JPH0247031U - - Google Patents
Info
- Publication number
- JPH0247031U JPH0247031U JP12587288U JP12587288U JPH0247031U JP H0247031 U JPH0247031 U JP H0247031U JP 12587288 U JP12587288 U JP 12587288U JP 12587288 U JP12587288 U JP 12587288U JP H0247031 U JPH0247031 U JP H0247031U
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- reticle
- cleaning
- chemical solution
- scrub
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 5
- 238000005201 scrubbing Methods 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12587288U JPH0247031U (zh) | 1988-09-26 | 1988-09-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12587288U JPH0247031U (zh) | 1988-09-26 | 1988-09-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0247031U true JPH0247031U (zh) | 1990-03-30 |
Family
ID=31376862
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12587288U Pending JPH0247031U (zh) | 1988-09-26 | 1988-09-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0247031U (zh) |
-
1988
- 1988-09-26 JP JP12587288U patent/JPH0247031U/ja active Pending