JPH0222365U - - Google Patents
Info
- Publication number
- JPH0222365U JPH0222365U JP10094788U JP10094788U JPH0222365U JP H0222365 U JPH0222365 U JP H0222365U JP 10094788 U JP10094788 U JP 10094788U JP 10094788 U JP10094788 U JP 10094788U JP H0222365 U JPH0222365 U JP H0222365U
- Authority
- JP
- Japan
- Prior art keywords
- mechanism section
- nitride film
- film growth
- section
- plasma cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 3
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Landscapes
- Separation Of Gases By Adsorption (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10094788U JPH065416Y2 (ja) | 1988-07-28 | 1988-07-28 | プラズマｃｖｄ窒化膜成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10094788U JPH065416Y2 (ja) | 1988-07-28 | 1988-07-28 | プラズマｃｖｄ窒化膜成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0222365U true JPH0222365U (enExample) | 1990-02-14 |
| JPH065416Y2 JPH065416Y2 (ja) | 1994-02-09 |
Family
ID=31329490
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10094788U Expired - Lifetime JPH065416Y2 (ja) | 1988-07-28 | 1988-07-28 | プラズマｃｖｄ窒化膜成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH065416Y2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0647234A (ja) * | 1992-06-09 | 1994-02-22 | Ebara Infilco Co Ltd | Ｃｖｄ法排ガスの除害方法 |
-
1988
- 1988-07-28 JP JP10094788U patent/JPH065416Y2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0647234A (ja) * | 1992-06-09 | 1994-02-22 | Ebara Infilco Co Ltd | Ｃｖｄ法排ガスの除害方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH065416Y2 (ja) | 1994-02-09 |
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