JPH0223356A - Photosensitive planographic printing plate - Google Patents

Abstract

PURPOSE:To improve developability and image reproducibility by treating the surface of a base with the sol of the compd. of metal. CONSTITUTION:The surface of the base of the photosensitive planographic printing plate having a non-silver salt photosensitive layer and photosensitive silver halide emulsion layer on a base is treated with the sol of the compd. of the metal. The sol of the compd. of the metal consists of an oxide or hydride and the metals forming such sol include, for example, Al, Ti, Zr, Cr, Ni, Zn, Sn, Mn, Cu, Co, Fe, etc., and at least one kind of the sols of the compds. of such metals are used. The Al, Cr, Ni, Zn are preferably used. The developability and image reproducibility are improved in this way.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photosensitive lithographic printing plate having a non-silver salt photosensitive layer and a photosensitive silver halide emulsion layer.

[Background of the invention]

Previously, Special Publication No. 61-46823, Special Publication No. 61-556
As described in No. 66 and Japanese Patent Publication No. 61-55667, a non-silver salt photosensitive layer and a photosensitive silver halide emulsion layer are sequentially provided on a hydrophilic support; Are known. The method and process for preparing a lithographic printing plate using such a photosensitive lithographic printing plate are as follows. First, imagewise exposure is carried out, and the silver halide in the photosensitive layer containing silver halide is developed (first development), and then activated light containing ultraviolet rays is applied either immediately or after treatment with a fixing solution. The support is exposed to light and then sent to a second development stage where only the non-image areas of the non-silver salt photosensitive layer are dissolved and removed to expose the hydrophilic surface of the support, thereby obtaining a lithographic printing plate. In this case, the processing solution used for the second development needs to be such that it selectively dissolves only the non-image areas of the non-silver salt photosensitive layer. Lithographic printing plate (so-called PS plate)
You can choose from the developer solutions used for development.

Alternatively, after the exposure to ultraviolet rays as described above, a step of washing out the photosensitive silver halide emulsion layer on the first layer on the entire surface or only on the non-image area can be included. Next, it is treated with a second developer to selectively dissolve and remove only the non-image areas.

Traditionally, supports for photosensitive lithographic printing plates include paper, paper laminated with plastic, metal plates such as aluminum, zinc, iron, copper, etc., plastic films,
Paper or plastic films plated, laminated or vapor-deposited with the above-mentioned metals are known.

However, these conventional supports have any of the following drawbacks.

(1) If the hardness of the support surface is insufficient, the surface of the non-image area or the image area may be damaged by printing a large number of sheets.
As a result, stains occur in non-image areas during printing, or poor ink adhesion occurs in image areas.

(2) If the hydrophilicity and water retention of the support surface are insufficient, stains may occur during printing, or the width of the dampening solution may be narrow, resulting in printing that is difficult to print.

(3) If the adhesion between the surface of the support and the ink-receptive material is insufficient, the image area during printing will be severely damaged and cannot withstand printing on a large number of sheets.

(4) If the bending strength or tensile strength of the support is insufficient, gripping or plate breakage may occur during printing.

For example, aluminum plates, which are most effectively used in this field, require grain treatment and anodizing treatment to provide sufficient hydrophilicity, water retention, and adhesion, making the manufacturing process complicated. At the same time, the current disadvantage is that the cost is extremely high.

Therefore, iron materials have been developed as supports for photosensitive planographic printing plates, which have characteristics such as being inexpensive, having high mechanical strength, and being magnetic. For example, JP-A-5
No. 5-145193, No. 58-220796 and No. 5
As described in Japanese Patent Application Laid-open No. 9-31192, an iron support having a chromium electrodeposited layer, JP-A-56-130395
As described in Japanese Patent No. 56-130396, Japanese Patent No. 56-150592, and Japanese Patent No. 57-64597, iron supports whose surface has been roughened by electroforming are known.

These iron supports are insufficiently hydrophilic.

To improve the hydrophilicity of iron supports, JP-A-58-22
As described in No. 0797 and No. 59-11294, there is a hydrophilic treatment method in which treatment is performed with a mixed aqueous solution of a water-soluble polymer and a water-soluble metal salt or an aqueous potassium permanganate solution. Furthermore, as described in Japanese Patent Publication No. 62-55517, a hydrophilic treatment method has been developed in which treatment is performed with a solution containing a metal compound. However, although these supports are improved in hydrophilicity, a photosensitive lithographic printing plate with good developability (second development) and image reproducibility has not been obtained.

[Problem to be solved by the invention]

Therefore, an object of the present invention is to provide a photosensitive lithographic printing plate having a non-silver salt photosensitive layer and a photosensitive silver halide emulsion layer on a support, which has good developability and good image reproducibility. The purpose is to provide a printed version.

[Means to solve the problem]

The above object of the present invention is to provide a photosensitive planographic printing plate having a non-silver salt photosensitive layer and a photosensitive silver halide emulsion layer on a support, in which the support of the photosensitive planographic printing plate has a surface coated with a metal compound. This is achieved by a photosensitive lithographic printing plate characterized by a sol-treated support.

The present invention will be explained in detail below.

The iron support of the present invention is obtained by roughening the surface of an iron material, subjecting it to plating or post-plating chemical conversion treatment, and further subjecting it to hydrophilic treatment.

The iron material in the present invention includes not only pure iron but also alloys of iron and other elements. Other elements that form alloys with iron include carbon, manganese, and nickel. As an alloy,
Specifically, carbon steel (an alloy of carbon (0.04-1.7%) and iron), cast iron with a higher carbon content than carbon steel, and other elements (such as manganese, nickel, chromium, cobalt, tungsten, Special steels containing molybdenum (for example, manganese steel, nickel steel, chromium steel, nickel-chromium steel), etc.

The carbon steel mentioned above includes extremely mild steel (carbon 0.25% or less),
Mild steel (0.25-0.5%) Hard steel (carbon 0.5-1.0
%), extremely hard steel (carbon 1.0% or more).

Various conventionally known methods can be used to roughen the surface of the iron material, including mechanical methods, chemical methods, and electrolytic methods. Examples of the mechanical method include a ball polishing method, a brush polishing method, and a polishing method using liquid honing.

Chemical methods include etching with a solution containing sulfuric acid, phosphoric acid, nitric acid, hydrochloric acid, oxalic acid, birophosphoric acid, ferric chloride, etc. The electrolytic method includes an electrolytic etching method and an electrolytic plating method.

In the plating treatment after the surface has been roughened, Ni, Cr, Cu, or Sn, which has a rust-preventing effect on the iron support, is used.

Note that the plating metal is not limited to the above-described single metal, but also includes an alloy containing one or more of these metals, or a composite plating of two or more of these metals.

Chemical conversion treatments that may be carried out as necessary after plating include immersion in a solution containing chromate, dichromate, phosphate, molybdate, borate, perborate, etc., or in such a solution. There is a chemical conversion treatment method using electrolysis.

The center line average roughness (as indicated in DIN 4768) of the surface of the support obtained by the above treatment is 0.
It is 1 to 3 μm, preferably 0.3 to 1.5 μm.

The treatment performed after plating with a sol of a metal compound is a hydrophilic treatment, and this treatment may be applied to both the front and back surfaces of the support.

A sol of a metal compound is composed of an oxide or an aqueous substance, and examples of the metal that forms such a sol include Aα.
, T i , Zr , Cr , N i , Z
n, Sn, Mn, Cu, Co, F
e.

There are Pb, Cd, Mg, Ca, etc., and in the present invention, at least one of the sols of compounds of these metals is
A(2, Cr, Ni, Zn are preferably used).

As the method for making the wood parent, it is preferable to carry out cathodic electrolysis or immersion treatment in an aqueous solution containing a sol of the metal compound. The concentration of a sol of a metal compound in an aqueous solution is 1 to 1
OQg/Q is preferred. Additionally, inorganic salts such as chromic acid, phosphoric acid, and sulfuric acid, organic acids such as citric acid and acetic acid, or surfactants can be added to the treatment solution to improve the stability of the sol in an aqueous solution. .

The cathode electrolysis conditions vary depending on the type of sol used, but the current density is 0.5 to IQA/dm'', the treatment temperature is 5 to 50°C, and the treatment time is 1 to 60 seconds.

The non-silver salt photosensitive layer provided on the support of the present invention includes a photosensitive layer used in ordinary PS plates.

Examples of compositions constituting such a photosensitive layer include the following.

(1) Photosensitive composition containing o-quinonediazide compound Examples of the o-quinonediazide compound include ester compounds of 0.su7toquinonediazide sulfonic acid and polycondensation resins of phenols and aldehydes or ketones.

Examples of the phenols include phenol, 0-
Cresol, m-cresol, p-cresol, 3.5
Examples include m-phenols such as xylenol, carvacrol, and thymol, dihydric phenols such as catechol, resorcinol, and hydroquinone, and trihydric phenols such as pyrogallol and 70-glucine.

Examples of the aldehyde include formaldehyde, benzaldehyde, acetaldehyde, crotonaldehyde, and furfural.

Preferred of these are formaldehyde and benzaldehyde. Further, examples of the ketone include acetone and methyl ethyl ketone.

Specific examples of the polycondensation resin include phenol/formaldehyde resin, m-cresol/formaldehyde resin, m-+p-mixed cresol/formaldehyde resin, resorcinol/benz, aldehyde resin, pyrogallol/acetone resin, and the like.

The condensation rate of 0-naphthoquinonediazide sulfonic acid with respect to the OH group of the phenol of the 0-naphthoquinonediazide compound (reaction rate with respect to one OH group) is 15 to 80%.
is preferable, and more preferably 20 to 45%.

Furthermore, it is used in the present invention. - As the quinonediazide compound, compounds described in JP-A-58-43451 can also be used.

Among the above 0-quinonediazide compounds, 1.2-benzoquinonediazide sulfonyl chloride or 1.2. - Naphthoquinonediazide sulfonyl chloride and pyrogallol.
It is obtained by reacting an acetone condensation resin or 2.3.4-trihydroxybenzophenone. -quinonediazide ester compounds are most preferred.

As the O-quinonediazide compound used in the present invention, each of the above compounds may be used alone, or two or more thereof may be used in combination.

These 0-quinonediazide compounds are preferably used in combination with an alkali-soluble resin. Examples of alkali-soluble resins include novolac resins, vinyl polymers having phenolic hydroxyl groups, and condensation resins of polyhydric phenols and aldehydes or ketones described in JP-A-55-57841. Examples of the novolac resin include phenol-formaldehyde resin, cresol-formaldehyde resin, and phenol-cresol resin as described in JP-A-55-57841.
Formaldehyde copolycondensate resin, JP-A-55-127
Examples include copolycondensate resins of p-substituted phenol and 7-enol, or cresol and formaldehyde, as described in Japanese Patent No. 553.

In addition, the vinyl polymer having a phenolic hydroxyl group is a polymer having a unit having the phenolic hydroxyl group in its molecular structure, and includes at least one structural unit of the following - binding margin CI) to (V). Polymers are preferred.

General formula (1) General formula [■] General formula (I [I) General formula (IV) W H General formula (V) H [In the formula, R1 and R2 each represent a hydrogen atom, an alkyl group, or a carboxyl group, Preferably it is a hydrogen atom. R5 represents a hydrogen atom, a halogen atom, or an alkyl group, preferably a hydrogen atom or an alkyl group such as a methyl group or an ethyl group. R1 represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group, preferably a hydrogen atom. A represents an alkylene group which may have a substituent, which connects a nitrogen atom or an oxygen atom and an aromatic carbon atom, m represents an integer from O to IO, and B may have a substituent. Represents a phenylene group or a naphthylene group which may have a substituent. ] The polymer of the present invention preferably has a copolymer-type structure, and the monomer units that can be used in combination with the structural units shown in the above-mentioned binding margins (1) to (V) include: For example, ethylenically unsaturated olefins such as ethylene, propylene, isobutylene, butadiene, and isoprene, styrenes such as styrene, α-methylstyrene, p-methylstyrene, p-chlorostyrene, and acrylics such as acrylic acid and methacrylic acid. Acids such as itaconic acid, maleic acid, maleic anhydride, unsaturated aliphatic dicarboxylic acids such as methyl acrylate, ethyl acrylate, n-butyl acrylate, isobutyl acrylate, dodecyl acrylate, 2-taloloethyl acrylate, acrylic Esters of σ-methylene aliphatic monocarboxylic acids such as methyl methacrylate, methyl α-chloroacrylate, ethyl methacrylate, ethyl ethacrylate, nitriles such as acrylonitrile and methacrylonitrile, e.g. Amides such as acrylamide, anilides such as acrylanilide, p-chloroacrylanilide, I-nitroacrylanilide, m-methoxyacrylanilide, vinyl esters such as vinyl acetate, vinyl propionate, vinyl benzoate, vinyl butyrate, etc. vinyl ethers such as methyl vinyl ether, ethyl vinyl ether, inbutyl vinyl ether, β-chloroethyl vinyl ether, hinyl chloride, vinylidene chloride, vinylidene cyanide,
For example l-methyl-1-methoxyethylene, 1. l-dimethoxyethylene 1.2/dimethoxyethylene, 1.1
- Ethylene derivatives such as dimethoxycarbonylethylene and 1-methyl-1-nitroethylene; N-vinyl compounds such as N-vinylpyrrole, N-vinylcarbazole, N-vinylindole, N-vinylpyrrolidene, and N-hinylpyrrolidone; There are vinyl monomers such as .

These vinyl monomers exist in polymer compounds with a structure in which unsaturated double bonds are cleaved.

Among the above monomers, aliphatic monocarboxylic acid esters and nitriles exhibit excellent performance for the purpose of the present invention and are therefore preferred.

Some of these photosensitive compositions may contain other ingredients as necessary.
Furthermore, pigments such as dyes and pigments, sensitizing agents, plasticizers, surfactants, organic acids, acid anhydrides, and compounds capable of generating acids upon exposure to light can be added.

(2) Photosensitive composition containing diazo resin The diazo resin represented by the condensate of p-diazodiphenylamine and formaldehyde may be water-soluble or water-insoluble, but is preferably
7 and No. 57-43890, etc., which are water-insoluble and soluble in ordinary organic solvents are used. Particularly preferred is a diazo resin represented by the binding margin (1) below.

- Spelling allowance (I) [In the formula, R1, R2 and R3 represent a hydrogen atom, an alkyl group or an alkoxy group, R' represents a hydrogen atom, an alkyl group or a phenyl group, and X represents PFe or BF4,
Y represents -NH-, -S- or -〇-. ] The diazo resin is preferably used in combination with a film-forming resin, particularly a lipophilic polymer compound having a hydroxyl group. In addition to the above-mentioned lipophilic polymer compounds, examples of such lipophilic polymer compounds include 7-mer-1 having an aliphatic hydroxyl group in the side chain, such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate, and other copolymers. Examples include copolymers with monomers obtained.

In addition to these, polyvinyl butyral resins, polyurethane resins, polyamide resins, epoxy resins, novolak resins, natural resins, etc. may be added as necessary.

In addition, pigments such as dyes and pigments, fat-sensitizing agents, plasticizers, surfactants, and the like can be added to these photosensitive compositions.

A photosensitive composition containing a polymer compound containing a photosensitive group in the main chain or side chain of the polymer, and containing a photosensitive polymer as a main component such as mids and polycarbonates (for example, U.S. Pat. No. 3,030 .208, 3,707.373 and 3,453,237); (2.gloperiden) such as cinnamylidenemalonic acid;
Those based on photosensitive polyesters derived from malonic acid compounds and difunctional glycols (eg, US Pat. No. 2,956).

878 and 3.173.787); cinnamate esters of hydroxyl-containing polymers such as polyvinyl alcohol, starch, cellulose and the like (e.g. Patent 2,690゜9
No. 66, No. 2,752,372, No. 2,732.30
Photosensitive polymers such as those described in No. 1) and the like are included.

Other sensitizers, stabilizers, plasticizers,
Pigments, dyes, etc. can be included.

(4) Photopolymerizable composition comprising an addition-polymerizable unsaturated compound This composition preferably comprises (a) a vinyl monomer having at least two terminal vinyl groups, (b) a photopolymerization initiator, and ( c) Consisting of a polymer compound as a binder.

As the vinyl monomer of component (a), Japanese Patent Publication No. 35-50
No. 93, No. 35-14719, and No. 44-28727. Acrylic or methacrylic acid esters of polyols, such as diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, pentaerythritol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, etc., or methylene bis(meth)acrylate, etc. ) acrylamide, bis(meth)acrylamides such as ethylene bis(meth)acrylamide, or unsaturated monomers containing urethane groups, such as di(2'-methacryloxyethyl)-2,4-tolylene diurethane, Examples include reaction products of diol mono(meth)acrylates and diisocyanates, such as di(2'acryloxyethyl)trimethylene diurethane.

As the photopolymerization initiator of component (b), the above-mentioned one-piece CI
) can be used, but other types can also be used. For example, carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo and diazo compounds, halogen compounds, and photoreduction as described in Chapter 5 of "Light Sensitive Systems" by J. Kosar, cited above. There are sex pigments. More specifically, British Patent I.

No. 459.563.

On the other hand, various known polymers can be used as the binder for component (c). Details of specific binders are described in US Pat. No. 4,072,527. Furthermore, the British patented photopolymerizable composition contains a thermal polymerization inhibitor,
It can contain plasticizers, dyes and pigments.

The light-sensitive silver halide emulsion provided on the above-mentioned non-silver salt photosensitive layer may be a negative type ordinary emulsion or a direct positive type emulsion. As the silver halide, four commonly used silver chloride, silver bromide, silver iodide, or a mixed silver halide thereof can be used. The average particle diameter is preferably about 0, 0.05 μm to 5 μm in diameter. The particles may be sensitized by, for example, sulfur sensitization, reduction sensitization, or LR to achieve appropriate sensitivity.

Chemical sensitization, such as sensitization with salts of noble metals such as Rh and Pt, and spectral sensitization with sensitizing dyes can be performed.

Any particle having a surface latent image type or internal latent image type latent image distribution may be used. Commonly used additives can be added to this.

These silver halide light-sensitive emulsion layers have a thickness of about 1 to log
/m2, preferably from 2 to 6 g/m''. Application can be done by dip, air knife, curtain or other coating methods, or by methods such as U.S. Pat.
The hopper coating method and extrusion coating method described in No. 294 can be applied. It is also possible to provide an intermediate layer having the following special composition on the non-silver salt photosensitive layer, and then provide a photosensitive layer containing a silver halide photosensitive emulsion thereon. The special composition is one in which the above lipophilic resin is dispersed in a hydrophilic protective colloid as shown below.

The hydrophilic protective colloid used in this intermediate layer is a hydrophilic polymer compound used in silver halide emulsions.

Graft polymers with gelatin, gelatin derivatives and other polymers Proteins such as casein and albumin, cellulose derivatives such as hydroxyethyl cellulose and carboxymethyl cellulose, sodium alginate, starch derivatives, partially acetalized polyvinyl alcohol, poly-N-vinyl pyrrolidone Homo or copolymers such as polyacrylic acid, polyacrylamide, polyvinyl imidazole, and polyhinyl virazole can be used.

The method and process for making a lithographic printing plate using the photosensitive lithographic printing plate as described above are as follows. First, imagewise exposure is performed to form a latent image on the silver halide in the silver halide photosensitive emulsion layer. Next, silver halide development (first development) is performed,
The non-silver salt-sensitive layer is exposed to active light, either immediately or through treatment with a fixing solution, followed by a wash-out treatment to remove the silver halide-sensitive emulsion layer, and then the non-silver salt-sensitive layer is exposed to active light, either immediately or through treatment with a fixer solution. A second development process is performed in which either the exposed portion or the unexposed portion of the photosensitive layer is dissolved and removed to expose the hydrophilic surface of the support to obtain a lithographic printing plate. In this case the second
The processing solution used for development must be one that selectively dissolves either the exposed or unexposed areas of the non-silver salt photosensitive layer, and in particular, the processing solution normally used for developing PS plates is required. or similar developers. For example, when the non-silver salt photosensitive layer is a layer made of an 0-quinonediazide compound, an aqueous solution of sodium silicate or the method described in US Pat.
141.733 is used.

To develop the silver halide emulsion photosensitive layer, a developing method normally used for silver halide photosensitive materials is used. Developing agents include hydroquinone, catechol, resorcinol, pyrogallol, such as halogen atoms, aryl groups, amino groups, c
The above-mentioned compounds substituted with l to C1 alkyl groups, alkoxy groups, etc. are used. The developer further contains alkaline agents such as sodium hydroxide, potassium hydroxide, and triethanolamine, pH buffering agents such as sodium carbonate, potassium carbonate, potassium silicate, and tertiary sodium phosphate, potassium bromide, mercapto compounds, and triazoles. Similar antifogging agents, water softeners such as EDTA and sodium polyphosphate, and preservatives such as sodium sulfite and ethanolamine can be used.

Processing conditions using such a developer are generally a solution temperature of 20
10-120 at ~50°C, more preferably 24-40°C
seconds, more preferably 10 to 40 seconds.

The fixer contains sodium thiosulfate, sodium sulfite,
A fixing solution that contains a silver halide solvent such as ammonium rhodan or ammonium thiosulfate, a pH buffering agent, and the like and is normally used for silver halide photosensitive materials is used. The fixing process is performed at room temperature for 1 to 30 seconds, preferably 10 seconds or less.

For the second development, a developer suitable for the non-silver photosensitive layer may be used, and the developer is 15 to 500C! , more preferably at 15-40°C,
10-120 seconds, more preferably 10-45 seconds.

〔Example〕

The present invention will be illustrated below with reference to Examples, but the embodiments of the present invention are not limited thereto.

Example 1 A flat surface of a steel plate with a thickness of 0 to 15 mm was roughened by etching with a Baume 40' ferric chloride solution, and a sulfate bath was used for this, at a temperature of 50° C. and a current density of 5 A/dm. DeZ
After plating n to 4 μm, the particle size was 1100 as a hydrophilic treatment.
A solution containing 20 g of n Cr sol/(2, Log/+2 phosphoric acid, with a steel plate as the cathode and a current density of 2 A/dm"
Electrolysis was performed for 0 seconds, washed with water, and then dried to obtain Support-1.

Preparation and printing test of lithographic printing plate sample-1 A non-silver salt photosensitive liquid having the following composition was coated on the support-1 obtained as above using a rotary coater, dried at 90°C for 4 minutes, and a non-silver salt photosensitive solution was applied. A silver salt photosensitive layer was provided. The coating amount after drying was 2 g/m2.

Non-silver salt photosensitive liquid composition Phenol-m-cresol/p-cresol formaldehyde copolycondensation resin (phenol: m-Fresol:
p-cresol = 2.0: 4.8: 3.2, molar ratio)
6.2g2.3.4-trihydroxybenzophenone/1.2-naphthoquinonediazide-5=sulfonic acid ester 1.5g Victoria Pure Blue BOH (manufactured by Hodugaya Chemical Co., Ltd.) 0.08g2-trichloromethyl-5 -(p-methoxystyryl)-1,
3,4-oxadiazole 0.15 g Methyl cellosolve 100 m
A photosensitive lithographic printing plate was prepared.

Silver halide emulsion composition: 45 g of phenol formaldehyde resin MP120HH (manufactured by Gun-ei Chemical Industry Co., Ltd.) was added to a mixture of 330 g of ethyl acetate and 120 g of methyl ethyl ketone, and 10 g of gelatin was added.
% solution in 600 m+2 and 60 m+2 of 10% aqueous solution of sodium 7-nylbenzenesulfonate and 10% of funnel oil.
Emulsion dispersed in a solution mixed with 150ml of methanol solution...1300g Silver chlorobromide gelatin emulsion (CQ-70 mol%, Br"30
Mol% of silver chlorobromide, average grain size...0.28μ, 55g of gelatin per kg of emulsion, containing 0.85mol of silver halide)...2000g 1.3-diethyl-5-(2-+3. 11% methanol solution of (3-sulfopropyl)benzoxazol-2-ylidene)ethylidenecothiohydantoin sodium salt...100m4
0.5% alkaline aqueous solution of 4-hydroxy-6-methyl-1,3,3a,7-tetrazaindene...
200m42.4-dichloro-6-hydroxy-5-)
2% aqueous solution of riazine...
・70mQ Next, using a transparent negative film as the original, photograph the document at a magnification of 16 times (area ratio) using a commercially available photographic enlarger, and then develop it for 32°Cl2O seconds with a developer with the following composition to fix the following composition. The image was fixed with a solution at 20° C. for 10 seconds. then 2
The entire surface of the plate was exposed to light using a KW metal halide lamp (Idolfin 2000 manufactured by Iwasaki Electric Co., Ltd.) at 8.0 mw/am2, treated with 50'O hot water, and then treated with 5DR-1 (manufactured by Konica Corporation) with water. 25℃ with developer solution diluted 6 times.
Development was performed for 40 seconds to produce lithographic printing plate sample-1.

Composition of developer water
...700mf2 meters

...3.0g sodium sulfite ...45.0g hydroquinone ...12.0g sodium carbonate (l hydrate) ...80.0g potassium bromide ...add 2g water
...This stock solution, referred to as 1Q, is diluted with water (1:2) and used.

fixer water
゛...700n+Q ammonium thiosulfate
...224g sodium sulfite
...Add 20g water...
・Set as 1000m12.

Next, this lithographic printing plate sample-1 was set in an offset printing machine (Komori Sprint L-25B), coated paper and New Bright G Beni (Toyo Ink Manufacturing Co., Ltd.) were used as printing ink.
(manufactured by Co., Ltd.).

When the dark parts of the halftone dot images of the lithographic printing plate sample 1 and the printed matter were observed with a 25@ magnifying glass, the halftone dot area ratio of 97% was completely reproduced.

Example 2 5 μm (7) Fe on the surface of a rolled steel foil with a thickness of 0.09 mm
The surface was plated to a surface roughness of 0.4 μm, and then heated to a temperature of 45°C and a current density of 40 A/d using a Sargent bath.
Cr plating with a thickness of 0.1 μm was carried out under the conditions of 100 m”, and as a hydrophilic treatment, 30 g/12 of alumina sol (Alumina Sol-200 manufactured by Nissan Chemical) with a particle size of 50 nm and 5 g of chromic acid were applied.
, 1 and dried to obtain Support-2.

Preparation and printing test of planographic printing plate sample-2 In the preparation of planographic printing plate sample-1 of Example 1, instead of using support-1, support-2 obtained as described above was used. Otherwise, the same treatment as in Example 1 was carried out to prepare a lithographic printing plate sample-2.

Next, printing was performed in the same manner as in Example 1, and observation revealed that the halftone dot area ratio of 97% was completely reproduced.

Comparative Example 1 In the production of Support-1 in Example 1, as a lumber-protecting layer, it was immersed in an aqueous solution of carboxymethylcellulose sodium salt and calcium acetate (0.07% by weight each) at room temperature for about 1 minute, washed with water and dried. Support 3 was obtained in the same manner as in Example 1 except that.

Preparation of lithographic printing plate sample-3 and printing test In the preparation of lithographic printing plate sample-1 of Example 1, the support 3 obtained as described above was used instead of the support 1. A lithographic printing plate sample-3 was prepared in the same manner as in Example 1.

Next, using this lithographic printing plate, printing was carried out in the same manner as in Example 1, and when observed, the halftone dot area ratio of 97% was not reproduced.

Comparative Example 2 In the production of Support 2 in Example 2, everything was the same as in Example 2 except that it was immersed in a 4% by weight potassium permanganate aqueous solution for 1 minute at 40°C, washed with water, and dried. In the same way, add support 4.

Preparation of lithographic printing plate sample-4 and printing test In the preparation of lithographic printing plate sample-1 of Example 1, the support-4 obtained as described above was used instead of the support-1. A lithographic printing plate sample-4 was prepared in exactly the same manner as in Example 1.
was created.

Next, using this lithographic printing plate sample 4, printing was carried out in the same manner as in Example 1, and when observed, the halftone dot area ratio of 97% was not reproduced.

〔Effect of the invention〕

The photosensitive lithographic printing plate of the present invention has good developability and gives printed matter with good image reproducibility.

Claims (1)

[Claims] In a photosensitive planographic printing plate having a non-silver salt photosensitive layer and a photosensitive silver halide salt emulsion layer on a support, the support of the photosensitive planographic printing plate is a support whose surface is treated with a sol of a metal compound. A photosensitive lithographic printing plate characterized by: