JPH02221923A - Composition for forming transparent electrode protective film of liquid crystal display element and liquid crystal display element - Google Patents

Composition for forming transparent electrode protective film of liquid crystal display element and liquid crystal display element

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Publication number
JPH02221923A
JPH02221923A JP4252689A JP4252689A JPH02221923A JP H02221923 A JPH02221923 A JP H02221923A JP 4252689 A JP4252689 A JP 4252689A JP 4252689 A JP4252689 A JP 4252689A JP H02221923 A JPH02221923 A JP H02221923A
Authority
JP
Japan
Prior art keywords
protective film
liquid crystal
composition
crystal display
transparent electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4252689A
Other languages
Japanese (ja)
Inventor
Yasuo Shimamura
泰夫 島村
Hiroyuki Morishima
森嶋 浩之
Shunichiro Uchimura
内村 俊一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP4252689A priority Critical patent/JPH02221923A/en
Publication of JPH02221923A publication Critical patent/JPH02221923A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain the coating film which cures at a low temp., has excellent wettability and is free from repellent phenomena by forming the electrode protective film of a compsn. composed of specific terminal hydroxy ladder polysiloxane, specific org. metal compd. and solvent. CONSTITUTION:The transparent electrode protective film is formed by using the compsn. prepd. by dissolving the terminal hydroxy ladder polysiloxane which is expressed by general formula I (where R1 and R2 are hydrogen or monovalent hydrocarbon group; n is a positive integer) and in which >=55% of R1 and/or R2 of the general formula I consists of a phenyl group and the number average mol. wt. is 2,000 to 500,000 and the org. metal compd. expressed by general formula II (where M is a metal element; R' is hydrogen or monovalent hydrocarbon group; m is a positive integer) into the solvent. As a result, the protective film which is cured by a low-temp. heat treatment is formed and the long-life liquid crystal element is obtd. without increasing the sheet resistance value of the electrodes.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は液晶表示素子の透明電極保護被膜形成用組成物
および液晶表示素子に関し、さらに詳しくは低温で乾燥
硬化することができる液晶表示素子の透明電極保護被膜
形成用組成物およびこれを用いて保護膜を形成した液晶
表示素子に関する。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a composition for forming a transparent electrode protective film for a liquid crystal display element and a liquid crystal display element, and more particularly to a composition for forming a transparent electrode protective film for a liquid crystal display element, and more particularly to a composition for forming a transparent electrode protective film on a liquid crystal display element, and more particularly to a composition for forming a transparent electrode protective film on a liquid crystal display element. The present invention relates to a composition for forming a transparent electrode protective film and a liquid crystal display element in which a protective film is formed using the composition.

〔従来の技術〕[Conventional technology]

従来、液晶表示素子の製造に際しては、パターニングさ
れた透明電極を有する基板に、ポリイミド等の有機高分
子からなる配向膜を塗布形成し、配・向処理を行った後
、素子を組み立てる方法が用いられていた。しかし、近
年、液晶表示素子の大型化に伴い、配向膜のピンホール
や素子のギャップ中に混入した異物や、一定のギャップ
を保つために基板の間に入れられるスペーサーが、配向
膜をキズつけたり、つき破ることによって起こる上下基
板間の導通による表示不良が問題となっている。
Conventionally, when manufacturing liquid crystal display elements, a method has been used in which an alignment film made of an organic polymer such as polyimide is coated on a substrate having a patterned transparent electrode, and after alignment and alignment processing is performed, the element is assembled. It was getting worse. However, in recent years, as liquid crystal display elements have become larger, foreign matter that has gotten into pinholes in the alignment film or gaps between the elements, and spacers inserted between the substrates to maintain a constant gap can damage the alignment film. Display defects due to conduction between the upper and lower substrates caused by puncturing have become a problem.

最近では、これを解決する手段として、透明電極と配向
膜の間に絶縁性の層を形成する方法が検討され、例えば
(1)スパッタリングによる低温で酸化膜を形成する方
法、(2)アルコキシシラン、アルコキシチタンおよび
増粘剤としての有機高分子を含む溶液を印刷法等で塗布
した後、熱処理して酸化膜とする方法等が採用されてい
る。
Recently, as a means to solve this problem, methods of forming an insulating layer between the transparent electrode and the alignment film have been studied. For example, (1) forming an oxide film at low temperature by sputtering, (2) using alkoxysilane , a method has been adopted in which a solution containing alkoxytitanium and an organic polymer as a thickener is applied by a printing method or the like, and then heat-treated to form an oxide film.

しかしながら、(1)の方法では、真空系の高価な装置
が必要であり、またバッチ処理のため生産性が悪くなる
欠点があり、(2)の方法では、酸化膜形成のための高
温処理によって透明電極のシート抵抗値が上昇する等の
欠点があった。
However, method (1) requires expensive vacuum equipment and has the disadvantage of poor productivity due to batch processing, while method (2) requires high-temperature treatment to form an oxide film. There were drawbacks such as an increase in the sheet resistance of the transparent electrode.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

本発明者らは、この問題を解決する方法として、末端ヒ
ドロキシラダーポリシロキサンおよび有機金属化合物を
溶剤に溶解させた組成物の検討を行ったが、この組成物
から形成される膜は、ぬれ性が悪(、この保護膜上に液
晶配向膜形成用組成物を塗布すると、ハジキが生じるこ
とを見出した。
As a method to solve this problem, the present inventors investigated a composition in which a terminal hydroxyl ladder polysiloxane and an organometallic compound were dissolved in a solvent, but the film formed from this composition had poor wettability. However, it has been found that when a composition for forming a liquid crystal alignment film is applied onto this protective film, repellency occurs.

本発明の目的は、前記技術の欠点をなくし、低温の熱処
理での硬化が可能で、しかもその硬化膜がぬれ性に優れ
、ハジキの発生のない液晶表示素子の透明電極保護被膜
形成用組成物およびこれを用いた液晶表示素子を提供す
ることにある。
The object of the present invention is to eliminate the drawbacks of the above-mentioned techniques, to provide a composition for forming a transparent electrode protective film of a liquid crystal display element, which can be cured by low-temperature heat treatment, the cured film has excellent wettability, and does not generate repellency. Another object of the present invention is to provide a liquid crystal display element using the same.

〔課題を解決するための手段〕[Means to solve the problem]

本発明者らは、前記問題点に鑑み鋭意検討した結果、特
定の末端ヒドロキシラダーポリシロキサンおよび特定の
有機金属化合物を溶剤に溶解させた組成物は、低温の熱
処理で硬化し、その硬化膜が液晶配向膜形成用組成物塗
布時にハジキの発生がなく優れた透明電極の保護被膜を
形成することを見出し、本発明に到達した。
As a result of intensive studies in view of the above problems, the present inventors found that a composition in which a specific terminal hydroxyl ladder polysiloxane and a specific organometallic compound are dissolved in a solvent is cured by low-temperature heat treatment, and the cured film is The inventors have discovered that a composition for forming a liquid crystal alignment film can form an excellent protective film for transparent electrodes without causing repellency when applied, and have arrived at the present invention.

すなわち、本発明は、(a)−綴代(1)(式中、R8
およびR2は水素または一価炭化水素基、nは正の整数
を意味する)で表され、かつ−綴代(1)中のR,およ
び/またはR2の55%以上がフェニル法からなる、数
平均分子量が2゜000〜500,000である末端ヒ
ドロキシラダーポリシロキサン、(b)−綴代(II)
M(OR’)m           (II)(式中
、Mは金属元素、Roは水素または一価炭化水素基、m
は正の整数を意味する)で表される有機金属化合物およ
び(C)溶媒を含有してなる液晶表示素子の透明電極保
護被膜形成用組成物ならびに前記透明電極保護被膜形成
用組成物を用いて形成した透明電極保護被膜を有する液
晶表示素子に関する。
That is, the present invention provides (a) - binding allowance (1) (in the formula, R8
and R2 is hydrogen or a monovalent hydrocarbon group, n is a positive integer), and 55% or more of R and/or R2 in the binding margin (1) consists of a phenyl group, a number Terminal hydroxyl ladder polysiloxane having an average molecular weight of 2°000 to 500,000, (b) - binding margin (II)
M(OR')m (II) (wherein M is a metal element, Ro is hydrogen or a monovalent hydrocarbon group, m
means a positive integer) and a composition for forming a transparent electrode protective film of a liquid crystal display element containing the solvent (C), and using the composition for forming a transparent electrode protective film. The present invention relates to a liquid crystal display element having a transparent electrode protective film formed thereon.

本発明に用いられる前記−綴代(1)で表される末端ヒ
ドロキシラダーポリシロキサンは、ハジキ発生防止の点
から、−1G式(I)中のR1および/またはR8の5
5%以上がフェニル基からなり、また塗布液としての粘
度、硬化性等の点から、数平均分子量が2,000〜5
00,000、好ましくは10,000〜50,000
の範囲である。
The terminal hydroxy ladder polysiloxane represented by the above-mentioned binding margin (1) used in the present invention is selected from the viewpoint of preventing the occurrence of cissing, when R1 and/or R8 in -1G formula (I)
5% or more of phenyl groups, and from the viewpoint of viscosity and curability as a coating liquid, the number average molecular weight is 2,000 to 5.
00,000, preferably 10,000-50,000
is within the range of

該末端ヒドロキシラダーポリシロキサンは、例えば特公
昭58−50657号公報に示されるようにフェニルト
リクロロシランを、多量の水を用いて加水分解した後、
得られた加水分解物をトルエン中でカルボジイミド類を
触媒として脱水縮重合させて得られる。この場合は前記
−綴代(1)中のR1およびR2がフェニル基の場合で
あるが、本発明においてはR+および/またはR2を、
フェニル基のほかにメチル基、エチル基等のアルキル基
、クロルフェニル基等のアリール基、水素原子などとす
ることができ、これらは分子中に1種または2種以上を
含むことができる。また末端ヒドロキシラダーポリシロ
キサンは1種または2種以上混合して用いることもでき
る。末端ヒドロキシラダーポリシロキサンの組成物中の
濃度は、その分子量および塗布膜厚によっても異なるが
、5〜20重量%が好ましい。−綴代(1)においてn
は、通常1〜1000の整数、好ましくは5〜500の
整数である。
The terminal hydroxyl ladder polysiloxane can be obtained by hydrolyzing phenyltrichlorosilane using a large amount of water, as shown in Japanese Patent Publication No. 58-50657, for example.
The resulting hydrolyzate is subjected to dehydration condensation polymerization in toluene using carbodiimides as a catalyst. In this case, R1 and R2 in the above-mentioned binding margin (1) are phenyl groups, but in the present invention, R+ and/or R2 are
In addition to the phenyl group, it may be an alkyl group such as a methyl group or an ethyl group, an aryl group such as a chlorophenyl group, or a hydrogen atom, and one or more of these may be contained in the molecule. Further, the terminal hydroxy ladder polysiloxanes can be used alone or in combination of two or more. The concentration of the terminal hydroxy ladder polysiloxane in the composition varies depending on its molecular weight and coating film thickness, but is preferably 5 to 20% by weight. -n in Tsukuriyo (1)
is usually an integer of 1 to 1000, preferably an integer of 5 to 500.

本発明に用いられる前記−綴代(II)で表される有機
金属化合物としては、T i  (OR’ ) a、Z
r (OR”)4 、Ta (OR”)5 、In (
OR’)3、Si  (OR’)4等の化合物があり、
R′としては、CHz 、Ct Hs 、C3Ht 、
CaI2 、Cs H++等があり、CH,、C,HS
、iC3Ht 、n  Cm Ht、1−C4H,、n
−C=Hqが好ましい。−綴代(Il)においてmは、
通常2〜6の整数、好ましくは3〜5の整数である。具
体的にはテトライソプロポキシチタン、テトラブトキシ
ジルコニウム、テトラエトキシジルコニウム、ペンタエ
トキシタンタル、トリブトキシインジウム、テトラエト
キシシラン等が挙げられる。これらの化合物は、前記末
端ヒドロキシラダーポリシロキサンの末端水酸基と反応
してSi−0−Mなる結合を形成し、低温で架橋剤とし
ての作用を有する。またその添加によって、形成される
保護被膜の屈折率を制御し、透明電極パターンが点灯し
ていない状態で透けて見えるいわゆるネサ黒等の現象を
防ぐことができる。これらの有機金属化合物の添加景は
、主に架橋剤として用いる場合には、末端ヒドロキシラ
ダーポリシロキサンのヒドロキシル基濃度に対し、10
〜100モル%が好ましく、また屈折率の制御を主目的
とする場合には、チタン、ジルコニウム等の有機金属化
合物を用い、Si原子に対して金属原子として10〜1
00モル%とするのが好ましい。
As the organometallic compound represented by the above-mentioned binding margin (II) used in the present invention, T i (OR' ) a, Z
r (OR”)4 , Ta (OR”)5 , In (
There are compounds such as OR')3 and Si(OR')4,
As R', CHz, Ct Hs, C3Ht,
There are CaI2, Cs H++, etc., CH,, C, HS
, iC3Ht , n Cm Ht, 1-C4H,, n
-C=Hq is preferred. - In the binding allowance (Il), m is
It is usually an integer of 2 to 6, preferably 3 to 5. Specific examples include tetraisopropoxytitanium, tetrabutoxyzirconium, tetraethoxyzirconium, pentaethoxytantalum, tributoxyindium, and tetraethoxysilane. These compounds react with the terminal hydroxyl group of the terminal hydroxyl ladder polysiloxane to form a Si-0-M bond and act as a crosslinking agent at low temperatures. Further, by adding it, the refractive index of the protective film to be formed can be controlled, and phenomena such as so-called Nesa black, in which the transparent electrode pattern is visible when not lit, can be prevented. When these organometallic compounds are used mainly as a crosslinking agent, the concentration of hydroxyl groups in the terminal hydroxyl ladder polysiloxane is 10%.
~100 mol% is preferable, and when the main purpose is to control the refractive index, an organometallic compound such as titanium or zirconium is used, and the ratio of the metal atom to the Si atom is 10 to 1 mol%.
It is preferable to set it to 00 mol%.

本発明に用いられる溶剤としては、N、N−ジメチルア
セトアミド、N−メチル−2−ピロリドンブチルセロソ
ルブ、ヘキシレングリコール、ブチルセロソルブ、N−
メチル−2−ピロリドン、ジエチレングリコール等が挙
げられる。
Solvents used in the present invention include N,N-dimethylacetamide, N-methyl-2-pyrrolidone butyl cellosolve, hexylene glycol, butyl cellosolve, N-
Examples include methyl-2-pyrrolidone and diethylene glycol.

本発明の組成物は、前記の末端ヒドロキシラダーポリシ
ロキサンを室温またはそれ以上の温度で溶媒に溶解した
後、前記有機金属化合物を添加し、撹拌溶解することに
よって得られる。
The composition of the present invention can be obtained by dissolving the terminal hydroxyl ladder polysiloxane in a solvent at room temperature or higher temperature, then adding the organometallic compound and dissolving with stirring.

本発明の組成物は、例えば透明電極のパターンが形成さ
れた基板上に、ロールコータ等の印刷機、スピナー塗布
機などによって塗布され、100〜300℃、好ましく
は150〜250℃のオーブン、ホットプレート等で熱
処理されて透明電極の保護被膜とされる。熱処理の時間
は、オーブンの場合は30〜90分、ホットプレートの
場合はlO〜30分程度が好ましい。また形成される保
護被膜の膜厚は絶縁耐圧の点から500〜2000人が
好ましい。
The composition of the present invention is applied onto a substrate on which a pattern of transparent electrodes is formed, for example, using a printing machine such as a roll coater, a spinner coater, etc. It is heat-treated with a plate or the like and used as a protective coating for the transparent electrode. The heat treatment time is preferably about 30 to 90 minutes in the case of an oven, and about 10 to 30 minutes in the case of a hot plate. Further, the thickness of the protective film to be formed is preferably 500 to 2000 from the viewpoint of dielectric strength.

〔実施例〕〔Example〕

以下、本発明を実施例により詳しく説明する。 Hereinafter, the present invention will be explained in detail with reference to Examples.

実施例1 (A)末端ヒドロキシラダーポリシロキサンの合成 フェニルトリクロロシラン(C6H5S i Cf3)
58.18g(0,275モル)およびメチルトリクロ
ロシラン(CH3S i Cl13 ’) 33.63
 g (0゜225モル)をジエチルエーテル200m
lに溶解した。一方、21の四ツロフラスコにイオン交
換水11を入れ、撹拌機、冷却器、温度計を取りつけ、
水浴で20°C以下に冷却し、このフラスコ中に上記フ
ェニルトリクロロシランおよびメチルトリクロロシラン
のエーテル溶液を滴下ロートで滴下し、加水分解を行っ
た。反応温度は20°C以下とし、4時間で滴下を終了
した。撹拌を止め、二層に分離した反応液を分液ロート
に入れてエーテル層を取り出した。エーテル層は、イオ
ン交換水で中性になるまで洗浄した後、無水硫酸ナトリ
ウムで一昼夜乾燥した。その後エーテルを除去し、減圧
乾燥器に入れ、60°Cで2時間乾燥した。得られた白
色の粉末はIRスペクトルで350OCT11−1に一
〇Hの吸収、1130cl’および1135cm−’に
5t−0−3tの吸収を示した。その数平均分子量は約
1,000であった。
Example 1 (A) Synthesis of terminal hydroxy ladder polysiloxane Phenyltrichlorosilane (C6H5S i Cf3)
58.18 g (0,275 mol) and methyltrichlorosilane (CH3S i Cl13') 33.63
g (0°225 mol) in 200 m diethyl ether
Dissolved in l. Meanwhile, put 11 ion-exchanged water into Yotsuro flask 21, attach a stirrer, cooler, and thermometer,
The flask was cooled to 20° C. or lower in a water bath, and the above ether solutions of phenyltrichlorosilane and methyltrichlorosilane were added dropwise through a dropping funnel to effect hydrolysis. The reaction temperature was kept at 20°C or less, and the dropwise addition was completed in 4 hours. Stirring was stopped, and the reaction solution separated into two layers was put into a separating funnel and the ether layer was taken out. The ether layer was washed with ion-exchanged water until it became neutral, and then dried over anhydrous sodium sulfate overnight. Thereafter, the ether was removed, and the mixture was placed in a vacuum dryer and dried at 60°C for 2 hours. The obtained white powder showed an 10H absorption at 350OCT11-1 and a 5t-0-3t absorption at 1130cl' and 1135cm-' in its IR spectrum. Its number average molecular weight was about 1,000.

次に前記白色の粉末の加水分解物を還流冷却管、撹拌機
および温度計を付けた三ツロフラスコに10g秤量し、
溶媒としてトルエン30m1を入れて溶解して均一層と
した。これに縮合触媒としてジシクロへキシルカルボジ
イミド4.1gを入れて溶解し、110“Cで撹拌還流
下で2時間反応させた。反応後、反応容器中に炭素誘導
体の析出が認められた。反応終了後、反応混合物を放冷
し、尿2素誘導体を吸引濾過し、10体積倍のメタノー
ル中に注いでポリマーを析出させた後、濾別し、減圧乾
燥した。得られたポリマーの数平均分子量は50.00
0であり、またそのrRスペクトルには3500cm−
’に一〇Hによる吸収が見られ、末端ヒドロキシラダー
ポリシロキサンであることを確認した。
Next, 10 g of the white powder hydrolyzate was weighed into a Mitsuro flask equipped with a reflux condenser, a stirrer, and a thermometer.
30 ml of toluene was added as a solvent and dissolved to form a uniform layer. 4.1 g of dicyclohexylcarbodiimide as a condensation catalyst was added and dissolved in this, and the mixture was reacted at 110"C under stirring and reflux for 2 hours. After the reaction, precipitation of a carbon derivative was observed in the reaction vessel. The reaction was completed. After that, the reaction mixture was allowed to cool, the urinary direa derivative was suction filtered, and the polymer was precipitated by pouring it into 10 times the volume of methanol, which was then filtered and dried under reduced pressure.The number average molecular weight of the obtained polymer was is 50.00
0, and its rR spectrum includes 3500 cm-
Absorption due to 10H was observed in ', confirming that it was a terminal hydroxyl ladder polysiloxane.

次に出発原料としてフェニルトリクロロシランおよびメ
チルトリクロルシランを各々単体を用いて上記手法によ
って反応させ、末端ヒドロキシポリフェニルラダーポリ
シロキサンおよび末端ヒドロキシポリメチルラダーポリ
シロキサンを合成した。これらのポリマーのIRスペク
トルを測定すると、いずれも1130cm−’付近に5
i−0−3iの吸収が認められた。さらに末端ヒドロキ
シポリメチルラダーポリシロキサンは1260c+r’
(寸近に5i−CHxに基づく吸収が、また末端ヒドロ
キシポリフェニルラダーポリシロキサンは3030cl
’にフェニル基のCH伸縮振動に基づく吸収が認められ
た。
Next, using phenyltrichlorosilane and methyltrichlorosilane alone as starting materials, they were reacted by the above method to synthesize terminal hydroxypolyphenyl ladder polysiloxane and terminal hydroxypolymethyl ladder polysiloxane. When measuring the IR spectra of these polymers, all of them show 5
Absorption of i-0-3i was observed. Furthermore, the terminal hydroxy polymethyl ladder polysiloxane is 1260c+r'
(The absorption based on 5i-CHx is close to 3030cl, and the terminal hydroxypolyphenyl ladder polysiloxane is
Absorption based on the CH stretching vibration of the phenyl group was observed in '.

末端ヒドロキシポリメチルラダーポリシロキサンのIR
チャートにおける5i−0−3iの113Qcm−’に
対する5i−CHzの1260cm−’のピーク強度比
を基準とし、フェニルトリクロロシラン(0,225モ
ル)とメチルトリクロロシラン(0,275モル)から
合成した末端ヒドロキシラダーポリシロキサンの126
0cm−’/ 1130cm−責のピーク強度比を比較
するとフェニルトリクロロシラン(0,225モル)と
メチルトリクロロシラン(0,2’75モル)から合成
した末端ヒドロキシラダーポリシロキサンのピーク強度
比の値が末端ヒドロキシポリメチルラダーポリシロキサ
ンのピーク強度比の値の約45%であることがわかった
。また3030cm−’にもピークが存在することから
、このポリマーは末端ヒドロキシポリフェニルメチルラ
ダーポリシロキサンであり、フェニル基の割合は55%
であることになる。
IR of terminal hydroxy polymethyl ladder polysiloxane
Based on the peak intensity ratio of 1260cm-' of 5i-CHZ to 113Qcm-' of 5i-0-3i in the chart, the terminal synthesized from phenyltrichlorosilane (0,225 mol) and methyltrichlorosilane (0,275 mol) Hydroxy Ladder Polysiloxane 126
Comparing the peak intensity ratio of 0 cm-'/1130 cm-, the value of the peak intensity ratio of terminal hydroxy ladder polysiloxane synthesized from phenyltrichlorosilane (0,225 mol) and methyltrichlorosilane (0,2'75 mol) is It was found to be about 45% of the peak intensity ratio value of the terminal hydroxy polymethyl ladder polysiloxane. Also, since there is a peak at 3030 cm-', this polymer is terminal hydroxypolyphenylmethyl ladder polysiloxane, and the proportion of phenyl groups is 55%.
It will be.

(B)保護被膜形成用組成物の作製および評価上記で得
られた末端ヒドロキシポリフェニルメチルラダーポリシ
ロキサン5gを、還流冷却管、撹拌機、温度計および滴
下ロートを付けた四ツ目フラスコに秤量し、溶媒として
N、N−ジメチルアセトアミド60gとヘキシレングリ
コール30gを加え、撹拌溶解した。次にテトライソプ
ロポキシチタンの10重量%イソプロピルアルコール溶
液5gを滴下ロートから撹拌下に滴下したのち、室温で
約2時間撹拌混合し、保護被膜形成用組成物を得た。こ
の組成物の固形分濃度は5.1重量%(200°C/2
hr乾燥)であり、25°Cにおける粘度は40センチ
ポイズであった。
(B) Preparation and evaluation of composition for forming a protective film 5 g of the terminal hydroxypolyphenylmethyl ladder polysiloxane obtained above was weighed into a four-eye flask equipped with a reflux condenser, a stirrer, a thermometer, and a dropping funnel. Then, 60 g of N,N-dimethylacetamide and 30 g of hexylene glycol were added as a solvent, and the mixture was stirred and dissolved. Next, 5 g of a 10% by weight isopropyl alcohol solution of tetraisopropoxytitanium was added dropwise from the dropping funnel with stirring, and the mixture was stirred and mixed at room temperature for about 2 hours to obtain a composition for forming a protective film. The solid content concentration of this composition is 5.1% by weight (200°C/2
hr drying) and the viscosity at 25°C was 40 centipoise.

得られた組成物をスピンナを用いてシリコンウェーハ上
に塗布し、150°Cで1時間の熱処理をし、さらに3
00°Cで1時間の熱処理を行って厚さ2000人の被
膜を形成した。該被膜に2mnの、1M電極を蒸着し、
絶縁破壊電圧を測定したところ、約100vの耐圧を示
した。
The obtained composition was applied onto a silicon wafer using a spinner, heat treated at 150°C for 1 hour, and then heated for 3 hours.
Heat treatment was performed at 00°C for 1 hour to form a film with a thickness of 2000 mm. depositing 2 mn of 1M electrodes on the coating;
When the dielectric breakdown voltage was measured, it showed a withstand voltage of about 100V.

次に640X200ドツトの透明電極パターンを形成し
た300X150mmのガラス基板上に上記組成物を印
刷法で塗布した後、上記と同様の熱処理を行い、厚さ1
000人の被膜を形成させた。
Next, the above composition was applied by a printing method onto a 300 x 150 mm glass substrate on which a transparent electrode pattern of 640 x 200 dots was formed, and then heat treatment was performed in the same manner as above, and a thickness of 1
000 people were coated.

該被膜上に800人のポリイミド系配向膜を形成し、セ
ルを組み立て、電圧印加時の配向状態を観察した。その
結果上下基板の導通による配向不良およびネサ黒は見ら
れなかった。また前記セルの組立て工程において、液晶
配向膜組成物(日立化成工業株式会社製、LX−140
0−04)を透明電掻保護被膜上に塗布したときにハジ
キは生じなかった。
An 800-layer polyimide alignment film was formed on the film, a cell was assembled, and the alignment state when voltage was applied was observed. As a result, no defective alignment or Nesa black due to conduction between the upper and lower substrates was observed. In addition, in the cell assembly process, a liquid crystal alignment film composition (manufactured by Hitachi Chemical Co., Ltd., LX-140
No repellency occurred when 0-04) was applied onto a transparent electric scratch protective coating.

比較例1 実施例1(A)において、フェニルトリクロロシランお
よびメチルトリクロロシランを用いる代わりにメチルト
リクロロシランのみを用いた以外は実施例1(A)と同
様の方法によって数平均分子量20,000の末端ヒド
ロキシポリメチルラダーシロキサンを合成した。またこ
れを実施例1(B)と同様のフラスコ中に5g秤量し、
溶媒としてN−メチル−2−ピロリドン60gとブチル
セロソルブ30gを加えて撹拌溶解し、さらにテトラブ
トキシジルコニウムの10重世%ブチルセロソルブ溶液
5gを滴下ロートから撹拌下に滴下した後、室温で約2
時間撹拌混合して保護被膜形成用組成物を得た。得られ
た組成物の固形分濃度は4.9重量%(200°Cで2
時間乾燥)であり、25°Cにおける粘度は20センチ
ボイズであった。
Comparative Example 1 A terminal with a number average molecular weight of 20,000 was prepared in the same manner as in Example 1(A) except that only methyltrichlorosilane was used instead of phenyltrichlorosilane and methyltrichlorosilane. Hydroxy polymethyl ladder siloxane was synthesized. In addition, 5 g of this was weighed into the same flask as in Example 1 (B),
As a solvent, 60 g of N-methyl-2-pyrrolidone and 30 g of butyl cellosolve were added and dissolved with stirring, and then 5 g of a 10% butyl cellosolve solution of tetrabutoxyzirconium was added dropwise from the dropping funnel with stirring.
The mixture was stirred and mixed for a period of time to obtain a composition for forming a protective film. The solid content concentration of the obtained composition was 4.9% by weight (2% by weight at 200°C).
The viscosity at 25° C. was 20 centivoise.

この組成物の膜特性を実施例1 (B)と同様にして評
価したところ、絶縁耐圧は45V/1000人であった
。しかし、配向膜組成物を塗布するとハジキが生じた。
When the film properties of this composition were evaluated in the same manner as in Example 1 (B), the dielectric strength voltage was 45 V/1000 people. However, when the alignment film composition was applied, repellency occurred.

比較例2 実施例1(A)において、フェニルトリクロロシランと
メチルトリクロロシランをモル比で1:1の割合で用い
た以外は実施例1 (A)と同様の方法によって数平均
分子ff120,000の末端ヒドロキシポリフェニル
メチルラダーポリシロキサンを合成した。またこれを実
施例1(B)と同様のフラスコ中に5g秤量し、溶媒と
してN−メチル−2−ピロリドン60gとブチルセロソ
ルブ30gを加えて撹拌溶解した。さらにテトラブトキ
シジルコニウムの10重世%ブチルセロソルブ溶液5g
を滴下ロートから撹拌下に滴下した後、室温で約2時間
撹拌混合して保護被膜形成用組成物を得た。得られた組
成物の固形分濃度は4.9重量%(200℃で2時間乾
燥)であり、25°Cにおける粘度は20センチボイズ
であった。
Comparative Example 2 In Example 1 (A), a number average molecular weight of ff 120,000 was prepared in the same manner as in Example 1 (A) except that phenyltrichlorosilane and methyltrichlorosilane were used in a molar ratio of 1:1. A terminal hydroxy polyphenylmethyl ladder polysiloxane was synthesized. Further, 5 g of this was weighed into the same flask as in Example 1 (B), and 60 g of N-methyl-2-pyrrolidone and 30 g of butyl cellosolve were added as solvents and dissolved with stirring. Furthermore, 5 g of 10% butyl cellosolve solution of tetrabutoxyzirconium
was added dropwise from the dropping funnel while stirring, and the mixture was stirred and mixed at room temperature for about 2 hours to obtain a composition for forming a protective film. The solid content concentration of the obtained composition was 4.9% by weight (drying at 200°C for 2 hours), and the viscosity at 25°C was 20 centivoise.

この組成物を塗布、硬化させて作製した保護被膜の上に
配向膜を塗布すると、塗膜の一部にハジキが生じた。
When an alignment film was applied on a protective film prepared by applying and curing this composition, repellency occurred in a part of the coating film.

〔発明の効果〕〔Effect of the invention〕

本発明の液晶表示素子の透明電極保護被膜形成用組成物
によれば、簡便な塗布法で、低温の熱処理により硬化さ
せて透明電極保護被膜を形成することができるため、透
明電極のシート抵抗値が上昇することがなく、また上下
基板の導通による配向不良やネサ黒等が防止できる。さ
らにこの透明電極保護被膜形成用組成物を用いて形成し
た保護被膜は、この上に配向膜組成物を塗布してもノ1
ジキの発生がないため、該組成物を用いて作製した液晶
表示素子および液晶表示板の寿命および信転性を向上さ
せることができる。
According to the composition for forming a transparent electrode protective film of a liquid crystal display element of the present invention, a transparent electrode protective film can be formed by a simple application method and cured by low-temperature heat treatment, so that the sheet resistance of the transparent electrode can be There is no rise in the temperature, and it is possible to prevent poor alignment and blackness due to conduction between the upper and lower substrates. Furthermore, the protective film formed using this composition for forming a transparent electrode protective film remains unchanged even when an alignment film composition is applied thereon.
Since no scratching occurs, the life and reliability of liquid crystal display elements and liquid crystal display boards produced using the composition can be improved.

Claims (1)

【特許請求の範囲】 1、(a)一般式( I ) ▲数式、化学式、表等があります▼( I ) (式中、R_1およびR_2は水素または一価炭化水素
基、nは正の整数を意味する)で表され、かつ一般式(
I )中のR_1および/またはR_2の55%以上が
フェニル基からなる、数平均分子量が2,000〜50
0,000である末端ヒドロキシラダーポリシロキサン
、 (b)一般式(II) M(OR′)_m(II) (式中、Mは金属元素、R′は水素または一価炭化水素
基、mは正の整数を意味する)で表される有機金属化合
物および (c)溶媒を含有してなる液晶表示素子の透明電極保護
被膜形成用組成物。 2、請求項1記載の透明電極保護被膜形成用組成物を用
いて形成した透明電極保護被膜を有する液晶表示素子。
[Claims] 1. (a) General formula (I) ▲ Numerical formulas, chemical formulas, tables, etc. ▼ (I) (In the formula, R_1 and R_2 are hydrogen or a monovalent hydrocarbon group, and n is a positive integer. ), and the general formula (
I) in which 55% or more of R_1 and/or R_2 consists of phenyl groups, and the number average molecular weight is 2,000 to 50
0,000, (b) general formula (II) M(OR')_m(II) (wherein M is a metal element, R' is hydrogen or a monovalent hydrocarbon group, m is 1. A composition for forming a transparent electrode protective film of a liquid crystal display element, comprising an organometallic compound represented by (meaning a positive integer) and (c) a solvent. 2. A liquid crystal display element having a transparent electrode protective film formed using the composition for forming a transparent electrode protective film according to claim 1.
JP4252689A 1989-02-22 1989-02-22 Composition for forming transparent electrode protective film of liquid crystal display element and liquid crystal display element Pending JPH02221923A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4252689A JPH02221923A (en) 1989-02-22 1989-02-22 Composition for forming transparent electrode protective film of liquid crystal display element and liquid crystal display element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4252689A JPH02221923A (en) 1989-02-22 1989-02-22 Composition for forming transparent electrode protective film of liquid crystal display element and liquid crystal display element

Publications (1)

Publication Number Publication Date
JPH02221923A true JPH02221923A (en) 1990-09-04

Family

ID=12638526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4252689A Pending JPH02221923A (en) 1989-02-22 1989-02-22 Composition for forming transparent electrode protective film of liquid crystal display element and liquid crystal display element

Country Status (1)

Country Link
JP (1) JPH02221923A (en)

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