JPH0241434U - - Google Patents
Info
- Publication number
- JPH0241434U JPH0241434U JP11795688U JP11795688U JPH0241434U JP H0241434 U JPH0241434 U JP H0241434U JP 11795688 U JP11795688 U JP 11795688U JP 11795688 U JP11795688 U JP 11795688U JP H0241434 U JPH0241434 U JP H0241434U
- Authority
- JP
- Japan
- Prior art keywords
- laser
- integrated circuit
- semiconductor integrated
- laser marking
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010330 laser marking Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 3
- 239000000835 fiber Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11795688U JPH0241434U (en, 2012) | 1988-09-09 | 1988-09-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11795688U JPH0241434U (en, 2012) | 1988-09-09 | 1988-09-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0241434U true JPH0241434U (en, 2012) | 1990-03-22 |
Family
ID=31361883
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11795688U Pending JPH0241434U (en, 2012) | 1988-09-09 | 1988-09-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0241434U (en, 2012) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013008683A (ja) * | 2008-11-04 | 2013-01-10 | Asml Netherlands Bv | 放射源およびリソグラフィ装置 |
-
1988
- 1988-09-09 JP JP11795688U patent/JPH0241434U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013008683A (ja) * | 2008-11-04 | 2013-01-10 | Asml Netherlands Bv | 放射源およびリソグラフィ装置 |