JPH0223605A - Reticle moving exchanger - Google Patents

Abstract

PURPOSE:To carry reticles in a short time through a shortest path, and to reduce the adhesion of a foreign matter such as dust by arranging a plurality of reticle cassettes on an approximately concentric circle on a plane and rotatably constituting the plate so that the positions of leading-out by a carrier are brought near the exposure base of substrates for the reticles. CONSTITUTION:Reticle cassettes 51, 52... are disposed on an approximately concentric circle on a plate 9. The plate 9 is turned by a power source 10 so that a desired reticle cassette such as 52 in the reticle cassettes 51, 52... is brought to a position nearest to a reticle setting base 2. A carrier 3 is moved by a power source 11, and the internal cassette 42 of the reticle cassette 52 is lifted slightly from a lower section, extruded in the horizontal direction, and set to the upper section of the reticle setting base 2. The internal cassette 42 is set, a substrate for a mask is exposed, and the reticle 42 is returned into the cassette 52 by the carrier 3. The cassette 52 is fixed previously onto the plate 9 by using a pawl and a pawl receiving section.

Description

[Detailed Description of the Invention] [Summary] The present invention relates to a reticle moving and changing machine that stores a cassette carrying a reticle to be exposed to obtain a resist pattern on a wafer substrate and efficiently transports a desired reticle. The purpose of this system is to provide a reticle mobile exchange machine that reduces the adhesion of foreign substances such as dust by transporting reticles from the mobile exchange machine over the shortest possible path in a short time. In a reticle moving exchanger in which a plurality of reticle cassettes are arranged approximately concentrically on a flat plate, and the reticle cassettes are pulled out by a carrier and moved onto a reticle setting table, and the reticle cassettes are pulled out by a carrier and moved to a reticle setting table, the reticle cassettes are pulled out by a carrier and moved to a reticle setting table. It is characterized in that the flat plate is configured to be rotatable.

[Industrial Field of Application] The present invention relates to a reticle moving and changing machine that stores a cassette carrying a reticle to be exposed to light to obtain a resist pattern on a wafer substrate and efficiently transports a desired reticle.

Conventional reticle transfer machines place reticle cassettes on a horizontal plate, stack them vertically, and move the desired reticle onto a reticle setting table using a conveyor such as a robot arm that moves vertically and horizontally. was. As a result, it takes a long time to replace the reticle, and when the reticle is moved onto the reticle set table, dust may adhere to the reticle. Therefore, it has been desired to have a structure that can be replaced in a short time and that is difficult to attract dust.

[Prior Art] In order to manufacture large-scale integrated circuits using semiconductor elements, photolithography technology using resist coating is frequently used. At that time, change the pattern on the reticle to 115 or 1/1.
A pattern is created on a wafer substrate by reducing the size to 0. Therefore, reticles are often manufactured with a size 5 to 10 times larger than the original size pattern on a wafer, and the pattern is formed on a glass substrate using metal such as chromium. Furthermore, multiple reticles are required during resist patterning to fabricate semiconductor devices. Furthermore, different reticles are required when manufacturing other types of semiconductor devices. FIG. 3 is a schematic diagram showing a mobile exchange for moving and exchanging a plurality of such reticles.

In FIG. 3, 1 generally shows a reticle moving exchanger, 2 a reticle setting table, 3 a robot-like reticle carrier, 41, 42- a reticle, 51, 52
- indicates a reticle cassette containing a reticle, 6 indicates a reduction lens, and 7 indicates a wafer substrate. The reticle moving exchanger 1 includes a reticle transfer unit 1-51. It has shelf boards 81 and 82- on which 52-- are placed respectively. In order to give a predetermined exposure to the wafer substrate 7, a predetermined item of the reticle cassette, for example 52, is moved vertically and horizontally to the reticle storage area of the reticle setting table 2, and the reticle 42 is transferred to the reticle setting table by the power of a power source (not shown). Transport it to the reticle storage area 2. A reticle pattern is irradiated onto a wafer substrate 7 through a lens 6 with illumination light from a light source (not shown).

FIG. 4 is a schematic top view showing the relationship between the reticle and the carrier. In FIG. 4, the same reference numerals as in FIG. 3 indicate the same parts, and the general feeding rod (as a general feeding tool) is shown to have entered below the reticle 42.

[Problem to be solved by the invention] In the configuration shown in FIGS. 3 and 4, after the conveyor 3 moves up and down to a predetermined position, the reticle is taken out from the reticle cassette and conveyed onto the reticle set table. It takes considerable distance and time to reach this point.

Therefore, even if the working environment is kept clean, there is a drawback that dust adheres to the reticle. Furthermore, in order to exchange the reticle for the next reticle, it was necessary to return it to the cassette and lift or pull down the next reticle cassette to transport it, which required a long time.

SUMMARY OF THE INVENTION An object of the present invention is to improve the above-mentioned drawbacks and to provide a reticle moving exchanger in which reticle transfer from the reticle moving exchanger is carried out over as short a path as possible in a short period of time, thereby reducing the adhesion of foreign matter such as dust.

Means for Solving the Problems The reticle moving exchanger of the present invention arranges a plurality of reticle cassettes substantially concentrically on a flat plate, and the position at which the reticle cassettes are pulled out by the carrier is near the exposure table of the reticle substrate. The feature is that the flat plate is configured to be rotatable.

[Operation] Since the reticle cassettes are arranged approximately concentrically on a rotatable flat plate, the desired reticle cassette is rotated to a position close to the reticle set table, and the reticle is pulled out from the cassette using that device. . Since the reticle only needs to be transported a short distance onto the reticle center, there is little risk of dust adhering to it, and it can be replaced in a short time.

Embodiment FIG. 1 is a plan view showing the configuration of an embodiment of the present invention, and FIG. 2 is a side view of the main parts thereof. In Figures 1 and 2, 2
3 is a reticle center, 3 is a robot-like carrier, and 51 and 52 are reticle cassettes that store reticles inside. 9 is a flat plate, 10 is a power source for rotating the flat plate, and 11 is a power source for driving a carrier, which can be moved in each direction as indicated by the arrows. Reticle cassette 51.52-
are arranged approximately concentrically on the flat plate 9. Reticle cassettes 51, 52- A desired one, e.g. 52
The flat plate 9 is rotated by the power source 10 so that it comes to the position closest to the reticle set table 2.

Next, the transport tool 3 is moved by power fill to lift the internal cassette 42 of the reticle cassette 52 a little, for example, from below, push it out in the horizontal direction, and set it above the reticle setting table 2.

After the mask substrate is set and exposed, the reticle 42 is returned to the cassette 52 by the carrier 3.

Incidentally, the cassette 52 is fixed on the flat plate 9 using the claws and the claw receiver.

In FIG. 1, it is desirable that the edge of the flat plate 9 and the reticle set table 2 be sufficiently close to each other.

Further, instead of using a transport rod as the transport tool 3, it may be of a type that opens the lid of the reticle cassette and sucks a square of the reticle before moving it.

[Effects of the Invention] In this way, according to the present invention, the transport distance from taking out the reticle from the reticle cassette to setting it on the reticle setting table is shortened, so the possibility of dust adhering to the reticle is reduced. . Therefore, no foreign matter is transferred onto the wafer substrate, and the yield of products can be greatly improved.

[Brief explanation of the drawing]

FIG. 1 is a plan view showing the configuration of an embodiment of the present invention, FIG. 2 is a side view of the main parts of FIG. FIG. 4 is a diagram showing the relationship between the reticle in FIG. 3 and a conveyor. 1 - Reticle moving exchanger 2 - Reticle set table 3 - Transport tool 41.42 - Reticle 51.52 - Reticle cassette 9 - Flat plate Patent applicant Fujitsu Ltd. Representative Patent attorney Eisuke Suzuki Reticle moving exchange Third reason for talent

Claims (1)

[Scope of Claims] A plurality of reticle cassettes (51), (52), etc. are arranged in a predetermined state, and a specific cassette (52) is placed on the transport tool (3).
), the reticle cassettes (51), (52), etc. are arranged approximately concentrically on a flat plate (9), and are transported. Ingredients (3)
1. A reticle moving exchanger characterized in that said flat plate (9) is configured to be rotatable so that a pull-out position thereof is near a reticle set table (2).