JPH0228213A - Epoxy resin composition for semiconductor sealing - Google Patents
Epoxy resin composition for semiconductor sealingInfo
- Publication number
- JPH0228213A JPH0228213A JP63115269A JP11526988A JPH0228213A JP H0228213 A JPH0228213 A JP H0228213A JP 63115269 A JP63115269 A JP 63115269A JP 11526988 A JP11526988 A JP 11526988A JP H0228213 A JPH0228213 A JP H0228213A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- silicone oil
- epoxy
- formula
- modified silicone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 52
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 51
- 239000000203 mixture Substances 0.000 title claims abstract description 22
- 239000004065 semiconductor Substances 0.000 title claims description 20
- 238000007789 sealing Methods 0.000 title description 3
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 27
- 229920002545 silicone oil Polymers 0.000 claims abstract description 25
- 125000000962 organic group Chemical group 0.000 claims abstract description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 3
- 125000000217 alkyl group Chemical group 0.000 claims abstract 2
- 238000005538 encapsulation Methods 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract description 15
- 229920003986 novolac Polymers 0.000 abstract description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 10
- 230000009477 glass transition Effects 0.000 abstract description 9
- 229920005989 resin Polymers 0.000 abstract description 7
- 239000011347 resin Substances 0.000 abstract description 7
- 125000003700 epoxy group Chemical group 0.000 abstract description 6
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 abstract description 3
- 229930003836 cresol Natural products 0.000 abstract description 3
- 238000002156 mixing Methods 0.000 abstract description 2
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000004593 Epoxy Substances 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 10
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000011256 inorganic filler Substances 0.000 description 5
- 229910003475 inorganic filler Inorganic materials 0.000 description 5
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 239000000806 elastomer Substances 0.000 description 3
- 238000001879 gelation Methods 0.000 description 3
- 239000006082 mold release agent Substances 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- -1 ethylene, trimethylene, tetramethylene Chemical group 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229920005573 silicon-containing polymer Polymers 0.000 description 2
- 239000012756 surface treatment agent Substances 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- RXFFQBYNCVPZGL-UHFFFAOYSA-N 1,2,3,4,5,5a,8,9-octahydropyrido[1,2-b]diazepine Chemical compound N1CCCCC2C=CCCN21 RXFFQBYNCVPZGL-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- UJWXADOOYOEBCW-UHFFFAOYSA-N 2-[[2-[bis[2-(oxiran-2-ylmethoxy)phenyl]methyl]phenoxy]methyl]oxirane Chemical compound C1OC1COC1=CC=CC=C1C(C=1C(=CC=CC=1)OCC1OC1)C1=CC=CC=C1OCC1CO1 UJWXADOOYOEBCW-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical class CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001470 diamides Chemical class 0.000 description 1
- 210000002451 diencephalon Anatomy 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Chemical group CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は半導体封止用エポキシ樹脂組成物に組するも
のである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention is applied to an epoxy resin composition for semiconductor encapsulation.
近年、半導体素子は、高集積化に伴うチップ面積の大型
化、樹脂の薄肉化により、従来のエポキシw脂組成物で
封止した場合、チップにクラックが生じたり、ボンディ
ング線の切断、アルミ配線のスライド、封止樹脂のクラ
ックなど半導体部品(1として致命的故障を起こす。こ
れは、従来の半導体用封止用エポキシ樹脂が、耐熱性、
耐湿性という観点から開発されており、その硬化物が可
撓性に乏しく、素子へ加わる応力が大きいためである。In recent years, semiconductor devices have become more integrated, resulting in larger chip areas and thinner resins. When encapsulated with conventional epoxy resin compositions, chips may crack, bonding lines may be cut, or aluminum wiring may occur. Sliding, cracks in the encapsulating resin, etc. can cause fatal failures in semiconductor parts (1).This is because conventional epoxy resins for semiconductor encapsulation are
This is because it was developed from the viewpoint of moisture resistance, and its cured product has poor flexibility, and the stress applied to the element is large.
一般に半導体封止用エポキシ樹脂の応力を低減するため
には、樹脂の熱膨張率を小さくして熱歪を小さくする方
向と、弾性率を低くし、熱歪による応力を小さくする方
向がある。また、耐熱性、耐湿性を保持し、熱歪の小さ
い温度領域を広げるという面からみた場合、ガラス転移
温度を高くする必要がある。低応力化の方法として可撓
化剤を添加する方法があるが、従来の可撓化剤(たとえ
ば、長鎖状アルキレンポリアミン、ポリオキシアルキレ
ングリコール、長鎖状アルキレンオキサイドをもったビ
スフェノールA型ジグリシジルエーテル)で弾性率を低
下させる方法では、硬化物のガラス転移温度の低下が大
きく、耐熱性、耐湿性が低下するという欠点がある。(
持分1↓559−8718号公報、特公昭59−308
20号公報、特公昭59−226066号公報)
1封1♀性およびガラス転移温度の低下が小さい可撓化
剤として両末端にエポキシ樹脂、あるいはフェノール樹
脂と反応可能な官能基をもったポリブタジェン、あるい
はブタジェンとアクリロニトリルとの共重合体から得ら
れるエラストマー変性可14化剤も考案されている。(
特公昭58−108220号公報、特公昭58−174
416号公報、特公昭58−184204号公報、特公
昭62−9248号公報、特公昭59−113021号
公報、特公昭59−58024号公報参照)
又、高温度の電気特性、熱安定性において優れた可撓化
剤である低弾性率のシリコーン樹脂あるいはシリコーン
ゴムを分散させるという方法がある。(特公昭62−8
4147号公報、特公昭564647号公報)
〔発明が解決しようとする課題〕
上記従来のエラストマー変成可撓化剤は、高温時におけ
るエラストマー中の不飽和結合が酸化され劣化するため
に可撓化効果が消失するという問題点があり、シリコー
ン樹脂は金hA(フレームなど)との接着性が乏しく、
シリコーンオイルハ、エポキシマトリクスとの界面強度
が弱いため硬化物の透湿性が大きくなり、耐湿性が悪(
、機械強度も弱いという点で信頼性に欠けるという問題
点があった。Generally, in order to reduce the stress of an epoxy resin for semiconductor sealing, there are two ways: to reduce the coefficient of thermal expansion of the resin to reduce thermal strain, and to lower the modulus of elasticity to reduce stress due to thermal strain. In addition, from the viewpoint of maintaining heat resistance and moisture resistance and expanding the temperature range where thermal distortion is small, it is necessary to increase the glass transition temperature. One way to reduce stress is to add a flexibilizer, but conventional flexibilizers (for example, long-chain alkylene polyamines, polyoxyalkylene glycols, bisphenol A-type diamides with long-chain alkylene oxides) The method of lowering the elastic modulus using glycidyl ether (glycidyl ether) has the disadvantage that the glass transition temperature of the cured product is significantly lowered, resulting in lower heat resistance and moisture resistance. (
Equity 1↓ Publication No. 559-8718, Special Publication No. 59-308
(No. 20, Japanese Patent Publication No. 59-226066) Polybutadiene, which has a functional group capable of reacting with an epoxy resin or a phenol resin at both ends, is used as a flexibilizing agent with a small drop in 1-sealability and glass transition temperature; Alternatively, an elastomer modifying agent obtained from a copolymer of butadiene and acrylonitrile has also been devised. (
Special Publication No. Sho 58-108220, Special Publication No. Sho 58-174
(See Japanese Patent Publication No. 416, Japanese Patent Publication No. 58-184204, Japanese Patent Publication No. 62-9248, Japanese Patent Publication No. 59-113021, Japanese Patent Publication No. 59-58024) Also, it has excellent electrical properties and thermal stability at high temperatures. Another method involves dispersing silicone resin or silicone rubber with a low elastic modulus as a flexibilizing agent. (Tokuko Showa 62-8
(Japanese Patent Publication No. 4147, Japanese Patent Publication No. 564647) [Problems to be Solved by the Invention] The above-mentioned conventional elastomer modification flexibility agents have a poor flexibility effect because the unsaturated bonds in the elastomer are oxidized and deteriorated at high temperatures. There is a problem that the silicone resin disappears, and silicone resin has poor adhesion with gold hA (frames, etc.).
Silicone oil has a weak interface with the epoxy matrix, so the moisture permeability of the cured product increases, resulting in poor moisture resistance (
However, there was a problem in that it lacked reliability due to its low mechanical strength.
この発明は、かかる課題を解決するためになされたちの
で、耐熱性、耐湿性を有し、かつ低弾性率、低熱膨張率
、従来と同程度又はそれ以上の高ガラス転移温度の硬化
物の得られる半導体封圧用エポキシ樹脂組成物を得るこ
とを目的とする。The present invention has been made to solve these problems, and therefore, it is possible to obtain a cured product that has heat resistance, moisture resistance, low elastic modulus, low coefficient of thermal expansion, and a high glass transition temperature comparable to or higher than conventional products. The purpose of the present invention is to obtain an epoxy resin composition for semiconductor confinement.
この発明の半導体封止用エポキシ樹脂組成物は、−数式 式中、 R3 + R4・は二価の有機基、 ”!I + R23! ”2“′\ \ である。 The epoxy resin composition for semiconductor encapsulation of this invention has the following formula: During the ceremony, R3 + R4 is a divalent organic group, ”!I+R23!”2”′\ \ It is.
で示される変性シリコーンオイルの内の少なくとも一種
とエポキシ樹脂を反応させて得られる可撓化剤、エポキ
シ樹脂および硬化剤を含有するものである。It contains a flexibilizing agent, an epoxy resin, and a curing agent obtained by reacting at least one of the modified silicone oils shown in the following with an epoxy resin.
この発明において、シリコーンオイルとエポキシ樹脂と
の予備反応により得られる共重合体は、シリコーンポリ
マーの両末端あるいは両末端と分子内部に含まれるフェ
ノール性水酸基とエポキシ樹脂中のエポキシ基とが任意
に反応することにより可撓化成分であるシリコーンポリ
マーを化学的に予備結合させており、エポキシ硬化物中
でシリコーンとマトリクスとの界面を強靭にするもので
ある。In this invention, the copolymer obtained by preliminary reaction between silicone oil and epoxy resin is produced by the reaction between both ends of the silicone polymer or both ends and the phenolic hydroxyl group contained within the molecule and the epoxy group in the epoxy resin. By doing so, the silicone polymer, which is the flexibilizing component, is chemically pre-bonded, and the interface between the silicone and the matrix in the cured epoxy product is strengthened.
この発明に係わるエポキシz 、Mとしては、例えばク
レゾールノボラック型エポキシ嗣脂、フェノ−にノボラ
ック型エポキシ圏脂、アルキルベンゼン変性フェノール
ノボラック型エポキシ!flLハロゲン化フェノールノ
ボラック型エポキシ樹脂、ビスフェノールAノボラック
型エポキシ樹脂、トリス(グリシドキシフェニル)メタ
ンなどの多官能型エポキシ樹脂、などがあげられるが、
これに限定されるものではない。これらは単独で用いて
もよく二種類以上を併用してもよい。Epoxies Z and M according to the present invention include, for example, cresol novolak type epoxy resin, phenol novolac type epoxy resin, alkylbenzene-modified phenol novolac type epoxy! Examples include flL halogenated phenol novolak type epoxy resin, bisphenol A novolac type epoxy resin, multifunctional type epoxy resin such as tris(glycidoxyphenyl)methane, etc.
It is not limited to this. These may be used alone or in combination of two or more.
又、変性シリコーンオイルと反応させるエポキシ樹脂と
それ以外のエポキシ樹脂は同種でも異種でも良い。Further, the epoxy resin to be reacted with the modified silicone oil and the other epoxy resins may be of the same type or different types.
この発明に係わる硬化剤としては、フェノールノボラッ
ク樹脂、クレゾールノボラック樹脂、アルキル変性フェ
ノール樹脂、ビスフェノールAノボラック1flL)−
リス(ヒドロキシフェニル)メタンなどの多官能型フェ
ノール樹脂などのフェノールノボラック硬化剤があげら
れるが、これらに限定されるものではない。これらは単
独の使用に限定されるものではなく二種類以上を併用で
きる。Examples of the curing agent according to this invention include phenol novolak resin, cresol novolak resin, alkyl-modified phenol resin, and bisphenol A novolak 1flL)-
Examples include, but are not limited to, phenolic novolak curing agents such as polyfunctional phenolic resins such as lis(hydroxyphenyl)methane. These are not limited to use alone, but two or more types can be used in combination.
又、この発明に、硬化促進剤(触媒)、無機充填剤、内
部離型剤、表面処理剤、顔料、難燃剤および酸化防止剤
などの添加剤を適宜含有させることは何ら差支えない。Further, in the present invention, additives such as a curing accelerator (catalyst), an inorganic filler, an internal mold release agent, a surface treatment agent, a pigment, a flame retardant, and an antioxidant may be appropriately included.
硬化促進剤としては、通常の触媒である限り特に限定さ
れるものではなく、その具体例としては、トリフェニル
ホスフィンなどの本スフィン類で代表されるリン化合物
、2−メチルイミダゾール、2−エチル−4−メチルイ
ミダゾールなどのイミダゾール類、3級アミン類、1,
8−ジアザビシクロ(5,4,0)ウンデセン7、その
有機塩類などがある。これらは単独に用いてもよく、併
用しても何ら差支えない。その添加量は、封止樹脂組成
物中に1重i%以下が望ましい。1重量%以上ではゲル
化が速すぎ成形が困難となる。無機充填剤は、エポキシ
間脳100重量部に対して250〜1300重量部が好
ましく、250重量部以下では強度が低く、耐熱性、耐
熱衝撃性の面で支障が生じ、1300 i置部以上では
流動性に乏しく成形が困難になる。無機充填剤としては
、天然シリカ、合成シリカ、形状としては破砕シリカ、
球状シリカなどの石英粉砕物や、タルク、マイカ、窒化
ケイ素、アルミナなどがあり、これらに限定されるもの
ではない。The curing accelerator is not particularly limited as long as it is a common catalyst, and specific examples thereof include phosphorus compounds represented by the present sphines such as triphenylphosphine, 2-methylimidazole, and 2-ethyl- Imidazoles such as 4-methylimidazole, tertiary amines, 1,
Examples include 8-diazabicyclo(5,4,0)undecene 7 and its organic salts. These may be used alone or in combination without any problem. The amount added is desirably 1% by weight or less in the sealing resin composition. If it exceeds 1% by weight, gelation occurs too quickly and molding becomes difficult. The inorganic filler is preferably used in an amount of 250 to 1300 parts by weight per 100 parts by weight of the epoxy diencephalon.If it is less than 250 parts by weight, the strength will be low and problems will occur in terms of heat resistance and thermal shock resistance. Poor fluidity makes molding difficult. Inorganic fillers include natural silica, synthetic silica, and crushed silica in the form of
Examples include, but are not limited to, crushed quartz such as spherical silica, talc, mica, silicon nitride, and alumina.
また、これらは単独で使用してもよく二種類以上を併用
してもよい。また、脂肪酸およびその金属塩や、天然ワ
ックス、合成ワックスなどの内部離型剤、表面処理剤、
カーボンブラックなどの顔料、三酸化アンチモンといっ
た難燃剤、酸化防止剤が用いられる。Further, these may be used alone or in combination of two or more. In addition, fatty acids and their metal salts, internal mold release agents such as natural waxes and synthetic waxes, surface treatment agents,
Pigments such as carbon black, flame retardants such as antimony trioxide, and antioxidants are used.
この発明に係わる変性シリコーンオイルは、−数式
アルコキシ基、フェニル基および炭素I!!、1〜5の
唱
(フッ素置換アルキル基の内の−[−1,aは10〜3
00)の整数、bは0〜10の整数、0≦b/(a+b
)≦0.32ノである。The modified silicone oil according to the present invention has an alkoxy group, a phenyl group, and a carbon I! ! , 1 to 5 (-[-1, a of the fluorine-substituted alkyl group is 10 to 3
00), b is an integer from 0 to 10, 0≦b/(a+b
)≦0.32.
で示され、R+R3,R4としては、例えばメチレン、
エチレン、トリメチレン、テトラメチレンおよびプロピ
レンなどの二価の飽昭炭化水素基、炭素数θ〜10のエ
ーテル結合を含む二価の基、フェニレン基、二価の脂環
式炭化水素基、並びに複素環基があり、それぞれ同一で
あっても異なっても良い。and R+R3, R4 are, for example, methylene,
Divalent saturated hydrocarbon groups such as ethylene, trimethylene, tetramethylene and propylene, divalent groups containing an ether bond having θ to 10 carbon atoms, phenylene groups, divalent alicyclic hydrocarbon groups, and heterocycles There are two groups, each of which may be the same or different.
又、シロキサン単位数C式(1)中a)は、10〜30
0のatであり、10より小さいものは低弾性率化とし
ての効果が乏しく、逆に、300より大きいものは、エ
ポキシ樹脂との反応性が極端に小さ(なるばかりでなく
、さらに海島界面の強度が弱いため耐クラツク性などの
特性直で支障をきたす。そのため、a値の大きいシリコ
ーンにおいては両末端の他に分子内にフェノール性水酸
基をもたせることが望ましい。その際す値はO〜10の
整数で0≦1)/(a+b)≦0.32であり、0.3
2より大きくなるとエポキシ樹脂との予備反応の際、ゲ
ル化を生じ、安定した可撓化剤を得ることができない。Further, the number of siloxane units C in formula (1) a) is 10 to 30
If the at is smaller than 10, the effect of lowering the elastic modulus is poor, and if it is larger than 300, the reactivity with the epoxy resin is extremely small (not only does it cause a decrease in the sea-island interface) Because the strength is weak, it will cause problems in properties such as crack resistance. Therefore, in silicones with a large a value, it is desirable to have a phenolic hydroxyl group in the molecule in addition to both ends. is an integer of 0≦1)/(a+b)≦0.32, and 0.3
If it is larger than 2, gelation occurs during the preliminary reaction with the epoxy resin, making it impossible to obtain a stable flexibilizing agent.
又、上記変成シリコーンオイルは単独あるいは二種類以
上併用することができる。Further, the above-mentioned modified silicone oil can be used alone or in combination of two or more kinds.
上記変成シリコーンオイルとエポキシ樹脂を反応させて
可撓化剤を得る反応において、フェノール変性シリコー
ンオイル中のフェノール性水酸基とエポキシ樹脂のエポ
キシ基との当量比(フェノール性水酸基/エポキシ基)
の値は、0.4以下が好ましい。0.4より大きい場合
は、エポキシ樹脂との予備反応中にゲル化を生じ、安定
した可撓化剤が得られない。触媒は、シリコーンオイル
100重量部に対して3重量部以下が好ましい。このよ
うにして合成される予備反応物は、シリコーンオイル中
のフェノール性水酸基が70%以上エポキシ樹脂のエポ
キシ基と反応しているものが好ましい。In the reaction of reacting the above-mentioned modified silicone oil and epoxy resin to obtain a flexibilizing agent, the equivalent ratio of the phenolic hydroxyl group in the phenol-modified silicone oil to the epoxy group of the epoxy resin (phenolic hydroxyl group/epoxy group)
The value of is preferably 0.4 or less. If it is larger than 0.4, gelation occurs during the preliminary reaction with the epoxy resin, making it impossible to obtain a stable flexibilizing agent. The amount of the catalyst is preferably 3 parts by weight or less per 100 parts by weight of silicone oil. The pre-reacted product synthesized in this manner is preferably one in which 70% or more of the phenolic hydroxyl groups in the silicone oil have reacted with the epoxy groups of the epoxy resin.
70%未満の反応物では、半導体封止材料として強度低
下が大きくなるほか、高温で長時間保持した場合の重量
減少が大きくなるなどの支障を生じる。If the amount of the reactant is less than 70%, there will be problems such as a large decrease in strength as a semiconductor sealing material and a large weight loss when held at high temperatures for a long time.
この発明の実施例の半導体封止用エポキシ樹脂組成物は
、変成シリコーンオイルの添加量を囚とし、変成シリコ
ーンオイルと反応するエポキシ圏IJ& 、その他のエ
ポキシ目脂および硬化剤等の有機成分をα3〕とすると
き、[Al/(IAI+1BI)が3〜20重量%であ
るのが望ましい。3重量%未満では成形物の弾性率の低
下効果が小さく、ガラス転移温度の向上が小さい。逆に
20%を越えると機械強度の低下が著しく大きくなる。The epoxy resin composition for semiconductor encapsulation of the embodiment of the present invention controls the amount of modified silicone oil added, and contains α3 organic components such as epoxy zone IJ&, other epoxy eye fat, and curing agent that react with the modified silicone oil. ], it is desirable that [Al/(IAI+1BI) is 3 to 20% by weight. If it is less than 3% by weight, the effect of lowering the elastic modulus of the molded product is small and the improvement in the glass transition temperature is small. On the other hand, if it exceeds 20%, the decrease in mechanical strength will be significant.
以下、この発明を実施例により具体的に説明する。Hereinafter, the present invention will be specifically explained with reference to Examples.
実施例1
一般式
で示され平均分子量12 rl Oでフェノール性水酸
基当j1630の変性シリコーンオイル50[L部を、
エポキシ当jl (W、P、E) 170の多官能型エ
ポキシ樹脂(商品名EPPN−502、日本化薬量)1
00ffiffi部とトリフェニルホスフィン1重量部
と共に窒素雰囲気下140℃で反応させ、可撓化剤(1
)を得た。Example 1 A modified silicone oil represented by the general formula with an average molecular weight of 12 rl O and phenolic hydroxyl groups of 50 [L parts]
Epoxy weight jl (W, P, E) 170 multifunctional epoxy resin (trade name EPPN-502, Nippon Kayaku) 1
00ffiffi part and 1 part by weight of triphenylphosphine were reacted at 140°C in a nitrogen atmosphere, and a flexibilizer (1 part by weight) was reacted with 1 part by weight of triphenylphosphine.
) was obtained.
次に、可撓化剤に用いたエポキシ樹脂(EPPN502
)81重量部、エポキシ当量(W、P−E)2soの臭
化フェノールノボラックエポキシ樹脂(商品名BREN
−8日本化薬製日本化薬量部、上記エポキシ樹脂の合計
のエポキシ当量とフェノール性水酸基当量が等しくなる
ように加えたフェノール性水酸基当量105のフェノー
ルノボラック樹脂(商品名PSF4261群栄化学製)
66重置部、上記可撓化剤o) 29重量部、トリフェ
ニルホスフィン(TPP)1重量部、シランカップリン
グ剤、内部離型剤、無機充填剤として溶融シリカ扮未、
三酸化アンチモンおよび着色剤を表に示す配合量で混合
し、混練しやすいように加j、’A してこの発明の一
実施例の半導体封止用エポキシ樹脂組成物を得た。Next, the epoxy resin (EPPN502
) 81 parts by weight, epoxy equivalent (W, P-E) 2so brominated phenol novolac epoxy resin (trade name BREN
-8 Parts of Nippon Kayaku manufactured by Nippon Kayaku, phenol novolac resin with a phenolic hydroxyl equivalent of 105 added so that the total epoxy equivalent of the above epoxy resin and the phenolic hydroxyl equivalent are equal (product name PSF4261 manufactured by Gunei Chemical Co., Ltd.)
66 overlapping parts, 29 parts by weight of the above-mentioned flexibilizing agent (o), 1 part by weight of triphenylphosphine (TPP), silane coupling agent, internal mold release agent, fused silica as an inorganic filler,
Antimony trioxide and a colorant were mixed in the amounts shown in the table, and additions were made to facilitate kneading to obtain an epoxy resin composition for semiconductor encapsulation according to an embodiment of the present invention.
実施例2,3
実施例1において得た可撓化剤(1)の量およびその他
を各々表に示すように混合する以外は実施例1と同様に
してこの発明の他の実施例の半導体封止用エポキシ樹脂
組成物を、得た。Examples 2 and 3 Semiconductor encapsulation of other examples of the present invention was made in the same manner as in Example 1 except that the amount of the flexibilizing agent (1) obtained in Example 1 and others were mixed as shown in the table. A stopper epoxy resin composition was obtained.
実施例4
実施例1において用いた変成シリコーンオイルの代りに
一般式
で示され平均分子fi 4500でフェノール性水酸基
当ff122ooの変性シリコーンオイルを用いて実施
例1と同様に可撓化剤(2)を得、可撓化剤(2)およ
びその他を表に示すように見合する以外は実施例1と同
様にしてこの発明の他の実施例の半導体封止用エポキシ
樹脂組成物を1洋た。Example 4 Flexibility agent (2) was prepared in the same manner as in Example 1 except that instead of the modified silicone oil used in Example 1, a modified silicone oil represented by the general formula and having an average molecular fi of 4500 and a phenolic hydroxyl group of ff 122oo was used. An epoxy resin composition for semiconductor encapsulation according to another example of the present invention was prepared in the same manner as in Example 1 except that the flexibilizing agent (2) and others were adjusted as shown in the table.
実施例5
実施例1において用いた変成シリコーンオイルの代りに
一役式
で示され平均分子量uoooでフェノール性水酸基当1
15600の変成シリコーンオイルを用いて実施例1と
同様に可撓化剤(3)を得、可撓化剤(3)およびその
他を表に示すように混合する以外は実施例1と同様にし
てこの発明の他の実施例の半導体封止用エポキシ樹脂組
成物を得た。Example 5 In place of the modified silicone oil used in Example 1, a silicone oil was used which was expressed by the monomer formula and had an average molecular weight of uooo and a phenolic hydroxyl group of 1
A flexibilizer (3) was obtained in the same manner as in Example 1 using 15600 modified silicone oil, and in the same manner as in Example 1 except that the flexibilizer (3) and others were mixed as shown in the table. An epoxy resin composition for semiconductor encapsulation according to another example of the present invention was obtained.
実施例6
実施例1において用いた変成シリコーンオイルの代りに
、一般式
で示され平均分子量11000でフェノール性水酸基当
i12100の変性シリコーンオイルを用いて実施例1
と同様に可撓化剤(4)を得、可撓化剤(4)およびそ
の他を表に示すように混合する以外は実施例1と同様に
してこの発明のさらに他の実施例の半導体封止用エポキ
シ樹脂組成物を得た。Example 6 In place of the modified silicone oil used in Example 1, a modified silicone oil represented by the general formula and having an average molecular weight of 11,000 and an i of 12,100 per phenolic hydroxyl group was used.
A semiconductor encapsulation according to another embodiment of the present invention was prepared in the same manner as in Example 1 except that the flexibilizing agent (4) was obtained in the same manner as in Example 1, and the flexibilizing agent (4) and others were mixed as shown in the table. A stopper epoxy resin composition was obtained.
実施例7
実施例6において合成された可撓化剤(4)およびその
他の有機成分を実施例6と同様にして、無機充填剤を1
200部混合する以外は実施例1と同様にしてこの発明
のさらに他の実施例の半導体封止用エポキシ樹脂組成物
を得た。Example 7 The flexibilizing agent (4) synthesized in Example 6 and other organic components were used in the same manner as in Example 6, and the inorganic filler was added to 1.
An epoxy resin composition for semiconductor encapsulation according to yet another example of the present invention was obtained in the same manner as in Example 1 except that 200 parts of the composition were mixed.
比較例1
フェノール性水酸基当量210のシリコーンオイルの可
撓化剤(5)を用い、表に示すように混合してエポキシ
樹脂組成物を得た。Comparative Example 1 A silicone oil flexibilizing agent (5) having a phenolic hydroxyl equivalent of 210 was used and mixed as shown in the table to obtain an epoxy resin composition.
比較例2
可撓化剤を用いないで、表に示すように混合してエポキ
シ樹脂組成物を得た。Comparative Example 2 An epoxy resin composition was obtained by mixing as shown in the table without using a flexibilizing agent.
特性試験
上記実施例1〜6、比較例1.2のエポキシ樹脂組成物
の硬化試験片を作製し、機械特性(JISK6911
)、ガラス転多温度、熱膨張率、−196℃×30se
c〜260°CX30SeCの熱サイクル100回後の
パッケージクラック特性を測定した。その結果を表に示
す。表の結果から明らかなように、この発明の実施例の
半導体封止用エポキシ−脂組放物の硬化物は、耐熱性が
高く、低熱膨張率で、低弾性率であり、さらに従来例と
同程度又はそれ以上の高ガラス転移温度を達成し、又エ
ポキシ樹脂成分により耐湿性を有し、半導体封止用とし
て好適に使用しうろことが解る。Characteristic Test Cured test pieces of the epoxy resin compositions of Examples 1 to 6 and Comparative Example 1.2 were prepared, and the mechanical properties (JISK6911
), glass transition temperature, coefficient of thermal expansion, -196℃×30se
The package crack characteristics after 100 thermal cycles of c~260°CX30SeC were measured. The results are shown in the table. As is clear from the results in the table, the cured product of the epoxy-resin composition for semiconductor encapsulation of the example of the present invention has high heat resistance, a low coefficient of thermal expansion, and a low modulus of elasticity, and is also superior to the conventional example. It can be seen that it achieves a glass transition temperature as high as or higher than that, and has moisture resistance due to the epoxy resin component, and can be suitably used for semiconductor encapsulation.
以上説明したとおり、この発明は、
−数式
で示される変性シリコーンオイルの内の少なくとも一種
とエポキシ樹脂を反応させて得られる可撓化剤、エポキ
シ樹脂および硬化剤を含有するものを用いることにより
、耐熱性、耐湿性を有し、かつ低弾性率、低熱膨張率、
従来と同程度又はそれ以上の高ガラス転移温度の硬化物
の得られる半導体封止用エポキシt’d k組成物を得
ることができる。As explained above, the present invention provides: - By using a material containing a flexibilizing agent obtained by reacting an epoxy resin with at least one of the modified silicone oils represented by the formula, an epoxy resin, and a curing agent, Has heat resistance, moisture resistance, low elastic modulus, low coefficient of thermal expansion,
It is possible to obtain an epoxy t'dk composition for semiconductor encapsulation, which can produce a cured product with a glass transition temperature as high as or higher than conventional epoxy t'dk compositions.
Claims (1)
2_1、R_2_2、R_2_3、R_2_4、R_2
_5、R_2_6、R_2_7は炭素数1〜5のアルキ
ル基、炭素数1〜5のヒドロキシアルキル基、炭素数1
〜5のアルコキシ基、フェニル基および炭素数1〜5の
フッ素置換アルキル基の内の一種、aは10〜300の
整数、bは0〜10の数、0≦b/(a+b)≦0.3
2である。) で示される変性シリコーンオイルの内の少なくとも一種
とエポキシ樹脂を反応させて得られる可撓可剤、エポキ
シ樹脂および硬化剤を含有する半導体封止用エポキシ樹
脂組成物。[Claims] General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (1) (In the formula, R_1, R_3, R_4 are divalent organic groups, R_
2_1, R_2_2, R_2_3, R_2_4, R_2
_5, R_2_6, R_2_7 are alkyl groups having 1 to 5 carbon atoms, hydroxyalkyl groups having 1 to 5 carbon atoms, and 1 carbon number.
~5 alkoxy groups, phenyl groups, and fluorine-substituted alkyl groups having 1 to 5 carbon atoms, a is an integer of 10 to 300, b is a number of 0 to 10, 0≦b/(a+b)≦0. 3
It is 2. ) An epoxy resin composition for semiconductor encapsulation containing a flexible agent, an epoxy resin, and a curing agent obtained by reacting at least one of the modified silicone oils shown in the following formula with an epoxy resin.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63115269A JPH0228213A (en) | 1988-04-05 | 1988-05-11 | Epoxy resin composition for semiconductor sealing |
KR1019890004486A KR930001988B1 (en) | 1988-04-05 | 1989-04-04 | Epoxy resin composition for semiconductor sealing |
US07/333,043 US5157061A (en) | 1988-04-05 | 1989-04-04 | Epoxy resin containing an epoxy resin-modified silicone oil flexibilizer |
US07/889,965 US5306747A (en) | 1988-04-05 | 1992-05-29 | Flexibilizers of hydroxyphenyl silicone oil-epoxy resin product and epoxy silicone oil-phenol resin product |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8451188 | 1988-04-05 | ||
JP63-84511 | 1988-04-05 | ||
JP63115269A JPH0228213A (en) | 1988-04-05 | 1988-05-11 | Epoxy resin composition for semiconductor sealing |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0228213A true JPH0228213A (en) | 1990-01-30 |
Family
ID=26425539
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63115269A Pending JPH0228213A (en) | 1988-04-05 | 1988-05-11 | Epoxy resin composition for semiconductor sealing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0228213A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02155915A (en) * | 1988-12-08 | 1990-06-15 | Sumitomo Bakelite Co Ltd | Epoxy resin composition |
JPH02250887A (en) * | 1989-03-24 | 1990-10-08 | Chisso Corp | Siloxane compound having hydroxyl group-containing substituent group and production thereof |
JPH0362844A (en) * | 1989-02-27 | 1991-03-18 | Shin Etsu Chem Co Ltd | Epoxy resin composition for sealing semiconductor and semiconductor device |
JPH0493363A (en) * | 1990-08-10 | 1992-03-26 | Shin Etsu Chem Co Ltd | Synthetic resin composition |
US5114994A (en) * | 1990-03-23 | 1992-05-19 | Mitsubishi Denki Kabushiki Kaisha | Epoxy resin composition for sealing semiconductor |
JP2006306953A (en) * | 2005-04-27 | 2006-11-09 | Dow Corning Toray Co Ltd | Curable silicone composition and its cured product |
-
1988
- 1988-05-11 JP JP63115269A patent/JPH0228213A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02155915A (en) * | 1988-12-08 | 1990-06-15 | Sumitomo Bakelite Co Ltd | Epoxy resin composition |
JPH0362844A (en) * | 1989-02-27 | 1991-03-18 | Shin Etsu Chem Co Ltd | Epoxy resin composition for sealing semiconductor and semiconductor device |
JPH02250887A (en) * | 1989-03-24 | 1990-10-08 | Chisso Corp | Siloxane compound having hydroxyl group-containing substituent group and production thereof |
US5114994A (en) * | 1990-03-23 | 1992-05-19 | Mitsubishi Denki Kabushiki Kaisha | Epoxy resin composition for sealing semiconductor |
BE1006505A5 (en) * | 1990-03-23 | 1994-09-13 | Mitsubishi Electric Corp | Epoxy composition for sealing semiconductor devices. |
JPH0493363A (en) * | 1990-08-10 | 1992-03-26 | Shin Etsu Chem Co Ltd | Synthetic resin composition |
JP2006306953A (en) * | 2005-04-27 | 2006-11-09 | Dow Corning Toray Co Ltd | Curable silicone composition and its cured product |
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