JPH02212751A - X-ray diffractometer - Google Patents
X-ray diffractometerInfo
- Publication number
- JPH02212751A JPH02212751A JP1033970A JP3397089A JPH02212751A JP H02212751 A JPH02212751 A JP H02212751A JP 1033970 A JP1033970 A JP 1033970A JP 3397089 A JP3397089 A JP 3397089A JP H02212751 A JPH02212751 A JP H02212751A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- rays
- incident
- ray
- ray diffractometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002441 X-ray diffraction Methods 0.000 abstract description 4
- 239000010949 copper Substances 0.000 abstract description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052802 copper Inorganic materials 0.000 abstract description 2
- 238000010276 construction Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、Ｘ線回折計に関するものである。[Detailed description of the invention] Industrial applications The present invention relates to an X-ray diffractometer.
従来の技術
従来のＸ線回折計の概要を第２図に示す。入射Ｘ線１は
、試料台３に固定された試料２によって検出器５の方向
に回折Ｘ線４として散乱される。BACKGROUND ART FIG. 2 shows an outline of a conventional X-ray diffractometer. Incident X-rays 1 are scattered by a sample 2 fixed on a sample stage 3 in the direction of a detector 5 as diffracted X-rays 4 .
従来のＸ線回折計の場合、入射Ｘ線１と試料２表面との
角度をθとすると、入射Ｘ線１と回折Ｘ線４との角度を
２０にとり、この関係を維持しつつ、試料台３と検出器
をスキャンする。In the case of a conventional X-ray diffractometer, if the angle between the incident X-ray 1 and the surface of the sample 2 is θ, the angle between the incident X-ray 1 and the diffracted X-ray 4 is set to 20, and while maintaining this relationship, the sample stage is 3 and scan the detector.
発明が解決しようとする課題
従来のＸ線回折計では、検出器を２０＝２００〜１２ｏ
０まで機械的にスキャンして、Ｘ線回折パターンを得る
ため、１試料の測定に少なくとも数分〜数１０分の測定
時間が必要であった。また、機械的に試料台と検出器を
スキャンするため、入射Ｘ線、試料台、検出器の幾何学
的な位置関係がしばしばずれ、Ｘ線回折計の調整には多
大の時間が費されていた。Problems to be Solved by the Invention In conventional X-ray diffractometers, the detector is
In order to obtain an X-ray diffraction pattern by mechanically scanning down to zero, measurement time of at least several minutes to several tens of minutes was required to measure one sample. In addition, because the sample stage and detector are scanned mechanically, the geometrical relationship between the incident X-ray, the sample stage, and the detector is often misaligned, and a great deal of time is spent adjusting the X-ray diffractometer. Ta.
課題を解決するための手段
本発明は、試料の法線を回転軸として任意の速度で回転
する試料に特性（固有）Ｘ線を照射し、得られた回折Ｘ
線を検出するＸ線回折計において、入射Ｘ線、試料９回
折Ｘ線を含む同一平面内で、試料から等距離に複数の検
出器を配置したＸ線回折計を提供する。Means for Solving the Problems The present invention irradiates characteristic (specific) X-rays onto a sample rotating at an arbitrary speed with the normal line of the sample as the rotation axis, and the resulting diffraction
An X-ray diffractometer for detecting rays is provided, in which a plurality of detectors are arranged equidistantly from a sample within the same plane containing incident X-rays and diffracted X-rays from a sample.
作 用 本発明のＸ線回折計によれば、入射Ｘ線、試料。For production According to the X-ray diffractometer of the present invention, the incident X-rays, the sample.
回折Ｘ線を含む同一平面内で、試料から等距離に３ ベ
ーン
複数の検出器を配置するため、検出器を固定したまま、
試料は、試料の法線を回転軸として、任意の速度で常に
同転させてＸ線回折パターンを得ることが可能である。Since multiple three-vane detectors are placed equidistantly from the sample within the same plane containing the diffracted X-rays, the
It is possible to obtain an X-ray diffraction pattern by constantly rotating the sample at an arbitrary speed using the normal line of the sample as the rotation axis.
したがって、Ｘ線回折計のθ−２θスキャンとＸ線回折
計の幾何学的な位置調整とがテト必要となり、測定時間
の大幅な短縮ができる。Therefore, θ-2θ scanning of the X-ray diffractometer and geometrical position adjustment of the X-ray diffractometer are required, and the measurement time can be significantly shortened.
実施例 第１図は、本発明のＸ線回折計の概要図である。Example FIG. 1 is a schematic diagram of the X-ray diffractometer of the present invention.
実験では入射Ｘ線１には管電圧４０ＫＶｌ管電流４ ｅ
ｓ ｍ Ａの管球から発生する銅（Ｃｕ）特性Ｘ線を、
試料２には多結晶シリコン＜Ｐｏ１ｙ−３ｉ）を、検出
器３には、０．１°間隔ごｘｌｕ・出用ダイオードｆ、
ｚ １０２４コ配置したマルチチャンネルダイオードを
使用した。ただし検出器は入射Ｘ線と回折Ｘ線との角度
２θ二２０’〜１２０’の間に配列した。In the experiment, the incident X-ray 1 has a tube voltage of 40 KVl and a tube current of 4 e.
Copper (Cu) characteristic X-rays generated from the s m A tube,
The sample 2 is made of polycrystalline silicon <Po1y-3i), and the detector 3 has xlu and output diodes f at 0.1° intervals.
Multi-channel diodes arranged in z 1024 pieces were used. However, the detectors were arranged between the angle 2θ220' and 120' between the incident X-ray and the diffracted X-ray.
この本発明のＸ線回折計を使用し、１θ秒間の測定を行
い、横軸にチャンネル数（２θ）と回折Ｘ線強度を図示
したところ、従来の０−２θ法で得られるＸ線回折パタ
ーンと同一の回折パターンが得られた。Using the X-ray diffractometer of the present invention, measurements were taken for 1θ seconds, and the horizontal axis shows the number of channels (2θ) and diffracted X-ray intensity. The same diffraction pattern was obtained.
発明の効果
本発明のＸ線回折計では、試料と検出器を固定したまま
Ｘ線回折パターンを得ることが可能であるため、Ｘ線回
折計のθ−２０スキャン時間と幾何学的な位置調整とが
不必要とな９、測定時間の大幅な短縮効果が得られると
ともに、機械的な駆動力部（モーターなど）も必要がな
くなり、装置をコンパクトにでき、インライン化への効
果も期待できる。Effects of the Invention With the X-ray diffractometer of the present invention, it is possible to obtain an X-ray diffraction pattern with the sample and detector fixed, so the θ-20 scan time and geometric position adjustment of the X-ray diffractometer can be 9, the measurement time can be significantly shortened, and there is no need for a mechanical drive unit (motor, etc.), the device can be made more compact, and it can be expected to be effective for in-line implementation.
第１図は本発明のＸ線回折計の概要図、第２図は従来の
Ｘ線回折計の概要図である。
１・・・・・・入射Ｘ線、２・・・・・・試料、３・・
・・・試料台、４・・・・・・回折Ｘ線、５・・・・・
・検出器、６・・・・・複数の検出器。FIG. 1 is a schematic diagram of the X-ray diffractometer of the present invention, and FIG. 2 is a schematic diagram of a conventional X-ray diffractometer. 1... Incident X-ray, 2... Sample, 3...
...Sample stage, 4...Diffraction X-ray, 5...
・Detector, 6...Multiple detectors.
Claims (1)
特性（固有）Ｘ線を照射し、得られた回折Ｘ線を検出す
るＸ線回折計において、入射Ｘ線、試料、回折Ｘ線を含
む同一平面内で、試料から等距離に複数の検出器を配置
することを特徴とするＸ線回折計。In an X-ray diffractometer, which irradiates a sample rotating at an arbitrary speed with the normal line of the sample as the rotation axis and detects the resulting diffracted X-rays, the incident X-rays, the sample, and the diffracted X-rays are detected. An X-ray diffractometer, characterized in that a plurality of detectors are arranged equidistantly from a sample within the same plane including the
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1033970A JPH02212751A (en) | 1989-02-14 | 1989-02-14 | X-ray diffractometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1033970A JPH02212751A (en) | 1989-02-14 | 1989-02-14 | X-ray diffractometer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02212751A true JPH02212751A (en) | 1990-08-23 |
Family
ID=12401345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1033970A Pending JPH02212751A (en) | 1989-02-14 | 1989-02-14 | X-ray diffractometer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02212751A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100409002C (en) * | 2001-08-07 | 2008-08-06 | 精工电子纳米科技术有限公司 | X-ray coating thickness device |
-
1989
- 1989-02-14 JP JP1033970A patent/JPH02212751A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100409002C (en) * | 2001-08-07 | 2008-08-06 | 精工电子纳米科技术有限公司 | X-ray coating thickness device |
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