JPH02167891A - Gas-phase synthetic device of diamond film - Google Patents

Gas-phase synthetic device of diamond film

Info

Publication number
JPH02167891A
JPH02167891A JP32128088A JP32128088A JPH02167891A JP H02167891 A JPH02167891 A JP H02167891A JP 32128088 A JP32128088 A JP 32128088A JP 32128088 A JP32128088 A JP 32128088A JP H02167891 A JPH02167891 A JP H02167891A
Authority
JP
Japan
Prior art keywords
gas
plasma
diamond film
substrate
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32128088A
Inventor
Takanori Minamitani
Nobuyuki Yoshino
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP32128088A priority Critical patent/JPH02167891A/en
Publication of JPH02167891A publication Critical patent/JPH02167891A/en
Application status is Pending legal-status Critical

Links

Abstract

PURPOSE: To uniformly form a diamond film on a substrate of large area at low temperature of substrate in synthesis of diamond film by gas-phase synthesis, by using plasma generated in a hollow cathode type plasma beam.
CONSTITUTION: Pressure in a vacuum chamber 22 is reduced to about 10-6Torr by vacuum exhaust through an exhaust system 24 and an introduced gas consisting essentially of hydrogen gas is discharged in a plasma beam source 10 to form a plasma zone 18 between the plasma source 10 and an opposing electrode 12 to which positive voltage based on the plasma beam source is applied. A carbon source compound such as methane gas is introduced from a gas inlet 28 simultaneously with the operation, the vacuum chamber 22 is maintained under 1-10 Torr degree of vacuum and a diamond film is formed on a substrate 16 set in the plasma zone 18.
COPYRIGHT: (C)1990,JPO&Japio
JP32128088A 1988-12-20 1988-12-20 Gas-phase synthetic device of diamond film Pending JPH02167891A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32128088A JPH02167891A (en) 1988-12-20 1988-12-20 Gas-phase synthetic device of diamond film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32128088A JPH02167891A (en) 1988-12-20 1988-12-20 Gas-phase synthetic device of diamond film

Publications (1)

Publication Number Publication Date
JPH02167891A true JPH02167891A (en) 1990-06-28

Family

ID=18130801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32128088A Pending JPH02167891A (en) 1988-12-20 1988-12-20 Gas-phase synthetic device of diamond film

Country Status (1)

Country Link
JP (1) JPH02167891A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02205684A (en) * 1989-02-02 1990-08-15 Nippon Sheet Glass Co Ltd Method and device for coating of film
EP0478909A1 (en) * 1990-09-14 1992-04-08 Balzers Aktiengesellschaft Process and apparatus for obtaining a diamondlayer
US5342660A (en) * 1991-05-10 1994-08-30 Celestech, Inc. Method for plasma jet deposition
US5551983A (en) * 1994-11-01 1996-09-03 Celestech, Inc. Method and apparatus for depositing a substance with temperature control
US5679404A (en) * 1995-06-07 1997-10-21 Saint-Gobain/Norton Industrial Ceramics Corporation Method for depositing a substance with temperature control
US6173672B1 (en) 1997-06-06 2001-01-16 Celestech, Inc. Diamond film deposition on substrate arrays
US6406760B1 (en) 1996-06-10 2002-06-18 Celestech, Inc. Diamond film deposition on substrate arrays
KR100765630B1 (en) * 2006-10-26 2007-10-09 (주)제이 앤 엘 테크 Wiper blade and manufacturing method of it for vehicle
DE10149588B4 (en) * 2001-10-08 2017-09-07 Oerlikon Trading Ag, Trübbach A method for diamond coating of substrates

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02205684A (en) * 1989-02-02 1990-08-15 Nippon Sheet Glass Co Ltd Method and device for coating of film
EP0478909A1 (en) * 1990-09-14 1992-04-08 Balzers Aktiengesellschaft Process and apparatus for obtaining a diamondlayer
US5616373A (en) * 1990-09-14 1997-04-01 Balzers Aktiengesellschaft Plasma CVD method for producing a diamond coating
US5342660A (en) * 1991-05-10 1994-08-30 Celestech, Inc. Method for plasma jet deposition
US5551983A (en) * 1994-11-01 1996-09-03 Celestech, Inc. Method and apparatus for depositing a substance with temperature control
US5683759A (en) * 1994-11-01 1997-11-04 Celestech, Inc. Method for depositing a substance with temperature control
US5679404A (en) * 1995-06-07 1997-10-21 Saint-Gobain/Norton Industrial Ceramics Corporation Method for depositing a substance with temperature control
US6099652A (en) * 1995-06-07 2000-08-08 Saint-Gobain Industrial Ceramics, Inc. Apparatus and method for depositing a substance with temperature control
US6406760B1 (en) 1996-06-10 2002-06-18 Celestech, Inc. Diamond film deposition on substrate arrays
US6173672B1 (en) 1997-06-06 2001-01-16 Celestech, Inc. Diamond film deposition on substrate arrays
DE10149588B4 (en) * 2001-10-08 2017-09-07 Oerlikon Trading Ag, Trübbach A method for diamond coating of substrates
KR100765630B1 (en) * 2006-10-26 2007-10-09 (주)제이 앤 엘 테크 Wiper blade and manufacturing method of it for vehicle

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