JPH02222471A - Coating agent having high weather-resistance - Google Patents
Coating agent having high weather-resistanceInfo
- Publication number
- JPH02222471A JPH02222471A JP4369089A JP4369089A JPH02222471A JP H02222471 A JPH02222471 A JP H02222471A JP 4369089 A JP4369089 A JP 4369089A JP 4369089 A JP4369089 A JP 4369089A JP H02222471 A JPH02222471 A JP H02222471A
- Authority
- JP
- Japan
- Prior art keywords
- coating agent
- curing
- vinyl monomer
- acid
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 59
- 238000000576 coating method Methods 0.000 claims abstract description 39
- 239000000178 monomer Substances 0.000 claims abstract description 36
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims abstract description 26
- 229920000642 polymer Polymers 0.000 claims abstract description 20
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 13
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 11
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 10
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000011737 fluorine Substances 0.000 claims abstract description 8
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims abstract description 7
- 238000010528 free radical solution polymerization reaction Methods 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 10
- 150000007529 inorganic bases Chemical class 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 239000000470 constituent Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 4
- 238000001723 curing Methods 0.000 description 32
- -1 aminooxy, mercapto Chemical class 0.000 description 21
- 238000004519 manufacturing process Methods 0.000 description 19
- 239000003973 paint Substances 0.000 description 17
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 14
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 238000006116 polymerization reaction Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 8
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 8
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 8
- 239000004566 building material Substances 0.000 description 8
- 239000000919 ceramic Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 229910001868 water Inorganic materials 0.000 description 8
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 239000008096 xylene Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 6
- 238000006253 efflorescence Methods 0.000 description 6
- 239000000839 emulsion Substances 0.000 description 6
- 206010037844 rash Diseases 0.000 description 6
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000004568 cement Substances 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- HEZMWWAKWCSUCB-PHDIDXHHSA-N (3R,4R)-3,4-dihydroxycyclohexa-1,5-diene-1-carboxylic acid Chemical compound O[C@@H]1C=CC(C(O)=O)=C[C@H]1O HEZMWWAKWCSUCB-PHDIDXHHSA-N 0.000 description 4
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- 238000002845 discoloration Methods 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
- 238000010526 radical polymerization reaction Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 4
- PYOKUURKVVELLB-UHFFFAOYSA-N trimethyl orthoformate Chemical compound COC(OC)OC PYOKUURKVVELLB-UHFFFAOYSA-N 0.000 description 4
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000010425 asbestos Substances 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 150000005690 diesters Chemical class 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000010422 painting Methods 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 229910052895 riebeckite Inorganic materials 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Natural products OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 239000000378 calcium silicate Substances 0.000 description 2
- 229910052918 calcium silicate Inorganic materials 0.000 description 2
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 239000006224 matting agent Substances 0.000 description 2
- 239000012860 organic pigment Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- MOVRCMBPGBESLI-UHFFFAOYSA-N prop-2-enoyloxysilicon Chemical compound [Si]OC(=O)C=C MOVRCMBPGBESLI-UHFFFAOYSA-N 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- BSSNZUFKXJJCBG-OWOJBTEDSA-N (e)-but-2-enediamide Chemical compound NC(=O)\C=C\C(N)=O BSSNZUFKXJJCBG-OWOJBTEDSA-N 0.000 description 1
- HDPNBNXLBDFELL-UHFFFAOYSA-N 1,1,1-trimethoxyethane Chemical compound COC(C)(OC)OC HDPNBNXLBDFELL-UHFFFAOYSA-N 0.000 description 1
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 1
- XHAFIUUYXQFJEW-UHFFFAOYSA-N 1-chloroethenylbenzene Chemical compound ClC(=C)C1=CC=CC=C1 XHAFIUUYXQFJEW-UHFFFAOYSA-N 0.000 description 1
- IEKHISJGRIEHRE-UHFFFAOYSA-N 16-methylheptadecanoic acid;propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CC(C)CCCCCCCCCCCCCCC(O)=O.CC(C)CCCCCCCCCCCCCCC(O)=O.CC(C)CCCCCCCCCCCCCCC(O)=O IEKHISJGRIEHRE-UHFFFAOYSA-N 0.000 description 1
- GGSRTHRSSCWGGK-UHFFFAOYSA-L 2,2-dibutyl-5-hydroxy-1,3,2-dioxastannepane-4,7-dione Chemical compound CCCC[Sn]1(CCCC)OC(=O)CC(O)C(=O)O1 GGSRTHRSSCWGGK-UHFFFAOYSA-L 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- MTLWTRLYHAQCAM-UHFFFAOYSA-N 2-[(1-cyano-2-methylpropyl)diazenyl]-3-methylbutanenitrile Chemical compound CC(C)C(C#N)N=NC(C#N)C(C)C MTLWTRLYHAQCAM-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ONIKNECPXCLUHT-UHFFFAOYSA-N 2-chlorobenzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1Cl ONIKNECPXCLUHT-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical group C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 1
- XSSBJTGLJOGGGP-UHFFFAOYSA-N 6-butyldec-5-en-5-ylsilane Chemical compound CCCCC([SiH3])=C(CCCC)CCCC XSSBJTGLJOGGGP-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000004923 Acrylic lacquer Substances 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 241001483078 Phyto Species 0.000 description 1
- 239000011398 Portland cement Substances 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical class [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000004650 carbonic acid diesters Chemical class 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- QLVWOKQMDLQXNN-UHFFFAOYSA-N dibutyl carbonate Chemical compound CCCCOC(=O)OCCCC QLVWOKQMDLQXNN-UHFFFAOYSA-N 0.000 description 1
- JJPZOIJCDNHCJP-UHFFFAOYSA-N dibutyl(sulfanylidene)tin Chemical compound CCCC[Sn](=S)CCCC JJPZOIJCDNHCJP-UHFFFAOYSA-N 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- UCQFCFPECQILOL-UHFFFAOYSA-N diethyl hydrogen phosphate Chemical compound CCOP(O)(=O)OCC UCQFCFPECQILOL-UHFFFAOYSA-N 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- KNXNFEMPRRJNKP-UHFFFAOYSA-N dioctyl phosphono phosphate propan-2-ol titanium Chemical compound [Ti].CC(C)O.CCCCCCCCOP(=O)(OP(O)(O)=O)OCCCCCCCC.CCCCCCCCOP(=O)(OP(O)(O)=O)OCCCCCCCC.CCCCCCCCOP(=O)(OP(O)(O)=O)OCCCCCCCC KNXNFEMPRRJNKP-UHFFFAOYSA-N 0.000 description 1
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical compound C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- UROXMPKAGAWKPP-UHFFFAOYSA-N dodecane-2-thiol Chemical compound CCCCCCCCCCC(C)S UROXMPKAGAWKPP-UHFFFAOYSA-N 0.000 description 1
- TVACALAUIQMRDF-UHFFFAOYSA-N dodecyl dihydrogen phosphate Chemical compound CCCCCCCCCCCCOP(O)(O)=O TVACALAUIQMRDF-UHFFFAOYSA-N 0.000 description 1
- CPBHJGWJMLDUNB-UHFFFAOYSA-N ethenoxysilane Chemical compound [SiH3]OC=C CPBHJGWJMLDUNB-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- GCSJLQSCSDMKTP-UHFFFAOYSA-N ethenyl(trimethyl)silane Chemical compound C[Si](C)(C)C=C GCSJLQSCSDMKTP-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- LDHBWEYLDHLIBQ-UHFFFAOYSA-M iron(3+);oxygen(2-);hydroxide;hydrate Chemical compound O.[OH-].[O-2].[Fe+3] LDHBWEYLDHLIBQ-UHFFFAOYSA-M 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- PXZQEOJJUGGUIB-UHFFFAOYSA-N isoindolin-1-one Chemical compound C1=CC=C2C(=O)NCC2=C1 PXZQEOJJUGGUIB-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- REOJLIXKJWXUGB-UHFFFAOYSA-N mofebutazone Chemical group O=C1C(CCCC)C(=O)NN1C1=CC=CC=C1 REOJLIXKJWXUGB-UHFFFAOYSA-N 0.000 description 1
- 238000013008 moisture curing Methods 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 238000012015 optical character recognition Methods 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- DNAJDTIOMGISDS-UHFFFAOYSA-N prop-2-enylsilane Chemical compound [SiH3]CC=C DNAJDTIOMGISDS-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- MNMVKGDEKPPREK-UHFFFAOYSA-N trimethyl(prop-2-enoxy)silane Chemical compound C[Si](C)(C)OCC=C MNMVKGDEKPPREK-UHFFFAOYSA-N 0.000 description 1
- HYWCXWRMUZYRPH-UHFFFAOYSA-N trimethyl(prop-2-enyl)silane Chemical compound C[Si](C)(C)CC=C HYWCXWRMUZYRPH-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- PKJOUIVGCFHFTK-UHFFFAOYSA-L zinc;hexanoate Chemical compound [Zn+2].CCCCCC([O-])=O.CCCCCC([O-])=O PKJOUIVGCFHFTK-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は窯業系建材などにおいて、養生前の塗装を可能
にし、更に高温高圧水蒸気養生によって無機質基材の養
生と同時に塗膜を形成させることができる高耐候性塗装
剤に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention enables painting of ceramic building materials before curing, and furthermore, forms a coating film at the same time as curing the inorganic base material by high-temperature and high-pressure steam curing. The present invention relates to highly weather-resistant coating agents.
[従来の技術]
近年、主に住宅用の外壁、屋根材として、窯業系建材の
需要が多い。耐候性、耐久性が良く、かつ外観も優れて
いるからである。窯業系建材は無機質基材を成型、養生
硬化することにより得られるが、その美観や保護のため
、無機質基材成型後に種々の方法で表面塗装が実施され
る。無機質基材成型品の表面塗装法として養生硬化後に
行う方法と養生硬化前に行う方法がある。[Prior Art] In recent years, there has been a great demand for ceramic building materials, mainly as exterior walls and roofing materials for residential buildings. This is because it has good weather resistance, durability, and appearance. Ceramic building materials are obtained by molding inorganic base materials and curing and curing them, but for the sake of beauty and protection, surface coating is performed by various methods after molding the inorganic base materials. There are two methods of surface coating for inorganic base material molded products: one after curing and the other before curing.
(1)養生硬化後の塗装法として、■成型品表面に直接
塗料を塗装し乾燥する方法、■成型直後の成型品表面に
着色セメントスラリーを塗布し養生硬化後、着色又は透
明塗料を塗装し乾燥させる方法が行われている。(1) Painting methods after curing and curing include: ■ Applying paint directly to the surface of the molded product and drying; ■ Applying a colored cement slurry to the surface of the molded product immediately after curing and applying colored or transparent paint after curing. A drying method is used.
(2)養生硬化前の塗装方法として、無機質基材成型後
直ちに、■着色塗料を塗装、■着色セメントスラリーを
塗布し続いて透明塗料を塗装、又は■着色セメントスラ
リーと合成樹脂エマルジョンの複合塗装材を塗布、など
の塗装を行った後、養生乾燥させる方法がある。(2) As a coating method before curing and curing, immediately after molding the inorganic base material, ■ apply a colored paint, ■ apply a colored cement slurry and then apply a transparent paint, or ■ apply a composite coating of a colored cement slurry and a synthetic resin emulsion. There is a method of curing and drying after applying a coating such as coating wood.
(3)また、近年、塗膜の耐久性(耐候性・耐水性・密
着性・二次白華性など)や、塗膜外観(塗膜の変色・劣
化・割れ・泡・−次白華性など)の向上及び生産工程の
短縮化、生産コストの低減のため、更には窯業系建材の
軽量化、高強度化が一層要求される中で、高温高圧水蒸
気養生を生産工程に取り入れると共に、養生前に塗装剤
を塗布し無機質基材の養生と塗装剤の硬化を同時に行う
方法が提案されている。この用途に使用される塗装剤と
して、例えば特開昭63−61011号公報記載の合成
樹脂エマルジョンが知られている。(3) In recent years, the durability of paint films (weather resistance, water resistance, adhesion, secondary efflorescence, etc.) and the appearance of paint films (discoloration, deterioration, cracking, bubbles, secondary efflorescence, etc.) With the increasing demand for lighter weight and higher strength ceramic building materials in order to improve performance (e.g.), shorten the production process, and reduce production costs, we are incorporating high-temperature and high-pressure steam curing into the production process. A method has been proposed in which a coating agent is applied before curing to simultaneously cure the inorganic substrate and harden the coating agent. As a coating agent used for this purpose, for example, a synthetic resin emulsion described in JP-A-63-61011 is known.
[発明が解決しようとする課題]
従来の(1)、(2)いずれの方法も塗膜の耐久性や塗
膜外観の改善、生産工程の短縮化、生産コストの低減等
の達成が不十分であり、長期使用による塗膜光沢の低下
や変色、クラックの発生等の問題があった。また(2)
の場合は特に合成樹脂エマルジョンに起因する、湿潤造
膜性の問題、養生時に発生したアルカリ分による塗膜の
劣化などの問題もあった。(3)の方法は、生産工程の
短縮化や生産コストの低減達成のためには有用である。[Problems to be solved by the invention] Both conventional methods (1) and (2) are insufficient to improve the durability of the coating film, improve the appearance of the coating film, shorten the production process, reduce production costs, etc. However, there were problems such as a decrease in the gloss of the coating film, discoloration, and the occurrence of cracks due to long-term use. Also (2)
In this case, there were problems such as wet film-forming properties caused by the synthetic resin emulsion and deterioration of the coating film due to alkaline content generated during curing. Method (3) is useful for shortening the production process and reducing production costs.
しかし、汎用されるアクリル系エマルジョンの場合、湿
潤造膜性や白華防止性が劣り、更に加熱により塗膜のア
ルカリ劣化が著しく促進されるため高温高圧水蒸気養生
前の塗装が困難であるなどの問題や、得られた窯業系建
材は耐久性が乏しいという問題もあった。すなわち、従
来、高温高圧水蒸気養生法に適用でき、塗膜の形成と塗
膜の耐久性の両方を達成できる塗装剤はなかった。However, commonly used acrylic emulsions have poor wet film-forming properties and efflorescence prevention properties, and furthermore, heating significantly accelerates alkaline deterioration of the coating film, making it difficult to apply the coating before curing with high-temperature, high-pressure steam. There was also the problem that the resulting ceramic building materials lacked durability. That is, until now, there has been no coating agent that can be applied to high-temperature, high-pressure steam curing methods and that can achieve both the formation of a coating film and the durability of the coating film.
このように、従来の塗装法や塗装剤はいずれも、現在高
まっている、メンテナンスフリー、高耐久性、高耐汚染
性などの要求を側底、満足させることができなかった。As described above, none of the conventional coating methods and coating agents has been able to satisfy the currently increasing demands for maintenance-free, high durability, and high stain resistance.
[課題を解決するための手段]
本発明者らは、塗装剤の湿気による硬化という性質に着
目し、基材が湿潤である状態で塗装し、その後加熱する
ことにより更に塗膜の耐久性を高める方法及び該方法に
適した塗装剤について種々研究を重ねた結果、本発明に
到達した。[Means for Solving the Problems] The present inventors have focused on the property of coating agents that harden due to moisture, and have further improved the durability of the coating film by applying the coating while the substrate is wet and then heating it. The present invention was achieved as a result of various studies on a method for increasing the amount of water and a coating agent suitable for the method.
すなわち、本発明は溶液重合によって得られる重合体で
、その構成成分が加水分解性シリル基を含有する単量体
単位(a)とその他のビニル系単量体単位(ロ)からな
る重合体を含むことを特徴とする高温高湿下で塗膜形成
する高耐候性塗装剤である。That is, the present invention is a polymer obtained by solution polymerization, the constituent components of which are a monomer unit (a) containing a hydrolyzable silyl group and another vinyl monomer unit (b). It is a highly weather-resistant coating agent that forms a coating film under high temperature and high humidity conditions.
本発明における加水分解性シリル基を含有する単量体単
位(a)となる単量体としては次式%式%
[式中、R2は重合性二重結合を有する有機基、R2は
炭素数1〜10までのアルキル基、アリール基及びアラ
ルキル基より選ばれる1価の炭化水素基、Xはハロゲン
、アルコキシ、アシロオキシ、ケトキシメート、アミノ
、酸アミド、アミノオキシ、メルカプト及びアルケニル
オキシ基からなる群より選ばれる加水分解性基、nは1
〜3の整数を示す]で示される加水分解性シリル基含有
ビニル化合物が挙げられる。具体的には、例えば加水分
解性シリル基含有ビニルシラン[CH2=CH51(O
CH3) 3、CH2=CH51(OCH2CH3)
a、CI、=CH5i(OCH2CH20Ct13)
3、など]、加水分解性シリル基含有(メタ)アクリロ
キシシラン[CH2=CIC0OCH2CH2CH2S
l (OCRs) a、CH2=CHC00CHzCH
zCH2Si(OCH2CHs) s、cH2=CHC
口0CH2CH2CH2SiC]、 、ル基含有アリ
ルシラン[CH2=CHCH251(OCH2CH3)
s、CH2=CHCH2NHCH2CH2CH25i
(OCH3) 3、C,PISCH20COCH=CH
,、C,F、C1,DCDC(Me)=CH2、CF3
(cF2) zcH20cOc(Me)=CHz、C
F s (cF 2) S (cI(2) 20COC
(Me) =CH2、CF s (cF 2) s (
cH2) 20COC(Me) =CH2、その他の加
水分解性シリル基含有不飽和シラン[CHz=CHCg
H4CH2CH,5i(OCHs) s、CH2=(J
IC6H4CH2NHCH2CH2CH2Si (OC
H2CH3) 3など]などが挙げられる。In the present invention, the monomer that becomes the monomer unit (a) containing a hydrolyzable silyl group has the following formula % [wherein, R2 is an organic group having a polymerizable double bond, and R2 is the number of carbon atoms] A monovalent hydrocarbon group selected from 1 to 10 alkyl groups, aryl groups and aralkyl groups, X is from the group consisting of halogen, alkoxy, acyloxy, ketoximate, amino, acid amide, aminooxy, mercapto and alkenyloxy groups selected hydrolyzable group, n is 1
The hydrolyzable silyl group-containing vinyl compound represented by the following formula represents an integer of 3 to 3. Specifically, for example, hydrolyzable silyl group-containing vinylsilane [CH2=CH51(O
CH3) 3, CH2=CH51 (OCH2CH3)
a, CI, =CH5i(OCH2CH20Ct13)
3, etc.], hydrolyzable silyl group-containing (meth)acryloxysilane [CH2=CIC0OCH2CH2CH2S
l (OCRs) a, CH2=CHC00CHzCH
zCH2Si(OCH2CHs) s, cH2=CHC
0CH2CH2CH2SiC], , allylsilane containing group [CH2=CHCH251(OCH2CH3)
s, CH2=CHCH2NHCH2CH2CH25i
(OCH3) 3, C, PISCH20COCH=CH
,,C,F,C1,DCDC(Me)=CH2,CF3
(cF2) zcH20cOc(Me)=CHz, C
F s (cF 2) S (cI(2) 20 COC
(Me) = CH2, CF s (cF 2) s (
cH2) 20COC(Me)=CH2, other hydrolyzable silyl group-containing unsaturated silanes [CHz=CHCg
H4CH2CH,5i(OCHs) s, CH2=(J
IC6H4CH2NHCH2CH2CH2Si (OC
H2CH3) 3, etc.].
これらのうちで好ましいものは、加水分解性シリル基含
有(メタ)アクリロキシシランである。Among these, hydrolyzable silyl group-containing (meth)acryloxysilane is preferred.
その他の重合性単量体単位(b)としては、例えば含ふ
っ素ビニル系単量体単位(c)が挙げられる。その単位
を与える単量体として具体的には、例えば次の化合物が
挙げられる。Examples of other polymerizable monomer units (b) include fluorine-containing vinyl monomer units (c). Specific examples of monomers providing the unit include the following compounds.
(1)下記のパーフルオロアルキル基含有(メタ)アク
リル酸エステル:
C,F、、CHzCHCH,OCOC(Me)=CH,
、H
CsF I 7 (cH2) I+ 0COC(Me)
=CH2、C?F r 5cON (Et) (cH
2) 20COC(Me) =CH2、C6F I 3
S02N (Me) (cH2) 20COCH=CH
2、CsF I ?502N (Pr) (cH2)
20COCH=CH2、C8F、isO□N(Me)
(cH2) zOcOc(Me)=CHz、CsF l
7S02N (Me) (cH2) 1oOcOcH
2cH=cH2、CH2=CHCOOCH2CH2、
(:sF l 7SO2N (cHzCHzOCOCH
=Cilz) 2、HCFz(cFz)ycHzOcO
c(Me)=CH2など。(1) The following perfluoroalkyl group-containing (meth)acrylic acid ester: C, F,, CHzCHCH, OCOC(Me)=CH,
, H CsF I 7 (cH2) I+ 0COC(Me)
=CH2,C? F r 5cON (Et) (cH
2) 20COC(Me) = CH2, C6F I3
S02N (Me) (cH2) 20COCH=CH
2. CsF I? 502N (Pr) (cH2)
20COCH=CH2, C8F, isO□N(Me)
(cH2) zOcOc(Me)=CHz, CsF l
7S02N (Me) (cH2) 1oOcOcH
2cH=cH2, CH2=CHCOOCH2CH2, (:sF l 7SO2N (cHzCHzOCOCH
=Cilz) 2, HCFz(cFz)ycHzOcO
c(Me)=CH2, etc.
偉)上記(メタ)アクリル酸エステルの場合と同様のパ
ーフルオロアルキル基を持つマレイン酸モノまたはジエ
ステル:
CsF+t (cH2)++DCOCI=CHCOOM
e。C) Maleic acid mono- or diester having a perfluoroalkyl group similar to the above (meth)acrylic acid ester: CsF+t (cH2)++DCOCI=CHCOOM
e.
Cl1F!7 (cH2)+10CDCI=CHCOO
CH2C7FISなど。Cl1F! 7 (cH2)+10CDCI=CHCOO
CH2C7FIS etc.
(3)上記と同様のパーフルオロアルキル基を有するビ
ニルエーテルマタはアリルエーテル:C7FISCH2
0CH=CH2、(、rF+5CHzOCHzCH=C
tlzなど。(3) Vinyl ether having the same perfluoroalkyl group as above is allyl ether: C7FISCH2
0CH=CH2, (, rF+5CHzOCHzCH=C
tlz etc.
(4)上記(メタ)アクリル酸エステルの場合と同様の
パーフルオロアルキル基を有するビニルスルホン酸:
C,P、7SO2NHCH2SO□Cll=CH,など
。(4) Vinyl sulfonic acid having a perfluoroalkyl group similar to the above (meth)acrylic acid ester: C, P, 7SO2NHCH2SO□Cll=CH, etc.
(5)フルオロオレフィン系単量体:
クロロトリフルオロエチレン、テトラフルオロエチレン
、ヘキサフルオロプロピレンなど。(5) Fluoroolefin monomers: chlorotrifluoroethylene, tetrafluoroethylene, hexafluoropropylene, etc.
[上記において、Etはエチル基を、Prはプロピル基
を示す。]
これらのうちで好ましいものは、炭素数3〜21のパー
フルオロアルキル基を含む(メタ)アクリル酸エステル
である。[In the above, Et represents an ethyl group, and Pr represents a propyl group. ] Preferred among these are (meth)acrylic esters containing a perfluoroalkyl group having 3 to 21 carbon atoms.
必要により用いられる(c)以外のその他の重合性単量
体単位を与える単量体としては、 (メタ)アクリル酸
アルキルエステル[炭素数1〜12のアルキルエステル
、例えば(メタ)アクリル酸メチル、(メタ)アクリル
酸エチル、 (メタ)アクリル酸n−ブチル、 (メタ
)アクリル酸2−エチルヘキシルなど];(メタ)アク
リル酸ヒドロキシアルキル(アルキル基の炭素数2〜1
0)[(メタ)アクリル酸ヒドロキシエチル、 (メタ
)アクリル酸ヒドロキシプロピル、 (メタ)アクリル
酸ヒドロキシへキシル];芳香族ビニル単量体(スチレ
ン、α−メチルスチレン、α−クロルスチレンなど);
ハロゲン含有単量体(塩化ビニル、塩化ビニリデンなど
);アルキル又はシクロアルキルビニルエーテル(メチ
ルビニルエーテル、シクロヘキシルビニルエーテルなど
);ビニルエステル(酢酸ビニルなど);ニトリル基含
有単量体(アクリロニトリルなど);アミド基含有単量
体[(メタ)アクリルアミド、クロトンアミド、N−メ
チロールアクリルアミド、フマル酸ジアミドなど] ;
カルボキシル基含有単量体[(メタ)アクリル酸、?L
/イン酸、無水マレイン酸など] ;非加水分解性のシ
リル基含宥単量体としては、例えばアルキルシランを含
有する単量体としてトリメチルビニルシラン、トリブチ
ルビニルシラン、ジブチルメチルビニルシラン、アリル
トリメチルシラン、トリメチルビニロキシシラン、アリ
ロキシトリメチルシランが挙げられる。ポリシロキサン
基を含有する単量体として1,3.5−)サメチル−1
,3,5−トリビニルシクロトリシロキサン、1.1.
1.3.3−ペンタメチル−3−ビニルシロキサン、C
H2=C(cH3)C00(cH2) 3si[03i
(c1,> 311、CH2=CHCOO(cH2)
s [Si (cH3) 20] 、、Si (cH3
) s、CHz=C(cHs)C00CgH4[5i(
cH3)zO]n5i(cHa)a、CH2=C(cH
3)C00(cH2) 3[sl (cHa) 20]
、、St (cl(、) 3、Cl2=C(c)+3)
COO(cH2) 、[Si (cH3) (c,tl
s)0]hSi (cH3) 3、Ctlz=C(cH
s)COO(cHz) a[si (c6H5) 20
]、、5i(cL)s、CHz=CHSt (0[5i
(ctla) 201−St (cH3) 3) a
(ただし、n=0〜130である)などが挙げられる
。Monomers that provide other polymerizable monomer units other than (c), which may be used as necessary, include (meth)acrylic acid alkyl esters [alkyl esters having 1 to 12 carbon atoms, such as methyl (meth)acrylate, Ethyl (meth)acrylate, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, etc.]; Hydroxyalkyl (meth)acrylate (alkyl group has 2 to 1 carbon atoms)
0) [hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, hydroxyhexyl (meth)acrylate]; aromatic vinyl monomer (styrene, α-methylstyrene, α-chlorostyrene, etc.);
Halogen-containing monomers (vinyl chloride, vinylidene chloride, etc.); alkyl or cycloalkyl vinyl ethers (methyl vinyl ether, cyclohexyl vinyl ether, etc.); vinyl esters (vinyl acetate, etc.); nitrile group-containing monomers (acrylonitrile, etc.); amide group-containing Monomers [(meth)acrylamide, crotonamide, N-methylolacrylamide, fumaric acid diamide, etc.];
Carboxyl group-containing monomer [(meth)acrylic acid, ? L
/inic acid, maleic anhydride, etc.]; Non-hydrolyzable silyl group-containing monomers include, for example, alkylsilane-containing monomers such as trimethylvinylsilane, tributylvinylsilane, dibutylmethylvinylsilane, allyltrimethylsilane, and trimethyl. Examples include vinyloxysilane and allyloxytrimethylsilane. 1,3.5-)samethyl-1 as a monomer containing a polysiloxane group
, 3,5-trivinylcyclotrisiloxane, 1.1.
1.3.3-pentamethyl-3-vinylsiloxane, C
H2=C(cH3)C00(cH2) 3si[03i
(c1, > 311, CH2=CHCOO(cH2)
s [Si (cH3) 20] ,,Si (cH3
) s, CHz=C(cHs)C00CgH4[5i(
cH3)zO]n5i(cHa)a, CH2=C(cH
3) C00 (cH2) 3 [sl (cHa) 20]
,,St (cl(,) 3, Cl2=C(c)+3)
COO (cH2), [Si (cH3) (c, tl
s)0]hSi (cH3) 3, Ctlz=C(cH
s) COO (cHz) a[si (c6H5) 20
],,5i(cL)s,CHz=CHSt(0[5i
(ctla) 201-St (cH3) 3) a
(However, n=0 to 130).
これらの中で好ましいものは、 (メタ)アクリル酸ア
ルキルおよび芳香族ビニル単量体であり、特に好ましい
ものはメタクリル酸メチル、アクリル酸n−ブチルおよ
びスチレンである。Preferred among these are alkyl (meth)acrylates and aromatic vinyl monomers, and particularly preferred are methyl methacrylate, n-butyl acrylate, and styrene.
共重合体中の各単位の含有量は、通常、(a)が1〜3
0重量部、(b)が70〜99重量部であり、好ましく
は(a)が2〜20重量部、(5)が80〜98重量部
であり、特に好ましくは(a)が3〜10重量部、ら)
が90〜97重量部である。(a)が1重量部未満であ
ると塗装された塗膜の硬化が不十分で塗膜がもろくなっ
たり、密着性が不良になったりする。30重量部を越え
るとオートクレーブ中の高温高湿条件下でシリル基の硬
化による塗膜の架橋密度が大きすぎて塗膜にクラックを
生じる。(b)が70重量部未満であると(a)の30
重量部を越える場合と同じ結果になり、99重量部を越
えると(a)が1重量部未満の場合と同じ結果になる。The content of each unit in the copolymer is usually 1 to 3 (a)
0 parts by weight, (b) is 70 to 99 parts by weight, preferably (a) is 2 to 20 parts by weight, and (5) is 80 to 98 parts by weight, particularly preferably (a) is 3 to 10 parts by weight. Parts by weight, et al.
is 90 to 97 parts by weight. If (a) is less than 1 part by weight, the applied coating film will not be sufficiently cured and the coating film will become brittle or have poor adhesion. If it exceeds 30 parts by weight, the crosslinking density of the coating film due to curing of the silyl groups under the high temperature and high humidity conditions in an autoclave will be too high, causing cracks in the coating film. If (b) is less than 70 parts by weight, 30 parts by weight of (a)
If it exceeds 99 parts by weight, the result will be the same as if (a) is less than 1 part by weight.
また(b)の単位として(c)を導入すると−得られた
塗膜の耐候性が更に向上し耐汚染性も発現する。(c)
の単位の含有量は通常1〜70重量部であり、好ましく
は5〜50重量部である。(c)が1重量部未満である
とふっ素による耐候性の向上がみられず耐汚染性も発現
しない。70重量部を越えて用いてもこれ以上ふっ素に
よる耐候性および耐汚染性が向上せず、不経済である。Furthermore, when (c) is introduced as a unit of (b), the weather resistance of the resulting coating film is further improved and stain resistance is also exhibited. (c)
The content of the units is usually 1 to 70 parts by weight, preferably 5 to 50 parts by weight. If (c) is less than 1 part by weight, no improvement in weather resistance due to fluorine will be observed and stain resistance will not be developed. Even if more than 70 parts by weight is used, the weather resistance and stain resistance due to fluorine will not be improved any further, which is uneconomical.
本発明における共重合体は(a)、(b)の各単量体を
熱重合、光重合又は放射線重合などのラジカル重合に従
って塊状、又は溶液重合させることにより製造できる。The copolymer in the present invention can be produced by bulk or solution polymerization of each monomer (a) and (b) according to radical polymerization such as thermal polymerization, photopolymerization, or radiation polymerization.
好ましい重合方法は有機溶剤中でラジカル開始剤を使用
したラジカル重合[溶液重合の場合、使用される有機溶
剤としては、芳香族炭化水素(トルエン、キシレン、エ
チルベンゼンなど)、脂肪族炭化水素(ヘキサン、ヘプ
タン、シクロヘキサンなど)、脂肪族エステル(酢酸エ
チル、酢酸n−ブチルなど)、脂肪族ケトン(アセトン
、メチルエチルケトン、メチルイソブチルケトン、ジ−
n−ブチルケトン、シクロヘキサノンなど)、脂肪族エ
ーテル(ジオキサン、テトラヒドロフランなど)、セロ
ソルブ(エチルセロソルブ、n−ブチルセロソルブ、セ
ロソルブアセテートなど)、ハロゲン化炭化水素(四塩
化炭素、二塩化エチレンなど)など、およびこれらの二
種以上の混合物が挙げられる。好ましいものはトルエン
、キシレン、メチルエチルケトン、メチルイソブチルケ
トン、酢酸n−ブチル、セロソルブアセテートおよび二
塩化エチレンの単独又はこれらの二種以上の混合物であ
る。A preferred polymerization method is radical polymerization using a radical initiator in an organic solvent [In the case of solution polymerization, the organic solvents used include aromatic hydrocarbons (toluene, xylene, ethylbenzene, etc.), aliphatic hydrocarbons (hexane, heptane, cyclohexane, etc.), aliphatic esters (ethyl acetate, n-butyl acetate, etc.), aliphatic ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, di-
n-butylketone, cyclohexanone, etc.), aliphatic ethers (dioxane, tetrahydrofuran, etc.), cellosolves (ethyl cellosolve, n-butyl cellosolve, cellosolve acetate, etc.), halogenated hydrocarbons (carbon tetrachloride, ethylene dichloride, etc.), and these Examples include mixtures of two or more of these. Preferred are toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, n-butyl acetate, cellosolve acetate and ethylene dichloride, singly or in mixtures of two or more thereof.
有機溶剤の(a)、ら)各単量体の合計重量に対する割
合は任意に選択できるが、通常0.2:2〜5:11好
ましくは0.5:1〜2:1である。The ratio of the organic solvent to the total weight of each monomer (a), et al. can be arbitrarily selected, but is usually 0.2:2 to 5:11, preferably 0.5:1 to 2:1.
ラジカル重合反応を行う場合、使用されるラジカル重合
開始剤としてはアゾ系化合物(アゾビスイソブチロニト
リル、アゾビスイソバレロニトリルなど)、過酸化物(
ベンゾイルパーオキシド、ジ−t−ブチルバーオキシド
、クメンハイドロパーオキシドなど)、レドックス系化
合物(ベンゾイルパーオキシド/N、 N−ジメチルア
ニリンなど)などが挙げられる。好ましいのはアゾ系化
合物である。When carrying out a radical polymerization reaction, the radical polymerization initiators used include azo compounds (azobisisobutyronitrile, azobisisovaleronitrile, etc.), peroxides (
Examples include benzoyl peroxide, di-t-butyl peroxide, cumene hydroperoxide, etc.), redox compounds (benzoyl peroxide/N, N-dimethylaniline, etc.). Preferred are azo compounds.
重合開始剤の添加量は(a)、(b)の各単量体の固形
分合計重量に対し、通常0.001〜20%、好ましく
は0.1〜10%である。The amount of the polymerization initiator added is usually 0.001 to 20%, preferably 0.1 to 10%, based on the total solid weight of each monomer (a) and (b).
また、場合によっては連鎖移動剤(n−ラウリルメルカ
プタン、 n−ドデシルメルカプタン、を−ドデシルメ
ルカプタン、T−メルカプトプロピルトリメトキシシラ
ン、γ−メルカプトプロピルメチルジメトキシシランな
ど)を加え分子量を調節することができる。In some cases, a chain transfer agent (n-laurylmercaptan, n-dodecylmercaptan, 2-dodecylmercaptan, T-mercaptopropyltrimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, etc.) may be added to adjust the molecular weight. .
ラジカル重合反応の反応温度は通常50〜150℃、好
ましくは70〜130℃である。反応時間は通常1〜1
0時間であり、好ましくは2〜7時間である。The reaction temperature of the radical polymerization reaction is usually 50 to 150°C, preferably 70 to 130°C. The reaction time is usually 1 to 1
0 hours, preferably 2 to 7 hours.
重合の終点は赤外吸収スペクトルの二重結合の吸収(1
648cm −’ )が消滅することによって、またガ
スクロマトグラフィー分析で未反応の単量体が減少する
ことによって確認できる。The end point of polymerization is the double bond absorption (1
This can be confirmed by the disappearance of 648 cm −' ) and by the decrease of unreacted monomers in gas chromatography analysis.
加水分解性シリル基を含有する重合体の分子量は特に制
限されないが、通常i、 ooo〜100.000、好
ましくは3.000〜50.000である。重合体は加
水分解性シリル基を含有するので大気中に暴露されても
常温で網状組織を形成して硬化するが、高温高圧水蒸気
養生の場合には系内の水分と高温により更に一層硬化が
促進される。その硬化機構は次に示すように加水分解性
シリル基の湿気硬化による。The molecular weight of the polymer containing a hydrolyzable silyl group is not particularly limited, but is usually i,ooo to 100,000, preferably 3,000 to 50,000. Since the polymer contains hydrolyzable silyl groups, it will harden by forming a network structure at room temperature even when exposed to the atmosphere, but in the case of high-temperature, high-pressure steam curing, it will harden even further due to the moisture in the system and the high temperature. promoted. The curing mechanism is based on moisture curing of hydrolyzable silyl groups as shown below.
一3i−0−R+ H2O→ −5i−OH+ R
OH−Si−OH+HO−Si−→−St 0−5i−
+ H20本発明における高耐候性塗装剤としては、加
水分解性シリル基含有重合体を単独で用いて皮膜として
もよいが、他の皮膜樹脂を添加して用いてもよい。他の
樹脂としては現在、塗料、コーティング剤として用いら
れている種々の樹脂、例えばラッカー系塗料、アクリル
ラッカー塗料、熱硬化アクリル塗料、アルキッド塗料、
エポキシ塗料、エステル系塗料、シリコン系塗料、シリ
ル基含有塗料等に用いられているものが挙げられる。特
に好ましいものとしては、シリル基含有塗料に用いられ
ているものが挙げられる。-3i-0-R+ H2O→ -5i-OH+ R
OH-Si-OH+HO-Si-→-St 0-5i-
+ H20 As the highly weather-resistant coating agent in the present invention, a hydrolyzable silyl group-containing polymer may be used alone to form a film, but other film resins may be added thereto. Other resins include various resins currently used as paints and coatings, such as lacquer paints, acrylic lacquer paints, thermosetting acrylic paints, alkyd paints,
Examples include those used in epoxy paints, ester paints, silicone paints, silyl group-containing paints, and the like. Particularly preferred are those used in silyl group-containing paints.
本発明の塗装剤には必要により加水分解性シリル基の硬
化触媒、安定剤、溶剤、充填剤、顔料、添加剤(紫外線
吸収剤、耐熱性向上剤、レベリング剤、たれ防止剤、艶
消し剤など)を混入併用することが可能である。The coating agent of the present invention may contain, if necessary, a curing catalyst for hydrolyzable silyl groups, stabilizers, solvents, fillers, pigments, and additives (ultraviolet absorbers, heat resistance improvers, leveling agents, anti-sagging agents, matting agents). etc.) can be used in combination.
加水分解性シリル基の硬化触媒としては従来からシラノ
ール縮合触媒として使用されているものでよく、有機チ
タネート系化合物[イソプロピルトリイソステアロイル
チタネート、イソプロピルトリ (ジオクチルピロホス
フェート)チタネート、テトライソプロビルジ(ラウリ
ルホスファイト)チタネートなど]、有機アルミニウム
系化合物(アセトアルコキシアルミニウムジイソプロピ
レートなど)、カルボン酸型錫化合物(ジオクチル酸錫
、ジブチル錫ジラウレート、ジブチル錫マレートなど)
、スルフィド型、メルカプチド型などの含硫黄系有機錫
化合物(ジブチル錫スルフィドなど)、その他カルボン
酸金属塩(酢酸ナトリウム、カプロン酸亜鉛、オクチル
酸鉛、ナフテン酸コバルトなど)、酸性燐酸エステル(
モノメチル酸性燐酸エステル、ジメチル酸性燐酸エステ
ル、ジエチル酸性燐酸エステル、モノブチル酸性燐酸エ
ステルなど)、カルボン酸およびその酸無水物(アジピ
ン酸、マレイン酸、クエン酸、イタコン酸、コハク酸、
フタル酸、トリメリット酸、無水マレイン酸、無水フタ
ル酸など)、アミノシラン(γ−アミノプロピルトリエ
トキシシラン、T−アミノプロピルトリメトキシシラン
など)、アミンおよびその塩(トリエチルアミン、ジブ
チルアミン−2−ヘキソエート、環式アミジンおよびそ
の塩など)、第4級アンモニウム塩(テトラブチルアン
モニウムハイドロキシドなど)などの硬化触媒が挙げら
れる。これらの触媒は単独でも二種以上を混合して使用
してもよい。硬化触媒の添加量はシリル基含有重合体に
対し、通常0.001〜20重量%である。The curing catalyst for hydrolyzable silyl groups may be those conventionally used as silanol condensation catalysts, such as organic titanate compounds [isopropyl triisostearoyl titanate, isopropyl tri(dioctyl pyrophosphate) titanate, tetraisoprobyl di(lauryl phosphate), etc. phyto) titanates, etc.], organic aluminum compounds (acetalkoxyaluminum diisopropylate, etc.), carboxylic acid type tin compounds (tin dioctylate, dibutyltin dilaurate, dibutyltin malate, etc.)
, sulfide type, mercaptide type, and other sulfur-containing organotin compounds (dibutyltin sulfide, etc.), other carboxylic acid metal salts (sodium acetate, zinc caproate, lead octylate, cobalt naphthenate, etc.), acidic phosphate esters (
monomethyl acid phosphate, dimethyl acid phosphate, diethyl acid phosphate, monobutyl acid phosphate, etc.), carboxylic acids and their acid anhydrides (adipic acid, maleic acid, citric acid, itaconic acid, succinic acid,
Phthalic acid, trimellitic acid, maleic anhydride, phthalic anhydride, etc.), aminosilanes (γ-aminopropyltriethoxysilane, T-aminopropyltrimethoxysilane, etc.), amines and their salts (triethylamine, dibutylamine-2-hexoate, etc.) , cyclic amidine and its salts), and quaternary ammonium salts (tetrabutylammonium hydroxide, etc.). These catalysts may be used alone or in combination of two or more. The amount of curing catalyst added is usually 0.001 to 20% by weight based on the silyl group-containing polymer.
シリル基の安定剤としては、加水分解性エステル、アル
コール及び炭酸、はう酸、燐酸、亜燐酸等の完全エステ
ルなどがよく、加水分解性エステルとしては、オルトギ
酸トリアルキル(オルトギ酸トリメチル、オルトギ酸ト
リエチルなど)、オルト酢酸トリアルキル(オルト酢酸
トリメチルなど)、シラン類(メチルトリメトキシシラ
ン、テトラメトキシシラン、テトラエトキシシラン、テ
トラn−ブトキシシラン、ビニルトリエトキシシラン、
γ−メタクリロキシプロピルトリメトキシシラン、T−
グリシドキシプロビルトリメトキシシラン、T−ウレイ
ドプロピルトリエトキシシラン、シリケートなど)が挙
げられる。アルコールとしては、メタノール、エタノー
ル、インプロパツール、イソブチルアルコール、オクチ
ルアルコール、セロソルブ、メチルセロソルブなどが挙
ケられる。炭酸、はう酸、燐酸、P−OHのない燐酸な
どの完全エステルとしては、炭酸ジエステル(炭酸ジメ
チル、炭酸ジエチル、炭酸エチレン、炭酸ジ−n−ブチ
ル、炭酸ジフェニルなど)、はう酸トリエステル(はう
酸トリエチル、はう酸トリーn−ブチル、はう酸トリフ
ェニルなど)、燐酸トリエステル(燐酸トリエチル、燐
酸トリーローブチル、燐酸トリフェニルなど) 、P−
DHのない燐酸モノエステル又はジエステル(エチル燐
酸ジエチル、フェニル燐酸ジフェニルなどのジエステル
又はジメチル燐酸メチル、ジエチル燐酸エチル、ジフェ
ニル燐酸フェニルなど)が挙げられる。安定剤の量はシ
リル基含有重合体に対して好ましくは1〜30%である
。As stabilizers for silyl groups, hydrolyzable esters, alcohols, and complete esters of carbonic acid, halonic acid, phosphoric acid, phosphorous acid, etc. are preferred. Hydrolyzable esters include trialkyl orthoformates (trimethyl orthoformate, orthoformate, trimethyl orthoformate, orthoformate, etc.). triethyl acid, etc.), trialkyl orthoacetate (trimethyl orthoacetate, etc.), silanes (methyltrimethoxysilane, tetramethoxysilane, tetraethoxysilane, tetra-n-butoxysilane, vinyltriethoxysilane,
γ-methacryloxypropyltrimethoxysilane, T-
(glycidoxypropyltrimethoxysilane, T-ureidopropyltriethoxysilane, silicate, etc.). Examples of the alcohol include methanol, ethanol, impropatol, isobutyl alcohol, octyl alcohol, cellosolve, methyl cellosolve, and the like. Examples of complete esters of carbonic acid, phosphoric acid, phosphoric acid, and phosphoric acid without P-OH include carbonic acid diesters (dimethyl carbonate, diethyl carbonate, ethylene carbonate, di-n-butyl carbonate, diphenyl carbonate, etc.), oxalic acid triesters (triethyl phosphate, tri-n-butyl phosphate, triphenyl phosphate, etc.), phosphoric acid triester (triethyl phosphate, trilobyl phosphate, triphenyl phosphate, etc.), P-
Examples include phosphoric acid monoesters or diesters without DH (diesters such as diethyl ethyl phosphate and diphenyl phenyl phosphate, methyl dimethyl phosphate, ethyl diethyl phosphate, phenyl diphenyl phosphate, etc.). The amount of stabilizer is preferably 1 to 30% based on the silyl group-containing polymer.
溶剤としては、本発明の重合体を製造する場合に使用す
る溶剤と同じでよいが、更に溶剤で希釈することも可能
である。溶剤の量は重合体に対して通常0〜600重量
%である。The solvent may be the same as that used in producing the polymer of the present invention, but it is also possible to dilute it with a further solvent. The amount of solvent is usually 0 to 600% by weight, based on the polymer.
また充填剤及び顔料を添加してもよい。これには体質顔
料(炭酸カルシウム、カオリン、タルク、ケイ酸アルミ
、アエロジルなど)、無機顔料(酸化チタン、酸化鉄、
黄鉛、酸化カドミウム、カーボンブラック、アルミ鱗片
など)、有機顔料(アゾ系、アゾレーキ系、フタロシア
ニン系、キナクリドン系、イソインドリノン系の有機顔
料など)が挙げられる。Fillers and pigments may also be added. These include extender pigments (calcium carbonate, kaolin, talc, aluminum silicate, Aerosil, etc.), inorganic pigments (titanium oxide, iron oxide,
yellow lead, cadmium oxide, carbon black, aluminum scales, etc.), organic pigments (azo-based, azo lake-based, phthalocyanine-based, quinacridone-based, isoindolinone-based organic pigments, etc.).
また通常用いられる紫外線吸収剤、耐熱性向上剤、レベ
リング剤、たれ防止剤、艶消し剤なども混入可能である
。It is also possible to mix commonly used ultraviolet absorbers, heat resistance improvers, leveling agents, anti-sag agents, matting agents, and the like.
本発明の塗装剤は重合体および樹脂、その他の成分を通
常の攪拌だけによる混合でもよいし、混合装置(ボール
ミル、ニーグー、サンドグラインダー、ロールミル、フ
ラットストンミルなど)を用いて分散、混合するこぎに
よっても得ることができる。The coating agent of the present invention may be prepared by mixing the polymer, resin, and other components by ordinary stirring alone, or by dispersing and mixing the polymer, resin, and other components using a mixing device (ball mill, niegu, sand grinder, roll mill, flat stone mill, etc.). It can also be obtained by
本発明の塗装剤が適用される基材としては、゛窯業系建
材が好ましい。これはセメント系、ケイ酸カルシウム系
、石膏系、石綿系等の無機質の材料から主として構成さ
れる屋根材や壁材であり、具体的には屋根材として、原
型スレート、石綿セメント板等、壁材として石綿ケイ酸
カルシウム板、炭酸マグネシウム板、石綿セメント板、
ALC板等がある。The substrate to which the coating agent of the present invention is applied is preferably a ceramic building material. These are roofing and wall materials mainly made of inorganic materials such as cement-based, calcium silicate-based, gypsum-based, and asbestos-based materials. Asbestos calcium silicate board, magnesium carbonate board, asbestos cement board,
There are ALC boards, etc.
これらの窯業系建材はそれらの構成部分を高温高圧水蒸
気養生することによって得られる。その養生条件は通常
、温度100〜220℃、圧力1〜22気圧、水蒸気雰
囲気下で処理時間3〜16時間であり、好ましくは温度
160〜200℃、圧力6〜15気圧、水蒸気雰囲気下
で処理時間5〜15時間である。These ceramic building materials are obtained by curing their constituent parts with high temperature and high pressure steam. The curing conditions are usually 3 to 16 hours at a temperature of 100 to 220°C, a pressure of 1 to 22 atm, and a steam atmosphere, preferably a temperature of 160 to 200°C, a pressure of 6 to 15 atm, and a steam atmosphere. The time is 5 to 15 hours.
窯業系建材に本発明の塗装剤を塗布する際は、塗装剤を
適当な溶剤に溶解混合し、所望の粘度に調整し、例えば
スプレー塗装、刷毛塗り等任意の塗布手段により塗装す
る。重ね塗りも可能である。When applying the coating agent of the present invention to ceramic building materials, the coating agent is dissolved and mixed in a suitable solvent, adjusted to a desired viscosity, and applied by any coating method such as spray coating or brush coating. Overcoating is also possible.
塗布量は通常、約5〜300g/lft” (固形分)
の割合である。The application amount is usually about 5 to 300g/lft” (solid content)
This is the percentage of
この塗装剤を塗布し上記条件の養生で得られた塗膜は加
水分解性シリル基が無機基材と反応し密着性が良好とな
る。シリル基が縮合したシロキサン結合は耐熱性、耐湿
潤性を向上させると共に塗膜の耐候性も向上させる。ま
た、ふっ素の導入により高温高圧水蒸気養生中での耐熱
性が一層向上し、塗膜の耐候性も一層向上する。更に、
ふっ素の使用により塗膜は耐汚染性を付与され、付加価
値がより高められる。The coating film obtained by applying this coating agent and curing under the above conditions has good adhesion as the hydrolyzable silyl group reacts with the inorganic base material. A siloxane bond formed by condensation of a silyl group improves heat resistance and moisture resistance, and also improves the weather resistance of the coating film. Furthermore, the introduction of fluorine further improves the heat resistance during high-temperature, high-pressure steam curing, and further improves the weather resistance of the coating film. Furthermore,
The use of fluorine imparts stain resistance to the coating film, further increasing its added value.
[実 施 例]
以下、製造例、比較製造例および実施例により本発明を
更に説明するが、本発明はこれに限定されるものではな
い。[Examples] The present invention will be further explained below with reference to production examples, comparative production examples, and examples, but the present invention is not limited thereto.
製造例1
キシレン100gを300 rdの四つロコルベンに仕
込み、攪拌しながら90℃に加熱した。Production Example 1 100 g of xylene was charged into a 300 rd four-piece Locolben and heated to 90° C. while stirring.
CF3(cF2)t(cHz)20cOc(Me)=C
Hz 10g 、メタクリル酸メチル60.g、メタク
リル酸n−ブチル25g1γ−メタクリロキシブロビル
トリメトキシシラン5g1n−ラウリルメルカプタン2
g1及びアゾビスイソブチロニトリル(以下AIBNと
いう)3gの混合溶液を3時間かけて滴下した。2時間
同温度で反応させた後、AIBN O,3gを追加し、
更に2時間反応させた。このようにしてキシレン50%
溶液の重合体を得た。CF3(cF2)t(cHz)20cOc(Me)=C
Hz 10g, methyl methacrylate 60. g, n-butyl methacrylate 25 g 1 γ-methacryloxybrobyl trimethoxysilane 5 g 1 n-lauryl mercaptan 2
A mixed solution of g1 and 3 g of azobisisobutyronitrile (hereinafter referred to as AIBN) was added dropwise over 3 hours. After reacting at the same temperature for 2 hours, 3 g of AIBN O was added,
The reaction was continued for an additional 2 hours. In this way, 50% xylene
A solution of polymer was obtained.
製造例2
スチレンLog、 CF3(cF2)S(cH2)20
COCH=CH220g、アクリル酸n−ブチル20g
1メタクリル酸メチル20g1メタクリル酸n−ブチル
20g、r−メタクリロキシプロピルトリメトキシシラ
ン10g、n−ラウリルメルカプタン2 g、 AIB
N 3gを使用し、製造例1と同様にして重合し、キシ
レン50%溶液の重合体を得た。Production example 2 Styrene Log, CF3(cF2)S(cH2)20
COCH=CH220g, n-butyl acrylate 20g
1 20 g of methyl methacrylate 1 20 g of n-butyl methacrylate, 10 g of r-methacryloxypropyltrimethoxysilane, 2 g of n-lauryl mercaptan, AIB
Polymerization was carried out in the same manner as in Production Example 1 using 3 g of N to obtain a polymer in a 50% xylene solution.
製造例3
メタクリル酸n−ブチル35g1γ−メタクリロキシプ
ロピルメチルジメトキシシラン15g1(cF3)2C
F(cF2)11(cH2)20COCH=CH250
g 、 n−ラウリルメルカプタン2 g、 AIBN
3 gを使用し、製造例1と同様にして重合し、キシレ
ン50%溶液の重合体を得た。Production example 3 n-butyl methacrylate 35 g 1 γ-methacryloxypropylmethyldimethoxysilane 15 g 1 (cF3) 2C
F(cF2)11(cH2)20COCH=CH250
g, n-lauryl mercaptan 2 g, AIBN
Using 3 g, polymerization was carried out in the same manner as in Production Example 1 to obtain a polymer in a 50% xylene solution.
製造例4
メタクリル酸メチル53g1メタクリル酸n−ブチル2
2g1アクリル酸2−エチルヘキシル10g。Production example 4 Methyl methacrylate 53g1 n-butyl methacrylate 2
2g1 2-ethylhexyl acrylate 10g.
T−メタクリロキシプロピルトリメトキシシラン10g
1メタクリル酸2−ヒドロキシエチル5g1n−ラウリ
ルメルカプタン2 g、 AIBN 3gを使用し、製
造例1と同様にして重合し、キシレン50%溶液のシリ
ル基含有重合体を得た。T-methacryloxypropyltrimethoxysilane 10g
Polymerization was carried out in the same manner as in Production Example 1 using 5 g of 2-hydroxyethyl methacrylate, 2 g of n-lauryl mercaptan, and 3 g of AIBN to obtain a silyl group-containing polymer in a 50% xylene solution.
比較製造例1
攪拌機、温度計、滴下ロート、窒素ガス導入管及び冷却
管を取り付けた11セパラブルコルベンに脱イオン水2
00g、ポリオキシエチレンオクチルフェノールエーテ
ル2gとポリオキシエチレンラウリルエーテル硫酸ナト
リウム(12g、重炭酸ナトリウム1gを仕込み、窒素
置換しながらウォーターバスにて75℃まで昇温させた
。Comparative Production Example 1 Two parts of deionized water were added to a 11 separable kolben equipped with a stirrer, a thermometer, a dropping funnel, a nitrogen gas introduction pipe, and a cooling pipe.
00g, polyoxyethylene octylphenol ether 2g, polyoxyethylene lauryl ether sodium sulfate (12g, and sodium bicarbonate 1g) were charged, and the temperature was raised to 75°C in a water bath while purging with nitrogen.
アクリル酸2−エチルヘキシル72g1メタクリル酸メ
チル55g1スチレン55gの混合物(第一段階)の1
0%を仕込み、10%過硫酸アンモニウム水溶液5gを
添加して重合を開始し、30分間重合反応を行った。内
温を80℃に調整しつつ混合物の残り90%を3時間で
滴下し、同時に10%過硫酸アンモニウム水溶液5gを
4時間で、ポリオキシエチレンオクチルフェノールエー
テル8gとポリオキシエチレンラウリルエーテル硫酸ナ
トリウム0.8gを2時間で連続添加して重合反応を進
めた。1 of a mixture (first stage) of 72 g of 2-ethylhexyl acrylate, 55 g of methyl methacrylate, and 55 g of styrene.
0%, 5 g of 10% ammonium persulfate aqueous solution was added to start polymerization, and the polymerization reaction was carried out for 30 minutes. While adjusting the internal temperature to 80°C, the remaining 90% of the mixture was added dropwise over 3 hours, and at the same time, 5 g of 10% ammonium persulfate aqueous solution was added over 4 hours to 8 g of polyoxyethylene octylphenol ether and 0.8 g of sodium polyoxyethylene lauryl ether sulfate. was continuously added over a period of 2 hours to advance the polymerization reaction.
3時間攪拌した後、アクリル酸2−エチルヘキシル18
g1メタクリル酸メチル14g1スチレン14g1メタ
クリル酸2gの混合物(第二段階)を50分間にわたり
滴下し重合反応を行った。After stirring for 3 hours, 2-ethylhexyl acrylate 18
A mixture (second stage) of g1 methyl methacrylate 14 g 1 styrene 14 g 1 methacrylic acid 2 g was added dropwise over 50 minutes to carry out a polymerization reaction.
3時間攪拌した後、更にエチレングリコールのジメタク
リル酸エステル12g5r−メタクリロキシプロピルト
リメトキシシラン5gの混合物(第三段階)を20分間
かけて滴下し重合反応を行った。After stirring for 3 hours, a mixture (third step) of 12 g of ethylene glycol dimethacrylic acid ester and 5 g of r-methacryloxypropyltrimethoxysilane (third step) was added dropwise over 20 minutes to carry out a polymerization reaction.
滴下終了後、内温を85℃まで昇温し、更に2時間熟成
した後、室温まで冷却した。アンモニア水でpHを8.
5に調整し、100メツシユの金網にて濾過し、樹脂エ
マルジョンを得た。After the dropwise addition was completed, the internal temperature was raised to 85° C., and the mixture was further aged for 2 hours, and then cooled to room temperature. Adjust the pH to 8. with ammonia water.
5 and filtered through a 100-mesh wire mesh to obtain a resin emulsion.
比較製造例2
比較製造例1と同様にして樹脂エマルジョンを得た。組
成は下記の通り。Comparative Production Example 2 A resin emulsion was obtained in the same manner as in Comparative Production Example 1. The composition is as follows.
(第一段階)
アクリル酸2−エチルヘキシル61g1メタクリル酸メ
チル46g、スチレン46g、の混合物(第二段階)
アクリル酸2−エチルヘキシル28g1メタクリル酸メ
チル22g1スチレン22g1メタクリル酸3gの混合
物
(第三段階)
エチレングリコールのジメタクリル酸エステル12g1
γ−メタクリロキシプロピルトリメトキシシラン5g
の混合物
(実施例1〜6、比較例1.2)
下記の表−1に示す配合量(重量部)により塗装剤(実
施例1〜6、比較例1.2)を得た。(First stage) A mixture of 61 g of 2-ethylhexyl acrylate, 46 g of methyl methacrylate, and 46 g of styrene (2nd stage) A mixture of 28 g of 2-ethylhexyl acrylate, 22 g of methyl methacrylate, 22 g of styrene, and 3 g of methacrylic acid (3rd stage) Ethylene glycol dimethacrylic acid ester 12g1
γ-methacryloxypropyltrimethoxysilane 5g
Mixtures (Examples 1 to 6, Comparative Example 1.2) Painting agents (Examples 1 to 6, Comparative Example 1.2) were obtained using the amounts (parts by weight) shown in Table 1 below.
表−1(1)
(塗膜試験)
ポルトランドセメント100部(重量部、以下同じ。)
、8号珪砂200部、水95部のモルタルペーストを型
に載せ、100kg/cm”で加圧成型した直後のモル
タル成型板の表面に実施例1〜6および比較例1.2で
得た塗装剤をスプレーガンで200μ(ドライ膜厚)塗
布して、室温で1時間放置乾燥後、温度60℃、湿度8
0%RHの3囲気中で8時間蒸気養生を行い、更に温度
160〜180℃の飽和水蒸気中で10時間オートクレ
ーブ養生を行って塗装成型板を作成し、各試験を行った
。結果を表−2に示す。Table 1 (1) (Coating film test) 100 parts of Portland cement (parts by weight, the same applies hereinafter)
A mortar paste containing 200 parts of No. 8 silica sand and 95 parts of water was placed on a mold and pressure-molded at 100 kg/cm''. Apply 200μ (dry film thickness) of the agent with a spray gun, leave it to dry at room temperature for 1 hour, and then dry at 60℃ and humidity 8.
Steam curing was carried out for 8 hours in 3 atmospheres of 0% RH, and further autoclave curing was carried out for 10 hours in saturated steam at a temperature of 160 to 180°C to prepare coated molded plates, and each test was conducted. The results are shown in Table-2.
表−1(2) 注) 触媒ニジオクチル錫ジラウレート 表−2 ◎印は評価が特に優れていることを示す。Table-1 (2) note) Catalyst Nidioctyltin dilaurate Table-2 The mark ◎ indicates that the evaluation is particularly excellent.
(試験方法および評価方法)
塗膜外観二オートクレーブ養生後の異常(変色・劣化、
割れ・泡、−次白華性)を目視
評価した。(Test method and evaluation method) Paint film appearance (2) Abnormalities after autoclave curing (discoloration, deterioration,
Cracks, bubbles, and secondary efflorescence) were visually evaluated.
耐候性 :ウェザオフ−ター2000時間後の光沢保持
率(%)を測定した。Weather resistance: The gloss retention rate (%) after 2000 hours of weathering was measured.
耐水性 :試験板を20℃で10日間水道水に浸漬後、
目視評価した。Water resistance: After immersing the test plate in tap water at 20℃ for 10 days,
Visual evaluation was performed.
密着性 :塗膜の2mm角ゴバン目セロテープ剥離試験
で評価した。Adhesion: Evaluated by a 2 mm square cellophane tape peel test of the coating film.
二次白華性:試験板の裏面を水道水に1日浸漬後、1日
風乾させ、これを1サイクルとし、10サイクル後の塗
膜の異常を目視評価した。Secondary efflorescence: The back side of the test plate was immersed in tap water for 1 day and then air-dried for 1 day. This was considered as 1 cycle, and abnormalities in the coating film were visually evaluated after 10 cycles.
[発明の効果]
本発明の高耐候性塗装剤を用い高温高湿下で得られた塗
膜は以下の効果を奏する。[Effects of the Invention] A coating film obtained under high temperature and high humidity using the highly weather resistant coating agent of the present invention exhibits the following effects.
(1)変色、劣化、割れ、泡がなく、−次白華性も良く
、塗膜外観に優れている。(1) There is no discoloration, deterioration, cracking, or bubbles, and the efflorescence property is good, and the coating film has an excellent appearance.
(2)耐候性、耐水性、密着性が良好で、耐久性に優れ
ている。(2) Good weather resistance, water resistance, adhesion, and excellent durability.
Claims (1)
が加水分解性シリル基を含有する単量体単位(a)とそ
の他のビニル系単量体単位(b)からなる重合体を含む
ことを特徴とする高温高湿下で塗膜形成する高耐候性塗
装剤。 2、その他のビニル系単量体単位(b)が含ふっ素ビニ
ル系単量体単位(c)を含むものである請求項1記載の
高耐候性塗装剤。 3、(a)が(メタ)アクリロキシアルキルアルコキシ
シラン、(c)が炭素数3〜21のパーフルオロアルキ
ル基を含むビニル系単量体単位である重合体であって、
重合体中での含有量は(a)が1〜30重量%、(c)
が1〜70重量%である請求項2記載の高耐候性塗装剤
。 4、高温高湿下での塗膜形成が高温高圧水蒸気下で無機
質基材の養生と同時に塗膜を形成する請求項1〜3のい
ずれかに記載の高耐候性塗装剤。[Claims] 1. A polymer obtained by solution polymerization, the constituent components of which consist of a monomer unit (a) containing a hydrolyzable silyl group and another vinyl monomer unit (b) A highly weather-resistant coating agent that forms a coating film under high temperature and high humidity conditions and is characterized by containing a polymer. 2. The highly weather resistant coating agent according to claim 1, wherein the other vinyl monomer unit (b) contains a fluorine-containing vinyl monomer unit (c). 3. A polymer in which (a) is a (meth)acryloxyalkylalkoxysilane and (c) is a vinyl monomer unit containing a perfluoroalkyl group having 3 to 21 carbon atoms,
The content of (a) in the polymer is 1 to 30% by weight, (c)
The highly weather resistant coating agent according to claim 2, wherein the amount is 1 to 70% by weight. 4. The highly weather resistant coating agent according to any one of claims 1 to 3, wherein the coating film is formed under high temperature and high humidity conditions at the same time as curing of the inorganic base material under high temperature and high pressure steam.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1043690A JP2525238B2 (en) | 1989-02-23 | 1989-02-23 | Method for producing highly weather-resistant coated base material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1043690A JP2525238B2 (en) | 1989-02-23 | 1989-02-23 | Method for producing highly weather-resistant coated base material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02222471A true JPH02222471A (en) | 1990-09-05 |
JP2525238B2 JP2525238B2 (en) | 1996-08-14 |
Family
ID=12670833
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1043690A Expired - Lifetime JP2525238B2 (en) | 1989-02-23 | 1989-02-23 | Method for producing highly weather-resistant coated base material |
Country Status (1)
Country | Link |
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JP (1) | JP2525238B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06340839A (en) * | 1993-05-31 | 1994-12-13 | Sanyo Chem Ind Ltd | Coating composition |
WO2004041880A1 (en) * | 2002-11-08 | 2004-05-21 | Daikin Industries, Ltd. | Treating agent for masonry |
JP2008050620A (en) * | 2007-10-25 | 2008-03-06 | Daikin Ind Ltd | Copolymer for cosmetic |
EP2340286A4 (en) * | 2008-09-25 | 2012-05-02 | 3M Innovative Properties Co | Method for treating wheel rims and composition for use therein |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55129405A (en) * | 1979-03-29 | 1980-10-07 | Kanegafuchi Chem Ind Co Ltd | Silyl group-containing vinyl resin and its preparation |
JPS5736109A (en) * | 1980-08-12 | 1982-02-26 | Kanegafuchi Chem Ind Co Ltd | High-solid coating resin |
JPS61151272A (en) * | 1984-12-26 | 1986-07-09 | Toagosei Chem Ind Co Ltd | Highly weatherproof coating |
JPS62283163A (en) * | 1986-02-04 | 1987-12-09 | Dainippon Ink & Chem Inc | Resin composition for coating |
JPS6361011A (en) * | 1986-08-29 | 1988-03-17 | Mizutani Paint Kk | Acrylic emulsion for aging in autoclave |
JPH02145665A (en) * | 1988-11-28 | 1990-06-05 | Shin Etsu Chem Co Ltd | Room temperature curing coating composition |
-
1989
- 1989-02-23 JP JP1043690A patent/JP2525238B2/en not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55129405A (en) * | 1979-03-29 | 1980-10-07 | Kanegafuchi Chem Ind Co Ltd | Silyl group-containing vinyl resin and its preparation |
JPS5736109A (en) * | 1980-08-12 | 1982-02-26 | Kanegafuchi Chem Ind Co Ltd | High-solid coating resin |
JPS61151272A (en) * | 1984-12-26 | 1986-07-09 | Toagosei Chem Ind Co Ltd | Highly weatherproof coating |
JPS62283163A (en) * | 1986-02-04 | 1987-12-09 | Dainippon Ink & Chem Inc | Resin composition for coating |
JPS6361011A (en) * | 1986-08-29 | 1988-03-17 | Mizutani Paint Kk | Acrylic emulsion for aging in autoclave |
JPH02145665A (en) * | 1988-11-28 | 1990-06-05 | Shin Etsu Chem Co Ltd | Room temperature curing coating composition |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06340839A (en) * | 1993-05-31 | 1994-12-13 | Sanyo Chem Ind Ltd | Coating composition |
WO2004041880A1 (en) * | 2002-11-08 | 2004-05-21 | Daikin Industries, Ltd. | Treating agent for masonry |
CN100336837C (en) * | 2002-11-08 | 2007-09-12 | 大金工业株式会社 | Treating agent for masonry |
JP2008050620A (en) * | 2007-10-25 | 2008-03-06 | Daikin Ind Ltd | Copolymer for cosmetic |
EP2340286A4 (en) * | 2008-09-25 | 2012-05-02 | 3M Innovative Properties Co | Method for treating wheel rims and composition for use therein |
Also Published As
Publication number | Publication date |
---|---|
JP2525238B2 (en) | 1996-08-14 |
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