JPH02199280A - Vacuum pump - Google Patents

Vacuum pump

Info

Publication number
JPH02199280A
JPH02199280A JP1016695A JP1669589A JPH02199280A JP H02199280 A JPH02199280 A JP H02199280A JP 1016695 A JP1016695 A JP 1016695A JP 1669589 A JP1669589 A JP 1669589A JP H02199280 A JPH02199280 A JP H02199280A
Authority
JP
Japan
Prior art keywords
pressure
vacuum pump
control valve
pump
control unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1016695A
Other languages
Japanese (ja)
Inventor
Toshio Matsuyama
松山 登志男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP1016695A priority Critical patent/JPH02199280A/en
Publication of JPH02199280A publication Critical patent/JPH02199280A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate management for control of a pressure and maintenance of pump performance by a method wherein a pressure control unit having a pressure controller, a pressure sensor, and a control valve is incorporated in a vacuum pump body. CONSTITUTION:A pressure control unit 1 is mounted to the upper part of a pump body 3 of an oil-sealed rotary vacuum pump. The pressure of an intake air port 4 is measured by a pressure sensor 6, and is compared with a value preset by a pressure controller 7. When a difference is produced therebetween, an inactive gas flow rate control valve 8 is regulated, and through regulation of a flow rate of gas through an N2 feed port 9 to the suction side, the pressure of the intake air port 4 is specified. This constitution eliminates management for control of a pressure by means of a processing device body and maintenance of pump performance.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は容器内を減圧して処理する半導体製造装置や食
料品の真空乾燥機などに用いられ、特に処理圧力を一定
に保つ排気系に使用される真空ポンプに関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention is used in semiconductor manufacturing equipment and vacuum dryers for food products that process the inside of a container by reducing the pressure, and is particularly applicable to an exhaust system that maintains a constant processing pressure. Regarding the vacuum pump used.

〔従来の技術〕[Conventional technology]

従来、この種の真空ボンダは排気する機能だけしか持っ
ておらず、圧力を一定にして処理する装置においては、
装置本体内に容器と、真空ポンプの中間に圧力制御弁と
を備え、容器内の圧力を測定した結果から電気的に前記
圧力制御弁の開度を調節する方法を取っていた。
Conventionally, this type of vacuum bonder only had the function of evacuation, and in equipment that processes at a constant pressure,
A method has been adopted in which a pressure control valve is provided between a container and a vacuum pump in the main body of the device, and the opening degree of the pressure control valve is electrically adjusted based on the result of measuring the pressure inside the container.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来の真空ポンプは単に排気する機能だけのた
め、循環オイルの劣化や機構部品の損傷などによる排気
性能の低下に対して無防備であり、処理圧力を一定にす
べき装置においては■装置側で一定圧力を制御する機構
を持つ、■定期的に真空ポンプの排気性能を管理し、異
常時は交換する、 というどちらかの方法を取る必要があり、装置側での制
御機構を持たない■の場合は、真空ポンプの性能を常に
一定の最高値に維持するか、または吸気口側配管に手動
弁を組込み、排気性能に応じてその弁を操作する方法し
かなく、圧力安定性の低下及び管理工数が多くなるとい
う欠点がある。
Since the conventional vacuum pump mentioned above only has the function of exhausting air, it is vulnerable to deterioration of exhaust performance due to deterioration of circulating oil or damage to mechanical parts. It has a mechanism to control a constant pressure with the pump.It is necessary to periodically manage the exhaust performance of the vacuum pump and replace it when an abnormality occurs.There is no control mechanism on the equipment side.■ In this case, the only options are to maintain the vacuum pump performance at a constant maximum value, or to incorporate a manual valve into the intake port side piping and operate the valve according to the exhaust performance, which may lead to a decrease in pressure stability and The disadvantage is that it requires a lot of management time.

本発明の目的は前記課題を解決した真空ボンダを提供す
ることにある。
An object of the present invention is to provide a vacuum bonder that solves the above problems.

〔発明の従来技術に対する相違点〕[Differences between the invention and the prior art]

上述した従来の真空ポンプに対し、本発明はポンプ本体
に圧力制御ユニットを組込み、吸気側圧力をあらかじめ
設定した圧力で安定させるという相違点を有する。
The present invention differs from the conventional vacuum pump described above in that a pressure control unit is incorporated into the pump body, and the suction side pressure is stabilized at a preset pressure.

〔課題を解決するための手段〕[Means to solve the problem]

前記目的を達成するため、本発明は容器内を低圧に減圧
する真空ボンダにおいて、ポンプ本体に吸気側の圧力を
設定・制御するための圧力コントローラと、吸気側の圧
力を測定するための圧力センサ及び圧力を変化させるた
めの制御弁を持つ圧力制御ユニットとを有するものであ
る。
In order to achieve the above object, the present invention provides a vacuum bonder that reduces the pressure inside a container to a low pressure, and includes a pressure controller for setting and controlling the pressure on the suction side of the pump body, and a pressure sensor for measuring the pressure on the suction side. and a pressure control unit having a control valve for changing the pressure.

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.

(実施例1) 第1図は本発明の実施例1を示す構成図である。(Example 1) FIG. 1 is a configuration diagram showing a first embodiment of the present invention.

1は圧力制御ユニットで油回転真空ポンプのポンプ本体
3の上部に搭載されている。2はボンブゲースである。
1 is a pressure control unit mounted on the upper part of the pump body 3 of the oil rotary vacuum pump. 2 is Bomb Game.

5は排気口である。吸気口4の圧力は圧力センサ6によ
り測定され、圧力コントローラ7であらかじめ設定され
た値と比較され、差がある場合は不活性ガス流量制御弁
8を調節し、N2供給口9からの吸気側へのガス流量を
増減して吸気口4の圧力を一定にする。
5 is an exhaust port. The pressure at the intake port 4 is measured by a pressure sensor 6 and compared with a preset value by a pressure controller 7. If there is a difference, the inert gas flow rate control valve 8 is adjusted and the pressure from the intake side from the N2 supply port 9 is adjusted. The pressure at the intake port 4 is kept constant by increasing or decreasing the gas flow rate.

(実施例2) 第2図は本発明の実施例2を示す構成図である。(Example 2) FIG. 2 is a configuration diagram showing a second embodiment of the present invention.

本実施例では圧力コントローラ7で設定した値に対して
圧力センサ6からの値が同じになるように圧力制御弁1
0の開度を調節する。この実施例では、圧力制御弁10
を使用してメカニカルブースター真空ポンプ11の吸気
側圧力を調節するが、不活性ガスを導入する方法と同じ
ように排気側圧力を一定に維持できるという利点がある
In this embodiment, the pressure control valve 1 is configured so that the value from the pressure sensor 6 is the same as the value set by the pressure controller
Adjust the opening degree of 0. In this embodiment, the pressure control valve 10
is used to adjust the intake side pressure of the mechanical booster vacuum pump 11, but it has the advantage that the exhaust side pressure can be maintained constant, similar to the method of introducing an inert gas.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は真空ポンプに圧力制御ユニ
ットを組込むことにより、処理装置本体での圧力制御や
ポンプ性能維持のための管理が不要となる効果がある。
As explained above, the present invention has the advantage that by incorporating a pressure control unit into a vacuum pump, there is no need for pressure control in the main body of the processing apparatus or management for maintaining pump performance.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例1を示す構成図、第2図は本発
明の実施例2を示す構成図である。 1・・・圧力制御ユニット 2・・・ボンダケース3・
・・ポンプ本体(油回転真空ポンプ)4・・・吸気口 
     5・・・排気口6・・・圧力センサ    
7・・・圧力コントローラ8・・・不活性ガス流量制御
弁 9・・・N1供給口    10・・・圧力制御弁11
・・・メカニカルブースター真空ポング第1図 第2図
FIG. 1 is a block diagram showing a first embodiment of the present invention, and FIG. 2 is a block diagram showing a second embodiment of the present invention. 1... Pressure control unit 2... Bonder case 3.
...Pump body (oil rotary vacuum pump) 4...Intake port
5...Exhaust port 6...Pressure sensor
7... Pressure controller 8... Inert gas flow rate control valve 9... N1 supply port 10... Pressure control valve 11
...Mechanical booster vacuum pump Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] (1)容器内を低圧に減圧する真空ポンプにおいて、ポ
ンプ本体に吸気側の圧力を設定・制御するための圧力コ
ントローラと、吸気側の圧力を測定するための圧力セン
サ及び圧力を変化させるための制御弁を持つ圧力制御ユ
ニットとを有することを特徴とする真空ポンプ。
(1) In a vacuum pump that reduces the pressure inside a container to a low pressure, the pump body is equipped with a pressure controller for setting and controlling the pressure on the intake side, a pressure sensor for measuring the pressure on the intake side, and a pressure sensor for changing the pressure. A vacuum pump comprising a pressure control unit having a control valve.
JP1016695A 1989-01-26 1989-01-26 Vacuum pump Pending JPH02199280A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1016695A JPH02199280A (en) 1989-01-26 1989-01-26 Vacuum pump

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1016695A JPH02199280A (en) 1989-01-26 1989-01-26 Vacuum pump

Publications (1)

Publication Number Publication Date
JPH02199280A true JPH02199280A (en) 1990-08-07

Family

ID=11923431

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1016695A Pending JPH02199280A (en) 1989-01-26 1989-01-26 Vacuum pump

Country Status (1)

Country Link
JP (1) JPH02199280A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58124079A (en) * 1982-01-20 1983-07-23 Furukawa Electric Co Ltd:The Pressure regulating method in vacuum pump
JPS6255484A (en) * 1985-09-02 1987-03-11 Yuken Kogyo Kk Variable capacity type pump

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58124079A (en) * 1982-01-20 1983-07-23 Furukawa Electric Co Ltd:The Pressure regulating method in vacuum pump
JPS6255484A (en) * 1985-09-02 1987-03-11 Yuken Kogyo Kk Variable capacity type pump

Similar Documents

Publication Publication Date Title
JP3332053B2 (en) Gas supply method to chamber
US6419455B1 (en) System for regulating pressure in a vacuum chamber, vacuum pumping unit equipped with same
KR20030007938A (en) Methods and apparatus for maintaining a pressure within an environmentally controlled chamber
CN101470447A (en) Transmission cavity pressure control system and method
US20060034673A1 (en) Semiconductor manufacturing apparatus and control method thereof
JPH02199280A (en) Vacuum pump
US6402479B1 (en) Apparatus for pumping out transfer chambers for transferring semiconductor equipment
JP3328632B2 (en) Etching equipment
JPS6025232A (en) Pressure regulation of semiconductor manufacturing device
JPS62106627A (en) Semiconductor manufacturing device
JPH05267224A (en) Dryetching system
JPH02192537A (en) Indoor absolute pressure controller device
JPH04196313A (en) Semiconductor manufacturing equipment
JP2551968B2 (en) Exhaust system in vacuum equipment
CN116520902B (en) Control method and equipment for pressure of semiconductor chamber with magnetic suspension device
JPS62169416A (en) Method and equipment for controlling pressure of vacuum apparatus
JP2002303295A (en) Evacuating ability monitoring method, vacuum treatment method and device
JPH07176809A (en) Laser oscillation device
JP2718508B2 (en) Vacuum container gas introduction method and vacuum apparatus for carrying out the method
JPH05251543A (en) Semiconductor processor
JPH01268029A (en) Method of pressure control of semiconductor manufacturing apparatus
JP2614516B2 (en) Differential exhaust type vacuum processing equipment
JP2002316035A (en) Evacuation apparatus and method, semiconductor and manufacturing method for liquid crystal substrate
WO2022232455A1 (en) Fluid delivery mounting panel and system
KR200248852Y1 (en) Apparatus for controlling a chamber gas pressure in a semiconductor processing unit