JPH0241400U - - Google Patents

Info

Publication number
JPH0241400U
JPH0241400U JP12018788U JP12018788U JPH0241400U JP H0241400 U JPH0241400 U JP H0241400U JP 12018788 U JP12018788 U JP 12018788U JP 12018788 U JP12018788 U JP 12018788U JP H0241400 U JPH0241400 U JP H0241400U
Authority
JP
Japan
Prior art keywords
plasma
plasma source
container
chamber container
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12018788U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12018788U priority Critical patent/JPH0241400U/ja
Publication of JPH0241400U publication Critical patent/JPH0241400U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
JP12018788U 1988-09-13 1988-09-13 Pending JPH0241400U (US20090163788A1-20090625-C00002.png)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12018788U JPH0241400U (US20090163788A1-20090625-C00002.png) 1988-09-13 1988-09-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12018788U JPH0241400U (US20090163788A1-20090625-C00002.png) 1988-09-13 1988-09-13

Publications (1)

Publication Number Publication Date
JPH0241400U true JPH0241400U (US20090163788A1-20090625-C00002.png) 1990-03-22

Family

ID=31366074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12018788U Pending JPH0241400U (US20090163788A1-20090625-C00002.png) 1988-09-13 1988-09-13

Country Status (1)

Country Link
JP (1) JPH0241400U (US20090163788A1-20090625-C00002.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000018198A1 (fr) * 1998-09-24 2000-03-30 Seiko Epson Corporation Generateur de plasma a electrodes de substrat et procede de traitement de substances/materiaux

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000018198A1 (fr) * 1998-09-24 2000-03-30 Seiko Epson Corporation Generateur de plasma a electrodes de substrat et procede de traitement de substances/materiaux

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