, ■Cationic urea resin obtained by reacting polyisocyanate compound such as urethane prepolymer with amine and/or polyamine, ■Dialkylaminoalkyl A polymer derived from one or more cationic nitrogen-containing vinyl compounds such as vinyl compounds containing amino ester groups such as (meth)acrylate, vinylpyridine, vinylimidazole, or their salts, or a polymer derived from these. A multi-component copolymer of a cationic nitrogen-containing vinyl compound and other copolymerizable monomers; ■ A multicomponent copolymer derived from one or more monomers selected from the group consisting of diallylamine and its salts. or a copolymer of these monomers with other copolymerizable monomers, ■ chloromethyl group and/or
or hydroxymethyl group-containing polymer and amine and/or
or an aminomethyl group-containing resin obtained by reaction with a polyamine; ■ a polycondensate of polyhaloalkane and/or epihalohydrin and/or polyepihalohydrin with an amine and/or polyamine; ■ cations of the above-mentioned Nos. [Phase] (meth)acrylic resin, alkyd resin, or carboxyl group such as maleated polybutadiene Group-containing resin and ethyleneimine, boropyreneimine, hydroxyethyleneimine, 1,6-hexamethylene diethylene urea, diphenylmethane, 4.4-
Resins with amphoteric ionic groups obtained by reaction with basic nitrogen-containing alkylating agents such as aziridine compounds such as N,N-diethyleneurea, glycidylamine, or its salts, ■Dialkylaminoalkyl (meth)acrylates, vinylpyridine , one or more basic nitrogen-containing vinyl compounds such as vinylimidazole or their salts, and one or two carboxyl group-containing vinyl compounds such as (meth)acrylic acid, crotonic acid, or maleic acid. One or more mixed resins of water-soluble or water-dispersible resins from ■ to ■, such as copolymers with more than one species or multi-component copolymers with other copolymerizable monomers. used.
また、これらの有機樹脂にシリカゾル、Ag化合物、T
1化合物、シランカップリング剤等を添加したものを用
いてもよい。これら有機樹脂処理液はロール、スプレー
等で塗布され、熱風、誘導加熱等で加熱乾燥される。In addition, silica sol, Ag compound, T
One compound, a silane coupling agent, etc. may be added. These organic resin treatment liquids are applied by roll, spray, etc., and dried by heating with hot air, induction heating, etc.
これら有機皮膜層4は、鋼板との接着性を第一の目的と
して皮膜設計することが重要で、上記した如く本発明に
適用出来る樹脂はいずれも0゜Nを含む多くの官能基を
有しており、プリント基板の絶縁樹脂層との密着性を大
幅に改善している。It is important to design these organic film layers 4 with the primary purpose of adhesion to the steel plate, and as mentioned above, all the resins that can be applied to the present invention have many functional groups including 0°N. This significantly improves the adhesion with the insulating resin layer of the printed circuit board.
更に、これら有機樹脂は、メツキ面の耐鯖性向上にも大
いに寄与しており、Cu箔反対面の鋼板の耐錆性も著し
く向上する。Furthermore, these organic resins greatly contribute to improving the mackerel resistance of the plated surface, and the rust resistance of the steel plate on the opposite side of the Cu foil is also significantly improved.
以上の如く、鋼板の表面にCr、Cu、N1 。As mentioned above, Cr, Cu, and N1 are on the surface of the steel plate.
Zn、Snの内から選ばれた1種又は2種以上を0.5
〜5.0g/rfのメツキをし、その上に金属クロム換
算でlO〜80mg/rr?のクロメート処理を施し、
更に、その上に有機高分子化合物を主成分とする有機被
覆を0.5〜5.0g/ゴ塗布した本発明の鋼板によれ
ば、プリント基板の製造工程で形成する絶縁層との密着
性、耐錆性に優れることは勿論のこと、プリント基板の
切断や、プレス時の絶縁層の端部剥離がなく、又切断時
の金属層のカエリが少ない等、打抜き特性が優れたもの
である。0.5 of one or more selected from Zn and Sn
~5.0g/rf plating, and on top of that, 1O~80mg/rr in terms of metallic chromium? Chromate treatment of
Furthermore, according to the steel sheet of the present invention, on which an organic coating containing an organic polymer compound as a main component is coated in an amount of 0.5 to 5.0 g/g, the adhesiveness with the insulating layer formed in the manufacturing process of the printed circuit board is improved. Not only does it have excellent rust resistance, but it also has excellent punching characteristics, such as no peeling of the edges of the insulating layer when cutting printed circuit boards or pressing, and less burring of the metal layer when cutting. .
実施例 1
通常の低炭素冷延鋼板(板厚0.5m+w)および2.
0%の珪素を含有した珪素鋼板(板厚0.5sm)を次
の工程で処理した。Example 1 Ordinary low carbon cold rolled steel plate (plate thickness 0.5m+w) and 2.
A silicon steel plate (plate thickness 0.5 sm) containing 0% silicon was treated in the following process.
先ず、前処理として、3%苛性ソーダ溶液(液温40℃
)で2A/dm2x2秒で電解脱脂した。次いで市販の
砥粒入研削ブラシ(商品名サングリッド)で鋼板表面を
研削し、次いで5%硫酸溶液(液温20℃)で2A/d
I12X1秒で電解酸洗した。First, as a pretreatment, a 3% caustic soda solution (liquid temperature: 40°C) was used.
) was electrolytically degreased at 2 A/dm2 x 2 seconds. Next, the surface of the steel plate was ground with a commercially available abrasive-containing grinding brush (product name: Sungrid), and then heated at 2 A/d with a 5% sulfuric acid solution (liquid temperature 20°C).
Electrolytic pickling was carried out using I12X for 1 second.
この鋼板1を用いて次の条件でメツキを実施し、メツキ
層2を形成した。Using this steel plate 1, plating was performed under the following conditions to form a plating layer 2.
メツキ条件
1、Znメツキ: Z n S Oi、 7 H202
00sr / 1゜H2So415g/ff
DK(電流密度) 50A/dm2
浴温50℃
2、Cuメツキ:CCu2P2O72H2080/gN
H40H1g / fl 。Plating condition 1, Zn plating: Z n S Oi, 7 H202
00sr / 1゜H2So415g/ff DK (current density) 50A/dm2 Bath temperature 50℃ 2, Cu plating: CCu2P2O72H2080/gN
H40H1g/fl.
K 2 P 207 300 g / D 。K 2 P 207 300 g / D .
K N O38g / D pH8〜9゜DK (電
流密度)8A/c1m2
浴温50℃
メツキ: N i 5O46H20250g/fl 。KNO38g/D pH8~9°DK (current density) 8A/c1m2 Bath temperature 50°C Plating: Ni5O46H20250g/fl.
H2SO415g/g DK (電流密度)8A/dn+2 浴温50℃ 4.3nメツキ:フェノールスルホン酸200g/Ω。H2SO415g/g DK (current density) 8A/dn+2 Bath temperature 50℃ 4.3n plating: phenolsulfonic acid 200g/Ω.
Sn”30sr/N 浴温40℃
DK (?!S流密度) 15A/dff12その後、
クロメート処理として、電解処理を実施し、クロメート
層3を形成した。クロメート処理条件はCr03−H2
SO4浴(Cr Oa50g/fl 、 H2S O4
0,5g/N )を用いて、DK(電流密度) 30A
/da2(浴温50℃)で処理した。Sn”30sr/N Bath temperature 40℃ DK (?!S flow density) 15A/dff12 After that,
As the chromate treatment, electrolytic treatment was performed to form a chromate layer 3. Chromate treatment conditions are Cr03-H2
SO4 bath (Cr Oa50g/fl, H2S O4
0.5g/N), DK (current density) 30A
/da2 (bath temperature 50°C).
これらのクロメート処理した鋼板の表面にメチルメタア
クリレート50%、エチルアクリレート20%、ジメチ
ルアミノメタアクリレート20%を共重合することによ
って得られた水分散性三元共重合体樹脂をIg/rr?
、 3g/rrf、 7g/rrr塗布し、乾燥して
、有機被覆層4を形成しプリント基板に適した鋼板を得
た。A water-dispersible terpolymer resin obtained by copolymerizing 50% methyl methacrylate, 20% ethyl acrylate, and 20% dimethylamino methacrylate on the surface of these chromate-treated steel sheets was added to Ig/rr?
, 3g/rrf, 7g/rrr and dried to form an organic coating layer 4 to obtain a steel plate suitable for printed circuit boards.
その上に、絶縁層5として、ガラスエポキシ樹脂のプリ
プレグ(膜厚100un)を重ね、更に金属箔層6とし
て、銅箔を重ねて、170℃で20kg/cシの圧力で
20分間加圧し、その後170℃で2時間加圧下で加熱
してプリント基板を製作した。On top of that, a glass epoxy resin prepreg (film thickness 100 um) is layered as an insulating layer 5, and copper foil is further layered as a metal foil layer 6, and the mixture is pressurized at 170° C. and a pressure of 20 kg/c for 20 minutes. Thereafter, a printed circuit board was manufactured by heating at 170° C. for 2 hours under pressure.
各種条件で製造した鉄系プリント基板の評価を第1表(
1)、(2)に示した。Table 1 shows the evaluation of iron-based printed circuit boards manufactured under various conditions (
Shown in 1) and (2).
常態ビール強度・・・
接着後、常温で24時間保管後、JISC6481の引
き剥がし強さの測定方法に従って評価
耐熱ビール強度・・・
接着後、常温で24時間保管後、260℃の半田浴に3
0秒浮かべた後に常温
まで冷却して、JIS C6481の引き剥がし強さの
tF1定方決方法って評価
剪断時の剥離状況・・・
接着後、常温で24時間保管後、プレ
スにて打抜き後の接若層の剥離状況
○:皮膜の剥離がなく、良好
△;絶縁層と金属界面で一部剥離
×:絶縁層と金属界面で剥離
剪断時のカエリの状況・・・
接着後、常温で24時間保管後、同一
金型で打抜き後のカエリの状況を顕
微鏡で観察
O:カエリが30μ未満で良好
×:カエリが30μ以上で不良
塩水噴霧耐錆性・・・
JIS Z−23711:?%拠して行イア2時間後の
錆発生を目視判定。(無−錆が認
められない。白−白錆、赤−赤錆)
〔発明の効果〕
本発明の鋼板によれば、絶縁層との密着性、並びに耐錆
性に優れることは勿論のこと、特にプリント基板の切断
やプレス時の絶縁層の耐剥離性に優れると共に、金属層
のカエリが少ないという等効果を奏するものである。Normal beer strength...After adhesion, after storage at room temperature for 24 hours, evaluated according to the peel strength measurement method of JISC6481.Heat-resistant beer strength...After adhesion, after storage at room temperature for 24 hours, in a solder bath at 260℃
After floating for 0 seconds, cool to room temperature, and evaluate the JIS C6481 peel strength tF1 determination method. Peeling status during shearing... After adhesion, after storage at room temperature for 24 hours, and after punching with a press. Peeling status of the adhesive layer ○: No peeling of the film, good △; Partial peeling at the insulating layer and metal interface ×: Peeling at the insulating layer and metal interface Situation of burrs during shearing... After adhesion, at room temperature After storage for 24 hours, observe the condition of burrs after punching with the same mold using a microscope. O: Good if the burrs are less than 30μ. ×: Poor if the burrs are 30μ or more. Salt spray rust resistance... JIS Z-23711:? Visually judge the occurrence of rust after 2 hours of testing. (No rust - no rust observed; white - white rust, red - red rust) [Effects of the invention] The steel plate of the present invention not only has excellent adhesion with the insulating layer and rust resistance, but also In particular, it has excellent peeling resistance of the insulating layer during cutting and pressing of printed circuit boards, and also has effects such as less burring of the metal layer.
第1図は本発明の説明図である。 FIG. 1 is an explanatory diagram of the present invention.
Claims (1)
ばれた1種又は2種以上を0.5〜5g/m^2メッキ
し、その上に金属クロム換算で10〜80mg/m^2
のクロメート処理を施し、更に有機高分子化合物を主成
分とする有機被覆を0.5〜5g/m^2塗布したこと
を特徴とする鉄系プリント基板に適した鋼板。The surface of the steel plate is plated with 0.5 to 5 g/m^2 of one or more selected from Cr, Cu, Ni, Zn, and Sn, and then 10 to 80 mg/m in terms of metallic chromium. ^2
A steel plate suitable for iron-based printed circuit boards, characterized in that it has been subjected to a chromate treatment and further coated with an organic coating containing an organic polymer compound as a main component at a rate of 0.5 to 5 g/m^2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19726188A JPH0247052A (en) | 1988-08-09 | 1988-08-09 | Sheet suitable for iron based printed board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19726188A JPH0247052A (en) | 1988-08-09 | 1988-08-09 | Sheet suitable for iron based printed board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0247052A true JPH0247052A (en) | 1990-02-16 |
Family
ID=16371524
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19726188A Pending JPH0247052A (en) | 1988-08-09 | 1988-08-09 | Sheet suitable for iron based printed board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0247052A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62176836A (en) * | 1986-01-30 | 1987-08-03 | 日立化成工業株式会社 | Manufacture of steel-plate base copper-lined laminated board |
-
1988
- 1988-08-09 JP JP19726188A patent/JPH0247052A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62176836A (en) * | 1986-01-30 | 1987-08-03 | 日立化成工業株式会社 | Manufacture of steel-plate base copper-lined laminated board |
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