JPH0229690B2 - HORIAMIDOSANKAGOBUTSU - Google Patents
HORIAMIDOSANKAGOBUTSUInfo
- Publication number
- JPH0229690B2 JPH0229690B2 JP31672188A JP31672188A JPH0229690B2 JP H0229690 B2 JPH0229690 B2 JP H0229690B2 JP 31672188 A JP31672188 A JP 31672188A JP 31672188 A JP31672188 A JP 31672188A JP H0229690 B2 JPH0229690 B2 JP H0229690B2
- Authority
- JP
- Japan
- Prior art keywords
- acid compound
- mol
- structural unit
- polyamic acid
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 claims description 27
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 10
- 239000004952 Polyamide Substances 0.000 claims description 8
- 229920002647 polyamide Polymers 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 6
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 230000018044 dehydration Effects 0.000 claims description 4
- 238000006297 dehydration reaction Methods 0.000 claims description 4
- 238000006798 ring closing metathesis reaction Methods 0.000 claims description 4
- RHRNYXVSZLSRRP-UHFFFAOYSA-N 3-(carboxymethyl)cyclopentane-1,2,4-tricarboxylic acid Chemical compound OC(=O)CC1C(C(O)=O)CC(C(O)=O)C1C(O)=O RHRNYXVSZLSRRP-UHFFFAOYSA-N 0.000 claims description 3
- -1 alicyclic diamine Chemical class 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 125000003277 amino group Chemical group 0.000 claims 1
- 229920005575 poly(amic acid) Polymers 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000000887 hydrating effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
〔産業上の利用分野〕
本発明はポリアミド酸化合物に関する。
〔従来の技術〕
一般にポリアミド酸化合物は、耐熱性に非常に
優れた性質を示すポリイミド化合物の前駆体とし
て非常に有用であるほか、各種モノマーおよびポ
リマーと反応、混合させて変性することができる
ので用途範囲が広い。
従来のポリアミド酸化合物としては、無水ピロ
メリツト酸等の芳香族テトラカルボン酸2無水物
とジアミンとを、N,N−ジメチルホルムアミ
ド、N,N−ジメチルアセトアミド、N−メチル
−2−ピロリドン等の溶媒中で反応させて得られ
る芳香族ポリアミド酸化合物が知られている。
しかし、従来の芳香族ポリアミド酸化合物は保
存安定性が悪く、例えば脱水閉環によるイミド化
が若干でも進むと溶剤に溶けなくなり、溶液状態
で長期間保存すると白濁を生じるという欠点があ
る。この欠点を除くため、従来のポリアミド酸の
溶液は、通常、10℃以下で保存する必要があり、
取扱いが著しく不便であつた。さらに従来の芳香
族ポリアミド酸化合物は、原料である芳香族テト
ラカルボン酸2無水物の価格が高いため、汎用的
な用途には不向きであつた。
〔発明が解決しようとする課題〕
本発明の目的は、前記従来技術の問題を解決
し、耐熱性、機械的特性、電気特性、耐薬品性等
に優れたポリイミド化合物の前駆体等に利用され
る、溶液状態で安定なポリアミド酸化合物を提供
することにある。
〔課題を解決するための手段〕
本発明は、2,3,5−トリカルボキシ−シク
ロペンタン−アセチツクアシツドから2つの水酸
基を除いた構造と、脂肪族または脂環族ジアミン
の2つのアミノ基からそれぞれ1つの水素原子を
除いた構造とがアミド結合により結合した構造単
位30〜100モル%および該構造単位のアミド結合
の少なくとも1つが脱水閉環して得られる構造単
位0〜70モル%の繰り返し構造単位からなる、極
限粘度〔η〕(30℃、N−メチル−2−ピロリド
ン溶媒中)が0.05〜5dl/gであるポリアミド酸
化合物を提供するものである。
本発明のポリアミド酸化合物は、アミド結合の
一部が脱水閉環され、例えば下記一般式()、
()、()、()等で示される繰返し構造単位
が一部存在してもよい。
本発明のポリアミド酸化合物は、2,3,5−
トリカルボキシ−シクロペンタン−アセチツクア
シツドまたはその無水物と、脂肪族または脂環族
ジアミンとを少なくともそれらの一方を溶解する
溶媒中で反応させて得られる。
前記2,3,5−トリカルボキシ−シクロペン
タン−アセチツクアシツド(以下、「TCA」と称
する)は、例えばジシクロペンタジエンをオゾン
分解し、過酸化水素で酸化する方法(英国特許第
872355号、J.Org.Chem.28(10)2537、1963)、ジシ
クロペンタジエンを水和して得られるヒドロキシ
−ジシクロペンタジエンを硝酸酸化する方法(西
独特許第1078120号)などによつて製造すること
ができ、TCAを脱水することによりTCAは無水
物(通常は2無水物)が得られる。
前記TCAまたはTCA無水物と反応させるジア
ミンは、一般式:H2N−R1−NH2で示される化
合物であり、R1は2価の脂肪族または脂環族基
である。このR1としては、−(CH2)6−、−(CH2)7
−、−(CH2)8−、−(CH2)9−、
[Industrial Field of Application] The present invention relates to polyamic acid compounds. [Prior Art] In general, polyamic acid compounds are very useful as precursors for polyimide compounds that exhibit excellent heat resistance, and can be modified by reacting and mixing with various monomers and polymers. Wide range of uses. Conventional polyamic acid compounds include aromatic tetracarboxylic dianhydride such as pyromellitic anhydride and diamine in a solvent such as N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidone. Aromatic polyamide acid compounds obtained by reacting in However, conventional aromatic polyamic acid compounds have poor storage stability, and have the drawback that, for example, if imidization due to dehydration and ring closure progresses even slightly, they become insoluble in solvents and become cloudy when stored in a solution state for a long period of time. To eliminate this drawback, conventional polyamic acid solutions usually need to be stored at temperatures below 10°C.
It was extremely inconvenient to handle. Further, conventional aromatic polyamide acid compounds were unsuitable for general use because the raw material, aromatic tetracarboxylic dianhydride, was expensive. [Problems to be Solved by the Invention] The purpose of the present invention is to solve the problems of the prior art and to provide a precursor for polyimide compounds having excellent heat resistance, mechanical properties, electrical properties, chemical resistance, etc. The object of the present invention is to provide a polyamide acid compound that is stable in a solution state. [Means for Solving the Problems] The present invention provides a structure in which two hydroxyl groups are removed from 2,3,5-tricarboxy-cyclopentane-acetic acid, and two amino acids in an aliphatic or alicyclic diamine. 30 to 100 mol% of structural units in which a structure obtained by removing one hydrogen atom from each group is bonded by an amide bond, and 0 to 70 mol% of structural units obtained by dehydration and ring closure of at least one of the amide bonds of the structural unit. The present invention provides a polyamide acid compound consisting of repeating structural units and having an intrinsic viscosity [η] (30°C, in N-methyl-2-pyrrolidone solvent) of 0.05 to 5 dl/g. In the polyamide acid compound of the present invention, a part of the amide bond is dehydrated and ring-closed, for example, the following general formula (),
A portion of repeating structural units represented by (), (), (), etc. may be present. The polyamide acid compound of the present invention is 2,3,5-
It is obtained by reacting tricarboxy-cyclopentane-acetic acid or its anhydride with an aliphatic or alicyclic diamine in a solvent that dissolves at least one of them. The 2,3,5-tricarboxy-cyclopentane-acetic acid (hereinafter referred to as "TCA") can be produced by, for example, a method in which dicyclopentadiene is ozonolyzed and oxidized with hydrogen peroxide (British Patent No.
872355, J.Org.Chem.28(10)2537, 1963), oxidation of hydroxy-dicyclopentadiene obtained by hydrating dicyclopentadiene with nitric acid (West German Patent No. 1078120), etc. By dehydrating TCA, an anhydride (usually dianhydride) of TCA can be obtained. The diamine to be reacted with the TCA or TCA anhydride is a compound represented by the general formula: H2NR1-NH2 , where R1 is a divalent aliphatic or alicyclic group. For this R 1 , −(CH 2 ) 6 −, −(CH 2 ) 7
−, −(CH 2 ) 8 −, −(CH 2 ) 9 −,
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
以下、本発明を実施例によつてさらに詳細に説
明するが、本発明はこれらの実施例によつて制限
されるものではない。
実施例 1
N2雰囲気下、ヘキサメチレンジアミン11.6g
(0.1mol)をN−メチル−2−ピロリドン
(NMP)200mlに溶解し、撹拌しながら25℃で
TCA2無水物22.4g(0.1mol)を添加し、懸濁さ
せた後、50℃に昇温して3時間反応させた。その
後、この反応溶液をアセトン中に投入して凝固
し、乾燥させてポリアミド酸化合物の粉末33gを
得た。
このポリアミド酸化合物の極限粘度η(30℃、
NMP溶媒中)は1.4dl/gであつた。なお、反応
後の溶液を25℃で30日間放置しても粘度の上昇は
なく、また白濁等の不溶分析出の現象は見られな
かつた。
上記ポリアミド酸化合物の赤外吸収スペクトル
を第1図に示したが、アミド・カルボニルに基づ
く吸収が1640cm-1に見られた。さらに上記ポリア
ミド酸化合物の−COOH基含有量をアルカリ滴
定により求め、この−COOH基含有量からイミ
ド化率を測定したところ、イミド化率は0%であ
つた。なお、この場合のイミド化率とは、ポリア
ミド酸化合物中のアミド結合とイミド結合(アミ
ド結合が脱水閉環した結合)の合計量を100とし
たときのイミド結合の割合(モル%で示す)を示
したものである。
また上記ポリアミド酸化合物の元素分析を行な
つた結果、炭素56.1%、水素7.0%、窒素8.4%
(計算値:炭素56.5%、水素7.1%、窒素8.2%)で
あつた。
次にこのポリアミド酸化合物の粉末10gをN,
N−ジメチルホルムアミド30gに溶解し、25重量
%溶液を作り、一部をガラス板上にスピン・コー
テイングし、120℃で1時間、200℃で1時間、
350℃で30分加熱処理をして、20μmの茶色で透
明なポリイミド化合物のフイルムを作製した。こ
の化合物の各種物性を測定したところ、第1表に
示す結果を得た。
EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples. Example 1 11.6 g of hexamethylene diamine under N2 atmosphere
(0.1 mol) in 200 ml of N-methyl-2-pyrrolidone (NMP) and heated at 25°C with stirring.
After adding and suspending 22.4 g (0.1 mol) of TCA2 anhydride, the temperature was raised to 50° C. and the mixture was reacted for 3 hours. Thereafter, this reaction solution was poured into acetone, coagulated, and dried to obtain 33 g of polyamide acid compound powder. The intrinsic viscosity of this polyamic acid compound η (30℃,
(in NMP solvent) was 1.4 dl/g. Note that even when the solution after the reaction was left at 25° C. for 30 days, there was no increase in viscosity, and no phenomena of insoluble analysis such as clouding were observed. The infrared absorption spectrum of the above polyamic acid compound is shown in FIG. 1, and absorption due to amide carbonyl was observed at 1640 cm -1 . Further, the -COOH group content of the polyamide acid compound was determined by alkaline titration, and the imidization rate was measured from this -COOH group content, and the imidization rate was 0%. In addition, the imidization rate in this case is the ratio of imide bonds (expressed in mol%) when the total amount of amide bonds and imide bonds (bonds formed by dehydration and ring closure of amide bonds) in the polyamic acid compound is 100. This is what is shown. In addition, as a result of elemental analysis of the above polyamide acid compound, carbon 56.1%, hydrogen 7.0%, nitrogen 8.4%
(Calculated values: 56.5% carbon, 7.1% hydrogen, 8.2% nitrogen). Next, 10g of powder of this polyamic acid compound was added to N,
Dissolve in 30 g of N-dimethylformamide to make a 25% by weight solution, spin coat a portion on a glass plate, heat at 120°C for 1 hour, and at 200°C for 1 hour.
Heat treatment was performed at 350°C for 30 minutes to produce a 20 μm brown transparent polyimide compound film. When various physical properties of this compound were measured, the results shown in Table 1 were obtained.
本発明のポリアミド酸化合物は、保存安定性に
優れ、また該ポリアミド酸化合物を前駆物質とす
るポリイミド化合物は、耐熱性、機械的特性、電
気特性、耐薬品特性等に優れた特性を示すため、
例えば高温用フイルム、接着剤、塗料等に有用で
あり、具体的にはプリント配線基板、フレキシブ
ル配線基板、半導体集積回路素子の表面保護膜ま
たは層間絶縁膜、エナメル電線用被覆材、各種積
層板、ガスケツト等に有用である。
The polyamic acid compound of the present invention has excellent storage stability, and the polyimide compound using the polyamic acid compound as a precursor exhibits excellent properties such as heat resistance, mechanical properties, electrical properties, and chemical resistance properties.
For example, it is useful for high-temperature films, adhesives, paints, etc., specifically printed wiring boards, flexible wiring boards, surface protection films or interlayer insulation films for semiconductor integrated circuit elements, coating materials for enameled electric wires, various laminates, Useful for gaskets, etc.
第1図、第2図および第3図は、それぞれ本発
明の実施例で得られたポリアミド酸化合物の赤外
吸収スペクトルを示す図である。
FIG. 1, FIG. 2, and FIG. 3 are diagrams showing infrared absorption spectra of polyamic acid compounds obtained in Examples of the present invention, respectively.
Claims (1)
ン−アセチツクアシツドから2つの水酸基を除い
た構造と、脂肪族または脂環族ジアミンの2つの
アミノ基からそれぞれ1つの水素原子を除いた構
造とがアミド結合により結合した構造単位30〜
100モル%および該構造単位のアミド結合の少な
くとも1つが脱水閉環して得られる構造単位0〜
70モル%の繰り返し構造単位からなる、極限粘度
〔η〕(30℃、N−メチル−2−ピロリドン溶媒
中)が0.05〜5dl/gであるポリアミド酸化合
物。[Scope of Claims] 1 A structure obtained by removing two hydroxyl groups from 2,3,5-tricarboxy-cyclopentane-acetic acid, and one hydrogen from each of two amino groups of an aliphatic or alicyclic diamine. Structural unit 30 ~ in which the structure excluding atoms is bonded through an amide bond
100 mol% and a structural unit obtained by dehydration and ring closure of at least one of the amide bonds of the structural unit 0-
A polyamide acid compound consisting of 70 mol% of repeating structural units and having an intrinsic viscosity [η] (30°C, in N-methyl-2-pyrrolidone solvent) of 0.05 to 5 dl/g.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31672188A JPH0229690B2 (en) | 1988-12-15 | 1988-12-15 | HORIAMIDOSANKAGOBUTSU |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31672188A JPH0229690B2 (en) | 1988-12-15 | 1988-12-15 | HORIAMIDOSANKAGOBUTSU |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9129482A Division JPS58208321A (en) | 1982-05-31 | 1982-05-31 | Polyamic acid compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01301716A JPH01301716A (en) | 1989-12-05 |
JPH0229690B2 true JPH0229690B2 (en) | 1990-07-02 |
Family
ID=18080164
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31672188A Expired - Lifetime JPH0229690B2 (en) | 1988-12-15 | 1988-12-15 | HORIAMIDOSANKAGOBUTSU |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0229690B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006307055A (en) * | 2005-04-28 | 2006-11-09 | Hitachi Chem Co Ltd | Adhesive film, adhesion sheet and semiconductor device |
JP6972429B1 (en) * | 2020-08-05 | 2021-11-24 | 千代田化工建設株式会社 | Plant management method and plant design equipment |
-
1988
- 1988-12-15 JP JP31672188A patent/JPH0229690B2/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006307055A (en) * | 2005-04-28 | 2006-11-09 | Hitachi Chem Co Ltd | Adhesive film, adhesion sheet and semiconductor device |
JP6972429B1 (en) * | 2020-08-05 | 2021-11-24 | 千代田化工建設株式会社 | Plant management method and plant design equipment |
WO2022029915A1 (en) | 2020-08-05 | 2022-02-10 | 千代田化工建設株式会社 | Method for managing plant, plant design device, and plant management device |
Also Published As
Publication number | Publication date |
---|---|
JPH01301716A (en) | 1989-12-05 |
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