JPH0219806Y2 - - Google Patents

Info

Publication number
JPH0219806Y2
JPH0219806Y2 JP769484U JP769484U JPH0219806Y2 JP H0219806 Y2 JPH0219806 Y2 JP H0219806Y2 JP 769484 U JP769484 U JP 769484U JP 769484 U JP769484 U JP 769484U JP H0219806 Y2 JPH0219806 Y2 JP H0219806Y2
Authority
JP
Japan
Prior art keywords
processing
tank
splash plate
photographic film
waste liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP769484U
Other languages
Japanese (ja)
Other versions
JPS60120449U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP769484U priority Critical patent/JPS60120449U/en
Publication of JPS60120449U publication Critical patent/JPS60120449U/en
Application granted granted Critical
Publication of JPH0219806Y2 publication Critical patent/JPH0219806Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photographic Processing Devices Using Wet Methods (AREA)
  • Photographic Developing Apparatuses (AREA)

Description

【考案の詳細な説明】 (考案の技術分野) この考案は、写真フイルム処理機において処理
タンクの処理液交換時に漏出して落下する廃液を
回収する廃液タンクの構造に関する。
[Detailed Description of the Invention] (Technical Field of the Invention) This invention relates to the structure of a waste liquid tank that collects waste liquid that leaks and falls when the processing liquid in the processing tank is replaced in a photographic film processing machine.

(考案の技術的背景とその問題点) 第1図A,Bは従来の廃液回収の様子を説明す
るための図であり、同図Aのように装置本体内の
廃液皿1の上方の処理タンク2には、現像液、定
着液等の処理液3が満たされており、その中に写
真フイルムを搬送して処理するための処理ラツク
4が浸漬されている。そして、写真フイルムが処
理ラツク4によつて処理タンク2内の処理液3の
中を搬送されて所定の処理が行なわれるが、経時
的に処理液3が劣化し、新しい処理液に交換する
必要を生じる。このような場合、第1図Bに示す
ように処理ラツク4が別途駆動機構によつて図示
P方向に引上げられると共に、処理タンク2が図
示Q方向の交換位置に引出されて廃液化した処理
液3を廃棄し、処理タンク2に新たな処理液3を
充填することになる。
(Technical background of the invention and its problems) Figures 1A and 1B are diagrams for explaining the state of conventional waste liquid recovery. The tank 2 is filled with a processing liquid 3 such as a developer and a fixer, and a processing rack 4 for transporting and processing photographic film is immersed therein. Then, the photographic film is conveyed through the processing liquid 3 in the processing tank 2 by the processing rack 4 and subjected to prescribed processing, but the processing liquid 3 deteriorates over time and needs to be replaced with a new processing liquid. occurs. In such a case, as shown in FIG. 1B, the processing rack 4 is pulled up in the P direction in the figure by a separate drive mechanism, and the processing tank 2 is pulled out to the replacement position in the Q direction in the figure to remove the waste processing liquid. 3 will be discarded and the processing tank 2 will be filled with new processing liquid 3.

このような処理液交換時には処理タンク2は廃
液皿1の上になく、処理ラツク4の写真フイルム
を搬送するための溝等に溜つた廃液が雫5として
落下するが、従来はこの廃液の雫5が真下に配設
されている廃液皿1に溜るようになつている。し
かしながら、処理ラツク4の位置が高く、廃液の
雫5の廃液皿1までの落下距離が長いために雫の
はねが廃液皿1の外に出てしまつたり、廃液皿1
上に残つた廃液がしみとして残つてしまい、写真
フイルム処理機の美観を損ねたりする欠点があつ
た。
When replacing the processing liquid in this way, the processing tank 2 is not placed on the waste liquid tray 1, and the waste liquid accumulated in the groove for conveying photographic film in the processing rack 4 falls as drops 5. 5 is designed to collect in a waste liquid tray 1 located directly below. However, since the processing rack 4 is located high and the falling distance of the waste liquid drops 5 to the waste liquid dish 1 is long, the droplets may splash out of the waste liquid dish 1 or
There was a drawback that the waste liquid remaining on the top remained as a stain, spoiling the aesthetic appearance of the photographic film processing machine.

(考案の目的) この考案は上述のような事情からなされたもの
であり、処理液交換時における廃液の雫のはねを
なくし、美観を損ねることもない写真フイルム処
理機の廃液タンクを提供することを目的としてい
る。
(Purpose of the invention) This invention was made in view of the above-mentioned circumstances, and it is an object of the present invention to provide a waste liquid tank for a photographic film processing machine that eliminates the splashing of waste liquid drops when replacing the processing liquid and does not impair the aesthetic appearance. The purpose is to

(考案の概要) この考案は、写真フイルム処理液の廃液の雫の
はねをなくして美観を損ねないようにした写真フ
イルム処理機の廃液タンクに関し、写真フイルム
処理機の処理タンクの後方に配置され、前記処理
タンクに装着される処理ラツクから落下する写真
フイルム処理液の雫を溜めるタンク部と、前記タ
ンク部の上部に回動可能に取付けられ、写真フイ
ルム処理時には前記処理タンクに押圧されてほぼ
垂直状態に位置し、処理液交換時には前記処理タ
ンクの取外しによつて前記垂直位置から水平面に
対し幾分上方に傾いた位置まで回動するはね板部
材とで構成したものである。これによつて前記処
理ラツクから落下する前記写真フイルム処理液の
雫を前記はね板部材に沿つて前記タンク部に回収
貯溜するようになつている。
(Summary of the invention) This invention relates to a waste liquid tank for a photographic film processing machine that eliminates the splashing of drops of waste liquid from the photographic film processing liquid so as not to spoil the aesthetic appearance. a tank section for collecting drops of photographic film processing liquid falling from a processing rack attached to the processing tank; The splash plate member is located in a substantially vertical position and rotates from the vertical position to a position slightly tilted upward with respect to the horizontal plane by removing the processing tank when replacing the processing liquid. As a result, drops of the photographic film processing solution falling from the processing rack are collected and stored in the tank portion along the splash plate member.

(考案の実施例) 第2図はこの考案の一実施例を示す斜視図、第
3図はタンク部10に係合する凹部を設けられた
処理タンク20を装填した場合の側面図であり、
直方体の上部が開口された箱の形をした廃液を貯
溜するためのタンク部10は、底板11と、長方
形の一辺がやや突出した突出部Pを有する同一形
状で対向する左右1対の側板12A及び12B
と、この側板12A及び12Bの各突出部Pと係
合するように挟持された側板13と、この側板1
3と対向して側板12A及び12Bの間に配設さ
れ、上方に長く突出した壁板14とで成つてい
る。なお、このタンク部10はモールド加工等に
よつて一体的に構成されていても良い。そして、
壁板14の両側には矩形状の小片15A及び15
Bが垂設されており、この小片15A及び15B
に、それぞれほぼ扇形状のはね板側板16A及び
16Bが円柱状のピン17A及び17Bで回動可
能なように取付けられている。ここで、ピン17
A及び17Bにそれぞれ係合している左右1対の
はね板側板16A及び16Bの支持孔18A及び
18Bは、第4図に示すように匂玉状に偏心した
形状となつており、ピン17A及び17Bの軸支
位置がそれぞれ実線位置と破線位置との間で自由
に移動できるように、はね板側板16A及び16
Bが可動となつている。2枚のはね板側板16A
及び16Bは、各下辺に固着されたはね板19で
連結されてはね板部材を構成している。
(Embodiment of the invention) Fig. 2 is a perspective view showing an embodiment of the invention, and Fig. 3 is a side view when a processing tank 20 provided with a recess that engages with the tank portion 10 is loaded.
The tank part 10 for storing waste liquid, which is shaped like a rectangular parallelepiped box with an open top, has a bottom plate 11 and a pair of left and right side plates 12A facing each other and having the same shape and having a protrusion P with one side of a rectangle slightly protruding. and 12B
, the side plate 13 held so as to engage with each protrusion P of the side plates 12A and 12B, and the side plate 1
3 and a wall plate 14 that is disposed opposite to the side plates 12A and 12B and protrudes upwardly. Note that this tank portion 10 may be integrally formed by molding or the like. and,
On both sides of the wall plate 14 are rectangular pieces 15A and 15.
B is installed vertically, and these small pieces 15A and 15B
2, substantially fan-shaped splash plate side plates 16A and 16B are rotatably mounted on cylindrical pins 17A and 17B, respectively. Here, pin 17
The support holes 18A and 18B of the pair of left and right side panels 16A and 16B, which are engaged with the pins 17A and 17B, respectively, have an eccentric shape in the shape of a bead, as shown in FIG. The side plates 16A and 16 are arranged so that the pivot positions of the side plates 16A and 17B can be freely moved between the solid line position and the broken line position, respectively.
B is movable. Two splash plate side plates 16A
and 16B are connected by a splash plate 19 fixed to each lower side to form a splash plate member.

このような構成において、通常は第3図に示す
ようにタンク部10に係合する凹部を設けられた
処理タンク20が接するように装填されており、
はね板19は処理タンク20の側面21によつて
ピン17A,17Bを支点として上方にはね上げ
られる。しかしながら、はね板19はタンク部1
0の壁板14に当つて止まり、反対側へは倒れな
い。これにより、はね板19(又ははね板側板1
6A,16B)は処理タンク20の側面21の押
圧力に応じて第6図Aに示すように倒立状態とな
り、その自重によりピン17A及び17Bがそれ
ぞれ支持孔18A及び18Bの上部位置に係合す
ることになる。このため、下部位置に係合してい
る場合に比べて長さL1だけ、はね板19(又は
はね板側板16A,16B)は下方に押下げら
れ、はね板19のためのスペースを小さくするこ
とができる。
In such a configuration, normally, as shown in FIG. 3, a processing tank 20 provided with a recessed portion that engages with the tank portion 10 is loaded so as to be in contact with the processing tank 20.
The splash plate 19 is flipped upward by the side surface 21 of the processing tank 20 using the pins 17A and 17B as fulcrums. However, the splash plate 19
It stops when it hits the wall plate 14 at 0 and does not fall to the other side. As a result, the splash plate 19 (or the splash plate side plate 1
6A, 16B) become inverted as shown in FIG. 6A in response to the pressing force of the side surface 21 of the processing tank 20, and due to their own weight, the pins 17A and 17B engage with the upper positions of the support holes 18A and 18B, respectively. It turns out. Therefore, the splash plate 19 (or the splash plate side plates 16A, 16B) is pushed down by a length L1 compared to when it is engaged in the lower position, and the space for the splash plate 19 is saved. Can be made smaller.

このような定常状態から、処理液22の交換の
ために処理ラツク4が上方に引上げられ、第5図
に示すように処理タンク20が図示Q方向の処理
液交換位置に引出されると、第6図Aに示すよう
にはね板19も含めたはね板側板16A及び16
Bの重心Gが支点があるピン17A及び17Bよ
りも右側にあることから、はね板19には図示R
方向へのモーメントが作用して、同図Bのように
はね板19(又ははね板側板16A,16B)が
タンク部10の突出部Pと衝突する位置まで回転
して止まる。このとき、はね板19が水平線とな
す角αは30度程度であり、突出部Pとの衝突点に
対して図示右側に重心があるため、第6図Bに示
すようにピン17A及び17Bはそれぞれ支持孔
18A及び18Bの下部位置と係合することにな
る。このため、上部位置に係合している場合に比
べて長さL2だけはね板19は処理ラツク4の方
向へ突出することになり、その分だけ処理ラツク
4からの廃液の雫を受ける領域を広くすることが
できる。そして、処理ラツク4から漏出する廃液
の雫5は、傾斜して静止しているはね板19の上
面に落下し、落下した廃液ははね板19の上面を
伝つてタンク部10に導かれてその中に溜る。
From such a steady state, when the processing rack 4 is pulled upward to replace the processing liquid 22 and the processing tank 20 is pulled out to the processing liquid exchange position in the direction Q shown in the figure, as shown in FIG. As shown in Figure 6A, the splash plate side plates 16A and 16 including the splash plate 19
Since the center of gravity G of B is on the right side of the pins 17A and 17B where the fulcrum is, the splash plate 19 has R as shown in the figure.
A moment acts in the direction, and the splash plate 19 (or the splash plate side plates 16A, 16B) rotates to a position where it collides with the protrusion P of the tank portion 10 and stops, as shown in FIG. At this time, the angle α that the splash plate 19 makes with the horizontal line is about 30 degrees, and the center of gravity is on the right side in the figure with respect to the point of collision with the protrusion P. Therefore, as shown in FIG. 6B, the pins 17A and 17B will engage with the lower positions of the support holes 18A and 18B, respectively. Therefore, compared to the case where the splash plate 19 is engaged in the upper position, the splash plate 19 protrudes in the direction of the processing rack 4 by a length L2, and the splash plate 19 has an area that receives drops of waste liquid from the processing rack 4 by that amount. can be made wider. The drops 5 of waste liquid leaking from the treatment rack 4 fall onto the upper surface of the splash plate 19 which is tilted and stationary, and the fallen waste liquid is guided to the tank part 10 through the upper surface of the splash plate 19. It collects inside it.

また、処理タンク20に新たな処理液が充填さ
れて再びタンク部10に接するようにして装填さ
れると、はね板19は水平線から角度αをなして
傾斜しているので、処理タンク20の側面21に
よつて容易にはね上げられて第3図の装填状態と
なる。
Furthermore, when the processing tank 20 is filled with new processing liquid and is loaded so as to be in contact with the tank section 10 again, the splash plate 19 is inclined at an angle α from the horizontal line, so that the processing tank 20 is It is easily flipped up by the side surface 21 and becomes the loaded state shown in FIG.

なお、タンク部10に溜る廃液は雫として落下
する程度のものであるから、自然に放置しておけ
ば蒸発してしまうことになるが、タンク部10内
にヒータを設けて積極的に蒸発させるようにして
もよい。また、写真フイルム処理機における処理
量が多く、処理液の交換頻度が高くなつて廃液の
蒸発する量よりも溜る量の方が多い場合には、タ
ンク部10内に液面計を設け、ある基準レベル以
上の廃液がタンク部10内に溜つたときにアラー
ムを発生するようにしてもよい。
Note that the waste liquid that accumulates in the tank section 10 only falls as drops, so if left alone it will evaporate, but a heater is provided in the tank section 10 to actively evaporate it. You can do it like this. In addition, if the amount of processing in the photographic film processing machine is large and the processing liquid has to be replaced frequently, and the amount of waste liquid that accumulates is greater than the amount that evaporates, a liquid level gauge may be provided in the tank section 10. An alarm may be generated when waste liquid exceeding a reference level accumulates in the tank section 10.

さらに、はね板側板16A及び16BをR方向
に倒すような弾性部材(たとえばバネ)を設け、
はね板19を含めたはね板側板の自重にたよらず
にはね板19をR方向に回転させるような動力を
与えてもよい。さらにまた、タンク部の構造は廃
液を回収して貯溜できる構造であれば変更可能で
あり、タンク部の側面に開口を設けてはね板から
の廃液を回収するようにしても良い。
Furthermore, an elastic member (for example, a spring) is provided to tilt the side panels 16A and 16B in the R direction,
Power may be applied to rotate the splash plate 19 in the R direction without relying on the weight of the splash plate side plates including the splash plate 19. Furthermore, the structure of the tank part can be modified as long as it is capable of collecting and storing waste liquid, and an opening may be provided in the side surface of the tank part to collect waste liquid from the splash plate.

(考案の効果) 以上のようにこの考案によれば、処理ラツク4
とはね板19との落下距離が短いので、辺りに雫
をはね上げることもなく、確実にはね板の上面を
伝つてタンク部に回収され、タンク部内は外部か
ら見えない美観を損なうこともない。また、上記
実施例では壁板14をはね板19のストツパとし
て用いているので、処理タンク20によつてはね
板19が第3図のように倒立された状態では、は
ね板19の上面はタンク10の壁板14と対向
し、不注意にはね板19の上面に触れてはね板1
9に付着した廃液で手等を汚されることもない。
しかしながら、壁板14は必ずしも他の側板に比
べて高くなるようにする必要はなく、壁板14を
側板13と同程度の寸法とし、代わりに小片15
A及び15Bの付近にはね板側板16A及び16
Bに対する簡単なストツパを設けるようにしても
よい。
(Effect of the invention) As described above, according to this invention, the processing
Since the falling distance between the splash plate 19 and the splash plate 19 is short, the droplets are not splashed around, and the droplets are surely collected on the top surface of the splash plate and collected in the tank, and the interior of the tank cannot be seen from the outside and spoils the aesthetics. Not at all. Further, in the above embodiment, the wall plate 14 is used as a stopper for the splash plate 19, so when the splash plate 19 is inverted by the processing tank 20 as shown in FIG. The upper surface faces the wall plate 14 of the tank 10, and if you inadvertently touch the upper surface of the splash plate 19, the splash plate 1
There is no need to get your hands etc. dirty with the waste liquid attached to the tube.
However, the wall plate 14 does not necessarily need to be higher than the other side plates; instead, the wall plate 14 may be of similar size to the side plates 13, and instead the small pieces 15
There are side plates 16A and 16 near A and 15B.
A simple stopper for B may be provided.

なお、前記実施例では、処理ラツク4を上方に
引上げる場合について説明したが、処理ラツク4
を固定にし、処理タンク2を下方に引下げるよう
にしてもよいことは言うまでもない。
In the above embodiment, the case where the processing rack 4 was pulled upward was explained, but the processing rack 4
It goes without saying that the processing tank 2 may be fixed and the processing tank 2 may be pulled downward.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図A,Bは従来の廃液回収の様子を説明す
るための図、第2図はこの考案の一実施例の斜視
図、第3図は処理タンクを装填した場合の側面
図、第4図ははね板側板を拡大して示す図、第5
図はこの実施例の動作を説明するための図、第6
図A,Bははね板側板の支持孔とピンとの係合の
様子を説明するための図である。 1……廃液皿、2,20……処理タンク、3,
22……処理液、4……処理ラツク、10……タ
ンク部、12A,12B,13……側板、14…
…壁板、16A,16B……はね板側板、19…
…はね板。
Figures 1A and B are diagrams for explaining the state of conventional waste liquid recovery, Figure 2 is a perspective view of an embodiment of this invention, Figure 3 is a side view when the processing tank is loaded, Figure 4 The figure shows an enlarged view of the side plate of the splash plate.
The figure is a diagram for explaining the operation of this embodiment.
Figures A and B are diagrams for explaining how the support hole of the side plate of the splash plate engages with the pin. 1... Waste liquid dish, 2, 20... Processing tank, 3,
22... Processing liquid, 4... Processing rack, 10... Tank section, 12A, 12B, 13... Side plate, 14...
...Wall plate, 16A, 16B... Splash plate side plate, 19...
...splash board.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 写真フイルム処理機の処理タンクの後方に配置
され、前記処理タンクに装着される処理ラツクか
ら落下する写真フイルム処理液の雫を溜めるタン
ク部と、前記タンク部の上部に回動可能に取付け
られ、写真フイルム処理時には前記処理タンクに
押圧されてほぼ垂直状態に位置し、処理液交換時
には前記処理タンクの取外しによつて前記垂直位
置から水平面に対し幾分上方に傾いた位置、まで
回動するはね板部材とを具備して成り、前記処理
ラツクから落下する前記写真フイルム処理液の雫
を前記はね板部材に沿つて前記タンク部に回収貯
溜することを特徴とする写真フイルム処理機の廃
液タンク。
a tank section disposed behind a processing tank of a photographic film processing machine to collect drops of photographic film processing liquid falling from a processing rack attached to the processing tank; and a tank section rotatably mounted on the upper part of the tank section; When processing photographic film, it is pressed against the processing tank and is positioned in an almost vertical position, and when replacing the processing liquid, when the processing tank is removed, it rotates from the vertical position to a position that is tilted somewhat upwards with respect to the horizontal plane. A waste liquid from a photographic film processing machine, comprising a splash plate member, wherein drops of the photographic film processing liquid falling from the processing rack are collected and stored in the tank portion along the splash plate member. tank.
JP769484U 1984-01-25 1984-01-25 Waste liquid tank of photographic film processing machine Granted JPS60120449U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP769484U JPS60120449U (en) 1984-01-25 1984-01-25 Waste liquid tank of photographic film processing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP769484U JPS60120449U (en) 1984-01-25 1984-01-25 Waste liquid tank of photographic film processing machine

Publications (2)

Publication Number Publication Date
JPS60120449U JPS60120449U (en) 1985-08-14
JPH0219806Y2 true JPH0219806Y2 (en) 1990-05-31

Family

ID=30486283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP769484U Granted JPS60120449U (en) 1984-01-25 1984-01-25 Waste liquid tank of photographic film processing machine

Country Status (1)

Country Link
JP (1) JPS60120449U (en)

Also Published As

Publication number Publication date
JPS60120449U (en) 1985-08-14

Similar Documents

Publication Publication Date Title
US10852176B2 (en) Water fullness alarm device and a dehumidifier
JPH0219806Y2 (en)
CN105953511B (en) Refrigerator weighing device anti-interference structure and refrigerator
KR940001688B1 (en) Portable electronic apparatus having a battery pack
CN210066619U (en) Track cleaning device and track sweeper
JPH03113655U (en)
US2977175A (en) Refuse container
KR920006301Y1 (en) Drip tray for refrigerator
JP2017114092A (en) Thermal printer and printing unit
JPH0132606Y2 (en)
JPH04203714A (en) Device to stop filling to full in dehumidifier
CN214932025U (en) Automatic liquid level rising device
JPS5816061Y2 (en) Vending machine product presence detection switch device
JPH06331167A (en) Dehumidifier
JPH0643656Y2 (en) Automatic ice machine
JPH0684318U (en) Thin box scale
JP3472740B2 (en) Game machine ashtray mounting structure
JP3203111U (en) Car wash container
JPS6032851Y2 (en) Water storage tank device in ice maker
JPS5848670Y2 (en) Wet developing device
JPS5833547Y2 (en) Water storage amount detection device for dehumidifiers, etc.
JPH0289973A (en) Automatic ice-making device
KR890005662Y1 (en) Airconditioner
JPH0478264U (en)
JPH0783732A (en) Device for detecting quantity of liquid in container