JPH02237592A - Mosaic embroidery data preparing device - Google Patents

Abstract

PURPOSE:To prepare miss-free data by housing pattern line disposing data in memory addresses related to a diverging point to select sewing lines with reference to the condition of disposing data and register and form them on embroidery data. CONSTITUTION:A CPU 1 puts original pictures made by an image scanner 2 in an original picture data memory 4 and develop them on a mosaic plane converted to X, Y coordinates to make diverging points P1-P6 of the terminal points of pattern lines so that the pattern lines L1-L6 existing between the diverging points are adapted to correspond to first and second sewing lines the presence of which is stored in a memory address associated with the diverging points as disposition points through a FDD3. Next, a disposition data memory 5 is rewritten in association with the registration to embroidery data, and the sewing line is selected in association with the disposition data in the diverging point to register the embroidery data on a memory 6. Thus, even in complexed patterns, data can be prepared without any labor and mistakes.

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an embroidery data creation device that automatically creates embroidery data regarding the movement of a piece of cloth in a computerized embroidery machine based on an original mosaic image.

(Prior Art) When creating mosaic embroidery data such as cross stitch, conventionally the data was created by inputting the coordinates of the needle drop point using a digitizer or the like according to the sewing order.

(Problem to be solved by the invention) By the way, in the method using the above-mentioned digitizer,
J! In the case of complicated figures, it takes a long time to create data, and it is difficult to create data accurately without mistakes.

SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, it is an object of the present invention to provide an embroidery data creation device that determines the sewing order of each raphe line constituting a pattern through calculations by a CPU, and performs embroidery faithful to the original mosaic drawing. It is in.

(Means and Effects for Solving the Problems) The mosaic embroidery data creation device of the present invention is capable of computer embroidery in which embroidery is performed by moving a piece of cloth to various positions on a plane in synchronization with the vertical movement of the needle bar of a sewing machine. In the data creation device used in the machine to create embroidery data,
Embroidery data is created by embroidering on the lines of a mosaic line drawing, which is formed by a pattern line whose at least one end is in contact with another pattern line, and the end point of the pattern line is used as a branching point. Correlate the first and second raphe lines to one pattern line existing between the points, and determine the existence of those raphe lines,
Nothing is stored as placement data in a memory address related to the above-mentioned branch point, and related to the registration in the embroidery data described below. The present invention is characterized by having an embroidery data registration means for selecting a line and registering it in the embroidery data.

(Embodiment) As shown in FIG. 1, an embroidery data creation device according to an embodiment of the present invention includes a CPU 1 having a data creation program and a control section, an image scanner 2 for importing original image data, and an original image scanner 2 for capturing original image data. A floppy disk drive FDD3 that can record data and embroidery data, an original image data storage section 4 for importing the original image data, an arrangement data storage section 5 that stores the presence or absence of the first and second raphe lines, and an embroidery It is composed of an embroidery data storage section 6 that stores data. Further, the CPU 1 is connected to a sewing machine 10, a sewing machine drive motor 8, and an XY machine for a piece of cloth which is operated in synchronization with the sewing machine 10, which constitute a computerized embroidery sewing machine.
It is also possible to control the drive device 9 to perform embroidery based on the embroidery data.

First, the concept of the data creation method of this embodiment will be explained. First, convert the original picture into a mosaic, and then turn on each section of the mosaic that you want to embroider on the mosaic.
, and other mosaic units as FF mosaic units. Then, pattern lines made up of predetermined pattern lines are applied to each ON mosaic unit to create a mosaic line drawing. Then, in this embodiment, the first and second raphes, which are straight lines, are made to correspond to the pattern lines. When generating embroidery data, at the branch point where the pattern line branches, arrangement data indicating the presence or absence of a raphe line for each pattern line is searched in each branch direction, and the double line state flag E and single line state flag, which will be described later, are searched. Embroidery data, which is array data of relative coordinates of needle drop points, is created by selecting those that meet the discrimination conditions by F and sequentially tracing the raphe line.

For example, to explain using the example of Figures 3 and 5, if the raphe lines Al and Bl to be embroidered are made to correspond to the pattern line L1 applied to the ON mosaic unit, which will be described later, as shown in Figure 5 (
1). Then, the pattern lines Ll and L2 in FIG.
The raphe lines Al, Bl, A2, in FIG. 5 (2) correspond to
Consider the case of creating data for printing B2. The existence of A1 to B2 is registered as the above-mentioned raphe arrangement data. Assuming that the starting point is P1, first, at the branch point P1, a branch state, which will be described later, is checked, and the upper right raphe line A1 is selected and registered in the embroidery data. Then, the raphe line A1 is deleted from the arrangement data. Next, the search point moves to P2, the branching state at that point is checked, the lower right raphe A2 is selected, it is registered in the embroidery data, and the raphe A2 is deleted from the arrangement data. In this way, registration and deletion are repeated in sequence until all raphe lines of the arrangement data are deleted.

Next, details of data creation processed by the CPU 1 of this embodiment will be explained according to the main program flow shown in FIG. First, by creating a mosaic line drawing in step S1, the CPU 1 imports the original image into the original image data storage section 4 via the image scanner 2. Then, mosaic line drawing processing is performed. As a specific example, first, as shown in FIG. , the section to be pierced is set as an ON mosaic unit, the section not to be embroidered is set as an OFF mosaic unit, and the above-mentioned ON mosaic unit is set as
As shown in FIG. 3, it is developed on a mosaic plane converted into xy coordinates where X=x/u and Y=y/u. Then, a pattern line is applied to each ON mosaic unit, and the pattern line is the point between the points where X and Y are even numbers and the points where X and Y are odd numbers, respectively, in the XY coordinates shown in Figure 4. The slope line of the section (dashed line in the figure) is applied. Further, each of the above points is a vertex of a mosaic unit, and also serves as a branching point of a pattern line, which will be described later. Numbers 1 to L6 in FIG. 3 are applied pattern lines, and P1 to P6 are branch points for each pattern line.

The above is the mosaic line drawing process, and data that will be followed by embroidery will be created. Note that at least one of the pattern lines is a branch point with another pattern line. In other words, in order to create a series of embroidery data, the pattern lines must be continuous, but if the pattern lines are cut very close together, adding pattern lines to make them continuous will create a series of embroidery data. You can create things. For example, if raphe lines L2 and L4 in Fig. 3 do not exist, stitch fiL3 is in a disconnected state, but by setting raphe line L2 to "present", the pattern line is made continuous. be able to.

Subsequently, the process moves to arrangement data registration in step S2 of FIG. 6 of the main program. A first raphe line A and a second raphe line B having the same locus are made to correspond to each pattern line in the above mosaic diagram. That is, one pattern line is formed by two raphes A and B, and the presence or absence of the above A and BwA is stored as placement data in the placement data storage unit 5 at a memory address related to the branch point of the pattern line. do. Here, in this embodiment, the arrangement data is registered in an array of A (ADD), B (ADD), so the memory address related to the branch point of the pattern line is the arrangement data A (ADD) in this embodiment.
Since it is registered as an array of D), B (ADD), the variable ADD, which is the subscript of the array, is applied (hereinafter, ?&ADD is referred to as an address variable). Therefore, the coordinates of the branch points at both ends of the pattern line are (XP, YP) and (XP', Y
P''), the address variable ADD is ADD=(XP+XP') ¥2+ 100 ・((YP+YP') ¥2) ・・・・・・・・・・・・(1) However, ¥ is an integer division symbol that truncates the decimal. Then, when raphe A is "with", the arrangement data of raphe A is A (ADD) = 1. Also, when raphe B is "with", the sewing The arrangement data for line B is registered as B (ADD)=1. For example, in the arrangement data for the mosaic diagram in FIG. 3, for the raphe L1, both ends thereof have the coordinates XP=2. YP=2, and XP'=
3, YP”=3, the address variable ADD corresponding to the memory address is 202, and the arrangement data is naturally data A since the raphe line L1 exists.
(202) and B (202) both become 1. All arrangement data for the mosaic diagram in FIG. 3 is as shown in FIG. 20.

Next, step S3 of the main program calls the embroidery data generation routine R1 to create embroidery data based on the haze distribution data. , the contents of the subroutine group SUB3 to SUB8 used in this routine Rl will be explained.

First, the next direction calculation of subroutine SUB3 shown in FIG. 9 is a calculation for determining the next direction to be searched. here,
To explain the search direction, as shown in Fig. 7, there are four search directions with respect to the search branch point P (XP.
The directions, ie, upper right, upper left, lower left, lower right, are associated with indices O, 1, 2, and 3. For example, at the branch point P2S in Fig. 3, there is a pattern line L5 in the DT=0 direction, and a pattern line L5 in the DT=1 direction, which is the direction index (hereinafter referred to as the direction) of the pattern line where the haze distribution data branches. is pattern line L
6, DT = 2 directions (there is a pattern line L1, DT
There is a pattern line L2 in the =3 direction. Therefore, if the search point coordinates XP, YP and the search direction DT are given, the pattern line can be extracted and the placement data of the raphe line can also be referred to. Then, if the search is counterclockwise, the next direction is DT
Calculated by = (DT+1)%4 (530 1 ). Here, % is a remainder operator. This is done in order to change the value from 0 to a value of 3 or more. When a pattern line is selected by the search, the direction DT gives the next transmission (branch) direction, ie, the direction of the next branch point, when the embroidery data is registered.

Next, the subroutine S) XY of UB4 shown in FIG.
The displacement calculation is performed in step S401 to obtain displacements ΔXP, ΔYP for a given direction DT from the relationship between the direction DT and the XY displacements ΔXP, ΔYP shown in FIG. represents the relative displacement value on the XY coordinates from the current search point to the pattern line branching point of DT in the search direction or transmission direction.

Next, the address calculation of the subroutine SUB5 shown in FIG. , B (ADD).

First, in step 8501, subroutine SU
Call B4 to find relative displacements ΔXP and ΔYP with respect to the search or transmission (branch) direction DT. Next, in step S502, the displacement ΔXP, ΔYP is added to the coordinate values xp, yp of the current branch point to determine the coordinates xp', yp of the search direction branch point or the next branch point to be transmitted (branched).
"demand.

So, in step S503, zamfIi! IXP
, YP, XP', and YP', the address variable ADD is obtained using the formula (1) used when registering the haze distribution data.

Next, the embroidery data registration in subroutine SUB6 shown in FIG. 12 involves finding the relative displacement on the XY coordinates using the given transmission (branching) direction DT, and converting it into the relative coordinates of the needle drop point of the embroidery data. It is stored in an array. First, in order to obtain the displacement, in step S601, the above SUB4 is called and the relative displacements ΔXP, ΔY
Find P. Then, in step S602, the relative displacements ΔXP, ΔYP are multiplied by the mosaic unit dimension U, and the product is calculated as the embroidery data array, Δxp (N
), Δyp (N).

Next, variable replacement in subroutine SUB7 shown in Figure 13 rewrites the coordinates in order to move the search branch point to the next transmission (branch) destination by registering the selected raphe line in the embroidery data. , First, in step S701, the next branch point coordinates xp', yp'' obtained in subroutine SUB5 are substituted for the current branch point coordinates tMxp, YP.Furthermore, in step S702, the start direction DTO of the next search is selected. It is determined from the direction in which the raphe exists, that is, the final search direction, that is, the transmission (branching) direction DT.This starting direction is the opposite direction to the branching direction, so when there are four directions as in this embodiment, DTo is calculated by DTo=(DT+2)%4, where % is a remainder operator.

Then, for convenience of the next search, DT=DTo is set. Furthermore, for the variable N for embroidery arrangement data, N
=N+1 is incremented (S703).

The branch state check in subroutine SUB8 shown in FIG. 14 refers to the arrangement data around the branch point and sets the double line state flag E and single line state flag F, which are used to select raphe lines when generating embroidery data. It is a subroutine. Here, to explain the single and double track conditions,
First, '6. Line status means that for one pattern line, immediately after the initial mosaic line registration, raphe lines A and B coexist, and the arrangement data of the address variable corresponding to the pattern line is
A (ADD)=1 B(ADD)=. It is 1. This state is called a double track state. In addition, the single-line state means that when registering embroidery data, raphe line A is registered with priority over stitch iB for each pattern line, and only raphe line A is deleted from the placement data, so A (ADD). =OB(ADD)=1. This state is called a single gland state. Furthermore, when raphe B is also registered in the embroidery data, the arrangement data becomes A (ADD)=OB (ADD)=0, indicating that there is no longer a raphe to be registered.

To explain using the example in Fig. 16, the broken line indicates that the embroidery data has been registered, that is, the corresponding 47 lines no longer exist, and the placement data is O, and the solid line indicates that the embroidery data has not been registered, that is, the raphe line exists and is placed. Indicates that the data is 1. Figure 16 (
The pattern line between P2 and P5 in 1) is a double line because both raphe A and B exist (unregistered), and PI,
The pattern line between P2 is a single line because only raphe B exists (and is not registered), and the pattern line between P2 and P3 is also a single line. Note that the left and right positions of the embroidery lines A and H between the branch points in the figure have no meaning.

The double track state flag E checks the single double track state of the pattern lines branching at the search branch point, and if there is one or less pattern line in the single track state and at least one pattern line in the double track state, , flag E is set to 1.

The single-line state flag F similarly checks the single-double-line state of the pattern lines branching at the search branch point, and if there are two or more pattern lines in the single-line state, or there is only one pattern line in the single-line state.
Flag F is set to 1 when there is only one pattern line and no double pattern line. To explain using the example of Fig. 16, if the transmission registration order is now from branch point P1 to P2, and the search branch point is point P3 in Fig. 16 (1), here, the pattern line of the single gland state is Since there is one pattern line and there is also one double pattern line, flag E is set to 1.

In addition, when the transmission registration order further advances to P4, P5, and the next search branch point reaches point P2 in FIG. F is set to 1. Also, as shown in Fig. 16 (3), P1
, P2, and when the point P3 is reached, here,
Since there is one single pattern line and no double pattern line, flag F is set to 1. These flags are used as raphe selection means in the embroidery data generation of routine R1 as follows.

First, if the flag E is set to 1, select the raphe A in the corresponding double-line state, and on the other hand, if the flag F is set to 1, select the pattern line (raphe B) in the single-line state. ) forms a loop to be described later, select the raphe B in the single line state corresponding to the loop. However, in the case of this embodiment, in order to simplify the program, the return model 8! line(
B raphe). In addition, when a loop line is not formed, that is, when there is one patterned line in a single-track state and no patterned line in a double-track state (end-of-line point), select the corresponding single-track pattern line 41 (U-turn). . And flags E, F
If both are not set, it is determined that all raphes have been registered.

Note that the raphes in the single-gland state forming the above-mentioned loops are, for example, the raphes B2, B3, B4, and B5 in the single-gland state when reaching point P2 in FIG. 16 (2). Points to the raphe that draws the loop. When flag F=1, for example, B
2. If you select a raphe line other than B5, such as B1, B6, or A6, all of them! ! Lines cannot be registered to embroidery data.

This is because if you select Bl, there will be no return line, and A
If you select 6 or B6, it will be transmitted when you return to P2 (
This is because the destination (branch) becomes uncertain.

In addition, in this embodiment, B5, which is the return side, is selected between B2 and B5 when selecting the raphe B in the loop-like single gland state.
This is designated by the following single-track state branch designation direction DF.

Therefore, this subroutine SU, which performs the flag processing described above,
The flow of checking the branch point of B8 will be explained with reference to FIG. 14. First, flags E and F and counters KE and KF for the number of pattern lines in double and single line states are reset to 0 (5801).
. Next, subroutine SUB3 is called to obtain the next search direction DT (S802). Then, the address variable A D of the pattern line arrangement data for the search direction DT
I) is obtained (S803). Then add that address
, refer to the haze distribution data A (ADD) of the raphe among the pattern lines in the search direction DT, and calculate A (ADD)=1.
If so, KE is incremented only when counter KE=O, and the search direction value DT at that time is stored in the counterclockwise double-track state branch designation direction DE. Furthermore, when the counter KE=1, the process directly jumps to step 8806. Then, A (ADD)=O and B (A
DD) = 1, the counter KF is incremented and the search direction value DT at that time is set as the single-track state branch designation direction D.
It is stored in F (S804). Note that since the raphe line A is registered in the embroidery data before the raphe line B, checking only the raphe line A will tell whether or not it is a double line condition.

Then, check until the search completes in all directions (S80
6), Finally, the set of flags E and F. process (S
807). That is, if counter KE<2 and counter KF>O, flag E is set to 1, and counter K
If F>1 and counter KF=1 and KE=O
In each case, flag F is set to 1.

The above is the explanation of subroutines SUB2 to SUB8, and then
The flow of embroidery data generation in routine R1 will be explained with reference to FIG. First, set and input the initial values (SI
OI). Note that the initial values are the coordinates xp, yp of the starting point.
and, assuming the direction of approach from the outside, the opposite direction DTo. At the same time, the search start direction is set to DT=DTo.

Next, the above subroutine SUB8 is called to check the branch status, and depending on the placement data, the flag E,
Set F (5102).

And flag E. The next raphe is selected according to F (S103, 5104). That is, when flag E=1,
The process jumps to step S105, and if the flag F=1, the process jumps to step S109. Also, E, F
If both are 0, the registration is complete, and the routine returns to the main flow. Then, the jump destination step S105 is to select a double-line raphe line and register it in the embroidery data, and the registered pattern line direction value D
Assign the double-track state branch designation direction DE set in subroutine SUB8 to T, call subroutine SUB6, and write the embroidery array data Δxp(N), Δyp.
(N) is registered (5106).

Then, subroutine SUB5 is called to perform address calculation (S107), and the raphe A of the address variable is
Rewrite the arrangement data A (ADD) = O (3108
).

On the other hand, the jump destination step S109 is for selecting a single suture gland and registering it in the embroidery data.
In order to register all pattern lines, it is necessary to select from single-line raphe lines forming a loop. Therefore, the above-mentioned single line state branch designation direction value DF set in subroutine SUB8 is assigned to the R record pattern line direction value DT, subroutine SUB6 is called, and the embroidery array data Δxp(N), Δyp(N) (S11)
0). Then, subroutine SUB5 is called to perform address calculation and obtain address value ADD (Si
ll), the arrangement data B (
ADD)=O (S112). In both cases, subroutine SUB7 is called to move the search point to the next branch point by variable substitution, and the process returns to step S102.

As a specific example, the processing of routine R1 in the case of the raphe pattern shown in FIG. 16 (4) in which each raphe line corresponds to the mosaic diagram shown in FIG. 3 (see FIG. 20 for arrangement data) will be described.

Assuming that the starting point is P1 and the approach direction value from the outside is O, the opposite direction value 2 is set as the starting direction. That is, it is set as follows: XP=2 YP=2 DTo=DT=2. Next, first check the branch status,
At this start branch point, the direction DT=0, the address value ADD=202, and the arrangement data is A(202)=
Since there is only one pattern line, the flag E is set to 1 even if there is only one double pattern line. Therefore, step S1
05, and the raphe line A1 of the pattern line L1, which is in a double line state, is registered. That is, registered pattern line direction DT=
0, ΔXP=1 and ΔYP=1 are obtained from FIG. 21, and the embroidery data of the relative displacement coordinates of the first stitch is
As bit u=10, Δxp (0)=10 Δyp(0)=10 is registered, and the arrangement data is rewritten to A (202)=O. Then, the next search branch point is by variable substitution,
The coordinates are XP=3 and YP=3, that is, the branch point P2, and the search direction is D I' o =D T =2. Then, again, the subroutine SUB2 of step S102
The process is repeated from , A2 is selected and registered as the second stitch at the branch point P2, A3 is selected and registered at the branch point P3, A4 is selected and registered at the branch point P4, and A5 is selected and registered at the branch point P5, and the stitch reaches the branch point P2. The coordinates of the branch point and the start search direction are as follows: XP=3 YP=3 DTo=DT=0. Further, the arrangement data at this time is shown in Table 2, and the registration form of the raphe line is as shown in FIG. 16 (2).

To explain the process of step S102 in this case, that is, KF=3 is set by subroutine SUB8, so
The flag F=1 is set, and O of the single-line branch designation direction DF is substituted for the transmission direction DT. therefore,
Jumping to step S109, ia head B5 is selected,
This will be registered in the embroidery data. The following processing is omitted.

In addition, at this branch point, loop-shaped single line raphe B5 or B
If a raphe other than 2 (B5 is selected in this routine) is selected, it becomes impossible to register all the raphes on the pattern.

Next, as a modification of this embodiment, a case where the patterns of the raphe lines A and B are different will be described. For example, Figure 17 (1)
If raphe A is a straight line and raphe B is a zigzag line between branch points Pa and Pb (Pa, c, d, e, f, and Pb are needle drop points) as shown in FIG. In step 8106, the embroidery data registration process in subroutine SUB6 of S110 is changed. That is, in the embroidery data registration of subroutine SUB6, Δxp (N)·, Δyp (
It is necessary to use FIG. 23 for the calculation of N).

In the case of mlQA registration, the A line pattern in Fig. 23 is used, so it is the same as the above embodiment, but in the case of raphe B (zigzag stitch) registration, the B line pattern in Fig. 23, that is, the zigzag Coordinate values related to the needle drop point of sewing are used. The actual needle drop point is the value obtained by multiplying this value by U. Note that when raphe B is registered, five zigzag stitches are registered at once as shown in the B line pattern in FIG. 23, so N in step S703 of subroutine SUB7 is
The operation of =N+1 needs to be changed to N=N+5. Note that the above pattern is in the direction DT.
=O, and for the direction DT=1, the pattern shown in FIG. 17(2) is used. Here points Pa, c, d
, e, f, Pb are needle drop points. Although patterns in other directions are omitted, the coordinates related to the needle drop point of the zigzag stitch are shown in the B line pattern in FIG. 23.

Next, as another modification of this embodiment, in the creation of the mosaic line drawing in step S1 described above, the ON mosaic unit is developed on the XY coordinates by the mosaic processing of the original image, but in this case, four adjacent mosaic units are A method of handling and processing them as one set will be explained. First, each set of four adjacent mosaic units is divided into two or less ON mosaic units and three or more ON mosaic units, and all four mosaic units in the former set are OF.
F as a mosaic unit, and rewrite the mosaic image by making the latter set of mosaic units all ON mosaic units. The subsequent processing is the same as in the above embodiment.

A specific example is shown in FIG. First, as one set of four adjacent mosaic units, Mll, M12, M17
, M18, and all four are ON, so no changes are made. The next adjacent pair of M13, M14, M1
5. Since three of M16 are ON, in order to make it a mosaic unit with all ON, change M15 from OFF to ON, and also change the next set of adjacent M19, M20, M2
1. Since only two M22 are ON, change M19 and M20 from ○N to OFF in order to make the mosaic unit all OFF.

Then, step S described above is applied to the ON mosaic unit.
Applying pattern lines in the same way as in step 1 yields LLl~L18
Eight mosaic line drawings are generated. As a result, embroidery data of a so-called cross-stitch pattern is generated. It is also possible to create a rectangular pattern depending on how one set of letters is divided. Note that the subsequent generation processing is the same as in the above-described embodiment, so a description thereof will be omitted.

Next, as yet another modification of the present embodiment, a program for generating embroidery data of a hexagonal pattern for the above-mentioned square pattern will be described. The pattern is a hexagonal line pattern as shown in FIG. 19, each line L22 to L25 is a pattern line, and the branching points are P21, P22, etc. Then, the directions DTO to 3 in the above embodiment are made to correspond to the indices 0 to 5 as the direction DT. Specific values are shown in FIG.

The pattern line search is performed, for example, at the search point P21 in the search direction DT=O, there are no pattern lines in 2 and 4, and the pattern line in the search direction DT=1 is L23, and the search direction DT=3.
The pattern line in the search direction DT=5 is L21, and the pattern line in the search direction DT=5 is L22.
Thus, the arrangement data registration process can be performed in the same manner as in the above embodiment, however, the next direction calculation formula in subroutine SUB3 is changed as follows.

DT=(DT+1)%6 Also, change the variable substitution in subroutine SUB7 as follows.

DTo= (DT+3)%6 Also, the displacement X of the displacement calculation in subroutine SUB4
To find P and YP, refer to the values for the direction DT from FIG.

Further, the calculation of the relative displacement amount in the embroidery data registration in the subroutine SUB6 is changed as follows.

Δxp=ΔXP−u ΔyP=o. 58-ΔYP-u Since the other processing programs are almost the same as those in the above embodiment, their explanation will be omitted.

(Effect of the invention) As described above, when creating mosaic embroidery data, the pattern line arrangement data is stored in the memory address related to the branch point, 41 lines are selected by referring to the state of the arrangement data, and the embroidery data is This device generates embroidery data by registering it in the embroidery machine, and with this device, it is possible to create error-free data even with complex patterns without the need for manual labor.

[Brief explanation of drawings]

FIG. 1 is a block diagram of a mosaic embroidery data creation device according to an embodiment of the present invention, FIG. 2 is a diagram of an original embroidery pattern used in the device shown in FIG. 1, and FIG. 3 is a diagram of the device shown in FIG. 1 above. Embroidery mosaic diagram used in the device shown in FIG. FIG. 6 shows the main program flow used in the apparatus shown in FIG. 1 above. FIG. 7 shows the subroutine SU8 shown in FIG.
The XY displacement calculation flow in FIG. 11 is the subroutine SUB5 of the apparatus shown in FIG.
The address calculation flow in FIG. 12 is the Soka subroutine SUB6 in FIG. 1 above.
The embroidery data registration flow in FIG. 13 is the subroutine SUB7 of the device shown in FIG.
The variable substitution flow in FIG. 14 is the subroutine SUB8 of the device shown in FIG.
The branch status check flow in FIG. 15 shows the routine R1 embroidery data generation flow used in the device shown in FIG. Figure 17 is a diagram of a raphe zigzag pattern used in a modified example of the mosaic embroidery data creation device according to the embodiment of the present invention; 19 is a mosaic diagram (original cross-stitch image) used in another modification; FIG. Figures (1) and (2) are specific examples of the arrangement data of the device in Figure 1 above, Figure 21 is a relationship between the direction and coordinates of the device in Figure 1, and Figure 22 is the example of the above embodiment. A diagram showing the relationship between directions and coordinates of another modification of the device shown in FIG. 1, and FIG. 23 shows the zigzag raphe line A of the modification shown in FIG. ! It is a pattern diagram of skein B. 1...CPU (embroidery data registration means) 5
・・・・・・・・・・・・・・・Arrangement data storage section (arrangement data storage means)

Claims (1)

[Claims] (1) In a data creation device for creating embroidery data used in computer embroidery machines that perform embroidery by moving a piece of cloth to various positions on a plane in synchronization with the vertical movement of the needle bar of a sewing machine, at least One end is used to create embroidery data that is embroidered on the lines of a mosaic line drawing formed by pattern lines that are in contact with other pattern lines, and the end point of the pattern line is used as a branching point. The first and second raphe lines are made to correspond to one pattern line existing between the points, and the presence or absence of those raphe lines is stored as placement data in the memory address related to the branch point, and the following stitching is performed. A layout data storage means that is rewritten in connection with the registration in the sewing data; and a sewing data registration means that selects a raphe line and registers it in the sewing data in connection with the layout data at the branching point. A stabilization data creation device comprising: