JPH02185747A - Magneto-optical recording medium - Google Patents

Magneto-optical recording medium

Info

Publication number
JPH02185747A
JPH02185747A JP376489A JP376489A JPH02185747A JP H02185747 A JPH02185747 A JP H02185747A JP 376489 A JP376489 A JP 376489A JP 376489 A JP376489 A JP 376489A JP H02185747 A JPH02185747 A JP H02185747A
Authority
JP
Japan
Prior art keywords
copolymer
film
tetrafluoroethylene
magneto
teflon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP376489A
Other languages
Japanese (ja)
Inventor
Tetsushiyuu Miyahara
鉄洲 宮原
Takeshi Tobisawa
飛沢 猛
Takao Ichioka
市岡 孝男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
Original Assignee
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink and Chemicals Co Ltd filed Critical Dainippon Ink and Chemicals Co Ltd
Priority to JP376489A priority Critical patent/JPH02185747A/en
Publication of JPH02185747A publication Critical patent/JPH02185747A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve oxidation resistance, corrosion resistance and adhesion strength to an adjacent inorg. matter or UV curing resin by completely covering a recording layer with a copolymer film of tetrafluoroethylene and ethylene. CONSTITUTION:An inorg. dielectric film 2 is coated with an org. protective film 4 consisting of a copolymer of tetrafluoroethylene and ethylene (tetrafluoroethylene copolymer). As the tetrafluoroethylene copolymer has polymerization chains in which hydrogen atoms are surrounded by fluorine atoms, the copolymer has equivalent properties such as chemical resistance, weather resistance and water repellent property to those of 'Teflon(R)', and moreover, the copolymer has lower gas transmittance for O2 and N2 by one figure than 'Teflon(R)'. The copolymer shows good adhesion to other material as it contains CH bonds in its polymerization chains.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、レーザビーム等の光ビームの照射により情報
の記録、再生および消去を行なう光磁気ディスクに関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magneto-optical disk on which information is recorded, reproduced and erased by irradiation with a light beam such as a laser beam.

〔従来の技術〕[Conventional technology]

光磁気ディスクは記録層として希土類−遷移金属非晶質
合金膜を用いるものが実用化されようとしているが、一
般にこのような希土類元素を含有した膜は非常に酸化さ
れ易いために、通常St、N4゜5IAtN 、 At
N 、 ZnSなどの無機質誘電体膜で記録膜を覆い、
記録層が酸素ガス又は水分と接触しないようにした構造
がとられている。
Magneto-optical disks using rare earth-transition metal amorphous alloy films as recording layers are about to be put into practical use, but films containing such rare earth elements are generally very easily oxidized, so they are usually made of St, N4゜5IAtN, At
The recording film is covered with an inorganic dielectric film such as N or ZnS,
The structure is such that the recording layer does not come into contact with oxygen gas or moisture.

例えば、特開昭60−63747.%開昭60−801
44 。
For example, JP-A-60-63747. %Opened in 1986-801
44.

特開昭60−145525.%開昭62−40651.
特開昭62−197939の各公報に示されている。
JP-A-60-145525. % Kaisho 62-40651.
This is disclosed in Japanese Patent Laid-Open No. 62-197939.

しかし、このような無機質誘電体膜は、一般にその表面
が親水性であるため、空気中の水分が吸着しやすく、従
って、誘電体膜に微細なピンホールが存在する場合には
、そこから水分が侵入して、記録層に孔食が発生し、光
磁気ディスクの耐久性を低下させる原因となる。そこで
、これを改善するために、(1)無機物保護膜の上にピ
ンホールを埋めるのが容易でかつ耐環境性に優れたテフ
ロン。
However, since the surface of such an inorganic dielectric film is generally hydrophilic, it easily adsorbs moisture in the air, and therefore, if there are minute pinholes in the dielectric film, moisture will be removed from there. enters, causing pitting corrosion in the recording layer and reducing the durability of the magneto-optical disk. In order to improve this, we developed (1) Teflon, which is easy to fill pinholes on the inorganic protective film and has excellent environmental resistance.

エポキシ樹脂またはポリイミドで被覆する方法(特開昭
62−293536 )、(2)光磁気記録媒体の外界
と接触する部位を撥水性樹脂のテフロン(四フフ化エチ
レン)または低透湿性樹脂のポリ・母うキシリレン、変
性ウレタン樹脂で被覆する方法(特開昭63−2074
5)等が報告されている。
A method of coating with epoxy resin or polyimide (Japanese Unexamined Patent Publication No. 62-293536); (2) coating the area of the magneto-optical recording medium that comes into contact with the outside with water-repellent resin Teflon (tetrafluoroethylene) or low moisture permeable resin polyimide; Method of coating with matrix xylylene and modified urethane resin (Japanese Patent Application Laid-Open No. 63-2074
5) etc. have been reported.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

このような有機樹脂の中で、テフロン(四フッ化エチレ
ン)は耐熱性、耐薬品性、耐候性および撥水性が最も優
れているため、防蝕効果が最も効果的と考えられる。
Among such organic resins, Teflon (tetrafluoroethylene) has the best heat resistance, chemical resistance, weather resistance, and water repellency, and is therefore considered to have the most effective anticorrosion effect.

しかしながら、このようなテフロン膜を使用した場合に
もいくつかの問題点がある。第1はテフロン樹脂は防水
効果は大きいものの、酸素02や窒素N2のガス透過性
は比較的大きく、また水蒸気の透過性もある丸め、高温
高湿度下にさらされた場合には酸化防止には必ずしも役
立たない。即ち、テフロンにおいてはガス透過性は02
に対して1050.N2に対して390cc−ml/ 
l OOin ・24hr−atm  と大きく酸化性
ガスによる記録層中の希土類元素の選択酸化の問題は回
避出来ない。
However, there are some problems even when such a Teflon membrane is used. First, although Teflon resin has a large waterproofing effect, it has relatively high gas permeability to oxygen 02 and nitrogen N2, and is also permeable to water vapor. Not necessarily helpful. That is, in Teflon, the gas permeability is 02
1050. 390cc-ml/for N2
The problem of selective oxidation of the rare earth elements in the recording layer by the oxidizing gas cannot be avoided, which is as large as l OOin .multidot.24 hr-atm.

第2は接着性の問題である。光磁気ディスクはカー回転
角の増幅効果と耐酸化保護を兼ねて、磁性膜上に無機防
電体膜(SIO□、810.Si、N4.AtN、Zn
S・te )を形成させるが、このような無機膜は硬く
てもろいため、基板のわずかな変形(収縮、膨張)や取
扱時の応力によってクラックが入ってしまう。
The second problem is adhesion. Magneto-optical disks have an inorganic electrically shielding film (SIO□, 810.Si, N4.AtN, Zn
However, since such an inorganic film is hard and brittle, cracks may occur due to slight deformation (shrinkage, expansion) of the substrate or stress during handling.

そこで、これを押えるために一般に1媒体の最表面に紫
外線硬化樹脂をスピンコードし硬化させることによって
厚さ10〜40μmの有機保護層を形成させることが行
なわれている(例えば、特開昭57−27451公報)
Therefore, in order to suppress this, it is generally done to form an organic protective layer with a thickness of 10 to 40 μm by spin-coding and curing an ultraviolet curable resin on the outermost surface of a medium (for example, JP-A-57 -27451 Publication)
.

従って、この紫外線硬化樹脂の代わりに、前述のテフロ
ン膜を厚くコーティングすれば保護効果はよ)効果的で
あるが、テフロンは化学的に溶剤に溶けないため、スピ
ンコード法を用いることが出来ない。従って蒸着、イオ
ンブレーティングあるいはスフ9ツタ等のドライプロセ
スで成膜する必要があるが、この場合には膜厚を厚くす
ることが困難である。
Therefore, instead of this ultraviolet curing resin, it would be effective to apply a thick coating of the Teflon film mentioned above, but the spin code method cannot be used because Teflon is not chemically soluble in solvents. . Therefore, it is necessary to form a film by a dry process such as evaporation, ion blasting, or suffix, but in this case, it is difficult to increase the film thickness.

そこで、特開昭62−293536の如くスパッタ法に
より無機防電体膜をテフロン膜で被覆したとしても取扱
上の問題から媒体最表面を更にスピンコード法を用い紫
外線硬化樹脂でコーティングする必要がある。ところが
、テフロンはC−F結合よりなるため、分極率も小さく
、電気的に中性であυ表面不活性であるため、他物質と
の接着性、ぬれ性が悪く、紫外線硬化樹脂等の保護膜を
均一に塗布できないという問題点がある。
Therefore, even if the inorganic electrically shielding film is coated with a Teflon film by the sputtering method as in JP-A-62-293536, due to handling problems, it is necessary to further coat the outermost surface of the medium with an ultraviolet curing resin using the spin cord method. . However, since Teflon consists of C-F bonds, its polarizability is low, it is electrically neutral, and its surface is inert, so it has poor adhesion and wettability with other substances, and is difficult to protect UV-curable resins. There is a problem that the film cannot be applied uniformly.

この問題は光磁気記録媒体のみならず、相変化戴光ディ
スク体についても同様である。これを回避するためにテ
フロン等のフッ素樹脂膜上に無機材料からなる薄膜を形
成しておきその上に、紫外線硬化樹脂層を形成する方法
が報告されている(I!#開昭63−26848)。し
かしながら、この方法ではSiO2,513N4.Go
、st、*z、sb等の無機材料をスフ9ツタあるいは
蒸着等で形成する必要があるため光ディスクの製作工程
が増加し、製造コスト面から実用的でない。
This problem applies not only to magneto-optical recording media but also to phase-change optical disk bodies. In order to avoid this, a method has been reported in which a thin film made of an inorganic material is formed on a fluororesin film such as Teflon, and then an ultraviolet curable resin layer is formed on it (I! #Kaisho 63-26848 ). However, in this method, SiO2,513N4. Go
, st, *z, sb, etc., must be formed by layering or vapor deposition, which increases the number of steps for manufacturing the optical disk, making it impractical from the viewpoint of manufacturing costs.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

本発明は、光磁気ディスクの耐久性向上のために無機鰐
電体膜の上に更にコーティングする有機保limAのう
ち最も優れているテフロン(四フフ化エチレン)膜の問
題点すなわち、ガス透過性および、接着性の問題を解決
することを課題とする。
The present invention addresses the problems of the Teflon (tetrafluoroethylene) film, which is the most excellent organic adhesive, and which is further coated on top of the inorganic electric film to improve the durability of magneto-optical disks, namely its gas permeability. And, the task is to solve the problem of adhesion.

〔課題を解決するための手段〕[Means to solve the problem]

上記課題を解決するための本発明はテフロン(四フッ化
エチレン)膜の代わりに下記構造のテトラフロロエチレ
ンとエチレンの[j合体(四フッ化エチレンコポリマー
)を用いる。例えばのようなものがある。H,Fの代わ
りにCH3等の置換基がついていても構わない。上記構
造の材料は、融点265〜270℃、溶融粘度104〜
105poise(300〜320℃)であるため、ス
パッタ法の他に真空蒸着によっても膜形成が可能である
。一方、単なるテトラフロロエチレン樹脂の場合は溶融
粘度が10  ヘ10  poise (340〜38
0℃)と高いため蒸着法によって膜形成することは困難
である。
In order to solve the above problems, the present invention uses a [j combination (tetrafluoroethylene copolymer) of tetrafluoroethylene and ethylene] having the following structure instead of a Teflon (tetrafluoroethylene) membrane. For example, there is something like this. A substituent such as CH3 may be substituted for H or F. The material with the above structure has a melting point of 265-270°C and a melt viscosity of 104-270°C.
Since the temperature is 105 poise (300 to 320°C), the film can be formed not only by sputtering but also by vacuum evaporation. On the other hand, in the case of simple tetrafluoroethylene resin, the melt viscosity is 10 to 10 poise (340 to 38
It is difficult to form a film by vapor deposition because the temperature is as high as 0°C).

次に化学的性質について述べると、上記四フッ化エチレ
ンコポリマーはフッ素原子が水素原子を狭んだ形で重合
鎖が出来ているため、耐薬品性、耐候性、撥水性につい
てテフロンと同等の性質を保持しながら、ガス透過係数
は02に対して148゜N2に対して45cc−mit
/100 ln ・24hra itmといずれもテフ
ロンよシ1桁小さな値を示す。
Next, regarding the chemical properties, the above-mentioned tetrafluoroethylene copolymer has polymer chains formed by fluorine atoms sandwiching hydrogen atoms, so it has properties equivalent to Teflon in terms of chemical resistance, weather resistance, and water repellency. while maintaining the gas permeability coefficient of 148° for 02 and 45cc-mit for N2.
/100 ln and 24 hra itm, both of which are one order of magnitude smaller than Teflon.

更に、CH結合を内蔵しているため、他物質との接着性
が良くなる。
Furthermore, since it contains a CH bond, its adhesion to other substances is improved.

上記の如く、本発明では光磁気ディスクの耐久性向上の
ために無機誘電体膜の上にテトラフロロエチレンとエチ
レンの共重合体(四フフ化エチレンコ?リマー)の膜を
形成し、耐酸化性、耐食性および隣接する無機物質また
は紫外線硬化樹脂との接着性の改善を行なった。
As mentioned above, in the present invention, in order to improve the durability of the magneto-optical disk, a film of a copolymer of tetrafluoroethylene and ethylene (tetrafluoroethylene copolymer) is formed on an inorganic dielectric film to improve oxidation resistance. , corrosion resistance and adhesion to adjacent inorganic substances or UV-curable resins were improved.

〔実施例〕〔Example〕

以下、本発明の光磁気記録媒体の実施例を図面を用いて
説明する。
Embodiments of the magneto-optical recording medium of the present invention will be described below with reference to the drawings.

(実施例1) 第1図は本発明の光磁気記録媒体の断面を模式的に示し
たものである。1はボリカーゴネイト(pc )基板(
1301111φ、1.6μmピッチのグループ付)、
2はS i 3N4誘電体膜で各々厚みは80 nmで
ある。
(Example 1) FIG. 1 schematically shows a cross section of a magneto-optical recording medium of the present invention. 1 is polycargonate (PC) substrate (
1301111φ, with 1.6μm pitch group),
2 are Si 3N4 dielectric films each having a thickness of 80 nm.

この膜はSt、N4をターゲットとして、高周波スパッ
タ法を用い、アルゴンガス圧5tlTorr 、投入電
力1 kWで約15分間スパッタを行なうことによって
形成した。3はTbFICo光磁気記録膜で厚みは11
00nである。この膜はTb25F・70CO5の合金
ターゲットを用い直流スパッタ法でアルゴンガス圧5m
Torr。
This film was formed by sputtering using St and N4 as targets using a high frequency sputtering method at an argon gas pressure of 5 tlTorr and an input power of 1 kW for about 15 minutes. 3 is a TbFICo magneto-optical recording film with a thickness of 11
It is 00n. This film was made using a DC sputtering method using an alloy target of Tb25F/70CO5 at an argon gas pressure of 5 m.
Torr.

投入電力0.7kWで約5分間スパッタを行なうことに
よって形成した。4はテトラフロロエチレンとエチレン
の共重合体膜で厚みは200 n1llである。
It was formed by sputtering for about 5 minutes at an input power of 0.7 kW. 4 is a copolymer film of tetrafluoroethylene and ethylene with a thickness of 200 n1ll.

この膜は、旭硝子製四7フ化エチレンコポリマー(商品
名ニアクロンcop )のターゲットを用い高周波スパ
ッタ法でアルゴン5mTorr 、投入電力0.3kW
で約15分間スパッタを行なうことによって形成した。
This film was produced using a high-frequency sputtering method using a target of Asahi Glass Co., Ltd.'s tetra7fluoroethylene copolymer (trade name: Niacron cop) under argon gas of 5 mTorr and input power of 0.3 kW.
It was formed by sputtering for about 15 minutes.

このようにして得られた光磁気ディスクを80℃、85
%RHの恒温恒湿槽に入れ、2000時間の加速劣化試
験を行ない、C/Nおよびディフェクトエラーレイト(
DIR)を測定した結果を第1表に示した。
The thus obtained magneto-optical disk was heated at 80°C and 85°C.
%RH, and conducted an accelerated deterioration test for 2000 hours to determine the C/N and defect error rate (
The results of measuring DIR) are shown in Table 1.

ここで、C/N比はディスクを180Orpmで回転さ
せ、波長830 t+mの半導体レーザーを用いて出力
5mW、 dat750%、記録周波数I MHzでデ
ィスク半径位置40襲の部分に記録を行なった後、これ
を再生出力1 mWの半導体レーザーを用いて再生し、
その信号をバンド幅30 kHzにてス被りトラムアナ
ライザーを用いて測定した。
Here, the C/N ratio is determined by rotating the disk at 180 rpm and recording on the 40th radius of the disk using a semiconductor laser with a wavelength of 830 t+m at an output of 5 mW, a dat of 750%, and a recording frequency of I MHz. is reproduced using a semiconductor laser with a reproduction output of 1 mW,
The signal was measured using an overlapping tram analyzer with a bandwidth of 30 kHz.

また、DERは未記録部分について半導体レーザー・母
ワー1 mW 、回転速度4m/S、γ= 45 m 
、測定トラックfi4000 )ラック、スレショルド
レベルは反射光量の+25%として、欠陥数をカウント
することによって行なった。
In addition, the DER for the unrecorded portion was determined using a semiconductor laser/power supply power of 1 mW, rotation speed of 4 m/S, and γ = 45 m.
, measurement track fi4000) rack, the threshold level was set to +25% of the amount of reflected light, and the number of defects was counted.

次に、同時に作製した5x5cmの試験用ポリカーゲネ
イト基板上の光磁気記録媒体を1規定のNaC2水溶液
に5時間浸漬し透過型光学顕微鏡で孔食の発生有無を1
00倍に拡大して観察した結果(写真)を第6図に示す
。第6図にみるように、テストピースの全視野でピンホ
ールは生成していないことがわかる。
Next, a magneto-optical recording medium on a 5x5cm test polycargenate substrate prepared at the same time was immersed in a 1N NaC2 aqueous solution for 5 hours, and the presence or absence of pitting corrosion was observed using a transmission optical microscope.
The result (photograph) of observation with 00 times magnification is shown in FIG. As shown in FIG. 6, it can be seen that no pinholes were generated in the entire field of view of the test piece.

(比較例1) 実施例1においてアフロ70020代わりに、三井−デ
ュポンフロロケミカル社製のテトラフロロエチレン樹脂
(商品名:テフロン■820−J )を用いた以外は実
施例1と同様にして光磁気ディスクおよびそのテストピ
ースを作製した。
(Comparative Example 1) Optical magnetism was carried out in the same manner as in Example 1, except that tetrafluoroethylene resin (trade name: Teflon 820-J) manufactured by Mitsui-DuPont Fluorochemical Co., Ltd. was used instead of Afro 70020 in Example 1. A disk and its test piece were produced.

このサングルを実施例1と同様の加速劣化試験を行なっ
てC/NおよびDIRを測定した結果を表1に示した。
This sample was subjected to the same accelerated deterioration test as in Example 1, and the C/N and DIR were measured. Table 1 shows the results.

その結果、C/Nについては変化は少ないものの、DI
Rは実施例1に比較して1桁以上低下している。
As a result, although there was little change in C/N, DI
R is reduced by one order of magnitude or more compared to Example 1.

また、第7図には1規定のNaC1水溶液中に5時間浸
漬後の透過顕微鏡写真(拡大100倍)を示した。
Moreover, FIG. 7 shows a transmission micrograph (100x magnification) after immersion in a 1N NaCl aqueous solution for 5 hours.

第7図にみるように10〜100μm直径のピンホール
が部分的に生成しておシ、孔食が発生、成長しているの
がわかる。
As shown in FIG. 7, it can be seen that pinholes with a diameter of 10 to 100 μm are partially formed, and pitting corrosion occurs and grows.

(比較例2) 実施例1において四フッ化エチレンコポリマーの膜を被
着させない以外は実施例1と同様にして光磁気ディスク
およびそのテストピースを作製した。これらサンプルを
実施例1と同様の加速劣化試験を行なった。その結果を
C/NおよびDIRについて表1に、顕微鏡写真(拡大
100倍)について第8図に示した。DIRは2桁程度
低下するとともに、NaC2水溶液浸漬テストでの孔食
の発生が著しい。
(Comparative Example 2) A magneto-optical disk and its test piece were produced in the same manner as in Example 1, except that the film of tetrafluoroethylene copolymer was not deposited in Example 1. These samples were subjected to the same accelerated deterioration test as in Example 1. The results are shown in Table 1 for C/N and DIR, and in FIG. 8 for a micrograph (100x magnification). The DIR decreased by about two orders of magnitude, and pitting corrosion occurred significantly in the NaC2 aqueous solution immersion test.

(実施例2) 実施例1と同様にして作製した光磁気rイスクにおいて
記録媒体の最表面にスピンコード法によシ、紫外線硬化
樹脂(大日本インキ製5D−301)を約30μm塗布
した後、紫外線照射を行ない硬化させ、光磁気rイスク
を作製した。その構造を第2図に示した。このサンプル
を実施例1と同様の加速劣化試験を行なった結果を表1
に示した。
(Example 2) After applying approximately 30 μm of ultraviolet curable resin (5D-301 manufactured by Dainippon Ink) to the outermost surface of the recording medium using a spin code method in a magneto-optical disk produced in the same manner as in Example 1. The material was cured by irradiation with ultraviolet rays to produce a magneto-optical disk. Its structure is shown in Figure 2. This sample was subjected to the same accelerated deterioration test as in Example 1, and the results are shown in Table 1.
It was shown to.

これより、C/NおよびDERとも、実施例1と同様に
劣化はほとんど認められなかった。
From this, similar to Example 1, almost no deterioration was observed in both C/N and DER.

(比較例3) 実施例2において、四フッ化エチレンコポリマーの膜を
被着させない以外は実施例2と同様にして、光磁気ディ
スク・す/プルを作製した。その構造を第3図に示した
。このサンプルを実施例1と同様の加速劣化試験を行な
ったところ表1に示すようにC/Nについてはほとんど
低下はなかったもののDIRについて若干の劣化が認め
られた。
(Comparative Example 3) A magneto-optical disk/s/pull was produced in the same manner as in Example 2 except that the film of tetrafluoroethylene copolymer was not deposited. Its structure is shown in Figure 3. When this sample was subjected to the same accelerated deterioration test as in Example 1, as shown in Table 1, although there was almost no decrease in C/N, some deterioration in DIR was observed.

(実施例3) 実施例1において、ポリカー?ネイトの下地基板上にあ
らかじめ、7ノ化エチレンコポリマー膜を約1000X
の厚さに被着させその上に、実施例1と同様にして光磁
気ディスク・サンプルを作製し九。その構造の模式図を
第4図に示す。このサンプルを実施例1と同様の加速劣
化試験を行なったところC/NおよびDERとも劣化は
認められなかった0 (実施例4) 実施例1においてポリカーボネイト基板の記録層側と反
対側にフッ化エチレンコポリマーの膜を被着させた以外
は実施例1と同様に光磁気ディスクを作製した(第5図
〕。得られたサンプルを実施例1と同様に加速劣化試験
を行なったところ、実施例1と同様の安定性を得た。
(Example 3) In Example 1, polycar? In advance, apply a heptano-ethylene copolymer film at approximately 1000X on the base substrate of Neato.
A magneto-optical disk sample was prepared thereon in the same manner as in Example 1. A schematic diagram of its structure is shown in FIG. When this sample was subjected to the same accelerated deterioration test as in Example 1, no deterioration was observed in both C/N and DER.0 (Example 4) In Example 1, the side opposite to the recording layer side of the polycarbonate substrate was fluorinated. A magneto-optical disk was prepared in the same manner as in Example 1 except that an ethylene copolymer film was applied (Fig. 5).The obtained sample was subjected to an accelerated deterioration test in the same manner as in Example 1. Stability similar to that of 1 was obtained.

/ 6万′ / 第  1  表 乃至第8図は孔食の発生の有無を示す顕微鏡写真である
/ 60,000' / Tables 1 to 8 are microscopic photographs showing the presence or absence of pitting corrosion.

1・・・基板、2・・・無機誘電体膜、3・・・光磁気
記録層、4・・・フッ化エチレンコポリマー保m層、s
・・・紫外線硬化樹脂層。
DESCRIPTION OF SYMBOLS 1... Substrate, 2... Inorganic dielectric film, 3... Magneto-optical recording layer, 4... Fluorinated ethylene copolymer retention layer, s
...UV curable resin layer.

〔発明の効果〕〔Effect of the invention〕

以上述べたように本発明によれば、透光性基板上に光磁
気記録層に光を照射し、記録再生・消去を行なう光磁気
記録媒体において、外界および/ま九は基板と接触する
部位を四フッ化エチレンコポリマーの膜で被覆すること
Kより、保存安定性が向上し、信頼性の高い、光磁気記
録媒体を提供することが可能となった。
As described above, according to the present invention, in a magneto-optical recording medium in which a magneto-optical recording layer on a transparent substrate is irradiated with light to perform recording, reproduction and erasing, the outside world and/or the area that contacts the substrate is By coating K with a film of tetrafluoroethylene copolymer, storage stability is improved and it becomes possible to provide a highly reliable magneto-optical recording medium.

【図面の簡単な説明】[Brief explanation of the drawing]

Claims (1)

【特許請求の範囲】[Claims] 光学的に透明な基板上に記録層を形成した光磁気記録媒
体において、該記録層を四フッ化エチレンとエチレンの
共重合体の膜で完全に被覆することを特徴とする光磁気
記録媒体。
1. A magneto-optical recording medium comprising a recording layer formed on an optically transparent substrate, characterized in that the recording layer is completely covered with a film of a copolymer of tetrafluoroethylene and ethylene.
JP376489A 1989-01-12 1989-01-12 Magneto-optical recording medium Pending JPH02185747A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP376489A JPH02185747A (en) 1989-01-12 1989-01-12 Magneto-optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP376489A JPH02185747A (en) 1989-01-12 1989-01-12 Magneto-optical recording medium

Publications (1)

Publication Number Publication Date
JPH02185747A true JPH02185747A (en) 1990-07-20

Family

ID=11566237

Family Applications (1)

Application Number Title Priority Date Filing Date
JP376489A Pending JPH02185747A (en) 1989-01-12 1989-01-12 Magneto-optical recording medium

Country Status (1)

Country Link
JP (1) JPH02185747A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005083696A1 (en) * 2004-02-27 2005-09-09 Matsushita Electric Industrial Co., Ltd. Magnetic recording medium, manufacturing method and manufacturing equipment therefor, method for reproducing record of magnetic recording medium and record reproducing equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005083696A1 (en) * 2004-02-27 2005-09-09 Matsushita Electric Industrial Co., Ltd. Magnetic recording medium, manufacturing method and manufacturing equipment therefor, method for reproducing record of magnetic recording medium and record reproducing equipment

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