JPH0243259A - Thermoplastic resin composition for sealing electronic component - Google Patents
Thermoplastic resin composition for sealing electronic componentInfo
- Publication number
- JPH0243259A JPH0243259A JP19401788A JP19401788A JPH0243259A JP H0243259 A JPH0243259 A JP H0243259A JP 19401788 A JP19401788 A JP 19401788A JP 19401788 A JP19401788 A JP 19401788A JP H0243259 A JPH0243259 A JP H0243259A
- Authority
- JP
- Japan
- Prior art keywords
- pp5k
- filler
- temperature
- weight
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims description 7
- 229920005992 thermoplastic resin Polymers 0.000 title claims description 7
- 238000007789 sealing Methods 0.000 title description 9
- 229920005989 resin Polymers 0.000 claims abstract description 16
- 239000011347 resin Substances 0.000 claims abstract description 16
- 239000000945 filler Substances 0.000 claims abstract description 13
- 125000003118 aryl group Chemical group 0.000 claims abstract description 9
- 239000012765 fibrous filler Substances 0.000 claims abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 36
- 239000003960 organic solvent Substances 0.000 abstract description 17
- 239000000203 mixture Substances 0.000 abstract description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 11
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract description 9
- 239000002904 solvent Substances 0.000 abstract description 8
- 239000002253 acid Substances 0.000 abstract description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 4
- 238000002156 mixing Methods 0.000 abstract description 4
- 239000003365 glass fiber Substances 0.000 abstract description 3
- 150000002576 ketones Chemical class 0.000 abstract description 3
- 229920006295 polythiol Polymers 0.000 abstract description 3
- 239000005350 fused silica glass Substances 0.000 abstract description 2
- 238000005476 soldering Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 13
- 238000005406 washing Methods 0.000 description 13
- 238000004140 cleaning Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 7
- 238000011282 treatment Methods 0.000 description 7
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000010306 acid treatment Methods 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 239000004743 Polypropylene Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- -1 aromatic thioether Chemical class 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 238000007385 chemical modification Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 229920000069 polyphenylene sulfide Polymers 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- JITSWUFGPFIMFG-UHFFFAOYSA-N 1,1,2,2,4-pentachlorobutane Chemical compound ClCCC(Cl)(Cl)C(Cl)Cl JITSWUFGPFIMFG-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- OKISUZLXOYGIFP-UHFFFAOYSA-N 4,4'-dichlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=C(Cl)C=C1 OKISUZLXOYGIFP-UHFFFAOYSA-N 0.000 description 1
- ODPYDILFQYARBK-UHFFFAOYSA-N 7-thiabicyclo[4.1.0]hepta-1,3,5-triene Chemical compound C1=CC=C2SC2=C1 ODPYDILFQYARBK-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 101000964718 Homo sapiens Zinc finger protein 384 Proteins 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229920013632 Ryton Polymers 0.000 description 1
- 239000004736 Ryton® Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 102100040731 Zinc finger protein 384 Human genes 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910052977 alkali metal sulfide Inorganic materials 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 150000003857 carboxamides Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- VHHHONWQHHHLTI-UHFFFAOYSA-N hexachloroethane Chemical compound ClC(Cl)(Cl)C(Cl)(Cl)Cl VHHHONWQHHHLTI-UHFFFAOYSA-N 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- IHYNKGRWCDKNEG-UHFFFAOYSA-N n-(4-bromophenyl)-2,6-dihydroxybenzamide Chemical compound OC1=CC=CC(O)=C1C(=O)NC1=CC=C(Br)C=C1 IHYNKGRWCDKNEG-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- IWELDVXSEVIIGI-UHFFFAOYSA-N piperazin-2-one Chemical class O=C1CNCCN1 IWELDVXSEVIIGI-UHFFFAOYSA-N 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- HYHCSLBZRBJJCH-UHFFFAOYSA-M sodium hydrosulfide Chemical compound [Na+].[SH-] HYHCSLBZRBJJCH-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000012222 talc Nutrition 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、芳香族ポリチオエーテルケトン樹脂、ケイ酸
質充填材および繊維状充填材からなる樹脂組成物、特に
耐ハンダ性および流動性にすぐれた電子部品封止用熱可
塑性樹脂組成物に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a resin composition comprising an aromatic polythioetherketone resin, a siliceous filler, and a fibrous filler, which has particularly excellent solder resistance and fluidity. The present invention relates to a thermoplastic resin composition for encapsulating electronic components.
従来、IC,!−ランシスター ダイオード、コンデン
サー サイリスター コイル、コネク1゜
2゜
ター等の電子部品は、電気絶縁性の保持、機械的保護、
外部雰囲気による特性変化の防止等の目的でエポキシ樹
脂あるいはシリコーン樹脂等の熱硬化性樹脂を使用し、
トランスファーあるいは圧縮成形方法を採用して被覆ま
たは封止することが広く行われている。Conventionally, IC,! -Electronic components such as Lansistor diodes, capacitors, thyristor coils, and connectors must maintain electrical insulation, mechanical protection,
Thermosetting resins such as epoxy resins or silicone resins are used to prevent changes in characteristics due to external atmosphere.
Covering or sealing using transfer or compression molding methods is widely practiced.
しかし、これらの熱硬化性樹脂は、樹脂の保存性が悪い
こと、封止成形時の成形サイクルが長くなったり、ある
いはランナー スプルーの再利用ができない等の問題が
ある。However, these thermosetting resins have problems such as poor resin storage stability, a long molding cycle during sealing molding, and the inability to reuse the runner sprue.
更に近年、上記した熱硬化性樹脂の問題点を解決する目
的で熱可塑性樹脂であるポリフェニレンスルフィド樹脂
を使用し、封止することが特開昭52−149348号
、特開昭53−66°565号公報および米国特許42
69756号公報に開示されている。Furthermore, in recent years, in order to solve the above-mentioned problems of thermosetting resins, polyphenylene sulfide resin, which is a thermoplastic resin, has been used for sealing in JP-A-52-149348 and JP-A-53-66°565. Publication No. 42 and U.S. Patent No. 42
It is disclosed in Japanese Patent No. 69756.
また、−船底〔1〕の構造をもつ芳香族ポリチオエーテ
ルケトンは高融点(Tm=350℃)、且つ高ガラス転
位点(Tg=145℃)を有し、耐熱性、機械的性質、
電気的性質及び寸法安定性に優れ、且つ吸水率が低く、
物理的に非常に優れている。また、濃硫酸以外の溶剤に
は不溶であり、耐薬品性も非常に優れた熱可塑性ポリマ
であることが知られている(特公昭47−617号公報
)。In addition, the aromatic polythioetherketone with the structure [1] has a high melting point (Tm = 350°C) and a high glass transition point (Tg = 145°C), and has good heat resistance, mechanical properties,
Excellent electrical properties and dimensional stability, and low water absorption.
Physically very good. It is also known to be a thermoplastic polymer that is insoluble in solvents other than concentrated sulfuric acid and has excellent chemical resistance (Japanese Patent Publication No. 47-617).
しかし、ポリフェニレンスルフィド樹脂は樹脂単体では
熱変形温度が130〜140℃であり、かつ成形体が非
常番ζもろい欠点を有しているので、電子部品封止用途
にはケイ酸質充填材および繊維状充填材を配合して、熱
変形温度および機械的強度の向上、線膨張係数の低下等
の改善を行っている。However, polyphenylene sulfide resin has a thermal deformation temperature of 130 to 140°C when used as a single resin, and has the disadvantage that the molded product is extremely brittle. By blending fillers in the form of fillers, improvements such as improvements in heat distortion temperature, mechanical strength, and reduction in linear expansion coefficient are achieved.
しかしながら、上記充填材によって強度および耐熱性の
改善をしているにもかかわらず、ポI7 フェニレンス
ルフィド樹脂は電子部品を成形後、260℃のハンダ浴
に10秒間浸漬すると、成形品がツクしたりあるいはク
ラックが発生する欠点を有している。このため、260
℃以上の耐ハンダ性が要求される用途、例えばIC。However, despite the improvement in strength and heat resistance with the above-mentioned filler, PoI7 phenylene sulfide resin causes the molded product to crack when immersed in a 260°C solder bath for 10 seconds after molding the electronic component. Otherwise, it has the disadvantage of generating cracks. For this reason, 260
Applications that require solder resistance above ℃, such as IC.
コンデンサ一部品で表面実装タイプに使用することがで
きない。The capacitor is a single component and cannot be used as a surface mount type.
また、芳香族ポリチオエーテルケトン単体では線膨張率
が大きく、かつ熱変形温度が185℃であり、高い耐熱
性を要求される電子部品封止分野に使用することができ
ない。Furthermore, aromatic polythioetherketone alone has a large coefficient of linear expansion and a heat distortion temperature of 185° C., so it cannot be used in the field of electronic component sealing, which requires high heat resistance.
本発明者らは上記の如き状況に鑑み、260℃以上の耐
ハンダ性および良流動性を有している電子部品封止用熱
可塑性樹脂組成物の取得を課題とする。In view of the above situation, the inventors of the present invention set it as their object to obtain a thermoplastic resin composition for encapsulating electronic components that has solder resistance at 260° C. or higher and good fluidity.
すなわち本発明は、(イ)芳香族ポリチオエーテル゛ケ
トン樹脂30〜90重量%、(ロ))ケイ酸質充填材1
0〜60重景%および、(ハ)繊維状充填材0〜50重
量%からなる電子部品封止用熱可塑性樹脂組成物を提供
するものである。That is, the present invention comprises (a) 30 to 90% by weight of aromatic polythioether ketone resin, (b) siliceous filler 1
The object of the present invention is to provide a thermoplastic resin composition for encapsulating electronic components, comprising 0 to 60% by weight and (iii) 0 to 50% by weight of a fibrous filler.
本発明で用いる芳香族ポリチオエーテルケトン樹脂(以
下PP5Kと略す)は、構造式を有する重合体である。The aromatic polythioetherketone resin (hereinafter abbreviated as PP5K) used in the present invention is a polymer having a structural formula.
このポリマの重合方法としては、例えばジハロゲン芳香
族ケトンとアルカリ金属硫化物を有機アミド溶媒中で反
応させる方法(特公昭47−617号公報)、また芳香
族チオエーテルとホスゲンをルイス酸存在下、非プロト
ン性有機溶媒中で反応させる方法(特開昭60−729
23号公報)が挙げられる。また本発明の目的を逸脱し
ない範囲で芳香族チオエーテルケトンポリマとスルフィ
ドスルホンポリマの共重合またはブロック共重合体を用
いることもできる。Examples of polymerization methods for this polymer include, for example, a method in which a dihalogen aromatic ketone and an alkali metal sulfide are reacted in an organic amide solvent (Japanese Patent Publication No. 47-617), and an aromatic thioether and phosgene are reacted in the presence of a Lewis acid in the presence of a Lewis acid. Method of reaction in a protic organic solvent (JP-A-60-729
Publication No. 23). Furthermore, a copolymer or block copolymer of an aromatic thioetherketone polymer and a sulfide sulfone polymer can also be used without departing from the object of the present invention.
本発明で用いられるPP5Kの分子量は特に限定するも
のでないが、対数粘度yinh(溶媒=98%濃硫酸、
ポリマ濃度:0.5f/dl、測定温度:25℃の条件
下で測定)が0.2〜0.7の範囲のものが好ましい。The molecular weight of PP5K used in the present invention is not particularly limited, but the logarithmic viscosity yinh (solvent = 98% concentrated sulfuric acid,
Polymer concentration: 0.5 f/dl, measurement temperature: 25° C.) is preferably in the range of 0.2 to 0.7.
特にIC,トランジスター等のボンディングワイヤを有
する素子を封止する場合は、ボンディングワイヤの破損
を回避するために低分子量のものが好ましく用いられる
。In particular, when sealing elements having bonding wires such as ICs and transistors, those with low molecular weight are preferably used to avoid damage to the bonding wires.
本発明で使用するPP5Kは、前述の様にいかなるPP
5Kも使用可能であるが、(1)酸処理、(2)熱水洗
浄または(3)有機溶媒洗浄を施されたPP5K1ある
いは(4)ナトリウム含有量が900−以下であるPP
5Kを使用すると、本発明の効果がより一層発現されて
好ましい。The PP5K used in the present invention can be any PP as described above.
5K can also be used, but PP5K1 that has been subjected to (1) acid treatment, (2) hot water washing, or (3) organic solvent washing, or (4) PP with a sodium content of 900 or less.
It is preferable to use 5K because the effects of the present invention are further expressed.
以下これらの好ましいPP SKの処理について述べる
。These preferred PPSK treatments will be described below.
酸処理を行う場合は次の通りである。The case of acid treatment is as follows.
酸処理の方法は、酸または酸の水溶液にPP5Kを浸漬
せしめる等の方法があり、必要により適宜攪拌または加
熱することも可能である。The acid treatment may be carried out by immersing PP5K in an acid or an aqueous solution of the acid, and stirring or heating may be carried out as necessary.
例えば、酢酸を用いる場合、pH4の水溶液を80〜9
0℃に加熱した中にPP5K粉末を浸漬し、30分間攪
拌することにより十分な効果が得られる。酸処理を施さ
れたPP5Kは残留している酸または塩等を物理的に除
去するため、水または温水で数回洗浄することが必要で
ある。For example, when using acetic acid, a pH 4 aqueous solution of 80 to 9
A sufficient effect can be obtained by immersing the PP5K powder in a solution heated to 0° C. and stirring for 30 minutes. The acid-treated PP5K needs to be washed several times with water or hot water in order to physically remove residual acids or salts.
洗浄に用いる水は、酸処理によるPP5Kの好ましい化
学的変性の効果を損なわない意味で、蒸留水、脱イオン
水であることが好ましい。The water used for washing is preferably distilled water or deionized water in the sense that it does not impair the preferable chemical modification effect of PP5K by acid treatment.
熱水で洗浄する場合は次の通りである。即ちPP5Kを
熱水処理するにあたり、熱水の温度を100℃以上、よ
り好ましくは120℃以上、さらに好ましくは150℃
以上、特に好ましくは170℃以上とすることが重要で
あり、100℃未満ではPP5Kの好ましい化学的変性
の効果が小さいため好ましくない。When washing with hot water, the procedure is as follows. That is, when treating PP5K with hot water, the temperature of the hot water is set to 100°C or higher, more preferably 120°C or higher, and even more preferably 150°C.
As mentioned above, it is particularly important to set the temperature to 170°C or higher; a temperature lower than 100°C is not preferable because the effect of the preferred chemical modification of PP5K is small.
本発明の熱水洗浄によるPP5Kの好ましい化学的変性
の効果を発現するため、使用する水は蒸留水あるいは脱
イオン水であることが好ましい。熱水処理の操作は、通
常、所定量の水に所定量のPP5Kを投入し、圧力容器
内で加熱、攪拌することにより行われる。PP5Kと水
との割合は、水の多い方が好ましいが、通常、水11に
対し、PPSK2O0g以下の浴比が選択される。In order to achieve the desired effect of chemical modification of PP5K by hot water washing according to the present invention, the water used is preferably distilled water or deionized water. The hot water treatment is usually performed by adding a predetermined amount of PP5K to a predetermined amount of water, and heating and stirring the mixture in a pressure vessel. As for the ratio of PP5K to water, it is preferable that there is more water, but usually a bath ratio of 0 g or less of PPSK2O to 11 water is selected.
また、処理の雰囲気は、末端基の分解は好ましくないの
で、これを回避するため不活性雰囲気下とすることが好
ましい。更に、この熱水処理操作を終えたPP5Kは、
残留している成分を物理的に除去するため温水で数回洗
浄するのが好ましい。Furthermore, since decomposition of terminal groups is undesirable, the treatment atmosphere is preferably an inert atmosphere to avoid this. Furthermore, PP5K that has undergone this hot water treatment operation is
It is preferable to wash with warm water several times to physically remove any remaining components.
有機溶媒で洗浄する場合は次の通りである。When washing with an organic solvent, the procedure is as follows.
PP5Kの洗浄に用いる有機溶媒は、PP5Kを分解す
る作用等を有しないものであれば特に制限はなく、例え
ばN−メチルピロリドン、ジメチルホルムアミド、ジメ
チルアセトアミド、1.3−ジメチルイミダゾリジノン
、ヘキサメチルホスホラスアミド、ピペラジノン類等の
含窒素極性溶媒、ジメチルスルホキシド、ジメチルスル
ホン、スルホラン等のスルホキシド・スル°ホン系溶媒
、アセトノ、メチルエチルケトン、ジエチルケトン、ア
セトフェノン等のケトン系溶媒、ジメチルエーテル、ジ
プロピルエーテル、ジオキサン、テトラヒドロフラン等
のエーテル系FJ媒、クロロホルム、塩化メチレン、ト
リクロロエチレン、2塩化エチレン、パークロルエチレ
ン、モノクロルエタン、ジクロルエタン、テトラクロル
エタン、パークロルエタン、クロルベンゼン等のハロゲ
ン系溶媒、メタノール、エタノール、プロパツール、ブ
タノール、ペンタノール、エチレングリコール、プロピ
レングリコール、フェノール、クレゾール、ポリエチレ
ングリコール、ポリプロピレングリコール等のアルコー
ル・フェノール系溶媒、ベンゼン、トルエン、キシレン
等の芳香族炭化水素系溶媒等が挙げられる。これらの有
機溶媒のうちでも、N−メチルピロリドン、アセトン、
ジメチルホルムアミド、クロロホルム等の使用が特に好
ましい。また、これらの有機溶媒は、1種類または2種
類以上の混合で使用されろ。The organic solvent used for washing PP5K is not particularly limited as long as it does not have the effect of decomposing PP5K, and examples include N-methylpyrrolidone, dimethylformamide, dimethylacetamide, 1,3-dimethylimidazolidinone, and hexamethyl. Nitrogen-containing polar solvents such as phosphorus amide and piperazinones, sulfoxide/sulfone solvents such as dimethyl sulfoxide, dimethyl sulfone, and sulfolane, ketone solvents such as acetonate, methyl ethyl ketone, diethyl ketone, and acetophenone, dimethyl ether, dipropyl ether, Ether FJ media such as dioxane and tetrahydrofuran, halogenated solvents such as chloroform, methylene chloride, trichloroethylene, ethylene dichloride, perchlorethylene, monochloroethane, dichloroethane, tetrachloroethane, perchloroethane, and chlorobenzene, methanol, ethanol, Examples include alcohol/phenol solvents such as propatool, butanol, pentanol, ethylene glycol, propylene glycol, phenol, cresol, polyethylene glycol, and polypropylene glycol, and aromatic hydrocarbon solvents such as benzene, toluene, and xylene. Among these organic solvents, N-methylpyrrolidone, acetone,
Particularly preferred is the use of dimethylformamide, chloroform and the like. Further, these organic solvents may be used alone or in combination of two or more.
有機溶媒による洗浄の方法としては、有機溶媒中にPP
5Kを浸漬せしめる等の方法があり、必要により適宜攪
拌または加熱することも可能である。As a method of cleaning with an organic solvent, PP is added in an organic solvent.
There are methods such as immersing 5K, and it is also possible to stir or heat as necessary.
有機溶媒でPP5Kを洗浄する際の洗浄温度については
特に制限はなく、常温〜300℃程度の任意の温度が選
択できる。洗浄温度が高くなる程洗浄効率が高くなる傾
向があるが、通常は常温〜150℃の洗浄温度で十分効
果が得られる。There is no particular restriction on the cleaning temperature when cleaning PP5K with an organic solvent, and any temperature from room temperature to about 300°C can be selected. Although there is a tendency that the higher the cleaning temperature, the higher the cleaning efficiency, a sufficient effect can usually be obtained at a cleaning temperature of room temperature to 150°C.
圧力容器中で、有機溶媒の沸点以上の温度で加圧下に洗
浄することも可能である。また、洗浄時間についても特
に制限はない。洗浄条件にもよるが、バッチ式洗浄の場
合、通常5分間以上洗浄することにより、十分な効果が
得られる。It is also possible to wash under pressure in a pressure vessel at a temperature above the boiling point of the organic solvent. Furthermore, there is no particular restriction on the cleaning time. Although it depends on the cleaning conditions, in the case of batch cleaning, sufficient effects can usually be obtained by cleaning for 5 minutes or more.
また連続式で洗浄することも可能である。It is also possible to wash continuously.
重合により生成したPP5Kを有機溶媒で洗浄するのみ
で十分であるが、本発明の効果をさらに発揮させるため
に、水洗浄または温水洗浄と組合わせるのが好ましい。Although it is sufficient to simply wash the PP5K produced by polymerization with an organic solvent, in order to further exhibit the effects of the present invention, it is preferable to combine washing with water or hot water.
また、N−メチルピロリドン等の高沸点水溶性有機溶媒
を用いた場合は、有機溶媒洗浄後、水または温水で洗浄
することにより、残存有機溶媒の除去が容易に行えて好
ましい。これらの洗浄に用いる水は蒸留水、脱イオン水
であることが好ましい。Further, when a high-boiling water-soluble organic solvent such as N-methylpyrrolidone is used, the residual organic solvent can be easily removed by washing with water or hot water after washing with the organic solvent. The water used for these washings is preferably distilled water or deionized water.
また本発明で用いるPP5Kは、本発明の効果を十分に
発現させろためにナトリウムの含有量が900P以下で
あることが好ましい。ナトリウム含有量が900P以上
であるPP5Kのナトリウム含有量を900P以下に落
とす有効な手段として、上述の酸処理、熱水処理あるい
は有機溶媒による洗浄等の処理を用いることができる。Further, in order to fully exhibit the effects of the present invention, the PP5K used in the present invention preferably has a sodium content of 900P or less. As an effective means for reducing the sodium content of PP5K having a sodium content of 900P or more to 900P or less, treatments such as the above-mentioned acid treatment, hot water treatment, or washing with an organic solvent can be used.
上記記載のPP5Kの酸処理、熱水処理および有機溶媒
による洗浄、またナトリウム含有量が900−以下のP
P5Kというのは、あくまでも本発明の効果をより発現
させるために好ましいということで、決して本発明の必
須条件ではない。本発明においてはあらゆるPP5Kが
使用可能である。Acid treatment, hot water treatment and washing with an organic solvent of PP5K described above, and P with a sodium content of 900- or less
P5K is only preferable in order to further express the effects of the present invention, and is by no means an essential condition for the present invention. Any PP5K can be used in the present invention.
かかるPP5Kの組成物中におけろ配合割合は30〜9
0重量%、好ましくは40〜70重量%のものが用いら
れる。30重量%未満では封止成形時における流動性が
悪くなるので適切でない。また90重量%を超えると充
填材含有量が過小になるため封止成形品の線膨張係数が
大きくなり好ましくない。The blending ratio of such PP5K in the composition is 30 to 9
0% by weight, preferably 40 to 70% by weight. If it is less than 30% by weight, the fluidity during sealing molding will deteriorate, so it is not suitable. Moreover, if it exceeds 90% by weight, the filler content becomes too small and the linear expansion coefficient of the encapsulated molded product increases, which is not preferable.
本発明で用いられるケイ酸質充填剤とは、シリカを主体
とした非繊維状の無機質充填材であって、石英、タルク
、カオリンなどが挙げられ、好ましくは石英、より好ま
しくは99%以上の純度を有する市販の溶融シリカ、結
晶性シリカ、合成シリカの粉砕品および球状のものが挙
げられる。本発明の全組成物中に占めるケイ酸質充填材
の配合割合は60〜10重量%、好ましくは50〜15
重量%の範囲が選択される。10重量%未満では線膨張
係数低下の改善効果が不十分であり、60重量%を超え
ると流動性が悪くなるため好ましくない。The siliceous filler used in the present invention is a non-fibrous inorganic filler mainly composed of silica, and includes quartz, talc, kaolin, etc., preferably quartz, more preferably 99% or more Examples include commercially available fused silica, crystalline silica, pulverized synthetic silica, and spherical silica with purity. The proportion of the siliceous filler in the entire composition of the present invention is 60 to 10% by weight, preferably 50 to 15% by weight.
A weight percent range is selected. If it is less than 10% by weight, the effect of improving the linear expansion coefficient decrease is insufficient, and if it exceeds 60% by weight, fluidity deteriorates, which is not preferable.
これらのケイ酸質充填材は2種以上を併用する乙とも可
能であり、必要により、シラン系およびチタン系カップ
リング剤で予備処理して使用することができる。Two or more of these siliceous fillers can be used in combination, and if necessary, they can be pretreated with a silane-based and titanium-based coupling agent before use.
本発明で用いる繊維状充填材としては、ガラス繊維、セ
ラミックス繊維、石綿、チタン酸カリウム繊維、その他
の無機質繊維、炭素繊維、ポリアミド、ポリエステル、
その他の有機合成繊維が適しており、この中では特にガ
ラス繊維が好ましい。かかる繊維状充填材の組成物中に
おける配合量は、0〜50重量%、好ましくは5〜30
重量%の範囲が選択される。50重量%を超えると、封
止成形時における流動性が悪くなる。また、該繊維状充
填材の繊維長は、組成物の機械強度及び、封止成形時に
おける流動性の面から、押出混練後において、0.03
ff〜1、Ouであることが好ましい。The fibrous fillers used in the present invention include glass fibers, ceramic fibers, asbestos, potassium titanate fibers, other inorganic fibers, carbon fibers, polyamides, polyesters,
Other organic synthetic fibers are suitable, of which glass fibers are particularly preferred. The amount of such fibrous filler in the composition is 0 to 50% by weight, preferably 5 to 30% by weight.
A weight percent range is selected. If it exceeds 50% by weight, fluidity during sealing molding will deteriorate. In addition, the fiber length of the fibrous filler is determined to be 0.03 after extrusion kneading in terms of mechanical strength of the composition and fluidity during sealing molding.
It is preferable that it is ff~1, Ou.
本発明の組成物には、本発明の目的を阻害しない範囲で
酸化防止剤、熱安定剤、滑剤、着色剤、紫外線吸収剤、
他種ポリマー等を添加配合することができる。The composition of the present invention includes antioxidants, heat stabilizers, lubricants, colorants, ultraviolet absorbers, and
Other types of polymers can be added and blended.
本発明の組成物の調製方法は、−船釣な方法が用いられ
特に限定されるものでない。例えば、室温においてリボ
ン羽根型混合機、ドラム型回転混合機を用いて各成分を
一緒に混合した後、単軸押出機、多軸押出機またはニー
ダ−などにより溶融混線を行い、ペレット化される。The method for preparing the composition of the present invention is not particularly limited, and a boat fishing method may be used. For example, each component is mixed together at room temperature using a ribbon blade type mixer or a drum type rotating mixer, and then melted and mixed using a single screw extruder, multi-screw extruder, or kneader, and then pelletized. .
以下に実施例及び比較例を示して本発明を更に具体的に
説明する。なお、本実施例に示す部及び%はすべて重量
基準である。The present invention will be explained in more detail by showing Examples and Comparative Examples below. Note that all parts and percentages shown in the examples are based on weight.
参考例1 (PPSKの重合)
オートクレーブに30%水硫化ナトリウム水溶H9,3
4kqc水硫化ナトリウム50モル)、50%水酸化ナ
トリウム4.00 &g(水酸化ナトリウム50モル)
およびN−メチル−2−ピロリドン(以下NMPと略す
)16#を仕込み、攪拌しながら徐々に205℃まで昇
温し、水7゜5 &9を含む留出水8.01を除去した
。残留混合物にビス(p−クロロフェニル)ケトン12
.55 kq及びNMP4幻を加え、圧力3.2 ky
/ dゲージ圧にて、250℃で5時間加熱した。Reference Example 1 (Polymerization of PPSK) 30% sodium bisulfide aqueous solution H9,3 in an autoclave
4kqc sodium hydrosulfide 50 moles), 50% sodium hydroxide 4.00 &g (sodium hydroxide 50 moles)
and 16 # of N-methyl-2-pyrrolidone (hereinafter abbreviated as NMP) were charged, and the temperature was gradually raised to 205° C. while stirring, and 8.01 of distilled water containing 7.5 and 9 of water was removed. Bis(p-chlorophenyl)ketone 12 is added to the residual mixture.
.. Add 55 kq and NMP4, pressure 3.2 ky
/d gauge pressure at 250°C for 5 hours.
反応生成物をイオン交換水で2回、70℃のイオン交換
熱水で5回洗浄したのち、120℃で24時間減圧乾燥
して、約4.5#のPP5K樹脂粉末を得た。The reaction product was washed twice with ion-exchanged water and five times with ion-exchanged hot water at 70°C, and then dried under reduced pressure at 120°C for 24 hours to obtain a PP5K resin powder of about 4.5#.
得られたPP5Kは対数粘度0.40 、ガラス転移温
度145℃および融点348℃の特性を有していた。The obtained PP5K had a logarithmic viscosity of 0.40, a glass transition temperature of 145°C, and a melting point of 348°C.
〔参考例2〕
参考例1で得られたPP5K粉末2 kqを90℃に加
熱されたpH4の酢酸水溶液201中に投入し、約30
分間攪拌し続けたのち濾過し、P液のpHが7になるま
で約90℃の脱イオン水で洗浄し、120℃で24時間
減圧乾燥して粉末状にして、実施例に供した。このPP
5K中の全ナトリウム含有量は375Fであった。[Reference Example 2] 2 kq of PP5K powder obtained in Reference Example 1 was put into 201 aqueous acetic acid solution of pH 4 heated to 90°C, and about 30
After continuing to stir for a minute, it was filtered, washed with deionized water at about 90°C until the pH of the P solution became 7, and dried under reduced pressure at 120°C for 24 hours to form a powder, which was used in Examples. This PP
The total sodium content in 5K was 375F.
実施例1〜4、比較例1〜2
参考例2で得たPP SK粉末、ケイ酸質充填材および
繊維状充填材を第1表の組成でトライブレンドしたのち
、30rj02軸押出機に供給して、処理温度350〜
380℃で溶融混練して均一溶融ブレンドペレットを得
た。続いて得られたペレットを射出成形機(温度360
〜380℃、金型温度170℃)にてテストピースを成
形し、物性測定して第1表の結果を得た。Examples 1 to 4, Comparative Examples 1 to 2 After tri-blending the PP SK powder, silicic acid filler, and fibrous filler obtained in Reference Example 2 with the composition shown in Table 1, the mixture was fed to a 30rj0 twin-screw extruder. The processing temperature is 350~
The mixture was melt-kneaded at 380°C to obtain homogeneous melt-blended pellets. Subsequently, the obtained pellets were placed in an injection molding machine (temperature 360
A test piece was molded at a temperature of ~380°C and a mold temperature of 170°C, and the physical properties were measured to obtain the results shown in Table 1.
また、インサート専用射出成形機(温度360〜380
℃、金型温度200℃)にて16ピンDIP型IC封止
品を成形し、260℃の/%ンダ浴1こ10秒間浸漬処
理後の封止品のフクレおよびクラックの有無を軟X線法
で観察した。In addition, insert-only injection molding machines (temperature 360-380
A 16-pin DIP type IC sealed product was molded at a mold temperature of 200°C, and the presence of blisters and cracks in the sealed product was determined by soft Observed by law.
結果は第1表記載の通りであった。The results were as shown in Table 1.
第1表の結果から明らかなように、本実施例組成物は耐
ハンダ性にすぐれていることが判る。As is clear from the results in Table 1, it can be seen that the composition of this example has excellent solder resistance.
比較例3
実施例1で用いたPP5Kの代わりに、ポリフェニレン
スルフィド樹脂1ライドン(Ryton)V−1’(フ
ィリップス社製)を用いて、実施例1と同様の方法でテ
ストピースおよびDIP型IC封止品を成形して評価を
行った。結果は第1表に記載の通りであった。Comparative Example 3 A test piece and a DIP type IC seal were prepared in the same manner as in Example 1, using polyphenylene sulfide resin 1 Ryton V-1' (manufactured by Philips) instead of PP5K used in Example 1. A fixed product was molded and evaluated. The results were as shown in Table 1.
本発明の電子部品封止用熱可塑性樹脂組成物はすぐれた
耐ハンダ性および流動性を有するため、電子部品、例え
ばIC,)ランシスターダイオード、コンデンサー コ
ネクター等の封止用材料として非常に有用である。Since the thermoplastic resin composition for encapsulating electronic components of the present invention has excellent solder resistance and fluidity, it is very useful as a material for encapsulating electronic components such as ICs, Lansyster diodes, capacitor connectors, etc. be.
特許出願人 東 し 株 式 会 社Patent applicant Higashi Shikikai Co., Ltd.
Claims (1)
量%、 (ロ)ケイ酸質充填材10〜60重量%および、(ハ)
繊維状充填材0〜50重量%からなる電子部品封止用熱
可塑性樹脂組成物。[Scope of Claims] (a) 30 to 90% by weight of aromatic polythioetherketone resin, (b) 10 to 60% by weight of siliceous filler, and (c)
A thermoplastic resin composition for encapsulating electronic components comprising 0 to 50% by weight of a fibrous filler.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19401788A JPH0243259A (en) | 1988-08-02 | 1988-08-02 | Thermoplastic resin composition for sealing electronic component |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19401788A JPH0243259A (en) | 1988-08-02 | 1988-08-02 | Thermoplastic resin composition for sealing electronic component |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0243259A true JPH0243259A (en) | 1990-02-13 |
Family
ID=16317560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19401788A Pending JPH0243259A (en) | 1988-08-02 | 1988-08-02 | Thermoplastic resin composition for sealing electronic component |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0243259A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002326625A (en) * | 2001-04-27 | 2002-11-12 | Taira Nakajima | Pack container |
-
1988
- 1988-08-02 JP JP19401788A patent/JPH0243259A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002326625A (en) * | 2001-04-27 | 2002-11-12 | Taira Nakajima | Pack container |
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