JPH02221399A - Small-sized test cell for composite plating - Google Patents

Small-sized test cell for composite plating

Info

Publication number
JPH02221399A
JPH02221399A JP4088989A JP4088989A JPH02221399A JP H02221399 A JPH02221399 A JP H02221399A JP 4088989 A JP4088989 A JP 4088989A JP 4088989 A JP4088989 A JP 4088989A JP H02221399 A JPH02221399 A JP H02221399A
Authority
JP
Japan
Prior art keywords
plating
corners
composite
composite plating
floor member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4088989A
Other languages
Japanese (ja)
Other versions
JPH0819555B2 (en
Inventor
Muneyori Matsumura
宗順 松村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
Original Assignee
Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uemera Kogyo Co Ltd, C Uyemura and Co Ltd filed Critical Uemera Kogyo Co Ltd
Priority to JP1040889A priority Critical patent/JPH0819555B2/en
Publication of JPH02221399A publication Critical patent/JPH02221399A/en
Publication of JPH0819555B2 publication Critical patent/JPH0819555B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To constitute the small-sized test cell for the subject plating which can surely form the subject plating film with good reproducibility by engaging a floor member consisting of a flat bottom and upward tapered walls connected to the outer peripheral edges thereof with the inside of a peripheral wall body of a square ring shape having rounded four corners. CONSTITUTION:The small-sized test cell 1 is constituted of a cell body 2 and the floor member 3 and the cell body 2 is constituted of the peripheral wall body 4 of approximately the square ring shape which has the rounded inner peripheral surfaces at the four corners 4a and a bottom plate 5 which is closed at the bottom opening thereof. The floor member 3 consists of the square flat bottom 6 having the rounded four corners and the annular tapered wall parts 7 inclining gradually upward from the outer peripheral edges toward the outside. The four corners of the tapered wall parts 7 are formed as the curved corner parts 7c which have roundness and connect the side face parts 7a on one side and the side face parts 7b on the other side adjacent to each other. The top ends of the curved corner parts 7c have the roundness corresponding to the roundness at the four corners of the peripheral wall body 4. The plating liquid is uniformly stirred without stagnation in this way and the particulate materials are uniformly dispersed therein.

Description

【発明の詳細な説明】 産皇上段■五光更 本発明は、無機又は有機微粒子等の複合材をめっき皮膜
中に共析させる複合めっき試験に用いられる小型の複合
めっき試験槽に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a small-sized composite plating test tank used in a composite plating test in which composite materials such as inorganic or organic fine particles are eutectoided into a plating film.

の    び   が   しよ  と  る従来より
、無機又は有機微粒子等の複合材をめっき皮膜中に共析
させる複合めっきが各種用途に広く用いられているが、
複合めっき液の試験には、ハルセル試験装置や1〜5Q
のビーカー中にめっき試験液を入れ、マグネチックスタ
ーラーやプロペラ撹拌を行なってめっきを行ない、めっ
き皮膜の外観や複合材の共析量を試験することが行なわ
れてきた。
Composite plating, in which composite materials such as inorganic or organic fine particles are eutectoided into a plating film, has been widely used for various purposes.
For testing composite plating solutions, Hull cell test equipment and 1-5Q
A plating test solution is placed in a beaker, and plating is performed using magnetic stirrer or propeller stirring to test the appearance of the plating film and the eutectoid amount of the composite material.

しかしながら、ハルセル試験装置やビーカー試験では、
複合めっき皮膜の性能等をある程度試験することができ
るが、現場のめっき槽の状態を再現する点では十分でな
い。
However, in Hull cell test equipment and beaker tests,
Although it is possible to test the performance of composite plating films to some extent, it is not sufficient to reproduce the conditions of the plating tank on site.

このため、本発明者は現場と同じ四角箱形槽を小型化し
たものを使用して複合めっき試験を行なったが、この場
合の撹拌方式としては、マグネチックスターラーによる
撹拌がめつき槽の中央部に回転子を置いて中央部で撹拌
し得る点から好適であり、このためマグネチックスター
ラーを使用することを試みた。しかし、かかるめっき撹
拌によるめっき試験では、めっき液中に撹拌の不適切に
より空気が混入したり、不適当な渦流が生じ、このため
これらの撹拌の影響によるめっき外観不良が生じる問題
があり、更に複合材がめつき液中に均一に分散せず、し
ばしばめっき槽の底部周縁部近傍、特に四隅部に沈殿し
、添加した複合材が全て確実にめっきに使用されず、こ
のため共析量が添加した複合材量に相応せず、低下した
り、めっき試験片に共析量のばらつきが生じたり、更に
はめつき試験毎に共析量が相違するなど、良好な再現性
が得られないものであった。またこの場合マグネチック
スターラーの代りにプロペラ撹拌方式を採用しても同様
の問題が生じた6 本発明は、上記事情に鑑みなされたもので、めっき槽内
のめっき液に撹拌の乱れにより空気を混入させたり、渦
流を生じさせることがなく、均一に澱みなく撹拌するこ
とができ、従って複合材がめつき液中に均一かつ有効に
分散し得、添加した複合材及びその量に相応した皮膜特
性を有する複合めっき皮膜を確実にかつ再現性よく得る
ことができ、このため複合めっき液及びこれから得られ
た複合めっき皮膜の性能及び特性を確実に評価し得る複
合めっき用小型試験槽を提供することを目的とする。
For this reason, the present inventor conducted a composite plating test using a smaller version of the same rectangular box tank used in the field, but the stirring method used in this case was that the stirring method using a magnetic stirrer was used in the center of the plating tank. This is suitable because a rotor can be placed in the center to stir the mixture, and for this reason we attempted to use a magnetic stirrer. However, in such a plating test using plating stirring, there are problems such as air being mixed into the plating solution due to inappropriate stirring, and inappropriate vortices being generated, resulting in poor appearance of the plating due to the influence of these stirrings. The composite material is not uniformly dispersed in the plating solution and often settles near the bottom periphery of the plating tank, especially at the four corners, ensuring that all the added composite material is not used for plating, and this results in the eutectoid amount being added. Good reproducibility may not be obtained because the amount of eutectoid is not commensurate with the amount of composite material applied, the amount of eutectoid decreases, and the amount of eutectoid varies between plating test pieces, and the amount of eutectoid differs between plating tests. there were. In this case, even if a propeller agitation system was used instead of a magnetic stirrer, the same problem would occur.6 The present invention was developed in view of the above circumstances, and the plating solution in the plating tank is filled with air due to turbulent stirring. It can be stirred uniformly and without stagnation without mixing or creating vortices, so the composite material can be uniformly and effectively dispersed in the plating solution, and the film properties can be adjusted according to the added composite material and its amount. To provide a small-sized test tank for composite plating, which can reliably and reproducibly obtain a composite plating film having the following characteristics, and thereby enable reliable evaluation of the performance and characteristics of the composite plating solution and the composite plating film obtained therefrom. With the goal.

を  するための 本発明は、上記目的を達成するため、内部に複合材を分
散した複合めっき液を収容し、該めっき液を撹拌しつつ
、これに浸漬させた試験片に複合めっきを行なう複合め
っき用小型試験槽において、四隅が丸味を帯びた四角リ
ング状又は断面中空略レーストラック状の周壁体内に平
底部とその外周縁部に連設された上向きのテーパー壁と
からなる床部材を係合してなることを特徴とする複合め
っき用小型試験槽を提供する。
In order to achieve the above object, the present invention contains a composite plating solution in which a composite material is dispersed, and performs composite plating on a test piece immersed in the plating solution while stirring the plating solution. In a small test chamber for plating, a floor member consisting of a flat bottom and an upwardly tapered wall connected to the outer peripheral edge of the wall is installed in a surrounding wall having a square ring shape with rounded corners or a hollow racetrack shape in cross section. To provide a small-sized test tank for composite plating characterized by a combination of the following:

■−里 本発明の複合めっき用小型試験槽は、上述した構成とし
たことにより、スターラー回転子やプロペラの回転によ
り生じためっき液の流れが平底部とその外周縁部に連設
されたテーパー壁に沿って上昇し、試験槽内を下方から
上方へ向かう流れが形成され、渦流の発生が効果的に防
止されると共に、周壁体が四隅が丸味を帯びた四角リン
グ状又は断面中空略レーストラック状であり、内面に角
部を有しないため、隅部にめっき液の澱みが生じること
なく、複合材がめつき液中に均一に分散し、隅などに沈
殿することがないので、添加した複合材が有効に複合め
っきに使用され、添加した複合材及びその量に相応した
皮膜特性を有する複合めっき皮膜を確実に得ることがで
きる。従って、本発明の複合めっき用小型試験槽によれ
ば、複合めっき液及びこれから得られた複合めっき皮膜
の性能及び特性を確実に評価し得る。
■-Sato The compact test tank for composite plating of the present invention has the above-described configuration, so that the flow of the plating solution caused by the rotation of the stirrer rotor and propeller is controlled by the taper connected to the flat bottom and its outer periphery. A flow rises along the wall and flows from the bottom to the top in the test chamber, effectively preventing the generation of vortices. Since it is track-shaped and has no corners on the inner surface, the plating solution does not stagnate in the corners, and the composite material is uniformly dispersed in the plating solution and does not precipitate in the corners. The composite material is effectively used in composite plating, and a composite plating film having film characteristics commensurate with the added composite material and its amount can be reliably obtained. Therefore, according to the small-sized test tank for composite plating of the present invention, the performance and characteristics of the composite plating solution and the composite plating film obtained therefrom can be reliably evaluated.

以下、本発明の一実施例につき1図面を参照して説明す
る。
Hereinafter, one embodiment of the present invention will be described with reference to one drawing.

〔実施例〕〔Example〕

第1図及び第2図は、本発明の一実施例に係る複合めっ
き用小型試験槽1を示すもので、スターラー回転子を使
用し、実験室等で複合めっき試験を行なうのに好適に使
用される内容量0.5〜5Qの複合めっき用試験槽であ
る。
Figures 1 and 2 show a small test tank 1 for composite plating according to an embodiment of the present invention, which uses a stirrer rotor and is suitable for use in conducting composite plating tests in laboratories, etc. This is a test tank for composite plating with an internal capacity of 0.5 to 5Q.

この複合めっき用試験槽1は槽本体2と床部材3とから
構成されている。槽本体2は、四隅4a。
This composite plating test tank 1 is composed of a tank body 2 and a floor member 3. The tank body 2 has four corners 4a.

4a、4a、4aが丸味を帯びた内周面を有する略四角
リング状乃至断面中空略レーストラック状の周壁体4と
、その下端開口部を閉塞する底板5とからなる。また床
部材3は、四隅が丸味を帯びた四角状平底部6とその外
周縁部から外方に向かうに従かい漸次上向傾斜するリン
グ状テーパー壁部7とからなり、このテーパー壁部7の
四隅は互に隣接する一側面部7aと他側面部7bとの間
を丸味を持って連絡する湾曲隅部7Cとして形成され、
該湾曲四隅部7c、7c、7c、7cの上端部は上記周
壁体4の四隅に相応した丸味を帯びて形成されている。
4a, 4a, 4a consist of a peripheral wall body 4 having a generally square ring shape or a hollow racetrack shape in cross section and having a rounded inner peripheral surface, and a bottom plate 5 that closes an opening at the lower end of the peripheral wall body 4. The floor member 3 is composed of a rectangular flat bottom part 6 with rounded corners and a ring-shaped tapered wall part 7 that gradually slopes upward as it goes outward from the outer peripheral edge of the bottom part 6. The four corners of are formed as curved corners 7C that connect one side surface portion 7a and the other side surface portion 7b that are adjacent to each other with a rounded shape,
The upper ends of the four curved corners 7c, 7c, 7c, 7c are rounded to correspond to the four corners of the peripheral wall 4.

また、テーパー壁部7の互に対向する一方の両側面部7
a、7aの中央部には円弧状の切り欠き部8,8が形成
され、これにより上記底部6の互に対向する一方の一側
縁部6a。
Also, one of the opposing side surfaces 7 of the tapered wall portion 7
Arc-shaped notches 8, 8 are formed in the central portions of the bottom portions 6a, 7a, thereby forming one side edge 6a of the bottom portion 6 that faces each other.

6aの中央部に外方に向けた円弧状突出部9,9が形成
されている。この床部材3は槽本体2に係合し、底抜5
上に配設されて、複合めっき用試験槽1が形成されるも
のである。
Arcuate protrusions 9, 9 facing outward are formed at the center of 6a. This floor member 3 engages with the tank body 2, and the bottoming member 3
A test tank 1 for composite plating is formed by disposing the test tank 1 on the top.

ここで、上記テーパー壁部7の角度は、底部6に対し2
0〜50@、特に30’前後とすることが好ましい、ま
た周壁体4の隅部4a、4a。
Here, the angle of the tapered wall portion 7 is 2 with respect to the bottom portion 6.
The corner portions 4a, 4a of the peripheral wall body 4 are preferably in the range of 0 to 50@, particularly around 30'.

4a、4a内面はめっき槽の大きさに応じて適宜その曲
率半径が設定されるが1通常曲率半径が10〜30■、
特に20nw+前後に形成される。更に1円弧状突出部
9.9の曲率半径は、使用するスターラー回転子7に応
じて適宜設定されるが。
The radius of curvature of the inner surfaces of 4a and 4a is set as appropriate depending on the size of the plating tank, but usually the radius of curvature is 10 to 30 cm,
In particular, it is formed around 20nw+. Furthermore, the radius of curvature of the circular arc-shaped protrusion 9.9 is appropriately set depending on the stirrer rotor 7 to be used.

通常曲率半径60〜1001111.特に80mn前後
に形成される。
Normal curvature radius 60-1001111. In particular, it is formed around 80 mm.

上記複合めっき用試験槽1を用いて複合めっき試験を行
なう場合、試験槽1内を複合材を分散した複合めっき試
験液で満たし、マグネチックスターラー装置10上に載
置すると共に、試験槽1内にスターラー回転子11を配
置し、スターラー回転子を回転させた状態で上記複合め
っき液中に浸漬した試験片にめっきを行なうものである
When performing a composite plating test using the above test tank 1 for composite plating, the inside of the test tank 1 is filled with a composite plating test solution in which a composite material is dispersed, and the test tank 1 is placed on the magnetic stirrer device 10. A stirrer rotor 11 is disposed in the test piece, and a test piece immersed in the composite plating solution is plated while the stirrer rotor is being rotated.

これにより、スターラー回転子7の回転により生じため
っき液流が底部のテーパー壁部7に沿って上昇し、試験
槽1内を下方から上方へ向かう流れが形成され、渦流の
発生が効果的に防止されると共に、周壁体4内面隅部が
角ばらずに丸味を帯びているので、めっき液流に澱みが
生じることなくスムーズな液流の循環が行なわれる。ま
た、スターラー回転子を用いた撹拌の場合は、なるべく
大きな回転子を使用し、低回転で撹拌を行なうことが渦
流の発生を防止する上で好ましいが、上記試験槽1には
底部6の一側縁部6a、6aに円弧状突出部9,9が形
成されているので大きな回転子を使用することができ、
この点からも渦流が生じにくいものである。
As a result, the plating liquid flow generated by the rotation of the stirrer rotor 7 rises along the tapered wall portion 7 at the bottom, forming a flow from the bottom to the top in the test chamber 1, effectively generating a vortex flow. In addition, since the inner corner of the peripheral wall 4 is not angular but rounded, smooth circulation of the plating solution is achieved without stagnation occurring in the plating solution. In addition, in the case of stirring using a stirrer rotor, it is preferable to use a rotor as large as possible and perform stirring at low rotation speed in order to prevent the generation of vortices. Since the arcuate protrusions 9, 9 are formed on the side edges 6a, 6a, a large rotor can be used.
From this point as well, vortices are less likely to occur.

従って、上記複合めっき用試験槽1を使用することによ
り、スターラー回転子を使用した撹拌方式を採用しても
、試験槽内のめっき液に撹拌の乱れにより空気を混入さ
せたり、渦流を生じさせることがなく、均一に撹拌する
ことができ、従って複合材がめつき液中に均一に分散し
、隅などに沈殿することがないので添加された複合材が
有効に複合めっきに使用され、得られた複合めっき皮膜
は添加した複合材に確実に相応した皮膜特性を有し、種
々の複合材種類、添加量の複合めっきを有効に再現でき
る。それ故、複合めっき液、これから得られた皮膜の性
能を試験槽による悪影響をなくして評価し得る。
Therefore, by using the above composite plating test tank 1, even if a stirring method using a stirrer rotor is adopted, air may be mixed into the plating solution in the test tank due to turbulence of stirring, or eddies may be generated. Therefore, the composite material is uniformly dispersed in the plating solution and does not settle in the corners, so the added composite material can be effectively used in composite plating and the resulting composite material can be stirred uniformly. The composite plating film has film characteristics that are certainly suitable for the added composite material, and it is possible to effectively reproduce composite plating with various types of composite materials and amounts added. Therefore, the performance of the composite plating solution and the films obtained therefrom can be evaluated without the adverse effects of the test chamber.

なお、上記実施例においては、槽本体と床部材とを別体
として形成し、これらを接合して複合めっき用試験槽1
としたが、これらを一体に形成してもよく、まためっき
を行なう場合に、プロペラ撹拌等の他の撹拌手段を用い
てもよい。更に、その他の構成についても本発明の要旨
を逸脱しない範囲で種々変更して差支えない。
In the above embodiment, the tank body and the floor member are formed separately, and these are joined to form the composite plating test tank 1.
However, these may be formed integrally, and when plating is performed again, other stirring means such as propeller stirring may be used. Furthermore, various changes may be made to other configurations without departing from the gist of the present invention.

次に、実験例により本発明の効果を具体的に示す。Next, the effects of the present invention will be specifically illustrated by experimental examples.

〔実験例〕[Experiment example]

第1,2図に示したものと同様の複合めっき用試験槽を
用いて下記(1)、(2)、(3)の複合めっきを行な
い、めっき液中の複合材の分散量及びめっき皮膜中の複
合材の共析量を測定した。この場合、試験槽1の内寸法
は170mmX 90nmX 120mm、周壁体4の
隅部4a、4a、4a、4aの曲率半径30nn、テー
パー壁部7の傾斜角度30″5円弧状切り欠き部9,9
の曲率半径80mmのものを用いた。なお、比較のため
隅部が丸味を帯びず、かつ床部材3を有しない四角箱形
の試験槽(上記めっき槽1と同容量)を用いて下記(1
)、(2)。
Composite plating as described in (1), (2), and (3) below was performed using a test tank for composite plating similar to that shown in Figures 1 and 2, and the amount of dispersion of the composite material in the plating solution and the plating film were measured. The eutectoid amount of the composite material inside was measured. In this case, the internal dimensions of the test chamber 1 are 170 mm x 90 nm x 120 mm, the radius of curvature of the corners 4a, 4a, 4a, 4a of the peripheral wall 4 is 30 nn, the inclination angle of the tapered wall 7 is 30'', the arcuate notches 9, 9
The radius of curvature of 80 mm was used. For comparison, the following (1
), (2).

(3)と同様の条件で複合めっきを行ない、複合材のめ
っき液中への分散量及びめっき皮膜中の共析量を測定し
た。これらの結果を第1表に示す。
Composite plating was performed under the same conditions as in (3), and the amount of composite material dispersed in the plating solution and the amount of eutectoid in the plating film were measured. These results are shown in Table 1.

(1)31m径のSiC微粒子50 g / Qをスル
ファミン酸ニッケル系めっき液に分散し、pH4,2、
温度45℃、スターラー回転子(回転径36on、以下
同じ)の回転数5QOrpmの条件で陰極電流密度3A
/dnfにおいて複合電気ニッケルめっきを行なった。
(1) 50 g/Q of SiC fine particles with a diameter of 31 m were dispersed in a nickel sulfamate plating solution, and the pH was 4.2.
Cathode current density 3A under the conditions of temperature 45℃ and stirrer rotor (rotation diameter 36on, same below) rotation speed 5QOrpm.
Composite electrolytic nickel plating was performed at /dnf.

(2)5M径のZrO,微粒子100 g / Qをス
ルファミン酸ニッケル系めっき液に分散し、pH4,0
゜温度45℃、スターラー回転子の回転数65Orpm
の条件で陰極電流密度3A/drrrにおいて複合電気
ニッケルめっきを行なった。
(2) Disperse 100 g/Q of ZrO fine particles with a diameter of 5M in a nickel sulfamate plating solution and adjust the pH to 4.0.
゜Temperature 45℃, stirrer rotor rotation speed 65Orpm
Composite electrolytic nickel plating was performed under the following conditions at a cathode current density of 3 A/drrr.

(3)11m径のAl1.0.微粒子200g/Qをワ
ットタイプのニッケルめっき液に分散し、pl−14,
2゜温度50℃、スターラー回転子の回転数70 Or
pmの条件で陰極電流密度3A/drrrにおいて複合
電気ニッケルめっきを行なった。
(3) 11m diameter Al1.0. Disperse 200g/Q of fine particles in Watt type nickel plating solution, pl-14,
2゜Temperature: 50℃, stirrer rotor rotation speed: 70 Or
Composite electrolytic nickel plating was performed at a cathode current density of 3 A/drrr under the conditions of pm.

第1表 っき皮膜を確実にかつ再現性よく繰り返し得ることがで
き、このため複合めっき液及びこれから得られた複合め
っき皮膜の性能及び特性を確実に評価し得る。
The first surface plating film can be repeatedly obtained reliably and with good reproducibility, and therefore the performance and characteristics of the composite plating solution and the composite plating film obtained therefrom can be reliably evaluated.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(A)、(B)、(C)は1本発明複合めっき用
小型試験槽の一実施例を示すもので、(A)は平面図、
(B)は(A)図B−B線に沿った断面図、(C)は(
A)図C−C線に沿った断面図、第2図は同側の分解斜
視図である。 本発明の複合めっき用試験槽によれば、スターラー回転
子やプロペラを用いた撹拌手段を採用した場合でも、試
験槽内のめっき液に撹拌の不適切により空気を混入させ
たり、渦流を生じさせることがなく、均一に澱みなく撹
拌することができ、従って複合材がめつき液中に均一に
分散し得、添加した複合材に相応した皮膜特性を有する
複合め1・・・複合めっき用小型試験槽 2・・・槽本
体3・・・床部材     4・・・周壁体6・・・底
  部        7・・・テーパー壁部出願人 
 上 村 工 業 株式会社 代理人  弁理士 小 島 隆 司
Figures 1 (A), (B), and (C) show an embodiment of a small test tank for composite plating according to the present invention; (A) is a plan view;
(B) is a sectional view taken along line B-B in (A), and (C) is (
A) A sectional view taken along the line C-C in the figure, and FIG. 2 is an exploded perspective view of the same side. According to the test tank for composite plating of the present invention, even when a stirring means using a stirrer rotor or a propeller is adopted, air may be mixed into the plating solution in the test tank or eddies may be generated due to inappropriate stirring. The composite material can be stirred uniformly and without stagnation, and therefore the composite material can be uniformly dispersed in the plating solution, and the composite material has film characteristics commensurate with the added composite material 1...Small test for composite plating Tank 2... Tank body 3... Floor member 4... Surrounding wall body 6... Bottom part 7... Tapered wall part Applicant
Uemura Kogyo Co., Ltd. Agent Patent Attorney Takashi Kojima

Claims (1)

【特許請求の範囲】[Claims] 1. 内部に複合材を分散した複合めっき液を収容し、
該めっき液を撹拌しつつ、これに浸漬させた試験片に複
合めっきを行なう複合めっき用小型試験槽において、四
隅が丸味を帯びた四角リング状又は断面中空略レースト
ラック状の周壁体内に平底部とその外周縁部に連設され
た上向きのテーパー壁とからなる床部材を係合してなる
ことを特徴とする複合めっき用小型試験槽。
1. Contains a composite plating solution with composite materials dispersed inside,
In a small test tank for composite plating, in which composite plating is performed on a test piece immersed in the plating solution while stirring the plating solution, a flat bottom is installed inside the circumferential wall having a square ring shape with rounded corners or a hollow approximately racetrack shape in cross section. A small test tank for composite plating, characterized in that it is formed by engaging a floor member consisting of a floor member and an upwardly tapered wall connected to its outer peripheral edge.
JP1040889A 1989-02-21 1989-02-21 Small test tank for composite plating Expired - Lifetime JPH0819555B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1040889A JPH0819555B2 (en) 1989-02-21 1989-02-21 Small test tank for composite plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1040889A JPH0819555B2 (en) 1989-02-21 1989-02-21 Small test tank for composite plating

Publications (2)

Publication Number Publication Date
JPH02221399A true JPH02221399A (en) 1990-09-04
JPH0819555B2 JPH0819555B2 (en) 1996-02-28

Family

ID=12593082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1040889A Expired - Lifetime JPH0819555B2 (en) 1989-02-21 1989-02-21 Small test tank for composite plating

Country Status (1)

Country Link
JP (1) JPH0819555B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06108298A (en) * 1992-09-30 1994-04-19 Kawasaki Steel Corp Electricity conducting treatment test equipment for metallic plate and test piece holder
WO1996000314A3 (en) * 1994-06-24 1996-02-22 Aixtron Gmbh Reactor and process for coating flat substrates
US6279506B1 (en) 1995-06-26 2001-08-28 Aixtron Ag Reactor for coating plane substrates and method for producing said substrates

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53127U (en) * 1976-06-21 1978-01-05
JPS536236A (en) * 1976-07-08 1978-01-20 Suwa Seikosha Kk Cooprecipitation plating apparatus
JPS552797A (en) * 1978-06-15 1980-01-10 Rexall Drug Chemical Electrolytic cell
JPS58133400A (en) * 1982-01-30 1983-08-09 Matsushita Electric Works Ltd Composite plating method
JPS63138246A (en) * 1986-11-29 1988-06-10 Oki Electric Ind Co Ltd Method for testing stirring state of plating liquid

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53127U (en) * 1976-06-21 1978-01-05
JPS536236A (en) * 1976-07-08 1978-01-20 Suwa Seikosha Kk Cooprecipitation plating apparatus
JPS552797A (en) * 1978-06-15 1980-01-10 Rexall Drug Chemical Electrolytic cell
JPS58133400A (en) * 1982-01-30 1983-08-09 Matsushita Electric Works Ltd Composite plating method
JPS63138246A (en) * 1986-11-29 1988-06-10 Oki Electric Ind Co Ltd Method for testing stirring state of plating liquid

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06108298A (en) * 1992-09-30 1994-04-19 Kawasaki Steel Corp Electricity conducting treatment test equipment for metallic plate and test piece holder
JP2700044B2 (en) * 1992-09-30 1998-01-19 川崎製鉄株式会社 Specimen holder for conducting test of metal plate
WO1996000314A3 (en) * 1994-06-24 1996-02-22 Aixtron Gmbh Reactor and process for coating flat substrates
US6279506B1 (en) 1995-06-26 2001-08-28 Aixtron Ag Reactor for coating plane substrates and method for producing said substrates

Also Published As

Publication number Publication date
JPH0819555B2 (en) 1996-02-28

Similar Documents

Publication Publication Date Title
AU607386B2 (en) Mass transfer mixing system especially for gas dispersion in liquids or liquid suspensions
US4498785A (en) Floating magnetic stirrer for culture medium
JP3677227B2 (en) Stirring blade and stirring method
JPH02221399A (en) Small-sized test cell for composite plating
JP3349512B2 (en) Cassettes for processing samples for histological experiments, especially section preparation
EP0137606A3 (en) Sterile suspension and solution holding and mixing tank
JP4316251B2 (en) Closed stirring device
JP3244847B2 (en) Cell culture vessel
JPH0329329Y2 (en)
JPH07786A (en) Impeller
NO159457B (en) BORETAARN DEVICE.
JP6887639B2 (en) Stirrer, stirrer method, cell culture method and reaction promotion method
SU929187A1 (en) Apparatus for mechanical ajitating of liquids
CN221207747U (en) Mixer with vibration function
JPS5916530A (en) Impeller in agitator
CN211411717U (en) Vertical four-petal mixer
JPS5919526A (en) Stirring blade in stirrer
US3123343A (en) Harry h
CN218189014U (en) Dispersion disk and dispersion machine comprising same
JP2501938Y2 (en) Particle size distribution measuring device
TW202126381A (en) Dispersion device and slurry dispersion system
CN208660953U (en) It is a kind of to test the high-efficiency stirrer used
SU1176930A1 (en) Apparatus for dispersing gas into a liquid
JP2024076500A (en) Agitation device
JPH05103965A (en) Gas-liquid agitation impeller