JPH0234152B2 - - Google Patents

Info

Publication number
JPH0234152B2
JPH0234152B2 JP56178189A JP17818981A JPH0234152B2 JP H0234152 B2 JPH0234152 B2 JP H0234152B2 JP 56178189 A JP56178189 A JP 56178189A JP 17818981 A JP17818981 A JP 17818981A JP H0234152 B2 JPH0234152 B2 JP H0234152B2
Authority
JP
Japan
Prior art keywords
current
ion beam
range
measurement range
proportional
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56178189A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5880252A (ja
Inventor
Masahiko Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin High Voltage Co Ltd
Original Assignee
Nissin High Voltage Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin High Voltage Co Ltd filed Critical Nissin High Voltage Co Ltd
Priority to JP17818981A priority Critical patent/JPS5880252A/ja
Publication of JPS5880252A publication Critical patent/JPS5880252A/ja
Publication of JPH0234152B2 publication Critical patent/JPH0234152B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP17818981A 1981-11-05 1981-11-05 イオン注入装置 Granted JPS5880252A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17818981A JPS5880252A (ja) 1981-11-05 1981-11-05 イオン注入装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17818981A JPS5880252A (ja) 1981-11-05 1981-11-05 イオン注入装置

Publications (2)

Publication Number Publication Date
JPS5880252A JPS5880252A (ja) 1983-05-14
JPH0234152B2 true JPH0234152B2 (US20110009641A1-20110113-C00185.png) 1990-08-01

Family

ID=16044147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17818981A Granted JPS5880252A (ja) 1981-11-05 1981-11-05 イオン注入装置

Country Status (1)

Country Link
JP (1) JPS5880252A (US20110009641A1-20110113-C00185.png)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4517465A (en) * 1983-03-29 1985-05-14 Veeco/Ai, Inc. Ion implantation control system
JPH0740481B2 (ja) * 1986-01-31 1995-05-01 株式会社日立製作所 イオン打込制御方法
JPH0744024B2 (ja) * 1986-06-19 1995-05-15 日新電機株式会社 イオン照射装置
JPH01183049A (ja) * 1988-01-11 1989-07-20 Fujitsu Ltd イオン照射装置
US4929840A (en) * 1989-02-28 1990-05-29 Eaton Corporation Wafer rotation control for an ion implanter
US6271529B1 (en) 1997-12-01 2001-08-07 Ebara Corporation Ion implantation with charge neutralization

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55160427A (en) * 1979-05-23 1980-12-13 Nova Ass Inc Beam machining apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55160427A (en) * 1979-05-23 1980-12-13 Nova Ass Inc Beam machining apparatus

Also Published As

Publication number Publication date
JPS5880252A (ja) 1983-05-14

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