JPH02209912A - Unsaturated group-containing polycarboxylic resin, resin composition containing same and solder resist resin composition - Google Patents

Unsaturated group-containing polycarboxylic resin, resin composition containing same and solder resist resin composition

Info

Publication number
JPH02209912A
JPH02209912A JP2966889A JP2966889A JPH02209912A JP H02209912 A JPH02209912 A JP H02209912A JP 2966889 A JP2966889 A JP 2966889A JP 2966889 A JP2966889 A JP 2966889A JP H02209912 A JPH02209912 A JP H02209912A
Authority
JP
Japan
Prior art keywords
meth
resin composition
acid
resin
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2966889A
Other languages
Japanese (ja)
Inventor
Minoru Yokoshima
実 横島
Kazumitsu Nawata
縄田 一允
Tetsuo Okubo
大久保 哲男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Kayaku Co Ltd
Original Assignee
Nippon Kayaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Co Ltd filed Critical Nippon Kayaku Co Ltd
Priority to JP2966889A priority Critical patent/JPH02209912A/en
Publication of JPH02209912A publication Critical patent/JPH02209912A/en
Pending legal-status Critical Current

Links

Landscapes

  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE:To obtain the title resin excellent in resistance to heat and chemicals and electrical insulation, thus useful for the permanent protective film for printed wiring boards by reaction with a polybasic carboxylic acid (anhydride) of a reaction product of a tetraglycidyl ether and (meth)acrylic acid. CONSTITUTION:The objective resin can be obtained by reaction with (A) a polybasic carboxylic acid (e.g. maleic acid, phthalic acid) or its anhydride of (B) a reaction product of a tetraglycidyl ether of the formula and (meth)acrylic acid. The reaction ratio for the compound of the formula and the (meth)acrylic acid is pref. such as to be 0.9-1.1 chemical equivalent of the (meth)acrylic acid per chemical equivalent of the epoxy group in said compound of the formula.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、不飽和基含有ポリカルボン酸樹脂、及び該樹
脂を含有するプリント配線基板の永久保護膜として使用
される耐熱性、耐薬品性及び電気絶縁性に優れたソルダ
ーレジストに適する樹脂組成物に関する。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a polycarboxylic acid resin containing an unsaturated group, and a heat-resistant and chemical-resistant resin used as a permanent protective film for a printed wiring board containing the resin. The present invention also relates to a resin composition suitable for a solder resist having excellent electrical insulation properties.

(従来の技術) 近年、省資源、省エネルギー、作業性向上、生産性向上
などの理由により紫外線硬化型組成物が多用されてきて
いる。プリント配線基板加工分野においても同様の理由
によりソルダーレジストインキ、マーキングインキなど
種々のインキが従来の熱硬化型組成物から紫外線硬化型
組成物へと移行してきている。ソ・ルダーレジストイン
キはいち早(紫外線硬化型組成物へと移行した。
(Prior Art) In recent years, ultraviolet curable compositions have been widely used for reasons such as resource saving, energy saving, improved workability, and improved productivity. In the field of printed wiring board processing, various inks such as solder resist inks and marking inks have been shifting from conventional thermosetting compositions to ultraviolet curable compositions for the same reason. Solder resist inks quickly transitioned to ultraviolet curable compositions.

(発明が解決しようとする課題) しかしながら、現在この紫外線硬化型組成物の適用され
ている用途としては、ラジオ、ビデオ、テレビ等に使用
されている民生用基板と称せられる分野に限られ、コン
ビ1、−ター、制御機器等の産業用基板といわれる分野
への適用は未だ行われていないのが実情である。これは
産業用基板に使用されるソルダーレジストインキには、
民生基板用ソルダ・−1/シストインキに要求されてい
ない高電気絶縁性、加湿下洗おけるハンダ耐熱性、耐メ
ツキ性など高い性能が要求されており、現在の民生基板
用ソルダーレジストインキでは、要求性能レベルに達し
ていないためである。最近の工1/クトロニクス機器類
の小形化、高機能化により、産業用基板に於いても回路
のパターン密度の精度向上の要求が高くなり、従来の紫
外線硬化型ソルダーレジストインキを用いたスクリーン
印刷法では、印刷精度の限界から、満足すべき結果は得
られていない。
(Problems to be Solved by the Invention) However, the applications to which this ultraviolet curable composition is currently applied are limited to fields called consumer substrates used in radios, videos, televisions, etc. 1. The reality is that it has not yet been applied to the field of industrial boards such as controllers and control equipment. This is the solder resist ink used for industrial boards.
Solder resist inks for consumer boards -1/Cyst inks are required to have high performance such as high electrical insulation, solder heat resistance that can be washed under humidified conditions, and plating resistance, which are not required for current solder resist inks for consumer boards. This is because the performance level has not been reached. Due to the recent downsizing and increasing functionality of electronics equipment, there is a growing demand for improved precision in circuit pattern density even for industrial boards, and screen printing using conventional ultraviolet-curable solder resist ink has become more difficult. With this method, satisfactory results have not been obtained due to limitations in printing accuracy.

又従来の紫外線硬化型ソルダ・−レジストインキは、2
−ヒドロキシエチルメタクリレート、  l−リメチロ
ールブロバントリアクリ1/−ト等の1〜3官能モノマ
ー及び各種アクリ1/−トオリゴマーなどを含んでおり
、スクリ・−ン印刷時にこれらの物質かにじみ出し、・
・ンダがつかない等のトラブルの発生がみられる。前記
1−だ問題点の改善のこころみもなされており、例えば
特開昭60−208377では、光重合可能なエポキシ
ビニルエステル樹脂と光重合開始剤とアミン系エポキシ
硬化剤からなる樹脂組成物が提案されており、耐熱性、
密着性、耐化学薬品性、電気絶縁特性に優れているが、
アミン系エポキシ硬化剤を使用するため貯蔵安定性がな
(、有機溶剤で現像しなければならない等の欠点を有l
−ている。
In addition, conventional ultraviolet curable solder-resist ink is
Contains mono- to trifunctional monomers such as -hydroxyethyl methacrylate, l-rimethylolbroban triacrylate, and various acrylate oligomers, and these substances ooze out during screen printing.・
・There are some problems such as not being able to print properly. Efforts have been made to improve the above-mentioned problem 1-1. For example, in JP-A-60-208377, a resin composition consisting of a photopolymerizable epoxy vinyl ester resin, a photopolymerization initiator, and an amine-based epoxy curing agent was proposed. It is heat resistant,
It has excellent adhesion, chemical resistance, and electrical insulation properties, but
Since it uses an amine-based epoxy curing agent, it has disadvantages such as poor storage stability (and the need to develop with an organic solvent).
-I am.

(課題を解決するための手段) 本発明者らは、前記の問題を解決するため、鋭意研究の
結果、貯蔵安定性が良・好で、アルカリ水溶液で現像が
可能な、耐熱性、密着性、耐薬品性および電気絶縁特性
に優れたフルダーレジストに適する樹脂組成物を提供す
ることに成功した◇ すなわち、本発明は、 1)式(1) で表されるテトラグリシジルエーテルと(メタ)アクリ
ル酸との反応物を更に多塩基性カルボン酸又は、その無
水物と反応させてなる不飽和基含有ポリカルボン酸樹脂
、 2)前記式(1)のテトラグリシジルエーテルと(メタ
)アクリル酸との反応物を更に多塩基性カルボン酸又は
、その無水物と反応させてなる不飽和基含有ポリカルボ
ン酸樹脂を含有することを特徴とする樹脂組成物、特に
ソルダーレジスト樹脂組成物に関する。ここで(メタ)
アクリル酸とはアクリル酸又はメタクリル酸又はそれら
の混合物を表す。
(Means for Solving the Problems) In order to solve the above-mentioned problems, the present inventors have conducted extensive research and found that the present inventors have good storage stability, can be developed with an alkaline aqueous solution, have heat resistance, and have good adhesion. The present invention has succeeded in providing a resin composition suitable for a fulder resist having excellent chemical resistance and electrical insulation properties◇ That is, the present invention has the following features: 1) Tetraglycidyl ether represented by formula (1) and (meth) An unsaturated group-containing polycarboxylic acid resin obtained by further reacting a reaction product with acrylic acid with a polybasic carboxylic acid or its anhydride; 2) a tetraglycidyl ether of the formula (1) and (meth)acrylic acid; The present invention relates to a resin composition, particularly a solder resist resin composition, characterized in that it contains an unsaturated group-containing polycarboxylic acid resin obtained by reacting the reactant of the above with a polybasic carboxylic acid or an anhydride thereof. here (meta)
Acrylic acid refers to acrylic acid or methacrylic acid or mixtures thereof.

本発明の不飽和基含有ポリカルボン酸樹脂は式(1)で
表されるテトラグリシジルエーテルと(メタ)アクリル
酸とを反応させ、エポキシ(メタ)アクリレートを得る
。次いで多塩基性カルボン酸又は、その無水物を反応さ
せることによって得ることができる。本発明において用
いる前記の式(1)で表されるテトラグリシジルエーテ
ルは、種々の商品名で、たとえばエピコートYL−93
1、モポン1031.(いずれも油化シェルエポキシ■
、商品名)等として既に市販されているから、本発明は
、かかる市販品を用いて実施することができる。
The unsaturated group-containing polycarboxylic acid resin of the present invention is obtained by reacting the tetraglycidyl ether represented by formula (1) with (meth)acrylic acid to obtain epoxy (meth)acrylate. It can then be obtained by reacting a polybasic carboxylic acid or its anhydride. The tetraglycidyl ether represented by the formula (1) used in the present invention has various trade names, such as Epicote YL-93.
1. Mopon 1031. (Both oil-based shell epoxy
, trade name) etc., the present invention can be carried out using such commercial products.

式(1)で表されるテトラグリシジルニーテルト(メタ
)アクリル酸との反応は、式(1)で表されるテトラグ
リシジルエーテルのエポキシ基の1化学当量に対して(
メタ)アクリル酸約0.8〜1.5化学当量、特に好ま
しくは、約0.9〜1.1化学当量となる比で反応させ
、反・応待に希釈剤(例えば、メチルエチルケトン、メ
チルイソブチルケトン、酢酸ブチル、エチルセロソルブ
アセテート、ブチルセロソルブアセテート、ベンゼン、
トルエン、石油エーテル等の溶剤類、又はカルピトール
(メタ)アクリレート、フェノキシエチル(メタ)アク
リレート、ペンタエリスリトールトリ(メタ)アクリレ
ート、トリス(ヒドロキシエチル)イソシアヌレートリ
(メタ)アクリレート、トリス(ヒドロキシエチル)イ
ンシアヌレートトリ(メタ)アクリレート、アクリロイ
ルモルホリン、トリメチロールプロパントリ(メタ)ア
クリレート、ジペンタエリスリトールポリ(メタ)アク
リレート等の反応性単量体等)を使用するのが好ましく
、更に反応を促進させるために触媒(例えば、トリエチ
ルアミン、ベンジルジメチルアミン、メチルトリエチル
アンモニウムクロライド、トリフェニルスチビン等)を
使用することが好ましく、該触媒の使用量は反応混合物
に対して0.1〜10重景%重量に好ましくは1〜5重
量%である。
The reaction with the tetraglycidyl nitrate (meth)acrylic acid represented by the formula (1) is carried out with respect to 1 chemical equivalent of the epoxy group of the tetraglycidyl ether represented by the formula (1).
The reaction is carried out at a ratio of about 0.8 to 1.5 chemical equivalents of meth)acrylic acid, particularly preferably about 0.9 to 1.1 chemical equivalents, and a diluent (for example, methyl ethyl ketone, methyl isobutyl ketone) is used in the reaction. , butyl acetate, ethyl cellosolve acetate, butyl cellosolve acetate, benzene,
Solvents such as toluene and petroleum ether, or carpitol (meth)acrylate, phenoxyethyl (meth)acrylate, pentaerythritol tri(meth)acrylate, tris(hydroxyethyl)isocyanurate tri(meth)acrylate, tris(hydroxyethyl)in It is preferable to use reactive monomers such as cyanurate tri(meth)acrylate, acryloylmorpholine, trimethylolpropane tri(meth)acrylate, dipentaerythritol poly(meth)acrylate, etc.), and to further accelerate the reaction. It is preferable to use a catalyst (for example, triethylamine, benzyldimethylamine, methyltriethylammonium chloride, triphenylstibine, etc.), and the amount of the catalyst used is preferably 0.1 to 10% by weight based on the reaction mixture. is 1 to 5% by weight.

反応中の重合を防止するために重合防止剤(例えば、メ
トキノン、ハイドロキノン、フェノチアジン等)を使用
するのが好ましく、その使用量は反応混合物に対して0
.01〜1重量%、特に好ましくは0.05〜0,5重
量%である。反応温度は60〜150℃1%に好ましく
は80〜120℃である。多塩基性カルボン酸又はその
無水物の具体的な例としては、マレイン酸、コハク酸、
フタル酸、テトラクロロフタル酸、テトラブロモフタル
酸、エンドメチレンテトラヒドロフタル酸、テトラヒド
ロフタル酸、ヘキサヒドロフタル酸、トリメリット酸、
ピロメリット酸等及びこれらの酸の無水物等が挙げられ
る。
In order to prevent polymerization during the reaction, it is preferable to use a polymerization inhibitor (for example, methoquinone, hydroquinone, phenothiazine, etc.), and the amount used is 0% based on the reaction mixture.
.. 01-1% by weight, particularly preferably 0.05-0.5% by weight. The reaction temperature is 60-150°C 1%, preferably 80-120°C. Specific examples of polybasic carboxylic acids or their anhydrides include maleic acid, succinic acid,
Phthalic acid, tetrachlorophthalic acid, tetrabromophthalic acid, endomethylenetetrahydrophthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, trimellitic acid,
Examples include pyromellitic acid and anhydrides of these acids.

前記の方法で得た式(1)で表されるテトラグリシジル
エーテルと(メタ)アクリル酸との反応生成物と多塩基
性カルボン酸又は、その無水物との反応は(エポキシ(
メタ)アクリレート中の水酸基のエステル化反応)は、
式(1)で表されるテトラグリシジルエーテルと(メタ
)アクリル酸との反応生成物中の水酸基に対゛して、水
酸基1化学当量あたり前記の酸又は、その無水物0.0
5〜1.00化学当量を反応させる。
The reaction of the reaction product of the tetraglycidyl ether represented by the formula (1) obtained by the above method with (meth)acrylic acid and a polybasic carboxylic acid or its anhydride is (epoxy (
Esterification reaction of hydroxyl group in meth)acrylate) is
With respect to the hydroxyl groups in the reaction product of the tetraglycidyl ether represented by formula (1) and (meth)acrylic acid, 0.0 of the above acid or its anhydride per chemical equivalent of hydroxyl group.
5 to 1.00 chemical equivalents are reacted.

生成物の酸価(rngKOH/g )は30〜150程
度であることが好ましい。反応温度は、60〜150℃
、特に好ましくは80〜120℃である。本発明の組成
物に使用される不飽和基含有ポリカルボン酸樹脂の使用
量は10〜100重量%、特に20〜90重量%が好ま
しい。
The acid value (rngKOH/g) of the product is preferably about 30 to 150. Reaction temperature is 60-150℃
, particularly preferably 80 to 120°C. The amount of the unsaturated group-containing polycarboxylic acid resin used in the composition of the present invention is preferably 10 to 100% by weight, particularly 20 to 90% by weight.

本発明組成物には、更に、フェノール・ノボラック型エ
ポキシ樹脂、クレゾール・ノボラック型エポキシ樹脂、
ビスフェノール型エポキシ樹脂等のエポキシ化合物、こ
れらのエポキシ化合物と(メタ)アクリル酸の反応物で
あるエポキシアクリレート、前記した反応性単量体等を
含有させることができる。これらの使用量は、組成物の
0〜90重量%、特に10〜80重量%が好ましい。
The composition of the present invention further includes a phenol/novolac type epoxy resin, a cresol/novolac type epoxy resin,
Epoxy compounds such as bisphenol type epoxy resins, epoxy acrylates which are reaction products of these epoxy compounds and (meth)acrylic acid, the above-mentioned reactive monomers, etc. can be contained. The amount of these used is preferably 0 to 90% by weight, particularly 10 to 80% by weight of the composition.

本発明の組成物を硬化する方法としては、電子線、紫外
線及び熱による硬化法があるが、紫外線及び熱硬化する
のが好ましい。
Methods for curing the composition of the present invention include curing methods using electron beams, ultraviolet rays, and heat, with ultraviolet rays and heat curing being preferred.

紫外線で硬化する場合には、光重合開始剤を使用する。When curing with ultraviolet light, a photoinitiator is used.

光重合開始剤としては、公知のどのような光重合開始剤
でも使用することができるが、配合後の貯蔵安定性の良
いものが望ましい。
As the photopolymerization initiator, any known photopolymerization initiator can be used, but it is desirable that the photopolymerization initiator has good storage stability after being blended.

この様な光重合開始剤としては、例えば2−クロロチオ
キサントン、2.4−ジエチルチオキサントン、2−イ
ソプロピルチオキサントン、ベンジルジメチルケタール
、2−エチルアントラキノン、N、N−ジメチル安息香
酸イソアミルエステル、N、N−ジメチル安息香酸エチ
ルエステル、2−ヒドロキシ−2−メチルプロピオフェ
ノン、4′−イソプロピル−2−ヒドロキシ−2−メチ
ルプロピオフェノン等が挙げられる。これら光重合開始
剤は、一種または二種以上、を任意の割合で混合して使
用することができる。好ましい光重合開始剤としては、
2.4−ジエーF−A/チオキサントン、2−イソプロ
ピルチオキサントン等が挙げられる。光重合開始剤の使
用量は組成物の0.1〜20重量%、特に1〜lO重量
%であることが好ましい。
Examples of such photopolymerization initiators include 2-chlorothioxanthone, 2,4-diethylthioxanthone, 2-isopropylthioxanthone, benzyl dimethyl ketal, 2-ethylanthraquinone, N,N-dimethylbenzoic acid isoamyl ester, N,N- -dimethylbenzoic acid ethyl ester, 2-hydroxy-2-methylpropiophenone, 4'-isopropyl-2-hydroxy-2-methylpropiophenone, and the like. These photopolymerization initiators can be used alone or in a mixture of two or more in any proportion. Preferred photoinitiators include:
Examples include 2.4-DIA/thioxanthone and 2-isopropylthioxanthone. The amount of photopolymerization initiator used is preferably 0.1 to 20% by weight, particularly 1 to 10% by weight of the composition.

本発明の組成物に、エポキシ基含有化合物を添加する場
合には、その硬化剤として、ジフェニルヨードニウム−
・ンサフルオロアンチモネー)、)’Jフエニ、5ス、
′−″:ニウムヘキサフルオロホスフェート、トリフニ
ニルスルホニウムへキサフルオロアンチモスート等の光
カチオン重合触媒を使用することが好ましい。市販品と
しては、例えば、旭電化■製5P−150,5P−17
0、チバ・ガイギー■製イルガキ為アー261等を挙げ
ることができる。その使用量は、組成物の0.01〜1
.0重量%、特に0.02〜0.2重量%であることが
好ましい。
When adding an epoxy group-containing compound to the composition of the present invention, diphenyliodonium-
・Nsafluorantimone), )'J Fueni, 5th,
'-'': It is preferable to use a photocationic polymerization catalyst such as nium hexafluorophosphate or triphnynylsulfonium hexafluoroantimosute. Commercially available products include, for example, 5P-150 and 5P-17 manufactured by Asahi Denka ■.
0, Irugaki Tamer 261 manufactured by Ciba Geigy ■, etc. The amount used is 0.01 to 1 of the composition.
.. Preferably it is 0% by weight, especially 0.02-0.2% by weight.

本発明の樹脂組成物には、更に、種々の添加剤1例えば
、メルク、シリカ、アルミナ、硫酸バリウム、酸化マグ
ネシウムなどの体質顔料、アエロジルなどのチキントロ
ピー剤、シリコーン、フッ素系アクリル共重合物等のレ
ヘIJング剤、消泡剤及び着色剤などを加えてもかまわ
ない。又、組成物の取り扱いを容易にするために前記し
た溶剤類を更に添加することもできる。
The resin composition of the present invention may further contain various additives, such as extender pigments such as Merck, silica, alumina, barium sulfate, and magnesium oxide, chicken tropic agents such as Aerosil, silicones, fluorine-based acrylic copolymers, etc. It is also possible to add a resetting agent, an antifoaming agent, a coloring agent, etc. Further, the above-mentioned solvents may be further added to facilitate handling of the composition.

本発明の組成物は、特にソルダーレジスト樹脂組成物と
して有用であるが、その他にも絶縁材料、含浸材、表面
被覆材、塗料、接着剤等としても使用できる。
The composition of the present invention is particularly useful as a solder resist resin composition, but can also be used as an insulating material, an impregnating material, a surface coating material, a paint, an adhesive, and the like.

(実施例) 以下、本発明を実施例により具体的に説明する。なお実
施例中の部は、重量部である。
(Example) Hereinafter, the present invention will be specifically explained with reference to Examples. Note that parts in the examples are parts by weight.

〔不飽和基含有ポリカルボン酸樹脂の実施例〕実施例1
゜ 前記式(1)で表されるテトラグリシジルエーテル(油
化シェルエポキシ■製、エポン1031、エポキシ当量
210)2100部、アクリル酸685部、メチルハイ
ドロキノン1.4部、トリフェニルスチビン25部及び
ブチルセロソルブアセテート1407部を加え、95℃
まで昇温させ30時間反応させた後、更忙無水フタル酸
472部を加えて、90℃で20時間反応させた。粘度
6800 cps (25℃)、酸価(溶剤をのぞいた
成分) 56 mgKOH/gの生成物を得た。
[Example of unsaturated group-containing polycarboxylic acid resin] Example 1
゜2100 parts of tetraglycidyl ether represented by the above formula (1) (manufactured by Yuka Shell Epoxy ■, Epon 1031, epoxy equivalent 210), 685 parts of acrylic acid, 1.4 parts of methylhydroquinone, 25 parts of triphenylstibine, and butyl cellosolve. Add 1407 parts of acetate and heat to 95℃
After raising the temperature to 90° C. and reacting for 30 hours, 472 parts of phthalic anhydride was added, and the mixture was reacted at 90° C. for 20 hours. A product with a viscosity of 6800 cps (25° C.) and an acid value (components excluding the solvent) of 56 mgKOH/g was obtained.

実施例2゜ 実施例1の中で無水フタル酸に代えて無水マレイン酸4
51.6部及びブチルセロソルブアセテ−)1407部
を1398部に変えた以外は実施例1と同様に反応をさ
せ、粘度7300 cps(25℃)、酸価(溶剤をの
ぞいた成分)80mgKOH/gの生成物を得た。
Example 2 Maleic anhydride 4 was used instead of phthalic anhydride in Example 1.
The reaction was carried out in the same manner as in Example 1 except that 1,407 parts and butyl cellosolve acetate) were changed to 1,398 parts, and the reaction was carried out in the same manner as in Example 1. The product was obtained.

実施例3、 実施例1の中で無水フタル酸に代えてテトラヒドロ無水
フタル酸9]8.6部及びブチルセロソルブアセテート
1407部を1598.4部に変えた以外は、実施例1
と同様に反応をさせ、粘度23100 cps (25
℃)、酸価(溶剤をのぞいた成分) 95 mgKOH
/gの生成物を得た。
Example 3 Example 1 except that 8.6 parts of tetrahydrophthalic anhydride 9 was used instead of phthalic anhydride in Example 1, and 1598.4 parts of butyl cellosolve acetate was used instead of 1407 parts.
The viscosity was 23100 cps (25
°C), acid value (components excluding solvent) 95 mgKOH
/g of product was obtained.

実施例4゜ 実施例1において、無水フタル酸に代えて、ヘキサヒド
ロ無水フタル酸1104部及びブチルセロソルブアセテ
ート1407 部ヲ2610部に変えた以外は実施例1
と同様に反応させ、粘度11000 cps (25℃
)、酸価(溶剤ヲノぞいた成分) 107 mgKOH
/gの生成物を得た。
Example 4 Example 1 except that 1,104 parts of hexahydrophthalic anhydride and 1,407 parts of butyl cellosolve acetate were used instead of phthalic anhydride, and 2,610 parts of butyl cellosolve acetate were used instead of phthalic anhydride.
The viscosity was 11,000 cps (at 25°C).
), acid value (components excluding solvent) 107 mgKOH
/g of product was obtained.

実施例5゜ 前記式(1)で表されるテトラグリシジルエーテル(油
化シェルエポキシ■製、エピコートYL−931、エポ
キシ当量195)1950部、メタクリル酸817部、
メチルハイドロキノンt o i 、メチルトリエチル
アンモニウムクロライド2部及びブチルセロソルブアセ
テート1393部を加え、95℃まで昇温させ3部時間
反応させた後、更に無水フタル酸470部を加えて、9
0°Cで20時間反応させた。粘度7100cps(2
5℃)、酸価(溶剤ヲノソイタ成分) 57 mgKO
H/Hの生成物を得た。
Example 5 1950 parts of tetraglycidyl ether represented by the above formula (1) (manufactured by Yuka Shell Epoxy ■, Epicoat YL-931, epoxy equivalent: 195), 817 parts of methacrylic acid,
Methylhydroquinone to i, 2 parts of methyltriethylammonium chloride and 1393 parts of butyl cellosolve acetate were added, the temperature was raised to 95°C and the mixture was reacted for 3 parts, and then 470 parts of phthalic anhydride was added and 9 parts of phthalic anhydride was added.
The reaction was carried out at 0°C for 20 hours. Viscosity 7100cps (2
5℃), acid value (solvent component) 57 mgKO
A H/H product was obtained.

応用実施例6〜] 0゜ 第1表に示す配合組成に従ってソルダーレジスト樹脂組
成物を配合し、銅スルホールプリント配線板にスクリー
ン印刷法にて20〜100μmの膜厚で塗布した後、塗
膜を70’Cで60分間乾燥した後、ネガフィルムを塗
膜に直接接触又は接触させない様にして当てる。次いで
、5藷超高圧水銀灯を使用して紫外・線を照射し、次い
で、1,5%Na2COs水溶液などのアルカリ水溶液
で塗膜の未照射部分を溶解除去した。その後、熱風乾燥
器で150℃、30分間加熱硬化を行い、得られたそれ
ぞれの供試体について、6穐の性能試験を行った。それ
らの結果を第1表に示す。
Application Example 6 ~] 0゜ A solder resist resin composition was blended according to the composition shown in Table 1, and the coating was applied to a copper through-hole printed wiring board with a film thickness of 20 to 100 μm using a screen printing method. After drying at 70'C for 60 minutes, a negative film is applied with or without direct contact with the coating. Next, it was irradiated with ultraviolet rays using a 5-meter ultra-high-pressure mercury lamp, and then the unirradiated portions of the coating film were dissolved and removed with an alkaline aqueous solution such as a 1.5% Na2COs aqueous solution. Thereafter, heat curing was performed at 150° C. for 30 minutes in a hot air dryer, and 6 performance tests were conducted on each of the obtained specimens. The results are shown in Table 1.

〔貯蔵安定性〕[Storage stability]

樹脂組成物を30℃に放置し、増粘あるいはゲル化まで
の日数を測定した。
The resin composition was left at 30° C., and the number of days until it thickened or gelled was measured.

〔溶解性〕[Solubility]

5品超高圧水銀灯を使用し、紫外線を照射しついで30
℃の1.5%Naz CCh水溶液で未照射部分を溶解
、除去し、溶解性について判定した。
Using a 5-item ultra-high pressure mercury lamp, irradiate with ultraviolet rays and then heat for 30 minutes.
The unirradiated portion was dissolved and removed with a 1.5% Naz CCh aqueous solution at 1.5° C., and the solubility was determined.

○・・・・・・溶解速度が速い。○...Dissolution rate is fast.

×・・・・・・溶解しないか又は極めて遅い。×: Does not dissolve or dissolves extremely slowly.

〔耐ハンダ性〕[Solder resistance]

260℃の溶融ハンダに2分間浸漬した後の塗膜の状態
について判定した。
The state of the coating film after being immersed in molten solder at 260° C. for 2 minutes was evaluated.

○・・・・・・塗膜の外観異常なし。○...No abnormality in the appearance of the paint film.

×・・・・・・ふくれ、溶融、剥離。×...Blistering, melting, peeling.

〔密着性〕[Adhesion]

供試体の塗膜に1xIII!mの大きさのゴバン目を1
00個刻み、セロハンテープで剥離した後の密着性を評
価した。
1xIII on the coating film of the specimen! 1 Goban of size m
The adhesion after peeling off with cellophane tape in 00 pieces was evaluated.

〔絶縁性抵抗〕[Insulating resistance]

80℃、95%RHの雰囲気中に240時間放置し、 その塗膜の絶縁抵抗を測定した。 Leave it in an atmosphere of 80°C and 95% RH for 240 hours, The insulation resistance of the coating film was measured.

柚エポキシアクリレート: EPPN−201(日本化
薬■製、フェノール・ノボラック型 エポキシ樹脂)のエポキシ基1化学当 量あたりアクリル酸0.5化学当量を反応させたもので
、ブチルセロソルブア セテート30%で希釈したもの。
Yuzu epoxy acrylate: EPPN-201 (manufactured by Nippon Kayaku ■, phenol/novolac type epoxy resin) reacted with 0.5 chemical equivalent of acrylic acid per chemical equivalent of epoxy group, diluted with 30% butyl cellosolve acetate. .

蒼■EPPN−201:  フェノール・ノボラック型
エポキシ樹脂(日本化薬■製) 料■5P−170:  無電化■製、光カチオン重合触
媒。
Ao ■EPPN-201: Phenol/novolac type epoxy resin (manufactured by Nippon Kayaku ■) Material ■5P-170: Manufactured by Denka ■, photo cationic polymerization catalyst.

Q DETX :  日本化薬■製、光重合開始剤、組
成物に適する。
Q DETX: Manufactured by Nippon Kayaku ■, photopolymerization initiator, suitable for compositions.

Claims (1)

【特許請求の範囲】 1)式(1) ▲数式、化学式、表等があります▼(1) で表されるテトラグリシジルエーテルと(メタ)アクリ
ル酸との反応物を更に多塩基性カルボン酸又はその無水
物と反応させてなる不飽和基含有ポリカルボン酸樹脂。 2)特許請求の範囲第1項記載の不飽和基含有ポリカル
ボン酸樹脂を含有する樹脂組成物。 3)特許請求の範囲第1項記載の不飽和基含有ポリカル
ボン酸樹脂を含有するソルダーレジスト樹脂組成物。
[Claims] 1) Formula (1) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(1) The reaction product of tetraglycidyl ether and (meth)acrylic acid is further reacted with a polybasic carboxylic acid or An unsaturated group-containing polycarboxylic acid resin made by reacting with the anhydride. 2) A resin composition containing the unsaturated group-containing polycarboxylic acid resin according to claim 1. 3) A solder resist resin composition containing the unsaturated group-containing polycarboxylic acid resin according to claim 1.
JP2966889A 1989-02-10 1989-02-10 Unsaturated group-containing polycarboxylic resin, resin composition containing same and solder resist resin composition Pending JPH02209912A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2966889A JPH02209912A (en) 1989-02-10 1989-02-10 Unsaturated group-containing polycarboxylic resin, resin composition containing same and solder resist resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2966889A JPH02209912A (en) 1989-02-10 1989-02-10 Unsaturated group-containing polycarboxylic resin, resin composition containing same and solder resist resin composition

Publications (1)

Publication Number Publication Date
JPH02209912A true JPH02209912A (en) 1990-08-21

Family

ID=12282494

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2966889A Pending JPH02209912A (en) 1989-02-10 1989-02-10 Unsaturated group-containing polycarboxylic resin, resin composition containing same and solder resist resin composition

Country Status (1)

Country Link
JP (1) JPH02209912A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006257138A (en) * 2005-03-15 2006-09-28 Dainippon Ink & Chem Inc Side-chain acryloyl group-containing epoxy resin and method for producing the same
WO2015080146A1 (en) * 2013-11-28 2015-06-04 日本化薬株式会社 Active energy ray-curable resin composition, and spacer for display elements and/or color filter protective film using same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006257138A (en) * 2005-03-15 2006-09-28 Dainippon Ink & Chem Inc Side-chain acryloyl group-containing epoxy resin and method for producing the same
WO2015080146A1 (en) * 2013-11-28 2015-06-04 日本化薬株式会社 Active energy ray-curable resin composition, and spacer for display elements and/or color filter protective film using same
CN105745576A (en) * 2013-11-28 2016-07-06 日本化药株式会社 Active energy ray-curable resin composition, and spacer for display elements and/or color filter protective film using same
JPWO2015080146A1 (en) * 2013-11-28 2017-03-16 日本化薬株式会社 Active energy ray curable resin composition, and display element spacer and / or color filter protective film using the same
CN105745576B (en) * 2013-11-28 2019-12-17 日本化药株式会社 Active energy ray-curable resin composition and spacer for display element and/or color filter protective film using same

Similar Documents

Publication Publication Date Title
JP4514049B2 (en) Photosensitive resin composition and cured product thereof
JP3673321B2 (en) Photosensitive resin composition capable of alkali development
US5215863A (en) Resin composition and solder resist composition
JPH0297513A (en) Unsaturated polycarboxylic acid resin, resin composition and solder resist resin composition containing same
JPH01161038A (en) Resin composition and solder resist resin composition
JP2878486B2 (en) Resin composition, solder resist resin composition and cured product thereof
JPH0532746A (en) Resin composition, solder resist resin composition and their hardened material
JPH01242569A (en) Imide(meth)acrylate, resin composition produced therefrom and solder resist resin composition
JP2704661B2 (en) Unsaturated group-containing polycarboxylic acid resin, resin composition containing the same, solder resist resin composition and cured product thereof
JPH0411626A (en) Resin composition, solder resist resin composition, and cured product
JPH02209912A (en) Unsaturated group-containing polycarboxylic resin, resin composition containing same and solder resist resin composition
JPS63312375A (en) Resin composition and solder resist resin composition therefrom
JPH04270345A (en) Resin composition and solder resist resin composition and their hardened product
JPH05178950A (en) Resin composition, solder resist resin composition and cured products thereof
JPH03106903A (en) Photosensitive thermosetting resin composition solder resist resin composition, and cured product thereof
JPH03237112A (en) Unsaturated group-containing polycarboxylic acid resin, resin composition containing same resin, solder resist resin composition and cured materials of them
JPH03153768A (en) Photosensitive thermoset resin composition, solder resist resin composition, and cured product thereof
JPH04165358A (en) Polycarboxylic acid resin including unsaturated group, resin compound including same, solder-resisting resin compound and set material of these
JP2540921B2 (en) Curable composition
JPS62241979A (en) Resin composition and solder resist ink composition
JP2004300326A (en) Low dielectric light curable resin composition
JP2817901B2 (en) Unsaturated group-containing polycarboxylic acid resin, resin composition using the same, solder resist resin composition and cured product
JPH02120308A (en) Mixture of polycarboxylic acid containing unsaturated group, resin composition containing same and solder resist resin composition
JPH03290428A (en) Photosensitive resin composition
JP3319620B2 (en) Unsaturated group-containing polycarboxylic acid resin, resin composition and cured product thereof