JPH02172884A - Device for pulling up single crystal rod - Google Patents
Device for pulling up single crystal rodInfo
- Publication number
- JPH02172884A JPH02172884A JP32601488A JP32601488A JPH02172884A JP H02172884 A JPH02172884 A JP H02172884A JP 32601488 A JP32601488 A JP 32601488A JP 32601488 A JP32601488 A JP 32601488A JP H02172884 A JPH02172884 A JP H02172884A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- chamber
- heater
- crystal rod
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 42
- 239000007789 gas Substances 0.000 claims abstract description 27
- 238000010926 purge Methods 0.000 claims abstract description 19
- 239000011261 inert gas Substances 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 8
- 239000002994 raw material Substances 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 abstract description 7
- 239000003575 carbonaceous material Substances 0.000 abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 4
- 239000010453 quartz Substances 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 150000001722 carbon compounds Chemical class 0.000 description 9
- 230000006698 induction Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000155 melt Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、CZ (Czochra l sk i)法
によって多結晶融液から単結晶棒を引き上げるための引
−Lげ装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a pulling device for pulling a single crystal rod from a polycrystalline melt by the CZ (Czochralski) method.
(従来の技術)
この種の引上げ装置は、チャンバー内に不活性ガス供給
用のパージチューブ、結晶原料を収容するルツボ、該ル
ツボの周囲に配設されるヒータ、該ヒータの周囲に配さ
れる断熱部材等を収納して構成されるか、前記ヒータ、
断熱部材等は炭素材て構成され、且つ炭素材の一部か石
英ルツボの外側と接触しているため、これらか高温加熱
されると1CO等の炭素化合物の蒸気か生してこれらの
蒸気がルツボ内の結晶融液に混入し、このために引き上
げられる単結晶棒のC濃度か高くなって種々の不具合か
生じる0例えば、半導体製造において、Si単結晶中の
高濃度のCは、半導体素子の電気特性に悪影響を与える
とともに、各種結晶欠陥の主因となる。(Prior Art) This type of pulling device includes a purge tube for supplying an inert gas in a chamber, a crucible for accommodating a crystal raw material, a heater disposed around the crucible, and a purge tube disposed around the heater. The heater may be configured by housing a heat insulating member or the like;
The heat insulating members are made of carbon materials, and some of the carbon materials are in contact with the outside of the quartz crucible, so when they are heated to high temperatures, vapors of carbon compounds such as 1CO are generated and these vapors are released. For example, in semiconductor manufacturing, high concentration of C in Si single crystals is mixed into the crystal melt in the crucible, which increases the C concentration in the single crystal rod that is pulled, causing various problems. It has an adverse effect on the electrical properties of the metal and is the main cause of various crystal defects.
そこて、Arガス等の不活性ガスを前記パージチューブ
からチャンバー内に導入し、CO等の炭素化合物の蒸気
かルツボ内の結晶融液に触れるのを阻止し、以て前記不
具合を解消することか一般的に行なわれている。Therefore, an inert gas such as Ar gas is introduced into the chamber from the purge tube to prevent the vapor of carbon compounds such as CO from coming into contact with the crystal melt in the crucible, thereby eliminating the above problem. Or is it commonly practiced?
(発明が解決しようとする課!2Fり
しかしながら、上記のようにチャンバー内に不活性ガス
を供給しても、ヒータや断熱部材の高温部から発生する
CO等の炭素化合物の蒸気がルツボ内の結晶融液に触れ
るのを完全に阻止することは困難であり、引上げられた
単結晶棒中のC5度を低く抑えるには限界があった。(The problem that the invention aims to solve! 2nd floor) However, even if an inert gas is supplied into the chamber as described above, the vapor of carbon compounds such as CO generated from the high temperature parts of the heater and the heat insulating member will still enter the crucible. It is difficult to completely prevent contact with the crystal melt, and there is a limit to keeping the C5 degree in the pulled single crystal rod low.
そこで、特公昭57−40119号は、引き上げ中の単
結晶棒を同心円的に囲むポット状の熱遮閉〕kガス整流
筒を開示するか、この構造てはルツボ内の不活性雰囲気
ガスかルツボの上縁外周部を出た直後、ルツボ上縁外岡
に近接するカーボン製ルツボサセプタに接触し、更にヒ
ータ、その他のカーホン部材に接触し、このためにクリ
ーピング又は6L流によるガスの逆流によって、炭素て
汚染された雰囲気かルツボ内の融体の上に形成され易い
。従って、この方法ては、引き上げられる単結晶棒の単
結晶汚染を抑制するという効果が期待できない。Therefore, Japanese Patent Publication No. 57-40119 discloses a pot-shaped heat shielding [k gas rectifying cylinder] that concentrically surrounds the single crystal rod being pulled, or this structure is designed to prevent the inert atmosphere gas inside the crucible from flowing into the crucible. Immediately after exiting the outer periphery of the upper edge, the carbon comes into contact with the carbon crucible susceptor close to the outer surface of the upper edge of the crucible, and further comes into contact with the heater and other carton members, so that the carbon is A contaminated atmosphere is likely to form on top of the melt in the crucible. Therefore, this method cannot be expected to be effective in suppressing single crystal contamination of the single crystal rod being pulled.
又、他の例として特公昭56−21758号か公知であ
る。この方法は構造的に複雑であり、装置か破損し易く
、加工の困難な部品て構成され、更に致命的なのは、心
要な構成部品の石英製ガスストレーナの下端外面に酸化
シリコンか検出され、これの落下による結晶孔れを生ず
るという問題がある。Another example is Japanese Patent Publication No. 56-21758. This method is structurally complex and requires parts that are easily damaged and difficult to machine, and most importantly, silicon oxide is detected on the outer surface of the lower end of the critical component, the quartz gas strainer. There is a problem in that crystal pores are formed due to the falling of the crystals.
本発明は、上記問題に鑑みてなされたもので、その目的
とする処は、C濃度の低い単結晶棒を弓上げることかて
きる単結晶棒の引上げ装置を提供するにある。The present invention has been made in view of the above-mentioned problems, and its object is to provide a single-crystal rod pulling device capable of lifting a single-crystal rod with a low C concentration.
(課題を解決するための手段)
上記目的を達成すべく本発明は、チャンバー内に、不活
性ガス供給用のパージチューブ、結晶原料を収容するル
ツボ、該ルツボの周囲に配設されるヒータ、該ヒータの
周囲に配される断熱部材等を収納して構成される単結晶
棒の引上げ装置において、引Eげ単結晶棒を同心円的に
囲繞するパージチューブを前記チャンバーの上部から前
記ルツボ内の湯面近傍まで延設して該パージチューブの
下端縁をルツボの上端縁よりも下方に位とせしめるとと
もに、前記ルツボの上端部外周に気密に嵌合する短円筒
部と、該短円筒部上端から上方に向かってロート状に開
き、その上端部か水平に外方へ延出するリング状円板に
て構成される鍔付テーパ筒部とから成るガス誘導筒を設
け、該ガス誘導筒の前記リング状円板外周部とチャンバ
ー内壁との隙間かチャンバー下部から上方へ向かうガス
の流れを遮断する程度に制限されていることを特徴とす
る。(Means for Solving the Problems) In order to achieve the above object, the present invention includes a purge tube for supplying an inert gas, a crucible for accommodating a crystal raw material, a heater disposed around the crucible, In a single-crystal rod pulling device configured to house a heat insulating member placed around the heater, a purge tube that concentrically surrounds the E-drawn single-crystal rod is inserted from the top of the chamber into the crucible. a short cylindrical part that extends close to the hot water level so that the lower end edge of the purge tube is positioned below the upper end edge of the crucible, and that fits airtightly to the outer periphery of the upper end of the crucible; and the upper end of the short cylindrical part A gas guide tube is provided, which opens upward in a funnel shape, and has a flange-tapered tube section consisting of a ring-shaped disk extending horizontally outward from the upper end of the gas guide tube. It is characterized in that the gap between the outer periphery of the ring-shaped disk and the inner wall of the chamber is limited to an extent that blocks the flow of gas upward from the lower part of the chamber.
(作用)
ヒータや断熱部材の高温部の上部はガス誘導筒にて被わ
れているため、高温部から発生するc。(Function) Since the upper part of the high-temperature part of the heater or heat insulating member is covered with a gas induction tube, c is generated from the high-temperature part.
等の炭素化合物のノル気の上昇かガス誘導筒によって妨
げられ、CO等の炭素化合物の蒸気かルツボ側へ流れて
ルツボ内の結晶融液に触れるのか阻止され、この結果、
当該引上げ装置によって引き上げられる単結晶棒のC′
e度か低く抑えられる。The rise of the vapor of carbon compounds such as CO is blocked by the gas induction cylinder, and the vapor of carbon compounds such as CO is prevented from flowing to the crucible side and coming into contact with the crystal melt in the crucible, and as a result,
C' of the single crystal rod pulled up by the pulling device
It can be kept to a low degree.
(実施例)
以下に本発明の一実施例を添付図面に基づいて説明する
。(Example) An example of the present invention will be described below based on the accompanying drawings.
図面は本発明に係る引上げ装置の模式的な縦断面図であ
り、図中、lはチャンバーてあり、該チャンバー1内に
は石英製のルツボ2が支持軸3上に載置されて収納され
ている。又、このチャンバー1内の上記ルツボ2の周囲
にはt&S材から成る円筒状のヒータ4か配され、該ヒ
ータ4の周囲には同じく炭素材から成る円筒状の断熱部
材5が配設されており、該チャンバーlの底部には排気
口6が開口している。The drawing is a schematic vertical cross-sectional view of a pulling device according to the present invention, and in the drawing, l indicates a chamber, and a quartz crucible 2 is placed on a support shaft 3 and stored in the chamber 1. ing. Further, a cylindrical heater 4 made of T&S material is arranged around the crucible 2 in this chamber 1, and a cylindrical heat insulating member 5 made of carbon material is also arranged around the heater 4. An exhaust port 6 is opened at the bottom of the chamber 1.
更に、チャンバー1内の上部には不活性ガス供給用のパ
ージチューブ9か後述の引上げ単結晶棒14を同志的に
囲繞する如くチャンバー1の上部からルツボ2内の湯面
近傍まで垂直に延設されており、該パージチューブ9の
下端縁は前記ルツボ2の上端縁よりも下方に位nせしめ
られている。Further, in the upper part of the chamber 1, a purge tube 9 for supplying inert gas is installed vertically extending from the upper part of the chamber 1 to near the melt surface in the crucible 2 so as to surround a pulled single crystal rod 14, which will be described later. The lower edge of the purge tube 9 is positioned below the upper edge of the crucible 2.
尚、ルツボ2内には結晶融液(本実施例ては、S1融液
)10か収容されている。又、チャンバーl内には上方
から引上げ軸11がパージチューブ9内を通って臨んて
おり、該引上げ軸11は不図示の駆動機構によって回転
及び上下動せしめられる。Incidentally, a crystal melt (in this embodiment, S1 melt) 10 is accommodated in the crucible 2. Further, a pulling shaft 11 faces into the chamber l from above through the inside of the purge tube 9, and the pulling shaft 11 is rotated and moved up and down by a drive mechanism (not shown).
ところて1本実施例においては、パージチューブ9の周
囲にこれと同志的にガス誘導筒12か前記ルツボ2の上
部外周に固定されて配されており、該ガス誘導筒12は
、ルツボ2の上端部外周に気密に嵌合する短円筒部12
aと、該短円筒部12aの上端から上方に向かってロー
ト状に開き、その上端部が水平に外方へ延出するリング
状円板12b−1にて構成される鍔付テーパ筒部12b
とから成る。尚、このガス誘導11i12はC,SiC
又はSiCコーチインク材にて構成され、そのソング状
円板12b−1の外周部とチャンバー1の内壁との間の
隙間δはチャンバーlのド部から上方へ向かうガスの流
れを遮断し得る程度に小さく制限されている。However, in this embodiment, a gas guide tube 12 is arranged around the purge tube 9 and fixed to the upper outer periphery of the crucible 2. A short cylindrical portion 12 that airtightly fits on the outer periphery of the upper end.
a, and a ring-shaped disc 12b-1 that opens upward from the upper end of the short cylindrical part 12a in a funnel shape and whose upper end extends horizontally outward.
It consists of Note that this gas induction 11i12 is made of C, SiC
Or, it is made of SiC coach ink material, and the gap δ between the outer periphery of the song-shaped disc 12b-1 and the inner wall of the chamber 1 is large enough to block the flow of gas upward from the corner of the chamber 1. is limited to a small amount.
而して、当該引上げ装置におり・て、C7法によって例
えばSlの単結晶棒14を引き上げるには、ルツボ2内
に適当なサイズに分割したSi材料を投入し、このSi
材料なヒータ4によって加熱して溶融し2ルツホ2内の
Si融液10の表面に引上げ軸11に取り付けた種結晶
13を浸漬し、この引上げ軸llを回転させながら、こ
れを毎分数mm程度の速度て引き上げればよい。In order to pull up, for example, a single crystal rod 14 of Sl using the C7 method in the pulling device, Si material divided into appropriate sizes is put into the crucible 2, and the Si material is
A seed crystal 13 attached to a pulling shaft 11 is immersed in the surface of the Si melt 10 in the Lutuho 2, and the seed crystal 13 attached to the pulling shaft 11 is heated and melted by a heater 4. All you have to do is pull it up at the same speed.
この場合、パージチューブ9からArガス等の不活性ガ
スかチャンバー1内に供給され、この不活性ガスはチャ
ンバー1内を図示矢印方向に流れΦ。In this case, an inert gas such as Ar gas is supplied into the chamber 1 from the purge tube 9, and this inert gas flows inside the chamber 1 in the direction of the arrow in the figure Φ.
一方、炭素材から成るヒータ4及び断熱部材5の高温部
からはCO等の炭素化合物の蒸気か発生するか、これら
ヒータ4及び断熱部材5の上部はガス誘導筒12によっ
て被われているため、CO等の炭素化合物の蒸気が1昇
してルツボ2側へ流れることかなく、このCO等の炭素
化合物の蒸気はルツボ3内のSi融MIOに触れること
なく前記不活性ガスと共に排気口6からチャンバー1外
へ排出される。On the other hand, vapors of carbon compounds such as CO are generated from the high-temperature parts of the heater 4 and the heat insulating member 5 made of carbon materials, or because the upper parts of the heater 4 and the heat insulating member 5 are covered by the gas guide tube 12, The vapor of carbon compounds such as CO does not rise and flow to the crucible 2 side, and the vapor of carbon compounds such as CO is discharged from the exhaust port 6 together with the inert gas without touching the Si molten MIO in the crucible 3. It is discharged to the outside of chamber 1.
上記のように、CO等の炭素化合物の蒸気のSi融融液
l上の接触かガス誘導筒12によって阻1トされる結果
、当該引上げ装置によって引上げられる単結晶棒14の
c6度か低く抑えられる。As mentioned above, contact of the vapor of carbon compounds such as CO on the Si melt is prevented by the gas guide tube 12, and as a result, the single crystal rod 14 pulled up by the pulling device is suppressed to a temperature as low as 6 degrees. .
しかも、本実施例のように、ガス誘導fa12をC,S
iC又はSiCコーチインク材にて構成しても、SiO
とCとの接触が避けられるため、単結晶棒14のce度
を確実に下げることかてきる。Moreover, as in this embodiment, the gas induction fa12 is changed to C, S.
Even if it is composed of iC or SiC coach ink material, SiO
Since contact between C and C can be avoided, it is possible to reliably lower the CE degree of the single crystal rod 14.
(発明の効果)
以上の説明で明らかな如く本発明によれば2チヤンバー
内に、不活性ガス供給用のパージチューブ、結晶原料を
収容するルツボ、該ルツボの周囲に配、;りされるヒー
タ、1該ヒータの周囲に配される断/1%部材等を収納
して構成される単結晶棒の引上げ装置において、引、F
げ単結晶棒を同心円的に囲繞するパージチューブを前記
チャンバーの上部から前記ルツボ内の湯面近傍まで延設
して該パージチューブの下端縁をルツボの上端縁よりも
下方に位置せしめるとともに、前記ルツボの上端部外周
に気密に11合する短円筒部と、該短円筒部上端か3ら
上方に向かってロート状に開き、その上端部が水平に外
方へ延出するリンク状円板にて構成される鍔付テーパ筒
部とから成るガス誘導筒を設け、該ガス誘導筒の前記リ
ング状円板外周部とチャンバー内壁との隙間かチVンハ
ー下部から上方へ向かうガスの流れを遮断する程度に制
限されているため、引き上げられる単結晶棒のCO度を
低く抑えることかできるという効果か得られる。(Effects of the Invention) As is clear from the above description, according to the present invention, two chambers include a purge tube for supplying an inert gas, a crucible for accommodating the crystal raw material, and a heater disposed around the crucible. 1. In a single crystal rod pulling device which is configured by storing cut/1% members etc. arranged around the heater, pulling, F
A purge tube that concentrically surrounds the single crystal rod is extended from the upper part of the chamber to near the hot water level in the crucible, and the lower edge of the purge tube is positioned below the upper edge of the crucible; A short cylindrical part that airtightly fits around the outer periphery of the upper end of the crucible, and a link-shaped disc that opens upward from the upper end of the short cylindrical part in a funnel shape and whose upper end extends horizontally outward. A gas guide tube consisting of a flanged tapered tube section is provided, and a gap between the ring-shaped disk outer circumference of the gas guide tube and the inner wall of the chamber blocks the flow of gas upward from the lower part of the cylinder. Since the CO content of the single crystal rod being pulled is limited to a low level, it is possible to obtain the effect that the CO content of the single crystal rod being pulled can be kept low.
図面は本発明に係る引上げ装置の模式的な縦断面図であ
る。
l・・・チャンバー、2・・・ルツボ、4・・・ヒータ
、5・・・断熱部材、9・・・パージチューブ、12・
・・ガス誘導筒、12a・・・短円筒部、12b・・・
鍔付テーパ筒部、12b−1・・・リンク状円板、14
・・・中結晶林。
特許出願人 信越半導体株式会社The drawing is a schematic vertical sectional view of a pulling device according to the present invention. l...Chamber, 2...Crucible, 4...Heater, 5...Insulating member, 9...Purge tube, 12...
...Gas guide tube, 12a...Short cylindrical part, 12b...
Tapered cylindrical portion with flange, 12b-1... Link-shaped disc, 14
... Medium crystalline forest. Patent applicant Shin-Etsu Semiconductor Co., Ltd.
Claims (2)
ーブ、結晶原料を収容するルツボ、該ルツボの周囲に配
設されるヒータ、該ヒータの周囲に配される断熱部材等
を収納して構成される単結晶棒の引上げ装置において、
引上げ単結晶棒を同心円的に囲繞するパージチューブを
前記チャンバーの上部から前記ルツボ内の湯面近傍まで
延設して該パージチューブの下端縁をルツボの上端縁よ
りも下方に位置せしめるとともに、前記ルツボの上端部
外周に気密に嵌合する短円筒部と、該短円筒部上端から
上方に向かってロート状に開き、その上端部が水平に外
方へ延出するリング状円板にて構成される鍔付テーパ筒
部とから成るガス誘導筒を設け、該ガス誘導筒の前記リ
ング状円板外周部とチャンバー内壁との隙間がチャンバ
ー下部からh方へ向かうガスの流れを遮断する程度に制
限されていることを特徴とする単結晶棒の引上げ装置。(1) The chamber houses a purge tube for supplying inert gas, a crucible for storing crystal raw materials, a heater placed around the crucible, a heat insulating member placed around the heater, etc. In the single crystal rod pulling device,
A purge tube that concentrically surrounds the pulled single-crystal rod is extended from the upper part of the chamber to near the hot water level in the crucible, and the lower edge of the purge tube is positioned below the upper edge of the crucible; Consisting of a short cylindrical part that airtightly fits on the outer periphery of the upper end of the crucible, and a ring-shaped disc that opens upward from the upper end of the short cylindrical part in a funnel shape, and whose upper end extends horizontally outward. A gas guide tube consisting of a tapered cylindrical portion with a flange is provided, and the gap between the ring-shaped disk outer circumferential portion of the gas guide tube and the inner wall of the chamber is such that it blocks the flow of gas from the lower part of the chamber toward the h direction. A device for pulling a single crystal rod, characterized in that:
ィング材にて構成される請求項1記載の単結晶棒の引上
げ装置。(2) The single-crystal rod pulling device according to claim 1, wherein the gas guide tube is made of C, SiC, or a SiC coating material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63326014A JP2614095B2 (en) | 1988-12-26 | 1988-12-26 | Single crystal rod pulling device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63326014A JP2614095B2 (en) | 1988-12-26 | 1988-12-26 | Single crystal rod pulling device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02172884A true JPH02172884A (en) | 1990-07-04 |
JP2614095B2 JP2614095B2 (en) | 1997-05-28 |
Family
ID=18183132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63326014A Expired - Fee Related JP2614095B2 (en) | 1988-12-26 | 1988-12-26 | Single crystal rod pulling device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2614095B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109576780A (en) * | 2018-12-28 | 2019-04-05 | 宁夏隆基硅材料有限公司 | A kind of seed crystal welding process and equipment |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5930792A (en) * | 1982-08-10 | 1984-02-18 | Toshiba Corp | Apparatus for growing single crystal |
JPS61132583A (en) * | 1984-11-30 | 1986-06-20 | Fujitsu Ltd | Production of semiconductor single crystal |
JPS62216990A (en) * | 1986-03-18 | 1987-09-24 | Sakaguchi Dennetsu Kk | Single crystal growth device |
-
1988
- 1988-12-26 JP JP63326014A patent/JP2614095B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5930792A (en) * | 1982-08-10 | 1984-02-18 | Toshiba Corp | Apparatus for growing single crystal |
JPS61132583A (en) * | 1984-11-30 | 1986-06-20 | Fujitsu Ltd | Production of semiconductor single crystal |
JPS62216990A (en) * | 1986-03-18 | 1987-09-24 | Sakaguchi Dennetsu Kk | Single crystal growth device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109576780A (en) * | 2018-12-28 | 2019-04-05 | 宁夏隆基硅材料有限公司 | A kind of seed crystal welding process and equipment |
Also Published As
Publication number | Publication date |
---|---|
JP2614095B2 (en) | 1997-05-28 |
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