JPH02210851A - Semiconductor chip carrier - Google Patents
Semiconductor chip carrierInfo
- Publication number
- JPH02210851A JPH02210851A JP3174889A JP3174889A JPH02210851A JP H02210851 A JPH02210851 A JP H02210851A JP 3174889 A JP3174889 A JP 3174889A JP 3174889 A JP3174889 A JP 3174889A JP H02210851 A JPH02210851 A JP H02210851A
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- recess
- insulating layer
- semiconductor chip
- metal plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 38
- 239000004020 conductor Substances 0.000 claims abstract description 34
- 239000002470 thermal conductor Substances 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims description 37
- 239000002184 metal Substances 0.000 claims description 37
- 230000000694 effects Effects 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 7
- 230000005611 electricity Effects 0.000 abstract description 2
- 230000002093 peripheral effect Effects 0.000 abstract description 2
- 230000017525 heat dissipation Effects 0.000 description 10
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000000463 material Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は、半導体搭載用に用いられるチップキャリア
に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a chip carrier used for mounting semiconductors.
(従来の技術)
従来の半導体チップキャリア特にプラスチック製のチッ
プキャリアでは半導体チップの放熱を大きくするために
、第3図に示した構造が知られている7Jすなわち、半
導体搭載用の第1の凹部lと放熱の為の第2の凹部2を
互いに表裏の関係にある両表面にそれぞれ形成した絶縁
層3、この絶縁層3に埋入され前記2つの凹部の底面に
露出した金属板4、半導体チップ搭載用の第1の凹部1
が形成された絶縁層3の表面に配設された導電パターン
5を備え、この導電パターン5が絶縁層の端面まで展設
して外部端子となるリードレスチンプキャリアBである
。この場合、第2の凹部2の底面に露出した金属板4の
放熱面の面積に支配される放熱には限度がある。又、第
4図は他の従来例であり絶縁層3において第1の凹部l
が形成された表面とは反対の表面に配設した熱伝導層8
と、この熱伝導層8と同一の表面に形成された第2の凹
部2の底面に露出して絶縁層3に埋入した金属板4とを
第2の凹部2の内壁に形成した熱伝導体9で接続し、さ
らに上記第1の四部1が形成された絶縁層3の表面に配
設された導電パターン5の外部端子をこの導電パターン
5に接続するスルホール導電路10に挿入接合された端
子ビン11で形成したビングリッドアレイCとして知ら
れている。この半導体チップキャリアにあっては、第1
の凹部によって露出した金属板4に搭載した半導体チッ
プの発生する熱は金属板4からこの熱伝導体9を経由し
て外部に露出した熱伝導層8へと移動するので第3図の
場合に比べて外部に露出した熱伝導層8による放熱量が
加わり一層放熱効果が向上する。(Prior Art) Conventional semiconductor chip carriers, particularly plastic chip carriers, have a known structure shown in FIG. 3 in order to increase heat dissipation from semiconductor chips. an insulating layer 3 in which a second recess 2 for heat dissipation is formed on both front and back surfaces, a metal plate 4 embedded in this insulating layer 3 and exposed at the bottom of the two recesses, and a semiconductor. First recess 1 for chip mounting
The leadless chimp carrier B is provided with a conductive pattern 5 disposed on the surface of an insulating layer 3 on which a conductive pattern 5 is formed, and this conductive pattern 5 extends to the end surface of the insulating layer to serve as an external terminal. In this case, heat radiation is limited by the area of the heat radiation surface of the metal plate 4 exposed at the bottom of the second recess 2. FIG. 4 shows another conventional example in which the first recess l is formed in the insulating layer 3.
A thermally conductive layer 8 disposed on a surface opposite to the surface on which
and a metal plate 4 embedded in the insulating layer 3 and exposed at the bottom of the second recess 2 formed on the same surface as the heat conduction layer 8. The external terminal of the conductive pattern 5 disposed on the surface of the insulating layer 3 on which the first four parts 1 are formed is inserted and bonded to the through-hole conductive path 10 connecting the conductive pattern 5 to the conductive pattern 5. It is known as a bin grid array C formed of terminal bins 11. In this semiconductor chip carrier, the first
The heat generated by the semiconductor chip mounted on the metal plate 4 exposed by the recessed part moves from the metal plate 4 via this heat conductor 9 to the heat conductive layer 8 exposed to the outside, so in the case of FIG. In comparison, the amount of heat dissipated by the heat conductive layer 8 exposed to the outside is added, and the heat dissipation effect is further improved.
しかし、上記従来例に係るプラスチック製のチップキャ
リアにあっては、更に放熱効果を高めた半導体チップキ
ャリアの造出が期待されている。However, in the case of the plastic chip carrier according to the above-mentioned conventional example, it is expected to create a semiconductor chip carrier with further enhanced heat dissipation effect.
又、絶縁N3の表面で微細化した回路間隔の狭い導電パ
ターン5が信号回路として作動する時、特性インピーダ
ンスが大きくなり信号が遅延することや半導体チップの
グランドを第1の凹部lに設定した時、グランドの面積
が埋入した金属板4では小さくその結果半導体チップの
グランド電位の安定性に欠けることなどの問題もある。Furthermore, when the conductive pattern 5 with narrow circuit intervals made on the surface of the insulator N3 operates as a signal circuit, the characteristic impedance becomes large and the signal is delayed, and when the ground of the semiconductor chip is set in the first recess l. However, the buried metal plate 4 has a small ground area, and as a result, there is a problem that the ground potential of the semiconductor chip lacks stability.
これらの問題に対して、[プリント配線板読本」 (伊
藤謹司著、日刊工業新聞社)111〜113頁にあるよ
うにプリント配線板と同じサイズあるいはそれ以上の大
きさの導電性のよい金属板をプリント配線板に対設して
シールドすることが記載されているが、金属板はプリン
ト配線板に含まれるものではなく依然として従来のプリ
ント配線板が固有する特性インピーダンスの低減を図る
ことはできない。To solve these problems, as described in "Printed Wiring Board Reader" (written by Kinji Ito, published by Nikkan Kogyo Shimbun), pages 111-113, a highly conductive metal plate of the same size or larger than the printed wiring board is used. However, the metal plate is not included in the printed wiring board, and it is still not possible to reduce the characteristic impedance inherent in conventional printed wiring boards.
(発明が解決しようとする課題)
放熱が大きく導電パターンの特性インピーダンスが低く
半導体チップのグランド電位の安定する導電体シールド
層を含んだ半導体チップキャリアを提供することにある
。(Problems to be Solved by the Invention) It is an object of the present invention to provide a semiconductor chip carrier including a conductive shield layer that has high heat dissipation, low characteristic impedance of a conductive pattern, and stabilizes the ground potential of the semiconductor chip.
<tJIBを解決するための手段〉
本発明は前記課題を解決するために、半導体チップ搭載
用の第1の凹部を表面に形成した絶縁層、この絶縁層に
埋入され前記凹部の底面に露出した金属板、前記凹部が
形成された絶縁層の表面に配設された導電パターンと前
記金属板との間の絶縁層内に形成された導電体シールド
層とを備え、この導電体シールド層と前記金属板とが前
記凹部の内壁に形成された導電体で接続されてなること
を特徴とする半導体チップキャリアを提供することにあ
る。<Means for Solving tJIB> In order to solve the above problems, the present invention provides an insulating layer having a first recess formed on its surface for mounting a semiconductor chip, an insulating layer embedded in this insulating layer and exposed at the bottom of the recess. a conductive shield layer formed in an insulating layer between the conductive pattern disposed on the surface of the insulating layer in which the recess is formed and the metal plate, the conductive shield layer and An object of the present invention is to provide a semiconductor chip carrier characterized in that the metal plate is connected to the metal plate through a conductor formed on the inner wall of the recess.
(実施例)
以下図面に基づいて詳しく説明する。第1図は本発明の
実施例に係る半導体チップキャリアである。第1図の半
導体チップキャリア^は絶縁層3に埋入された金属板4
が絶縁層3の表裏面に同じ中心を持つ四角柱に形成され
た半導体チップ搭載用の第1の凹部1と放熱のための第
2の凹部2の各底部に露出している。なお、凹部の形状
は四角柱状に制限する趣旨ではなく円柱などでもよく又
、凹部1と2の大きさは金属板4より小さくするのが金
属板4の脱落を阻止する上で好ましい、絶縁N3の第1
の凹部1の表面には半導体チップの回路と接続する導電
パターン5が配設され、同じ絶縁yfj3に形成された
外部端子として働く端子ビンを挿入するスルホール導電
!10に接続している。この導電パターン5は絶縁層3
の端部まで展設されて外部端子となっていてもよい、導
電パターン5と前記金属板4との間の絶縁層3内でスル
ホール導電路10と絶縁層3の端面周縁部を除く全面に
導電体シールド層6が形成され、この導電体シールド層
6は導電パターン5に流れた電気の伝搬波を存限空間内
に閉じ込める作用をし特性インピーダンスを低下させる
。なお導電体シールド層6と絶縁層3の表面の導電パタ
ーン5との間の絶縁層の厚みdを約0.3mmより小さ
くすることが特性インピーダンスの低下に特に効果があ
る。(Example) A detailed description will be given below based on the drawings. FIG. 1 shows a semiconductor chip carrier according to an embodiment of the present invention. The semiconductor chip carrier shown in FIG. 1 is a metal plate 4 embedded in an insulating layer 3.
are exposed at the bottoms of a first recess 1 for mounting a semiconductor chip and a second recess 2 for heat dissipation, which are formed in the shape of a rectangular prism having the same center on the front and back surfaces of the insulating layer 3. Note that the shape of the recesses is not limited to a rectangular prism shape, but may be a cylinder or the like, and the size of the recesses 1 and 2 is preferably smaller than the metal plate 4 in order to prevent the metal plate 4 from falling off. 1st of
A conductive pattern 5 is arranged on the surface of the recess 1 to be connected to the circuit of the semiconductor chip, and a through-hole conductive pattern is formed in the same insulation YFJ3 to insert a terminal pin that serves as an external terminal. Connected to 10. This conductive pattern 5 is the insulating layer 3
The entire surface of the insulating layer 3 between the conductive pattern 5 and the metal plate 4 except for the through-hole conductive path 10 and the peripheral edge of the end surface of the insulating layer 3 may be extended to the end of the insulating layer 3 to serve as an external terminal. A conductive shield layer 6 is formed, and this conductive shield layer 6 acts to confine the propagating waves of electricity flowing through the conductive pattern 5 within a space to the extent possible, thereby lowering the characteristic impedance. Note that setting the thickness d of the insulating layer between the conductive shield layer 6 and the conductive pattern 5 on the surface of the insulating layer 3 to be less than about 0.3 mm is particularly effective in reducing the characteristic impedance.
この導電体シールド層6は第1の凹部1の内壁に形成さ
れた導電体7を介して金属板4に接続して金属板4に搭
載される半導体チップの発生する熱を放熱する作用もす
る。更に前記凹部2の底面に露出する前記金属板4はこ
の凹部2の内壁に形成した熱伝導体9を介してこの凹部
2が形成されたのと同じ側の表面に配設した熱伝導層8
と接続している。従って第1の凹部によって露出した金
属板4に搭載した半導体チップの発生する熱は金属板4
からこの熱伝導体9を経由して外部に露出した熱伝導層
8へも移動するので放熱面積の拡大により一層放熱効果
もます。This conductor shield layer 6 is connected to the metal plate 4 via a conductor 7 formed on the inner wall of the first recess 1, and also functions to radiate heat generated by the semiconductor chip mounted on the metal plate 4. . Further, the metal plate 4 exposed on the bottom surface of the recess 2 is connected to a heat conductive layer 8 disposed on the same surface on which the recess 2 is formed, via a heat conductor 9 formed on the inner wall of the recess 2.
is connected to. Therefore, the heat generated by the semiconductor chip mounted on the metal plate 4 exposed by the first recess is transferred to the metal plate 4.
Since the heat is transferred from the heat conductor 9 to the heat conductive layer 8 exposed to the outside, the heat dissipation area is expanded and the heat dissipation effect is further improved.
次に、使用材料について述べると、第1図の半導体チッ
プキャリアを構成する絶縁N3としては、基材に樹脂を
含浸乾燥して得られたプリプレグの樹脂を硬化した絶縁
材料が用いられる。ここで絶縁層の樹脂としては耐熱性
、耐湿性に優れかつ樹脂純度、特にイオン性不純物の少
ないものが好ましい、具体的には、エポキシ樹脂、ポリ
イミド樹脂、フッソ樹脂、PPO樹脂などが適している
。Next, regarding the materials used, as the insulating material N3 constituting the semiconductor chip carrier of FIG. 1, an insulating material obtained by curing the resin of a prepreg obtained by impregnating and drying a base material with a resin is used. Here, the resin for the insulating layer is preferably one that has excellent heat resistance and moisture resistance, and has high resin purity, especially low ionic impurities. Specifically, epoxy resin, polyimide resin, fluorine resin, PPO resin, etc. are suitable. .
なお絶縁層の基材としては、紙よりガラス繊維などの無
機材料の方が耐熱性、耐湿性などに優れ好ましい。As the base material for the insulating layer, an inorganic material such as glass fiber is preferable to paper because of its superior heat resistance and moisture resistance.
絶縁層3の半導体チップ搭載側の表面の導電パターン5
、この反対側の表面の熱伝導層8そして絶縁層3内に形
成された導電体シールド層6には、銅、真鍮、アルミニ
ウム、鉄、ニッケル、ステンレスなどから適宜選択して
適用でき、中でも銅が導電性、熱伝導性に優れ特に好ま
しい、絶縁層3の半導体チップ搭載側の表面の導電パタ
ーン5及び、この反対側の表面の熱伝導層8を形成する
にあたっては、アディティブ法、サブトラクティブ法な
どの種々の方法が用いられる。導電体シールド層6の形
成にはマスラミネーシ四ン、ビンラミネーション等の多
層プリント配線板の製作方法が用いられる。スルホール
導電路10や凹部内壁の導電体7及び熱伝導体9は絶縁
層3の表面の導電パターン5の形成時にスルホールメツ
キ法などで形成される。Conductive pattern 5 on the surface of the insulating layer 3 on the semiconductor chip mounting side
The thermally conductive layer 8 on the opposite surface and the conductive shield layer 6 formed in the insulating layer 3 can be appropriately selected from copper, brass, aluminum, iron, nickel, stainless steel, etc. Among them, copper can be used. In forming the conductive pattern 5 on the surface of the semiconductor chip mounting side of the insulating layer 3 and the thermally conductive layer 8 on the opposite surface, which is particularly preferable due to its excellent electrical conductivity and thermal conductivity, an additive method or a subtractive method can be used. Various methods are used, such as: To form the conductor shield layer 6, a multilayer printed wiring board manufacturing method such as mass lamination or bottle lamination is used. The through-hole conductive path 10 and the conductor 7 and thermal conductor 9 on the inner wall of the recess are formed by a through-hole plating method or the like when forming the conductive pattern 5 on the surface of the insulating layer 3.
第2回は、本発明の他の実施例に係わる半導体チップキ
ャリアの部分詳細図である0図において半導体チップ搭
載側の絶縁層の表面に配設した導電パターン5の一部G
は第1の凹部lの内壁に形成された導電体7を介して金
属板4と接続している。なお図示されていないが前記凹
部1の内壁に形成された導電体7は絶縁層内に形成され
た導電体シールドN6とも接続している。従って、半導
体チップのグランドと導電パターン5の中の前記導電パ
ターンGとをワイヤーボンドするとグランド面積が、埋
入した金属体4と絶縁層内の導電体シールド層6とへ拡
大するのでグランド電位が安定化できる。In the second part, a part G of the conductive pattern 5 disposed on the surface of the insulating layer on the semiconductor chip mounting side is shown in FIG.
is connected to the metal plate 4 via a conductor 7 formed on the inner wall of the first recess l. Although not shown, the conductor 7 formed on the inner wall of the recess 1 is also connected to a conductor shield N6 formed within the insulating layer. Therefore, when the ground of the semiconductor chip and the conductive pattern G in the conductive pattern 5 are wire-bonded, the ground area expands to the buried metal body 4 and the conductive shield layer 6 in the insulating layer, so that the ground potential increases. It can be stabilized.
(発明の効果)
本発明は叙述の如(半導体チップ搭載用の第1の凹部を
絶縁層の表面に形成し、この凹部の底面に絶縁層に埋入
した金属板を露出させ、この凹部の内壁に形成した導電
体が埋入した前記金属板とこの凹部が形成された絶縁層
の表面に配設された導電パターンとの間の絶&!層内の
導電体シールド層とに接合していることにより、第1の
凹部によって露出した金属板4に搭載した半導体チップ
の発生する熱を放熱するのにほぼ半導体チップキャリア
に等しい面積の導電体シールド層を熱伝導体として確保
できるので、かかる導電体シールド層がない従来例に比
べて放熱効果が高まる。更に、第2の凹部の底面に露出
する前記金属板はこの第2の凹部の内壁に形成した熱伝
導体を介してこの第2の凹部が形成されたのと同じ側の
表面に配設した熱伝導層8と接続しているので第1の凹
部によって露出した金属板4に搭載した半導体チップの
発生する熱は金属板4からこの熱伝導体9を経由して外
部に露出した熱伝導層8へと移動するので一層放熱効果
が高まる。又、導電体シールド層を絶縁層の表面に配設
された導電パターンの真下に構成することによって導電
パターンに流れる電気の伝搬波を有限空間内に閉じ込め
、特性インピーダンスを低下させることができる。特に
導電パターンが信号回路として作動した時、信号の遅延
が防止できる。(Effects of the Invention) The present invention is as described above (a first recess for mounting a semiconductor chip is formed on the surface of an insulating layer, a metal plate embedded in the insulating layer is exposed at the bottom of this recess, The gap between the metal plate in which the conductor formed on the inner wall is embedded and the conductive pattern arranged on the surface of the insulating layer in which the recess is formed &! is bonded to the conductor shield layer in the layer. By doing so, a conductor shield layer having an area approximately equal to the semiconductor chip carrier can be secured as a heat conductor to dissipate the heat generated by the semiconductor chip mounted on the metal plate 4 exposed by the first recess. The heat dissipation effect is enhanced compared to the conventional example without a conductive shield layer.Furthermore, the metal plate exposed at the bottom of the second recess is connected to the second recess through a heat conductor formed on the inner wall of the second recess. Since the semiconductor chip mounted on the metal plate 4 exposed by the first recess is connected to the heat conductive layer 8 disposed on the same side surface where the recess is formed, the heat generated by the semiconductor chip mounted on the metal plate 4 exposed by the first recess is transferred from the metal plate 4. The heat is transferred to the heat conductive layer 8 exposed to the outside through the heat conductor 9, further increasing the heat dissipation effect.Also, a conductor shield layer is formed directly below the conductive pattern disposed on the surface of the insulating layer. By doing so, it is possible to confine the electrical propagation waves flowing through the conductive pattern within a finite space and reduce the characteristic impedance.Particularly when the conductive pattern operates as a signal circuit, signal delay can be prevented.
更に、半導体チップとワイヤーボンドされた導電パター
ンの中でグランドとなる導電パターンは第1の凹部の内
壁に形成された導電体に接続されるのでグランド面積が
、埋入した金属体と絶縁層内の導電体シールド層へと拡
大する。このためにグランド電位は安定化する。Furthermore, among the conductive patterns wire-bonded to the semiconductor chip, the conductive pattern that serves as the ground is connected to the conductor formed on the inner wall of the first recess, so the ground area is the same as the buried metal body and the insulating layer. It expands to the conductive shield layer. This stabilizes the ground potential.
第1図は本発明の一実施例を示す断面図、第2図は本発
明の他の実施例で第1の凹部の内壁の導電体と絶縁層の
表面の導電パターンの接合状態を示す斜視図、第3図は
一従来例を示す断面図、第4図は他の従来例を示す断面
図である6A・・・半導体チップキャリア
B・・・リードレスチップキャリア
C・・・ピングリッドアレイ
ト・・第1の凹部 2・・・第1の凹部3・・・絶縁
1 4・・・金属板5・・・導電パターン 6・
・・導電体シールド層7・・・導電体 8・・・
熱伝導体層9・・・熱伝導体 10・・・スルホール
導電路手続補正書(自発)
平成1年7月11日
事件の表示
平成1年 特許願 第31748号
発明の名称
半導体チップキャリア
補正をする・者
事件との関係 特許出願人
住 所 大阪府門真市大字門真1048番地名
称 (583)松下電工株式会社
代表者 三好俊夫FIG. 1 is a cross-sectional view showing one embodiment of the present invention, and FIG. 2 is a perspective view showing a bonding state between the conductor on the inner wall of the first recess and the conductive pattern on the surface of the insulating layer in another embodiment of the present invention. 6A...Semiconductor chip carrier B...Leadless chip carrier C...Pin grid array G... First recess 2... First recess 3... Insulation 1 4... Metal plate 5... Conductive pattern 6.
...Conductor shield layer 7...Conductor 8...
Thermal conductor layer 9...Thermal conductor 10...Through-hole conductive path procedure amendment (voluntary) Display of the July 11, 1999 incident 1999 Patent application No. 31748 Name of the invention Semiconductor chip carrier amendment Relationship with the patent applicant's case Patent applicant address 1048 Kadoma, Kadoma City, Osaka Prefecture
Name (583) Matsushita Electric Works Co., Ltd. Representative Toshio Miyoshi
Claims (3)
た絶縁層、この絶縁層に埋入され前記凹部の底面に露出
した金属板、前記凹部が形成された絶縁層の表面に配設
された導電パターンと前記金属板との間の絶縁層内に形
成された導電体シールド層とを備え、この導電体シール
ド層と前記金属板とが前記凹部の内壁に形成された導電
体で接続されてなることを特徴とする半導体チップキャ
リア。(1) An insulating layer with a first recess formed on its surface for mounting a semiconductor chip, a metal plate embedded in this insulating layer and exposed at the bottom of the recess, and a metal plate disposed on the surface of the insulating layer in which the recess is formed. a conductor shield layer formed in an insulating layer between the conductive pattern and the metal plate, and the conductor shield layer and the metal plate are connected by a conductor formed on an inner wall of the recess. A semiconductor chip carrier characterized by:
る表面に配設した熱伝導層と、この熱伝導層が配設され
た絶縁層の表面に形成された第2の凹部を備え、この凹
部の底面に露出した前記金属板と前記熱伝導層とを第2
の凹部の内壁に形成した熱伝導体で接続したことを特徴
とする請求項1記載の半導体チップキャリア。(2) comprising a thermally conductive layer disposed on a surface different from the surface of the insulating layer on which the conductive pattern is disposed, and a second recess formed on the surface of the insulating layer on which the thermally conductive layer is disposed; The metal plate and the thermally conductive layer exposed on the bottom surface of this recess are
2. The semiconductor chip carrier according to claim 1, wherein the semiconductor chip carrier is connected by a thermal conductor formed on an inner wall of the recess.
が第1の凹部の内壁に形成された導電体で導電体シール
ド層と金属板とに接続されていることを特徴とする請求
項1記載の半導体チップキャリア。(3) A claim characterized in that a part of the conductive pattern disposed on the surface of the insulating layer is connected to the conductor shield layer and the metal plate by a conductor formed on the inner wall of the first recess. Item 1. Semiconductor chip carrier according to item 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3174889A JP2775809B2 (en) | 1989-02-10 | 1989-02-10 | Semiconductor chip carrier |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3174889A JP2775809B2 (en) | 1989-02-10 | 1989-02-10 | Semiconductor chip carrier |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02210851A true JPH02210851A (en) | 1990-08-22 |
JP2775809B2 JP2775809B2 (en) | 1998-07-16 |
Family
ID=12339644
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3174889A Expired - Lifetime JP2775809B2 (en) | 1989-02-10 | 1989-02-10 | Semiconductor chip carrier |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2775809B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04196256A (en) * | 1990-11-27 | 1992-07-16 | Matsushita Electric Works Ltd | Semiconductor chip carrier |
JPH04196255A (en) * | 1990-11-27 | 1992-07-16 | Matsushita Electric Works Ltd | Semiconductor chip carrier |
JPH0945846A (en) * | 1995-07-31 | 1997-02-14 | Nec Corp | Semiconductor device and manufacture thereof |
-
1989
- 1989-02-10 JP JP3174889A patent/JP2775809B2/en not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04196256A (en) * | 1990-11-27 | 1992-07-16 | Matsushita Electric Works Ltd | Semiconductor chip carrier |
JPH04196255A (en) * | 1990-11-27 | 1992-07-16 | Matsushita Electric Works Ltd | Semiconductor chip carrier |
JPH06103725B2 (en) * | 1990-11-27 | 1994-12-14 | 松下電工株式会社 | Semiconductor chip carrier |
JPH06103724B2 (en) * | 1990-11-27 | 1994-12-14 | 松下電工株式会社 | Semiconductor chip carrier |
JPH0945846A (en) * | 1995-07-31 | 1997-02-14 | Nec Corp | Semiconductor device and manufacture thereof |
CN1052340C (en) * | 1995-07-31 | 2000-05-10 | 日本电气株式会社 | Plastic moulded integrated circuit assembly with low-glancing-flatness deviation lead wire |
Also Published As
Publication number | Publication date |
---|---|
JP2775809B2 (en) | 1998-07-16 |
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