JPH02307092A - Stage mechanism - Google Patents
Stage mechanismInfo
- Publication number
- JPH02307092A JPH02307092A JP1128382A JP12838289A JPH02307092A JP H02307092 A JPH02307092 A JP H02307092A JP 1128382 A JP1128382 A JP 1128382A JP 12838289 A JP12838289 A JP 12838289A JP H02307092 A JPH02307092 A JP H02307092A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- drive shaft
- center
- gravity
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005484 gravity Effects 0.000 claims abstract description 34
- 239000004065 semiconductor Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、半導体製造装置の露光装置等においてステッ
プ駆動の可動ステージに利用されるステージ機構に関す
る。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a stage mechanism used as a step-driven movable stage in an exposure apparatus of a semiconductor manufacturing apparatus or the like.
〈従来の技術）
半導体製造装置の露光装置等に用いられている従来のＸ
−Ｙ軸ステージを第５図により説明する。<Conventional technology> Conventional X used in exposure equipment of semiconductor manufacturing equipment, etc.
-The Y-axis stage will be explained with reference to FIG.
図に示すＸ−Ｙ軸ステージ２１は、ベース２２上に第１
駆動部２３が固定されている。該第１駆動部２３には、
Ｘ軸ステージ２４を駆動させる第１駆動軸が回動自在に
設けられている。該第１駆動軸２５には雄ねじ部２５ａ
が形成されている。該雄ねじ部２５ａはＸ輌ステージ２
４に設けた雌ねじ部（図示せず）に螺合されている。又
Ｘ軸ステージ２４はベース２２上にかつ摺動自在に設け
られている。The X-Y axis stage 21 shown in the figure is mounted on a base 22.
The drive unit 23 is fixed. The first drive section 23 includes:
A first drive shaft that drives the X-axis stage 24 is rotatably provided. The first drive shaft 25 has a male threaded portion 25a.
is formed. The male threaded portion 25a is connected to the X vehicle stage 2.
It is screwed into a female threaded portion (not shown) provided at 4. Further, the X-axis stage 24 is slidably provided on the base 22.
更に該Ｘ軸スデーシ２４には第２駆動部２６が固定され
ている。第２駆動部２５には、Ｙ軸ステージ２７を駆動
させる第２駆動軸（図示せず）が回動自在に設けられて
いる。該第２駆動軸には雄ねじ部（図示せず）が形成さ
れている。そして第２駆動軸はＹ軸ステージ２７に設け
られた雌ねじ部（図示せず）に螺合されている。又Ｘ軸
ステージ２４上には、Ｙ軸ステージ２７か摺動自在に設
けられている。Further, a second drive section 26 is fixed to the X-axis shifter 24. The second drive unit 25 is rotatably provided with a second drive shaft (not shown) that drives the Y-axis stage 27 . A male threaded portion (not shown) is formed on the second drive shaft. The second drive shaft is screwed into a female threaded portion (not shown) provided on the Y-axis stage 27. Further, a Y-axis stage 27 is slidably provided on the X-axis stage 24.
この様に構成されたＸ−Ｙ軸ステージ２１では。In the X-Y axis stage 21 configured in this way.
ベース２２と第１駆動部２３と第１駆動軸２５とか成す
重心ＧＢ“とＸ軸ステージ２４と第２駆動部２６と第２
駆動軸とか成す重心Ｇｘ′と、Ｙ軸ステージ２７の重心
ＧＹ′と、が夫々に異なる高さに位置している。The center of gravity GB" formed by the base 22, the first drive section 23, and the first drive shaft 25, the X-axis stage 24, the second drive section 26, and the second
The center of gravity Gx' of the drive shaft and the center of gravity GY' of the Y-axis stage 27 are located at different heights.
次に、Ｘ−Ｙ輌ステージ２１の動作を説明する。Next, the operation of the XY vehicle stage 21 will be explained.
Ｘ軸ステージ２４を駆動するには、先ず、第１駆動部２
３により第１駆動軸２５を回動させる。該第１駆動軸２
５に設けた雄ねし部２５ａとＸ軸ステージ２４に設けた
雌ねじ部とのねし作用により、Ｘ軸ステージ２４を駆動
する。To drive the X-axis stage 24, first, the first drive section 2
3 to rotate the first drive shaft 25. The first drive shaft 2
The X-axis stage 24 is driven by the threading action between the male threaded portion 25a provided at 5 and the female threaded portion provided on the X-axis stage 24.
一方、Ｙ軸ステージ２７を駆動するには、Ｘ軸ステージ
２４の駆動と同様にして、第２駆動部２６により第２駆
動軸を回動させる。該第２駆動軸に設けた雄ねじ部とＹ
軸ステージ２７に設けた雌ねし部とのねし作用により、
Ｙ軸ステージ２７を駆動する。On the other hand, to drive the Y-axis stage 27, the second drive shaft is rotated by the second drive section 26 in the same manner as the X-axis stage 24 is driven. The male threaded portion provided on the second drive shaft and the Y
Due to the threading action with the female threaded part provided on the shaft stage 27,
The Y-axis stage 27 is driven.
前記Ｘ−Ｙステージ機構２１を半導体製造装置のステッ
パに用いた場合を第６図により説明する。A case where the XY stage mechanism 21 is used in a stepper of a semiconductor manufacturing apparatus will be explained with reference to FIG.
ステッパ２０には、露光照明部、コンデンサレンズ部、
レチクル設置部及び縮小レンズ部て構成された露光光学
系１５か設けられている。該露光光学系１５はアーム１
６に固定される。The stepper 20 includes an exposure illumination section, a condenser lens section,
An exposure optical system 15 consisting of a reticle installation section and a reduction lens section is provided. The exposure optical system 15 is connected to the arm 1
It is fixed at 6.
又該アーム１６とＸ−Ｙ軸ステージ２１とが台座１７に
固設される。Further, the arm 16 and the X-Y axis stage 21 are fixed to the pedestal 17.
更にＹ軸ステージ２７Ｊ：には半導体ウェハ３ｏが載置
されている。Further, a semiconductor wafer 3o is placed on the Y-axis stage 27J.
該半導体ウェハ３０には、Ｘ軸ステージ２４又はＹ軸ス
テージ２７がステップ駆動される毎に、レチクルパター
ンか露光される。A reticle pattern is exposed onto the semiconductor wafer 30 each time the X-axis stage 24 or the Y-axis stage 27 is driven step by step.
〈発明か解決しようとする課題〉
しかしながら、上記した従来のＸ−Ｙ軸ステージては、
第１駆動部と第１駆動軸とベースとが成す重心と、第２
駆動部と第２駆動軸とＸ軸ステージとか成す重心と、Ｙ
軸ステージの重心とが夫々高さ方向に異なるので、Ｘ軸
ステージ及びＹ軸ステージの何れか一方又は両方を駆動
させると、ステージ機構を回転させようとするモーメン
トが働き、Ｘ−Ｙ軸ステージを上下方向に振動させると
いう問題点を生じていた。<Problem to be solved by the invention> However, the above-mentioned conventional X-Y axis stage
The center of gravity formed by the first drive part, the first drive shaft, and the base, and the second
The center of gravity formed by the drive unit, the second drive shaft, the X-axis stage, and the Y
Since the center of gravity of each axis stage is different in the height direction, when either or both of the X-axis stage and Y-axis stage is driven, a moment that tries to rotate the stage mechanism acts, causing the X-Y axis stage to rotate. This caused the problem of vertical vibration.
その為、半導体製造装置の露光装置等の位置決め装置に
用いた場合には、ベースの振動がアームを介して露光光
学系に伝わり、露光時に、露光パターンかピッチずれ、
トラベゾイト等を起こしたり、解像不良を起こしたりし
て、露光される半導体装置の歩留りを低下させるという
課題を宥していた。Therefore, when used in a positioning device such as an exposure device of semiconductor manufacturing equipment, the vibration of the base is transmitted to the exposure optical system via the arm, causing the exposure pattern to shift in pitch during exposure.
This solves the problem of causing trabezoites and the like and poor resolution, which lowers the yield of exposed semiconductor devices.
〈課題を解決するための手段）
本発明は、上記した課題を解決する為に成されたもので
、ステージの上下方向の振動の発生を防止したステージ
機構を提供することを目的とする。<Means for Solving the Problems> The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a stage mechanism that prevents the occurrence of vibrations in the vertical direction of the stage.
Ｄｌｌチ、ベースと、このベースの内側に設けた第１駆
動部と、該第１駆動部摺動自在により駆動する第１駆動
軸と、前記ベースの内側に摺動自在に支持されるととも
に該第１駆動軸を介して駆動する第１ステージと、この
第１ステージの内側に設けた第２駆動部と、該２駆動部
により駆動する第２駆動軸と、前記第１ステージの内側
に摺動自在に支持されるとともに該第１駆動軸を介して
駆動される第２ステージとから成り、
前記ベースと第１駆動部とが成す重心と、第１駆動軸と
第１ステージと第２駆動部と第２駆動軸とか成す重心と
、第２ステージの重心と、を夫々同一平面内に設け、
第１駆動軸と第１ステージと第２駆動部と第２駆動軸と
か成す重心を第１駆動軸の軸線に一致させるとともに、
第２ステージの重心を第２駆動軸の軸線に一致させたこ
とを特徴とするものである。Dll, a base, a first drive section provided inside the base, a first drive shaft slidably driven by the first drive section, and a first drive shaft slidably supported inside the base and driven by the first drive shaft. a first stage driven via a first drive shaft; a second drive section provided inside the first stage; a second drive shaft driven by the second drive section; a second stage that is movably supported and driven via the first drive shaft; the center of gravity formed by the base and the first drive section; The center of gravity formed by the part and the second drive shaft, and the center of gravity of the second stage are respectively provided in the same plane, Along with matching the axis of the drive shaft,
This is characterized in that the center of gravity of the second stage is aligned with the axis of the second drive shaft.
〈作用〉
上記構成のステージ機構は、第１駆動部とベースとが成
す重心と、第１駆動軸と第２駆動部と第２駆動軸と第１
ステージとが成す重心と、第２ステージの重心と、を同
一平面上に設けるとともに、第１駆動軸と第２駆動部と
第２駆動軸と第１ステージとが成す重心を第１駆動軸の
軸線に一致させ、又第２ステージの重心を第２駆動軸の
軸線に一致させたことにより、ステージ機構を上下方向
に回転させようとする慣性モーメントが生じない。よっ
て慣性モーメントの影響によるステージ機構の上下方向
の振動を解消する。<Operation> The stage mechanism having the above configuration has a center of gravity formed by the first drive section and the base, a first drive shaft, a second drive section, a second drive shaft and the first drive shaft.
The center of gravity formed by the stage and the center of gravity of the second stage are provided on the same plane, and the center of gravity formed by the first drive shaft, the second drive section, the second drive shaft and the first stage is set on the same plane. By aligning the axis and aligning the center of gravity of the second stage with the axis of the second drive shaft, no moment of inertia is generated that would cause the stage mechanism to rotate in the vertical direction. Therefore, vibrations in the vertical direction of the stage mechanism due to the influence of the moment of inertia are eliminated.
〈実施例〉 本発明の実施例を図に基づいて説明する。<Example> Embodiments of the present invention will be described based on the drawings.
第１図はステージ機構１の平面図を示しており５この横
断面図を第２図に示すとともに縦断面図を第３図に示す
。FIG. 1 shows a plan view of the stage mechanism 1, a cross-sectional view thereof is shown in FIG. 2, and a vertical cross-sectional view is shown in FIG. 3.
ステージ機構Ｉは、枠形状を成すベース２の内側に第１
駆動部３が固定されている。又ベース２の内側でかつ後
述する第１ステージ４の駆動方向に沿った側面にはステ
ージ支持溝２ａが形成されている。The stage mechanism I includes a first stage mechanism inside a frame-shaped base 2.
The drive unit 3 is fixed. Further, a stage support groove 2a is formed inside the base 2 and on the side surface along the driving direction of the first stage 4, which will be described later.
該第１駆動部３には、第１ステージ４を駆動する第１駆
動軸５か設けられている。又第１駆動軸５はベース２に
形成された貫通孔２ｂに遊挿されている。更に、第１駆
動軸５は、枠形状を成す第１ステージ４に取付けられて
いる。The first drive section 3 is provided with a first drive shaft 5 that drives the first stage 4 . Further, the first drive shaft 5 is loosely inserted into a through hole 2b formed in the base 2. Furthermore, the first drive shaft 5 is attached to the first stage 4 which has a frame shape.
第１ステージ４にはステージ支持部４ｂか形成されてい
る。そして、第１ステージ４は、ステージ支持部４ｂを
介して前記ステージ支持溝２ａに摺動自在に支持される
。又第１ステージ４の内側てかっ第１ステージ４の駆動
方向に沿った側面には第２駆動部６が設けられている。The first stage 4 is formed with a stage support portion 4b. The first stage 4 is slidably supported in the stage support groove 2a via the stage support portion 4b. Further, a second driving section 6 is provided on the inner side of the first stage 4 and on the side surface along the driving direction of the first stage 4 .
又第１ステージ４の内側てかつ第１ステージ４の駆動方
向に対して直角方向に沿った側面には、ステージ支持部
４ｃが形成されている。Further, a stage support portion 4c is formed on the inner side of the first stage 4 and on the side surface along the direction perpendicular to the driving direction of the first stage 4.
該第２駆動部６には、回動自在に第２駆動軸７か設けら
れている。第２駆動軸７は、その外周面に雄ねじ部７ａ
が形成されている。A second drive shaft 7 is rotatably provided in the second drive section 6. The second drive shaft 7 has a male threaded portion 7a on its outer peripheral surface.
is formed.
又第２ステージ８には、雄ねじ部７ａに螺合する雌ねじ
部（図示せず）が形成されている。そして第２駆動軸７
の回転によって第２ステージ８が駆動する。この第２ス
テージ８にはステージ支持溝８ａが形成されている。又
第２ステージ８は、ステージ支持溝８ａを介して、前記
ステージ支持部４ｃにかつ摺動自在に支持されている。Further, the second stage 8 is formed with a female threaded portion (not shown) that is screwed into the male threaded portion 7a. and second drive shaft 7
The second stage 8 is driven by the rotation. This second stage 8 has a stage support groove 8a formed therein. Further, the second stage 8 is slidably supported by the stage support portion 4c via a stage support groove 8a.
そして、ベース２と第１駆動部３とが成す重心Ｇ８と、
第１駆動軸５と第１ステージ４と第２駆動部６と第２駆
動軸７とが成す重心Ｇ、ｃと、第２ステージ８の重心Ｇ
Ｙと、が同一平面内に設けられている。And the center of gravity G8 formed by the base 2 and the first drive section 3,
Centers of gravity G and c formed by the first drive shaft 5, first stage 4, second drive unit 6, and second drive shaft 7, and center of gravity G of the second stage 8
Y and are provided in the same plane.
又第１駆動軸５の軸線Ｘを前記重心Ｇｘに一致させると
ともに、第２駆動軸７の軸線Ｙを前記重心ＧＹに一致さ
せである。Further, the axis X of the first drive shaft 5 is made to coincide with the center of gravity Gx, and the axis Y of the second drive shaft 7 is made to coincide with the center of gravity GY.
上記構成のステージ機構１は、第１ステージ４又は第２
ステージ８を駆動した時に、ステージ機構１を上下方向
に回転させようとする慣性モーメントが生じないので、
上下方向に振動しない。The stage mechanism 1 having the above configuration has the first stage 4 or the second stage
When the stage 8 is driven, there is no moment of inertia that would cause the stage mechanism 1 to rotate in the vertical direction.
Does not vibrate vertically.
前記ステージ機構１を半導体製造装置の露光装置、特に
ステッパに用いた場合を第４図により説明する。A case in which the stage mechanism 1 is used in an exposure apparatus of a semiconductor manufacturing apparatus, particularly a stepper, will be explained with reference to FIG.
ステツバ１０には、露光照明部２コンデンサレンズ部、
レチクル設置部及び縮小レンズ部て構成された露光光学
系１５が設けられている。該露光光学系１５はアーム１
６に固定されている。The stator 10 includes an exposure illumination section 2, a condenser lens section,
An exposure optical system 15 consisting of a reticle installation section and a reduction lens section is provided. The exposure optical system 15 is connected to the arm 1
It is fixed at 6.
又アーム１６とステージ機構ｌとか台座１７に固設され
ている。Further, the arm 16 and the stage mechanism 1 are fixed to the pedestal 17.
更にステージ機構１の第２ステージ８には、半導体ウェ
ハ３０が載置されている。Furthermore, a semiconductor wafer 30 is placed on the second stage 8 of the stage mechanism 1.
該半導体ウェハ３０には、第１ステージ４又は第２ステ
ージ８がステップ駆動される毎に、レチクルパターンが
露光される。A reticle pattern is exposed onto the semiconductor wafer 30 each time the first stage 4 or the second stage 8 is driven step by step.
この時、該ステージ機構１を上下方向に回転させようと
する慣性モーメントが生じないので、ステージ機構１は
、慣性モーメントの影響による上下方向の振動を解消す
る。At this time, since no moment of inertia is generated that would cause the stage mechanism 1 to rotate in the vertical direction, the stage mechanism 1 eliminates vibrations in the vertical direction due to the influence of the moment of inertia.
よって、アーム１６は振動しなくなり、露光光学系１５
は安定して固定される。Therefore, the arm 16 no longer vibrates, and the exposure optical system 15
is stable and fixed.
従って、ステージ凌構工は、ステッパ１０によって露光
されるレチクルパターンのピッチずれ、トラベゾイド等
を解消するとともに、焦点ずれによる解像不良も解消す
る。Therefore, the stage construction eliminates pitch deviations, trabezoids, etc. of the reticle pattern exposed by the stepper 10, and also eliminates poor resolution due to defocus.
〈発明の効果）
以上、説明した様に本発明によれば、ステージ機構を回
転させようとする慣性モーメントを生じなくしたので、
ステージ機構の上下方向の振動がなくなる。<Effects of the Invention> As explained above, according to the present invention, the moment of inertia that attempts to rotate the stage mechanism is not generated.
Vertical vibration of the stage mechanism is eliminated.
その為、半導体製造装置の露光装置等を可動ステージと
して用いた場合に、ピッチずれやトラベゾイド等が生じ
ない、又焦点ずれのない優れた露光パターンを形成する
ことができ、露光される半導体装置の歩留りを向上させ
ることができるという効果が得られる。Therefore, when the exposure equipment of semiconductor manufacturing equipment is used as a movable stage, it is possible to form an excellent exposure pattern without pitch deviation, trabezoid, etc., and without defocusing, and it is possible to The effect is that the yield can be improved.
第１図は、本発明の詳細な説明する図、第２図は、第１
図中のＡ−Ａ線横断面図、第３図は、第１図中のＢ−Ｂ
線縦断面図、第４図は、第１図中のステージ機構が設け
られたステッパを説明する部分破砕正面図。
第５図は、従来の技術を説明する正面図、第６図は、従
来のＸ−Ｙ軸ステージが設けられたステッパを説明する
正面図である。
１・・・ステージ機構、 ２・・・ベース。
３・・・第１駆動部、 ４・・・第１ステージ。
５・・・第１駆動軸、 ６・・・第２駆動部。
７・・・第２駆動軸、 ８・・・第２ステージ。
Ｇ８・・・ベースと第１駆動部とが成す重心。
ＧＹ・・・第２ステージの重心。
Ｘ・・・第１駆動軸の軸線。
Ｙ・・・第２駆動軸の軸線。FIG. 1 is a diagram explaining the present invention in detail, and FIG.
The cross-sectional view taken along the line A-A in the figure, and Figure 3 is the cross-sectional view taken along the line B-B in Figure 1.
4 is a partially exploded front view illustrating the stepper provided with the stage mechanism shown in FIG. 1; FIG. FIG. 5 is a front view illustrating a conventional technique, and FIG. 6 is a front view illustrating a stepper provided with a conventional X-Y axis stage. 1... Stage mechanism, 2... Base. 3... First drive unit, 4... First stage. 5... First drive shaft, 6... Second drive section. 7...Second drive shaft, 8...Second stage. G8... Center of gravity formed by the base and the first drive section. GY: Center of gravity of the second stage. X: Axis of the first drive shaft. Y: Axis line of the second drive shaft.
Claims (1)
前記第１駆動軸を介して駆動する第１ステージと、 前記第１ステージの内側に設けた第２駆動部と、 前記第２駆動部を介して駆動する第２駆動軸と、 前記第１ステージの内側にかつ摺動自在に支持されると
ともに前記第２駆動軸を介して摺動する第２ステージと
から構成され、 前記ベースと前記第１駆動部とが成す重心と、前記第１
駆動軸と前記第１ステージと前記第２駆動部と前記第２
駆動軸とが成す重心と、前記第２ステージの重心とを同
一平面内に設け、 前記第１駆動軸と前記第１ステージと前記第２駆動部と
前記第２駆動軸とが成す重心を該第１駆動軸の軸線に一
致させるとともに、前記第２ステージの重心を前記第２
駆動軸の軸線に一致させたことを特徴とするステージ機
構。[Scope of Claims] A base, a first drive section provided inside the base, a first drive shaft slidably driven by the first drive section, and supported slidably inside the base. a first stage that is driven via the first drive shaft; a second drive section provided inside the first stage; a second drive shaft that is driven via the second drive section; a second stage that is slidably supported inside the first stage and slides via the second drive shaft; the center of gravity formed by the base and the first drive section; 1
a drive shaft, the first stage, the second drive section, and the second
The center of gravity formed by the drive shaft and the center of gravity of the second stage are provided in the same plane, and the center of gravity formed by the first drive shaft, the first stage, the second drive section, and the second drive shaft is set in the same plane. The center of gravity of the second stage is aligned with the axis of the first drive shaft, and the center of gravity of the second stage is aligned with the axis of the first drive shaft.
A stage mechanism characterized by being aligned with the axis of the drive shaft.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1128382A JPH02307092A (en) | 1989-05-22 | 1989-05-22 | Stage mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1128382A JPH02307092A (en) | 1989-05-22 | 1989-05-22 | Stage mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02307092A true JPH02307092A (en) | 1990-12-20 |
Family
ID=14983436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1128382A Pending JPH02307092A (en) | 1989-05-22 | 1989-05-22 | Stage mechanism |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02307092A (en) |
-
1989
- 1989-05-22 JP JP1128382A patent/JPH02307092A/en active Pending
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