JPH02204745A - Mask for exposing device - Google Patents
Mask for exposing deviceInfo
- Publication number
- JPH02204745A JPH02204745A JP1025071A JP2507189A JPH02204745A JP H02204745 A JPH02204745 A JP H02204745A JP 1025071 A JP1025071 A JP 1025071A JP 2507189 A JP2507189 A JP 2507189A JP H02204745 A JPH02204745 A JP H02204745A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- marks
- well
- exposing device
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 abstract description 4
- 239000000758 substrate Substances 0.000 abstract description 3
- 230000000007 visual effect Effects 0.000 abstract description 3
- 230000000694 effects Effects 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は、露光装置用マスクに関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a mask for exposure equipment.
マスクの表裏及び上下左右方向の判別をつけに（い為、
露光装置用マスクをセットした状態が正しいのかどうか
の判断が困醤であρた。誤ってセットさ、れた時は、そ
れが露光装置やマスクの搬送シスｔムの場合はマスクの
アライメントエラーの原因となり、マスクを再度入れ直
さなければならなかった。またペリクル貼付機の場合は
ペリクルを再度貼り直さなければならないという問題点
を有していた。In order to distinguish between the front and back of the mask, as well as the top, bottom, left and right directions.
It was difficult to judge whether the mask for the exposure device was set in the correct state or not. If the mask is set incorrectly, it may cause a mask alignment error in the case of an exposure device or a mask transport system, and the mask must be reinserted. Further, in the case of a pellicle pasting machine, there is a problem in that the pellicle must be pasted again.
そこで、本発明は従来のこのような問題点を解決するた
め、露光装置用マスクの表裏及び上下左右方向の判別が
容易に出来る露光装置用マスクを提供するところにある
。SUMMARY OF THE INVENTION In order to solve these conventional problems, the present invention provides a mask for an exposure device that allows easy identification of the front and back sides of the mask, as well as the up, down, left and right directions.
［従来の技術］
従来の鱈光装置用マスクは、第４図に示す様に表裏、上
下、左右対象の形状を有していた。[Prior Art] A conventional mask for a cod optical device has a shape that is symmetrical in front and back, top and bottom, and left and right sides, as shown in FIG.
［発明が解決しようとする課題］
しかし、前述の従来の露光装置用マスクでは、［課題を
解決するための手段］
本発明の露光装置用マスクは、露光装置用マスクの表裏
及び上下左右方向の判別をつける為の目印を付けた事を
特徴とする特
［実施例コ
以下に本発明の実施例を図面にもとづいて説明する。第
１図において、露光装置用マスク基板１１に切ｖＪ欠き
１２を設ける。この切り欠きは第１図に示す様に、底辺
１ ｃｍ ＋高さ２ｃｍの直角主角形になっている。こ
の切シ欠きが第１図のごとくマスクの右下に来るのは一
種類のみであり、露光装置用マスクの表裏及び上下左右
は正確な状態に置かれる。[Problem to be Solved by the Invention] However, in the conventional exposure equipment mask described above, [Means for Solving the Problem] The exposure equipment mask of the present invention provides Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1, a notch VJ cutout 12 is provided in a mask substrate 11 for an exposure apparatus. As shown in FIG. 1, this notch is in the form of a right-angled main square with a base of 1 cm and a height of 2 cm. Only one type of mask has this notch in the lower right corner of the mask as shown in FIG. 1, so that the front and back, top, bottom, right and left sides of the mask for exposure equipment are placed in an accurate state.
なお、第２図は、露光装置用マスク基板２１に方向判別
マーク２２を設けたものである。この方向判別マークは
、露光装置用マスクに被露光パターンを設ける時に同時
に設ける事ができる。そしてこのマークは長方形など、
マスクな反転２回転させても同一位置に同一形状の図形
が来ない様なものを設定する。こうする事により、機械
での自動検出も可能となる。In addition, FIG. 2 shows a mask substrate 21 for an exposure apparatus provided with a direction discrimination mark 22. In FIG. This direction discrimination mark can be provided at the same time as a pattern to be exposed is provided on a mask for an exposure apparatus. And this mark is a rectangle, etc.
Set the mask so that no figure with the same shape will come to the same position even if it is rotated twice. By doing this, automatic detection by a machine is also possible.
さらに、第５図に示すよ５に、露光装置用マスク基板３
１に位置判別マーク５２を設け、マスクが正確な状態に
あるか文字で判断できるようにすることも可能である。Furthermore, as shown in FIG.
It is also possible to provide a position determination mark 52 on the mask 1 so that it can be determined by text whether the mask is in an accurate state.
これによって、目視ですぐにマスクの状態を判別する事
ができる。This allows the condition of the mask to be immediately determined visually.
また、第１図から第５図までの実施例を組み合わせる事
も可能であり、それによってマスクの正確な状態を、機
械による自動検出や目視判別が容易に出来る。Furthermore, it is also possible to combine the embodiments shown in FIGS. 1 to 5, thereby making it easy to automatically detect the exact state of the mask by a machine or to visually determine it.
〔発明の効果コ
本発明の露光装置用マスクは、以上説明した様に、マス
クの表裏及び上下左右方向判別をつける為の目印を付け
た事により、マスクの正確な状態を機械によって自動的
に検出させたり、目視での確認を容易にする効果がある
。[Effects of the Invention] As explained above, the mask for exposure equipment of the present invention has marks for distinguishing the front and back sides of the mask, as well as the top, bottom, left, and right directions, so that the exact state of the mask can be automatically determined by a machine. This has the effect of facilitating detection and visual confirmation.
第１図、第２図及び第５図は、本発明の露光装置用マス
クの平面図。
第４図は、従来の露光装置用マスクの平面図。
第１１図
１２１品
篤３１図
算＋１辺1, 2, and 5 are plan views of a mask for an exposure apparatus according to the present invention. FIG. 4 is a plan view of a conventional mask for exposure equipment. Figure 11 121 Shinaatsu 31 illustrations + 1 side
Claims (1)
方向の判別をつける為の目印を付けた事を特徴とする露
光装置用マスク。A mask for exposure equipment, characterized in that it has marks for distinguishing the front and back sides of the mask, as well as the top, bottom, left and right directions.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1025071A JPH02204745A (en) | 1989-02-03 | 1989-02-03 | Mask for exposing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1025071A JPH02204745A (en) | 1989-02-03 | 1989-02-03 | Mask for exposing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02204745A true JPH02204745A (en) | 1990-08-14 |
Family
ID=12155695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1025071A Pending JPH02204745A (en) | 1989-02-03 | 1989-02-03 | Mask for exposing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02204745A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010008738A (en) * | 2008-06-27 | 2010-01-14 | Hoya Corp | Method for manufacturing photomask |
| JP2018017933A (en) * | 2016-07-28 | 2018-02-01 | 京セラドキュメントソリューションズ株式会社 | Manufacturing method of image reading device |
-
1989
- 1989-02-03 JP JP1025071A patent/JPH02204745A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010008738A (en) * | 2008-06-27 | 2010-01-14 | Hoya Corp | Method for manufacturing photomask |
| JP4536804B2 (en) * | 2008-06-27 | 2010-09-01 | Ｈｏｙａ株式会社 | Photomask manufacturing method |
| JP2018017933A (en) * | 2016-07-28 | 2018-02-01 | 京セラドキュメントソリューションズ株式会社 | Manufacturing method of image reading device |
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