JPH02184089A - Gas circulation type pulse laser - Google Patents

Gas circulation type pulse laser

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Publication number
JPH02184089A
JPH02184089A JP272189A JP272189A JPH02184089A JP H02184089 A JPH02184089 A JP H02184089A JP 272189 A JP272189 A JP 272189A JP 272189 A JP272189 A JP 272189A JP H02184089 A JPH02184089 A JP H02184089A
Authority
JP
Japan
Prior art keywords
gas
main
discharge
discharger
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP272189A
Other languages
Japanese (ja)
Inventor
Sei Takemori
竹森 聖
Eisaku Mizufune
水船 栄作
Yukio Kawakubo
川久保 幸雄
Yoshimasa Kubota
久保田 善征
Hiroharu Sasaki
弘治 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP272189A priority Critical patent/JPH02184089A/en
Publication of JPH02184089A publication Critical patent/JPH02184089A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To prevent a discharging product generated in a preliminary ionization discharger from mixing in a main discharger through the opening of an opening electrode by isolating a gas passage including the main discharger and a gas passage including the preliminary ionization discharger, and independently circulating two gas flows. CONSTITUTION:Gas is circulated in a gas passage 9 by a fan 11. That is, laser gas raised at its temperature at a main discharger is fed to a heat exchanger 12 to be cooled, and newly supplied to a main discharger 4. Since a current density is relatively small in a glow discharge of the main discharge, a discharging product in the laser gas is very small, and does not substantially affect the influence to the stability of the discharge. Since an arc discharge having high current density is generated at gaps 5a and 5b in a gas passage 10, a large quantity of discharging product is generated. Since this product easily attracts electrons in a discharging plasma, it particularly makes the glow discharge of the main discharge unstable. The laser gas containing a large quantity of discharging product is circulated by a fan 13, passed through a gas reproducer 14, and newly supplied to a preliminary ionization arc discharger.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はパルスガスレーザに係り、特に、高繰返しパル
ス動作に好適なガス循環に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a pulsed gas laser, and more particularly to gas circulation suitable for high repetition pulse operation.

〔従来の技術〕[Conventional technology]

従来の装置は、特開昭62−81078 号公報に記載
のように、レーザガス流は主放電部から開口電極の開口
部を介して予備電離用放電部を通過して、更に主放電部
へと循環する構成となっていた。
In the conventional device, as described in Japanese Patent Application Laid-Open No. 62-81078, the laser gas flow passes from the main discharge part through the opening of the aperture electrode, passes through the pre-ionization discharge part, and then goes to the main discharge part. It had a cyclical structure.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術は、予備電離用放電部で生じた放電生成物
が循環ガス流中に残留する点について考慮がされておら
ず、高繰返しパルス動作時に残留放電生成物によって主
放電が不安定となる問題があった。
The above conventional technology does not take into consideration the fact that discharge products generated in the pre-ionization discharge section remain in the circulating gas flow, and the main discharge becomes unstable due to the residual discharge products during high repetition pulse operation. There was a problem.

本発明の目的は、高繰返しパルス動作でも安定した主放
電を達成する高出力ガスレーザ装置を提供することにあ
る。
An object of the present invention is to provide a high-output gas laser device that achieves stable main discharge even with high-repetition pulse operation.

(I’llを解決するための手段〕 上記目的は、主放電部を含むガス流路と予備電離用放電
部を含むガス流路を分離して、二つのガス流を互いに独
立に循環させることにより達成される。
(Means for solving I'll) The above purpose is to separate the gas flow path including the main discharge part and the gas flow path including the pre-ionization discharge part, and circulate the two gas flows independently of each other. This is achieved by

〔作用〕[Effect]

主放電部では、ガス流速v1によって動圧ΔPlだけ負
圧が発生する。予備電離用放電部でも同様に、ガス流速
v2によって動圧ΔPzだけ負圧が発生する。本発明で
は、それぞれの負圧の大きさがΔPi≦ΔP2となるよ
うにガス流速vtt vzを設定する。これによって、
予備電離用放電部で生じた放電生成物が開口電極の開口
部を介して主放電部に混入することを防ぐことができる
In the main discharge section, a negative pressure equal to the dynamic pressure ΔPl is generated due to the gas flow rate v1. Similarly, in the pre-ionization discharge section, a negative pressure equal to the dynamic pressure ΔPz is generated due to the gas flow rate v2. In the present invention, the gas flow rate vtt vz is set so that the magnitude of each negative pressure satisfies ΔPi≦ΔP2. by this,
It is possible to prevent discharge products generated in the pre-ionization discharge section from entering the main discharge section through the opening of the open electrode.

また、前述の二つのガス流は互いに分離して循環するの
で、主放電部を含むガス流路に残留放電生成物が混入す
ることもない。
Further, since the two gas streams described above are circulated separately from each other, residual discharge products are not mixed into the gas flow path including the main discharge section.

〔実施例〕〔Example〕

以下、本発明の一実施例を第1図のエキシマレーザ装置
によって説明する。
An embodiment of the present invention will be described below using an excimer laser device shown in FIG.

レーザ管1内に3気圧レーザガス(HCfl。Inside the laser tube 1 is a 3 atm laser gas (HCfl).

Xs、He、Neの混合ガス)を封入する。主電極2a
、2bのうち一方は1m数の円形開口3をもつ開口電極
2bである。主電極2a、2b間には主放電部4が形成
される。開口電極2bに対して主放電部4と反対側の位
置に、予備fi!離手段としてスパークギャップ5a、
5bが設けられる。
A mixed gas of Xs, He, and Ne) is sealed. Main electrode 2a
, 2b is an aperture electrode 2b having circular apertures 3 of 1 m in number. A main discharge portion 4 is formed between the main electrodes 2a and 2b. A preliminary fi! A spark gap 5a as a releasing means,
5b is provided.

主電極の一方2aには、ピーキングコンデンサ6a、6
bが並列に接続され、更に、高圧パルス電源7に接続さ
れる。
Peaking capacitors 6a, 6 are connected to one of the main electrodes 2a.
b are connected in parallel, and further connected to the high voltage pulse power supply 7.

一方、ダクト8a、8b、8cによって、主放電部4を
含むガス流路9とスパークギャップ部5a、5bを含む
ガス流路10を形成する。ガス流路9内にはガス循環用
ファン11と熱交換器12を配置する。また、ガス流路
10内にはガス循環用ファン13とガス再生装置14を
配置する。
On the other hand, the ducts 8a, 8b, and 8c form a gas flow path 9 including the main discharge portion 4 and a gas flow path 10 including the spark gap portions 5a and 5b. A gas circulation fan 11 and a heat exchanger 12 are arranged within the gas flow path 9. Furthermore, a gas circulation fan 13 and a gas regeneration device 14 are arranged within the gas flow path 10.

本実施例の動作は次のとおりである。高圧パルス電源7
からパルス電圧が、主電極2a、ピーキングコンデンサ
6a、6b、スパークギャップ5a、5bの間に印加さ
れる。パルス電圧印加中に、スパークギャップ5a、5
bではアーク放電が発生して紫外線が生じる。この紫外
線は開口電極2bの開口部3を通過して、主放電部4の
レーザガスを予備電離する。印加電圧が上昇して主放電
開始電圧に達すると、主電極2a、2bの間で主放電で
あるグロー放電が発生してレーザガスが放電励起され、
本図には示さないレーザ共振器からレーザ出力が取り出
される。
The operation of this embodiment is as follows. High voltage pulse power supply 7
A pulse voltage is applied between the main electrode 2a, the peaking capacitors 6a, 6b, and the spark gaps 5a, 5b. During application of pulse voltage, spark gaps 5a, 5
In b, arc discharge occurs and ultraviolet rays are produced. This ultraviolet light passes through the opening 3 of the aperture electrode 2b and pre-ionizes the laser gas in the main discharge section 4. When the applied voltage increases and reaches the main discharge starting voltage, a glow discharge, which is a main discharge, occurs between the main electrodes 2a and 2b, and the laser gas is excited by discharge.
Laser output is extracted from a laser resonator not shown in this figure.

ガス流路9内では、ファン11によってガス循環が行わ
れる。即ち、主放電で温度上昇したレーザガスは熱交換
器12に送られて冷却され、新たに主放電部4へ供給さ
れる。ここで、主放電であるグロー放電では電流密度が
比較的小さいので、レーザガス中の放電生成物は極くわ
ずかで、放電の安定性には実質的に影響を及ぼさない。
Gas circulation is performed within the gas flow path 9 by a fan 11 . That is, the laser gas whose temperature has increased due to the main discharge is sent to the heat exchanger 12 to be cooled, and is then newly supplied to the main discharge section 4. Here, in glow discharge, which is the main discharge, the current density is relatively low, so the discharge products in the laser gas are extremely small and do not substantially affect the stability of the discharge.

一方、ガス流路10内のギャップ5a、5bでは、電流
密度の大きなアーク放電が発生するので、多量の放電生
成物が生じる。この生成物は放電プラズマ中の電子を吸
着し易いので、特に主放電であるグロー放電を不安定に
する。放電生成物を多量に含んだレーザガスは、ファン
13によって循環され。
On the other hand, arc discharge with a large current density occurs in the gaps 5a and 5b in the gas flow path 10, so a large amount of discharge products are generated. This product tends to adsorb electrons in the discharge plasma, making glow discharge, which is the main discharge, particularly unstable. The laser gas containing a large amount of discharge products is circulated by a fan 13.

ガス再生装置14を通過して、新たに予備電離用アーク
放電部へ供給される。
The gas passes through the gas regeneration device 14 and is newly supplied to the preliminary ionization arc discharge section.

本実施例では、主放電部のガス流速v1と予備電離用ア
ーク放電部のガス流速v2を実質的に等しく設定する。
In this embodiment, the gas flow velocity v1 of the main discharge section and the gas flow velocity v2 of the preliminary ionization arc discharge section are set to be substantially equal.

ガス流速1/l、 V2によって発生する動圧ΔPl、
ΔP2は等しくなるので、開口電極2bの両面では圧力
差が生じない。このため、放電生成物を含むレーザガス
は開口3を介して主放電部4に混入することはない。
Gas flow rate 1/l, dynamic pressure ΔPl generated by V2,
Since ΔP2 is equal, no pressure difference occurs on both sides of the open electrode 2b. Therefore, the laser gas containing discharge products does not enter the main discharge section 4 through the opening 3.

本実施例では、予備電離用アーク放電によって生じた放
電生成物が主放電部4に混入することがないので、主放
電であるグロー放電が安定して高繰返しパルス動作が達
成されるという効果がある。
In this embodiment, the discharge products generated by the pre-ionizing arc discharge do not enter the main discharge section 4, so that the glow discharge, which is the main discharge, is stabilized and high repetition pulse operation is achieved. be.

本発明の第二の実施例を第2図に示す。この実施例が第
1図と異なる点は、ガス流路9,10を新たなガス流路
15で連結し、ガス流路15内にガス再生装置16とフ
ァン17を配置している点である。ファン17によって
ガス流路15の入口部15aと出口部15bには差圧Δ
Pが発生する。
A second embodiment of the invention is shown in FIG. This embodiment differs from FIG. 1 in that the gas channels 9 and 10 are connected by a new gas channel 15, and a gas regenerator 16 and a fan 17 are arranged in the gas channel 15. . The fan 17 creates a differential pressure Δ between the inlet 15a and outlet 15b of the gas flow path 15.
P occurs.

従って、ガス流路9の圧力は、ガス流路10の圧力より
もΔPだけ大きいことになる。他の実施例では、レーザ
ガスの温度上昇などによって予備電離用アーク放電部の
ガス圧力が局部的に上昇しても、ファン17による差圧
ΔPによって、アーク放電部のレーザガスが主放電部4
に混入するのを確実に阻止できるという効果がある。
Therefore, the pressure in the gas flow path 9 is greater than the pressure in the gas flow path 10 by ΔP. In another embodiment, even if the gas pressure in the preliminary ionization arc discharge section increases locally due to a rise in the temperature of the laser gas, the differential pressure ΔP caused by the fan 17 causes the laser gas in the arc discharge section to
This has the effect of reliably preventing contamination.

更に1本発明の第三の実施例を第3図示す、レーザ管1
の一部を形成する着脱可能な取付板1aが設置される。
Furthermore, a third embodiment of the present invention is shown in FIG. 3, a laser tube 1.
A removable mounting plate 1a is installed which forms a part of the.

ダクト8a、8dで形成されるガス流路10は取付板1
aに相対するように配置され、取付板1aに対応する位
置にガス再生装置14が設置される。この構成によれば
、取付板1aを取り外すという簡単な作業によってガス
再生装置14の保守2点検が容易になる。
The gas flow path 10 formed by the ducts 8a and 8d is connected to the mounting plate 1.
The gas regeneration device 14 is disposed opposite to the mounting plate 1a, and is installed at a position corresponding to the mounting plate 1a. According to this configuration, maintenance and inspection of the gas regeneration device 14 is facilitated by the simple operation of removing the mounting plate 1a.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、予備電離用アーク放電によって生じた
放電生成物が主放電部に混合することがないので、安定
した主放電が得られて高繰返しパルス動作が達成できる
According to the present invention, since the discharge products generated by the pre-ionizing arc discharge are not mixed into the main discharge part, a stable main discharge can be obtained and a high repetition pulse operation can be achieved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例のエキシマレーザ装置の断面
図、第2図と第3図は本発明の他の実施例の断面図であ
る。
FIG. 1 is a sectional view of an excimer laser device according to one embodiment of the invention, and FIGS. 2 and 3 are sectional views of other embodiments of the invention.

Claims (1)

【特許請求の範囲】 1、レーザ管中に封入したレーザガスを放電励起する主
放電部を形成する主電極の少なくとも一方が開口部をも
つ開口電極から成り、前記開口電極に対して主放電部と
反対側の位置にレーザガスの予備電離手段部をもつパル
スレーザにおいて、 前記主放電部を含むガス流路と前記予備電離手段を含む
ガス流路を分離したことを特徴とするガス循環型パルス
レーザ。 2、特許請求項第1項において、 前記主放電部のガス流速と前記予備電離手段部のガス流
速を実質的に等しくしたことを特徴とするガス循環型パ
ルスレーザ。 3、特許請求の項1項において、 前記予備電離手段部のガス圧力を前記主放電部のガス圧
力に対して負圧にしたことを特徴とするガス循環型パル
スレーザ。 4、特許請求項第1項において、 前記予備電離手段部を含むガス流路を前記レーザ管を形
成する管壁に相対するように配置したことを特徴とする
ガス循環型パルスレーザ。
[Scope of Claims] 1. At least one of the main electrodes forming the main discharge part for discharge excitation of the laser gas sealed in the laser tube is an open electrode having an opening, and the main discharge part and the main discharge part are connected to the open electrode. 1. A gas circulation type pulsed laser having a laser gas pre-ionization means section on the opposite side, characterized in that the gas flow path including the main discharge section and the gas flow path containing the pre-ionization means are separated. 2. The gas circulation type pulsed laser according to claim 1, wherein the gas flow velocity in the main discharge section and the gas flow velocity in the preliminary ionization section are made substantially equal. 3. The gas circulation type pulse laser according to claim 1, wherein the gas pressure in the pre-ionization means section is set to be a negative pressure with respect to the gas pressure in the main discharge section. 4. The gas circulation type pulsed laser according to claim 1, wherein the gas flow path including the pre-ionization means is arranged to face a tube wall forming the laser tube.
JP272189A 1989-01-11 1989-01-11 Gas circulation type pulse laser Pending JPH02184089A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP272189A JPH02184089A (en) 1989-01-11 1989-01-11 Gas circulation type pulse laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP272189A JPH02184089A (en) 1989-01-11 1989-01-11 Gas circulation type pulse laser

Publications (1)

Publication Number Publication Date
JPH02184089A true JPH02184089A (en) 1990-07-18

Family

ID=11537174

Family Applications (1)

Application Number Title Priority Date Filing Date
JP272189A Pending JPH02184089A (en) 1989-01-11 1989-01-11 Gas circulation type pulse laser

Country Status (1)

Country Link
JP (1) JPH02184089A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03203277A (en) * 1989-12-28 1991-09-04 Toshiba Corp Pulse gas laser oscillation apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03203277A (en) * 1989-12-28 1991-09-04 Toshiba Corp Pulse gas laser oscillation apparatus

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