JPH0227346B2 - - Google Patents
Info
- Publication number
- JPH0227346B2 JPH0227346B2 JP56041069A JP4106981A JPH0227346B2 JP H0227346 B2 JPH0227346 B2 JP H0227346B2 JP 56041069 A JP56041069 A JP 56041069A JP 4106981 A JP4106981 A JP 4106981A JP H0227346 B2 JPH0227346 B2 JP H0227346B2
- Authority
- JP
- Japan
- Prior art keywords
- general formula
- phenyl
- group
- lower alkyl
- alkyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 150000001540 azides Chemical class 0.000 claims description 10
- 239000003795 chemical substances by application Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 230000002140 halogenating effect Effects 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 6
- 150000003536 tetrazoles Chemical class 0.000 claims description 6
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical class ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 125000001424 substituent group Chemical group 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 150000002596 lactones Chemical class 0.000 claims description 3
- -1 α-phenethyl Chemical group 0.000 description 39
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 14
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 238000001816 cooling Methods 0.000 description 11
- 239000007788 liquid Substances 0.000 description 11
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- PXIPVTKHYLBLMZ-UHFFFAOYSA-N Sodium azide Chemical compound [Na+].[N-]=[N+]=[N-] PXIPVTKHYLBLMZ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 6
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- YDPLDMLRERBXAV-UHFFFAOYSA-N aluminum;triazide Chemical compound [Al+3].[N-]=[N+]=[N-].[N-]=[N+]=[N-].[N-]=[N+]=[N-] YDPLDMLRERBXAV-UHFFFAOYSA-N 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000005530 alkylenedioxy group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- JUINSXZKUKVTMD-UHFFFAOYSA-N hydrogen azide Chemical compound N=[N+]=[N-] JUINSXZKUKVTMD-UHFFFAOYSA-N 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- GAXBVDIQHTZHGF-UHFFFAOYSA-N 1-benzyl-5-(chloromethyl)tetrazole Chemical compound ClCC1=NN=NN1CC1=CC=CC=C1 GAXBVDIQHTZHGF-UHFFFAOYSA-N 0.000 description 1
- UUXHICUVBOTXQS-UHFFFAOYSA-N 2-hydroxybutanamide Chemical compound CCC(O)C(N)=O UUXHICUVBOTXQS-UHFFFAOYSA-N 0.000 description 1
- 125000006179 2-methyl benzyl group Chemical group [H]C1=C([H])C(=C(C([H])=C1[H])C([H])([H])*)C([H])([H])[H] 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- 125000005809 3,4,5-trimethoxyphenyl group Chemical group [H]C1=C(OC([H])([H])[H])C(OC([H])([H])[H])=C(OC([H])([H])[H])C([H])=C1* 0.000 description 1
- 125000003762 3,4-dimethoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C(OC([H])([H])[H])C([H])=C1* 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- 125000004860 4-ethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004217 4-methoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1OC([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- LKYWEFFEMVUUGA-UHFFFAOYSA-N 5-(3-chloropropyl)-1-ethyltetrazole Chemical compound CCN1N=NN=C1CCCCl LKYWEFFEMVUUGA-UHFFFAOYSA-N 0.000 description 1
- INTQSGGUSUSCTJ-UHFFFAOYSA-N 5-(4-chlorobutyl)-1-cyclohexyltetrazole Chemical compound ClCCCCC1=NN=NN1C1CCCCC1 INTQSGGUSUSCTJ-UHFFFAOYSA-N 0.000 description 1
- FULJUACZUJFKJL-UHFFFAOYSA-N 5-(chloromethyl)-1-(4-ethylphenyl)tetrazole Chemical compound C1=CC(CC)=CC=C1N1C(CCl)=NN=N1 FULJUACZUJFKJL-UHFFFAOYSA-N 0.000 description 1
- UYOWQFWKDDJSLV-UHFFFAOYSA-N 5-hydroxypentanamide Chemical compound NC(=O)CCCCO UYOWQFWKDDJSLV-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- PHSPJQZRQAJPPF-UHFFFAOYSA-N N-alpha-Methylhistamine Chemical compound CNCCC1=CN=CN1 PHSPJQZRQAJPPF-UHFFFAOYSA-N 0.000 description 1
- 229940099471 Phosphodiesterase inhibitor Drugs 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 229940121363 anti-inflammatory agent Drugs 0.000 description 1
- 239000002260 anti-inflammatory agent Substances 0.000 description 1
- 239000000924 antiasthmatic agent Substances 0.000 description 1
- 239000003146 anticoagulant agent Substances 0.000 description 1
- 229940030600 antihypertensive agent Drugs 0.000 description 1
- 239000002220 antihypertensive agent Substances 0.000 description 1
- 229960004676 antithrombotic agent Drugs 0.000 description 1
- 239000003699 antiulcer agent Substances 0.000 description 1
- UUXFWHMUNNXFHD-UHFFFAOYSA-N barium azide Chemical compound [Ba+2].[N-]=[N+]=[N-].[N-]=[N+]=[N-] UUXFWHMUNNXFHD-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- UETLMBWMVIQIGU-UHFFFAOYSA-N calcium azide Chemical compound [Ca+2].[N-]=[N+]=[N-].[N-]=[N+]=[N-] UETLMBWMVIQIGU-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 230000002490 cerebral effect Effects 0.000 description 1
- 239000012320 chlorinating reagent Substances 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000004850 cyclobutylmethyl group Chemical group C1(CCC1)C* 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000006623 cyclooctylmethyl group Chemical group 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000004851 cyclopentylmethyl group Chemical group C1(CCCC1)C* 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000004186 cyclopropylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- GUWHRJQTTVADPB-UHFFFAOYSA-N lithium azide Chemical compound [Li+].[N-]=[N+]=[N-] GUWHRJQTTVADPB-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- OTMXCBMQBZIPSQ-UHFFFAOYSA-N n-benzyl-4-hydroxybutanamide Chemical compound OCCCC(=O)NCC1=CC=CC=C1 OTMXCBMQBZIPSQ-UHFFFAOYSA-N 0.000 description 1
- WZWYDTYFTHILJH-UHFFFAOYSA-N n-cyclohexyl-5-hydroxypentanamide Chemical compound OCCCCC(=O)NC1CCCCC1 WZWYDTYFTHILJH-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 239000002571 phosphodiesterase inhibitor Substances 0.000 description 1
- UXCDUFKZSUBXGM-UHFFFAOYSA-N phosphoric tribromide Chemical compound BrP(Br)(Br)=O UXCDUFKZSUBXGM-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- TZLVRPLSVNESQC-UHFFFAOYSA-N potassium azide Chemical compound [K+].[N-]=[N+]=[N-] TZLVRPLSVNESQC-UHFFFAOYSA-N 0.000 description 1
- 238000012746 preparative thin layer chromatography Methods 0.000 description 1
- XTUSEBKMEQERQV-UHFFFAOYSA-N propan-2-ol;hydrate Chemical compound O.CC(C)O XTUSEBKMEQERQV-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- PDEROVFZLWBVSG-UHFFFAOYSA-N strontium;diazide Chemical compound [Sr+2].[N-]=[N+]=[N-].[N-]=[N+]=[N-] PDEROVFZLWBVSG-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- HFRXJVQOXRXOPP-UHFFFAOYSA-N thionyl bromide Chemical compound BrS(Br)=O HFRXJVQOXRXOPP-UHFFFAOYSA-N 0.000 description 1
Description
【発明の詳細な説明】
本発明はテトラゾール誘導体、さらに詳しくは
一般式
〔式中R′は低級アルキル基、シクロアルキル基、
シクロアルキル低級アルキル基、フエニル基また
はフエニル低級アルキル基を示し、該フエニル基
およびフエニル低級アルキル基のフエニル環は置
換基を有してもよい。Aは低級アルキレン基をX
はハロゲン原子を示す〕
で表わされるテトラゾール誘導体の新規な製造法
に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to tetrazole derivatives, more specifically, compounds of the general formula [In the formula, R' is a lower alkyl group, a cycloalkyl group,
It represents a cycloalkyl lower alkyl group, a phenyl group, or a phenyl lower alkyl group, and the phenyl ring of the phenyl group and phenyl lower alkyl group may have a substituent. A is a lower alkylene group
represents a halogen atom] This invention relates to a novel method for producing a tetrazole derivative represented by:
本発明によつて得られる上記一般式(1)の化合物
は、抗血栓症剤、脳循環改善剤、消炎剤、抗潰瘍
剤、降圧剤、抗喘息剤、さらにホスホジエステラ
ーゼ阻害剤などとして有用なテトラゾリルアルコ
キシカルボスチリル誘導体の合成中間体として有
用である(西ドイツ公開P2934747−5を参照)。 The compound of general formula (1) obtained by the present invention is useful as an antithrombotic agent, a cerebral circulation improving agent, an anti-inflammatory agent, an anti-ulcer agent, an antihypertensive agent, an anti-asthmatic agent, and a phosphodiesterase inhibitor. It is useful as an intermediate for the synthesis of zolylalkoxycarbostyryl derivatives (see West German Publication P2934747-5).
本発明の目的は、上記一般式(1)の化合物を多大
の労力および時間を必要とすることなく、高純
度、好収率で、しかも非常に安価な出発原料より
製造し得る新規、かつ工業的に有利な方法を提供
することにある。 The object of the present invention is to provide a novel and industrial method for producing the compound of general formula (1) with high purity, good yield, and from very inexpensive starting materials without requiring much labor or time. The objective is to provide an advantageous method.
すなわち本発明は、一般式
[式中、Aは前記に同じ]で表されるラクトン誘
導体を一般式:
R′NH2 (4)
[式中、R′は前記に同じ]で表わされるアミン
と反応させて一般式
HO−A−CONHR′ (2)
〔式中R′およびAは前記に同じ〕
で表わされるヒドロキシアミド誘導体を得、該ヒ
ドロキシアミド誘導体をハロゲン化剤と反応さ
せ、次いでアジ化水素酸またはその金属アジ化物
と反応させることを特徴とする上記一般式(1)のテ
トラゾール誘導体の製造法を提供するものであ
る。 That is, the present invention is based on the general formula A lactone derivative represented by the formula [wherein A is the same as above] is reacted with an amine represented by the general formula: R'NH 2 (4) [wherein R' is the same as above] to form the general formula HO- A-CONHR' (2) [In the formula, R' and A are the same as above] A hydroxyamide derivative represented by the following is obtained, the hydroxyamide derivative is reacted with a halogenating agent, and then hydrazoic acid or its metal azide is reacted with a halogenating agent. The present invention provides a method for producing the tetrazole derivative of the above general formula (1), which is characterized by reacting the tetrazole derivative with the general formula (1).
本明細書において、低級アルキル基としては直
鎖または分技状のアルキル基を含み、例えば、メ
チル、エチル、プロピル、イソプロピル、ブチ
ル、イソブチル、tert−ブチルなどが挙げられ
る。フエニル低級アルキル基としては、例えば、
ベンジル、α−フエネチル、β−フエネチル、3
−フエニルプロピル、4−フエニルブチル、1,
1−ジメチル−2−フエニルエチル、ジフエニル
メチル基などが挙げられる。シクロアルキル基と
しては、例えばシクロプロピル、シクロブチル、
シクロペンチル、シクロヘキシル、シクロヘプチ
ル、シクロオクチルなどが挙げられる。 In the present specification, the lower alkyl group includes a linear or branched alkyl group, such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, and the like. Examples of the phenyl lower alkyl group include:
Benzyl, α-phenethyl, β-phenethyl, 3
-phenylpropyl, 4-phenylbutyl, 1,
Examples include 1-dimethyl-2-phenylethyl and diphenylmethyl groups. Examples of the cycloalkyl group include cyclopropyl, cyclobutyl,
Examples include cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl.
シクロアルキル基低級アルキル基としては、例
えば、シクロプロピルメチル、シクロブチルメチ
ル、シクロペンチルメチル、シクロヘキシルメチ
ル、シクロオクチルメチル、2−シクロヘキシル
エチル、2−シクロオクチルエチル、1−メチル
−2−シクロヘキシルエチル、3−シクロヘプチ
ルプロピル、4−シクロヘキシルブチル、1,1
−ジメチル−2−シクロヘキシルエチル、ジシク
ロヘキシルメチル基などが挙げられる。低級アル
キレン基としては直鎖もしくは分技状のアルキレ
ン基を挙げることができ、例えばメチレン、エチ
レン、トリメチレン、プロピレン、テトラメチレ
ン、2−エチルエチレン、ペンタメチレン、ヘキ
サメチレン、2−メチルトリメチレン、2,2−
ジメチルトリメチレン、1−メチルトリメチレン
基など、好ましくは炭素数3〜6個の低級アルキ
レン基を例示できる。 Examples of cycloalkyl lower alkyl groups include cyclopropylmethyl, cyclobutylmethyl, cyclopentylmethyl, cyclohexylmethyl, cyclooctylmethyl, 2-cyclohexylethyl, 2-cyclooctylethyl, 1-methyl-2-cyclohexylethyl, 3 -cycloheptylpropyl, 4-cyclohexylbutyl, 1,1
-dimethyl-2-cyclohexylethyl, dicyclohexylmethyl group, and the like. Examples of the lower alkylene group include linear or branched alkylene groups, such as methylene, ethylene, trimethylene, propylene, tetramethylene, 2-ethylethylene, pentamethylene, hexamethylene, 2-methyltrimethylene, ,2-
Preferred examples include lower alkylene groups having 3 to 6 carbon atoms, such as dimethyltrimethylene and 1-methyltrimethylene groups.
上記のフエニル低級アルキル基およびフエニル
基のフエニル環は適当な置換基を有していてもよ
く、置換基としては、例えばメトキシ、エトキ
シ、プロポキシ、イソプロポキシ、ブトキシ、
tert−ブトキシなどの低級アルコキシ基、メチ
ル、エチル、プロピル、イソプロピル、ブチル、
イソブチル、tert−ブチルなどの低級アルキル
基、塩素原子、フツ素原子、臭素原子などのハロ
ゲン原子、ジメチルアミノ、ジエチルアミノ、ジ
プロピルアミノ、ジブチルアミノ、メチルエチル
アミノ基などのジ低級アルキルアミノ基、ニトロ
基、メチレンジオキシ、エチレンジオキシ、トリ
メチレンジオキシ基などの低級アルキレンジオキ
シ基などの低級アルキレンジオキシ基などを挙げ
ることができる。該置換基を有するものとして
は、例えば4−クロルフエニル、3,5−ジクロ
ルフエニル、2−ブロムフエニル、4−メトキシ
フエニル、3,4−ジメトキシフエニル、2−ニ
トロフエニル、3,4,5−トリメトキシフエニ
ル、2−メチルフエニル、4−エチルフエニル、
3,4−ジメチルフエニル、3,4−メチレンジ
オキシフエニル、2−クロル−4−ニトロフエニ
ル、4−ジメチルアミノフエニル基などの置換フ
エニル基、4−クロルベンジル、3,5−ジクロ
ベンジル、β−2−ブロムフエネチル、4−メト
キシベンジル、β−3,4−ジメトキシフエネチ
ル、2−ニトロベンジル、β−3,4,5−トリ
メトキシフエネチル、2−メチルベンジル、α−
4−エチルフエネチル、β−3,4−ジメチルフ
エネチル、β−3,4−メチレンジオキシフエネ
チル、2−クロル−4−ニトロベンジル、β−4
−ジメチルアミノフエネチル基などの置換フエニ
ル低級アルキル基を挙げることとができる。ま
た、ハロゲン原子としては、沃素、臭素、塩素、
弗素原子を挙げることができる。 The phenyl ring of the above phenyl lower alkyl group and phenyl group may have a suitable substituent, and examples of the substituent include methoxy, ethoxy, propoxy, isopropoxy, butoxy,
Lower alkoxy groups such as tert-butoxy, methyl, ethyl, propyl, isopropyl, butyl,
Lower alkyl groups such as isobutyl and tert-butyl, halogen atoms such as chlorine, fluorine and bromine, di-lower alkylamino groups such as dimethylamino, diethylamino, dipropylamino, dibutylamino and methylethylamino groups, nitro and lower alkylenedioxy groups such as lower alkylenedioxy groups such as methylenedioxy, ethylenedioxy, and trimethylenedioxy groups. Examples of those having the substituent include 4-chlorophenyl, 3,5-dichlorophenyl, 2-bromphenyl, 4-methoxyphenyl, 3,4-dimethoxyphenyl, 2-nitrophenyl, 3,4,5-trimethoxy phenyl, 2-methylphenyl, 4-ethylphenyl,
Substituted phenyl groups such as 3,4-dimethylphenyl, 3,4-methylenedioxyphenyl, 2-chloro-4-nitrophenyl, 4-dimethylaminophenyl group, 4-chlorobenzyl, 3,5-diclobenzyl , β-2-bromphenethyl, 4-methoxybenzyl, β-3,4-dimethoxyphenethyl, 2-nitrobenzyl, β-3,4,5-trimethoxyphenethyl, 2-methylbenzyl, α-
4-ethylphenethyl, β-3,4-dimethylphenethyl, β-3,4-methylenedioxyphenethyl, 2-chloro-4-nitrobenzyl, β-4
Mention may be made of substituted phenyl lower alkyl groups such as the -dimethylaminophenethyl group. In addition, halogen atoms include iodine, bromine, chlorine,
Mention may be made of the fluorine atom.
本発明においては、まず一般式(3)で表わされる
安価なラクトン類を一般式(4)で表わされるアミノ
誘導体と反応させて一般式(2)で表わされるヒドロ
キアミド誘導体を製造する。 In the present invention, first, an inexpensive lactone represented by the general formula (3) is reacted with an amino derivative represented by the general formula (4) to produce a hydroxyamide derivative represented by the general formula (2).
〔式中、R′およびAは前記に同じ〕
一般式(3)の化合物と一般式(4)の化合物との反応
は、無溶媒または適当な溶媒中で行なわれ、該溶
媒としては例えばメタノール、エタノールなどの
低級アルコール類、n−ヘキサン、n−ヘプタン
などの炭化水素類、ベンゼン、トルエン、キシレ
ンぜどの芳香族炭化水素類、テトラヒドロフラ
ン、ジオキサンなどのエーテル類などの反応に不
活性な溶媒を挙げることができる。該反応は無触
媒または、必要に応じて、適当なアルカリ触媒の
存在下に行なわれ、該アルカリ触媒としては、例
えば水酸化リチウム、水酸化ナトリウム、水酸化
カリウムなどのアリカリ金属水酸化物、リチウム
アルコラート、ナトリウムアルコラート、カリウ
ムアルコラートなどのアルコラート類、トリメチ
ルアミン、トリエチルアミン、ジメチルアニリ
ン、ピリジン、ピコリンなどの有機塩基などを挙
げることとができる。一般式(4)の化合物の使用量
は、一般式(3)の化合物に対して、通常、過剰量、
好ましくは等モル〜10倍モル量程度である。反応
温度は室温から300℃、好ましくは80〜150℃程度
までの広範囲な温度条件を彩用でき、反応時間
も、1時間から2日程度の範囲から選ばれる。 [In the formula, R' and A are the same as above] The reaction between the compound of general formula (3) and the compound of general formula (4) is carried out without a solvent or in a suitable solvent, such as methanol. , lower alcohols such as ethanol, hydrocarbons such as n-hexane and n-heptane, aromatic hydrocarbons such as benzene, toluene and xylene, and ethers such as tetrahydrofuran and dioxane. can be mentioned. The reaction is carried out without a catalyst or, if necessary, in the presence of a suitable alkali catalyst. Examples of the alkali catalyst include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; Examples include alcoholates such as alcoholate, sodium alcoholate, and potassium alcoholate, and organic bases such as trimethylamine, triethylamine, dimethylaniline, pyridine, and picoline. The amount of the compound of general formula (4) to be used is usually an excess amount,
Preferably, the amount is about equimolar to 10 times the molar amount. The reaction temperature can be varied over a wide range from room temperature to 300°C, preferably about 80 to 150°C, and the reaction time can be selected from a range of about 1 hour to about 2 days.
本発明方法は、前記の如しくして得られる一般
式(2)の化合物をハロゲン化剤と反応させ、次いで
アジ化水素酸またはその金属アジ化物と反応させ
ることにより容易に実施され、目的とする一般式
(1)の化合物を高純度、好収率で得ることができ
る。 The method of the present invention can be easily carried out by reacting the compound of general formula (2) obtained as described above with a halogenating agent, and then reacting with hydrazoic acid or its metal azide, and achieves the objective. general formula to
Compound (1) can be obtained with high purity and good yield.
本発明の一般式(2)の化合物とハロゲン化剤との
反応は、無溶媒または適当な溶媒中で行なわれ、
該溶媒としては反応に悪影響を与えない不活性の
ものをすべて使用でき、例えばベンゼン、トルエ
ン、キシレンなどの芳香族炭化水素類、クロルベ
ンゼン、ブロモベンゼンなどのハロゲン化芳香族
炭化水素類、ジエチルエーテル、テトラヒドロフ
ラン、ジオキシサンなどのエーテル類、塩化メチ
レン、クロロホルム、1,2−ジクロルエタンな
どのハロゲン化炭化水素類などを挙げることがで
きる。ハロゲン化剤としては、例えば、五塩化リ
ン、オキシ塩化リン、三塩化リン、塩化チオニル
などの塩素化剤、オキシ臭化リン、三臭化リン、
臭化チオニルなどの臭素化剤など、好ましくは、
オキシ塩化リン、五塩化リン、塩化チオニルなど
が挙げられる。ハロゲン化剤の使用量は、通常、
一般式(2)の化合物に対して等モル〜50倍モル、好
ましくは等モル〜2倍量程度である。反応温度
は、通常−20〜100℃、好ましくは0〜40℃程度
であり、また反応時間は30分〜6時間程度であ
る。 The reaction between the compound of general formula (2) of the present invention and the halogenating agent is carried out without a solvent or in a suitable solvent,
As the solvent, any inert solvent that does not adversely affect the reaction can be used, such as aromatic hydrocarbons such as benzene, toluene, and xylene, halogenated aromatic hydrocarbons such as chlorobenzene and bromobenzene, and diethyl ether. , ethers such as tetrahydrofuran and dioxysan, and halogenated hydrocarbons such as methylene chloride, chloroform, and 1,2-dichloroethane. Examples of the halogenating agent include chlorinating agents such as phosphorus pentachloride, phosphorus oxychloride, phosphorus trichloride, and thionyl chloride, phosphorus oxybromide, phosphorus tribromide,
A brominating agent such as thionyl bromide, preferably
Examples include phosphorus oxychloride, phosphorus pentachloride, and thionyl chloride. The amount of halogenating agent used is usually
The amount is about 1 to 50 times the amount of the compound of general formula (2), preferably about 1 to 2 times the amount of the compound of general formula (2). The reaction temperature is usually -20 to 100°C, preferably about 0 to 40°C, and the reaction time is about 30 minutes to 6 hours.
上記の反応溶液は、そのまま、アジ化水素酸ま
たは金属アジ化物との反応に供される。アジ化水
素酸またはその金属アジ化物はそのまま用いても
よく、あるいは、前記一般式(2)の化合物ととハロ
ゲン化剤との反応に用いられる不活性溶媒の溶液
として使用される。金属アジ化物としては、例え
ばアジ化リチウム、アジ化ナリウム、アジ化カリ
ウムなどの第族金属アジ化物、アジ化カルシウ
ム、アジ化バリウム、アジ化ストロンチウムなど
の第族金属アジ化物、アジ化アルミニウムなど
の第族金属アジ化物などが挙げられる。好まし
い化合物はアジ化水素酸、アジ化ナトリウム、ア
ジ化アルミニウムである。アジ化水素酸またはそ
の金属アジ化物の使用量は、通常、出発原料の一
般式(2)の化合物に対して等モル〜5倍モル、好ま
しくは等モル〜3倍モル量程度である。反応温度
は0〜150℃好ましくは0〜100℃程度であり、反
応時間は3時間〜2日間程度である。 The above reaction solution is directly subjected to a reaction with hydrazidic acid or a metal azide. Hydroazidic acid or its metal azide may be used as it is, or as a solution in an inert solvent used in the reaction of the compound of general formula (2) with a halogenating agent. Examples of metal azides include group metal azides such as lithium azide, sodium azide, and potassium azide; group metal azides such as calcium azide, barium azide, and strontium azide; and aluminum azide. Examples include group metal azides. Preferred compounds are hydrazidic acid, sodium azide, and aluminum azide. The amount of hydrazidic acid or its metal azide to be used is usually about 1 to 5 times the mole, preferably about 1 to 3 times the mole of the compound of general formula (2) as the starting material. The reaction temperature is about 0 to 150°C, preferably about 0 to 100°C, and the reaction time is about 3 hours to 2 days.
上記の方法で生成する一般式(1)で表わされるテ
トラゾール誘導体は、慣用の単離手段、例えは
過、再結晶、カラムクロマトグラフイ、プレパラ
テイブ薄層クロマトグラフイ、蒸留などにより反
応混合物から容易に単離精製される。 The tetrazole derivative represented by the general formula (1) produced by the above method can be easily isolated from the reaction mixture by conventional isolation means such as filtration, recrystallization, column chromatography, preparative thin layer chromatography, distillation, etc. It is isolated and purified.
以下に実施例を挙げて本発明の方法をさらに具
体的に説明する。 The method of the present invention will be explained in more detail with reference to Examples below.
実施例 1
(1) δ−バレロラクトン1Kgとシクロヘキシルア
ミン1.05Kgを混和し、110〜120℃にて4時間加
熱する。反応液を30〜40℃に冷却し、酢酸エチ
ル4を加え、氷冷し、析出晶を取する。得
られた粗結晶を酢酸エチルより再結晶して無色
針状晶のN−シクロヘキシル−5−ヒドロキシ
吉草酸アミド1.63Kgを得る。Example 1 (1) 1 kg of δ-valerolactone and 1.05 kg of cyclohexylamine are mixed and heated at 110 to 120°C for 4 hours. The reaction solution was cooled to 30-40°C, ethyl acetate 4 was added thereto, cooled on ice, and the precipitated crystals were collected. The obtained crude crystals were recrystallized from ethyl acetate to obtain 1.63 kg of N-cyclohexyl-5-hydroxyvaleric acid amide in the form of colorless needles.
融点76〜78.5℃
(2) クロロホルム500mlにN−シクロヘキシル−
5−ヒドロキシ吉草酸アミド50gを溶解し、五
塩化リン100gを3分割投入する。冷却下に1
時間、次いで30℃にて3時間撹拌する。氷冷下
にアジ化ナトリウム40gを投入し、冷却下1時
間、20〜30℃にて3時間撹拌後、さらに2時間
加熱還流する。反応液を冷却し、2N水酸化ナ
トリウム水溶液700ml中に、氷と共に注ぐ。ク
ロロホルム層を2N水酸化ナトリウム水溶液、
水、2%塩酸、次いで水で洗浄後、硫酸マグネ
シウムで乾燥する。濃縮後、残渣にイソプロピ
ルエーテル500mlおよび活性炭2.5gを加えて、
2時間加熱還流後、不溶物を去する。液を
濃縮し、残渣にn−ヘキサンを加えて結晶化
し、取する。n−ヘキサンで洗浄、乾燥後、
イソプロパノール−水より再結晶して無色針状
晶の1−シクロヘキシル−5−(4−クロロブ
チル)テトラゾール54gを得る。融点84.5〜
86.5℃
実施例 2
塩化メチレン500mlにN−シクロヘキシル−4
−ヒドロキシ酪酸アミド50gを溶解し、オキシ塩
化リン170gを冷却撹拌下に滴下する。滴下後、
冷却下に1時間、30℃にて3時間撹拌する。氷冷
下にアジ化水素酸の1N塩化メチレン溶液500mlを
滴下し、冷却下1時間、20〜30℃にて3時間撹拌
後、さらに4時間加熱還流する。反応液を前記実
施例1−(2)と同様に処理し、イソプロパノール−
水より再結晶して無色針状晶の1−シクロヘキシ
ル−5−(3−クロロプロピル)テラゾール55.6
gを得る。 Melting point 76-78.5℃ (2) N-cyclohexyl in 500ml of chloroform
Dissolve 50 g of 5-hydroxyvaleramide, and add 100 g of phosphorus pentachloride in three portions. 1 under cooling
and then stirred at 30° C. for 3 hours. 40 g of sodium azide was added under ice cooling, and the mixture was stirred for 1 hour under cooling, at 20 to 30°C for 3 hours, and then heated under reflux for another 2 hours. Cool the reaction solution and pour into 700 ml of 2N aqueous sodium hydroxide solution with ice. Add 2N sodium hydroxide solution to the chloroform layer,
After washing with water, 2% hydrochloric acid, and then water, drying with magnesium sulfate. After concentration, add 500 ml of isopropyl ether and 2.5 g of activated carbon to the residue.
After heating under reflux for 2 hours, insoluble materials were removed. Concentrate the liquid, add n-hexane to the residue to crystallize it, and collect. After washing with n-hexane and drying,
Recrystallization from isopropanol-water gives 54 g of 1-cyclohexyl-5-(4-chlorobutyl)tetrazole in the form of colorless needles. Melting point 84.5~
86.5℃ Example 2 N-cyclohexyl-4 in 500ml of methylene chloride
- 50 g of hydroxybutyric acid amide is dissolved and 170 g of phosphorus oxychloride is added dropwise with cooling and stirring. After dripping,
Stir for 1 hour under cooling and 3 hours at 30°C. 500 ml of a 1N methylene chloride solution of hydroazidic acid was added dropwise under ice cooling, and the mixture was stirred for 1 hour under cooling and at 20 to 30°C for 3 hours, and then heated under reflux for an additional 4 hours. The reaction solution was treated in the same manner as in Example 1-(2) above, and isopropanol-
1-Cyclohexyl-5-(3-chloropropyl)terazol 55.6 recrystallized from water to give colorless needle-like crystals
get g.
融点82〜85℃
実施例 3
ベンゼン500mlのN−ベンジル−4−ヒドロキ
シ酪酸アミド50gを溶解し、塩化チオニル135g
を冷却撹拌下に滴下する。冷却下に1時間、30℃
にて3時間撹拌後、再び冷却下にアジ化アルミニ
ウム96gを投入する。冷却下に1時間、30℃で3
時間撹拌後、さらに3時間加熱還流する。反応液
を冷却し、2N水酸化ナトリウム水溶液700ml中
に、氷と共に注ぐ。ベンゼン層を2N水酸化ナト
リウム水溶液、水、2%塩酸、次いで水で洗浄
後、硫酸マグネシウムで乾燥する。濃縮後、残渣
を減圧蒸留して、沸点171〜175℃(1.5mmHg)の
淡黄色オイル状の1−ベンジル−5−(3−クロ
ロプロピル)テトラゾール54gを得る。 Melting point: 82-85℃ Example 3 Dissolve 50g of N-benzyl-4-hydroxybutyric acid amide in 500ml of benzene, and dissolve 135g of thionyl chloride.
is added dropwise while stirring while cooling. 1 hour under cooling at 30℃
After stirring for 3 hours, 96 g of aluminum azide was added while cooling again. 3 at 30°C for 1 hour under cooling.
After stirring for an hour, the mixture is further heated under reflux for 3 hours. Cool the reaction solution and pour into 700 ml of 2N aqueous sodium hydroxide solution with ice. The benzene layer is washed with a 2N aqueous sodium hydroxide solution, water, 2% hydrochloric acid, and then water, and then dried over magnesium sulfate. After concentration, the residue is distilled under reduced pressure to obtain 54 g of 1-benzyl-5-(3-chloropropyl)tetrazole in the form of a pale yellow oil with a boiling point of 171-175°C (1.5 mmHg).
実施例 4 実施例1と同様にして、下記の化合物を得る。Example 4 In the same manner as in Example 1, the following compound is obtained.
1−エチル−5−(3−クロロプロピル)テト
ラゾール、無色液体、沸点160〜163℃/20mmHg
1−フエニル−5−(3−クロロプロピル)テ
トラゾール、無色液体、沸点205〜210℃/9.0mm
Hg
1−イソプロピル−5−(3−クロロプロピル)
テトラゾール、無色液体、NMRδCDCl3 ppn1.55(d、
6H)、2.30(m、2H)、2.95(t、2H)、3.65(d、
2H)、4.7(m、1H)
1−シクロペンチル−5−(3−クロロプロピ
ル)テトラゾール、無色液体、NMRδCDCl3 ppn1.5〜
2.7(m、10H)、3.1(t、2H)、3.7(t、2H)、4.6
〜5.0(m、1H)
1−シクロヘキシルメチル−5−(3−クロロ
プロピル)テトラゾール、無色液体、NMRδCDCl3 ppn
0.3〜2.7(m、13H)、3.0(t、2H)、3.75(t、
2H)、4.5(d、2H)
1−シクロオクチル−5−(3−クロロプロピ
ル)テトラゾール、無色液体、NMRδCDCl3 ppn1.35〜
2.65(m、16H)、3.0(t、2H)、3.67(t、2H)、
4.2〜4.7(m、1H)
1−ベンジル−5−クロロメチルテトラゾー
ル、無色液体、NMRδCDCl3 ppn4.67(s、2H)、5.35
(s、2H)、7.1〜7.6(m、5H)
1−(2−クロロ−4−ニトロフエニル)−5−
クロロメチルテトラゾール、黄色液体、
NMRδCDCl3 ppn4.8(s、2H)、7.76(d、1H)、8.25〜
8.60(m、2H)、
1−(4−エチルフエニル)−5−クロロメチル
テトラゾール、無色液体、NMRδCDCl3 ppn1.3(t、
3H)、2.75(q、2H)、4.8(s、2H)7.43(s、
4H)
1−(β−3.4−ジメトキシフエネチル)−5−
(3−クロロプロピル)テトラゾール、黄色液体、
NMRδCDCl3 ppn1.80〜2.25(m、2H)、2.45(t、2H)
、
3.70(s、3H)、3.75(s、3H)、4.40(t、2H)、
6.30(d、1H)、6.45(dd、1H)、6.70(d、1H)。 1-Ethyl-5-(3-chloropropyl)tetrazole, colorless liquid, boiling point 160-163℃/20mmHg 1-phenyl-5-(3-chloropropyl)tetrazole, colorless liquid, boiling point 205-210℃/9.0mm
Hg 1-isopropyl-5-(3-chloropropyl)
Tetrazole, colorless liquid, NMRδ CDCl3 ppn 1.55 (d,
6H), 2.30 (m, 2H), 2.95 (t, 2H), 3.65 (d,
2H), 4.7 (m, 1H) 1-cyclopentyl-5-(3-chloropropyl)tetrazole, colorless liquid, NMRδ CDCl3 ppn 1.5~
2.7 (m, 10H), 3.1 (t, 2H), 3.7 (t, 2H), 4.6
~5.0 (m, 1H) 1-cyclohexylmethyl-5-(3-chloropropyl)tetrazole, colorless liquid, NMRδ CDCl3 ppn
0.3-2.7 (m, 13H), 3.0 (t, 2H), 3.75 (t,
2H), 4.5(d, 2H) 1-cyclooctyl-5-(3-chloropropyl)tetrazole, colorless liquid, NMRδ CDCl3 ppn 1.35~
2.65 (m, 16H), 3.0 (t, 2H), 3.67 (t, 2H),
4.2-4.7 (m, 1H) 1-benzyl-5-chloromethyltetrazole, colorless liquid, NMRδ CDCl3 ppn 4.67 (s, 2H), 5.35
(s, 2H), 7.1-7.6 (m, 5H) 1-(2-chloro-4-nitrophenyl)-5-
Chloromethyltetrazole, yellow liquid,
NMRδ CDCl3 ppn 4.8 (s, 2H), 7.76 (d, 1H), 8.25~
8.60 (m, 2H), 1-(4-ethylphenyl)-5-chloromethyltetrazole, colorless liquid, NMRδ CDCl3 ppn 1.3 (t,
3H), 2.75 (q, 2H), 4.8 (s, 2H) 7.43 (s,
4H) 1-(β-3.4-dimethoxyphenethyl)-5-
(3-chloropropyl)tetrazole, yellow liquid,
NMRδ CDCl3 ppn 1.80-2.25 (m, 2H), 2.45 (t, 2H)
,
3.70 (s, 3H), 3.75 (s, 3H), 4.40 (t, 2H),
6.30 (d, 1H), 6.45 (dd, 1H), 6.70 (d, 1H).
Claims (1)
るラクトン誘導体を一般式:R′NH2[式中、R′は
低級アルキル基、シクロアルキル基、シクロアル
キル低級アルキル基、フエニル基またはフエニル
低級アルキル基を示し、該フエニル基およびフエ
ニル低級アルキル基のフエニル環は置換基を有し
ていてもよい]で表わされるアミン誘導体と反応
させて一般式 HO−A−CONHR′ [式中、R′およびAは前記に同じ]で表わされ
るヒドロキアミド誘導体を得、該ヒドロキシアミ
ド誘導体をハロゲン化剤と反応させ、次いでアジ
化水素酸または金属アジ化物と反応させることを
特徴とする一般式 [式中R′およびAは前記に同じ。Xはハロゲン
原子を示す]で表わされるテトラゾール誘導体の
製造法。[Claims] 1. General formula [Wherein, A represents a lower alkylene group] A lactone derivative represented by the general formula: R'NH 2 [wherein, R' is a lower alkyl group, a cycloalkyl group, a cycloalkyl lower alkyl group, a phenyl group, or a phenyl lower alkyl group, the phenyl group and the phenyl ring of the phenyl lower alkyl group may have a substituent] to form the general formula HO-A-CONHR' [wherein, A general formula characterized by obtaining a hydroxyamide derivative represented by [R' and A are the same as above], reacting the hydroxyamide derivative with a halogenating agent, and then reacting with hydrazidic acid or a metal azide. [In the formula, R' and A are the same as above. A method for producing a tetrazole derivative represented by: X represents a halogen atom.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4106981A JPS57156469A (en) | 1981-03-19 | 1981-03-19 | Preparation of tetrazole derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4106981A JPS57156469A (en) | 1981-03-19 | 1981-03-19 | Preparation of tetrazole derivative |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57156469A JPS57156469A (en) | 1982-09-27 |
JPH0227346B2 true JPH0227346B2 (en) | 1990-06-15 |
Family
ID=12598148
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4106981A Granted JPS57156469A (en) | 1981-03-19 | 1981-03-19 | Preparation of tetrazole derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57156469A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100935893B1 (en) | 2007-09-11 | 2010-01-07 | 국방과학연구소 | Process for production of 1,1'-dimethyl-5,5'-bitetrazole |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5535019A (en) * | 1978-09-01 | 1980-03-11 | Otsuka Pharmaceut Co Ltd | Carbostyryl derivative |
-
1981
- 1981-03-19 JP JP4106981A patent/JPS57156469A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5535019A (en) * | 1978-09-01 | 1980-03-11 | Otsuka Pharmaceut Co Ltd | Carbostyryl derivative |
Also Published As
Publication number | Publication date |
---|---|
JPS57156469A (en) | 1982-09-27 |
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