JPH02287428A - Production of liquid crystal display device - Google Patents

Production of liquid crystal display device

Info

Publication number
JPH02287428A
JPH02287428A JP10962489A JP10962489A JPH02287428A JP H02287428 A JPH02287428 A JP H02287428A JP 10962489 A JP10962489 A JP 10962489A JP 10962489 A JP10962489 A JP 10962489A JP H02287428 A JPH02287428 A JP H02287428A
Authority
JP
Japan
Prior art keywords
liquid crystal
display device
crystal display
film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10962489A
Other languages
Japanese (ja)
Inventor
Nobuyuki Shimotomai
信行 下斗米
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP10962489A priority Critical patent/JPH02287428A/en
Publication of JPH02287428A publication Critical patent/JPH02287428A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE:To eliminate the unequalness in display and to obtain the liquid crystal display device having uniform and high in quality by etching one of substrates or the film formed on the substrate in picture element units. CONSTITUTION:After a Cr film is formed by a sputtering method on the transparent substrate 1 over the entire surface thereof, the film is patterned to form a light shielding layer 2 and color filter layers 3 of R, G, B are then formed by a dyeing method, electrode deposition method, printing method or the like. An over coat layer 4 is then formed and thereafter the over coat layer on the picture elements corresponding to R, G, B is etched. Further, a common electrode 5 is formed over the entire surface of the substrate by a sputtering method and thereafter, thin-film transistors consisting of polysilicon and picture element electrodes 7 are formed in the form of a matrix as means for controlling the electrooptical effect of the liquid crystal on a transparent substrate 6. A pair of the substrates are adhered via a sealant 8 and the liquid crystal 9 is sealed therebetween to obtain the liquid crystal display device. The film thickness of the respective picture elements are varied in this way, by which the fluctuation in the film thickness is lessened and the unequalness in the display is eliminated. The liquid crystal display device having the uniform and high quality is thus obtd.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は液晶表示装置の製造方法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for manufacturing a liquid crystal display device.

−フィルターを形成する際に膜厚を赤・緑・青の画素ご
とに異ならせて、液晶のセルギャップを異ならせていた
-When forming the filter, the film thickness was varied for each red, green, and blue pixel, and the cell gap of the liquid crystal was varied.

〔発明が解決しようとする課題] しかし、前述の従来技術では、形成する膜厚をコントロ
ールするのが非常に難しく、膜厚のバラツキによりコン
トラストムラ・応答ムラ・色ムラなどの表示上のムラが
生じるという課題を有する。
[Problems to be Solved by the Invention] However, with the above-mentioned conventional technology, it is very difficult to control the thickness of the formed film, and variations in the film thickness may cause display irregularities such as uneven contrast, uneven response, and uneven color. It has the problem of arising.

そこで本発明は、このような課題を解決するもので、そ
の目的とするところは、エツチングにより各画素の膜厚
を異ならせ、膜厚のバラツキを少なくし、コントラスト
ムラ・応答ムラ・色ムラなどの表示上のムラをなくし、
均一で高画質の液晶表示装置を得るところにある。
The present invention is intended to solve these problems.The purpose of the present invention is to make the film thickness of each pixel different by etching, reduce the variation in film thickness, and eliminate contrast unevenness, response unevenness, color unevenness, etc. Eliminate unevenness in the display of
The goal is to obtain a liquid crystal display device with uniform and high image quality.

[従来の技術]                  
[課題を解決するための手段]従来の液晶表示装置の製
造方法は、特開昭60   本発明の液晶表示装置の製
造方法は、一対の蔦−296733などに記載されてい
るようにカラ  板上に液晶の電気光学効果を副扉する
ための手段と液晶セルのセルギャップを制御する手段を
形成する液晶表示装置の製造方法において、少なくとも
一方の基板あるいは基板上に形成した膜を画素単位でエ
ツチングすることを特徴とする。
[Conventional technology]
[Means for Solving the Problems] The conventional method for manufacturing a liquid crystal display device is as described in Japanese Patent Laid-Open No. 1983-1983, and the method for manufacturing a liquid crystal display device of the present invention is as described in Japanese Patent Application Laid-Open No. 1989-296733. In a manufacturing method of a liquid crystal display device, which forms a means for controlling the electro-optic effect of a liquid crystal and a means for controlling a cell gap of a liquid crystal cell, at least one of the substrates or a film formed on the substrate is etched pixel by pixel. It is characterized by

イミドなどの有機膜などがある。There are organic films such as imide.

[実施例1] 本実施例を以下図面に基づいて説明する。第1図は、本
実施例の液晶表示装置の断面図、第2図(a)〜(d)
は、本実施例の主要工程の断面図である。まず、透明基
板1上にCr膜をスパッタ法で全面に形成した後、パタ
ーニングして遮光層2を形成する。(第2図(a))次
にR−G−Hのカラーフィルター層3を染色法、電着法
、印刷法などで形成する。(第2図(b))そして、オ
ーバーコート層4を印刷法、スピンコード法、デイツプ
法などで形成し、R−G−Bに対応する画素上のオーバ
ーコート層を第1表に記載した条件でエツチングする。
[Example 1] This example will be described below based on the drawings. FIG. 1 is a cross-sectional view of the liquid crystal display device of this example, and FIGS. 2(a) to (d)
2 is a cross-sectional view of the main steps of this example. First, a Cr film is formed on the entire surface of the transparent substrate 1 by sputtering, and then patterned to form the light shielding layer 2. (FIG. 2(a)) Next, an R-G-H color filter layer 3 is formed by a dyeing method, an electrodeposition method, a printing method, or the like. (Fig. 2(b)) Then, the overcoat layer 4 was formed by a printing method, a spin code method, a dip method, etc., and the overcoat layer on the pixel corresponding to R-G-B was listed in Table 1. Etching according to conditions.

(第2図(C)) ここで、オーバーコートに用いる材料には、Sio2や
SiN、などの無機膜あるいは感光性ポリそして、共通
電極5をスパッタ法で基板全面に形成する。(第2図(
d)) つぎに、透明基板6上に液晶の電気光学効果を制御する
手段として、ポリシリコン薄膜トランジスターと画素電
極7をマトリックス状に形成する。
(FIG. 2(C)) Here, the material used for the overcoat is an inorganic film such as Sio2 or SiN, or photosensitive poly, and the common electrode 5 is formed on the entire surface of the substrate by sputtering. (Figure 2 (
d)) Next, polysilicon thin film transistors and pixel electrodes 7 are formed in a matrix on the transparent substrate 6 as a means for controlling the electro-optic effect of the liquid crystal.

そして、上記一対の基板をシール剤8を介して接着せし
め液晶9を封入して液晶表示装置を得た。
Then, the above-mentioned pair of substrates were bonded together with a sealant 8 interposed therebetween, and a liquid crystal 9 was sealed therein to obtain a liquid crystal display device.

[実施例2] 本実施例を以下図面に基づいて説明する。第4図は、本
実施例の液晶表示装置の断面図、第5図(a)〜(d)
は、本実施例の主要工程の断面図である。まず、透明基
板1上に液晶の電気光学効果を制御する手段として、ポ
リシリコン薄膜トランジスター2と画素電極3をマトリ
ックス状に形成する。(第2図(a))次にR−G−B
のカラーフィルター層4を染色法、電着法などで形成す
る。(第2図(b))そして、遮光層5を印刷法、スピ
ンコード法、デイツプ法などで形成する。(第2図(C
))そして、Sin、からなるオーバーコート層をスピ
ンコード法により3μ形成した後、感光性ポリイミドか
らなるオーバーコート層を0.9μ形成し、R−Gの画
素上の感光性ポリイミドを露光、現像、エツチングして
除去する。
[Example 2] This example will be described below based on the drawings. FIG. 4 is a cross-sectional view of the liquid crystal display device of this example, and FIGS. 5(a) to (d)
2 is a cross-sectional view of the main steps of this example. First, polysilicon thin film transistors 2 and pixel electrodes 3 are formed in a matrix on a transparent substrate 1 as a means for controlling the electro-optic effect of liquid crystal. (Figure 2(a)) Next, R-G-B
The color filter layer 4 is formed by a dyeing method, an electrodeposition method, or the like. (FIG. 2(b)) Then, the light shielding layer 5 is formed by a printing method, a spin code method, a dip method, or the like. (Figure 2 (C
)) Then, after forming an overcoat layer of 3 μm consisting of Sin by a spin code method, an overcoat layer of 0.9 μm consisting of photosensitive polyimide was formed, and the photosensitive polyimide on the R-G pixels was exposed and developed. , remove by etching.

そして、Rの画素上の5in2を0.9μエツチングし
て、ギャップ制御パターン6を形成する。
Then, a gap control pattern 6 is formed by etching 0.9μ of 5in2 on the R pixel.

次に、透明基板10上に遮光層と共通電極9を形成する
Next, a light shielding layer and a common electrode 9 are formed on the transparent substrate 10.

そして、上記一対の基板をシール剤7を介して接着せし
め、液晶8を封入して液晶表示装置を得た。
Then, the above-mentioned pair of substrates were bonded together with a sealant 7 interposed therebetween, and a liquid crystal 8 was sealed therein to obtain a liquid crystal display device.

[発明の効果] 本発明は、以上説明したように、少なくとも一方の基板
あるいは基板上に形成した膜を画素単位で再ツチングし
たことにより、膜厚のバラツキが少なくなり、コントラ
ストムラ・応答ムラ・色ムラなどの表示上のムラがなく
なり、均一で高画質の液晶表示装置を得ることができた
[Effects of the Invention] As explained above, the present invention re-chips at least one substrate or a film formed on the substrate in pixel units, thereby reducing variations in film thickness and reducing contrast unevenness, response unevenness, and Display unevenness such as color unevenness is eliminated, and a liquid crystal display device with uniform and high image quality can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の液晶表示装置の断面図、第2図(a
)〜(d)は、本発明の液晶表示装置の主要工程の断面
図である。 1.6.透明基板 2、遮光層 3、カラーフィルター層 オーバーコート層 共通電極 画素電極 シール剤 液晶 第3図は、 従来の液晶表示装置の断面図である。 2、透明基板 カラーフィルター層 共通電極 画素電極 シール剤 液晶 第4図は、本発明の液晶表示装置の断面図、第5図(a
)〜(d)は、本発明の液晶表示装置の主要工程の断面
図である。 1゜ 10゜ 透明基板 ポリシリコン薄膜トランジスター 画素電極 カラーフィルター層 遮光層 ギャップ制御パターン シール剤 液晶 共通電極 以上 出願人 セイコーエプソン株式会社 代理人 弁理士 銘木喜三部 (fl!!1名)(bン Cd) 仄Tコ 区
FIG. 1 is a sectional view of the liquid crystal display device of the present invention, and FIG.
) to (d) are cross-sectional views of main steps of the liquid crystal display device of the present invention. 1.6. Transparent substrate 2, light shielding layer 3, color filter layer overcoat layer common electrode pixel electrode sealant liquid crystal Figure 3 is a sectional view of a conventional liquid crystal display device. 2. Transparent substrate color filter layer common electrode pixel electrode sealant liquid crystal Fig. 4 is a sectional view of the liquid crystal display device of the present invention, Fig.
) to (d) are cross-sectional views of main steps of the liquid crystal display device of the present invention. 1゜10゜Transparent substrate Polysilicon thin film transistor Pixel electrode Color filter layer Light shielding layer Gap control pattern Sealing agent Liquid crystal common electrode and above Applicant Seiko Epson Corporation Agent Patent attorney Kizobe Meiki (fl!! 1 person) (b) Cd)

Claims (1)

【特許請求の範囲】[Claims] 一対の基板上に液晶の電気光学効果を制御するための手
段と液晶セルのセルギャップを制御する手段を形成する
液晶表示装置の製造方法において、少なくとも一方の基
板あるいは基板上に形成した膜を画素単位でエッチング
することを特徴とする液晶表示装置の製造方法。
In a method for manufacturing a liquid crystal display device in which a means for controlling the electro-optic effect of liquid crystal and a means for controlling a cell gap of a liquid crystal cell are formed on a pair of substrates, at least one of the substrates or a film formed on the substrate is used as a pixel. A method for manufacturing a liquid crystal display device characterized by etching in units.
JP10962489A 1989-04-28 1989-04-28 Production of liquid crystal display device Pending JPH02287428A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10962489A JPH02287428A (en) 1989-04-28 1989-04-28 Production of liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10962489A JPH02287428A (en) 1989-04-28 1989-04-28 Production of liquid crystal display device

Publications (1)

Publication Number Publication Date
JPH02287428A true JPH02287428A (en) 1990-11-27

Family

ID=14515004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10962489A Pending JPH02287428A (en) 1989-04-28 1989-04-28 Production of liquid crystal display device

Country Status (1)

Country Link
JP (1) JPH02287428A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7057684B2 (en) 2000-10-17 2006-06-06 Matsushita Electric Industrial Co., Ltd. Liquid crystal display with varying thickness

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7057684B2 (en) 2000-10-17 2006-06-06 Matsushita Electric Industrial Co., Ltd. Liquid crystal display with varying thickness

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