JPH02237769A - Feeding method for work liquid - Google Patents
Feeding method for work liquidInfo
- Publication number
- JPH02237769A JPH02237769A JP5644589A JP5644589A JPH02237769A JP H02237769 A JPH02237769 A JP H02237769A JP 5644589 A JP5644589 A JP 5644589A JP 5644589 A JP5644589 A JP 5644589A JP H02237769 A JPH02237769 A JP H02237769A
- Authority
- JP
- Japan
- Prior art keywords
- high frequency
- magnetic disk
- work liquid
- frequency vibration
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 11
- 239000007788 liquid Substances 0.000 title abstract description 15
- 238000003754 machining Methods 0.000 claims description 24
- 239000012530 fluid Substances 0.000 claims description 13
- 238000005498 polishing Methods 0.000 abstract description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 12
- 238000000576 coating method Methods 0.000 abstract description 10
- 239000011248 coating agent Substances 0.000 abstract description 9
- 239000002245 particle Substances 0.000 abstract description 4
- 239000010409 thin film Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 6
- 239000006061 abrasive grain Substances 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000011179 visual inspection Methods 0.000 description 2
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Landscapes
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、加工液を使用する加工に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to machining using machining fluid.
例えば、従来の磁気記録媒体の製造工程で、研削テープ
を用いる媒体表面の加工において、加工液投入はノズル
を用い媒体加工面に投入していた.関連技術としては、
特開昭57−64332号公報に記載されている。すな
わち、有機繊維からなる琢磨布にて多量の水を流しなが
ら媒体表面に圧接する表面仕上げ工程における洗浄方法
である。For example, in the conventional manufacturing process of magnetic recording media, when processing the surface of the medium using an abrasive tape, a nozzle is used to inject processing fluid onto the surface of the medium to be processed. Related technologies include:
It is described in Japanese Patent Application Laid-Open No. 57-64332. That is, this is a cleaning method in the surface finishing process in which a polishing cloth made of organic fibers is pressed against the surface of the medium while flowing a large amount of water.
〔発明が解決しようとする課題」
上記従来技術は、研削テープあるいは研削砥石などの加
工部材による被加工物表面の加工時における加工液の供
給方法の点について配慮がされておらず、ミクロン・サ
ブミクロンオ・−ダの加工残液の排出、目詰まり及び良
好なる仕トげ而形成に問題があった。[Problems to be Solved by the Invention] The above-mentioned conventional technology does not give consideration to the method of supplying machining fluid when machining the surface of a workpiece using a machining member such as a grinding tape or a grinding wheel, and it・There were problems in draining the processing residual liquid, clogging, and forming a good finish.
例えば、研削テープによる媒体表面の加工において、加
工時に発生した磁性粉体、樹脂、あるいは脱落した砥粒
などで占める加工残渣は、効率よく洗い流さないと凝集
により、加エキズであるスクラッチ発生の要因となる。For example, when processing the media surface with a grinding tape, the processing residue, which is made up of magnetic powder, resin, or dropped abrasive grains generated during processing, will aggregate if not washed away efficiently, causing scratches that are caused by scratches. Become.
本発明の目的は、被加工物表面の加工時の残渣排出を促
進させ、常に清浄な表面状態のもとて被加工物表面の加
工を行ない,スクラッチの発生しない高精度の仕上げ面
を提供することにある。The purpose of the present invention is to promote removal of residue during processing of the surface of a workpiece, to always perform processing on the surface of the workpiece under a clean surface condition, and to provide a highly accurate finished surface without scratches. There is a particular thing.
上記目的を達成するために,被加工物の加工面に供給す
る加工液に高周波振動を乗せたものである。In order to achieve the above objective, high-frequency vibrations are added to the machining fluid supplied to the machining surface of the workpiece.
被加工物の加工面に供給する加工液に高周波振動を乗せ
ることにより,加工時に発生する加工残渣に対して、そ
の振動による分離作用から残渣凝集を防ぐことができる
。中でも、研削テープによる媒体表面の加工において、
高圧水流、シャワーブラッシング等でも除去できなかっ
たサブミクロンオーダの残渣粒子も揺らすことにより効
率よく媒体表面から洗い流すことができる6従って、常
に清浄な表面状態のもとて被加工物表面の加工を行なう
ことができるため,スクラッチの発生しない高精度の仕
上げ面が得られる。By applying high-frequency vibrations to the machining fluid supplied to the machining surface of the workpiece, it is possible to prevent agglomeration of machining residues generated during machining due to the separation effect of the vibrations. Among these, when processing the media surface using abrasive tape,
Submicron-order residual particles that could not be removed by high-pressure water jets, shower brushing, etc. can be efficiently washed away from the medium surface by shaking. 6 Therefore, the surface of the workpiece can always be processed with a clean surface condition. As a result, a highly accurate finished surface without scratches can be obtained.
以下、本発明の第一の実施例を磁気ディスクの塗膜加工
を用い、第1図より第4図により説明する.
第二の実施例を薄膜磁気ディスクのテクスチャー加工を
用い、第5図より説明する.
第三の実施例として,薄膜磁気ヘッドの研磨を用い、第
6図より説明する。A first embodiment of the present invention will be explained below using FIGS. 1 to 4 using coating processing of a magnetic disk. The second embodiment will be explained using FIG. 5 using texture processing of a thin film magnetic disk. As a third embodiment, polishing of a thin film magnetic head will be described with reference to FIG.
第一の実施例゛
磁気ディスク1をディスク固定軸(図示は省略)に固定
し回転させる。この磁気ディスク1の塗膜面に研削テー
ブ2を押付け部材であるゴムローラ3により背面から押
当てる。この際に、研削テープ2を走行させ、磁気ディ
スク1の表面に加工液を供給する。加工液は純水あるい
は浦性向上剤・合成潤滑剤等の成分を有する水溶性研削
液のいずれかを用いる。それらの加工液に対し、高周波
振動子4を振動させ、高周波振動ノズル5により高周波
振動水流6として塗膜面に供給ずる。本実施例では,Q
,8MHz〜3 M Hzの高周波振動を加工液に与え
、高周波振動ノズル5の先端穴径はφIIllm〜φi
− O m ,磁気ディスク1の塗膜面との距離は5
ws− 1 0 ua,流量は0. 5 Q / oi
in− 3 Q / winとしている。First embodiment: A magnetic disk 1 is fixed to a disk fixing shaft (not shown) and rotated. A grinding tape 2 is pressed against the coated surface of the magnetic disk 1 from the back side using a rubber roller 3 which is a pressing member. At this time, the grinding tape 2 is run to supply machining fluid to the surface of the magnetic disk 1. The machining fluid used is either pure water or a water-soluble grinding fluid containing components such as a roughness improver and a synthetic lubricant. A high frequency vibrator 4 is vibrated with respect to these machining liquids, and a high frequency vibrating nozzle 5 supplies the machining liquid to the coating surface as a high frequency vibrating water stream 6. In this example, Q
, 8 MHz to 3 MHz high frequency vibration is applied to the machining fluid, and the tip hole diameter of the high frequency vibration nozzle 5 is φIIllm to φi.
- O m, the distance from the coating surface of the magnetic disk 1 is 5
ws- 10 ua, flow rate is 0. 5 Q/oi
In-3 Q/win.
また,高周波振動ノズル5の取付け位置としては、ゴム
ローラ3により背面から押付けられた研削テープ2と研
削テープ2とが接触する磁気ディスク1の塗膜面との境
界上に高周波振動水流を供給できる様にする。なお,磁
気ディスク1の塗膜面に対し、高周波振動水流の供給を
常時一定の箇所でなく全面にもれなく供給するため、高
周波振動ノズル5−1に取付けたアームを偏心カムの揺
動機構により半径方向に移動可能とさせる。The high-frequency vibrating nozzle 5 is installed in such a way that a high-frequency vibrating water stream can be supplied to the boundary between the grinding tape 2 pressed from the back side by the rubber roller 3 and the coated surface of the magnetic disk 1 where the grinding tape 2 contacts. Make it. In order to supply the high-frequency vibrating water stream to the coated surface of the magnetic disk 1 not at a constant location but all over the surface, the arm attached to the high-frequency vibrating nozzle 5-1 is moved around the radius by the swinging mechanism of the eccentric cam. be able to move in the direction.
次に、高周波振動水流ノズル5−1の塗膜面に対する設
定角度の調整により、塗膜表面の加工を行なうため走行
される研削テープ2の表面にも供給できる様にする。こ
の機構により、スクラッチの発生要因の1つである研削
テープ2の表面に付着した金属系の異物、あるいは塵埃
等の汚れを除去でき、清浄な研削テープ2の表面のもと
て加工を行なうことができる。Next, by adjusting the set angle of the high-frequency vibrating water nozzle 5-1 with respect to the coating surface, it is possible to supply the water to the surface of the abrasive tape 2 that is run to process the coating surface. With this mechanism, it is possible to remove metallic foreign matter or dirt such as dust that adheres to the surface of the grinding tape 2, which is one of the causes of scratches, and to perform processing with a clean surface of the grinding tape 2. I can do it.
さらに、高周波振動ノズル5−1.を研削テープ2に対
して、1780゜反対側にも取付ける。この高周波振動
ノズル5−2は加工時の残渣を効率よく洗い流し、常に
清浄な塗膜表面にして加工を行なえる様にしたものであ
る。Furthermore, high frequency vibration nozzle 5-1. Also attach it to the opposite side of the grinding tape 2 by 1780 degrees. This high-frequency vibrating nozzle 5-2 is designed to efficiently wash away residues from processing, so that the coating surface can always be kept clean during processing.
第3図及び第4図に本発明におけるスクラッチ及び微小
スクラッチの発生率を示す。なお,スクランチとは、目
視、エラーの許容限界を越える大きさのものであり、微
小スクラソチとはそれらの許容限弄を越えない小さなス
クラッチである。FIGS. 3 and 4 show the incidence of scratches and microscratches in the present invention. Note that a scratch is a scratch whose size exceeds the permissible limit for visual inspection, and a minute scratch is a small scratch that does not exceed the permissible limit for visual inspection.
媒体加工而に供給する加工液に高周波振動を乗せる本発
明により、スクラッチ及び微小スクラッチの低減により
高精度の仕上げ面形成が可能となった・
第二の実施例
被加工物,加工部材及び加工液を用いる加工装置で表面
精度が要求される第二の実施例として、薄膜磁気ディス
クのテクスチャー加工を用い第5図により説明する。The present invention, which applies high-frequency vibrations to the machining fluid supplied to the media machining machine, has made it possible to form highly accurate finished surfaces by reducing scratches and microscratches.Second Example Workpiece, workpiece, and machining fluid As a second example in which surface accuracy is required in a processing apparatus using the lithography method, texture processing of a thin film magnetic disk will be explained with reference to FIG.
磁気ヘッドとの吸着防止のため、Ni−P基板上に電磁
気特性を劣下させない程度に基板の円周方向に同心円状
の微細な面荒し加工を施し、微細な凹凸を形成するテク
スチャー加工は以下の概略構成による。In order to prevent adsorption with the magnetic head, the Ni-P substrate is subjected to fine surface roughening in concentric circles in the circumferential direction of the substrate to the extent that the electromagnetic characteristics are not degraded, and the texture processing to form fine irregularities is as follows. Based on the schematic configuration.
すなわち、基板7をディスク固定軸(図示は省略)に固
定し回転させる。研磨剤として、ダイヤモンド砥粒を有
する研磨液を高周波振動子4により振動させ、高周波振
動ノズル5により高周波振動水流6として研磨テープ8
に供給する。研磨液を吸収し、研磨剤が付着した研磨テ
ープ8を加圧ガイド9により加圧し基板7の表面に接触
させ、所定の送り速度で走行させ基板7の表面加工を行
なう機構である。なお、本実施例では,第一の実施例と
同様、0.8〜3 M I{zの高周波振動を研磨剤及
び研磨液に与える。That is, the substrate 7 is fixed to a disk fixing shaft (not shown) and rotated. As an abrasive, a polishing liquid having diamond abrasive grains is vibrated by a high-frequency vibrator 4, and a high-frequency vibrating nozzle 5 converts the polishing liquid into a high-frequency vibrating water stream 6 to a polishing tape 8.
supply to. This is a mechanism in which the polishing tape 8 that has absorbed the polishing liquid and has the polishing agent attached thereto is pressed by a pressure guide 9 to contact the surface of the substrate 7, and is run at a predetermined feed rate to process the surface of the substrate 7. Note that in this example, high frequency vibration of 0.8 to 3 M I{z is applied to the polishing slurry and polishing liquid, as in the first example.
磁気ディスクの塗膜加工と同様に、研磨剤及び研磨液に
高周波振動を乗せることにより、スクラッチの発生しな
い高精度の加工面形成が得られる。Similar to the coating process for magnetic disks, high-frequency vibrations are applied to the abrasive and polishing liquid to form a highly accurate machined surface that does not generate scratches.
第三の実施例
第三の実施例として、磁気ディスク装置用薄膜ヘッドの
研磨方法を用い、図6より説明する。Third Embodiment As a third embodiment, a method of polishing a thin film head for a magnetic disk drive will be described with reference to FIG.
薄膜磁気ヘッドの研磨は、複数の薄膜磁気ヘッドを搭載
したスライダーブロック10を治具1−1に取付け、該
ブロック10の浮上而と所定の形状を有する研磨用定盤
12とを、ダイヤモンドやその他の砥粒及び油剤等の加
工液をノズルにより供給しながら相対運動させることに
より,上記浮上面を所定のギャップ深さ・t法に加工す
る方法である。ここで、第一及び第二の実施例と同様に
、ダイヤモンドやその他の砥粒及び油剤等の加工液に0
.8・〜3 M HZの高周波振動を乗せることにより
、スクラッチの発生しない高精度の加工面形成が得られ
る。To polish a thin-film magnetic head, a slider block 10 carrying a plurality of thin-film magnetic heads is attached to a jig 1-1, and the floating body of the block 10 and a polishing surface plate 12 having a predetermined shape are connected with a diamond or other polishing plate. This is a method of machining the above-mentioned floating surface to a predetermined gap depth/t method by causing relative movement while supplying abrasive grains and machining liquid such as oil through a nozzle. Here, as in the first and second embodiments, diamond or other abrasive grains and machining liquid such as oil
.. By applying high-frequency vibrations of 8 to 3 MHz, highly accurate processed surface formation without scratches can be obtained.
本発明によれば、被加工物表面を加工する際に発生する
残渣の凝集を防ぎ、残渣粒子を効率よく洗い流すことが
できるのでスクラッチの発生しない高精度の仕上げ面を
形成できる。According to the present invention, it is possible to prevent the agglomeration of residue generated when processing the surface of a workpiece and to efficiently wash away the residue particles, so that a highly accurate finished surface without scratches can be formed.
第1図は本発明の一実旅例による塗膜加工装置の概略説
明図、第2図は高周波振動水流ノズルの詳細説明図、第
3図及び第4図はスクラッチ及び微小スクラノチの発生
率を示す説明図、第5図は薄膜磁気ディスクのテクスチ
ャー加工の概略説明図、第6図は薄膜磁気ヘッドの研磨
の概略説明図である。
1 ・磁気ディスク、2・・・研削テープ、3・・ゴム
ローラ、4・・・高周波振動、5 (5−1.5−2)
・・・高周波振動ノズル、6・・高周波振動水流、7・
・・基板、8・・・研磨テープ、9・・・加圧ガイド、
10・・・スライダブロック、】1,・・・治具、12
・・・研磨用定盤。
躬3図
躬4工
ブコセス
プot人
アαtス
アロ乞人Fig. 1 is a schematic explanatory diagram of a coating film processing device according to an example of the present invention, Fig. 2 is a detailed explanatory diagram of a high-frequency vibrating water jet nozzle, and Figs. 3 and 4 show the incidence of scratches and minute scratches. FIG. 5 is a schematic illustration of texturing of a thin film magnetic disk, and FIG. 6 is a schematic illustration of polishing of a thin film magnetic head. 1. Magnetic disk, 2.. Grinding tape, 3.. Rubber roller, 4.. High frequency vibration, 5. (5-1.5-2)
...High frequency vibration nozzle, 6..High frequency vibration water flow, 7.
... Substrate, 8... Polishing tape, 9... Pressure guide,
10...Slider block, ]1,...Jig, 12
... Polishing surface plate. 3rd figure 4th grader
Claims (1)
などの加工部材により、被加工物表面の加工を行なう加
工装置において、被加工物の表面に供給する加工液に高
周波の振動を乗せることを特徴とする加工液供給方法。1. In the processing process of a workpiece, in a processing device that processes the surface of the workpiece using a processing member such as a grinding tape or a grinding wheel, high-frequency vibrations are applied to the machining fluid supplied to the surface of the workpiece. Characteristic machining fluid supply method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5644589A JPH02237769A (en) | 1989-03-10 | 1989-03-10 | Feeding method for work liquid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5644589A JPH02237769A (en) | 1989-03-10 | 1989-03-10 | Feeding method for work liquid |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02237769A true JPH02237769A (en) | 1990-09-20 |
Family
ID=13027289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5644589A Pending JPH02237769A (en) | 1989-03-10 | 1989-03-10 | Feeding method for work liquid |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02237769A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018075683A (en) * | 2016-11-10 | 2018-05-17 | 株式会社サンシン | Tape polishing device |
-
1989
- 1989-03-10 JP JP5644589A patent/JPH02237769A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018075683A (en) * | 2016-11-10 | 2018-05-17 | 株式会社サンシン | Tape polishing device |
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