JPH0227726U - - Google Patents
Info
- Publication number
- JPH0227726U JPH0227726U JP10570288U JP10570288U JPH0227726U JP H0227726 U JPH0227726 U JP H0227726U JP 10570288 U JP10570288 U JP 10570288U JP 10570288 U JP10570288 U JP 10570288U JP H0227726 U JPH0227726 U JP H0227726U
- Authority
- JP
- Japan
- Prior art keywords
- generation chamber
- plasma generation
- plasma
- coil
- member located
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002826 coolant Substances 0.000 claims description 2
- 239000003302 ferromagnetic material Substances 0.000 claims 1
- 230000005291 magnetic effect Effects 0.000 claims 1
- 239000000696 magnetic material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案のプラズマ処理装置の要部縦断
面図、第２図は第４図に示すケース及び電磁コイ
ルの縦断面図、第３図はヨークの斜視図、第４図
は第５図に示すケース及び電磁コイル部分とこれ
らの外周に挿設したヨーク部分の縦断面図、第５
図は従来のプラズマ処理装置を示す概略構成図で
ある。
３……プラズマ生成室、４……冷却用媒体、５
……ケース、５ａ，５ｂ……ケース部材、６……
電磁コイル。
Fig. 1 is a longitudinal cross-sectional view of the main parts of the plasma processing apparatus of the present invention, Fig. 2 is a longitudinal cross-sectional view of the case and electromagnetic coil shown in Fig. 4, Fig. 3 is a perspective view of the yoke, and Fig. 4 is a longitudinal cross-sectional view of the case and electromagnetic coil shown in Fig. 4. Vertical cross-sectional view of the case and electromagnetic coil portion shown in the figure, and the yoke portion inserted on the outer periphery of these parts, No. 5
The figure is a schematic configuration diagram showing a conventional plasma processing apparatus. 3... Plasma generation chamber, 4... Cooling medium, 5
...Case, 5a, 5b...Case member, 6...
electromagnetic coil.
Claims (1)
より、プラズマを発生させるプラズマ生成室と、
前記プラズマ生成室内に磁場を形成させるために
その外周に配置され、かつ冷却用媒体を充填した
環状ケースに収納された電磁コイルとを備えたプ
ラズマ処理装置において、前記コイルの内側に位
置するケース部材が非磁性材料からなり、かつ前
記コイルの外側に位置するケース部材が強磁性材
料からなるプラズマ処理装置。 A plasma generation chamber that generates plasma by electron cyclotron resonance using microwaves,
A case member located inside the coil in a plasma processing apparatus comprising an electromagnetic coil arranged on the outer periphery of the plasma generation chamber to form a magnetic field in the plasma generation chamber and housed in an annular case filled with a cooling medium. is made of a non-magnetic material, and a case member located outside the coil is made of a ferromagnetic material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988105702U JPH0648832Y2 (en) | 1988-08-09 | 1988-08-09 | Plasma processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988105702U JPH0648832Y2 (en) | 1988-08-09 | 1988-08-09 | Plasma processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0227726U true JPH0227726U (en) | 1990-02-22 |
| JPH0648832Y2 JPH0648832Y2 (en) | 1994-12-12 |
Family
ID=31338555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988105702U Expired - Lifetime JPH0648832Y2 (en) | 1988-08-09 | 1988-08-09 | Plasma processing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0648832Y2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6267822A (en) * | 1985-09-20 | 1987-03-27 | Hitachi Ltd | Plasma processor |
| JPS62197847U (en) * | 1986-06-06 | 1987-12-16 |
-
1988
- 1988-08-09 JP JP1988105702U patent/JPH0648832Y2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6267822A (en) * | 1985-09-20 | 1987-03-27 | Hitachi Ltd | Plasma processor |
| JPS62197847U (en) * | 1986-06-06 | 1987-12-16 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0648832Y2 (en) | 1994-12-12 |