JPH0224545A - Method for fluorescence x-ray analysis - Google Patents

Method for fluorescence x-ray analysis

Info

Publication number
JPH0224545A
JPH0224545A JP17351288A JP17351288A JPH0224545A JP H0224545 A JPH0224545 A JP H0224545A JP 17351288 A JP17351288 A JP 17351288A JP 17351288 A JP17351288 A JP 17351288A JP H0224545 A JPH0224545 A JP H0224545A
Authority
JP
Japan
Prior art keywords
sample
thin film
internal standard
ray
fluorescence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17351288A
Other languages
Japanese (ja)
Inventor
Toshio Koide
小出 年男
Moriaki Kojima
小島 盛昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Priority to JP17351288A priority Critical patent/JPH0224545A/en
Publication of JPH0224545A publication Critical patent/JPH0224545A/en
Pending legal-status Critical Current

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  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To enable selection of an arbitrary element as an internal standard element by a method wherein a thin film containing an element to be used as an internal standard is provided on the measuring surface of a sample. CONSTITUTION:A number of samples 1 are set on a rotatable sample holder 2 and subjected to X-ray irradiation from an X-ray tube 3 at a prescribed position, and a fluorescence X-ray generated by this irradiation is detected by a detector 4. The sample 1 is formed in the shape of a column and the surface thereof is smoothed to be a measuring surface. On this measuring surface, a thin film 5 containing an element to be used as an internal standard is provided. In order to measure the content of an element to be inspected in the sample 1, first the thin film 5 is provided on the sample 1 and the fluorescence X-ray generated from the sample 1 is detected. Then the intensity of the fluorescence X-ray in the thin film 5 and the intensity of the fluorescence X-ray in the element to be inspected in the sample 1 are measured. By determining the ratio in the intensity between these X-rays therefore, the content of the element to be inspected can be quantified.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、塊状、板状試料の他、粉砕試料、切削試料、
線材試料、粉末試料等に含有される元素の定量を行う蛍
光X線分析方法に関するものである。
[Detailed Description of the Invention] <Industrial Application Field> The present invention is applicable to not only lumpy and plate-like samples, but also crushed samples, cut samples,
The present invention relates to a fluorescent X-ray analysis method for quantifying elements contained in wire samples, powder samples, etc.

〈従来の技術〉 蛍光X線分析方法による定量方法では、例えば元素含有
量既知の標準試料を用いて、その含有量と蛍光X線強度
との関係を求めて検量線(感度曲線)を作成し、これと
未知試料の蛍光X線強度を比較して、未知試料中の元素
含有量を求めることができる。
<Prior art> In a quantitative method using fluorescent X-ray analysis, for example, a standard sample with known element content is used to determine the relationship between the content and fluorescent X-ray intensity to create a calibration curve (sensitivity curve). By comparing this with the fluorescent X-ray intensity of the unknown sample, the element content in the unknown sample can be determined.

この場合、蛍光X線分析装置の電源の変動、装置各部の
特性変化等により測定値に変化が生じることがあるので
、内標準法(内部標準法)等の補償方式を用いて測定精
度を高めている。
In this case, changes may occur in the measured values due to fluctuations in the power supply of the fluorescent X-ray analyzer, changes in the characteristics of each part of the equipment, etc., so compensation methods such as the internal standard method (internal standard method) are used to improve measurement accuracy. ing.

〈発明が解決しようとする課題〉 ところが、この内標準法にあっては、試料内に含まれる
適当な標準元素、あるいは試料中に混入した既知量の標
準元素のX線強度と被検元素のX線強度の比から定量を
行うものであるため、■試料中に適当な標準元素を選ぶ
ことが困難であったり、■試料中への標準元素の混入操
作が煩雑あったり、■あるいは試料中に標準元素を均一
に分散させることが困難であったりする場合がある。
<Problem to be solved by the invention> However, in this internal standard method, the X-ray intensity of an appropriate standard element contained in the sample or a known amount of the standard element mixed in the sample and the test element are Since quantitative determination is based on the ratio of X-ray intensities, it may be difficult to select an appropriate standard element for the sample, or it may be complicated to mix the standard element into the sample. In some cases, it may be difficult to uniformly disperse standard elements.

本発明者等は、このような従来の問題点を解決するため
、鋭意検討した結果、従来から用いられている試料の表
面研磨や圧搾等の操作により、試料の測定面を平滑にし
た後、この測定面上に内標準とする元素を含む薄膜を設
置して、試料中の被検元素を内標準法により、精度良く
定量できることを見出し、本発明を完成するに至った。
In order to solve these conventional problems, the inventors of the present invention have conducted intensive studies and found that after smoothing the measurement surface of the sample by conventional operations such as surface polishing and squeezing of the sample, By placing a thin film containing an element to be used as an internal standard on this measurement surface, the inventors discovered that the element to be tested in the sample could be quantified with high accuracy by the internal standard method, and the present invention was completed.

く課題を解決するための手段及びその作用〉か−る本発
明の特徴とする点は、より具体的に示すと、試料の測定
表面上に、内標準とする元素を含む薄膜を設置し、X線
の照射による薄膜中の内標準元素と試料中の被検元素の
蛍光X線強度比を求めることにより、試料中の含有元素
を定量する蛍光X線分析方法にある。
Means for Solving the Problems and Their Effects> To be more specific, the characteristics of the present invention are as follows: A thin film containing an element to be used as an internal standard is placed on the measurement surface of the sample; The present invention is a fluorescent X-ray analysis method for quantifying elements contained in a sample by determining the fluorescent X-ray intensity ratio of an internal standard element in a thin film and a test element in a sample by irradiating X-rays.

つまり、本発明によると、試料の全体に標準元素を混合
することなく、試料の表面上に予め形成しである薄膜を
設置するのみで、被検元素の含有量を精度良く測定する
できる。
That is, according to the present invention, the content of the test element can be measured with high accuracy by simply placing a pre-formed thin film on the surface of the sample without mixing the standard element throughout the sample.

〈実施例〉 第1図は本発明方法を実施するための蛍光X線分析装置
系(波長分散型、エネルギー分散型のいずれも可)の−
例を示したものである。
<Example> Figure 1 shows a fluorescent X-ray analyzer system (either wavelength dispersive type or energy dispersive type) for carrying out the method of the present invention.
This is an example.

この装置系では、多数の試料1・・・が回転自在の試料
ホルダー2上に載置され、所定の位置で、X線管3から
のX線照射を受け、この照射により生じた蛍光X線が検
出器4により検知されるようになっている。ここで、波
長分散型の蛍光X線分析装置系では、検出器4は分光結
晶とスリットを組み合わせたXvA分光器からなり、エ
ネルギー分散型の蛍光X線分析装置系では、検出器4は
半導体検出器からなる。
In this device system, a large number of samples 1... are placed on a rotatable sample holder 2, and at a predetermined position are exposed to X-rays from an X-ray tube 3, and fluorescent X-rays are generated by this irradiation. is detected by the detector 4. Here, in a wavelength-dispersive X-ray fluorescence analyzer system, the detector 4 consists of an XvA spectrometer that combines a spectroscopic crystal and a slit, and in an energy-dispersive X-ray fluorescence analyzer system, the detector 4 consists of a semiconductor detector. Consists of vessels.

上記試料1は、その種類にもよるが、固体試料の場合、
例えば第2図の如く円柱状(なお、粉砕、粉末試料等で
は固めて行う)に成形し、その表面を研磨や圧搾操作等
により平滑にして測定面とする。そして、この測定面上
に内標準とする元素を含む薄膜5を設置する。
Depending on the type of sample 1, if it is a solid sample,
For example, as shown in FIG. 2, it is formed into a cylindrical shape (in the case of pulverized or powdered samples, it is solidified), and its surface is smoothed by polishing, squeezing, etc., and used as a measurement surface. Then, a thin film 5 containing an element to be used as an internal standard is placed on this measurement surface.

この薄膜5は、例えば、第3図に示したようにポリプロ
ピレンやポリエチレン等の樹脂からなるフィルム6上に
、蒸着法やスパッタ法等により内標準とする元素7(こ
の内標準元素7を含む化合物も可、以下同じ)を積層さ
せて形成するか、あるいは樹脂中に混入させて形成する
。また、この薄膜5の他の形成方法としては、第4図(
A) (B)に示したように内標準とする元素を含有す
る薄い金属板8に多数の小孔9・・・やスリット10.
For example, as shown in FIG. 3, this thin film 5 is coated with an internal standard element 7 (a compound containing the internal standard element 7) on a film 6 made of a resin such as polypropylene or polyethylene by vapor deposition or sputtering. (The same applies hereafter) or by mixing them into a resin. Further, as another method for forming the thin film 5, there is shown in FIG.
A) As shown in (B), a large number of small holes 9 . . . and slits 10 .
.

・を設けたものとして形成するか、あるいはこの金属板
8上にやはり蒸着法やスパッタ法等により内標準とする
元素を積層させて形成するとよい。
. . , or by layering an element to be used as an internal standard on this metal plate 8 by vapor deposition, sputtering, or the like.

ここで、内標準とする元素としては、試料1中に含有さ
れていないものを選定するようにする。
Here, an element that is not contained in sample 1 is selected as the internal standard element.

上記薄膜5において、フィルム6や金属板日の内標準元
素7の積層厚さや、内標準元素含有のフィルム6および
金属板8の厚さは、薄過ぎると、得られる内標準元素の
X線強度が小さくなり、逆に、厚過ぎると、照射したX
線が膜下(内側)の試料1部分に到達できなくなるため
、内標準元素の蛍光X線強度と試料1中の被検元素の蛍
光X線強度とが適正な値となるように選定する。また、
金属板8の小孔9・・・やスリット10・・・の大きさ
においても、得られる内標準元素の蛍光X線強度と試料
1中の被検元素の蛍光X線強度とが適正な値となるよう
に選ぶものとする。
In the thin film 5, if the layer thickness of the internal standard element 7 of the film 6 or the metal plate or the thickness of the internal standard element-containing film 6 and metal plate 8 are too thin, the X-ray intensity of the internal standard element obtained is becomes small, and conversely, if it is too thick, the irradiated X
Since the rays cannot reach the part of sample 1 under the membrane (inside), the fluorescent X-ray intensity of the internal standard element and the fluorescent X-ray intensity of the test element in sample 1 are selected to be appropriate values. Also,
The fluorescent X-ray intensity of the obtained internal standard element and the fluorescent X-ray intensity of the test element in the sample 1 are appropriate values even for the sizes of the small holes 9... and the slits 10... of the metal plate 8. shall be selected so that

このようにして得られた薄膜5としては、予め内標準元
素の異なるものや、内標準元素7の積層厚さ、ないしフ
ィルム、金属板厚さの異なるものを幾種類か用意してお
くとよい。
As for the thin films 5 obtained in this way, it is advisable to prepare in advance several types of thin films with different internal standard elements, different stacked thicknesses of the internal standard elements 7, or different thicknesses of films or metal plates. .

この薄膜5を用いて、試料1中の被検元素の含有量を測
定するには、先ず、薄膜5を試料1上に設置し、この状
態で、上記した蛍光X線分析装置系により、X線を照射
し、試料1から生じた蛍光X線を検知すれば、薄膜5中
の蛍光Xis強度と、試料1中の被検元素の蛍光X線強
度が測定されるため、これらの強度比を求めることによ
り、試料1中の被検元素の含有量を定量することができ
る。
To measure the content of the test element in the sample 1 using this thin film 5, first, the thin film 5 is placed on the sample 1, and in this state, an X-ray When the fluorescent X-rays generated from the sample 1 are detected, the fluorescent Xis intensity in the thin film 5 and the fluorescent X-ray intensity of the test element in the sample 1 are measured. By determining this, the content of the test element in the sample 1 can be quantified.

この測定時、試料1に対するX線の照射にあっては適宜
照射範囲(例えば、第4図(A) (B)の点線!で示
される範囲)を持たせ、特に、小孔9・・・やスリット
10・・・のある金属板製薄膜5の場合、方向性による
検出データのバラツキを防ぐため、好ましくは、試料1
を回転させて検出データの均一化を図るようにするとよ
い。
During this measurement, the sample 1 is irradiated with X-rays with an appropriate irradiation range (for example, the range shown by the dotted lines in FIGS. 4(A) and 4(B)!), and in particular, the small hole 9... In the case of a metal plate thin film 5 having slits 10, etc., it is preferable that the sample 1
It is preferable to rotate the detection data to make the detection data uniform.

なお、上記実施例では、試料1を円柱状としたが、本発
明ではこれに限定されず、試料1の形態に応じて、種々
の形状が可能で、最小限その測定面上に薄膜が設置でき
る形状であればよい。
In the above example, the sample 1 is cylindrical, but the present invention is not limited to this. Various shapes are possible depending on the shape of the sample 1, and at least a thin film is placed on the measurement surface. Any shape that can be used is fine.

〈発明の効果〉 以上のような説明から明らかなように本発明の蛍光X線
分析方法によれば、次のように優れた効果が得られる。
<Effects of the Invention> As is clear from the above explanation, according to the fluorescent X-ray analysis method of the present invention, the following excellent effects can be obtained.

■、内標準として、試料の測定面上に設置した薄膜中に
含まれる元素を用いるので、任意の元素を内標準元素に
選ぶことができる。このため、従来のように試料中の含
有元素に内標準として適当な元素が選択できない場合に
も、本発明では、内標準法の使用が可能となる。
(2) Since an element contained in a thin film placed on the measurement surface of the sample is used as the internal standard, any element can be selected as the internal standard element. Therefore, even when it is not possible to select an appropriate element as an internal standard for the elements contained in a sample as in the past, the present invention makes it possible to use the internal standard method.

■、内標準の実施にあたって、Y$備された試料の平滑
な測定面上に薄膜を設置するのみでよいため、操作が極
めて簡単である。従って、従来のように試料全体に標準
元素を混入する場合のような煩雑さから解放される。
(2) In carrying out internal standardization, it is only necessary to place a thin film on the smooth measurement surface of the prepared sample, so the operation is extremely simple. Therefore, the complexity of mixing standard elements into the entire sample as in the conventional method can be avoided.

■、また、薄膜の内標準元素は、蒸着法やスパッタ法等
により形成したり、あるいは薄膜のベースとなる樹脂フ
ィルムや金属板への混入により得られるため、成形、膜
厚の制御等が簡単であると同時に、標準元素の均一分散
が容易にでき、従来法に比べて、高精度の分析が達成で
きる。
■Also, since the internal standard element for the thin film can be formed by vapor deposition or sputtering, or mixed into the resin film or metal plate that is the base of the thin film, it is easy to mold and control the film thickness. At the same time, the standard elements can be easily dispersed uniformly, and higher-precision analysis can be achieved than with conventional methods.

■、また、内標準元素が異なる樹脂フィルムや金属板か
らなる薄膜の幾種類かを予め用意しておけば、広範な測
定範囲に対応することが可能となる。
(2) Furthermore, if several types of thin films made of resin films or metal plates containing different internal standard elements are prepared in advance, it becomes possible to cover a wide measurement range.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明方法を実施するための蛍光X線分析装置
系の一例を示した概略図、第2図は本発明で使用される
試料および薄膜の一例を示した斜視図、第3図は薄膜の
部分拡大断面図、第4図(A) (B)は他側の薄膜を
示した各平面図である。 図中、 1・・・・試料、 2・・・・試料ホルダー 3・・・・X線管、 4・・・・検出器、 5・・・・薄膜、 6・・・・フィルム、 7・・・・内標準とする元素、 8・・・・金属板、 9・・・・小孔、 10・ ・ ・スリット、 第1図
Fig. 1 is a schematic diagram showing an example of a fluorescent X-ray analyzer system for implementing the method of the present invention, Fig. 2 is a perspective view showing an example of a sample and thin film used in the present invention, and Fig. 3 4(A) and 4(B) are respective plan views showing the thin film on the other side. In the figure, 1... Sample, 2... Sample holder 3... X-ray tube, 4... Detector, 5... Thin film, 6... Film, 7... ...Element used as internal standard, 8..Metal plate, 9..Small hole, 10..Slit, Figure 1

Claims (1)

【特許請求の範囲】[Claims] 試料の測定表面上に、内標準とする元素を含む薄膜を設
置し、X線の照射による薄膜中の内標準元素と試料中の
被検元素の蛍光X線強度比を求めることにより、試料中
の含有元素を定量することを特徴とする蛍光X線分析方
法。
A thin film containing an element to be used as an internal standard is placed on the measurement surface of the sample, and the fluorescent X-ray intensity ratio of the internal standard element in the thin film and the test element in the sample is determined by irradiation with A fluorescent X-ray analysis method characterized by quantifying elements contained in.
JP17351288A 1988-07-12 1988-07-12 Method for fluorescence x-ray analysis Pending JPH0224545A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17351288A JPH0224545A (en) 1988-07-12 1988-07-12 Method for fluorescence x-ray analysis

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17351288A JPH0224545A (en) 1988-07-12 1988-07-12 Method for fluorescence x-ray analysis

Publications (1)

Publication Number Publication Date
JPH0224545A true JPH0224545A (en) 1990-01-26

Family

ID=15961901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17351288A Pending JPH0224545A (en) 1988-07-12 1988-07-12 Method for fluorescence x-ray analysis

Country Status (1)

Country Link
JP (1) JPH0224545A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1914541A1 (en) * 2006-10-17 2008-04-23 Oxford Instruments Analytical Oy Compensation for fluctuations in the radiation characteristics of the X-ray source in an XRF analyser
JP2008304405A (en) * 2007-06-11 2008-12-18 Rigaku Industrial Co Fluorescent x-ray analyzer and method for the same
JP2012159449A (en) * 2011-02-02 2012-08-23 Nippon Telegr & Teleph Corp <Ntt> Analysis method
CN103076352A (en) * 2012-12-28 2013-05-01 中国科学院高能物理研究所 Method for obtaining high-quality X-ray absorption spectrum of thin film sample
CN103575581A (en) * 2013-07-25 2014-02-12 葛洲坝集团水泥有限公司 Element detection standard sample preparation and application methods
CN104730098A (en) * 2015-04-03 2015-06-24 甘肃酒钢集团宏兴钢铁股份有限公司 Rapid analysis method of high-content harmful element in blast furnace iron material
JP2017020868A (en) * 2015-07-09 2017-01-26 富士通株式会社 Method, device, and measurement device
WO2017169247A1 (en) * 2016-03-30 2017-10-05 株式会社リガク X-ray fluorescence analyzer and x-ray fluorescence analysis method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1914541A1 (en) * 2006-10-17 2008-04-23 Oxford Instruments Analytical Oy Compensation for fluctuations in the radiation characteristics of the X-ray source in an XRF analyser
US7474730B2 (en) 2006-10-17 2009-01-06 Oxford Instruments Analytical Oy Compensation for fluctuations over time in the radiation characteristics of the X-ray source in an XRF analyser
JP2008304405A (en) * 2007-06-11 2008-12-18 Rigaku Industrial Co Fluorescent x-ray analyzer and method for the same
JP2012159449A (en) * 2011-02-02 2012-08-23 Nippon Telegr & Teleph Corp <Ntt> Analysis method
CN103076352A (en) * 2012-12-28 2013-05-01 中国科学院高能物理研究所 Method for obtaining high-quality X-ray absorption spectrum of thin film sample
CN103575581A (en) * 2013-07-25 2014-02-12 葛洲坝集团水泥有限公司 Element detection standard sample preparation and application methods
CN104730098A (en) * 2015-04-03 2015-06-24 甘肃酒钢集团宏兴钢铁股份有限公司 Rapid analysis method of high-content harmful element in blast furnace iron material
JP2017020868A (en) * 2015-07-09 2017-01-26 富士通株式会社 Method, device, and measurement device
WO2017169247A1 (en) * 2016-03-30 2017-10-05 株式会社リガク X-ray fluorescence analyzer and x-ray fluorescence analysis method

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